JPS63218776A - Metx resistant solder resist ink composition - Google Patents
Metx resistant solder resist ink compositionInfo
- Publication number
- JPS63218776A JPS63218776A JP62051732A JP5173287A JPS63218776A JP S63218776 A JPS63218776 A JP S63218776A JP 62051732 A JP62051732 A JP 62051732A JP 5173287 A JP5173287 A JP 5173287A JP S63218776 A JPS63218776 A JP S63218776A
- Authority
- JP
- Japan
- Prior art keywords
- parts
- weight
- solder resist
- film
- resist ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は耐メツキフルダレシストインク組成物に関する
。詳しくは無電解金属メッキ(化学メッキ)を用いるプ
リント回路基板の製造に利用できる耐薬品性(耐メツキ
液性)、耐熱性、および基板との密着性に優れた皮膜を
与える耐メツキソルダーレジストインク組成物に関する
ものである〇〔従来の技術〕
一般に、プリント回路基板の導体回路の膜厚は30〜3
511m必要である。さらにこの導体回路引張り強度2
1に9/−以上が要求される。これを満足する無電解金
属めっき類は、一般に、pH12〜130強アルカリ浴
中(60〜80℃)でなければ得られないし、その無電
解めっきの析出速度は0.5〜5μm/時間程度である
為に30〜35μmもの厚みを得るためには、長時間め
っきを行う必要がある。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a plating-resistant stain-resistant ink composition. For more information, please see plating-resistant solder resist ink that provides a film with excellent chemical resistance (plating liquid resistance), heat resistance, and adhesion to the board that can be used in the manufacture of printed circuit boards using electroless metal plating (chemical plating). Related to composition〇 [Prior art] Generally, the film thickness of the conductor circuit of a printed circuit board is 30 to 3
511m is required. Furthermore, this conductor circuit tensile strength 2
1 requires 9/- or more. Electroless metal plating that satisfies this requirement can generally only be obtained in a strong alkaline bath with a pH of 12 to 130 (60 to 80°C), and the deposition rate of electroless plating is approximately 0.5 to 5 μm/hour. Therefore, in order to obtain a thickness of 30 to 35 μm, it is necessary to conduct plating for a long time.
従ってこのような回路基板に導体回路を形成するに際し
て、回路保■用に用Aるレジスト膜は高温の強アルカリ
めっき液に長時間耐えられることを要する。かつ、基板
に対する印刷性が良好で、基板と導体との密着性も良好
で更に半田付は温度に耐える取扱いが容易でなければな
らない。Therefore, when forming a conductor circuit on such a circuit board, the resist film used for circuit protection must be able to withstand high temperature strong alkaline plating solution for a long time. In addition, it must have good printability on the board, good adhesion between the board and the conductor, and must be able to withstand temperature and be easy to handle when soldering.
従来より、導体回路を保護するレジスト皮膜は種々知ら
れているが、上記諸点を満足すると共に、使用し易い一
夜型のソルダレジストインクに適したエポキシ樹脂組成
物は開発されて込なかった。Various resist films for protecting conductor circuits have been known in the past, but an epoxy resin composition that satisfies the above points and is suitable for use as an easy-to-use overnight solder resist ink has not yet been developed.
即ち、従来の耐メツキソルダレジストは主剤、硬化剤か
らなる2液型が大部分であり、−成型のソルダレジスト
ではハンダ耐熱性等を十分満足する本のは知られていな
hのが現状である。In other words, most conventional solder resists are two-component, consisting of a base agent and a hardening agent, and currently there is no known molded solder resist that fully satisfies soldering heat resistance, etc. be.
本発明の目的は無電解金属メッキ液に長時間浸漬しても
レジスト皮膜が溶媒に溶けたり白化したすせず、きれつ
も生じず、膨潤せず、かつ基材及び導体との密着性に優
れ、且つ耐熱性が良好で、半田付は作業にも十分耐え高
温での熱劣化の少す一夜型のソルダレジスト用のインク
組成物を提供することにある。The purpose of the present invention is to prevent the resist film from dissolving in the solvent, whitening, sagging, cracking, or swelling even when immersed in an electroless metal plating solution for a long time, and to have excellent adhesion to base materials and conductors. The object of the present invention is to provide an ink composition for an overnight solder resist that has good heat resistance, can withstand soldering work well, and has little thermal deterioration at high temperatures.
即ち、従来は、例えば銅張り積層基板にエツチング法で
導体パターンを形成し、これをソルダレジストインク皮
膜で保護し、スルーホール部のみを無電解めっきで作る
セミアディティブ法によるプリント回路板製造プロセス
では、スルーホールにつながっている導体パターン上の
レジスト膜に密着不良が生じ、半田付は作業時にこの部
分がふくれとなるケースが大半である。これは前述の如
く高温強アルカリ性の無電解めっき液に長時間浸漬する
為、レジスト膜を通して水分が浸入し、レジスト膜と導
体間の接着強度を低下させるためである。又、耐熱性が
十分でないと、長時間熱処理を行うと皮膜が脆くなり、
塗膜のふくれ、はくりが生じる。In other words, in the conventional printed circuit board manufacturing process, for example, a semi-additive method was used in which a conductor pattern was formed on a copper-clad laminate board by etching, this was protected with a solder resist ink film, and only the through-holes were formed by electroless plating. In most cases, poor adhesion occurs in the resist film on the conductor pattern connected to the through-hole, and this area bulges during soldering. This is because, as mentioned above, since the resist film is immersed in a high-temperature, strongly alkaline electroless plating solution for a long time, moisture enters through the resist film, reducing the adhesive strength between the resist film and the conductor. Also, if the heat resistance is not sufficient, the film will become brittle if heat treated for a long time.
Blistering or peeling of the paint film occurs.
ここで本発明者等は、種々検討した結果、ドラシノー6
−メチルアミノ−8−)リアジンをとにより上記問題を
解決できることを見出した。As a result of various studies, the inventors of the present invention have determined that Dracino 6
It has been found that the above problem can be solved by using -methylamino-8-) riazine.
即ち、本発明は、前記(司のエポキシ化合物100重量
部に対し、(ロ)の2.4−ジヒドラジノ−6−メチル
アミノ−s−トリフ9フ5〜35重量物、(/→充てん
材は3〜40重量部、に)揺変剤はO,S〜10重量部
の割合であることを特徴とする一夜型の耐メツキソルダ
レジストインク組成物を提供するものである。That is, the present invention provides 100 parts by weight of the epoxy compound (2), 5 to 35 parts by weight of 2,4-dihydrazino-6-methylamino-s-trifle (2), (/→ filler) 3 to 40 parts by weight, and) the thixotropic agent is in a proportion of O, S to 10 parts by weight.
本発明に用Aられる(イ)エポキシ化合物としては平均
して1分子当り2個以上のエポキシ基を有する常温で液
状の化合物例えばビスフェノールA。The epoxy compound (A) used in the present invention is a compound having an average of two or more epoxy groups per molecule and is liquid at room temperature, such as bisphenol A.
ビスフェノールFなどの多価アルコールとエピクロルヒ
ドリンとを塩基性触媒の存在下で反応させて得られるポ
リグリシジルエーテルなどを用いることができる。Polyglycidyl ether obtained by reacting a polyhydric alcohol such as bisphenol F with epichlorohydrin in the presence of a basic catalyst can be used.
本発明の(ロ)で用いられる2、4−ジヒドラジノ−6
−メチルアミノ−S−)リアジンは下記の構造であり
肖−(lis
必要に応じ硬化促進剤を併用することもできる。2,4-dihydrazino-6 used in (b) of the present invention
-Methylamino-S-) lyazine has the following structure and a curing accelerator can be used in combination if necessary.
硬化促進剤としては例えば第4級アンモニウム塩、第4
級ホスホニウム塩、アミン化合物等が挙げられる。硬化
剤である2、4−ジヒドロキシ−6−メチルアミノ−8
−トリアジンはエポキシ化合物100’ii1部に対し
5〜35重量部、好ましくは15〜25重量部用いられ
る。5重量部未満では硬化が不十分であり、35重量部
より多いと塗膜性能が低下し好ましくない@
本発明で用いるP→の充てん材には、例えばタルク、マ
イカ、アルミナ、硫酸バリウム、水酸化アルミニウム、
シリカ、TiO!などの無キ質の粉末である。充てん剤
の使用量は前記のエポキシ化合物100重量部に対して
3〜40重量部添加する。Examples of curing accelerators include quaternary ammonium salts, quaternary
Examples include class phosphonium salts, amine compounds, and the like. 2,4-dihydroxy-6-methylamino-8 which is a curing agent
- Triazine is used in an amount of 5 to 35 parts by weight, preferably 15 to 25 parts by weight, per 1 part of epoxy compound 100'ii. If it is less than 5 parts by weight, curing will be insufficient, and if it is more than 35 parts by weight, the coating performance will deteriorate, which is undesirable. Aluminum oxide,
Silica, TiO! It is a solid powder such as. The amount of filler used is 3 to 40 parts by weight per 100 parts by weight of the epoxy compound.
40重量部より多いと塗膜形成性が悪く、また3重量部
より少いと特性向上の効果がないからである。充てん材
の平均粒子径は0.5〜10μm程度のものが好ましい
。This is because when the amount is more than 40 parts by weight, the coating film forming properties are poor, and when it is less than 3 parts by weight, there is no effect of improving the properties. The average particle diameter of the filler is preferably about 0.5 to 10 μm.
尚、充てん材はソルダレジストインキの印刷性を向上さ
せかつ、硬化したソルダレジスト類の機械的特性を高め
る役目をする。Note that the filler serves to improve the printability of the solder resist ink and to improve the mechanical properties of the cured solder resist.
()→の揺変剤はスクリーン印刷性向上の目的で例えは
粒径0.1μm以下の超微粉末シリカ等を用いへ郷変剤
はエポキシ化合物100重量部に対し0.5〜10重量
部用いられる。揺変剤量がこの範囲を外れるとインキの
スクリーン印刷性が低下し実用に供しえない。The thixotropic agent ()→ is 0.5 to 10 parts by weight per 100 parts by weight of the epoxy compound. used. If the amount of thixotropic agent is outside this range, the screen printability of the ink will deteriorate and it cannot be put to practical use.
本発明の組成物は、本発明の主旨をそこなわな(八限り
、必要に応じ公知の各種添加剤を加えるととができる。The composition of the present invention may be modified by adding various known additives as necessary, without detracting from the spirit of the present invention.
例えば、硬化促進剤、レベリング剤、沈降防止剤、カッ
プリング剤、モノエポキシ化合物、着色剤、顔料、消泡
剤、密着性付与剤、沸点が100℃以上の有キ溶媒等の
添加物を挙げることができる。Examples include additives such as curing accelerators, leveling agents, anti-settling agents, coupling agents, monoepoxy compounds, colorants, pigments, antifoaming agents, adhesion agents, and solid solvents with a boiling point of 100°C or higher. be able to.
本発明の組成物を前述の主成分と添加成分を加え、三本
ロール等で十分混合して製造される。The composition of the present invention is produced by adding the above-mentioned main components and additional components and thoroughly mixing the composition with a triple roll or the like.
以下本発明をその実施例により詳細に説明する。 Hereinafter, the present invention will be explained in detail with reference to examples thereof.
斗
実施例1〜3及び比較例1〜−
@1表に示した配合組成を十分予備混練した後セラミッ
ク三本ロールで3回通しを行いフルダレホールポリイミ
ド基板上にスクリーン印刷機を用いて膜厚が約25μm
になるように塗布し、180℃で8時間加熱硬化を行っ
て保護膜を銅張りプリント配線基板上に設けた。これを
供試体として火中に塗布基板を20時間浸漬後、
基板をめっき液から取出し水洗し、
90℃で30分乾燥する。レジス
ト膜の表面を顕微鏡で観察した。Examples 1 to 3 and Comparative Examples 1 to -@1 The compositions shown in the table were sufficiently pre-kneaded, passed through three times with a ceramic triple roll, and formed into a film on a full Darrehole polyimide substrate using a screen printing machine. Thickness is approximately 25μm
The protective film was coated on the copper-clad printed wiring board by applying the coating so as to give a protective film and curing by heating at 180° C. for 8 hours. Using this as a test piece, the coated substrate was immersed in a fire for 20 hours, then removed from the plating solution, washed with water, and dried at 90°C for 30 minutes. The surface of the resist film was observed using a microscope.
O・・・塗膜の異状なし
×・・・塗膜の白化溶解、ふくれ
密 着 性:乾燥した塗膜のゴバン目密着テストを行
った。O: No abnormality in the paint film. ×: Whitening, dissolution, and blistering of the paint film. Adhesion: The dried paint film was subjected to an interstitial adhesion test.
耐はんだ性:乾燥した塗膜を260℃の溶融はんだに1
分間浸漬し塗膜の状態に
ついて判定した。Solder resistance: Dry coating film is molten solder at 260℃ 1
It was immersed for a minute and the condition of the coating film was evaluated.
0・・・塗膜の外観異状なし
×・・・塗膜のはぐりふくれ、溶融
熱劣化テス):230℃の乾燥6中で72時間エージン
グ後の塗膜の状態及び密着
性を評価した。0: No abnormality in the appearance of the coating film ×... Peeling of the coating film, melting heat deterioration test): The condition and adhesion of the coating film after aging in Drying 6 at 230° C. for 72 hours was evaluated.
○・・・異状なし
×・・・塗膜のふ〈ルはくり
C以下余白)
表1
*1 油化シェルエポキシ社gg−szs*2 2.4
−ジヒドラジノ−6−メチルアミノ−S−)リアジン
*3 2t4−ジアミノ−6(2′−メチルイミダゾー
ルα))エチル−s−トリアジン
*4 龍森社堰 シリカ粉末■■平均粒径 IPm*5
日本アエロジル製、超微粉末シリカ、アエロジル20
0 平均粒径 12さん○...No abnormality ×...Full of coating film (margin below peeling C) Table 1 *1 Yuka Shell Epoxy Co., Ltd. gg-szs*2 2.4
-dihydrazino-6-methylamino-S-) riazine*3 2t4-diamino-6(2'-methylimidazole α))ethyl-s-triazine*4 Tatsumorisha Seki Silica powder■■Average particle size IPm*5
Made by Nippon Aerosil, ultrafine powder silica, Aerosil 20
0 Average particle size 12
Claims (1)
(イ)エポキシ化合物 (ロ)2、4−ジヒドラジノ−6−メチルアミノ−S−
トリアジン (ハ)充てん材 (ニ)揺変剤 かつ、前記(イ)のエポキシ化合物100重量部に対し
、(ロ)の2、4−ジヒドラジノ−6−メチルアミノ−
S−トリアジンは5〜35重量部、 (ハ)充てん材は3〜40重量部、 (ニ)揺変剤は0.5〜10重量部の割合であることを
特徴とする耐メッキソルダレジストインク組成物。[Scope of Claims] Containing the following components (a), (b), (c), and (d),
(a) Epoxy compound (b) 2,4-dihydrazino-6-methylamino-S-
triazine (c) filler (d) thixotropic agent and (b) 2,4-dihydrazino-6-methylamino- to 100 parts by weight of the epoxy compound (a);
A plating-resistant solder resist ink characterized in that the proportion of S-triazine is 5 to 35 parts by weight, (c) the filler is 3 to 40 parts by weight, and (d) the thixotropic agent is 0.5 to 10 parts by weight. Composition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62051732A JPS63218776A (en) | 1987-03-06 | 1987-03-06 | Metx resistant solder resist ink composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62051732A JPS63218776A (en) | 1987-03-06 | 1987-03-06 | Metx resistant solder resist ink composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63218776A true JPS63218776A (en) | 1988-09-12 |
Family
ID=12895069
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62051732A Pending JPS63218776A (en) | 1987-03-06 | 1987-03-06 | Metx resistant solder resist ink composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63218776A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006004788B4 (en) | 2005-02-03 | 2020-07-09 | Fuji Electric Co., Ltd. | Semiconductor device and manufacturing process for this |
-
1987
- 1987-03-06 JP JP62051732A patent/JPS63218776A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006004788B4 (en) | 2005-02-03 | 2020-07-09 | Fuji Electric Co., Ltd. | Semiconductor device and manufacturing process for this |
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