JPS63175026A - Novel polyamic acid copolymer - Google Patents
Novel polyamic acid copolymerInfo
- Publication number
- JPS63175026A JPS63175026A JP678887A JP678887A JPS63175026A JP S63175026 A JPS63175026 A JP S63175026A JP 678887 A JP678887 A JP 678887A JP 678887 A JP678887 A JP 678887A JP S63175026 A JPS63175026 A JP S63175026A
- Authority
- JP
- Japan
- Prior art keywords
- polyamic acid
- acid copolymer
- diaminodiphenyl ether
- pyromellitic dianhydride
- polyimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005575 poly(amic acid) Polymers 0.000 title claims description 34
- 239000000126 substance Substances 0.000 claims description 4
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 abstract description 19
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 abstract description 10
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 abstract description 9
- 150000004984 aromatic diamines Chemical class 0.000 abstract description 5
- 229920000642 polymer Polymers 0.000 abstract description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 abstract description 4
- 150000004985 diamines Chemical class 0.000 abstract description 4
- 229920001577 copolymer Polymers 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract 1
- 239000003495 polar organic solvent Substances 0.000 abstract 1
- 229920006122 polyamide resin Polymers 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 description 32
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 239000009719 polyimide resin Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- -1 diamine compound Chemical class 0.000 description 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 235000002597 Solanum melongena Nutrition 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- VIESAWGOYVNHLV-UHFFFAOYSA-N 1,3-dihydropyrrol-2-one Chemical compound O=C1CC=CN1 VIESAWGOYVNHLV-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- FJYCAYKHNVQCJW-UHFFFAOYSA-N 2-[4-[4-(2-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C(=CC=CC=3)N)=CC=2)C=C1 FJYCAYKHNVQCJW-UHFFFAOYSA-N 0.000 description 1
- ZDRNVPNSQJRIRN-UHFFFAOYSA-N 2-amino-5-[2-(4-amino-3-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenol Chemical compound C1=C(O)C(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C(O)=C1 ZDRNVPNSQJRIRN-UHFFFAOYSA-N 0.000 description 1
- JDFAWEKPFLGRAK-UHFFFAOYSA-N 2-amino-5-[2-(4-amino-3-hydroxyphenyl)propan-2-yl]phenol Chemical compound C=1C=C(N)C(O)=CC=1C(C)(C)C1=CC=C(N)C(O)=C1 JDFAWEKPFLGRAK-UHFFFAOYSA-N 0.000 description 1
- HUWXDEQWWKGHRV-UHFFFAOYSA-N 3,3'-Dichlorobenzidine Chemical group C1=C(Cl)C(N)=CC=C1C1=CC=C(N)C(Cl)=C1 HUWXDEQWWKGHRV-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical group C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- WECDUOXQLAIPQW-UHFFFAOYSA-N 4,4'-Methylene bis(2-methylaniline) Chemical compound C1=C(N)C(C)=CC(CC=2C=C(C)C(N)=CC=2)=C1 WECDUOXQLAIPQW-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- IBOFVQJTBBUKMU-UHFFFAOYSA-N 4,4'-methylene-bis-(2-chloroaniline) Chemical compound C1=C(Cl)C(N)=CC=C1CC1=CC=C(N)C(Cl)=C1 IBOFVQJTBBUKMU-UHFFFAOYSA-N 0.000 description 1
- CBEVWPCAHIAUOD-UHFFFAOYSA-N 4-[(4-amino-3-ethylphenyl)methyl]-2-ethylaniline Chemical compound C1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=CC=2)=C1 CBEVWPCAHIAUOD-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- UTDAGHZGKXPRQI-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 UTDAGHZGKXPRQI-UHFFFAOYSA-N 0.000 description 1
- IMQPYWDGCXNKNE-UHFFFAOYSA-N 4-phenylbenzene-1,2,3,5-tetramine Chemical compound NC1=C(N)C(N)=CC(N)=C1C1=CC=CC=C1 IMQPYWDGCXNKNE-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- 241000219112 Cucumis Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000004986 phenylenediamines Chemical class 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、耐熱性樹脂として知られるポリイミド樹脂の
前駆体である新規なポリアミド酸共重物に関する。詳し
くは、優れた熱的寸法安定性と、優れた引張特性を有す
るポリイミド樹脂を製造するための前駆体として使用さ
れる新規なポリアミド酸共重合体に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a novel polyamic acid copolymer which is a precursor of a polyimide resin known as a heat-resistant resin. In particular, the present invention relates to a novel polyamic acid copolymer used as a precursor for producing polyimide resins having excellent thermal dimensional stability and excellent tensile properties.
(従来の技術)
従来、ポリイミド樹脂は高度の耐熱性、耐薬品性、電気
的特性、機械的特性、その他優れた品持性を貞゛シてい
ることが知られており、例えば、特公昭36−1099
9に見られるような、4゜4′−ジアミノジフェニルエ
ーテルとピロメリット酸2無水物からなるポリアミド酸
を使用して得られるポリイミド膜は、従来から広く使用
されており、伸度などの機械的特性に優れているが、一
般に線膨張係数が大きく、熱的寸法安定性が悪いことが
知られている。一方、バラフェニレンジアミンとピロメ
リット酸2無水物からなるポリアミト酸を使用して得ら
れるポリイミド膜は、線膨張係数が小さく熱的寸法安定
性に優れるものの、非常に脆弱であり、フィルムとして
の実用性に欠け、実際に工業的に使用できないという欠
点を有していた。(Prior art) Polyimide resins have conventionally been known to have a high degree of heat resistance, chemical resistance, electrical properties, mechanical properties, and other excellent properties. 36-1099
Polyimide membranes obtained using polyamic acid consisting of 4゜4'-diaminodiphenyl ether and pyromellitic dianhydride, as shown in Figure 9, have been widely used and have excellent mechanical properties such as elongation. However, it is known that it generally has a large coefficient of linear expansion and poor thermal dimensional stability. On the other hand, polyimide films obtained using polyamic acid consisting of phenylene diamine and pyromellitic dianhydride have a small coefficient of linear expansion and excellent thermal dimensional stability, but are extremely brittle and cannot be used for practical use as films. It had the disadvantage that it lacked properties and could not be used industrially.
しかしながら近年、より優れた熱的寸法安定性を有し、
しかも伸度等の機械的特性に優れたポリイミド樹脂に対
する要求が高まってきており、この目的で種々の検討か
行われている。例えば、特開昭61−158025では
ビフェニルテトラカルボン酸成分を用いることで伸度な
どの機械的特性を改良しようと試みているか、このビフ
ェニルテトラカルボン酸成分を用いることにより、伸度
などi械的特性は改良される。しかしながら生成するポ
リイミド樹脂に熱軟化が発現し、従来のポリイミドの優
れた耐熱性を損なうなどの欠点を宵しており、更には引
っ張り試験時の降伏点が発生し耐応力歪か大きく、使用
時に変形する等の問題を有している。またこのポリイミ
ド樹脂はアルカリ不溶となり、アルカリエツチング等の
後処理もしくは後加工の工程に於てその加工性が著しく
劣るという欠点も有する。However, in recent years, with better thermal dimensional stability,
Moreover, there is an increasing demand for polyimide resins having excellent mechanical properties such as elongation, and various studies are being conducted for this purpose. For example, in JP-A-61-158025, an attempt was made to improve mechanical properties such as elongation by using a biphenyltetracarboxylic acid component; Properties are improved. However, the resulting polyimide resin suffers from thermal softening, which impairs the excellent heat resistance of conventional polyimides.Furthermore, the yield point occurs during tensile tests, and the stress-strain resistance is high. It has problems such as deformation. This polyimide resin also has the disadvantage that it is insoluble in alkali and has extremely poor processability in post-treatment or post-processing steps such as alkali etching.
また例えば、特開昭58−185624に見られるよう
に、ジアミン成分としてジメチルベンジンを導入し、熱
的寸法安定性を改良する方法も提案されているが、この
場合には側鎖のメチル基が生成するポリイミド樹脂の耐
熱性を阻害し、更にはこうして得られたポリイミド膜は
機械的強度に劣り脆くなることが知られている。For example, as seen in JP-A-58-185624, a method has been proposed in which dimethylbenzine is introduced as a diamine component to improve thermal dimensional stability, but in this case, the methyl group in the side chain is It is known that this impairs the heat resistance of the polyimide resin produced, and that the polyimide film thus obtained has poor mechanical strength and becomes brittle.
(発明が解決しようとする問題点)
従来ひろく使用されているポリイミド樹脂は線膨張係数
が約3 X 105℃−1と大きく、熱的寸法安定性か
悪く、金属などと積層したばあいにいわゆる反りやカー
ルを生ずる等の問題点を有していた。(Problems to be Solved by the Invention) Polyimide resins that have been widely used in the past have a large linear expansion coefficient of about 3 x 105°C-1, have poor thermal dimensional stability, and when laminated with metal etc. It had problems such as warping and curling.
これに対して、線膨張係数を金属に近ずけるため種々の
試みがなされているが、いずれも得られるポリイミド膜
は機械的強度や耐熱性や耐薬品性等に問題を生じ実用に
は至っていない。In response, various attempts have been made to bring the coefficient of linear expansion closer to that of metals, but the resulting polyimide films have problems with mechanical strength, heat resistance, chemical resistance, etc., and have not been put to practical use. not present.
(問題点を解決するための手段)
−1−記問題点を解決するため本発明者らは鋭意検討の
結果、一般式
て表される反復単位を包含するポリアミド酸共重合体よ
り得られたポリイミドが従来広く用いられているポリイ
ミドの耐熱性、機械的強度等の品持性を維持しつつ線膨
張係数を減少し、熱的寸法安定性が改良されることを見
出した。(Means for Solving the Problems) In order to solve the problems described in -1-, the present inventors have conducted intensive studies, and as a result, a polyamic acid copolymer containing repeating units represented by the general formula It has been found that polyimide can reduce the linear expansion coefficient and improve thermal dimensional stability while maintaining properties such as heat resistance and mechanical strength of conventionally widely used polyimides.
このポリアミド酸共重合体の構成について詳しく説明す
ると、上記反復単位A)と、上記反復単位(B)とが、
共重合体中に(A): (B)がモル比で10:90
から80 : 20まで、好ましくは30 : 70か
ら70 : 30までの割合で存在することが望ましい
。To explain in detail the structure of this polyamic acid copolymer, the repeating unit A) and the repeating unit (B) are
(A):(B) in the copolymer in a molar ratio of 10:90
It is desirable that they be present in a ratio of from 30:70 to 70:30, preferably from 30:70 to 70:30.
反復単位(A)のモル比が90%を越えると、」(重合
物を得ることは1■能であるか、得られるポリイミド膜
は熱的寸法安定性の改溌効果か小さい。When the molar ratio of the repeating unit (A) exceeds 90%, it is difficult to obtain a polymer, or the resulting polyimide film has little improvement in thermal dimensional stability.
一方、反復1′を位(B)がモル比で80%以」二の割
合で存在することも1■能であるが、得られるポリイミ
ド膜は脆弱であり実質−1ニフイルムに形成するのか困
難な場合がある。また、反復111位(A)。On the other hand, it is also possible for the repeating 1' position (B) to exist in a molar ratio of 80% or more, but the resulting polyimide film is fragile and it is difficult to form a substantially -1 film. There are cases where Also, repeat position 111 (A).
(B)の鎖長、即ち繰り返し数をmおよびnとすると、
mおよびnの値は重合体鎖中において種々の値をとるこ
とができ、何ら規制されるものではない。ポリアミド酸
共重合体の分子量については重量平均分子量が2万以上
、さらには10万以上がポリイミドの強度の点で好まし
い。If the chain length of (B), that is, the number of repeats, are m and n,
The values of m and n can take various values in the polymer chain and are not restricted in any way. Regarding the molecular weight of the polyamic acid copolymer, a weight average molecular weight of 20,000 or more, more preferably 100,000 or more is preferable from the viewpoint of the strength of the polyimide.
次に、このポリアミド酸共重合体の製造方法について説
明すると、芳香族ジアミン成分全量に対して20〜90
モル%好ましくは30〜70モル96のパラフェニレン
ジアミンと10〜80モル%好ましくは30〜70モル
06の4.4′−ジアミノジフェニルエーテルとからな
る芳香族ジアミン成分の全量と、ピロメリット酸2無水
物とを実質的に等モル使用し、重合してir:?られる
。Next, to explain the manufacturing method of this polyamic acid copolymer, 20 to 90% of the total amount of aromatic diamine components is
The total amount of the aromatic diamine component consisting of paraphenylenediamine, preferably 30 to 70 mol%, and 4,4'-diaminodiphenyl ether, preferably 30 to 70 mol%, and pyromellitic dianhydride. Using substantially equimolar amounts of ir:? It will be done.
更に詳しく説明すると、4,4′ −ジアミノジフェニ
ルエーテルとP−フェニレンジアミンとのモル比が10
:90から80 : 20、好ましくは30 : 70
から70 : 30の割合で混合された芳香族ジアミン
混合物とこの混合物の総量と実質的に等モルとなるピロ
メリット酸2無水物を使用し、釘機極性溶媒中で実質的
に無水の系にて 0〜100℃、好ましくは5〜80℃
、史に好ましくは5〜500Cの温度で小会して得られ
る。To explain in more detail, the molar ratio of 4,4'-diaminodiphenyl ether and P-phenylenediamine is 10.
:90 to 80:20, preferably 30:70
Using an aromatic diamine mixture mixed in a ratio of 70:30 and pyromellitic dianhydride in an amount substantially equimolar to the total amount of this mixture, a substantially anhydrous system was formed in a nail machine polar solvent. 0~100℃, preferably 5~80℃
, preferably at a temperature of 5 to 500C.
但し、本発明のポリアミド酸共重合体を得るに際し、芳
香族テトラカルボン酸二無水物としてピロメリット酸二
無水物を単独で使用するのが本発明の効果を得るのに最
も望ましいが、例えば、3゜3’ 、4.4’ −ビフ
ェニルテトラカルボン酸二無水物、3.3’ 、4.4
’ −ベンゾフェノンテトラカルボン酸二無水物、ナフ
タレン−1,2゜5.6−二無水物などの四塩基酸の一
部使用も可能である。ピロメリット酸二無水物以外の酸
無水物は本発明のLl的、効果が達成される範囲内の瓜
を使用できるが、全酸無水物に対し5モル%を越えない
は、好ましくは3モル%を越えない巾計が適当である。However, when obtaining the polyamic acid copolymer of the present invention, it is most desirable to use pyromellitic dianhydride alone as the aromatic tetracarboxylic dianhydride in order to obtain the effects of the present invention. 3゜3', 4.4'-biphenyltetracarboxylic dianhydride, 3.3', 4.4
It is also possible to use some of the tetrabasic acids such as -benzophenonetetracarboxylic dianhydride and naphthalene-1,2°5.6-dianhydride. Acid anhydrides other than pyromellitic dianhydride can be used within the range that achieves the practical effects of the present invention, but the amount does not exceed 5 mol %, preferably 3 mol % based on the total acid anhydride. A width meter that does not exceed % is appropriate.
また、芳香族ジアミン成分として4゜4′−ジアミノジ
フェニルエーテルとパラフェニレンジアミンの二種のジ
アミンのみを使用するのが本発明の効果を得るのに最も
望ましいが、一般式、
H2N−R−NH2
(式中、Rは二価の有機基)
で表されるジアミン化合物、例えば、4.4’ −ビス
(4−アミノフェノキシ)ビフェニル、4゜4′−ジア
ミノジフェニルスルホン、3.3’ −ジアミノジフェ
ニルスルホン、ビス[4−(4−アミノフェノキシ)フ
ェニル]スルホン、ビス[4−(3−アミノフェノキシ
)フェニル]スルホン、ビス[4−(2−アミノフェノ
キシ)フェニル]スルホン、1,4−ビス(4−アミノ
フェノキシ)ベンゼン、1.3−ビス(4−アミノフェ
ノキシ)ベンゼン、1.3−ビス(3−アミノフェノキ
シ)ベンゼン、1.4−ビス(4−アミノフェニル)ベ
ンゼン、ビス[4−(4−アミノフェノキシ)フェニル
コニ−チル、4.4’ −ジアミノジフェニルメタン、
ビス(3−エチル−4−アミノフェニル)メタン、ビス
(3−メチル−4−アミノフェニル)メタン、ビス(3
−クロロ−4−アミノフェニル)メタン、3.3’ −
ジアミノジフェニルスルホン、4.4’ −ジアミノジ
フェニルスルホン、3.3’−ジメトキシ−4゜4′−
ジアミノジフェニル、3.3’ −ジメチル−4,4’
−ジアミノビフェニル、3.3′−ジクロロ−4,4′
−ジアミノビフェニル、 2゜2’ 、5.5’−テト
ラクロロ−4,4′−ジアミノビフェニル、3,3′
−ジカルボキシ−4゜4′−ジアミノビフェニル、3.
3’ −ジヒドロキシ−4,4′−ジアミノビフェニ
ル、4,4′〜ジアミノジフエニルスルフイド、3.3
’ −ジアミノジフェニルエーテル、3.4’ −ジア
ミノビフェニル、4.4’ −ジアミノオクタフルオロ
ビフェニル、2.4−ジアミノトルエン、メタフェニレ
ンジアミン、2.2−ビス[4−(4−アミノフェノキ
シ)フェニル]プロパン、2.2−ビス[4−(4−ア
ミノフェノキシ)フェニル]ヘキサフルオロプロパン、
2.2−ビス(4−アミノフェニル)プロパン、2.2
−ビス(4−アミノフェニル)へキサフルオロプロパン
、2.2−ビス(3−ヒドロキシ−4−アミノフェニル
)プロパン、2,2−ビス(3−ヒドロキシ−4−アミ
ノフェニル)へキサフルオロプロパン、9゜9−ビス(
4−アミノフェニル)−10−ヒドロ−アントラセン、
オルトトリジンスルホン、3゜3’ 、4.4’−ビフ
ェニルテトラアミン、3゜3’ 、4.4’ −テトラ
アミノジフェニルエーテル等の一部使用も可能である。Further, it is most desirable to use only two types of diamines, 4゜4'-diaminodiphenyl ether and para-phenylene diamine, as aromatic diamine components in order to obtain the effects of the present invention. (wherein R is a divalent organic group) A diamine compound represented by, for example, 4.4'-bis(4-aminophenoxy)biphenyl, 4°4'-diaminodiphenylsulfone, 3.3'-diaminodiphenyl Sulfone, bis[4-(4-aminophenoxy)phenyl]sulfone, bis[4-(3-aminophenoxy)phenyl]sulfone, bis[4-(2-aminophenoxy)phenyl]sulfone, 1,4-bis( 4-aminophenoxy)benzene, 1.3-bis(4-aminophenoxy)benzene, 1.3-bis(3-aminophenoxy)benzene, 1.4-bis(4-aminophenyl)benzene, bis[4- (4-aminophenoxy)phenylconythyl, 4,4'-diaminodiphenylmethane,
Bis(3-ethyl-4-aminophenyl)methane, bis(3-methyl-4-aminophenyl)methane, bis(3
-chloro-4-aminophenyl)methane, 3.3' -
Diaminodiphenylsulfone, 4.4'-diaminodiphenylsulfone, 3.3'-dimethoxy-4゜4'-
Diaminodiphenyl, 3,3'-dimethyl-4,4'
-diaminobiphenyl, 3,3'-dichloro-4,4'
-diaminobiphenyl, 2°2', 5,5'-tetrachloro-4,4'-diaminobiphenyl, 3,3'
-dicarboxy-4°4'-diaminobiphenyl, 3.
3'-dihydroxy-4,4'-diaminobiphenyl, 4,4'-diaminodiphenyl sulfide, 3.3
'-diaminodiphenyl ether, 3.4'-diaminobiphenyl, 4.4'-diaminooctafluorobiphenyl, 2.4-diaminotoluene, metaphenylenediamine, 2.2-bis[4-(4-aminophenoxy)phenyl] Propane, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane,
2.2-bis(4-aminophenyl)propane, 2.2
-bis(4-aminophenyl)hexafluoropropane, 2,2-bis(3-hydroxy-4-aminophenyl)propane, 2,2-bis(3-hydroxy-4-aminophenyl)hexafluoropropane, 9゜9-screw (
4-aminophenyl)-10-hydro-anthracene,
It is also possible to partially use orthotolidine sulfone, 3°3', 4,4'-biphenyltetraamine, 3°3', 4,4'-tetraaminodiphenyl ether, and the like.
4.4′−ジアミノジフェニルエーテルとバラフェニレ
ンジアミン以外の多価アミンは本発明の目的、効果が達
成される範囲内のはを使用できるが、全アミンに対して
10モル%をこえない量、好ましくは5モル%を越えな
い小計が適当である。4. Polyvalent amines other than 4'-diaminodiphenyl ether and phenylenediamine may be used within the range that achieves the objectives and effects of the present invention, but preferably in an amount not exceeding 10 mol% based on the total amines. It is appropriate that the subtotal does not exceed 5 mol%.
ここで該ポリアミド酸共重合体の生成反応に使用される
HFab性溶媒としては、例えば、ジメチルスルホキシ
ド、ジエチルスルホキシドなどのスルホキシド系溶媒、
N、N−ジメチルホルムアミド、N、N−ジエチルホル
ムアミドなどのホルムアミド系溶媒、N、N−ジメチル
アセトアミド、N、N−ジエチルアセトアミドなどのア
セトアミド系溶媒、N−メチル−2−ピロリドン、N−
ビニル−2−ピロリドンなどのピロリドン系溶媒、フェ
ノール、0−1m−1またはp−クレゾール、キシレノ
ール、ハロゲン化フェノール、カテコールなどのフェノ
ール系溶媒、あるいはへキサメチルホスホルアミド、γ
−ブチロラクトンなどを挙げることかでき、これらを1
11独または混合物として用いるのが望ましいが、更に
はキシレン、)・ルエンのような男香族炭化水素の使用
も可能である。Examples of the HFab solvent used in the production reaction of the polyamic acid copolymer include sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide;
Formamide solvents such as N,N-dimethylformamide and N,N-diethylformamide, acetamide solvents such as N,N-dimethylacetamide and N,N-diethylacetamide, N-methyl-2-pyrrolidone, N-
Pyrrolidone solvents such as vinyl-2-pyrrolidone, phenol, 0-1m-1 or p-cresol, xylenol, halogenated phenols, phenolic solvents such as catechol, or hexamethylphosphoramide, γ
-butyrolactone, etc., and these
Although it is preferable to use them as hydrocarbons or as a mixture, it is also possible to use aromatic hydrocarbons such as xylene and luene.
また、このポリアミド酸共重合体は各々前記の角′機極
性溶媒中に5〜40重量%、好ましくは10〜30市量
%溶解されているのか取り扱いの面からも望ましい。Further, it is desirable from the viewpoint of handling that each of the polyamic acid copolymers is dissolved in the above-mentioned polar polar solvent from 5 to 40% by weight, preferably from 10 to 30% by weight.
かくして得られたポリアミド酸ノ」ミ重合体溶液は流延
または塗布してて膜状と成し、その膜を乾燥すると共に
該ポリアミド酸を熱的あるいは化学的に脱水閉環(イミ
ド化)してポリイミド膜を形成することができる。本発
明のポリアミド酸共重合物から得られたポリイミド膜は
、極めて優れた熱的寸法安定性を角゛し、しかも従来公
知のポリイミド樹脂と同様に、伸度などの機械的特性に
優れている。The thus obtained polyamic acid polymer solution is cast or coated to form a film, and the film is dried and the polyamic acid is thermally or chemically dehydrated and ring-closed (imidized). A polyimide film can be formed. The polyimide film obtained from the polyamic acid copolymer of the present invention has extremely excellent thermal dimensional stability and, like conventionally known polyimide resins, has excellent mechanical properties such as elongation. .
(実施例)
以−ド、実施例により本発明を具体的に説明するが、本
発明はこれら実施例のみに限定されるものではない。(Examples) Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited only to these Examples.
比較例1
5υOml四ツ目フラスコに4.4′ −ジアミノジフ
ェニルエーテル21.549を採取し、245.009
のN、N−ジメチルアセトアミドを加え溶解した。他/
;、100m1ナスフラスコにピロメリット酸二無水物
23.469を採取し、前記4.4’ −ジアミノジフ
ェニルエーテル溶液中に固形状で添加した。さらに、こ
の100mlナスフラスコ中の壁面に付着残存するピロ
メリット酸二無水物を10.009のN、N’−ジメチ
ルアセトアミドで反応系(四ツロフラスコ)内へ流し入
れた。史に引き続き1時間型はんを続け、15 ff’
、’ kkL 96のポリアミド酸溶液を得た。反応温
度は5−10℃に保った。但し以]二の操作でピロメリ
ット酸二無水物の取り扱い及び反応系内は乾燥窒素気流
下に置いた。Comparative Example 1 21.549 of 4.4'-diaminodiphenyl ether was collected in a 5υOml four-eye flask, and 245.009
of N,N-dimethylacetamide was added and dissolved. other/
23.469 pyromellitic dianhydride was collected in a 100 ml eggplant flask and added in solid form to the 4,4'-diaminodiphenyl ether solution. Furthermore, the pyromellitic dianhydride remaining attached to the wall of this 100 ml eggplant flask was poured into the reaction system (four-sided flask) with 10.009 N,N'-dimethylacetamide. Continuing with history, we continued to katahan for 1 hour, and 15 ff'
,' kkL 96 polyamic acid solution was obtained. The reaction temperature was kept at 5-10°C. However, in the second operation, the handling of pyromellitic dianhydride and the inside of the reaction system were placed under a stream of dry nitrogen.
次にこれらのポリアミド酸溶液をガラス板状に流延塗布
し約100℃にて約60分間乾燥後、ポリアミド酸塗膜
をガラス板よりノリし、その塗膜を支持枠に固定し、そ
の後約100 ’Cで約30分間、約200℃で約60
分間、約300℃で約60分間加熱し、脱水閉環乾燥後
15から25ミクロンのポリイミド膜を?l?だ。この
フィルムは以下の性質を示した。Next, these polyamic acid solutions were cast onto a glass plate, dried at about 100°C for about 60 minutes, the polyamic acid coating was glued onto the glass plate, the coating was fixed to a support frame, and then about 100'C for about 30 minutes, about 200'C for about 60 minutes
After heating at about 300°C for about 60 minutes, dehydrating and ring-closing drying, a polyimide film of 15 to 25 microns is formed. l? is. This film exhibited the following properties.
線膨張係数(at 200℃) 3.5 Xl05(
’C−’ )伸 度
85.7%比較例2
500m1四ツロフラスコにパラフェニレンジアミン1
4.91 gを採取し、245.009のN、N−ジメ
チルアセトアミドを加え溶解し、比較例1の方法に従い
30.099のどロメリット酸二無水物を反応させ、1
5重量%のポリアミド酸溶液をiす1こ。Linear expansion coefficient (at 200℃) 3.5 Xl05 (
'C-') Elongation
85.7% Comparative Example 2 Paraphenylenediamine 1 in a 500m1 four-way flask
4.91 g was collected, 245.009 N,N-dimethylacetamide was added and dissolved, and 30.099 g of romellitic dianhydride was reacted according to the method of Comparative Example 1.
Add 1 cup of 5% by weight polyamic acid solution.
但し、最終の壁面に併行残存するピロメリット酸二無水
物は10gのN、N−ジメチルアセトアミドで反応系(
四ツロフラスコ)内へ流し入れた。However, the pyromellitic dianhydride remaining on the final wall surface can be reacted with 10 g of N,N-dimethylacetamide (
Pour the mixture into a Yotsuro flask).
次に比較例1の方法に従い、これらのポリアミド酸溶液
よりポリイミド膜を得たか、これらのフィルムは脆弱で
ありその性質を測定することはできなかった。Next, polyimide films were obtained from these polyamic acid solutions according to the method of Comparative Example 1, but these films were so brittle that their properties could not be measured.
実施例1
500ml四ツロフラスコにパラフェニレンジアミン2
.79g及び4,4′−ジアミノジフェニルエーテルI
Q、319を採取し、1G0.QlのN、N−ジメチル
アセトアミドを加え溶解し、比較例1の方法に従い16
.90 gのピロメリット酸二無水物を反応させ、15
重量06のポリアミド酸溶液を得た。Example 1 Paraphenylenediamine 2 was placed in a 500ml four-way flask.
.. 79g and 4,4'-diaminodiphenyl ether I
Q, 319 was collected, 1G0. Add and dissolve N,N-dimethylacetamide of Ql, and add 16% according to the method of Comparative Example 1.
.. 90 g of pyromellitic dianhydride was reacted and 15
A polyamic acid solution having a weight of 06 was obtained.
但し、最終の壁面に付ン゛1残(fするピロメリット酸
二無水物は10.009のN、N−ジメチルアセトアミ
ドで反応系(四ツ目フラスコ)内へ流し入れた。However, the remaining pyromellitic dianhydride attached to the final wall was poured into the reaction system (four-eye flask) with 10.009 N,N-dimethylacetamide.
次に比較例1の方法に従い、これらのポリアミド酸溶液
よりポリイミド膜を得た。これらのフィルムは以下の性
質を示した。Next, according to the method of Comparative Example 1, polyimide films were obtained from these polyamic acid solutions. These films exhibited the following properties.
線膨張係数(at 200℃) 2.OXIO’
じC−1)伸 度
25.0%実施例2
5υυm1四ツ目フラスコにパラフェニレンジアミン4
.359及び4.4′−ジアミノジフェニルエーテル8
.07gを採取し、180.009のN、N−ジメチル
アセトアミドを加え溶解し、比較例1の方法に従い17
.589のピロメリット酸二無水物を反応させ、15
iTi、’ Q%のポリアミド酸溶液を得た。Coefficient of linear expansion (at 200°C) 2. OXIO'
C-1) Elongation
25.0% Example 2 Paraphenylenediamine 4 in 5υυm 1 four-eye flask
.. 359 and 4,4'-diaminodiphenyl ether 8
.. 07g was collected, 180.009 N,N-dimethylacetamide was added and dissolved, and 17g was collected according to the method of Comparative Example 1.
.. 589 pyromellitic dianhydride is reacted, 15
A polyamic acid solution containing iTi,'Q% was obtained.
但し、最終の壁面に付着残存するピロメリット酸二無水
物は10.00 gのN、N−ジメチルアセトアミドで
反応系(四ツ目フラスコ)内へ流し入れた。However, the pyromellitic dianhydride remaining on the final wall was poured into the reaction system (four-eye flask) with 10.00 g of N,N-dimethylacetamide.
次に比較例1の方法に従い、これらのポリアミド酸溶液
よりポリイミド膜を得た。これらのフィルムは以下の性
質を示した。Next, according to the method of Comparative Example 1, polyimide films were obtained from these polyamic acid solutions. These films exhibited the following properties.
線膨張係数(a【200℃) 0.9 Xl05(’
C−’ )仲 戊
20 、096実施例3
500ml四ツロフラスコにパラフェニレンジアミンG
、OGg及び4.4′−ジアミノジフェニルエーテル5
.etgを採取し、L60.OOgのN、N−ジメチル
アセトアミドを加え溶解し、比較例1の方法に従い18
.33 ’Jのピロメリット酸二無水物を反応させ、1
5市量%のポリアミド酸溶液を得た。Linear expansion coefficient (a [200℃) 0.9 Xl05('
C-') Nakao
20,096 Example 3 Paraphenylenediamine G in a 500ml four-way flask
, OGg and 4,4'-diaminodiphenyl ether 5
.. etg was collected and L60. OOg of N,N-dimethylacetamide was added and dissolved, and according to the method of Comparative Example 1, 18
.. 33'J of pyromellitic dianhydride is reacted, 1
A polyamic acid solution having a market weight of 5% was obtained.
但し、最終の壁面に付γ;残存するピロメリット酸二無
水物はto、oo gのN、N−ジメチルアセトアミド
で反応系(四ツ目フラスコ)内へ流し入れた。However, the remaining pyromellitic dianhydride was poured into the reaction system (four-eye flask) with to, oo g of N,N-dimethylacetamide.
次に比較例1のh′法に従い、これらのポリアミド酸溶
液よりポリイミド膜を?1)た。これらのフィルムは以
下の性質を示した。Next, according to the h' method of Comparative Example 1, a polyimide film was prepared from these polyamic acid solutions. 1) It was. These films exhibited the following properties.
線膨張係数(at 200°C) 0.3 xlOJ
5(”C−1)伸 度
20.0%実施例4
500m1四ツ目フラスコにパラフェニレンジアミン0
.9G9及び4,4′−ジアミノジフェニルエーテル4
.309を採取し、1[io、009のN、N−ジメチ
ルアセトアミドを加え溶解し、比較例1の方法に従い1
8.04 gのピロメリット酸二無水物を反応させ、1
5重量%のポリアミド酸溶液を得た。Linear expansion coefficient (at 200°C) 0.3 xlOJ
5 (“C-1) Elongation
20.0% Example 4 Paraphenylenediamine 0 in a 500m 1 four-eye flask
.. 9G9 and 4,4'-diaminodiphenyl ether 4
.. 309 was collected, 1[io, 009 N,N-dimethylacetamide was added and dissolved, and 1
8.04 g of pyromellitic dianhydride was reacted and 1
A 5% by weight polyamic acid solution was obtained.
但し、最終の壁面に付着残存するピロメリット酸二無水
物はto、oo gのN、N−ジメチルアセトアミドで
反応系(四ツ目フラスコ)内へ流し入れた。However, the pyromellitic dianhydride remaining on the final wall was poured into the reaction system (four-eye flask) with to, oo g of N,N-dimethylacetamide.
次に比較例1の方法に従い、これらのポリアミド酸溶液
よりポリイミド膜を得た。これらのフィルムは以下の性
質を示した。Next, according to the method of Comparative Example 1, polyimide films were obtained from these polyamic acid solutions. These films exhibited the following properties.
線膨張係数(at 200°C) 3.OxlO′5
(℃’ )仲 瓜
30,0%実施例5
実施例2の方法により得られたポリアミド酸溶液に、無
水酢酸33.11fi ’;j及びピリジン5.329
を加えた。Coefficient of linear expansion (at 200°C) 3. OxlO′5
(℃')Chinese melon
30.0% Example 5 To the polyamic acid solution obtained by the method of Example 2, 33.11 fi';j of acetic anhydride and 5.329 % of pyridine were added.
added.
次にこれらのポリアミド酸溶液組成物をガラス板状に流
延塗布し約100℃にて約10分間乾燥後、この半硬化
状塗膜をガラス板より剥し、その塗膜を支持枠に固定し
、その後約200℃で約10分間、約300℃で約20
分間加熱し、15から25ミクロンのポリイミド膜を得
た。これらのフィルムは以下の性質を示した。Next, these polyamic acid solution compositions were cast-coated onto a glass plate, dried at about 100°C for about 10 minutes, and then this semi-cured coating film was peeled off from the glass plate, and the coating film was fixed to a support frame. , then at about 200℃ for about 10 minutes, and at about 300℃ for about 20 minutes.
Heating was performed for a minute to obtain a polyimide film of 15 to 25 microns. These films exhibited the following properties.
線膨張係数(at 200℃) 0.9 XIO’
(℃1)仲 度 3
0.0%以上の結果を下表にまとめる。Linear expansion coefficient (at 200℃) 0.9 XIO'
(℃1) Naka degree 3
The results of 0.0% or more are summarized in the table below.
表
表から明らかなように本発明のポリアミド酸共重合体か
ら得られるポリイミド膜は小さい線膨張係数とすぐれた
伸び特性をあわせもつことが明らかである。As is clear from the table, the polyimide film obtained from the polyamic acid copolymer of the present invention has both a small coefficient of linear expansion and excellent elongation properties.
(発明の効果)
本発明のポリアミド酸共重合体から得られるポリイミド
膜は公知のポリイミド膜より線膨張係数か小さく、熱的
寸法安定性に優れており、更には公知の線膨張係数を小
さく改良したポリイミド膜が釘しj17なかった柔軟性
と耐熱性と加工性とを併せ持つという効果を奏する。(Effects of the Invention) The polyimide film obtained from the polyamic acid copolymer of the present invention has a smaller linear expansion coefficient than known polyimide films, has excellent thermal dimensional stability, and has further improved the known linear expansion coefficient to a smaller value. This polyimide film has unprecedented flexibility, heat resistance, and workability.
Claims (2)
A):(B)が10:90から80:20までの割合で
存在する特許請求の範囲第一項記載のポリアミド酸共重
合体。(2) The repeating unit (A) and the repeating unit (B) are in a molar ratio (
The polyamic acid copolymer according to claim 1, wherein A):(B) is present in a ratio of 10:90 to 80:20.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP678887A JPS63175026A (en) | 1987-01-14 | 1987-01-14 | Novel polyamic acid copolymer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP678887A JPS63175026A (en) | 1987-01-14 | 1987-01-14 | Novel polyamic acid copolymer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63175026A true JPS63175026A (en) | 1988-07-19 |
Family
ID=11647916
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP678887A Pending JPS63175026A (en) | 1987-01-14 | 1987-01-14 | Novel polyamic acid copolymer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63175026A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63254130A (en) * | 1987-04-10 | 1988-10-20 | Mitsubishi Electric Corp | Copolymer of aromatic polyamic acid or ester thereof |
JPH0247137A (en) * | 1988-08-09 | 1990-02-16 | Kanegafuchi Chem Ind Co Ltd | Preparation of polyamic acid |
WO2002014406A1 (en) * | 2000-08-11 | 2002-02-21 | Mitsui Chemicals, Inc. | Novel polyimide and circuit substrate comprising the same |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60210894A (en) * | 1984-04-04 | 1985-10-23 | 日立化成工業株式会社 | Method of producing substrate for flexible printed circuit board |
JPS60210629A (en) * | 1984-04-04 | 1985-10-23 | Hitachi Chem Co Ltd | Production of polyimide molding |
JPS6257916A (en) * | 1985-09-09 | 1987-03-13 | Toray Ind Inc | Copolyimide yarn |
JPS62174230A (en) * | 1986-01-29 | 1987-07-31 | Sumitomo Bakelite Co Ltd | Production of heat-resistant resin |
JPS62253621A (en) * | 1986-04-28 | 1987-11-05 | Hitachi Ltd | polyimide resin |
-
1987
- 1987-01-14 JP JP678887A patent/JPS63175026A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60210894A (en) * | 1984-04-04 | 1985-10-23 | 日立化成工業株式会社 | Method of producing substrate for flexible printed circuit board |
JPS60210629A (en) * | 1984-04-04 | 1985-10-23 | Hitachi Chem Co Ltd | Production of polyimide molding |
JPS6257916A (en) * | 1985-09-09 | 1987-03-13 | Toray Ind Inc | Copolyimide yarn |
JPS62174230A (en) * | 1986-01-29 | 1987-07-31 | Sumitomo Bakelite Co Ltd | Production of heat-resistant resin |
JPS62253621A (en) * | 1986-04-28 | 1987-11-05 | Hitachi Ltd | polyimide resin |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63254130A (en) * | 1987-04-10 | 1988-10-20 | Mitsubishi Electric Corp | Copolymer of aromatic polyamic acid or ester thereof |
JPH0247137A (en) * | 1988-08-09 | 1990-02-16 | Kanegafuchi Chem Ind Co Ltd | Preparation of polyamic acid |
WO2002014406A1 (en) * | 2000-08-11 | 2002-02-21 | Mitsui Chemicals, Inc. | Novel polyimide and circuit substrate comprising the same |
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