JPS6292337A - Holder for wafer - Google Patents
Holder for waferInfo
- Publication number
- JPS6292337A JPS6292337A JP23297185A JP23297185A JPS6292337A JP S6292337 A JPS6292337 A JP S6292337A JP 23297185 A JP23297185 A JP 23297185A JP 23297185 A JP23297185 A JP 23297185A JP S6292337 A JPS6292337 A JP S6292337A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- pins
- chuck
- semiconductor
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Sheets, Magazines, And Separation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は半導体素子の露光装置など半導体素子製造装置
のウェハ保持に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to wafer holding in a semiconductor device manufacturing apparatus such as a semiconductor device exposure device.
従来の半導体素子製造装置のウェハ搬送は、素子保護の
[1的からウェハを表面から保持したハンド等で搬送す
る形をとっていた。しかし製造装置の作動中ウェハを保
持する装置も裏面保持1例えばウェハ固定用チャックに
よる裏面吸着の構成なのでこの装置からウェハ搬送装置
にウェハな移し換える為に、チャックにハンド逃げ部の
切欠きを設けたり、チャック中央部にウェハを上下させ
る為の上下機構を設ける構造をとったりしていた。Wafer transportation in conventional semiconductor device manufacturing equipment has been carried out using hands or the like that hold the wafer from the surface in order to protect the devices. However, since the device that holds the wafer during the operation of the manufacturing device also has a backside suction system, for example, a chuck for fixing the wafer, in order to transfer the wafer from this device to the wafer transfer device, the chuck is provided with a cutout for the hand escape part. Or, a structure was adopted in which a vertical mechanism was installed in the center of the chuck to raise and lower the wafer.
従ってチャック構造が複雑化し、チャック製造上、使用
]−因難であった。又半導体素子の高集積化に伴う焼付
パターンの微細化の要求により、露光装置の投影光学系
は、より高解像度でより低焦点深度の方向に進んでいる
。前記のチャックではその複雑な構造の為にウェハに平
面不良を生じる可能性が高く、これら露光装置用のチャ
ックには用いる事ができないという問題もあった。Therefore, the chuck structure becomes complicated, which causes problems in the manufacture of the chuck. In addition, due to the demand for finer printed patterns as semiconductor devices become more highly integrated, projection optical systems of exposure apparatuses are moving toward higher resolution and lower depth of focus. Due to the complicated structure of the chuck described above, there is a high possibility that flatness defects will occur on the wafer, and there is also the problem that it cannot be used as a chuck for these exposure apparatuses.
本発明の目的は前述従来例の問題を解消し、チャックが
単純構造でもチャックからウェハ保持装置への移し換え
が筒中な操作でできる素f−保護可能な表面保持型ウェ
ハ保持′4装置を提供する43(である。An object of the present invention is to solve the problems of the prior art as described above, and to provide a protective surface-holding type wafer holding device which can be transferred from the chuck to the wafer holding device by an in-cylinder operation even if the chuck has a simple structure. 43 (is.
第1図〜第3図により本発明の−・実施例を説明する。 Embodiments of the present invention will be described with reference to FIGS. 1 to 3.
第1図はウェハのショットレイアウトの図、第2図は本
実施例のウェハ保持装置の乎面図、第3図は同A−A断
面図である。1はウェハ、2は装置本体、3はウェハに
当接するゴム部材、4は吸着したウェハを吸着方向と反
対方向に支持するビン、5はビン4に取4−1けられて
いてビン及びビンに支持されたウェハの位置決めを行な
う為のストッパ、6はビン4を支え、かつエア流量変動
等によって移動するr+r能に1のあるウェハなビン4
で常に支持させる為の板バネ、7と7は板バネ6を取り
付けかつビンを移!llrする為の回転板、8は回転&
7,7を動かす為のリンク、9はウェハに当らないよう
にするバッファプレート、11は回転板7.7を回転さ
せる為の軸でかつウェハ保持装置本体2と回転板7.γ
を結合させる回転軸、12は回転板7.7とリンク8で
構成されたリンク機構を動かすレバー、13は空気もれ
を防ぐカノヘー、a、b、c、dはウェハl」;の非チ
ップ領域である。FIG. 1 is a diagram of a wafer shot layout, FIG. 2 is a top view of the wafer holding device of this embodiment, and FIG. 3 is a sectional view taken along line A-A of the same. 1 is a wafer, 2 is a main body of the apparatus, 3 is a rubber member that comes into contact with the wafer, 4 is a bottle that supports the sucked wafer in the opposite direction to the suction direction, and 5 is a bottle 4-1 attached to the bottle 4. A stopper 6 is used to position the wafer supported by the bin 4, and 6 is a wafer bin 4 that supports the bin 4 and has an r+r ability of 1 to move due to fluctuations in air flow rate, etc.
Attach leaf springs 7 and 6 to always support them and move the bottle! Rotating plate for llr, 8 is rotating &
7, 7, 9 is a buffer plate that prevents it from hitting the wafer, 11 is a shaft for rotating the rotating plate 7.7, and the wafer holding device main body 2 and the rotating plate 7. γ
12 is a lever that moves a link mechanism composed of a rotating plate 7.7 and a link 8, 13 is a lever that prevents air leakage, a, b, c, and d are non-chips of wafer l'; It is an area.
第1図かられかるように略円形の反動ウェハに略正方形
にチップを作ると通常a、b、c、dのような不完全チ
ップ部ができる。この部分はチップ作成には関tせず特
に保護を必要としない。この不完全チップ部にビン4の
先端のゴム部材3を当接させる為本実施例のウェハ保持
装置では第2図に示すような構造をとっている。回転板
7と7は同じ回転軸11のまわりを回転でき、リンク8
を介して接続されている。またリンク8はレバー12と
図のような形で結合している。この為、レバー12を図
乎面の1−下方向に遅動させれば、4つの板バネ6は、
板バネ6に接続されている4つのビン4が常に回転軸1
1に対して軸対称かつ図乎面に向かってに下−左右対称
に一定円周上を溝14にそって動くように遅動する。不
完全チップ部a、b、c、dは一般にウェハ1.1−に
中心軸に対称かつ長方形の4角の位置関係にあるので、
ウェハlに合わせて装置本体2を回転させる市であらゆ
るウェハにおいて不完全チップ部a、b。As shown in FIG. 1, when substantially square chips are formed on a substantially circular recoil wafer, incomplete chip portions such as a, b, c, and d are usually produced. This part is not related to chip fabrication and does not require any particular protection. In order to bring the rubber member 3 at the tip of the bottle 4 into contact with this incomplete chip portion, the wafer holding device of this embodiment has a structure as shown in FIG. 2. Rotating plates 7 and 7 can rotate around the same rotation axis 11, and link 8
connected via. Further, the link 8 is connected to the lever 12 in the form shown in the figure. Therefore, if the lever 12 is moved slowly in the 1-down direction in the drawing, the four leaf springs 6 will
The four pins 4 connected to the leaf spring 6 are always connected to the rotation axis 1.
It moves slowly so as to move along the groove 14 on a constant circumference axially symmetrically with respect to 1 and downwardly and laterally symmetrically toward the drawing plane. Generally, the incomplete chip parts a, b, c, and d are symmetrical about the central axis of the wafer 1.1- and located at the four corners of a rectangle, so
Incomplete chip portions a and b occur in every wafer when the main body 2 of the apparatus is rotated in accordance with the wafer l.
c、d上にビン4を持っていく!11ができる。Bring bottle 4 onto c and d! I can do 11.
第3図により本実施例の保持原理を説明する。The holding principle of this embodiment will be explained with reference to FIG.
不完全チップ部a、b、c、dの位置にし八−12によ
りビン4を位置決めする。次にウェハlが乗っている図
示されていないウェハチャック等を上方、あるいはウェ
ハ保持装置全体を下方に移動し、ビン4のストッパー5
が装置本体2に突き当たるまでビン4をウェハlに押し
つける。この時ピン4の先端のゴム部材3は接触部が非
チップ領域a、b、c、dより十分小さく、又十分な弾
性を有してウェハlに傷等をつけず、更に十分な摩擦係
数を有してウェハlの横ずれを防1にするようにしであ
る。動作完了後エアー注入口15から十分なエア供給を
行なうとエアは図の矢印方向即ち円形の装置本体2の略
半径方向に流れ装置本体2とウェハ1との間の空間が大
気圧より負圧になる、いわゆるベルヌーイの原理により
ウェハlはビン4を押しつける方向に力が働き、ウェハ
lがこの装置に吸着された事になる。装置本体2の吸着
部を図のように円錐形にし、空いた空間にバッファプレ
ートlOをつけているので噴出空気が直接ウェハに当た
って生じる反発力を最小限にできる。この後装置本体2
を必要な場所に移動する事によりウェハlの搬送が可能
である。ウェハチャック−1−のウェハlを」−側のみ
で保持する為チャック側に特別な構造を必要とせず、ウ
ェハ1は不完全チップ部a* b * C+ dLか接
触部がないので−に側から保持しても半導体素子を傷つ
ける事がない。ベルヌーイの原理による吸着保持なので
安定した保持能力が得られる。Position the bottle 4 at the incomplete chip portions a, b, c, and d using 8-12. Next, move the wafer chuck (not shown) on which the wafer l is placed upward, or move the entire wafer holding device downward, and move the stopper 5 of the bin 4.
Push the bottle 4 against the wafer l until it hits the main body 2 of the apparatus. At this time, the contact portion of the rubber member 3 at the tip of the pin 4 is sufficiently smaller than the non-chip areas a, b, c, and d, and has sufficient elasticity so as not to damage the wafer l, and has a sufficient friction coefficient. This is to prevent lateral displacement of the wafer l. After the operation is completed, when sufficient air is supplied from the air inlet 15, the air flows in the direction of the arrow in the figure, that is, approximately in the radial direction of the circular device body 2, and the space between the device body 2 and the wafer 1 is at a negative pressure from atmospheric pressure. According to the so-called Bernoulli principle, a force acts on the wafer l in the direction of pressing the bottle 4, and the wafer l is attracted to this apparatus. The suction part of the apparatus body 2 is shaped conically as shown in the figure, and a buffer plate 10 is provided in the empty space, so that the repulsive force generated when the ejected air directly hits the wafer can be minimized. After this, the device body 2
The wafer l can be transported by moving the wafer l to the required location. Wafer chuck -1- holds wafer l only on the - side, so no special structure is required on the chuck side, and wafer 1 has incomplete chip parts a * b * C+ dL or contact parts, so it is held on the - side. It will not damage the semiconductor element even if it is held in place. Adsorption and retention based on Bernoulli's principle provides stable retention ability.
本実施例ではビン4が可動な構造にしたが、チップ位置
は半導体製造装置に付属するレチクルにより略わかって
いるので、不完全チップ部に必ず当接するような位置で
ビン4を装置本体2に固定し、吸着力向上の為に1i1
14を無くした構造にしてもかまわない。又チャックか
らウェハlを持ちI−げた後、ウェハlのドにハンドを
入れ、搬送をハンドで行なう形をとってもよい。又ベル
ヌーイ吸着の形をとらず、ビン4の先端部ないしゴム部
材3の接触部に不完全チップ部より小さい吸盤等吸着f
段をつけてもよい。ウェハ1−の接触部は不完全チップ
部a、b、c、d以外の非チップ領域、移し換え点の高
さが[1動制御の状態により多少変動のある東かや想さ
れるので、チャックの相対位置がやや高くなるり1を考
えてストッパ5を無くしてもよい。その他の本発明の範
囲内でのあらゆる改良は口f能である。In this embodiment, the bin 4 has a movable structure, but since the chip position is roughly known from the reticle attached to the semiconductor manufacturing equipment, the bin 4 is placed in the equipment main body 2 at a position where it will definitely come into contact with the incomplete chip part. 1i1 to fix and improve suction power
14 may be omitted. Alternatively, after lifting the wafer 1 from the chuck, a hand may be inserted into the wafer 1 and the wafer 1 may be transported by hand. Also, instead of taking the form of Bernoulli suction, a suction cup or the like smaller than the incomplete tip part is attached to the tip of the bottle 4 or the contact part of the rubber member 3.
You can add steps. The contact area of wafer 1- is a non-chip area other than the incomplete chip parts a, b, c, and d, and the height of the transfer point is assumed to vary somewhat depending on the state of the 1-movement control. The stopper 5 may be omitted in consideration of the fact that the relative position of the chuck becomes a little higher. Any other improvements within the scope of the invention are oral functions.
以ト半導体ウェハのl’= 4体側表面の非チップ領域
のみを接触させて保持させる4Gによりウェハチャック
等トに置かれたウェハを、素子を傷つけずに上側から保
持するす1がOf能になり、チャックに搬送用の複雑な
構造を必要としなくなった。Thus, l' = 4 of the semiconductor wafer 4G, which holds only the non-chip area on the body side surface, makes it possible to hold the wafer placed on a wafer chuck from above without damaging the elements. This eliminates the need for a complicated chuck structure for transport.
又、実施例の装置のように非チップ領域より十分小ネい
接触部をもつ支持部材とベルヌーイ吸着手段とを組み合
わせる市により、非チップ領域のみの接触でウェハを保
持する事が可能になった。Furthermore, by combining a support member with a contact portion that is sufficiently smaller than the non-chip area and Bernoulli suction means as in the device of the embodiment, it became possible to hold the wafer by contacting only the non-chip area. .
第1図はショットレイアウトの1例を示す図、第2図は
本実施例のウェハ保持装置の平面図、第3図は第2図に
おけるA−A断面図である。
図中:
l:ウェハ 2:ウエハ保持装置本体3:ゴム
部材 4:ビン
5:ストッパ 6:板バネ
7:回転板 8:リンク
9:軸 lO:バッファプレートll:回転
軸 12ニレバー
13:カバー 14=円周溝
15:エア注入「1
である。FIG. 1 is a diagram showing an example of a shot layout, FIG. 2 is a plan view of the wafer holding device of this embodiment, and FIG. 3 is a sectional view taken along line AA in FIG. 2. In the figure: l: Wafer 2: Wafer holding device main body 3: Rubber member 4: Bottle 5: Stopper 6: Leaf spring 7: Rotating plate 8: Link 9: Axis lO: Buffer plate ll: Rotating shaft 12 Nilever 13: Cover 14 = Circumferential groove 15: Air injection "1".
Claims (3)
加力する加力手段と、前記加力手段により加力された前
記ウェハの非チップ領域の複数点を支持可能な支持手段
とから形成される事を特徴とするウェハ保持装置。(1) Formed from a force applying means that applies force to the semiconductor wafer in the direction of the surface where chips are formed, and a support means capable of supporting multiple points in the non-chip area of the wafer applied by the force applying means. A wafer holding device characterized by:
である事を特徴とする特許請求の範囲第1項に記載のウ
ェハ保持装置。(2) The wafer holding device according to claim 1, wherein the applying means is a suction means for suctioning the wafer.
能である事を特徴とする特許請求の範囲第1項に記載の
ウェハ保持装置。(3) The wafer holding device according to claim 1, wherein the support means is movable parallel to the surface of the wafer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23297185A JPS6292337A (en) | 1985-10-17 | 1985-10-17 | Holder for wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23297185A JPS6292337A (en) | 1985-10-17 | 1985-10-17 | Holder for wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6292337A true JPS6292337A (en) | 1987-04-27 |
Family
ID=16947748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23297185A Pending JPS6292337A (en) | 1985-10-17 | 1985-10-17 | Holder for wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6292337A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS631647A (en) * | 1986-06-23 | 1988-01-06 | Taiyo Tekko Kk | Noncontact adsorbing device |
JP2012099755A (en) * | 2010-11-05 | 2012-05-24 | Disco Abrasive Syst Ltd | Transporting device |
JP2021132154A (en) * | 2020-02-20 | 2021-09-09 | 株式会社荏原製作所 | Substrate holding device |
-
1985
- 1985-10-17 JP JP23297185A patent/JPS6292337A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS631647A (en) * | 1986-06-23 | 1988-01-06 | Taiyo Tekko Kk | Noncontact adsorbing device |
JPH0343175B2 (en) * | 1986-06-23 | 1991-07-01 | Taiyo Tekko Kk | |
JP2012099755A (en) * | 2010-11-05 | 2012-05-24 | Disco Abrasive Syst Ltd | Transporting device |
JP2021132154A (en) * | 2020-02-20 | 2021-09-09 | 株式会社荏原製作所 | Substrate holding device |
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