JPS63103064A - Film forming device - Google Patents

Abstract

PURPOSE:To decrease the contamination in a sample chamber and to permit an easy mainte nance operation such as cleaning of the inside by constructing a vacuum vessel for forming a vapor deposited film on a substrate surface by vacuum deposition and ion beam projection in such a manner that said vessel can be separated to the sample chamber and evaporation source chamber and providing a partition plate having small holes for passage of materials to be evaporated between said chambers. CONSTITUTION:The vacuum vessel 2 is constituted of the sample chamber 16 and the evapora tion source chamber 18 with the partition plate 20 as a boundary. A rotatable holder 4 mounted with a sample 6 is provided in the sample chamber 16 and a high energy ion source 12a and a low energy ion source 12b are provided to both sides in the lower part so that ion beams 14a and 14b can be projected to the sample 6. Evaporation sources 8a, 8b consisting of different materials are provided in the evaporation source chamber 18. The respective materials 10a, 10b to be evaporated are injected from the small holes 22a, 22b of the plate 20 toward the substrate 6 and the vapor deposited film is formed thereon by the combination use of the ion beam projection. Since the holes for the materials to be evaporated of the plate 20 are small, the inside of the chamber 16 is less contaminated by the materials to be evaporated and since the chamber 16 and the chamber 18 are separable, the cleaning in the chamber 16 is extremely easy.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a film forming apparatus for forming a film on the surface of a sample at least by vacuum evaporation or by using vacuum evaporation and ion beam irradiation in combination.

[Conventional technology]

FIGS. 2 and 3 are schematic diagrams showing examples of conventional film forming apparatuses, each of which is capable of using vacuum evaporation and ion beam irradiation in combination.

That is, a sample 6 is housed in a rotary holder 4 in a vacuum container 2 that is evacuated by a vacuum pump (not shown). A film is formed on the surface of the sample 6 by using both the vapor deposition of the evaporated substance 10 from the source 8 and the irradiation of the ion beam 14 from the ion source 12 attached to the vacuum container 2.

(Problems to be Solved by the Invention) However, the conventional film forming apparatus as described above has the following problems.

(2) Almost the entire inside of the vacuum container 2 becomes dirty due to the adhesion of the evaporation substance 10 from the evaporation source 8. By the way, if this is left untreated, the degree of vacuum may deteriorate due to outgas from the adhered substances, or the ion source 1 may be damaged due to the detachment of the adhered substances.
2 or the evaporation source 8, problems such as discharge may occur.

■ Because vacuum container 2 cannot be divided,
Maintenance work such as internal cleaning is difficult.

In addition, during this work, there is a risk that the adhered substances inside the vacuum container 2 will become dust and spread outside, so cleaning work cannot be done in the clean room where the film forming apparatus is normally installed, which makes maintenance work even more difficult. making it difficult.

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a film forming apparatus that minimizes contamination within a vacuum container and allows maintenance work such as cleaning the inside of the vacuum container to be easily performed.

[Means for solving problems]

The film forming apparatus of the present invention divides a vacuum container into a sample chamber side that stores a sample and an evaporation source chamber side that stores an evaporation source, and makes the evaporation source chamber side removable. The present invention is characterized in that it includes a partition plate having an opening for transporting the evaporated substance to the sample and is removable together with the evaporation source chamber, and further includes at least a means for cooling the partition.

[Effect]

Vacuum deposition of the sample in the sample chamber by the evaporation source in the evaporation source chamber is performed through an opening in a partition plate provided between both chambers. Therefore, contamination caused by evaporated substances in the sample chamber can be minimized.

Furthermore, since the evaporation source chamber is made removable, maintenance work such as cleaning the inside of the vacuum container can be easily performed.

〔Example〕

FIG. 1 is a schematic diagram showing a film forming apparatus according to an embodiment of the present invention. Components equivalent to those in FIG. 2 or 3 are given the same reference numerals, and the differences from the conventional example will be mainly explained below.

In this embodiment, the vacuum container 2 is divided into a sample chamber 16 side in which the sample 6 is mounted and stored in the holder 4, and an evaporation source chamber 18 side in which two evaporation sources 8a and 8b are housed in this example. The evaporation source chamber 8 side is made removable, and a partition plate 20 is provided between the two chambers 16 and 18 to partition the two chambers. Reference numerals 17 and 19 are flanges for the split structure, and these parts are vacuum-sealed with an O-ring or the like (not shown). Further, the partition plate 20 is fixed to the flange 19 or the evaporation source chamber 18, and can be removed together with the evaporation source chamber 18.

In this example, a high-energy ion source 12a that can generate an ion beam 14a with high energy (for example, in the range of about LKeV to 5QKeV) and ions with low energy (for example, in the range of about 50eV to IKeV) are placed on the left and right sides of the sample chamber 16. A low-energy ion source 12b that can generate a beam I4b is arranged, and the holder 4 is rotated in the direction of arrow A by the holder driving device 26 to remove both ion sources 12a,
12b and both evaporation sources 8a, 8b, and for this purpose, the temporary partition 20 is provided with a partition 20 that transports the evaporated substance 10a from the evaporation source 8a to the sample 6 facing the high-energy ion source 12a for evaporation. opening 22a for
and sample 6 directed toward the low energy ion m1Zb side.
An opening 22b is provided for transporting and depositing the evaporated substance 10b from the evaporated rAab.

In this case, both openings 22a and 22b have the minimum necessary size, for example, the minimum size necessary to transport at least the evaporated substances 10a and 10b to the sample 6 and a film thickness monitor (not shown) provided in the vicinity thereof. evaporation sources 8a, 8b during evaporation from outside the sample chamber 16.
It is preferable to make the size the minimum necessary to perform the observation.

However, if necessary, the openings 22a and 22b may be divided into a plurality of openings depending on the purpose described above.

Further, the partition plate 20 is provided with a cooling water pipe 24 as a cooling means in order to suppress a temperature rise due to radiant heat from the evaporation sources 3a and 8b. Further, when the evaporation sources 8a and 8b are provided near the side wall of the evaporation source chamber 18, it is preferable to provide the cooling water pipe 24 also on the side wall of the evaporation source chamber 18 as in this example.

In this example, the structure is such that the sample chamber 16 side is fixed to a stand (not shown), and the evaporation source chamber 18 side is lowered toward the sample chamber 16 side.

In the above device, the vacuum container 2 is divided into the sample chamber 6 and the evaporation source chamber 18, and the necessary minimum openings 22a, 2 are provided between the two chambers.
Since the sample chamber 16 is partitioned by the partition plate 20 having 2b, contamination in the sample chamber 16 due to evaporated substances tOa and 10b can be minimized.

In addition, since the evaporation source chamber 18 side is made removable,
Inside the vacuum container 2, that is, the sample chamber 16 and the evaporation source chamber 18
Maintenance work such as cleaning the inside of the machine can be easily performed.

In addition, in conventional devices, internal maintenance work could only be done outside the clean room, but in this device, the inside of the sample chamber 16 hardly gets dirty, so only the easily dirty side of the evaporation source chamber 18 is covered with the partition plate 20. All you have to do is move it to a location other than the clean room and perform maintenance work there, which further simplifies maintenance work.

Furthermore, since the partition plate 20 and even the side walls of the evaporation source chamber can be cooled, outgassing from them is suppressed and good film formation is possible, and the adhesion of adhering substances to them is improved. Since the adhering substances are inhibited, it becomes easy to remove the adhering substances.

In addition, as in this embodiment, the high energy ion source 12a
and a low-energy ion source 12b, the same sample 6
By using the former in the initial stage of film formation and the latter later, it is possible to form a film on the surface of the sample 6 with good adhesion and less radiation damage, which was difficult to do with a single ion source. can.

Incidentally, although the above-mentioned embodiment illustrates a case in which there are two ion sources and two evaporation sources, the number thereof is not limited to this and is arbitrary.

Furthermore, if a film is to be formed on the sample 6 simply by vacuum evaporation, at least an evaporation source may be provided as the film forming means, and an ion source may not necessarily be provided.

〔Effect of the invention〕

As described above, according to the present invention, contamination caused by evaporated substances inside the vacuum container can be minimized, and maintenance work such as cleaning inside the vacuum container can be easily performed.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram showing a film forming apparatus according to an embodiment of the present invention. FIGS. 2 and 3 are schematic diagrams showing examples of conventional film forming apparatuses, respectively. 2... Vacuum container, 6... Sample, 3a, 3b... Evaporation source, 10a, 10b... Evaporation substance, 12a. 12b...Ion source, 16...Sample chamber, 18...
Evaporation source chamber, 20... Partition plate, 22a, 22b... Opening, 24... Cooling water piping.

Claims (1)

[Claims] (1) In a film forming apparatus that includes a vacuum container and at least an evaporation source as a film forming means for a sample stored therein, the vacuum container is separated into a sample chamber side that stores the sample and an evaporation source chamber side that stores the evaporation source. The partition plate is divided so that the evaporation source chamber side is removable, and a partition plate having an opening for transporting the evaporation material from the evaporation source to the sample is provided between the two chambers, which is removable together with the evaporation source chamber. A film forming apparatus further comprising a cooling means provided on at least the partition plate.