JPS63234511A - Semiconductor substrate treatment device - Google Patents
Semiconductor substrate treatment deviceInfo
- Publication number
- JPS63234511A JPS63234511A JP62069753A JP6975387A JPS63234511A JP S63234511 A JPS63234511 A JP S63234511A JP 62069753 A JP62069753 A JP 62069753A JP 6975387 A JP6975387 A JP 6975387A JP S63234511 A JPS63234511 A JP S63234511A
- Authority
- JP
- Japan
- Prior art keywords
- wafers
- carrier
- counted
- semiconductor substrate
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 25
- 239000004065 semiconductor Substances 0.000 title claims description 23
- 238000000034 method Methods 0.000 claims abstract description 5
- 238000003860 storage Methods 0.000 claims description 5
- 235000012431 wafers Nutrition 0.000 abstract description 21
- 239000000969 carrier Substances 0.000 description 5
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体集積回路製造工程において、半導体基板
収納箱(以下キャリアと称する)単位で半導体基板(以
下ウェハーと称する)を同時処理する半導体基板処理装
置に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a semiconductor substrate in which semiconductor substrates (hereinafter referred to as wafers) are simultaneously processed in units of semiconductor substrate storage boxes (hereinafter referred to as carriers) in the semiconductor integrated circuit manufacturing process. It relates to a processing device.
この種の半導体基板処理装置には、キャリアに複数枚の
ウェハーを収納し、これを処理部に搬入してキャリア単
位で複数枚のウェハーを同時処理する構造のものがある
。Some semiconductor substrate processing apparatuses of this type have a structure in which a plurality of wafers are stored in a carrier, the wafers are carried into a processing section, and the plurality of wafers are simultaneously processed in units of carriers.
従来、上述した半導体基板処理装置では、特に処理前後
でのウェハーの枚数管理は行われていないのが実情であ
る。Conventionally, in the above-described semiconductor substrate processing apparatus, the actual situation is that the number of wafers is not particularly managed before and after processing.
このため、処理を行っている途中でキャリア内のウェハ
ーが一部割れたこと龜気付かず装置を汚染させた状態で
処理を続けこれが不良発生原因を作ったり、処理途中で
キャリアが入れ替わっても気付かないという欠点があっ
た。For this reason, during processing, some wafers in the carrier may break and the processing continues without realizing that the equipment is contaminated, which may cause defects, or even if the carrier is replaced during processing, the user may not notice. There was a drawback that there was no
本発明の目的はウェハーの枚数管理機能を備えた半導体
基板処理装置を提供することにある。An object of the present invention is to provide a semiconductor substrate processing apparatus having a wafer number management function.
本発明は半導体基板収納箱単位で半導体基板の同時処理
を行う処理部を装備した半導体基板処理装置において、
前記処理部の前後で半導体基板収納箱に収納されている
半導体基板の枚数をカウントするカウンタと、該カウン
タにてカウントされた処理前後の半導体基板の枚数を比
較照合して枚数管理用信号を出力する比較部とを有する
ことを特徴とする半導体基板処理装置である。The present invention provides a semiconductor substrate processing apparatus equipped with a processing section that simultaneously processes semiconductor substrates in each semiconductor substrate storage box.
A counter that counts the number of semiconductor substrates stored in a semiconductor substrate storage box before and after the processing section compares and collates the number of semiconductor substrates counted by the counter before and after processing, and outputs a signal for number management. A semiconductor substrate processing apparatus is characterized in that it has a comparison section that performs the following steps.
以下、本発明の一実施例を図により説明する。 Hereinafter, one embodiment of the present invention will be described with reference to the drawings.
第1図は本発明に係る半導体基板処理装置における主要
部を示すものである。FIG. 1 shows the main parts of a semiconductor substrate processing apparatus according to the present invention.
第1図において、5はキャリア単位で複数枚の半導体基
板を同時処理する処理部であり、該処理部5の前段に、
キャリア2を搬入するローダ−1を設置するとともに、
該処理部5の後段に、キャリアを搬出するアンローダ−
6を設置する。さらに処理部5の前後段に、それぞれキ
ャリア2内のウェハー8の枚数をカウントするカウンタ
としてのCCDカメラ3,7を設け、かつ2個のCCD
カメラ3,7から出力するウェハーの枚数を比較照合し
枚数管理用信号を出力する比較部9を装備する。4はコ
ントローラーである。In FIG. 1, 5 is a processing section that simultaneously processes a plurality of semiconductor substrates in carrier units.
In addition to installing the loader 1 to carry the carrier 2,
An unloader for unloading the carrier is provided after the processing section 5.
Install 6. Furthermore, CCD cameras 3 and 7 as counters for counting the number of wafers 8 in the carrier 2 are provided at the front and rear stages of the processing section 5, respectively, and two CCD cameras
A comparator 9 is provided for comparing and collating the number of wafers output from the cameras 3 and 7 and outputting a signal for managing the number of wafers. 4 is a controller.
第1図に示すようにローダ−1にセットされたキャリア
2内のウェハーの枚数はCCDカメラ3によりカウント
される。カウントされたデータは比較部9へ送られる。As shown in FIG. 1, the number of wafers in a carrier 2 set in a loader 1 is counted by a CCD camera 3. The counted data is sent to the comparison section 9.
その後、処理部5を通ったキャリア2内のウェハーの枚
数はCCDカメラ7によりカウントされ、比較部9によ
り、ローダ−1でのデータと比較照合される。処理前後
のウエノ1−の枚数に差が生じた場合には比較部9から
の信号に基づいてコントローラー4が装置の駆動制御を
行い、ウェハーの割れやキャリアの入れ替わりなどの事
故に対処する。Thereafter, the number of wafers in the carrier 2 that have passed through the processing section 5 is counted by the CCD camera 7, and compared with the data from the loader 1 by the comparison section 9. If there is a difference in the number of wafers 1- before and after processing, the controller 4 controls the drive of the apparatus based on the signal from the comparison section 9 to deal with accidents such as cracking of wafers or replacement of carriers.
なお、本発明では枚数のカウントにCCDカメラを用い
たが、他のカウント方式を利用してもよい。In the present invention, a CCD camera is used to count the number of sheets, but other counting methods may be used.
以上説明したように本発明は処理前後のキャリア内のウ
ェハーの枚数をカウントし、比較照合することにより処
理中のウェハーの割れやキャリアの入れ替わりを発見す
ることが可能となり、装置の汚染やキャリアの入れ替わ
りによる製品の不良発生を防止できる効果を有するもの
である。As explained above, the present invention counts the number of wafers in the carrier before and after processing, and by comparing and collating the numbers, it is possible to detect cracks in wafers or replacement of carriers during processing, thereby preventing contamination of equipment or damage to carriers. This has the effect of preventing product defects due to product replacement.
第1図は本発明の一実施例を示す構成図である。 FIG. 1 is a block diagram showing an embodiment of the present invention.
Claims (1)
行う処理部を装備した半導体基板処理装置において、前
記処理部の前後で半導体基板収納箱に収納されている半
導体基板の枚数をカウントするカウンタと、該カウンタ
にてカウントされた処理前後の半導体基板の枚数を比較
照合して枚数管理用信号を出力する比較部とを有するこ
とを特徴とする半導体基板処理装置。(1) In a semiconductor substrate processing apparatus equipped with a processing section that simultaneously processes semiconductor substrates in each semiconductor substrate storage box, a counter that counts the number of semiconductor substrates stored in the semiconductor substrate storage boxes before and after the processing section. and a comparison unit that compares and collates the number of semiconductor substrates before and after processing counted by the counter and outputs a number management signal.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62069753A JPS63234511A (en) | 1987-03-24 | 1987-03-24 | Semiconductor substrate treatment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62069753A JPS63234511A (en) | 1987-03-24 | 1987-03-24 | Semiconductor substrate treatment device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63234511A true JPS63234511A (en) | 1988-09-29 |
Family
ID=13411866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62069753A Pending JPS63234511A (en) | 1987-03-24 | 1987-03-24 | Semiconductor substrate treatment device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63234511A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006081519A3 (en) * | 2005-01-28 | 2007-02-01 | Applied Materials Inc | Methods and apparatus for operation of substrate carrier handlers |
US7177716B2 (en) | 2004-02-28 | 2007-02-13 | Applied Materials, Inc. | Methods and apparatus for material control system interface |
US7218983B2 (en) | 2003-11-06 | 2007-05-15 | Applied Materials, Inc. | Method and apparatus for integrating large and small lot electronic device fabrication facilities |
US7221993B2 (en) | 2003-01-27 | 2007-05-22 | Applied Materials, Inc. | Systems and methods for transferring small lot size substrate carriers between processing tools |
US7274971B2 (en) | 2004-02-28 | 2007-09-25 | Applied Materials, Inc. | Methods and apparatus for electronic device manufacturing system monitoring and control |
US7413069B2 (en) | 2004-02-28 | 2008-08-19 | Applied Materials, Inc. | Methods and apparatus for transferring a substrate carrier within an electronic device manufacturing facility |
US7778721B2 (en) | 2003-01-27 | 2010-08-17 | Applied Materials, Inc. | Small lot size lithography bays |
-
1987
- 1987-03-24 JP JP62069753A patent/JPS63234511A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7221993B2 (en) | 2003-01-27 | 2007-05-22 | Applied Materials, Inc. | Systems and methods for transferring small lot size substrate carriers between processing tools |
US7778721B2 (en) | 2003-01-27 | 2010-08-17 | Applied Materials, Inc. | Small lot size lithography bays |
US7218983B2 (en) | 2003-11-06 | 2007-05-15 | Applied Materials, Inc. | Method and apparatus for integrating large and small lot electronic device fabrication facilities |
US7603195B2 (en) | 2003-11-06 | 2009-10-13 | Applied Materials, Inc. | Methods and apparatus for integrating large and small lot electronic device fabrication facilities |
US7177716B2 (en) | 2004-02-28 | 2007-02-13 | Applied Materials, Inc. | Methods and apparatus for material control system interface |
US7274971B2 (en) | 2004-02-28 | 2007-09-25 | Applied Materials, Inc. | Methods and apparatus for electronic device manufacturing system monitoring and control |
US7413069B2 (en) | 2004-02-28 | 2008-08-19 | Applied Materials, Inc. | Methods and apparatus for transferring a substrate carrier within an electronic device manufacturing facility |
US7522969B2 (en) | 2004-02-28 | 2009-04-21 | Applied Materials, Inc | Methods and apparatus for material control system interface |
US7603196B2 (en) | 2004-02-28 | 2009-10-13 | Applied Materials, Inc. | Methods and apparatus for material control system interface |
WO2006081519A3 (en) * | 2005-01-28 | 2007-02-01 | Applied Materials Inc | Methods and apparatus for operation of substrate carrier handlers |
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