JPS63191103A - Color filter - Google Patents

Abstract

PURPOSE:To reduce the film thickness of a colored resin layer and to improve a display grade, color characteristic, etc., by distributing the pigment particles in the colored resin layer in such a manner that the particles are successively smaller in the film thickness direction from the surface of a substrate. CONSTITUTION:The colored resin layer 62 which is dispersed with the pigments 63a-63c in the resin 62 and in which the pigment particles are dispersed in order of sizes, 63c, 63b, 63a, in the film thickness direction from the surface of the substrate 61 is formed on the substrate 61. Incident light 64 is successively entered into the resin layer by receiving the scattering by scattered light 65 and absorption successively from the upper part. Since the pigment particles are smaller nearer the surface of the colored resin layer 62, the scattering of the incident light is smaller nearer the surface and, therefore, the light transmitted therethrough is correspondingly increased and the light correspondingly absorbed by the pigment particles is eventually increased. The utilizing efficiency of the light is, therefore, larger than heretofore. The absorption efficiency of the pigments is thereby increased and the film thickness is reduced, by which the display grade and color characteristic of the sensor are improved.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a color filter, and particularly to a color filter suitable for fine color separation in color displays, color imaging devices, color sensors, and the like.

[Conventional technology] Conventionally, color filters have been prepared using gelatin, gelatin, etc. on a substrate.
A dyed color filter is known in which a mordant layer made of a wood-loving polymer material such as casein, gris, or polyvinyl alcohol is provided, and the mordant layer is dyed with a dye to form a colored layer.

In such dyeing methods, many dyes can be used, and it is relatively easy to meet the spectral characteristics required for filters, or the mordant layer is placed in a dyeing bath in which the dye is dissolved in the dyeing process of the mordant layer. Wet method 1, which is difficult to control due to immersion
It also has the disadvantage of poor yields because it involves a complicated process of providing an interlayer for resist dyeing for each color. Also, the heat resistance of dyeable pigments1
It is relatively low at around 50°C or less, and if the filter requires thermal treatment, it is difficult to use, and the dyed film itself has disadvantages such as poor reliability such as heat resistance and light resistance. are doing.

On the other hand, color filters using a colored resin in which a certain type of coloring material is dispersed in a transparent resin have been known.

For example, JP-A-58-46325, JP-A-60-
78401, JP 60-184202", JP 60-184203, JP 60-18
As shown in Japanese Patent Application Laid-open No. 4204 and Japanese Patent Application Laid-open No. 184205/1983, these color filters are formed from a colored resin film made by mixing a coloring material with a polyamino resin, so they have excellent heat resistance, It is a useful color filter with excellent properties such as light resistance.

Furthermore, in recent years, in order to simplify the manufacturing process of color filters, color filters using photosensitive coloring materials, such as polyimide resins, have been developed. For example, it is disclosed in JP-A-57-16407, JP-A-57-74707, JP-A-60-129707, and the like.

However, the color filter formed from the colored resin film described above is created by dispersing the pigment in the resin, so the pigment does not dissolve in the resin and the particle size and distribution in the resin are random. Easy to disperse.

Therefore, if more pigments with large particle diameters are distributed in the surface layer of the color filter, there will be more light scattering on the surface layer, and conversely, if more pigments with small particle diameters are distributed in the surface layer, light scattering will be less. The characteristics of the resulting color filter greatly vary depending on the manufacturing lot, which adversely affects the display quality of the display element and the color characteristics of the sensor, making it unsatisfactory as a device.

[Problems to be Solved by the Invention] The purpose of the present invention is to eliminate the drawbacks of the above-mentioned conventional examples, and improve the heat resistance, light resistance, and solvent resistance of color filters by using the conventional colored resin layer. The object of the present invention is to provide an excellent color filter that retains the advantages such as performance, display quality, sensor color characteristics, and less flare.

[Means for Solving the Problems] and [Operations] That is, 1, the present invention uses a colored resin formed by dispersing pigments in the resin, and forms a colored resin layer in a pattern by a printing process or a photolithography process. The color filter is characterized in that the pigment particles in the colored resin layer are distributed so as to become smaller in the thickness direction from the substrate surface.

The color filter of the present invention is a colored resin layer in which a colored resin in which pigments are dispersed is formed into a pattern by a printing process or a photolithography process, and the pigment particles in the colored resin layer are spread from the substrate surface in the film thickness direction. By distributing the particles in decreasing order, the thickness of the colored resin layer can be made thinner than in the past, and display quality, color characteristics, etc. can be improved.

As mentioned earlier, in the colored resin layer, pigments are dispersed in the resin, so when light enters these pigment particles, the light is scattered, and the larger the particles, the more light of the same wavelength , the scattering intensity also increases. Therefore,
Scattering in the resin also varies depending on the size of the pigment particles.

FIG. 6 is an explanatory diagram showing a state in which light is scattered by pigment particles distributed in order of size in a resin. In FIG. 1, pigments 63a to 63c are dispersed in resin 62,
The pigment particles are arranged in order of size in the film thickness direction from the substrate 61 surface.
Colored resin layer (
A color filter) is formed on the substrate 61, and the incident light 64
is scattered light 6 by the pigment particles 63a to 63c in order from the top.
After being scattered and absorbed by 5, the light enters.

As described above, in the color filter of the present invention, since the pigment particles on the surface of the colored resin layer are small, the closer the incident light is to the surface, the smaller the scattering, and therefore the more light is transmitted, and the more light is absorbed by the pigment particles. Since the amount of light that is emitted will inevitably increase, the efficiency of light use will also be greater than in the past.

Therefore, since the absorption efficiency of the pigment is also higher than that of the conventional method, there is an advantage that the film thickness is also thinner.

Further, the size of the pigment particles does not need to be particularly limited, and may be any size used in ordinary color filters, for example, a particle size of 0.2 B or less, preferably 0.1 B or less. The particles may be distributed so as to become smaller in order from the substrate surface in the film thickness direction.

The size of the pigment particles can be evaluated by observing the cross section of the colored resin layer using an optical microscope, 5il1 analysis, or the like.

In the present invention, as a method of reducing the size of pigment particles in the resin in the film thickness direction, several types of colored resin layers with different sizes of pigment particles to be dispersed are prepared, and the colored resin layers with the largest pigment particles are placed on the substrate in the order of the colored resin layers with the largest pigment particles. A method of forming the layer on top is effective.

In addition, the color filter of the present invention has mechanical properties, heat resistance,
Because the colored resin layer is formed using a resin system and pigment that have good durability such as light resistance and solvent resistance, it has excellent reliability characteristics and allows you to easily design excellent color filters. Not only is this possible, but it is also possible to form fine patterns using a simple method using only a general printing process or photolithography process.

The resins forming the colored resin layer of the color filter of the present invention include those that can form a cured film at 300°C or less, such as acrylic resins, polyamino resins (polyimide resins, polyamide resins), epoxy resins, Urethane resins, polycarbonate resins, silicone resins, etc., which do not have specific light absorption characteristics particularly in the visible wavelength range (400 to 700 nm) (light transmittance of about 90% or more) are preferred.

As the acrylic resin, JMC- manufactured by Japan Synthetic Rubber Co., Ltd.
25 and RFC manufactured by Blockbuster Fine Chemicals.

In order to impart photosensitivity to the resin, it is sufficient to have a photosensitive group in the molecule.

The photosensitive group in the present invention may be an aromatic chain having a photosensitive hydrocarbon unsaturated group as shown below.For example, (1) benzoic acid esters (in the formula, R1 is CHX= CY-COO-Z-1X is 1 or -C, H5, Y is -1+ or -CH, 2 is - or ethyl group or glycidyl group) (2) Benzyl acrylates (3) Diphenyl ethers (formula Middle R2 is CHX-CY-CONH-1CH2-CY
-COO-(C)+2) 2-OCO- or CHz-C
(4) Chalcone and other compound chains (in the formula, R1 represents H-, an alkyl group, an alkoxy group), etc. Can be mentioned.

Specific examples of aromatic polyamide resins and polyimide resins having these groups in the molecule include Lithocoat PA-
1000 (manufactured by Ube Industries), Risocoat PI-400 (
(manufactured by Ube Industries, Ltd.).

Generally, photosensitive resins used in photolithography processes vary depending on their chemical structure, but there are few that have excellent durability such as mechanical properties, heat resistance, light resistance, and solvent resistance. On the other hand, the photosensitive polyamino resin of the present invention is a highly durable resin based on its chemical structure, and the color filter formed using it also has very good durability. becomes.

The pigment forming the colored resin layer of the color filter of the present invention is not particularly limited as long as it can obtain desired spectral characteristics among organic pigments, inorganic pigments, etc. In this case, each material can be used alone or as a mixture of some of these materials. Moreover, organic pigments are preferable in view of the color characteristics and various performances of the color filter.

Organic pigments include azo pigments such as soluble azo, insoluble azo, condensed azo, phthalocyanine pigments,
and fused polycyclic pigments including indigo, anthraquinone, perylene, perinone, dioxazine, quinacridone, isoindolinone, phthalone, methine/azomethine, and other metal complex systems, or any number of these. A mixture of these is used.

In the present invention, the colored resin used to form the colored resin layer is, for example, the pigment having the desired spectral characteristics added to the photosensitive polyamino resin solution.
The particles are mixed at a ratio of about 50%, thoroughly dispersed using ultrasonic waves or triple rolls, and then filtered to remove large particles.

The colored resin layer of the color filter of the present invention is formed by applying the colored resin onto a substrate using a coating device such as a spinner or a roll coater, and forming a pattern through a photolithography process, and the layer thickness is determined by desired spectral characteristics. It is determined depending on the situation, usually about 0.5 to 5 μm, preferably,
About 1 to 2 pots is desirable.

The colored resin layer of the color filter of the present invention is itself made of a good material with sufficient durability, but in particular, in order to protect the colored resin layer from various environmental conditions, 1. On the surface of the colored resin layer, polyamide,
Organic resins such as polyimide, polyurethane, polycarbonate, silicone, and 513N4.5i02. SiO,
Spin code inorganic films such as ARt03+ Taz03,
It can be provided as a protective layer by a roll coating method or by a vapor deposition method. Further, depending on the material, after forming the protective layer, an alignment treatment may be performed, thereby making it possible to apply the protective layer to devices using liquid crystal.

A color filter having a colored resin layer as described above can be formed on a suitable substrate.For example, a glass plate, a transparent resin plate, a resin film, a cathode ray tube display surface, a light receiving surface of an image pickup tube, a CCD, a BBD. , C.I.D.
, wafers on which solid-state image sensing devices such as BASIS are formed, liquid crystal display surfaces of contact type image sensors using thin film semiconductors, photoreceptors for color electrophotography, substrates for electrochromy (EC) display devices, etc. .

If it is necessary to further increase the adhesion between the colored resin layer and the underlying substrate, either apply a thin layer of silane coupling agent or the like on the substrate and then form a colored resin pattern, or It is even more effective to form a color filter using a color filter to which a small amount of a silane coupling agent or the like is added.

Hereinafter, a typical method for forming a color filter of the present invention will be described with reference to the drawings.

FIG. 1 is a process diagram illustrating a method for forming a color filter using a photosensitive colored resin of the present invention. First, Figure 1 (a
), using a polyamino resin solution (NMP solution) containing a predetermined amount of pigment with desired spectral characteristics,
A colored resin film 2 of the first color is coated onto a predetermined substrate 1 using a spinner to a predetermined film thickness, and prebaked under appropriate temperature conditions. Next, Figure 1 (b
), the colored resin film is exposed to light having the sensitivity of the photosensitive colored resin (for example, a high-pressure mercury lamp, etc.) through a photomask 3 having a predetermined pattern shape corresponding to the pattern to be formed, Photocure the pattern section.

Then, as shown in FIG. 1(C), the colored resin film 2 having the photocured portion 2a is dissolved in a solvent (for example, one containing N-methyl-2-pyrrolidone-based solvent as a main component) that dissolves only the unexposed portion. After ultrasonic development, rinsing treatment (for example, 1
,1,1. )-lichloroethane etc.). Then,
By performing a boss baking process, a patterned colored resin layer 4 of the present invention as shown in FIG. 1(d) can be obtained.

In addition, when forming the color filter of the present invention consisting of two or more colors, if necessary, that is, depending on the number of colors of the filter to be used, from FIG.
The steps up to Figure 1(d) are repeated using colored resin liquids in which pigments corresponding to each color are dispersed.1 For example, patterned colored resin layers of different colors as shown in Figure 1(e) A color filter consisting of three colors of 4°5 and 6 can be formed.

Further, the color filter of the present invention may have a protective layer 7 formed from the above-mentioned materials on the top of the filter, as shown in FIG. 1(f).

[Example code] Examples of the present invention are shown below.

Example 1 A blue colored resin material [Heliogen Blue] capable of obtaining desired spectral characteristics was deposited on a glass substrate.
Blue) L7080 (Product name, manufactured by BASF.

C, i No. 74160) in PA-1000 (trade name, manufactured by Ube Industries, Ltd., polymer content 10%, solvent = N-methyl-2-pyrrolidone) in a pigment:bolimer = 1 = 2 ratio, and the size of the pigment particles diameter) is 0.08μL D,
Three types of photosensitive colored resin materials prepared by dispersing 0.05 μLm, 0.02 ILm, and 0.05 μLm in order from the glass substrate surface, a colored resin layer with a particle size of 0.08I1.11, and a colored resin layer with a particle size of 0.05μ
A colored resin layer with a particle size of 0.02B was coated to a thickness of 2.04 m using a spinner coating method, and the colored resin layer was then subjected to bleibation at 80°C for 130 minutes. Thereafter, exposure was performed using a high-pressure mercury lamp through a pattern mask corresponding to the pattern shape to be formed. After the exposure, the colored resin film is developed using ultrasonic waves in a special developer (a developer whose main component is N-methyl-2-pyrrolidone) that dissolves only the unexposed areas, and a special rinse solution ( After treatment with a rinsing liquid containing 1,1,1-trichloroethane as a main component, a boss bake was performed at 150° C. for 30 minutes to form a blue colored resin film having a patterned shape.

Next, a green colored resin material [Lionol Green 6YK (trade name)] was applied as a second color onto the glass substrate on which the blue colored pattern was formed.

Manufactured by Toyo Ink Co., Ltd., C, i No. 74265)
A-1000 (product name, manufactured by Ube Industries, polymer content: 10
%, solvent = N-methyl-2-pyrrolidone) with a pigment:bolimer ratio of 1:2 and a photosensitive colored resin material prepared by dispersing it with the same particle size as above]. , a green colored pattern was formed at a predetermined position on the substrate.

Furthermore, a red colored resin material [Irgazin Red BPT] was applied as a third color onto the substrate on which the blue and green patterns were formed in this manner.
(Product name, manufactured by Ciba-Geigy).

C, l No. 71127) to PA-1000 (trade name, manufactured by Ube Industries, Ltd., polymer content 10%, solvent = N-methyl-2-pyrrolidone), pigment: polymer = l22 mixture with the same particle size as above. A red colored pattern was formed at a predetermined position on the substrate in the same manner as described above, except that a photosensitive colored resin material dispersed and produced] was used. In this way,
A colored pattern of three color stripes of R (red), G (green), and B (blue) was obtained.

Note that the resin can be applied by a commonly used coating method such as a roll coater method or a printing method.

The spectral characteristics of the three-color filter thus formed are shown in FIG.

When the scattered light of the obtained color filter was measured using an integrating sphere (N Hitachi Model, 21G-2101),
The scattering intensity for each coloring pattern of blue, green, and red is
Q: It was almost the same, less than 1%. Therefore, since the pease ratio was small, the contrast was improved and a color filter with good display quality could be obtained.

Normally, when considering scattering, for example, in the case of a green filter, it should scatter blue light in the shorter wavelength range more than green light, or in the case of an absorption type color filter using pigments such as the present invention, blue light should be scattered more greatly than green light. Since the pigment absorbs the light, scattering in the blue color is minimized.

Therefore, it is effective to consider scattering only for the wavelength range of a desired color, as in the present invention.

In addition, the obtained color filter has excellent heat resistance and has 25
It can withstand temperatures of 0° C. or higher, which makes it possible to form ITO on CF by sputtering.

In addition, it has high hardness and excellent mechanical properties, and even when CF is configured in the liquid crystal cell in contact with the spacer, C
F will not be damaged. Furthermore, it has excellent solvent resistance, is resistant to various solvents after curing, does not change during each production process, and has excellent light resistance.

Comparative Example 1 The particle size of blue, green, and red pigment particles is approximately 0.05 to 2.
．． A color filter with a colored pattern of three color stripes of R (red), G (green), and B (blue) in which the size of pigment particles in the film thickness direction is not constant was prepared in Example 1. It was created using the same method as 1.

The scattering intensities of the obtained colored patterns of red, green, and blue were 0.1 to 1.0%, and were not constant for each color, so that the light absorption efficiency was not sufficient.

Example 2 A color liquid crystal display element was manufactured in the following manner using a thin film transistor as a substrate and forming the color filter of the present invention on the substrate.

First, as shown in Figure 3(a), a glass substrate (product name:
7059, manufactured by Corning) 1 with a layer thickness of 1000 on top of 1. After forming the T,0 pixel electrode 11 into a desired pattern by a photolithography process, Ai) is further applied on this surface.
A gate electrode 12 as shown in FIG. 3(b) was formed by vacuum evaporating the film to a layer thickness of 0.05 mm, and patterning this evaporated layer into a desired shape by a photolithography process.

Next, photosensitive polyimide (product name: Semicofine,
(manufactured by Toshisha Co., Ltd.) is coated on the surface of the substrate on which the electrodes are provided to form an insulating layer 13, and through-holes 14 forming contact portions between the train electrodes 18 and the pixel electrodes 11 are formed by pattern exposure and development processing. It was formed as shown in FIG. 3(C).

Here, the substrate 1 is set at a predetermined position in the deposition tank, 5iHn diluted with H2 is introduced into the deposition tank, and the electrodes 11, 12 and the insulating layer 1 are
A-3 with a layer thickness of 2000 people on the entire surface of the substrate 1 provided with
After depositing a photoconductive F (intrinsic layer) 15 consisting of i, a 09 layer 16 having a thickness of 1000 layers is formed on this photoconductive layer 15 by the same operation as shown in FIG. 3(d).
Laminated as shown. This substrate 1 was taken out from the deposition tank, and each of the n' layer 16 and the photoconductive layer 15 was
In this order, the film was patterned into a desired shape by dry etching as shown in FIG. 3(e).

Next, on the substrate surface on which the photoconductive layer 15 and the n layer 16 are provided, AP is vacuum-deposited to a thickness of 1,000 layers, and then a ρ-deposited layer is formed into the desired shape by a photolithography process. A source electrode 17 and a train electrode 18 as shown in FIG. 3(f) were formed by patterning.

Finally, three colored patterns of red, blue and green are formed in the same manner as in Example 1 to correspond to each of the pixel electrodes 11 as shown in FIG. 3(g). (h
), an insulator with an orientation function applied to the entire surface of this substrate [2
A polyimide resin as No. 2 was applied to a thickness of 1,200 layers, and the resin was cured by heat treatment at 250° C. for 1 hour to produce a thin film transistor with an integrated color filter.

A color liquid crystal display element was further formed using the thus produced thin film transistor with a color filter.

That is, 1,000 1.7.0 electrode layers were formed on the negative surface of a glass substrate (trade name: 7059, manufactured by Corning Inc.) in the same manner as described above, and an alignment function was further added to the electrode layers. A color liquid crystal display element was obtained by forming an insulating layer with a thickness of I200 and made of polyimide resin, and sealing liquid crystal between this substrate and the previously formed thin film transistor with a color filter, and fixing the whole. Ta.

The color liquid crystal display element thus formed had a function with good display quality.

Example 3 Instead of providing a three-color filter on the pixel electrode,
A color liquid crystal display element having a color filter of the present invention was obtained in the same manner as in Example 2 except that it was provided on the counter electrode.

The color liquid crystal display element thus formed has a function with good display quality.

Example 4 A color liquid crystal display element having a color filter of the present invention was obtained in the same manner as in Example 2 except that a three-color color filter was first formed on a counter substrate and then a counter electrode was provided.

The color liquid crystal display element formed in this manner had a function with good display quality.

Example 5 A wafer on which a CCD (charge, coupled, device) was formed was used as a substrate, and three-color stripes were formed so that each colored pattern of the color filter was arranged corresponding to each light receiving cell of the CCD. A color solid-state imaging device having a color filter of the present invention was formed in the same manner as in Example 1 except that the color filter was formed.

The color solid-state image sensing device thus formed had no flare and had a mechanical part with good color characteristics of the sensor.

Example 6 The color filter formed in Example 1 was applied to a wafer on which a CCD (charge, coupled, device) was formed, and each colored pattern of the color filter was applied in correspondence to each light receiving cell of the CCD. They were aligned and attached to form a color solid-state image sensor.

The color solid-state image sensor thus formed was free from flare and had good sensor color characteristics.

Example 7 A color photosensor array having the color filter of the present invention as shown in the partial plan schematic diagram of FIG. 4 was formed in the following manner according to the steps shown in FIG.

First, a photoconductive layer (intrinsic layer) 15 consisting of an a-3i (amorphous silicon) layer is formed on a glass substrate (trade name: 7059, manufactured by Corning Inc.) by a glow discharge method, as shown in FIG. 5(a). It was set up like this.

That is, SiH4 diluted to 10% by volume in (2) was heated to a gas pressure of 0.50 Torr and RF
A photoconductive layer 15 having a thickness of 0.7 B was obtained by depositing the photoconductive layer 15 on the substrate for 2 hours at a power of 10 W and a substrate temperature of 250° C.

Subsequently, a fifth layer is formed on this photoconductive layer 15 by a glow discharge method.
As shown in Figure (b), an n layer 16 was provided.

That is, SiH diluted to 10% by volume with H2,
■PH3 diluted to 100 ppm with 2 = 10
Using the gas mixed in step 1 as a raw material, and using the same conditions as the previous photoconductive layer deposition conditions, the photoconductive layer 15 was continuously deposited.
A 00 layer 16 with a layer thickness of 0.14 m was provided.

Next, as shown in FIG. 5(C), A
A conductive layer 19 was deposited on the R+ layer 16 to a layer thickness of 0-3 p, m. Subsequently, as shown in FIG. 5(d), a portion of the conductive layer 19 corresponding to the portion that will become the light conversion portion was removed.

That is, positive type Microposit l 300-27
(Product name, manufactured by 5hipley) After forming a photoresist pattern in the desired shape using photoresist,
Exposed areas (portions without a resist pattern) are etched using an etching solution containing phosphoric acid (85% aqueous solution by volume), nitric acid (60% by volume aqueous solution), glacial acetic acid, and water in a ratio of 16+l:2:l. The conductive layer 19 was removed from the substrate, and a common electrode 21 and individual electrodes 20 were formed.

Next, the 00 layer 16 of the part that will become the light conversion part is shown in FIG. 5(e).
It was removed as shown.

That is, after the Microposit 130G-277 photoresist was peeled off from the substrate, it was etched using a parallel plate plasma etching device DEM-451 (manufactured by Nikkei Anelva Co., Ltd.) using a plasma etching method (also known as a reactive ion etching method) with an RF power of 120 W. , gas pressure 0. ITo
Dry etching was performed using CFs gas at rr for 5 minutes to remove exposed portions of the n1 layer 16 and a portion of the surface layer of the photoconductive layer 15 from the substrate.

In this example, in order to prevent implantation of the cathode material of the etching device, a polysilicon sputtering target (8 inches, purity 99.999%) was placed on the cathode, and the sample was placed on top of it. The exposed portion of the SUS cathode material was covered with a Teflon (registered trademark) sheet cut out in the shape of a donut, and etching was performed with the 808 surface hardly exposed to plasma.

Thereafter, heat treatment was performed at 20° C. for 60 minutes in an oven in which nitrogen was flowed at a rate of 341/in.

Next, a protective layer was formed on the surface of the photosensor array thus created in the following manner.

That is, a silicon nitride layer as the protective layer 7 was formed on the photosensor array by a glow discharge method.

That is, S+H4 diluted to 10% by volume with H2 and 1
Silicon nitride (a -5i
A protective layer 7 made of a (NH) layer was formed as shown in FIG. 5(f).

Furthermore, using this protective layer 7 as a substrate, a color filter consisting of three color patterns of blue 5, green 4, and red 6 was formed in the same manner as in Example 1, and as shown in FIG. A color photosensor array was formed in which colored filters were placed on each sensor.

The color photosensor array formed in this example also had no flare and had good color characteristics.

Example 8 A color photosensor array was formed by pasting the color filter formed in Example 1 onto the photosensor array formed in Example 7 using an adhesive.

The color photosensor formed in this example also had good functionality, similar to that formed in Example 7.

[Effects of the Invention] According to the present invention, a colored resin layer is formed using a colored resin material obtained by dispersing a pigment in a resin that has a photosensitive group in its molecule or does not have a photosensitive group, Since the pigment particles in the colored resin layer are distributed so as to become smaller in the thickness direction from the substrate surface, the following effects can be obtained.

That is, the intensity of scattering from the color filter is reduced, and the efficiency of light absorption by the pigment is correspondingly increased, so that the display quality of the display element is significantly improved. Also, in the sensor element, for the same reason, the contrast is improved and the brownish characteristic is also improved. Furthermore, from a structural advantage, the film thickness can be reduced compared to the conventional method.

Further, according to the present invention, there is provided a color filter having a fine pattern that has excellent mechanical strength and excellent properties such as heat resistance, light resistance, and solvent resistance.

It can be produced by a simple manufacturing process using a colored resin material that can be easily produced. Therefore, it has become possible to apply the present invention to a wide variety of devices that require color filters with good performance, and it has become possible to produce color devices with excellent properties.

Furthermore, according to the present invention, desired spectral characteristics can be easily designed by controlling the type and concentration of the coloring material in the colored resin and the thickness of the colored resin layer.

[Brief explanation of the drawing]

FIGS. 1(a) to (f) are process diagrams for explaining the method for forming the color filter of the present invention, and FIG. 2 is a diagram showing the colored resin layer of the color filter of the present invention obtained in Example 1. 3(a) to (h) are manufacturing process diagrams of a color liquid crystal display element having a color filter of the present invention, and FIG. 4 is a graph showing a color photophotograph having a color filter of the present invention. FIGS. 5(a) to 5(g) are schematic plan partial views of the sensor array, and FIG. 6 is a diagram showing the formation process of the color photosensor array shown in FIG. FIG. 2 is an explanatory diagram showing a state in which light is scattered by pigment particles distributed in order of size. 1.61: Substrate 2: Colored resin film 2a: Photocured portion 3: Photomask 4.5, 6: Patterned colored resin layer 7: Protective layer 8: Spectral characteristics of red colored resin layer 9: Spectral characteristics of green colored resin layer Spectral characteristics 1O: Spectral characteristics of blue colored resin layer 11: Pixel electrode 12: Gate electrode 13: Insulating layer 14: Through hole 15: Photoconductive layer 1
6: nI layer 17: Source electrode 18 Nidrain electrode 19: Conductive layer 20: Individual electrode 21: Common electrode 2
2: Insulating film 62: Resin 63a, 63b, 63c: Pigment 64: Incident light 65: Scattered light Figure 1 Figure 2 Length (nm) Figure 3 Figure 5

Claims (7)

[Claims] (1) Using a colored resin made by dispersing pigments in the resin,
A color filter having a colored resin layer formed in a pattern by a printing process or a photolithography process, characterized in that pigment particles in the colored resin layer are distributed in order from the substrate surface to become smaller in the film thickness direction. Color filter. (2) The color filter according to claim 1, wherein the resin has a photosensitive group in its molecule. (3) The color filter according to claim 1, wherein the colored resin layer is a patterned colored resin layer provided on a substrate. (4) Claims in which the colored resin layer is a patterned colored resin layer formed by coating a colored resin film having a photosensitive group on a substrate, and then exposing and developing the film using a predetermined mask. The color filter according to item 1 or 3. (5) Claim 3 or 4, wherein the substrate is a display unit of a display device made of nematic liquid crystal or ferroelectric liquid crystal, an electrochromic (EC) display device, etc.
Color filter as described in section. (6) The color filter according to claim 3 or 4, wherein the substrate is a solid-state image sensor. (7) The color filter according to claim 3 or 4, wherein the substrate is a light receiving surface of an image sensor.