JPS63131515A - Aligner - Google Patents

Abstract

PURPOSE:To largely improve the accuracy of a pattern to be transferred to the surface of a sample by moving an illumination source and a lens group to expose the sample of large type of rectangular shape with the lens group of small size having excellent distortion rate, etc. CONSTITUTION:After the position of a photomask 3 and a sample 1 are matched in a microscope, etc., an ultraviolet ray (a) is irradiated from an irradiation source 4, and a lens group 2 and the source 4 are moved by a driving mechanism 5 from one end of the photomask 3 to the other end in a direction (b). In this case, the irradiated ultraviolet ray (a) is passed through the photomask 3, an optical path is corrected by the group 2, the pattern of the photomask 3 is focused on the sample 1 and transferred. An exposure amount is controlled by the moving velocity of the group 2 and the source 4. Accordingly, when a photoresist is thick, the moving velocity is decelerated, while when, on the contrary, thin, the velocity is accelerated to obtain an optimum exposure amount.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an exposure apparatus used in a photolithography process for electronic components, and in particular, to an exposure apparatus in which a photomask and a sample are placed apart from each other. The present invention relates to an exposure apparatus in which a group of lenses is provided between the lenses.

[Conventional technology]

Conventionally, this type of exposure apparatus has been used to scan a sample 1. coated with photoresist as shown in FIG. 3. A photomask on which a pattern to be transferred to the sample 1 is drawn; 4. A source of ultraviolet rays; Lens group 2, which images the pattern on the photomask onto the sample surface, is all fixed and the entire area of sample 1 is exposed at once, and this lens is naturally used when exposing a large sample. It was also large.

[Problem that the invention seeks to solve]

Since the above-mentioned exposure apparatus uses a large-diameter lens, the distortion rate of the lens becomes large, and as a result, the accuracy of the pattern transferred to the sample surface is significantly reduced, which is a drawback.

An object of the present invention is to provide an exposure apparatus that improves the accuracy of a pattern transferred onto a sample surface.

[Differences between the invention and the prior art]

In contrast to the above-mentioned conventional exposure apparatus that uses a batch exposure method using large lenses, the present invention uses small, easily manufactured lenses with good performance, and moves a lens group and an ultraviolet irradiation source to expose the sample. It has an original content of exposing the entire area.

[Means for solving problems]

The present invention includes a rectangular sample on which a photoresist with a thickness of several μm to more than 10 μm is formed, a photomask with a pattern to be transferred to the sample formed on one side of a transparent glass plate or plastic film, a lens group located between the sample and the photomask and for forming an image of the pattern of the photomask on the sample surface; a light source such as a mercury lamp or a xenon lamp; and a lens for collimating the light from the light source. , an irradiation source that irradiates the sample with the light through the photomask and the lens group, and a drive mechanism that moves the irradiation source and the lens group parallel to the surface of the photomask. This is an exposure device with

〔Example〕

Next, an embodiment of the present invention will be described with reference to the drawings.

FIG. 1 is an external view of one embodiment of the present invention, and FIG. 2 is a diagram showing the positions of a sample, a lens group, a photomask, and an irradiation source, which are features of the present invention.

A photomask 3 on which a pattern to be transferred to the sample 1 is formed is located above the sample 1 whose surface is coated with a photoresist with a thickness of several micrometers to several micrometers. A lens group 2 is attached between the photomask 3 and the photomask 3 at a position where the pattern of the photomask 3 is imaged on the surface of the sample 1. Further, above the photomask 3, there is an ultraviolet irradiation source 4 equipped with a light source such as a mercury lamp or a xenon lamp, and a lens that parallelizes the light from the light source.
is fixed to the lens group 2 mentioned above.

The lens group 2 and the irradiation source 4 are configured to be moved parallel to the surface of the photomask 3 by a drive mechanism 5 provided at the bottom.

In the embodiment, after moving the irradiation source 4 to the outside of the end face of the photomask 3, the photomask 3 and the sample 1 are
After aligning the position with a microscope etc.

Ultraviolet rays a are irradiated from the irradiation source 4, and the lens group 2 and the irradiation source 4 are moved by the drive mechanism 5 in the direction b from one end of the photomask 3 to the other end.

At this time, the irradiated ultraviolet rays a pass through the photomask 3, and after the optical path is corrected by the lens group 2, the pattern of the photomask 3 is imaged on the surface of the sample 1 and the pattern is transferred.

Further, the exposure amount is controlled by the moving speed of the lens group 2 and the irradiation source 4. Therefore, when the photoresist is thick, the moving speed is slowed down, and when the photoresist is thin, the moving speed is increased to obtain the optimum exposure amount.

〔Effect of the invention〕

As explained above, in the present invention, by moving the irradiation source and the lens group, a large rectangular sample can be exposed with a small lens group with excellent distortion rate, etc., and as a result, the performance of the lens group is improved. This has the effect of significantly improving resolution.

[Brief explanation of the drawing]

Fig. 1 is an external view of the exposure apparatus of the present invention, Fig. 2 is a view showing the positional relationship of the sample, lens group, photomask, and irradiation source in Fig. 1, and Fig. 3 is an external view of the conventional exposure apparatus. be. 1... Sample 2... Lens group 3...
・Photomask 4...Irradiation source 5...Drive mechanism

Claims (1)

[Claims] (1) A rectangular sample with a photoresist with a thickness of several μm to more than 10 μm formed on its surface, and a photomask with a pattern to be transferred to the sample formed on one side of a transparent glass plate or plastic film; a lens group located between the sample and the photomask and for forming an image of the pattern of the photomask on the sample surface; a light source such as a mercury lamp or a xenon lamp; and a lens for collimating the light from the light source. , an irradiation source that irradiates the sample with the light through the photomask and the lens group, and a drive mechanism that moves the irradiation source and the lens group parallel to the surface of the photomask. Exposure equipment.