JPS632819A - Silica glass manufacturing method - Google Patents
Silica glass manufacturing methodInfo
- Publication number
- JPS632819A JPS632819A JP14737286A JP14737286A JPS632819A JP S632819 A JPS632819 A JP S632819A JP 14737286 A JP14737286 A JP 14737286A JP 14737286 A JP14737286 A JP 14737286A JP S632819 A JPS632819 A JP S632819A
- Authority
- JP
- Japan
- Prior art keywords
- gel
- sol solution
- sol
- drying
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000000243 solution Substances 0.000 description 26
- 239000000499 gel Substances 0.000 description 24
- 238000001035 drying Methods 0.000 description 13
- 239000000377 silicon dioxide Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- -1 alkyl silicate Chemical compound 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000011240 wet gel Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 206010011878 Deafness Diseases 0.000 description 1
- 241000218657 Picea Species 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 231100000895 deafness Toxicity 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 208000016354 hearing loss disease Diseases 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 101150009089 tifa gene Proteins 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はゾル−ゲル法による石英ガラスの製造方法に関
する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing quartz glass by a sol-gel method.
従来ゾル−グル法による石英ガラスの製造方法は、特願
昭58−237577に詳細に記載されてiるように、
金属アルコキシドの加水分解溶液中に、超微粉末シリカ
を均一に分散させた後、該分散液の’PH直を3〜6に
調整したゾル溶液を容器に仕込んでゲル化させ、乾燥、
焼結するという工程を有して^る。The conventional method for producing quartz glass by the Sol-Guru method is as described in detail in Japanese Patent Application No. 58-237577.
After uniformly dispersing ultrafine powdered silica in a hydrolyzed solution of metal alkoxide, a sol solution of which the pH of the dispersion was adjusted to 3 to 6 was charged into a container and gelled, dried,
It involves a process of sintering.
本方法を利用して1つの仕込みゲルから1つのガラ名木
が得られ、モ板状ガラスを研磨することKよシ、工C用
7オトマスク石英基板等に適用でき、ゾル−ゲル法によ
る製造方法として有効な方法である。Using this method, one glass name tree can be obtained from one charged gel, and it can be applied to polishing plate-shaped glass, quartz substrates for engineering, etc., and can be manufactured by the sol-gel method. This is an effective method.
しかし、従来の製造方法でl:tlつの仕込み容器から
1つのガラス体が得られるだけで、量産性を考えた場合
、匝めて非合理的である。However, with the conventional manufacturing method, only one glass body can be obtained from 1:tl preparation containers, which is completely irrational when considering mass production.
そこで、本発明は従来のこのような量産性の問題点を解
決するもので、その目的とするところは、1つの仕込み
容器から2つ以上のガラス#−を同時に得て量産性を良
くするととくある。Therefore, the present invention is intended to solve these conventional problems in mass production, and its purpose is to improve mass production by simultaneously obtaining two or more glasses #- from one preparation container. be.
c問題点を解決するための手段〕
本発明のガラスの製造方法は、少くともアルキルシリケ
ートと超微粉末シリカを主原料とするゾル溶液の調製工
程、ゲル化工糧、乾燥工程、該ゲルの焼結工程よりなる
石英ガラスの製造方法のゾル溶液のゲル化工程1’l−
^て、PH!Il整したゾル溶液を容器内でゲル化させ
た後、さらKその上にアTLv14整したゾル溶液を仕
込んでゲル化させて。c. Means for Solving Problems] The method for producing glass of the present invention includes at least a step of preparing a sol solution containing alkyl silicate and ultrafine powdered silica as main raw materials, a gelling process, a drying step, and a baking step of the gel. Gelation step 1'l- of sol solution in method for manufacturing quartz glass consisting of coalescence step
^ Te, PH! After gelling the adjusted sol solution in a container, the sol solution adjusted to TLv14 was poured on top of it and allowed to gel.
二層以上に重ねてゲル化することを特徴とする。It is characterized by forming a gel in two or more layers.
〔実施列1〕
精製した市販のエチルシリケー) 1.947 ト3.
2!の純水に塩@3.2mAを加えた水溶液を激しく攪
拌し、無色透明の均一溶液を得た。そこに超微粉末シリ
カ(商品名キャボシルL−(イ)、キャボット社製)9
7!Mt−徐々に添加し、充分に攪拌した。[Execution row 1] Purified commercially available ethyl silica) 1.947 3.
2! An aqueous solution prepared by adding salt @ 3.2 mA to pure water was vigorously stirred to obtain a colorless and transparent homogeneous solution. There, ultrafine powdered silica (trade name CABO SIL L-(I), manufactured by Cabot Corporation) 9
7! Mt - Added slowly and stirred thoroughly.
さらKこのゾル溶UK超音波を3時間照射した。Furthermore, this sol was irradiated with UK ultrasound for 3 hours.
該ゾル溶液に1500Gの遠心力を15分間かけ、ゾル
溶液中のダマ状物を取)除いて均質度の高いゾル溶液を
得た。A centrifugal force of 1500 G was applied to the sol solution for 15 minutes to remove lumps in the sol solution to obtain a highly homogeneous sol solution.
該ゾル溶液t−o、i規定のアンモニア水でPH4,3
Ic!M整してから、ポリプロピレン製容器(幅30
anX 30 cnt X高さ1(JcIn) K 7
50 mAの量を仕込みフタをして水平に静置した。約
1時間後ゲル1ヒしたので、再びP H4,3に調整し
たゾル溶液750mAを固化したゲル上に注ぎ込み水子
に静置した。約1時開俵ゲル化し、二層のウェットゲル
が得られた。該ウェットゲルを5日間、刀℃の恒温室内
で熟成させた。The sol solution to, i with normal ammonia water has a pH of 4.3.
Ic! After adjusting the size of the polypropylene container (width 30mm)
anX 30 cnt x height 1 (JcIn) K 7
An amount of 50 mA was charged, the lid was closed, and the container was left standing horizontally. After about 1 hour, the gel was cooled, so 750 mA of the sol solution adjusted to pH 4.3 was again poured onto the solidified gel and allowed to stand still in the water column. After about 1 hour, the bale gelatinized and a two-layer wet gel was obtained. The wet gel was aged for 5 days in a thermostatic chamber at 0.degree.
熟成したウェットグルに開孔率0.4 %の7タをして
58℃の乾燥室内で乾燥させた。約5日後乾燥が終了し
た。得られたドライゲルは二層であるが少し力を加える
ことで容易に一層ずりに剥離した。The aged wet glue was coated with 7 sheets with a porosity of 0.4% and dried in a drying room at 58°C. Drying was completed after about 5 days. Although the obtained dry gel had two layers, it was easily peeled off into one layer by applying a little force.
該ドライゲルをガス1庚炉内に入れ、 30 ′C/h
rの速度で700℃まで昇温した。709℃から純ヘリ
ウムガスt−IJ!/1rLin の流量で炉内に流入
しはじめ、30℃/hrの速度で1400℃まで昇温し
、1400℃で2時間保持した。The dry gel was placed in a gas furnace and heated at 30'C/h.
The temperature was raised to 700°C at a rate of r. Pure helium gas t-IJ from 709℃! It started flowing into the furnace at a flow rate of /1rLin, the temperature was raised to 1400°C at a rate of 30°C/hr, and the temperature was maintained at 1400°C for 2 hours.
得られた石英ガラスμ幅14.&m X 14.6c!
!IX厚さ3.2uの大きさであった。The resulting quartz glass μ width was 14. &m x 14.6c!
! The size was IX thickness 3.2u.
〔実施列2〕
実施列1と同組成のゾル溶液を調製し、実施列1と同じ
ゲルfヒのや夛方で三層にゲル化させた。[Run 2] A sol solution having the same composition as in Run 1 was prepared, and gelled into three layers using the same method as in Run 1.
該ウェットゲルを5日間、30℃の恒温室内で熟成した
後、開孔率0.4チのフタをして58℃の乾燥室内で乾
燥させた。約5日後乾燥が終了した。The wet gel was aged for 5 days in a thermostatic chamber at 30°C, then covered with a lid having a porosity of 0.4 cm and dried in a drying room at 58°C. Drying was completed after about 5 days.
得られたドライゲルは三層であるが少し力を加えること
で割れることなく容易に一層ずりに剥離した。The obtained dry gel had three layers, but when a little force was applied, the layers were easily peeled off without cracking.
該ドライゲルを通常の方法で焼結することによ91幅1
4.&Fll X 14.6 X厚さ3.−の大きさの
石英ガラスが得られた。91 width 1 by sintering the dry gel in a conventional manner.
4. &Fll x 14.6 x thickness 3. A quartz glass with a size of - was obtained.
〔実施列3〕
精製した市販のエチルシリケート4.6!と11.1!
の純水に塩酸11.1 mAを加えた水溶液を激しく攪
拌し、無色透明の均−IW液を得た。そこに超微粉末シ
リカ(商品名アエロジル0×犯、デグサ社)3.ygy
を徐々に添加し、充分く攪拌した。さらにこのゾルF[
に超音波t−3時間照射して超微粉末シリカの分散を確
実なものとした。該ゾル溶液に1500Gの遠心力全1
5分間かけ、ゾル溶液中のダマ状物を取シ除いて均質度
の高いゾル溶液を得た。[Run 3] Purified commercially available ethyl silicate 4.6! And 11.1!
An aqueous solution prepared by adding 11.1 mA of hydrochloric acid to pure water was vigorously stirred to obtain a colorless and transparent homogeneous IW solution. There, ultrafine powdered silica (trade name: Aerosil 0x, Degussa) 3. ygy
was gradually added and stirred thoroughly. Furthermore, this sol F [
Ultrasonic waves were irradiated for t-3 hours to ensure the dispersion of the ultrafine powdered silica. A total of 1500G centrifugal force is applied to the sol solution.
The clumps in the sol solution were removed for 5 minutes to obtain a highly homogeneous sol solution.
該ゾル溶液全0.1規定のアンモニア水でPH4,3K
l!Il整してから、ポリプロピレン製容器C幅30
cmX 30 cym X高さ10口)に750mJの
量を仕込みフタをして水’FK靜!した。約父分後ゲル
化したので、離型用シリコーンスプL/−(K?958
P。The sol solution has a total pH of 4.3K with 0.1N ammonia water.
l! After adjusting the Il, polypropylene container C width 30
Pour 750 mJ into a tube (cm x 30 cym x height 10 mouths), cover with a lid, and water! did. After about an hour, it gelled, so I used silicone spruce L/-(K?958) for mold release.
P.
信越化学)を塗布した後、再びP H4,3に調整した
ゾル溶液750mAを固定したゲル上に注ぎ込み水〒に
静置した。約(資)分阪ゲル化したので、離聾用シリコ
ーンスプレーを塗布した後、再びI’H4,3KJ整し
たゾル溶液750mAを固化したゲル上に注ぎ込み水子
に静置した。約1時間後ゲルfヒし、三層のウェットグ
ルが得られた。該ウェットゲルを5日間、30℃の恒温
室内で熟成させた。After coating the gel (Shin-Etsu Chemical), 750 mA of the sol solution adjusted to pH 4.3 was again poured onto the fixed gel and allowed to stand in water. Approximately 10 minutes after gelatinization, a silicone spray for deafness was applied, and then 750 mA of the I'H4,3KJ prepared sol solution was again poured onto the solidified gel, and the gel was allowed to stand still in the water column. After about 1 hour, the gel was heated and a three-layered wet glue was obtained. The wet gel was aged in a thermostatic chamber at 30° C. for 5 days.
熟成したウェットゲルに開孔率0.4%のフタをして5
8℃の乾燥室内で乾燥させた。約5日後乾燥が終了した
。得られたドライゲルは三層で軟線終了時間で既に一層
一層が剥離していた。Put a lid on the aged wet gel with a porosity of 0.4% and
It was dried in a drying room at 8°C. Drying was completed after about 5 days. The obtained dry gel had three layers, and each layer had already peeled off by the end of the soft wire.
該ドライゲルを通常の方法で焼結することKよ’) %
@15cfRX 15m x厚さ3.4uの大きさの
石英ガラスが得られた。Sinter the dry gel using a conventional method.
@15cfRX A quartz glass with a size of 15 m x 3.4 u thick was obtained.
〔実施列4〕
実施例3と同組成のゾル溶液を調製し、実施列3と同じ
ゲル化のやシ方が五層はゲル化させた。[Example 4] A sol solution having the same composition as in Example 3 was prepared, and five layers were gelled in the same manner as in Example 3.
該ウェットグルを5日間、30℃の恒温室内で熟成した
後、開孔率0.4%の7りをして58℃の乾燥室内で乾
燥させた。約1ケ月後乾燥が終了した。The wet glue was aged for 5 days in a thermostatic chamber at 30° C., then dried in a drying room at 58° C. with a porosity of 0.4%. Drying was completed after about one month.
五枚のドライゲルが剥離した状態で得られた。Five sheets of dry gel were obtained in a peeled state.
該ドライゲルを通常の方法で焼結することにより幅15
cm X 15α×厚さ3.4uの大きさの石英ガラ
スが得られた。By sintering the dry gel in a conventional manner, the width of
A quartz glass with a size of cm×15α×thickness 3.4u was obtained.
〔実tIfA列5〕
市販の精製エチルシリケート、市販のエタノール、水、
および市販の電子工業用グレードの29%アンそニア水
を、それぞれ、 11 J 、 16.&# 、 3.
8J 、 0.45Jを混合し、4時間激しく攪拌した
後冷暗所にて一晩装置しシリカ微粒子分散液を濃縮し−
た後、安定化のため、PH直′t−4に調整し、第1鉦
とした。光透過式の遠心沈降粒度分布測定装置でシリカ
微粒子の一均粒径を測定したところ。[Actual tIfA column 5] Commercially available purified ethyl silicate, commercially available ethanol, water,
and commercially available electronic grade 29% anthonia water at 11 J and 16 J, respectively. &# 3.
8J and 0.45J were mixed, stirred vigorously for 4 hours, and kept in a cool dark place overnight to concentrate the silica fine particle dispersion.
After that, for stabilization, the pH was adjusted to t-4, which was used as the first gong. The average particle size of silica fine particles was measured using a light transmission type centrifugal sedimentation particle size distribution analyzer.
0.40尾であった。It was 0.40 fish.
次に市販のN製エチルシリケー) 4.87と0.02
規定の塩酸6 、157とを混合し、激しく攪拌し、加
水分解反応を行ない、窮2液とした。Next, commercially available N ethyl silica) 4.87 and 0.02
The mixture was mixed with 6,157 ml of specified hydrochloric acid, stirred vigorously, and subjected to a hydrolysis reaction to form two liquids.
眞1液と第2液を混合し、0.1規定のアンモニア水で
P H4,3にv4整して、実施列4に示すように五層
に仕込みゲル化させた。The first solution and the second solution were mixed, adjusted to pH 4.3 with 0.1N aqueous ammonia, and prepared in five layers as shown in Example 4 to form a gel.
該ウェットゲルを5日間%30℃の恒温室内で熟成させ
た1%開孔率0.4チのフタをして58℃の乾燥室内で
乾燥させた。約1ケ月後乾燥が終了した。五枚のドライ
ゲルが剥離した状態で得られた。The wet gel was aged for 5 days in a thermostatic chamber at 30° C. and dried in a drying chamber at 58° C. with a lid having a 1% porosity of 0.4 cm. Drying was completed after about one month. Five sheets of dry gel were obtained in a peeled state.
該ドライグルを通常の方法で焼結することKより幅15
cHIX 153 X厚さ3.4藺の大きさの石英ガ
ラスが得られた。The dry glue is sintered in a conventional manner to have a width of 15 mm.
A quartz glass having a size of cHIX 153×3.4 mm thick was obtained.
以上述べたように本発明によれば、少くともアルキルシ
リケートと超微粉末シリカを主原料とするゾル溶液のv
IJ整工程、ゲル化工程、乾燥工程、該ゲルの焼結工程
よりなる石英ガラスの製造方法のゾル溶液のゲル化工程
におhて、PE[pi整したゾル溶液を容器内でゲル化
させた後、さらにその上にPH調整しなゾル溶液を仕込
んでゲル比させて、2層以上に重ねてゲル化し九ととく
よff、 1つの仕込み容器から2つ以上のガラス体を
同時に得ることが可能となシ、″また限られた乾燥スペ
ース内からの乾燥枚数が増え、厳産注において多大な効
果を与えることはなった。As described above, according to the present invention, a sol solution containing at least alkyl silicate and ultrafine powder silica as main raw materials has a
In the sol solution gelling step of the quartz glass manufacturing method, which includes an IJ conditioning step, a gelling step, a drying step, and a sintering step of the gel, the PE[pi prepared sol solution is gelled in a container. After that, add a sol solution without adjusting the pH on top of it, make a gel ratio, and layer it in two or more layers to form a gel.This makes it possible to obtain two or more glass bodies at the same time from one preparation container. In addition, the number of sheets dried within a limited drying space has increased, which has had a great effect on tight production orders.
以 上that's all
Claims (1)
とするゾル溶液の調製工程、ゲル化工程、乾燥工程、該
ゲルの焼結工程よりなる石英ガラスの製造方法のゾル溶
液のゲル化工程において、PH調整したゾル溶液を容器
内でゲル化させた後、さらにその上にPH調整したゾル
溶液を仕込んでゲル化させて、二層以上に重ねてゲル化
することを特徴とする石英ガラスの製造方法。PH A method for producing quartz glass, which comprises gelling the prepared sol solution in a container, then charging a pH-adjusted sol solution thereon to gel it, and stacking it in two or more layers to form a gel. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61147372A JPH085679B2 (en) | 1986-06-24 | 1986-06-24 | Quartz glass manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61147372A JPH085679B2 (en) | 1986-06-24 | 1986-06-24 | Quartz glass manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS632819A true JPS632819A (en) | 1988-01-07 |
JPH085679B2 JPH085679B2 (en) | 1996-01-24 |
Family
ID=15428742
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61147372A Expired - Fee Related JPH085679B2 (en) | 1986-06-24 | 1986-06-24 | Quartz glass manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH085679B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01202734A (en) * | 1988-02-08 | 1989-08-15 | Canon Inc | Motor-driven camera |
CN110862220A (en) * | 2019-11-28 | 2020-03-06 | 福建工程学院 | A kind of preparation method of two-dimensional material doped multicomponent gel glass |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6081034A (en) * | 1983-10-05 | 1985-05-09 | Seiko Epson Corp | Method for producing base material for optical fiber |
-
1986
- 1986-06-24 JP JP61147372A patent/JPH085679B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6081034A (en) * | 1983-10-05 | 1985-05-09 | Seiko Epson Corp | Method for producing base material for optical fiber |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01202734A (en) * | 1988-02-08 | 1989-08-15 | Canon Inc | Motor-driven camera |
CN110862220A (en) * | 2019-11-28 | 2020-03-06 | 福建工程学院 | A kind of preparation method of two-dimensional material doped multicomponent gel glass |
Also Published As
Publication number | Publication date |
---|---|
JPH085679B2 (en) | 1996-01-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2000037359A1 (en) | Fine particle, sol having fine particles dispersed, method for preparing said sol and substrate having coating thereon | |
JPS632819A (en) | Silica glass manufacturing method | |
JPH10510307A (en) | Surface treatment composition | |
JP2538527B2 (en) | Method for producing metal oxide glass film and spherical fine particles | |
US4933202A (en) | Method of improving the adhesion of plastics to metals in dental prostheses | |
JPS59116135A (en) | Silica glass manufacturing method | |
JP3115366B2 (en) | Method for producing silica-titania glass | |
JP3876521B2 (en) | Ultraviolet shielding fine powder composition and use thereof | |
JP3062969B2 (en) | Bioactive layer coating method | |
JPH0712938B2 (en) | Quartz glass manufacturing method | |
JPS59102832A (en) | Borosilicate glass manufacturing method | |
JPS60131834A (en) | Manufacture of quartz glass | |
JPS6259553A (en) | Porous spherical glass and production thereof | |
JPS5841740A (en) | Method for manufacturing transparent bodies exhibiting interference colors or play-of-color | |
JPS6081034A (en) | Method for producing base material for optical fiber | |
JPS62278135A (en) | Production of glass | |
JPS6368369A (en) | Composition for forming polishing layer | |
JPS632817A (en) | Silica glass manufacturing method | |
JPS61168537A (en) | Silica glass manufacturing method | |
JPH0798665B2 (en) | Silica glass manufacturing method | |
JP2534498B2 (en) | Method for producing doped silica glass having optical functionality | |
JPS6090834A (en) | Manufacture of quartz glass | |
JPS643815B2 (en) | ||
JPS62212232A (en) | Production of glass | |
JPS6330335A (en) | Production of quartz glass |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |