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JPS63210100A - Production of single-domain lithium tantalate single crystal - Google Patents

Production of single-domain lithium tantalate single crystal

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Publication number
JPS63210100A
JPS63210100A JP62044472A JP4447287A JPS63210100A JP S63210100 A JPS63210100 A JP S63210100A JP 62044472 A JP62044472 A JP 62044472A JP 4447287 A JP4447287 A JP 4447287A JP S63210100 A JPS63210100 A JP S63210100A
Authority
JP
Japan
Prior art keywords
crystal
domain
lithium tantalate
single crystal
partial pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62044472A
Other languages
Japanese (ja)
Other versions
JPH0637350B2 (en
Inventor
Fumio Nitanda
二反田 文雄
Shuji Katayama
片山 秀志
Norihisa Abiko
安孫子 則久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP62044472A priority Critical patent/JPH0637350B2/en
Publication of JPS63210100A publication Critical patent/JPS63210100A/en
Publication of JPH0637350B2 publication Critical patent/JPH0637350B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Inorganic Insulating Materials (AREA)

Abstract

PURPOSE:To remarkably improve the quality of the title crystal without oxygen deficiency and strained parts by heat-treating the crystal grown by the Czochralski method at specified oxygen partial pressure and temp., cutting both ends of the crystal, and then forming a single domain in the crystal. CONSTITUTION:A lithium tantalate single crystal is grown in the atmosphere having <=10% oxygen partial pressure by using the Czochralski method. The single crystal is heat-treated at 900-1,200 deg.C for >=5hr in the atmosphere having >=20% oxygen partial pressure. Both ends of the heat-treated single crystal are cut, and then a single domain is formed in the crystal.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は弾性表面波素子、焦電素子さらに光学素子とし
て用いられる単分域タンタル酸リチウム単結晶の製造方
法に関するものであり、とりわけ均質な単結晶を高歩留
りで製造する方法に関するものである。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a method for producing single-domain lithium tantalate single crystals used as surface acoustic wave devices, pyroelectric devices, and optical devices. The present invention relates to a method for producing single crystals with high yield.

〔従来の技術〕[Conventional technology]

タンタル酸リチウム単結晶は融点が約1630℃と高い
ために、使用できるルツボも一般にはイリジウムや白金
−ロジウム合金製のものに限られている。このうちイリ
ジウムは高温で酸化しやすいために、不活性ガス中で使
用される。白金−ロジウム合金には酸化の問題はないが
、結晶中へのロジウムの混入を防ぐために特公昭57−
44202にあるように不活性ガス中で使用されること
が多い。このためいずれのルツボを使う場合でも、酸素
欠陥の発生が避けられなかった。この欠陥を低減するた
めに、特開昭59−69490および特開昭55−42
238にあるように不活性ガスに少量の酸素を含ませた
混合ガス雰囲気で育成する方法も提案されているが、必
ずしもその効果は十分ではなかった。
Since the lithium tantalate single crystal has a high melting point of about 1630° C., the crucibles that can be used are generally limited to those made of iridium or platinum-rhodium alloy. Among these, iridium is easily oxidized at high temperatures, so it is used in an inert gas atmosphere. Platinum-rhodium alloys do not have any oxidation problems, but in order to prevent rhodium from being mixed into the crystal,
44202, is often used in an inert gas atmosphere. For this reason, no matter which crucible is used, the occurrence of oxygen defects is unavoidable. In order to reduce this defect, Japanese Patent Application Laid-Open Nos. 59-69490 and 55-42
238, a method of growing in a mixed gas atmosphere containing an inert gas and a small amount of oxygen has been proposed, but the effect was not necessarily sufficient.

一方、単分域化処理についても、特公昭59−3248
3のように引き上げた形状のままで単分域化する方法、
特開昭57−140400のように粉末に埋め込んで単
分域化する方法、特開昭61−141699のように育
成後に両端を加工して内部を検査した後に単分域化する
方法など多くの方法が提案され°ζいるが、いずれも十
分な熱処理を施さないままに単分域化しようとすると、
単分域化処理中に結晶に表面クランクがはいったり、ま
た歪を内在したまま単分域化するために結晶全体が均一
に単分域化されず、単分域化処理中、もしくは処理後の
加工工程でクランクがはいるなどの問題があった。これ
らの問題を解決するために、特開昭57−67100の
ように熱処理と単分域化処理とを兼ねる方法や、特公昭
58−48519のように単分域化処理後に熱処理を行
う方法も提案されたが、いずれにせよ内部歪が十分に除
去されないままに単分域化処理を行うために、その効果
は十分ではなかった。
On the other hand, regarding single-area processing,
How to make it into a single domain while maintaining the raised shape as shown in 3.
There are many methods, such as a method of embedding it in powder to form a single domain as in JP-A-57-140400, a method of processing both ends after growing and inspecting the inside, and then forming a single-domain as in JP-A-61-141699. There are several methods proposed, but if you try to make it into a single domain without applying sufficient heat treatment,
During the single-domain processing, the crystal may have a surface crank, or because the crystal is made into a single-domain with inherent distortion, the entire crystal is not uniformly made into a single-domain, and this may occur during or after the single-domain processing. There were problems such as the crank fitting during the machining process. In order to solve these problems, there are methods that combine heat treatment and single-segment processing as in JP-A-57-67100, and methods that perform heat treatment after single-sector processing as in JP-A-58-48519. However, the effect was not sufficient because single-domain processing was performed without sufficiently removing internal distortions.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

以上述べたように、従来技術においては■ 育成中の雰
囲気に起因した酸素欠陥を除去することが難しいために
、着色や内部歪などのため、当該結晶を加工し種々の素
子、を作成した場合に、その素子の性能や信顛性がtf
lねれること、■ 歪を内在したまま単分域化しようと
するために当該結晶にクランクが発生しやすく、また全
体にわたって均一・なjii分域化が困難であること、
の二つの問題点があった。
As mentioned above, in the conventional technology, ■ Because it is difficult to remove oxygen defects caused by the atmosphere during growth, coloring and internal distortions occur, when processing the crystal to create various devices. The performance and reliability of the device is tf.
■ Crank tends to occur in the crystal because it is attempted to make it into a single domain while the strain is still present, and it is difficult to make it into a single domain uniformly throughout the crystal.
There were two problems.

本発明の目的は、この二つの問題点を同時に解決するた
めに最適な処理工程を提供し、とりわけ熱処理工程にお
いては最適条件をも提供し、もって均一な単分域タンタ
ル酸リチウム単結晶を歩留りよく製造する方法を提供す
ることにある。
The purpose of the present invention is to provide an optimal treatment process to simultaneously solve these two problems, and in particular to provide optimal conditions for the heat treatment process, thereby increasing the yield of uniform single-domain lithium tantalate single crystals. The purpose is to provide a method for manufacturing well.

〔問題点を解決するための手段〕[Means for solving problems]

本発明の特徴は、単分域化処理に先立ち、あらかじめ熱
処理と結晶の両端切断をおこなうことにある。熱処理は
、酸素分圧20%以上の雰囲気で、温度900℃以上1
200℃以下で、5時間以上おこなうことにより、酸素
欠陥にもとすく着色の除去、さらに内部歪の緩和に効果
があった。温度が900℃未満では、酸素の拡散がおこ
なわれず、上記効果はあられれなかった。逆に1200
℃を超える高温では、結晶に表面クランクがはいる場合
があった。
A feature of the present invention is that, prior to the single-domain treatment, heat treatment and cutting of both ends of the crystal are performed in advance. Heat treatment is performed at a temperature of 900°C or higher in an atmosphere with an oxygen partial pressure of 20% or higher.
By performing the heating at 200° C. or lower for 5 hours or more, it was effective in reducing oxygen defects, removing coloring, and alleviating internal strain. When the temperature was less than 900° C., oxygen did not diffuse and the above effect could not be achieved. On the other hand, 1200
At high temperatures exceeding ℃, surface cranks were sometimes formed in the crystals.

このため900℃以上1200℃以下、より望ましくは
1000℃から1150℃の範囲が熱処理温度として最
適である。結晶の両端切断は、結晶のなかでもっとも歪
の蓄積されている部分を取り除いておくという意味で重
要である。結晶の上端は、育成中、結晶直径を急激に増
大させたために強く歪んでおり、また結晶下端は、育成
終了時の融液と結晶との切り翻し時に大きな温度変化を
受けている。こうした強い歪は熱処理で除去することは
できず、この歪を内在したまま単分域処理を行うと、単
分域処理中に、この歪んだ部分からクランクが発生し、
結晶全体へとクラックが拡大する場合があった。このた
め、単分域化処理の前に結晶の両端を切断するようにし
たところ、単分域化処理でのクラックの発生はまったく
無くなった。
Therefore, the optimal heat treatment temperature is 900°C or more and 1200°C or less, more preferably 1000°C to 1150°C. Cutting both ends of the crystal is important in the sense that it removes the part of the crystal where the strain is most accumulated. The upper end of the crystal is strongly distorted due to the rapid increase in crystal diameter during growth, and the lower end of the crystal is subjected to large temperature changes when the melt and crystal are switched at the end of growth. Such strong distortion cannot be removed by heat treatment, and if single-domain processing is performed with this distortion still present, cranks will occur from this distorted part during single-domain processing.
In some cases, cracks spread to the entire crystal. For this reason, when both ends of the crystal were cut before the single-domain processing, the occurrence of cracks in the single-domain processing completely disappeared.

以上を要約すると、単分域化処理に先立ち、■酸素分圧
20%以上、温度900℃以上1200℃以下で5時間
以上の熱処理をおこない、■熱処理後に結晶の両端を切
断する、という2つの操作をおこなうことにより、均一
な単分域タンタル酸リチウム単結晶を歩留りよく製造す
ることができるようになった。
To summarize the above, prior to the single-domain treatment, there are two steps: (1) heat treatment at an oxygen partial pressure of 20% or more and a temperature of 900°C or more and 1200°C or less for more than 5 hours, and (2) cutting both ends of the crystal after the heat treatment. Through these operations, it became possible to produce uniform single-domain lithium tantalate single crystals with a high yield.

〔実施例〕〔Example〕

以下、具体例に沿って、本発明の詳細な説明する。 Hereinafter, the present invention will be described in detail with reference to specific examples.

実施例1 直径150−■のイリジウム製ルツボを用い、直径85
龍×長さ120amのタンタル酸リチウム単結晶をX軸
方向に引き上げた。育成中および冷却中の炉内にはチッ
素ガスを毎分101の割合で流した。育成した結晶は濃
い茶色に着色していた。
Example 1 Using an iridium crucible with a diameter of 150 mm,
A lithium tantalate single crystal with a length of 120 am was pulled in the X-axis direction. Nitrogen gas was flowed into the furnace at a rate of 101/min during growth and cooling. The grown crystals were colored dark brown.

この結晶を2分割し、上半分はそのまま単分域化処理を
おこない、下半分は熱処理してから単分域化処理をおこ
なうこととした。
This crystal was divided into two parts, and the upper half was subjected to single-domain processing as it is, and the lower half was heat-treated and then subjected to single-domain processing.

上半分について、Z軸方向の結晶の両側面に電極を形成
し、結晶を700℃まで加熱して両電極間に直流電圧を
印加し、そのまま冷却するという通常の手法で単分域化
処理をおこなった。単分域処理後、結晶の上端に数本の
表面クラックが生じていたが、この表面クラックは、内
部観察の目的で結晶上端を切り落とす途中で、結晶内部
にまで拡大した。結晶は部分的に着色が薄まり、濃淡の
ムラができていた。この結晶から2面を切り出し、エツ
チングによって調べたところ、単分域化されていること
は確認された。しかしながら、第1図−aに示すように
多くのエッチピットが存在し、結晶に歪が残っているこ
とがわかった。
For the upper half, single-domain processing was performed using the usual method of forming electrodes on both sides of the crystal in the Z-axis direction, heating the crystal to 700 °C, applying a DC voltage between both electrodes, and then cooling it. I did it. After the single-domain treatment, several surface cracks were observed at the top of the crystal, but these surface cracks expanded into the interior of the crystal during the process of cutting off the top of the crystal for the purpose of internal observation. The coloring of the crystals had faded in some areas, and the shading was uneven. When two faces were cut out from this crystal and examined by etching, it was confirmed that they were made into a single domain. However, as shown in FIG. 1-a, it was found that many etch pits were present and distortion remained in the crystal.

残った下半分は、大気中で1100℃で8時間、箱型電
気炉で熱処理した。熱処理はアルミナトレー上にタンタ
ル酸リチウムの粉末を敷き、その上に結晶を置いておこ
なった。熱処理後、結晶下端を切断し、両端を鏡面研摩
して内部の着色を調べたところ、わずかに不透明ではあ
るが、無色になったことを確認した。また今回は、結晶
下端切断時においても、ま2つたくクランクの発生はな
かった。
The remaining lower half was heat treated in the air at 1100° C. for 8 hours in a box electric furnace. Heat treatment was performed by placing lithium tantalate powder on an alumina tray and placing the crystals on top of it. After heat treatment, the lower end of the crystal was cut off, both ends were polished to a mirror finish, and the internal coloring was examined. It was confirmed that the crystal was colorless, although it was slightly opaque. In addition, this time, even when cutting the lower end of the crystal, there was no occurrence of two or more cranks.

次に、結晶上半分と同じ条件で、結晶下半分の単分域化
処理を行った。単分域化処理後の結晶を調べたところ、
無色のままであり、また単分域処理前の不透明感は消え
、完全な無色蓬明となっていた。また上半分と同様に2
面を切り出しエツチングしたところ、単分域化されてお
り、また第1図−bに示すように、エッチピント密度も
低く、歪が緩和されていることがわかった。
Next, the lower half of the crystal was subjected to a single domain treatment under the same conditions as the upper half of the crystal. When we examined the crystals after single-domain treatment, we found that
It remained colorless, and the opacity before the single-domain treatment disappeared, and it became completely colorless and transparent. Also, like the upper half, 2
When the surface was cut out and etched, it was found that it was formed into a single domain, and as shown in FIG. 1-b, the etch focus density was low and the distortion was relaxed.

実施例2 直径150關のイリジウムルツボを用い、直径85關×
長さ120關のタンタル酸リチウム単結晶を、36°回
転Y方向に引き上げた。育成中および冷却中は、炉内に
は酸素分圧が3%になるよう、酸素とチッ素の混合ガス
を毎分101の割合で流した。育成した結晶は、黄色味
を帯びていた。
Example 2 Using an iridium crucible with a diameter of 150 mm, a diameter of 85 mm x
A lithium tantalate single crystal with a length of 120 degrees was pulled up in the Y direction with a rotation of 36 degrees. During growth and cooling, a mixed gas of oxygen and nitrogen was flowed into the furnace at a rate of 101/min so that the oxygen partial pressure was 3%. The grown crystals were yellowish.

この結晶を大気中で、1100℃で5時間熱処理した後
に、結晶両端を切断した。切断時のクラックの発生はま
ったくなかった。次に結晶の上下端に電極を形成し、7
00℃まで加熱して、両電極の間に直流電圧をかけ、そ
のまま室温まで冷却することで単分域化処理を行った。
After this crystal was heat treated at 1100° C. for 5 hours in the air, both ends of the crystal were cut. No cracks occurred at all during cutting. Next, electrodes are formed on the top and bottom ends of the crystal, and
Single domain processing was performed by heating to 00°C, applying a DC voltage between both electrodes, and cooling to room temperature.

単分域化処理段階でのクランクの発生もなかった。この
結晶を直径75m1、厚さ0.35 m鳳のウェーハに
カロエし、10枚に1枚の割合でウェーハの着色検査、
直交偏光による歪検査、およびエツチング検査をおこな
ったところ、単分域化が結晶全体にわたりおこなわれて
いること、着色および着色むらのないこと、局所的歪が
存在しないことを確認した。
No cranking occurred during the single-area processing stage. These crystals are processed into wafers with a diameter of 75 m1 and a thickness of 0.35 m, and each wafer is inspected for coloring at a rate of 1 in 10.
A strain test using orthogonal polarized light and an etching test confirmed that single domain formation was performed over the entire crystal, that there was no coloring or uneven coloring, and that there was no local strain.

〔発明の効果〕〔Effect of the invention〕

以上述べたように、本発明によれば、単分域化処理以前
に酸素欠陥を除去し、かつ強く歪んだ結晶の両端を切断
するために、■途中工程での結晶のクランクが無くなり
、■無色透明な結晶が得られ、■部分的に多分域あるい
は逆方向の分域が残ることなく均一な単分域化が可能と
なり、■直交偏光のもとで検知される局所的歪が無くな
り、■エッチピット密度も低くなるなど、結晶品質を大
rlに向上せしめることができた。
As described above, according to the present invention, in order to remove oxygen defects and cut both ends of a strongly distorted crystal before the single-domain treatment, (1) cranking of the crystal during an intermediate process is eliminated; A colorless and transparent crystal is obtained; ■ Uniform single-domain formation is possible without remaining partially multi-domain or opposite-direction domains; ■ Local distortion detected under orthogonal polarization is eliminated; ■Etch pit density was also lowered, and crystal quality was greatly improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、実施例1で述べた単分域処理後のタンタル酸
リチウム単結晶の結晶構造写真である。 aに、熱処理を施さなかった場合、bに熱処理を施した
後に単分域化処理をおこなった場合を示す。 手続補正書
FIG. 1 is a photograph of the crystal structure of a lithium tantalate single crystal after the single-domain treatment described in Example 1. A shows the case where no heat treatment was performed, and b shows the case where the single domain processing was performed after heat treatment. Procedural amendment

Claims (1)

【特許請求の範囲】[Claims]  チョクラルスキー法で、酸素分圧10%以下の雰囲気
で育成したタンタル酸リチウム単結晶を、酸素分圧20
%以上の雰囲気で900℃以上1200℃以下の温度で
5時間以上熱処理する工程と、熱処理した単結晶の両端
を切断加工した後に単分域化することを特徴とする単分
域タンタル酸リチウム単結晶の製造方法。
A lithium tantalate single crystal grown using the Czochralski method in an atmosphere with an oxygen partial pressure of 10% or less is grown at an oxygen partial pressure of 20% or less.
% or more at a temperature of 900°C to 1200°C for 5 hours or more, and cutting both ends of the heat-treated single crystal to form a single domain. Method of manufacturing crystals.
JP62044472A 1987-02-27 1987-02-27 Method for producing single-domain lithium tantalate single crystal Expired - Lifetime JPH0637350B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62044472A JPH0637350B2 (en) 1987-02-27 1987-02-27 Method for producing single-domain lithium tantalate single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62044472A JPH0637350B2 (en) 1987-02-27 1987-02-27 Method for producing single-domain lithium tantalate single crystal

Publications (2)

Publication Number Publication Date
JPS63210100A true JPS63210100A (en) 1988-08-31
JPH0637350B2 JPH0637350B2 (en) 1994-05-18

Family

ID=12692457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62044472A Expired - Lifetime JPH0637350B2 (en) 1987-02-27 1987-02-27 Method for producing single-domain lithium tantalate single crystal

Country Status (1)

Country Link
JP (1) JPH0637350B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0767396A3 (en) * 1995-09-20 1997-05-21 Mitsubishi Materials Corporation Single-crystal lithium tetraborate and method making the same, optical converting method and converter device using the single-crystal lithium tetraborate, and optical apparatus using the optical converter device
WO2005038097A1 (en) * 2003-10-16 2005-04-28 Sumitomo Metal Mining Co., Ltd. Lithium tantalate substrate and process for producing the same
CN1332077C (en) * 2003-11-25 2007-08-15 住友金属矿山株式会社 Lithium niobate substrate and manufacturing method thereof
CN100348784C (en) * 2003-10-16 2007-11-14 住友金属矿山株式会社 Lithium tantalate substrate and method for producing same
CN100351436C (en) * 2003-10-16 2007-11-28 住友金属矿山株式会社 Lithium tantalate substrate and method for producing same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0767396A3 (en) * 1995-09-20 1997-05-21 Mitsubishi Materials Corporation Single-crystal lithium tetraborate and method making the same, optical converting method and converter device using the single-crystal lithium tetraborate, and optical apparatus using the optical converter device
WO2005038097A1 (en) * 2003-10-16 2005-04-28 Sumitomo Metal Mining Co., Ltd. Lithium tantalate substrate and process for producing the same
CN100348785C (en) * 2003-10-16 2007-11-14 住友金属矿山株式会社 Lithium tantalate substrate and process for producing the same
CN100348784C (en) * 2003-10-16 2007-11-14 住友金属矿山株式会社 Lithium tantalate substrate and method for producing same
CN100351436C (en) * 2003-10-16 2007-11-28 住友金属矿山株式会社 Lithium tantalate substrate and method for producing same
US7628853B2 (en) 2003-10-16 2009-12-08 Sumitomo Metal Mining Co., Ltd. Lithium tantalate substrate and process for its manufacture
CN1332077C (en) * 2003-11-25 2007-08-15 住友金属矿山株式会社 Lithium niobate substrate and manufacturing method thereof

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