JPS63156100A - Production of silicon carbide whisker - Google Patents
Production of silicon carbide whiskerInfo
- Publication number
- JPS63156100A JPS63156100A JP61301970A JP30197086A JPS63156100A JP S63156100 A JPS63156100 A JP S63156100A JP 61301970 A JP61301970 A JP 61301970A JP 30197086 A JP30197086 A JP 30197086A JP S63156100 A JPS63156100 A JP S63156100A
- Authority
- JP
- Japan
- Prior art keywords
- silicon carbide
- carbon black
- reaction
- carbide whiskers
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/005—Growth of whiskers or needles
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Catalysts (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、炭化ケイ素ウィスカーの製造方法に関し、詳
しくは、高純度であって、且つ、直線性にすぐれる針状
炭化ケイ素ウィスカー結晶を高収率にて製造する方法に
関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for producing silicon carbide whiskers, and more specifically, a method for producing acicular silicon carbide whisker crystals of high purity and excellent linearity in a high yield. It relates to a method of manufacturing.
従来の技術
炭化ケイ素ウィスカーは、軽量、高強度、高弾性を有し
、近年、複合材料の強化材として、種々の用途が期待さ
れている。BACKGROUND OF THE INVENTION Silicon carbide whiskers are lightweight, have high strength, and have high elasticity, and have recently been expected to be used in a variety of ways as reinforcing materials for composite materials.
このような炭化ケイ素ウィスカーの製造方法は従来、炭
素を含む原料及びケイ素を含む原料の一方又は両方を気
相にて反応炉内の所定の高温の反応域に供給する気相合
成法と、炭素を含む原料及びケイ素を含む原料として共
に固体を用いる固相合成法とに大別される。気相合成法
は、例えば、特公昭50−18480号公報、特公昭5
2−28757号公報、特公昭52−28759号公報
等に記載されており、また、固相合成法は、例えば、特
開昭58−20799号公報、特開昭58−45918
号公報、特開昭58−145700号公報等に記載され
ている。Conventionally, methods for producing such silicon carbide whiskers include a gas phase synthesis method in which one or both of a carbon-containing raw material and a silicon-containing raw material are supplied in a gas phase to a predetermined high-temperature reaction zone in a reactor; It is broadly divided into solid-phase synthesis methods that use solids as raw materials containing silicon and silicon-containing raw materials. The gas phase synthesis method is described, for example, in Japanese Patent Publication No. 50-18480 and Japanese Patent Publication No. 50-18480.
2-28757, Japanese Patent Publication No. 52-28759, etc., and the solid phase synthesis method is described in, for example, JP-A-58-20799, JP-A-58-45918.
JP-A-58-145700, etc.
上記のような従来の気相合成法は、−1’fflに、針
状結晶を得るには有利であるが、反面、気相原料の利用
率が著しく低い、気相原料が反応炉内で分解し、反応炉
がこれら分解物によって汚染される、更に、生成した炭
化ケイ素ウィスカー中にこれら分解物が混入する等の問
題を有しているので、炭化ケイ素ウィスカーの大量生産
には不適当であり、一方、従来の固相合成法によれば、
ケイ素を含む原料粉末と炭素を含む原料粉末とを混合し
、これを加熱して、主としてこれら粉末間の固相反応に
て直接に炭化ケイ素を生成させるので、粉状、粒状、屈
曲状の炭化ケイ素を多く生成し、直線性にすぐれる炭化
ケイ素ウィスカーを得ることが困難であるほか、得られ
た炭化ケイ素ウィスカーから上記のような異形の炭化ケ
イ素を分離除去することが容易ではない。The conventional gas phase synthesis method as described above is advantageous in obtaining needle-shaped crystals at -1'ffl, but on the other hand, the utilization rate of the gas phase raw material is extremely low, and the gas phase raw material is not used in the reactor. It is unsuitable for the mass production of silicon carbide whiskers because it decomposes, the reactor is contaminated with these decomposed products, and the resulting silicon carbide whiskers are mixed with these decomposed products. However, according to the conventional solid phase synthesis method,
Raw material powder containing silicon and raw material powder containing carbon are mixed and heated, and silicon carbide is directly produced mainly through a solid phase reaction between these powders, so carbonization in powder, granular, and bent shapes is possible. It is difficult to obtain silicon carbide whiskers that produce a large amount of silicon and have excellent linearity, and it is also difficult to separate and remove the above-mentioned irregularly shaped silicon carbide from the obtained silicon carbide whiskers.
そこで、本発明者らは、炭素含有原料として炭素粉末を
用い、ケイ素含有原料として二酸化ケイ素を含有する所
定形状の成形体を用いる方法を既に提案している。この
方法によれば、成形体の反応残分としてのケイ素が生成
する炭化ケイ素ウィスカーに混入することがなく、従っ
て、生成する炭化ケイ素ウィスカーには、その生成時に
副生ずるケイ素及び/又は二酸化ケイ素が微量に混入す
るにすぎない。また、反応残分としての炭素は、反応終
了後に反応生成物を大気中で燃焼させることによって容
易に除去することができるので、高純度の炭化ケイ素ウ
ィスカーを得ることができる。Therefore, the present inventors have already proposed a method in which a carbon powder is used as the carbon-containing raw material and a molded body having a predetermined shape containing silicon dioxide is used as the silicon-containing raw material. According to this method, silicon as a reaction residue of the compact does not mix with the silicon carbide whiskers produced, and therefore, the silicon carbide whiskers produced contain silicon and/or silicon dioxide, which are by-products during the production. Only a small amount is mixed in. Further, carbon as a reaction residue can be easily removed by burning the reaction product in the atmosphere after the reaction is completed, so that highly pure silicon carbide whiskers can be obtained.
本発明者らは、上記の方法について、更に、炭素含有原
料が生成する炭化ケイ素ウィスカーに及ぼす影響につい
て研究を重ねた結果、所定の性質を有するカーボンブラ
ックを炭素含有原料として用いることによって、特に、
直線性及び寸法の一様性にすぐれる針状炭化ケイ素ウィ
スカー結晶を高収率にて得ることができることを見出し
て本発明に至ったものである。The present inventors have further studied the effects of the carbon-containing raw material on the silicon carbide whiskers produced in the above-mentioned method, and found that by using carbon black having predetermined properties as the carbon-containing raw material, in particular,
The present invention was developed based on the discovery that acicular silicon carbide whisker crystals with excellent linearity and uniformity of dimensions can be obtained in high yield.
問題点を解決するための手段
本発明による炭化ケイ素ウィスカーの製造方法は、二酸
化ケイ素を含有する成形体と、BET比表面積t00m
”/g以上、平均粒子径35nm以下、及び嵩密度0.
06〜0.2 g /cm′Jであるカーボンブラック
とを水素ガス雰囲気下に1400〜1700℃の温度に
加熱することを特徴とする。Means for Solving the Problems The method for producing silicon carbide whiskers according to the present invention comprises a molded body containing silicon dioxide and a BET specific surface area t00m.
”/g or more, average particle size of 35 nm or less, and bulk density of 0.
The method is characterized in that carbon black having a concentration of 0.6 to 0.2 g/cm'J is heated to a temperature of 1400 to 1700° C. in a hydrogen gas atmosphere.
本発明の方法において、二酸化ケイ素を含有する成形体
とは、例えば、ケイ石粉、粉状シリカゲル、各種の非晶
質シリカ、沈降性シリカ、粘土等の二酸化ケイ素を含む
原料を適宜の手段、例えば、押出成形、プレス成形、造
粒等の手段によって成形し、板、棒、管、粒乃至球、容
器や箱、線状又はこれらの組み合わせとしての形状を与
えた立体的な固体をいう。この成形体が例えば管状や箱
型の容器等のような成形体であるとき、固体炭素含有原
料を充填するための容器を兼ねさせることができる。In the method of the present invention, the silicon dioxide-containing molded body is defined as a silicon dioxide-containing raw material such as silica powder, powdered silica gel, various amorphous silicas, precipitated silica, clay, etc., by an appropriate means, e.g. A three-dimensional solid that is formed by extrusion molding, press molding, granulation, etc., and given the shape of a plate, rod, tube, particle or sphere, container or box, linear shape, or a combination thereof. When this molded body is a molded body such as a tubular or box-shaped container, it can also serve as a container for filling the solid carbon-containing raw material.
上記二酸化ケイ素含有成形体は、高い収率にて炭化ケイ
素ウィスカーを得るためには、二酸化ケイ素を30重量
%以上含有することが好ましく、特に、40重量%以上
含有することが好ましい。In order to obtain silicon carbide whiskers at a high yield, the silicon dioxide-containing molded article preferably contains silicon dioxide in an amount of 30% by weight or more, particularly preferably 40% by weight or more.
また、本発明においては、炭素含有原料として、特に、
BET比表面積100m”/g以上、平均粒子径35n
m以下、及び嵩密度0.06〜0.2g/cam’であ
るカーボンブラックを用いる。In addition, in the present invention, particularly as carbon-containing raw materials,
BET specific surface area 100m”/g or more, average particle size 35n
Carbon black having a bulk density of 0.06 to 0.2 g/cam' is used.
本発明の方法においては、上記二酸化ケイ素含有成形体
とカーボンブラックとを水素ガス雰囲気下において、例
えば、電気炉のような限られた空間内で所定温度に加熱
して、炭化ケイ素ウィスカーを得るものである。In the method of the present invention, silicon carbide whiskers are obtained by heating the silicon dioxide-containing molded body and carbon black to a predetermined temperature in a limited space such as an electric furnace in a hydrogen gas atmosphere. It is.
かかる本発明の方法においては、炭化ケイ素ウィスカー
は、主として、次のような反応によって生成するものと
みられる。但し、本発明は、反応機構によって何ら制限
されるものではない。In the method of the present invention, silicon carbide whiskers are thought to be mainly produced by the following reaction. However, the present invention is not limited in any way by the reaction mechanism.
C(s) +21h(g) −CHa(g)
(t)SiOz(s) +CICll4
(−= SiO(g) +GO(g) +211z(g
) (21SiO(g) +2C(s) −= 5i
C(s) +CO(g) (3)即ち、先
ず、水素ガスと固体炭素原料とが反応(11によってメ
タンガスを生成し、これが二酸化ケイ素含有成形体の表
面において、反応(2)によって−it化ケイ素ガスが
生成する。次いで、この−酸化ケイ素ガスと炭素との反
応(3)によって、炭化ケイ素が生成する。従って、総
括反応式は、5iOz(s) +3C(s) 5i
C(s) +2CO(g) (41で表わ
されることとなる。C(s) +21h(g) −CHa(g)
(t)SiOz(s) +CICll4
(-= SiO(g) +GO(g) +211z(g
) (21SiO(g) +2C(s) −= 5i
C(s) +CO(g) (3) That is, first, hydrogen gas and solid carbon raw material react (11) to produce methane gas, which is converted into -it on the surface of the silicon dioxide-containing molded body by reaction (2). Silicon gas is produced.Next, silicon carbide is produced by the reaction (3) of this -silicon oxide gas and carbon.Therefore, the overall reaction formula is 5iOz(s) +3C(s) 5i
C(s) +2CO(g) (It will be expressed as 41.
本発明の方法においては、通常、二酸化ケイ素含有成形
体とカーボンブラックは適宜の反応容器内に充填され、
反応炉内で水素雰囲気下に加熱される。第1図はその一
例を示し、反応容器1内に板状の二酸化ケイ素含有成形
体2が間隔をおいて平行に立てられ、その空隙にカーボ
ンブラック3が充填されている。反応容器は例えばアル
ミナ製でもよく、また、高純度炭素製であってもよい。In the method of the present invention, the silicon dioxide-containing molded body and carbon black are usually filled into a suitable reaction vessel,
It is heated in a reactor under a hydrogen atmosphere. FIG. 1 shows an example of this, in which plate-shaped silicon dioxide-containing molded bodies 2 are placed in parallel at intervals in a reaction vessel 1, and carbon black 3 is filled in the gaps. The reaction vessel may be made of, for example, alumina or high-purity carbon.
前記反応式(4)においては、水素は炭化ケイ素の生成
に関与していないが、水素は、炭素のメタンガス化反応
(1)に不可欠であるので、炭素は、水素ガスと高い反
応性を有することが要求される。他方、反応(2)は、
炭素を充填した空間全体にわたってほぼ一様に進行し、
その結果、炭化ケイ素ウィスカーは、この空間全体にわ
たって生成し、他方、この空間以外では殆ど生成しない
。従って、本発明の方法においては、反応温度、雰囲気
ガス、触媒等の反応条件と共に、成形体から生じる一酸
化ケイ素を炭素を充填した反応空間中に所定濃度に保持
することが重要であり、このために、炭素が適度の空隙
をもつ凝集構造を有することが必要である。In the reaction formula (4), hydrogen does not participate in the production of silicon carbide, but since hydrogen is essential for the carbon methane gasification reaction (1), carbon has high reactivity with hydrogen gas. This is required. On the other hand, reaction (2) is
Proceeds almost uniformly throughout the carbon-filled space,
As a result, silicon carbide whiskers form throughout this space, while forming very little outside of this space. Therefore, in the method of the present invention, it is important to maintain the silicon monoxide produced from the compact at a predetermined concentration in the carbon-filled reaction space, as well as reaction conditions such as reaction temperature, atmospheric gas, and catalyst. Therefore, it is necessary for carbon to have an agglomerated structure with appropriate voids.
以上のように、上記の反応においては、水素ガスが炭化
ケイ素ウィスカーの生成に重要な寄与をなし、本発明に
よれば、反応域における雰囲気の水素ガスを常に70%
以上とすることによって、炭化ケイ素ウィスカーの収率
を著しく高めると共に、その針状性を著しく高めること
ができる。反応域における雰囲気を常に70%以上の水
素ガスを含むようにするには、具体的には、例えば、反
応が中に大量の水素を流通させ、上記したように、副生
ずる一酸化炭素の生成に伴う水素濃度の低減を防止する
。水素ガス濃度が70%よりも少ないときは、炭化ケイ
素ウィスカーの収量が著しく低減するのみならず、その
長さも短く、また、粉状や屈曲状等の異形の炭化ケイ素
ウィスカーの生成量が増大する。尚、反応炉が、例えば
、二酸化ケイ素成形体と固体炭素含有原料とを加熱反応
させる反応帯域を含む複数の帯域からなる場合は、本発
明によれば、限られた空間とは、上記反応帯域をいい、
反応炉の少なくともこの帯域の雰囲気を水素濃度70%
以上の雰囲気に保持すればよい。As described above, in the above reaction, hydrogen gas makes an important contribution to the generation of silicon carbide whiskers, and according to the present invention, the hydrogen gas in the atmosphere in the reaction zone is always reduced by 70%.
By doing so, the yield of silicon carbide whiskers can be significantly increased, and the acicularity thereof can be significantly improved. In order to make the atmosphere in the reaction zone always contain 70% or more hydrogen gas, for example, a large amount of hydrogen is passed through the reaction zone, and as mentioned above, carbon monoxide is produced as a by-product. prevent the reduction in hydrogen concentration associated with When the hydrogen gas concentration is less than 70%, not only the yield of silicon carbide whiskers is significantly reduced, but also the length is short, and the amount of silicon carbide whiskers produced in irregular shapes such as powder and bent shapes increases. . In addition, when the reactor is composed of a plurality of zones including a reaction zone in which a silicon dioxide molded body and a solid carbon-containing raw material are heated and reacted, according to the present invention, the limited space is defined as the reaction zone say,
The atmosphere in at least this zone of the reactor has a hydrogen concentration of 70%.
It is sufficient to maintain the above atmosphere.
カーボンブラックのBET比表面積、粒子径及び嵩密度
の三つの物性は、相互に完全に独立した物性ではなく、
相互に関連を有しつつ、水素ガスとの反応性及び凝集構
造を規定する。しかし、これらのうち、BET比表面積
は、カーボンブラックと水素ガスとの接触量をあられす
量であり、主として、気体との反応の指標となる。一方
、平均粒子径及び嵩密度は、カーボンブラックの主とし
て凝集構造の指標となる。ここに、本発明の方法によれ
ば、BET比表面積100m”/g以上、平均粒子径3
5nm以下、及び嵩密度0.06〜0.2g/cm3で
あるカーボンブラックは、水素ガスとの高い反応性をも
ち、前記した条件を満たすために、粉状、粒状、屈曲状
等の異形の副生なしに、針状性の高い炭化ケイ素ウィス
カーを生成することができるのであろう。The three physical properties of carbon black, BET specific surface area, particle size, and bulk density, are not completely independent physical properties from each other;
It defines the reactivity with hydrogen gas and the agglomerated structure while being related to each other. However, among these, the BET specific surface area is an amount that indicates the amount of contact between carbon black and hydrogen gas, and is mainly an index of the reaction with gas. On the other hand, the average particle diameter and bulk density are mainly indicators of the aggregate structure of carbon black. Here, according to the method of the present invention, the BET specific surface area is 100 m''/g or more, the average particle diameter is 3
Carbon black, which has a diameter of 5 nm or less and a bulk density of 0.06 to 0.2 g/cm3, has high reactivity with hydrogen gas, and in order to meet the above conditions, it can be made into irregular shapes such as powder, granules, and bent shapes. It would be possible to produce highly acicular silicon carbide whiskers without producing by-products.
更に、本発明の方法によれば、反応空間を確保するため
の反応促進剤を用いる必要がなく、従つて、炭化ケイ素
ウィスカーの製造において、反応炉壁にこれらが析出付
着することがなく、また、腐食性ガスの発生もないので
、反応炉を損傷させない。Further, according to the method of the present invention, there is no need to use a reaction accelerator to secure a reaction space, and therefore, in the production of silicon carbide whiskers, there is no need to deposit and adhere to the walls of the reactor. Since no corrosive gas is generated, the reactor will not be damaged.
本発明の方法による炭化ケイ素ウィスカーの製造におい
ては、好ましくは反応触媒が用いられる。In the production of silicon carbide whiskers by the method of the invention, preferably a reaction catalyst is used.
反応触媒としては、鉄、ニッケル、コバルト又はこれら
の化合物、例えば、酸化物、硝酸塩、炭酸塩、硫酸塩等
が用いられる。これら化合物は、粉末、水溶液その他適
宜の形態で炭素含有原料粉末に加え、混在せしめられる
。これら触媒は、特に、前記反応(3)を促進して、直
線状で高純度の炭化ケイ素ウィスカーの生成速度を早め
ると共に、その結果として、併発的に生じる望ましくな
い反応を抑制する作用がある。As the reaction catalyst, iron, nickel, cobalt, or compounds thereof, such as oxides, nitrates, carbonates, sulfates, etc., are used. These compounds are added to and mixed with the carbon-containing raw material powder in the form of powder, aqueous solution, or other appropriate form. In particular, these catalysts have the effect of accelerating the reaction (3) and increasing the rate of production of linear, highly pure silicon carbide whiskers, and as a result, suppressing undesirable reactions that occur concurrently.
本発明の方法において、二酸化ケイ素含有成形体と固体
炭素原料とを水素を含む雰囲気下で加熱する温度は、1
300℃以上が好適であり、特に、1400℃以上が好
ましい。1300℃よりも低い温度では、炭化ケイ素ウ
ィスカーの生成が極めて遅く、実用上好ましくないから
である。一方、余りに高温であるときは、反応条件が過
激にすぎて、ウィスカー径が肥大化し、また、ウィスカ
ーに分岐や折れ曲がり等の乱れが発生するようになる。In the method of the present invention, the temperature at which the silicon dioxide-containing molded body and the solid carbon raw material are heated in an atmosphere containing hydrogen is 1
The temperature is preferably 300°C or higher, particularly preferably 1400°C or higher. This is because, at a temperature lower than 1300° C., silicon carbide whisker formation is extremely slow, which is practically undesirable. On the other hand, when the temperature is too high, the reaction conditions are too extreme, the diameter of the whiskers increases, and disturbances such as branching and bending occur in the whiskers.
従って、反応温度は、通常、1700℃以下がよい。ま
た、加熱時間は、特に制限されるものではないが、通常
、0.5〜30時間が適当である。Therefore, the reaction temperature is usually 1700°C or lower. Further, the heating time is not particularly limited, but is usually suitable for 0.5 to 30 hours.
反応時間が余りに短いときは、未反応原料が多量に残留
し、一方、余りに長時間反応させても、炭化ケイ素ウィ
スカーの収量の増加が僅かであるので、生産性及び熱エ
ネルギー費用の観点からみて、何ら利点がないからであ
る。If the reaction time is too short, a large amount of unreacted raw materials will remain; on the other hand, if the reaction is too long, the yield of silicon carbide whiskers will increase only slightly. , because there is no advantage.
上記のように、二酸化ケイ素含有成形体と所定の性質を
有するカーボンブラックとを所定の水素雰囲気下に所定
の温度に加熱した後、これを徐冷若しくは放冷し、好ま
しくは、反応生成物に含まれる余剰の炭素を酸化焼却す
ることによって、通常、綿状の炭化ケイ素ウィスカーを
得ることができる。As described above, after heating the silicon dioxide-containing molded body and carbon black having predetermined properties to a predetermined temperature in a predetermined hydrogen atmosphere, this is slowly cooled or allowed to cool, and preferably, the reaction product is heated to a predetermined temperature. By oxidizing and incinerating the excess carbon contained, flocculent silicon carbide whiskers can usually be obtained.
発明の効果
以上のように、本発明の方法によれば、二酸化ケイ素含
有成形体と所定の物性を有するカーボンブラックとを水
素ガス雰囲気下に加熱するので、針状性の高い炭化ケイ
素ウィスカー結晶を高収率て製造することができる。余
剰の炭素を焼却して得られる炭化ケイ素ウィスカーは、
β型であって、通常、直径0.1〜2 p m、長さ2
0〜500μmである。更に、本発明の方法によれば、
塩化ナトリウムのようなハロゲン化金属からなる反応促
進剤を用いる必要がないので、これらの反応炉壁への付
着や反応炉を腐食させる腐食性ガスの発生もない。Effects of the Invention As described above, according to the method of the present invention, silicon dioxide-containing molded bodies and carbon black having predetermined physical properties are heated in a hydrogen gas atmosphere, so that highly acicular silicon carbide whisker crystals can be formed. It can be produced with high yield. Silicon carbide whiskers obtained by incinerating excess carbon are
β type, usually 0.1 to 2 pm in diameter and 2 pm in length
It is 0 to 500 μm. Furthermore, according to the method of the present invention,
Since there is no need to use a reaction accelerator made of a metal halide such as sodium chloride, there is no need for these to adhere to the walls of the reactor or to generate corrosive gases that corrode the reactor.
実施例
以下に実施例を挙げて本発明を説明するが、本発明はこ
れら実施例によって何ら限定されるものではない。EXAMPLES The present invention will be explained below with reference to Examples, but the present invention is not limited to these Examples in any way.
内法縦横それぞれ130關、深さ5011の高純度炭素
製の箱型反応容器内に二酸化ケイ素95重量%を含む長
さ縦120鶴、横4On、高さ80■lの成形板4枚を
図示したように等間隔に配設し、反応容器の空隙内に第
1表に示す種々の性質を有するカーボンブラック40g
と触媒としての酸化ニッケル0.28 gの均一な混合
物を充填した。Four molded plates containing 95% by weight of silicon dioxide and having a length of 120 cm, a width of 4 On, and a height of 80 μl are shown in a box-shaped reaction vessel made of high-purity carbon with an internal dimension of 130 cm and a depth of 5011 cm. 40 g of carbon black having various properties shown in Table 1 was placed in the cavity of the reaction vessel at equal intervals as shown in Table 1.
and 0.28 g of nickel oxide as a catalyst.
この反応容器の上部開口に高純度炭素製の蓋をし、反応
炉に挿入し、水素ガス雰囲気下で室温から6時間を要し
て1530℃まて昇温し、この温度に4時間保持した後
、室温まで放冷した。反応容器から反応残物としての成
形板を取り除いた後、内容物を集め、これを空気中で6
00℃の温度で4時間燃焼させ、未反応カーボンブラッ
クを焼却除去して、いずれの場合も、淡緑色のβ型炭化
ケイ素ウィスカーを得た。A high-purity carbon lid was placed on the upper opening of the reaction vessel, the vessel was inserted into a reactor, and the temperature was raised from room temperature to 1530°C over 6 hours under a hydrogen gas atmosphere, and maintained at this temperature for 4 hours. Thereafter, it was allowed to cool to room temperature. After removing the molded plate as reaction residue from the reaction vessel, the contents were collected and heated in air for 6 hours.
Burning was carried out for 4 hours at a temperature of 00° C., and unreacted carbon black was removed by incineration, yielding pale green β-type silicon carbide whiskers in each case.
得られた炭化ケイ素ウィスカーの収量、粉状物や屈曲し
たもの等の異形物量、径及び長さを第1表に示す。この
結果から明らかなように、本発明の方法に従って、所定
の性質を有するカーボンブラックを用いることによって
、その種類にかかわらずに、高収率にて針状性の高い炭
化ケイ素ウィスカーを得ることができる。これに対して
、比較例によれば、異形の炭化ケイ素ウィスカーの生成
が多いうえに、収率も低く、更に、未反応カーボンブラ
ックの焼却に長時間を要した。Table 1 shows the yield of the silicon carbide whiskers obtained, the amount of irregularly shaped materials such as powdery and bent ones, the diameter, and the length. As is clear from this result, silicon carbide whiskers with high acicularity can be obtained in high yield by using carbon black having predetermined properties according to the method of the present invention, regardless of its type. can. On the other hand, in the comparative example, many irregularly shaped silicon carbide whiskers were produced, the yield was low, and furthermore, it took a long time to burn off the unreacted carbon black.
第1図は、反応容器に充填された二酸化ケイ素含有成形
体とカーボンブラックとを示す。
1・・・反応容器、2・・・二酸化ケイ素含有成形体、
3・・・カーボンブラック。
特許出願人 株式会社神戸製鋼所
代理人 弁理士 牧 野 逸 部でだ。
〉・
第1図FIG. 1 shows a silicon dioxide-containing molded body and carbon black filled in a reaction vessel. 1... Reaction container, 2... Silicon dioxide-containing molded body,
3...Carbon black. The patent applicant is Kobe Steel, Ltd., and the patent attorney is Itsube Makino. 〉・ Figure 1
Claims (3)
積100m^2/g以上、平均粒子径35nm以下、及
び嵩密度0.06〜0.2g/cm^3であるカーボン
ブラックとを水素ガス雰囲気下に1400〜1700℃
の温度に加熱することを特徴とする炭化ケイ素ウィスカ
ーの製造方法。(1) A molded body containing silicon dioxide and carbon black having a BET specific surface area of 100 m^2/g or more, an average particle diameter of 35 nm or less, and a bulk density of 0.06 to 0.2 g/cm^3 are heated using hydrogen gas. 1400-1700℃ under atmosphere
A method for producing silicon carbide whiskers, the method comprising heating to a temperature of .
とする特許請求の範囲第1項記載の炭化ケイ素ウィスカ
ーの製造方法。(2) The method for producing silicon carbide whiskers according to claim 1, which comprises mixing carbon black with a catalyst.
であることを特徴とする特許請求の範囲第1項記載の炭
化ケイ素ウィスカーの製造方法。(3) The method for producing silicon carbide whiskers according to claim 1, wherein the catalyst is iron, nickel, cobalt, or a compound thereof.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61301970A JPS63156100A (en) | 1986-12-17 | 1986-12-17 | Production of silicon carbide whisker |
US07/096,743 US4873070A (en) | 1986-12-17 | 1987-09-15 | Process for producing silicon carbide whiskers |
DE8787308276T DE3777577D1 (en) | 1986-12-17 | 1987-09-18 | METHOD FOR PRODUCING SILICON CARBIDE WHISKERS. |
EP87308276A EP0272773B1 (en) | 1986-12-17 | 1987-09-18 | Process for production silicon carbide whiskers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61301970A JPS63156100A (en) | 1986-12-17 | 1986-12-17 | Production of silicon carbide whisker |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63156100A true JPS63156100A (en) | 1988-06-29 |
JPH0351678B2 JPH0351678B2 (en) | 1991-08-07 |
Family
ID=17903321
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61301970A Granted JPS63156100A (en) | 1986-12-17 | 1986-12-17 | Production of silicon carbide whisker |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63156100A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5849698A (en) * | 1981-09-21 | 1983-03-23 | Agency Of Ind Science & Technol | Preparation of silicon carbide whisker |
JPS58120599A (en) * | 1982-01-12 | 1983-07-18 | Onoda Cement Co Ltd | Production of beta-silicon carbide whisker |
JPS61127700A (en) * | 1984-11-21 | 1986-06-14 | Tokai Carbon Co Ltd | Manufacture of sic whisker |
-
1986
- 1986-12-17 JP JP61301970A patent/JPS63156100A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5849698A (en) * | 1981-09-21 | 1983-03-23 | Agency Of Ind Science & Technol | Preparation of silicon carbide whisker |
JPS58120599A (en) * | 1982-01-12 | 1983-07-18 | Onoda Cement Co Ltd | Production of beta-silicon carbide whisker |
JPS61127700A (en) * | 1984-11-21 | 1986-06-14 | Tokai Carbon Co Ltd | Manufacture of sic whisker |
Also Published As
Publication number | Publication date |
---|---|
JPH0351678B2 (en) | 1991-08-07 |
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