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JPS63185994A - Production of beta-lactam compound - Google Patents

Production of beta-lactam compound

Info

Publication number
JPS63185994A
JPS63185994A JP62017735A JP1773587A JPS63185994A JP S63185994 A JPS63185994 A JP S63185994A JP 62017735 A JP62017735 A JP 62017735A JP 1773587 A JP1773587 A JP 1773587A JP S63185994 A JPS63185994 A JP S63185994A
Authority
JP
Japan
Prior art keywords
formula
compound
optically active
compound expressed
lower alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62017735A
Other languages
Japanese (ja)
Inventor
Yoshihiro Nakamizo
中溝 喜博
Masao Matsukuma
松隈 征夫
Koji Hisamura
孝治 久村
Nobunori Takemoto
武本 宜教
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KH Neochem Co Ltd
Original Assignee
Kyowa Hakko Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Hakko Kogyo Co Ltd filed Critical Kyowa Hakko Kogyo Co Ltd
Priority to JP62017735A priority Critical patent/JPS63185994A/en
Publication of JPS63185994A publication Critical patent/JPS63185994A/en
Pending legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Nitrogen Condensed Heterocyclic Rings (AREA)

Abstract

PURPOSE:To enable production of the titled compound which is optically active in 3, 4 positions, by using an optically active amine as a catalyst when cis form in 3,4-positions of 2-azethydinone derivative which is a synthetic intermediate to carbapenem compound, etc., of antimicrobial agent is obtained. CONSTITUTION:A compound expressed by formula I (R<1> is carboxy protecting group; R<2> is lower alkyl or phenyl; R<3> is lower alkyl) is reacted with a compound expressed by the formula X-CH2COCl (X is phthalimide or azide) in an inert solvent in the presence of an optically active amine (e.g. nicotine, etc.) to provide the cis form in 3,4-positions of the aimed compound expressed by formula II. The reaction is normally carried out using the acid chloride of 1.0-1.5 equivalent and the optically active amine of 1-2 equivalent based on the compound expressed by formula II, preferably at -50 deg.C-room temperature for 30min-24hr. An optically active compound expressed by formula III is especially useful as the compound expressed by formula II.

Description

【発明の詳細な説明】 皮粟上皇且朋分団 本発明は抗菌活性を有するカルバペネム化合物又はカル
バセフェム化合物の合成中間体として用いられる、2−
アゼチジノン誘導体特にその光学活性体の製造法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a 2-
The present invention relates to a method for producing azetidinone derivatives, particularly optically active forms thereof.

式(II) CO,R’ (式中、R1は合成ペニシリン又は合成セファロスホリ
ンの化学で常用されるカルボキシ保護基テあり、Rtは
低級アルキル又はフェニルであり、R3は低級アルキル
である)で表される化合物と式(III) X −CIl□COCf          (I[[
)(式中、Xはフタルイミド又はアジドである)で表さ
れる化合物とを不活性溶媒中光学的に不活性なアミン、
例えばトリエチルアミンを触媒として反応させて弐(1
) (式中、R1,R2,R3及びXは前記と同義である)
で表される2−アゼチジノン誘導体の3,4位シス体を
得ることはすでに知られている(特開昭54−1285
91)。しかしながら、この方法では化合物(II)及
び(III)として光学的に不活性な化合物を用いてお
り、従って得られる化合物(1)のシス体も光学的に不
活性である。
Formula (II) CO,R' (wherein R1 is a carboxy protecting group commonly used in the chemistry of synthetic penicillins or synthetic cephalosphorins, Rt is lower alkyl or phenyl, and R3 is lower alkyl) The compound represented and the formula (III)
) (wherein X is phthalimide or azide) and an optically inactive amine in an inert solvent,
For example, by reacting with triethylamine as a catalyst,
) (wherein R1, R2, R3 and X have the same meanings as above)
It is already known that the 3,4-cis form of the 2-azetidinone derivative represented by
91). However, in this method, optically inactive compounds are used as compounds (II) and (III), and therefore the cis form of compound (1) obtained is also optically inactive.

又、従来より光学活性なβ−ラクタム環の合成(いわゆ
る不斉合成)についての試みも報告がなされている(例
えば、カナディアン ジャーナルオプ ケミストリー第
58巻1605頁1980年、ケミストリー レター1
853頁1980年等)が、これらはいずれも反応原料
として不斉分子種(ChiralSyn thon)を
用いた不斉合成である。
In addition, attempts to synthesize optically active β-lactam rings (so-called asymmetric synthesis) have been reported (for example, Canadian Journal of Chemistry, Vol. 58, p. 1605, 1980, Chemistry Letters 1).
853, 1980, etc.), but all of these are asymmetric syntheses using chiral molecular species (ChiralSyn thon) as reaction raw materials.

一方、光学活性化合物を触媒とした不斉合成法はこれま
で種々知られている。例えば光学的に不活性な各種ケテ
ン類への光学的に不活性なアルコールの付加反応の触媒
として光学活性塩基、例えばストリキニーネ、ブルシン
等を用い不斉合成を行なった例がある〔井上雄三ら訳、
不斉合成、東京化学同人(1973)、296,343
,344等〕。
On the other hand, various asymmetric synthesis methods using optically active compounds as catalysts have been known so far. For example, there are examples of asymmetric synthesis using optically active bases, such as strychnine and brucine, as catalysts for the addition reaction of optically inactive alcohols to various optically inactive ketenes [translated by Yuzo Inoue et al. ,
Asymmetric synthesis, Tokyo Kagaku Dojin (1973), 296, 343
, 344, etc.].

■が解決しようとする5、今 不斉分子種を用いることなく、光学的に不活性な反応原
料を用い光学活性なアミンを触媒として光学活性なβ−
ラクタム環を合成する方法は知られていない。
5. Now, without using asymmetric molecular species, optically active β-
There is no known method to synthesize lactam rings.

間 、壱を解2するための 段 本発明は式(II) CO2R’ (式中、R’ は合成ペニシリン又は合成セファロスポ
リンの化学で常用されるカルボキシ保護基であり、R2
は低級アルキル又はフェニルであり、R3は低級アルキ
ルである)で表される化合物と式(III) X  CHzCOCj!          (I[I
 )(式中、Xはフタルイミド又はアジドである)で表
される化合物とを反応に不活性な溶媒中光学活性アミン
の存在下反応させることを特徴とする式(式中、R1,
R1,Rff及びXは前記と同義である)で表される化
合物の3,4位シス体の製造法、特にその3,4位に関
する光学活性体の製造法に関する。
The present invention provides the formula (II) CO2R' (wherein R' is a carboxy protecting group commonly used in the chemistry of synthetic penicillins or synthetic cephalosporins, and R2
is lower alkyl or phenyl, and R3 is lower alkyl) and the compound represented by formula (III) X CHzCOCj! (I[I
) (wherein, R1,
The present invention relates to a method for producing the cis form at the 3 and 4 positions of a compound represented by (R1, Rff and

以下、式(I)、 (II)、 (III)等で表され
る化合物をそれぞれ化合物(I)、化合物(■)、化合
物(In)等という。又、化合物(1)の3,4位シス
体の3,4位に関する光学活性体を化合物(’l−1)
という。
Hereinafter, the compounds represented by formulas (I), (II), (III), etc. will be referred to as compound (I), compound (■), compound (In), etc., respectively. In addition, the optically active form regarding the 3 and 4 positions of the 3 and 4 cis form of the compound (1) is converted into a compound ('l-1).
That's what it means.

次に本発明方法をさらに詳しく説明する。式(■)中R
1で示されるエステル残基はペニシリン及びセファロス
ポリンの化学で常用されるカルボキシル基の保護基であ
り、メチル、エチル、n−プロピル、i−プロピル、n
−ブチル、sec −ブチル、L−ブチル基等のCI〜
C3の低級アルキル基、2,2.2− トリクロロエチ
ル、2.2.2−トリフロロエチルのようなハロゲン化
低級アルキル基、ベンジル、0−ニトロベンジル、p−
ニトロベンジル、p−メトキシベンジル基、ベンズヒド
リル基、トリチル基のような非置換もしくは置換アラル
キル基、フェナシル、p−クロロフェナシル、p−ブロ
ムフェナシルのような非置換もしくは置換のフェナシル
基、トリメチルシリル、ジメチル−t−ブチルシリルの
ようなトリ低級アルキルシリル基を示す。R2又はR3
で表される低級アルキル基としては、メチル、エチル、
n−プロピル、i−プロピル、n−ブチル、5eC−ブ
チル基等の01〜C5の直鎖もしくは分枝の低級アルキ
ル基が例示される。
Next, the method of the present invention will be explained in more detail. R in formula (■)
The ester residue represented by 1 is a carboxyl protecting group commonly used in penicillin and cephalosporin chemistry, and includes methyl, ethyl, n-propyl, i-propyl, n-propyl,
CI~ of -butyl, sec-butyl, L-butyl groups, etc.
C3 lower alkyl group, halogenated lower alkyl group such as 2,2.2-trichloroethyl, 2.2.2-trifluoroethyl, benzyl, 0-nitrobenzyl, p-
unsubstituted or substituted aralkyl groups such as nitrobenzyl, p-methoxybenzyl group, benzhydryl group, trityl group, unsubstituted or substituted phenacyl groups such as phenacyl, p-chlorophenacyl, p-bromphenacyl, trimethylsilyl, dimethyl- Indicates a tri-lower alkylsilyl group such as t-butylsilyl. R2 or R3
The lower alkyl group represented by is methyl, ethyl,
Examples include 01-C5 linear or branched lower alkyl groups such as n-propyl, i-propyl, n-butyl, and 5eC-butyl groups.

光学活性アミンとしてはニコチン、ブルシン、0−アセ
チルシンコニジン、0−アセチルシンコニン、N、N−
ジメチルデヒドロアビエチルアミン、N、N−ジメチル
−α−フェニルエチルアミン、N−メチル−2−アセト
キシエチルピロリジン、N−メチル−2−ベンゾイルオ
キシエチルピロリジン、N、N−ジメチルメンチルアミ
ン及びN−(ジ)アルキルアミノ酸エステル類等の3級
アミンが挙げられる。ここでアミノ酸のN−アルキル基
としては、メチル、エチル、n−プロピル、i−プロピ
ル、n−ブチル、i−ブチル、5ec−ブチル、む−ブ
チル等の低級アルキル基が又、エステル類としてはN−
アルキル基と同様のアルキル基及びベンジル基等であり
、例えば、N−メチルプロリンメチルエステル、N−メ
チルプロリンも一ブチルエステル、イソブチルプロリン
メチルエステル、N、N−ジメチルアラニンメチルエス
テル、N、N −ジメチルバリンメチルエステル及びN
、N−ジメチルバリンt−ブチルエステル等が挙げられ
る。化合物(■)及びその製造法は特開昭54−128
591に記載されている。
Optically active amines include nicotine, brucine, 0-acetyl cinchonidine, 0-acetyl cinchonine, N, N-
Dimethyldehydroabiethylamine, N,N-dimethyl-α-phenylethylamine, N-methyl-2-acetoxyethylpyrrolidine, N-methyl-2-benzoyloxyethylpyrrolidine, N,N-dimethylmenthylamine and N-(di) Examples include tertiary amines such as alkyl amino acid esters. Here, as the N-alkyl group of the amino acid, there are lower alkyl groups such as methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, 5ec-butyl, and mu-butyl, and as the esters, N-
These include alkyl groups and benzyl groups similar to alkyl groups, such as N-methylproline methyl ester, N-methylproline also monobutyl ester, isobutylproline methyl ester, N,N-dimethylalanine methyl ester, N,N- Dimethylvaline methyl ester and N
, N-dimethylvaline t-butyl ester, and the like. The compound (■) and its manufacturing method are disclosed in JP-A-128-1988.
591.

不活性溶媒としては、塩化メチレン、クロロホルム、四
塩化炭素ジクロロエタン等のハロゲン化低級アルカン類
、ベンゼン、トルエン、キシレン、エチルベンゼン、ク
メン等の芳香族炭化水素類、ジエチルエーテル、ジイソ
プロピルエーテル、テトラヒドロフランジメチルセロソ
ルブ等のエーテル類、酢酸エチル等のエステル等、シク
ロヘキサン、アセトニトリル、メチルエチルケトンジメ
チルホルムアミド等が挙げられる。
Examples of inert solvents include halogenated lower alkanes such as methylene chloride, chloroform, carbon tetrachloride dichloroethane, aromatic hydrocarbons such as benzene, toluene, xylene, ethylbenzene, and cumene, diethyl ether, diisopropyl ether, tetrahydrofuran dimethyl cellosolve, etc. , esters such as ethyl acetate, cyclohexane, acetonitrile, methyl ethyl ketone dimethylformamide, and the like.

化合物(I[[)は化合物(If)に対し、通常1.0
〜1.5当量、光学活性アミンは化合物(II)に対し
通常1〜2当量用いる。
Compound (I[[) is usually 1.0 relative to compound (If)
~1.5 equivalents, and the optically active amine is usually used in an amount of 1 to 2 equivalents relative to compound (II).

反応は一50°C〜還流下、特に−50″C〜室温で行
い、30分〜24時間で終了する。
The reaction is carried out at -50° C. to reflux, especially at -50° C. to room temperature, and is completed in 30 minutes to 24 hours.

反応終了後、一般合成化学の単離精製方法、例えば抽出
、クロマトグラフィー、結晶化等により光学活性体であ
る化合物(I−1)を単離精製できる。
After the reaction is completed, the optically active compound (I-1) can be isolated and purified by isolation and purification methods of general synthetic chemistry, such as extraction, chromatography, and crystallization.

化合物(1)の3.4位についてのシス体は61体及び
光学活性体(1−1)を包含する。
The cis form of the 3.4-position of compound (1) includes the 61 form and the optically active form (1-1).

化合物(1−1)は下記の2つの式のいずれかで表され
る化合物である。
Compound (1-1) is a compound represented by either of the following two formulas.

cozR’ 化合物(1−1−1)及び(1−1−2)は特開昭57
−91991又は特開昭55−145685に記載の方
法と同様な方法によってそれぞれ式 %式%) 、(式中、Yはアジド、フタルイミド又はアミノである
)で表される化合物に導くことができ、Yがアミノであ
る化合物(IV−1)、(IV−2)はさらにアシル化
によって抗菌活性を有する化合物に導くことができる(
例えば特開昭56−30976)。最終化合物の抗菌活
性は式(IV−1)の骨格のものがi体や(IV−2)
の骨格のものに比しはるかに優れている。従って通常化
合物(1−1−1)の方がdf体や化合物(1−1−2
)よりはるかに有用である。
cozR' compounds (1-1-1) and (1-1-2) are disclosed in JP-A-57
-91991 or JP-A-55-145685 by a method similar to that described in JP-A-55-145685, respectively, can lead to a compound represented by the formula % (formula %), (wherein Y is azide, phthalimide or amino), Compounds (IV-1) and (IV-2) in which Y is amino can be further acylated into compounds with antibacterial activity (
For example, JP-A-56-30976). The antibacterial activity of the final compound is determined by the i-form and (IV-2) with the skeleton of formula (IV-1).
It is far superior to the one with the skeleton. Therefore, compound (1-1-1) is usually more suitable for df form and compound (1-1-2).
) is much more useful.

本発明方法によって(1−1−1)と(I−1−2)の
いずれが多く得られるかは光学活性アミンや溶媒の種類
、反応温度等による。
Whether more of (1-1-1) or (I-1-2) can be obtained by the method of the present invention depends on the type of optically active amine, the type of solvent, the reaction temperature, etc.

尖施開 以下に本発明の実施例を挙げ具体的に説明する。tip opening EXAMPLES The present invention will be specifically explained below with reference to Examples.

なお、実施例中記載の光学収率(o、y、 )は、以下
の方法で求めた。
Note that the optical yields (o, y, ) described in Examples were determined by the following method.

実施例に従って得られる化合物(T)を下記参考図(1
)に従い化合物(IV−3)を得(特開昭57−919
91)更に脱エステルすることにより化合物(■)とし
く以上参考例1及び2参照)、その施光度を測定した(
得られた値を〔α) obsとする。)(■) 参考図(1) (V) (Vl) (IV−3) 〔式中、Rl 、 R!及びR3は前記と同意義、Ph
 tNはフタルイミド基を示す〕 他方(+) −7β−アミノ−1−アザビシクロ(4,
2,O]オクト−2−エン−8−オン−2−カルボン酸
(■)(特開昭56−30976)とN−カルベトキシ
フタルイミド(ネフケンス試薬)を反応させ、化合物(
■)に対応する(+)−7β−フタルイミド−1−アザ
ビシクロ(4,2,0)オクト−2−エン−8−オン−
2−カルボン酸としく参考例3参照)、その施光度を測
定した(得られた値を〔α) maxとする)。光学収
率(o、y、 )は下記式より求めた。
The compound (T) obtained according to the example is shown in the following reference figure (1
) Compound (IV-3) was obtained according to (JP-A-57-919
91) The compound (■) was further deesterified (see Reference Examples 1 and 2 above), and its degree of light absorption was measured (
Let the obtained value be [α) obs. ) (■) Reference diagram (1) (V) (Vl) (IV-3) [In the formula, Rl, R! and R3 have the same meanings as above, Ph
tN represents a phthalimide group] The other (+) -7β-amino-1-azabicyclo(4,
2,O]oct-2-en-8-one-2-carboxylic acid (■) (JP-A-56-30976) and N-carbetoxyphthalimide (Nefkens reagent) were reacted to form the compound (
(+)-7β-phthalimido-1-azabicyclo(4,2,0)oct-2-en-8-one-
2-carboxylic acid (see Reference Example 3), and its degree of light exposure was measured (the obtained value is defined as [α) max). The optical yield (o, y, ) was determined from the following formula.

実施例1 シス−4−(3,3−ジメトキシ−1−プロペン−1−
イル)−3−フタリミド−2−オキソアゼチジン−1−
イル−α−ジエチルホスホノ酢酸、第R’ =tBu 
、R2=Et 、R” =CI!+で表される化合物の
3.4位シス体〕の製造 α−アミノ−α−ジエチルホスホノ酢酸、第3ブチルエ
ステル2.67g(0,01モル)及び4,4−シメチ
ルートランス−2−ブチナール1.43 g(1,1当
it)を溶媒3 tanに溶解し、モレキュラシープ3
 mlを加え室温で30分間撹拌した。この溶液を17
mA!のモレキュラシーブのカラム中を通塔し、カラム
は更に10IllIlめ同一溶媒で3回洗浄した。生成
したシッフ塩基〔弐(II)に於てR’ =”Bu 、
R” =nt 、R’ =CflBの化合物〕を含む溶
出液及び洗浄液をあわせた中に塩基(1,2当M)及び
モレキュラシーブ5gを加えた。
Example 1 Cis-4-(3,3-dimethoxy-1-propene-1-
yl)-3-phthalimido-2-oxoazetidine-1-
yl-α-diethylphosphonoacetic acid, R' = tBu
, R2=Et, R''=CI!+ 3.4-position cis form of the compound] α-amino-α-diethylphosphonoacetic acid, tert-butyl ester 2.67 g (0.01 mol) and 1.43 g (1,1 equivalent it) of 4,4-dimethyl-trans-2-butinal were dissolved in 3 tan of solvent, and
ml was added and stirred at room temperature for 30 minutes. Add this solution to 17
mA! The column was passed through a column of molecular sieves, and the column was further washed three times with the same solvent for 10IllIl. The generated Schiff base [R' = "Bu in II (II),
A base (1,2 equivalent M) and 5 g of molecular sieve were added to the combined eluate and washing solution containing the compound with R" = nt and R' = CflB.

シッフ塩基生成に用いたと同じ溶媒30mj!に溶解し
たフタリルグリシン酸クロライド2.46g (1,1
当量)をシッフ塩基の溶液を第1表の反応温度に保ちな
がら0.5〜1時間で滴下した。滴下後室部で3時間撹
拌し反応を終了した。かくして得られた反応液中には標
記化合物が含有されているが、単離、精製することなく
、以下参考例1に記載の方法により、化学収率は、シス
−4−(3−オキソ−1−プロペン−1−イル)−3−
フタリミド−2−オキソアゼチジン−1−イル−α−ジ
エチルホスホノ酢酸、第3ブチルエステル〔式(V)に
於てR’ =’Bu 、R” =Etで表される化合物
〕として、又光学収率は更に参考例2に記載の方法によ
りシス−7−フタリミド−1−アザビシクロ(4,2,
0)オクト−2−エン−8−オキソ−2−カルボン酸〔
式(■)で表される化合物〕としてそれぞれ算出した。
30mj of the same solvent used for Schiff base generation! 2.46 g of phthalylglycinate chloride (1,1
equivalent amount) was added dropwise to the Schiff base solution over 0.5 to 1 hour while maintaining the reaction temperature shown in Table 1. After the dropwise addition, the mixture was stirred in the chamber for 3 hours to complete the reaction. Although the title compound was contained in the reaction solution obtained in this way, the chemical yield was determined to be cis-4-(3-oxo- 1-propen-1-yl)-3-
Phthalimido-2-oxoazetidin-1-yl-α-diethylphosphonoacetic acid, tertiary butyl ester [compound represented by R' = 'Bu, R'' = Et in formula (V)] The ratio was further determined by the method described in Reference Example 2.
0) Oct-2-ene-8-oxo-2-carboxylic acid [
[compound represented by formula (■)]].

結果を第1表に示す。尚標記化合物の構造は、一部シリ
カゲルクロマトで精製し、NMR及びIRより、特開昭
57−91991参考例1に記載の化合物と一致したこ
とより確認した。
The results are shown in Table 1. The structure of the title compound was partially purified by silica gel chromatography, and was confirmed by NMR and IR, as it matched with the compound described in Reference Example 1 of JP-A-57-91991.

第   1   表 本1 α−アミノ−α−ジエチルホスホノ酢酸、第3プ
チルエステノ肋1らの通算収率 *2  〔α)(C〒0.5  リンN沫則對沼しH7
,O)第1表に見られるように、対照として塩基に光学
不活性なトリエチルアミンを用い実施例及び参考例と同
様の方法により旋光度を測定した結果全く旋光度を有し
ておらず、本製造法がクロマト或いは晶析等の分離精製
過程で不斉分割がなされたものでなく光学活性アミンに
より不斉合成がなされたことは明らかである。
Table 1 Book 1 Total yield of α-amino-α-diethylphosphonoacetic acid, tertiary butyl esterophore 1, etc. *2 [α) (C〒0.5 Phosphorus N Mimorikanumashi H7
, O) As shown in Table 1, the optical rotation was measured in the same manner as in Examples and Reference Examples using optically inactive triethylamine as a base, and as a result, there was no optical rotation at all. It is clear that the production method involved asymmetric synthesis using an optically active amine, rather than asymmetric resolution in a separation and purification process such as chromatography or crystallization.

参考例1 シス−4−(3−オキソ−1−プロペン−1−イル)−
3−フタリミド−2−オキソアゼチジン−1−イル−α
−ジエチルホスホノ酢酸、第3ブチルエステルの製造 実施例1で得られた粗アセタール化合物を含む反応溶液
中へp−トルエンスルホン酸(2当量)を溶解したアセ
トン溶液10mff1を加え、20〜30分撹拌した。
Reference example 1 cis-4-(3-oxo-1-propen-1-yl)-
3-phthalimido-2-oxoazetidin-1-yl-α
- Production of diethylphosphonoacetic acid, tertiary butyl ester 10 mff1 of an acetone solution containing p-toluenesulfonic acid (2 equivalents) was added to the reaction solution containing the crude acetal compound obtained in Example 1, and the mixture was heated for 20 to 30 minutes. Stirred.

モレキュラシーブを濾別し、濾液は水、飽和重曹水、飽
和食塩水の順に洗浄し無水硫酸ナトリウムで乾燥した。
The molecular sieve was filtered off, and the filtrate was washed successively with water, saturated aqueous sodium bicarbonate, and saturated brine, and dried over anhydrous sodium sulfate.

減圧下に溶媒留去し、残渣はシリカゲルクロマト(ワコ
ーゲルC−20080g、溶出液:n−ヘキサン/酢酸
エチル−1/l)で精製し、目的物を結晶性油状物とし
て得た。収率(α−アミノ−α−ジエチルホスホノ酢酸
、第3ブチルエステルからの通算収率)は第1表に記載
した通りである。なお標記化合物の構造は特開昭57−
91991参考例2に記載のIR及びNMRに一致する
ことより確認した。
The solvent was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (Wakogel C-20080 g, eluent: n-hexane/ethyl acetate-1/l) to obtain the desired product as a crystalline oil. The yield (total yield from α-amino-α-diethylphosphonoacetic acid, tertiary butyl ester) is as shown in Table 1. The structure of the title compound is disclosed in JP-A-57-
This was confirmed by matching the IR and NMR spectra described in Reference Example 2 of 91991.

参考例2 シス−7−フタリミド−1−アザビシクロ〔4゜2.0
〕オクト−2−エン−8−オキソ−2−カルボン酸の製
造 参考例1で得られたアルデヒド化合物を90%メチルエ
チルケトン水溶液に溶解し、10%パラジウム炭素〔約
30%(W/W)対アルデヒド化合物〕を加え水素ガス
を通気した0反応終了後(通常数時間〜数10時間)で
触媒を濾別し、濾液にジメチルエタノールアミン(2当
量対アルデヒド化合物)を加え、30分〜1時間撹拌後
室温で一夜放置した。ついで減圧下に溶媒留去し、残渣
にクロロホルムを加え、10%クエン酸及び飽和食塩水
で順次洗浄し、無水硫酸ナトリウムで乾燥した。減圧下
に溶媒を留去し、残渣はシリカゲルクロマト(ワコーゲ
ルC−20020g、溶出液:クロロホルム)に付した
。粗精製物を少量のクロロホルムに溶解し、水冷下エー
テルを添加し、析出した結晶を吸引濾取し、ついで減圧
乾燥し標記化合物の第3ブチルエステル化合物〔式(I
V−3)において、R’ =tB!で表される化合物〕
を得た。本品のIR及びNMRは特開昭57−9199
1実施例3に記載の化合物に一致した。
Reference Example 2 Cis-7-phthalimido-1-azabicyclo[4°2.0
] Production of oct-2-ene-8-oxo-2-carboxylic acid The aldehyde compound obtained in Reference Example 1 was dissolved in a 90% aqueous methyl ethyl ketone solution, and 10% palladium on carbon [approximately 30% (W/W) to aldehyde After the completion of the reaction (usually several hours to several tens of hours), the catalyst was filtered off, dimethylethanolamine (2 equivalents to aldehyde compound) was added to the filtrate, and the mixture was stirred for 30 minutes to 1 hour. After that, it was left at room temperature overnight. The solvent was then distilled off under reduced pressure, and chloroform was added to the residue, which was washed successively with 10% citric acid and saturated brine, and dried over anhydrous sodium sulfate. The solvent was distilled off under reduced pressure, and the residue was subjected to silica gel chromatography (Wakogel C-20020 g, eluent: chloroform). The crude product was dissolved in a small amount of chloroform, ether was added under water cooling, and the precipitated crystals were collected by suction filtration and then dried under reduced pressure to obtain the tertiary butyl ester compound of the title compound [formula (I
V-3), R' = tB! Compound represented by]
I got it. IR and NMR of this product are JP-A-57-9199.
1 corresponded to the compound described in Example 3.

ついで第3ブチルエステル化合物に対し約10倍量(v
/w)のギ酸を加え室温で5時間撹拌した。析出した結
晶を少量のクロロホルムを添加し溶解したのち、水冷下
にエーテルを加え結晶を析出させた。吸引濾取しエーテ
ル洗浄後、減圧真空乾燥し、目的物の白色結晶を得た。
Then, about 10 times the amount (v) of the tertiary butyl ester compound
/w) of formic acid was added and stirred at room temperature for 5 hours. A small amount of chloroform was added to dissolve the precipitated crystals, and then ether was added while cooling with water to precipitate the crystals. The residue was collected by suction filtration, washed with ether, and then dried under reduced pressure to obtain white crystals of the desired product.

Rf(+i= 0.23 (クロロホルム/メタノール
=4/1) 0.39(酢酸エチル/酢酸=10/1)N M R(
CDCl 3)δ: 7.85(4H,a)、6.42
(IH,t)。
Rf (+i = 0.23 (chloroform/methanol = 4/1) 0.39 (ethyl acetate/acetic acid = 10/1) N M R (
CDCl 3) δ: 7.85 (4H, a), 6.42
(IH, t).

5.62(IH,d、、J=5Hz)、3.7〜4.2
(IH,m)、1.7〜2.7(411,++)なお、
標記化合物の施光度((α) obs)及びそれから算
出されるo、y、の結果は第1表に記載した通りである
5.62 (IH, d, J=5Hz), 3.7-4.2
(IH, m), 1.7 to 2.7 (411, ++)
The light absorption degree ((α) obs) of the title compound and the results of o and y calculated therefrom are as shown in Table 1.

参考例3 (+)−7β−フタルイミド−1−アザビシクロ(4,
2,0)オクト−2−エン−8−オン−2−カルボン酸
の製造法 (+)−7β−アミノ−1−アザビシクロC4,2゜0
〕オクト−2−エン−8−オン−2−カルボン酸[〔α
) =+65.9 (C−0,37リン酸緩衝液pH7
、O)コ200■(1,1/lモル)に炭酸ナトリウム
120■(1,1/lモル)及び水3 tailを加え
溶解し、これにN−カルベトキシフタルイミド480■
(2,2ミリモル)を添加、室温で7時間撹拌後−夜装
置した。不溶物を濾去し、濾液はIN塩酸で酸性とし析
出した結晶を吸引濾取し、水洗次いでエーテル洗浄後減
圧真空乾燥し、目的物140■(収率40.8%)を得
た。本化合物のRf値、IR及びNMRは参考例2で得
られるそれに一致した。施光度は〔α)=+42.2(
C=0.5リン酸緩衝液pH7,0)を有しており、こ
れを〔α) maxとした。
Reference Example 3 (+)-7β-phthalimido-1-azabicyclo(4,
2,0) Production method of oct-2-en-8-one-2-carboxylic acid (+)-7β-amino-1-azabicycloC4,2゜0
] Oct-2-en-8-one-2-carboxylic acid [[α
) = +65.9 (C-0,37 phosphate buffer pH 7
, O) To 200 μm (1.1/l mole) of sodium carbonate and 3 tails of water were added and dissolved, and to this was added 480 μm of N-carbetoxyphthalimide.
(2.2 mmol) was added and the mixture was stirred for 7 hours at room temperature and then heated overnight. Insoluble matters were removed by filtration, and the filtrate was acidified with IN hydrochloric acid, and the precipitated crystals were collected by suction filtration, washed with water and ether, and then dried under reduced pressure to obtain the desired product 140.mu. (yield: 40.8%). The Rf value, IR and NMR of this compound matched those obtained in Reference Example 2. The light intensity is [α)=+42.2(
C=0.5 phosphate buffer pH 7.0), which was defined as [α) max.

又凱坐墓果 光学活性アミンを触媒とする光学活性なβ−ラクタム環
の不斉合成がなされた。
In addition, an asymmetric synthesis of an optically active β-lactam ring was carried out using an optically active amine as a catalyst.

Claims (3)

【特許請求の範囲】[Claims] (1)式(II) ▲数式、化学式、表等があります▼(II) (式中、R^1は合成ペニシリン又は合成セファロスポ
リンの化学で常用されるカルボキシ保護基であり、R^
2は低級アルキル又はフェニルであり、R^3は低級ア
ルキルである)で表される化合物と式(III) X−CH_2COCl(III) (式中、Xはフタルイミド又はアジドである)で表され
る化合物とを反応に不活性な溶媒中光学活性アミンの存
在下反応させることを特徴とする式( I ) ▲数式、化学式、表等があります▼( I ) (式中、R^1、R^2、R^3及びXは前記と同義で
ある)で表される化合物の3、4位シス体の製造法。
(1) Formula (II) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(II) (In the formula, R^1 is a carboxy protecting group commonly used in the chemistry of synthetic penicillins or synthetic cephalosporins, and R^
2 is lower alkyl or phenyl, R^3 is lower alkyl) and the compound represented by formula (III) X-CH_2COCl(III) (wherein, X is phthalimide or azide) Formula (I) characterized by reacting a compound with a compound in the presence of an optically active amine in an inert solvent ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) (In the formula, R^1, R^ 2, R^3 and
(2)式( I )のシス体がさらに3、4位に関する光
学活性体である特許請求の範囲第1項記載の製造法。
(2) The production method according to claim 1, wherein the cis form of formula (I) is further an optically active form regarding the 3- and 4-positions.
(3)式( I )が ▲数式、化学式、表等があります▼ (式中、R^1、R^2、R^3及びXは式( I )に
おけると同義である)で表されることを特徴とする特許
請求の範囲第2項記載の製造法。
(3) Formula (I) is represented by ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, R^1, R^2, R^3 and X have the same meanings as in formula (I)) The manufacturing method according to claim 2, characterized in that:
JP62017735A 1987-01-28 1987-01-28 Production of beta-lactam compound Pending JPS63185994A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62017735A JPS63185994A (en) 1987-01-28 1987-01-28 Production of beta-lactam compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62017735A JPS63185994A (en) 1987-01-28 1987-01-28 Production of beta-lactam compound

Publications (1)

Publication Number Publication Date
JPS63185994A true JPS63185994A (en) 1988-08-01

Family

ID=11952002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62017735A Pending JPS63185994A (en) 1987-01-28 1987-01-28 Production of beta-lactam compound

Country Status (1)

Country Link
JP (1) JPS63185994A (en)

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