JPS6291487A - Method for manufacturing dielectric single crystal - Google Patents
Method for manufacturing dielectric single crystalInfo
- Publication number
- JPS6291487A JPS6291487A JP13162586A JP13162586A JPS6291487A JP S6291487 A JPS6291487 A JP S6291487A JP 13162586 A JP13162586 A JP 13162586A JP 13162586 A JP13162586 A JP 13162586A JP S6291487 A JPS6291487 A JP S6291487A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- frame
- dielectric
- pulling
- melt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野1
この発明は、+J−フIイー7(へ麩、08)や石英(
SfOz)’、にどの誘電体の単結晶を製造する方法に
関り−るものである。DETAILED DESCRIPTION OF THE INVENTION "Industrial Application Field 1 This invention is applicable to
This invention relates to a method for producing a single crystal of a dielectric material such as SfOz)'.
[従来のlk術1
誘電体の111結晶は高融点Cあり、またその製造に際
(〕ては汚染を嫌う。そのため、M電体の単結晶を製造
する場合、るつぼ月利として白金、白金・!1ジウム、
まI、:はイリジウムを使用し、さらに引上げ法(こま
って単結晶を成長させていた。[Conventional lk technique 1 The dielectric 111 crystal has a high melting point C, and contamination is disliked during its production.Therefore, when producing a single crystal of the M electric material, platinum, platinum, etc. are used as the crucible monthly rate.・!1 dium,
First,: Iridium was used and a pulling method was used to grow a single crystal.
また、製造される単結晶の断面形状を規定しようと覆る
場合には、E F G (F doe −define
d Film −fed (3rowtt+ )法のよ
うイf方法が採用されていた。In addition, when overlapping to define the cross-sectional shape of the single crystal to be manufactured, E F G (F doe -define
If methods such as the d Film-fed (3rowt+) method were employed.
[発明が解決しようとりる問題点]
しか【ノむがら、ト述のにうな方法に1ま1ス下のよう
な問題点がある。まず、引−I−げ法【・は、−(゛き
あがる単結晶の形状を規定りるJ、−)イヱしのが<、
い。[Problems to be Solved by the Invention] However, there are several problems with the method described above. First, the pulling method [・ is - (J which defines the shape of the single crystal to be pulled up, -) Iishino is <,
stomach.
そのため、最終形状のものにりるに(,11,\らに色
々な加工を施さ/K IJればイ1らヂ、歩留りム低い
。Therefore, if the final shape is subjected to various processing, the yield will be low.
また、この方v2では、あまり人きな渦電勾配を4=J
【)ることがCさヂ、イのl、:め固液界面の安定Mが
低下しがち′Cあ−)lこ。イシノ(この1〜とに起因
i)て、結晶成艮速瓜が遅くイfす、ひいC(よ生産f
’lが劣るようになる。まIこ、結晶の完全度が不−1
分と4【る。In addition, in this case v2, the less popular eddy electric gradient is 4=J
[) The stability M of the solid-liquid interface tends to decrease. Ishino (due to this 1), the speed of crystallization is slow, and the production speed is slow.
'l becomes inferior. Well, the degree of perfection of the crystal is not -1.
Minute and 4 [ru.
一方、E F G ’1k ’C1,L、!、41’l
)A1!れ特性から、対象可能となる杓料おJ、びダ
イの材質に制約がある。On the other hand, E F G '1k 'C1,L,! , 41'l
) A1! Due to these characteristics, there are restrictions on the materials that can be used for the ladle and die.
つまり、たとえばΔa、03リノノフイ’+7&<rど
のような限られたものしかこのツノ法を適用りることが
できない。In other words, this horn method can only be applied to a limited number of cases, such as Δa, 03 linonofi'+7&<r.
イれゆえに、この発明のr]的は、得られる111結晶
の形状を規定Jることができ、しかb Ii’、’I液
界1alの安定性を^めることのできる誘電体単結晶の
製造ツノ法をHa供づることである。Therefore, the object of the present invention is to develop a dielectric single crystal that can define the shape of the obtained 111 crystal and also improve the stability of the liquid boundary 1al. The method for producing horns is to provide Ha.
[問題点を解決するためのf段]および[発明の作用効
果1
この発明Lm J:る誘電体単結晶の製造方法は、誘電
体を融体状態から引出して単結晶固体に結晶成長させる
のに際し、融体の引出「Jに融体の凝固点より6高温に
加熱され(いる枠を設置し、法枠から単結晶を引出1こ
とを特徴どづる。[F stage for solving the problem] and [Operation and effect 1 of the invention] The method for manufacturing a dielectric single crystal according to the present invention involves pulling out a dielectric from a molten state and growing the dielectric into a single crystal solid. When drawing the molten material, a frame heated to 6 degrees higher than the freezing point of the molten material is installed, and the single crystal is pulled out from the method frame.
融体引出1.11一段間される枠の形状を適当に選ぶご
とによって、得られる単結晶の形状規定が61能とイす
る。、(]たが−)(、耐終的イ1形状に近い形0里結
晶を1!Iることがて−さ、歩留りを高めることがで、
きる。Melt drawing 1.11 By appropriately selecting the shape of the frame used for one stage, the shape of the obtained single crystal can be defined by 61 possibilities. ,(]Taga-)(,It is possible to produce 1!I crystals with a shape close to the final I1 shape, and to increase the yield.
Wear.
融体の凝固点よI′1t)高温に加熱されている枠を使
用1−るので、不必要な結晶の核の生成を防止づること
ができ、完全な単結晶を得やりくなる。さらに、急i%
l <>温度勾配を付けることも可能であり、固液界面
の安定性を高めることができる。したがつ−(、結晶成
艮速1良を高めることができ、ひいては41:R牲を高
めることがCさる。Since a frame heated to a temperature higher than the freezing point of the molten material is used, it is possible to prevent the generation of unnecessary crystal nuclei, making it easier to obtain a perfect single crystal. Furthermore, sudden i%
l <> It is also possible to create a temperature gradient, which can increase the stability of the solid-liquid interface. However, it is possible to increase the crystal growth rate and, in turn, increase the 41:R efficiency.
この発明では、最初から形状規定1)(いるの(・、た
とえば誘電体を溶融状態から引上げるどき(゛b1細径
Allに−で人さイ「小川を支持りるということ])な
(なる。つまり、従来のたとえばチョクラルスー1−−
法に見られるよう41人ぎへΦ聞支持が不要となる。こ
のことと、−1−述し/−二、J:うに固液界面が安定
しやすいということから、大径X5艮尺の誘電体1[!
結晶が得や寸くイする。また、ブリッジマン法(kとに
見られるようなるつぼを使用しでいないことから、単結
晶の良民化および連続化をも図ることができる。In this invention, from the beginning, the shape is defined 1) In other words, for example, the conventional
As seen in the law, support for 41 people is no longer necessary. In addition to this, -1-mentioned/-2, J: Since the solid-liquid interface in sea urchin is likely to be stable, the dielectric material 1 [!
The crystals are getting bigger and bigger. Furthermore, since a crucible as seen in the Bridgman method (k) is not used, it is possible to produce single crystals in a better and continuous manner.
融体の引出口に設置される枠は、好ましくは、融体の温
度よりも1−、20°C高い温度に加熱される。枠を融
体温lit J、りも高い温度に加熱りれば、引出時に
おける1扁痘勾配が人さくイ1す、固液界面が一層安定
となる。したがって、引出速1jl b速めることがで
きる。融体全体の温1ηを高くJることも考えられるが
、そのように1れば融体とる゛)ぼ等との反応を促進り
ることになりかねない。イの意味からも、枠の温度を高
めるのが望ましい。しかし、枠ど融体どの温度差を20
℃よりも大きくづると、融体と枠との反応が人さくなり
、あまりなfましくない。融体と枠どの間の最適な温度
差は、5℃である。The frame installed at the melt outlet is preferably heated to a temperature of 1-20°C higher than the temperature of the melt. If the frame is heated to a temperature higher than the molten temperature, the solid-liquid interface becomes more stable, as the 1-scale gradient at the time of withdrawal is reduced. Therefore, the withdrawal speed can be increased by 1jl b. It is conceivable to increase the temperature 1η of the entire molten body, but doing so may promote the reaction between the molten body and other objects. From the point of view (a), it is desirable to raise the temperature of the frame. However, the temperature difference between the frame and the melting body is 20
If the temperature is set higher than ℃, the reaction between the molten material and the frame will be slow, and it will not be very effective. The optimum temperature difference between the melt and the frame is 5°C.
誘電体を溶融状態から引出J方法として、上方に引上げ
る場合や、下方に引下げる場合や横方向に引出’?l場
合などがある。The dielectric is pulled out from the molten state by pulling it upwards, pulling it downwards, or pulling it laterally. There are some cases.
tJお、誘電体を枠から引出して単結晶固体に結晶成長
さける場合、急激な冷却は避けた方がよい。tJ Oh, when pulling out the dielectric from the frame to avoid crystal growth into a single crystal solid, it is better to avoid rapid cooling.
なぜなら、急激む冷rJIを行(−(えば、得られる単
結晶に内部欠陥が牛じやすくなり、単結晶の内部性t’
lに悪影響を及ぼすからである。This is because rapid cooling rJI (-(for example, internal defects are more likely to occur in the resulting single crystal, and the internal defects of the single crystal t'
This is because it has a negative effect on l.
誘電体の例として、たとえばり−77フイ17(Ajl
uzO3)、RGO(BI4G8aO+z)、1−N(
L、t Nb Os )、LT (l I Ta Os
)、GGG (Gd a (3a b ()+ z
) 、YAG (Yz△麩。As an example of a dielectric material, for example,
uzO3), RGO (BI4G8aO+z), 1-N(
L, t Nb Os ), LT (l I Ta Os
), GGG (Gd a (3a b () + z
), YAG (Yz△fu.
012)、石英(SiO2)、アルカリハライド(Na
C麩など)が挙げられる。012), quartz (SiO2), alkali halide (Na
C-fu, etc.).
誘電体)11結晶が高融点であり、しかもその製造に際
しては汚染を嫌うということを考慮して、好−〇−
ましくは、ト記枠は、白金、[]ジウム、イリジウム、
白金合金、L]ラジウム金、イリジウム合金から2iる
1lljから1丁意に選IJi!された材料から作るの
がよい。Considering that the dielectric material) 11 crystal has a high melting point and that contamination is disliked during its production, the frame is preferably platinum, []dium, iridium,
Platinum alloy, L] Radium gold, Iridium alloy carefully selected from 2i 1llj! It is best to make it from recycled materials.
[実施例1
第1図は、この発明を実施覆るのに使用りる装置の一例
を示J図Cある8、るつぼ1内に二は、ヒータ2によっ
″(融体状態に保たれk l−、i Nb O8が入っ
ている。この融体の引出]−1には、図示りるように、
融体の凝固点よりb t64に加熱され−(いる加熱枠
4を股間」)/、: 、るつぼ1おJ、び加熱枠1は、
白金から作ったもので・ある。イrお、1iNb(1゜
の融点は、12!−i(’3℃である。[Example 1] Figure 1 shows an example of the apparatus used to carry out the present invention. l-, i Nb O8 is contained in the melt]-1, as shown in the figure.
The crucible 1 and the heating frame 1 are heated to b t64 from the freezing point of the molten material.
It is made from platinum. The melting point of IrO, 1iNb (1°C is 12!-i('3°C).
イして、引出冶具F5(!用いて、幅30 +nm、厚
さ2I1mの平板状に連続的に単結晶としC引−1,1
3’ /、=、3このどきの引Iけ速1σは、約50
cil/ +n i n、 J:すI)速くづることが
でさI、二。Then, using the drawing jig F5 (!), continuously form a single crystal into a flat plate with a width of 30 + nm and a thickness of 2I1 m.
3' /, =, 3 The current pulling speed 1σ is about 50
cil/ +n in, J:su I) I can spell it quickly.
さらに、イリジウム製のるつぼと加熱枠とを使用して、
Gd s Qa h O+ 2 (GGG)ノ)日う
なる直径5Qmmの丸棒単結晶を(りることもでさに0Furthermore, using an iridium crucible and heating frame,
Gd s Qa h O+ 2 (GGG) ノ) A round rod single crystal with a diameter of 5 Q mm is
第1図は、この発明を実fIl!i覆るのに使用りる装
買の一例を模式的に示づ図である。
図にJ3いl、3は融体状態に保たれた1−iNbO8
,4は加熱枠を示づ。FIG. 1 shows this invention in practice! FIG. In the figure, J3, 3 is 1-iNbO8 kept in a molten state.
, 4 indicates the heating frame.
Claims (5)
成長させるのに際し、融体の引出口に融体の凝固点より
も高温に加熱されている枠を設置し、該枠から単結晶を
引出すことを特徴とする、誘電体単結晶の製造方法。(1) When pulling the dielectric out of the molten state and growing it into a single-crystal solid, a frame heated to a temperature higher than the freezing point of the molten material is installed at the outlet of the molten material, and the single crystal is grown from the frame. A method for producing a dielectric single crystal, characterized by bringing out the following.
温度に加熱されていることを特徴とする、特許請求の範
囲第1項に記載の誘電体単結晶の製造方法。(2) The method for manufacturing a dielectric single crystal according to claim 1, wherein the frame is heated to a temperature 1 to 20° C. higher than the temperature of the melt.
加熱されていることを特徴とする、特許請求の範囲第2
項に記載の誘電体単結晶の製造方法。(3) Claim 2, characterized in that the frame is heated to a temperature 5° C. higher than the temperature of the melt.
A method for producing a dielectric single crystal as described in .
金、ロジウム合金、イリジウム合金からなる群から任意
に選択された材料よりなることを特徴とする、特許請求
の範囲第1項ないし第3項のいずれかに記載の誘電体単
結晶の製造方法。(4) Claims 1 to 3, wherein the frame is made of a material arbitrarily selected from the group consisting of platinum, rhodium, iridium, platinum alloy, rhodium alloy, and iridium alloy. A method for producing a dielectric single crystal according to any one of the above.
とを特徴とする、特許請求の範囲第1項ないし第4項の
いずれかに記載の誘電体単結晶の製造方法。(5) The method for manufacturing a dielectric single crystal according to any one of claims 1 to 4, wherein the single crystal is pulled upward from the frame.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60-125766 | 1985-06-10 | ||
JP12576685 | 1985-06-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6291487A true JPS6291487A (en) | 1987-04-25 |
JPH0367995B2 JPH0367995B2 (en) | 1991-10-24 |
Family
ID=14918297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13162586A Granted JPS6291487A (en) | 1985-06-10 | 1986-06-05 | Method for manufacturing dielectric single crystal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6291487A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU170190U1 (en) * | 2016-08-22 | 2017-04-18 | федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский национальный исследовательский университет информационных технологий, механики и оптики" (Университет ИТМО) | DEVICE FOR GROWING PROFILED β-Ga2O3 SINGLE CRYSTALS FROM OWN MELT |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS534076A (en) * | 1976-05-12 | 1978-01-14 | Inst Yaderunoi Fuijiki Shibiru | Method of irradiation of accelerated electron beam on to circular portion of cylindrical body |
JPS543828A (en) * | 1977-06-11 | 1979-01-12 | Yodogawa Steel Works | Method of making panels for building use |
JPS544913A (en) * | 1977-06-14 | 1979-01-16 | Ngk Spark Plug Co | Method of making zirconia sintered body having highhstrength and oxygen ion conductivity |
-
1986
- 1986-06-05 JP JP13162586A patent/JPS6291487A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS534076A (en) * | 1976-05-12 | 1978-01-14 | Inst Yaderunoi Fuijiki Shibiru | Method of irradiation of accelerated electron beam on to circular portion of cylindrical body |
JPS543828A (en) * | 1977-06-11 | 1979-01-12 | Yodogawa Steel Works | Method of making panels for building use |
JPS544913A (en) * | 1977-06-14 | 1979-01-16 | Ngk Spark Plug Co | Method of making zirconia sintered body having highhstrength and oxygen ion conductivity |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU170190U1 (en) * | 2016-08-22 | 2017-04-18 | федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский национальный исследовательский университет информационных технологий, механики и оптики" (Университет ИТМО) | DEVICE FOR GROWING PROFILED β-Ga2O3 SINGLE CRYSTALS FROM OWN MELT |
Also Published As
Publication number | Publication date |
---|---|
JPH0367995B2 (en) | 1991-10-24 |
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