JPS6274567A - Polishing method for ceramic plate - Google Patents
Polishing method for ceramic plateInfo
- Publication number
- JPS6274567A JPS6274567A JP60215650A JP21565085A JPS6274567A JP S6274567 A JPS6274567 A JP S6274567A JP 60215650 A JP60215650 A JP 60215650A JP 21565085 A JP21565085 A JP 21565085A JP S6274567 A JPS6274567 A JP S6274567A
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- ceramic plate
- plate
- ceramic plates
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は電子工業の分野に使用される厚さ30〜100
.cam程度のセラミックス板の表面を精度良く研摩す
ることができるセラミックス板の研摩加工方法に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention is applicable to the field of electronic industry.
.. The present invention relates to a method of polishing a ceramic plate that can polish the surface of a ceramic plate with high precision.
(従来の技術)
従来、上記のような肉薄のセラミックス板の研摩加工方
法としては、厚さがQ、1mm程度のキャリアを互いに
反対方向に回転する上定盤と下定盤との間に挟み、キャ
リアの外周面に刻まれた歯を利用してキャリアに遊星回
転運動を行わせつつセラミックス板の上下両面を同時に
研摩加工する方法が一般的であった。ところがこのよう
な従来法においては、上定盤と下定盤との間隙がセラミ
ックス板の厚さと同一の0.15〜0.20鶴に過ぎな
い状態で運転されるため、砥粒のまわり及び排出が円滑
に行われず研摩に時間がかかるうえに加工中にセラミッ
クス板の一部が欠けたりするとその破片が他のセラミッ
クス板を傷付は易く不良率が大きくなり易い欠点があっ
た。また加工中にセラミックス板の厚さを測定するには
セラミックス板をキャリアから取外したうえで測定を行
い再びキャリアにセットする必要があるため研摩中のセ
ラミックス板の板厚管理が行いにくい欠点もあった。更
にまたキャリアの厚さ、が0.1fi程度と極めて薄い
ためキャリア径を大きくするとセラミックス板を確実に
保持することができなくなり、大量のセラミック板を同
時に研摩することができない欠点もあった。(Prior Art) Conventionally, as a polishing method for a thin ceramic plate as described above, a carrier having a thickness of Q and about 1 mm is sandwiched between an upper surface plate and a lower surface plate that rotate in opposite directions. A common method was to simultaneously polish both the upper and lower surfaces of a ceramic plate while causing the carrier to perform planetary rotation using teeth carved on the outer peripheral surface of the carrier. However, in this conventional method, the gap between the upper surface plate and the lower surface plate is only 0.15 to 0.20 mm, which is the same as the thickness of the ceramic plate. Polishing is not carried out smoothly and takes time, and if a part of the ceramic plate is chipped during processing, the fragments are likely to damage other ceramic plates, resulting in a high defect rate. Additionally, in order to measure the thickness of a ceramic plate during processing, it is necessary to remove the ceramic plate from the carrier, measure it, and then set it back on the carrier, making it difficult to control the thickness of the ceramic plate during polishing. Ta. Furthermore, since the thickness of the carrier is extremely thin, about 0.1 fi, if the carrier diameter is increased, the ceramic plate cannot be held securely, and a large number of ceramic plates cannot be polished at the same time.
(発明が解決しようとする問題点)
本発明は上記のような従来の問題点を解決して、研摩能
率に優れ加工中に破片が発生しても他のセラミックス板
を傷付ける可能性が小さく、またセラミックス板の板厚
管理が行い易く大量研摩が可能なセラミックス板の研摩
加工方法を目的として完成されたものである。(Problems to be Solved by the Invention) The present invention solves the conventional problems as described above, and has excellent polishing efficiency, and even if fragments are generated during processing, there is little possibility of damaging other ceramic plates. It was also completed with the aim of providing a method for polishing ceramic plates that allows for easy control of the thickness of the ceramic plate and allows for mass polishing.
(問題点を解決するための手段)
本発明は相対的に回転する上定盤と下定盤との間に円板
状のキャリアの透孔内に保持させたセラミックス板を挟
み、キャリアを遊星回転運動させながら研摩を行うセラ
ミックス板の研摩加工方法において、キャリアとセラミ
ックス板とを十分に肉厚の円盤状の保持治具の表面に接
着し、セラミックス板を片面から研摩することを特徴と
するものである。(Means for Solving the Problems) The present invention sandwiches a ceramic plate held in a hole in a disc-shaped carrier between an upper surface plate and a lower surface plate that rotate relatively, and rotates the carrier planetarily. A method for polishing a ceramic plate in which the ceramic plate is polished while being moved, characterized by bonding the carrier and the ceramic plate to the surface of a sufficiently thick disk-shaped holding jig, and polishing the ceramic plate from one side. It is.
以下に本発明を図面を参照しつつ更に詳細に説明するが
、第2図は高さ方向の寸法を誇張して図示したものであ
ることに留意されたい0図中(11は下面に多数の規則
的な凹溝(2)が刻設された上定盤、(3)は上面に同
様の凹溝(4)が刻設されたコラム(5)付きの下定盤
であって、これらの上定盤(11と下定盤(3)とは図
示を略した機構によって互いに反対方向に相対的な回転
を行うものである。(6)はこの種の研摩加工において
従来から使用されている厚さが061 ■−程度の金属
や樹脂製のキャリアであって、第1図に示すように同心
円状に多数の透孔(7)が透設されている。研磨される
セラミックス板(30)をキャリア(6)の透孔(7)
に嵌入して研摩加工を行うことは従来と同様であるが、
本発明においてはキャリア(6)はキャリアと同径で厚
さが例えば2〜31の十分に肉厚の円盤状の保持治具(
8)の表面に接着され、セラミックス板(30)は例°
えば熱可塑性の接着剤によってキャリア(6)の透孔(
7)の内部にセラミックス板(30)の上面がキャリア
(6)の上面より突出するように固定される。保持治具
(8)は鉄、アルミニウム等の金属材料あるいはセラミ
ック材料からなるものでその中央部には貫通孔(9)と
浅い凹部(10)が形成されている。またキャリア(6
)の外周面と保持治具(8)の外周面には同一形状の歯
(11)が形成されており、中央の太陽歯車(12)と
各定盤の外周に位置する内歯車(13)とに同時に噛合
するようになっている。The present invention will be described in more detail below with reference to the drawings, but it should be noted that the dimensions in the height direction are exaggerated in FIG. The upper surface plate (3) has regular grooves (2) carved therein, and the lower surface plate (3) has a column (5) with similar grooves (4) carved on its upper surface. The surface plate (11) and the lower surface plate (3) rotate relative to each other in opposite directions by a mechanism (not shown).The surface plate (6) has a thickness conventionally used in this type of polishing process. It is a carrier made of metal or resin with a diameter of 061 ■-, and has a large number of concentric holes (7) through it as shown in Fig. 1.The ceramic plate (30) to be polished is placed in the carrier. (6) through hole (7)
The process of inserting and polishing is the same as before, but
In the present invention, the carrier (6) is a sufficiently thick disk-shaped holding jig (with the same diameter as the carrier and a thickness of, for example, 2 to 3 mm).
8), and the ceramic plate (30) is
For example, the through holes (
7), the ceramic plate (30) is fixed in such a way that the upper surface of the ceramic plate (30) protrudes from the upper surface of the carrier (6). The holding jig (8) is made of a metal material such as iron or aluminum or a ceramic material, and has a through hole (9) and a shallow recess (10) formed in its center. Also carrier (6
) and the holding jig (8) are formed with teeth (11) of the same shape, and the sun gear (12) in the center and the internal gear (13) located on the outer circumference of each surface plate It is designed to engage at the same time.
このように、本発明の方法においては研摩されるセラミ
ックス板(30)はキャリア(6)とともに十分に肉厚
の円盤状の保持治具(8)の表面に強固に接着されたう
え上定盤(1)と下定盤(3)との間にセットされ、上
定盤(1)と下定盤(3)とを例えば80 rpm前後
の速度で相対的に回転させつつ太陽歯車(12)と内歯
車(13)とを回転させることによりキャリア(6)と
保持治具(8)とを遊星回転運動させながら研摩加工が
行われる。研摩加工は上定盤(1)の下面とセラミック
ス板(30)の上面との間に供給される酸化セリウム等
の研摩用の砥粒によって行われ、セラミ・7クス板(3
0)は上面から研摩される。第2図に示すように、本発
明の方法においては上定盤(11と下定盤(3)との間
には保持治具(8)の厚みとセラミックス板(30)の
厚みとを加え合せた十分に大きい間隙が存在するので、
砥粒は保持治具(8)の外周や貫通孔(9)及び下定盤
(3)の凹溝(4)を介して速やかに排出され、砥粒の
まわり及び排出が円滑に行われるため優れた研摩能率が
得られることとなる。また研摩加工中にセラミックス板
(30)の一部が欠けて破片が生じてもこの破片も速や
かに排出されることになるので他のセラミックス板(3
0)の表面を傷付ける可能性が小さくなり、不良率が低
下することとなる。しかも本発明においてはセラミック
ス板(30)は保持治具(8)の表面に接着されている
ので、研摩加工中にセラミックス板(30)の厚さを測
定したい場合には上定盤+11を上昇させて、セラミッ
クス板(30)を保持治具(8)とともに取外し、保持
治具(8)からセラミックス板(30)の上面までの距
離を測定することにより容易かつ正確な測定が可能であ
り、再度下定盤(3)上にセットし直すことも容易であ
る。このようにしてセラミックス板(30)の片面が研
摩されたら保持治具(8)を70〜80℃に加熱して接
着剤を溶融させ、キャリア(6)とセラミックス板(3
0)とを取外したうえ必要に応じてセラミックス板(3
0)の表裏を反転させてセラミックス板(30)の反対
側の表面を研摩加工することができる。In this way, in the method of the present invention, the ceramic plate (30) to be polished is firmly bonded together with the carrier (6) to the surface of the sufficiently thick disc-shaped holding jig (8), and (1) and the lower surface plate (3), and rotates the sun gear (12) and the inner surface plate while rotating the upper surface plate (1) and the lower surface plate (3) relatively at a speed of, for example, around 80 rpm. By rotating the gear (13), the polishing process is performed while causing the carrier (6) and the holding jig (8) to perform planetary rotational motion. The polishing process is performed using abrasive grains such as cerium oxide supplied between the lower surface of the upper surface plate (1) and the upper surface of the ceramic plate (30).
0) is polished from the top surface. As shown in FIG. 2, in the method of the present invention, the thickness of the holding jig (8) and the thickness of the ceramic plate (30) are added between the upper surface plate (11) and the lower surface plate (3). Since there is a sufficiently large gap,
The abrasive grains are quickly discharged through the outer periphery of the holding jig (8), the through hole (9), and the concave groove (4) of the lower surface plate (3). This results in higher polishing efficiency. Furthermore, even if a part of the ceramic plate (30) is chipped during the polishing process and fragments are generated, these fragments are also quickly discharged.
The possibility of damaging the surface of 0) is reduced, and the defective rate is reduced. Moreover, in the present invention, the ceramic plate (30) is bonded to the surface of the holding jig (8), so if you want to measure the thickness of the ceramic plate (30) during the polishing process, raise the upper surface plate +11. Then, by removing the ceramic plate (30) together with the holding jig (8) and measuring the distance from the holding jig (8) to the top surface of the ceramic plate (30), easy and accurate measurement is possible. It is also easy to set it again on the lower surface plate (3). Once one side of the ceramic plate (30) has been polished in this way, the holding jig (8) is heated to 70 to 80°C to melt the adhesive, and the carrier (6) and the ceramic plate (3
0) and remove the ceramic plate (3) as necessary.
By reversing the front and back of the ceramic plate (30), the opposite surface of the ceramic plate (30) can be polished.
また一般に、セラミックス板やガラス板の粗面を研摩す
ると粗面に残留している圧縮応力が解放され、厚さが1
00〜150μmになると凹状に変形するトワイマン効
果と呼ばれる現象が生ずるが、本発明方法によれば高能
率で研摩加工を行うことができるので、セラミックス板
をトワイマン効果を生じない程度の肉厚を持たせてその
上下両面を研摩加工し、更に所定の肉厚となるまで片面
から研摩する方法を採ることができる。従って本発明方
法によれば反りがなく仕上り精度に優れたセラミックス
板を製造することが可能となる。Generally, when the rough surface of a ceramic plate or glass plate is polished, the compressive stress remaining on the rough surface is released, and the thickness is reduced to 1.
When the thickness is between 00 and 150 μm, a phenomenon called the Twyman effect occurs where the ceramic plate is deformed into a concave shape. However, according to the method of the present invention, polishing can be performed with high efficiency, so the ceramic plate can be made to have a wall thickness that does not cause the Twyman effect. A method can be adopted in which both the top and bottom surfaces are polished, and then one side is polished until a predetermined thickness is achieved. Therefore, according to the method of the present invention, it is possible to manufacture a ceramic plate that is free from warpage and has excellent finishing accuracy.
(発明の効果)
本発明は以上の説明からも明らかなように、セラミック
ス板をキャリアとともに十分に肉厚の保持冶具の表面に
接着して片面から研摩加工を行うようにしたので、研摩
能率に優れ、加工中に生じた破片が他のセラミックス板
を傷付ける可能性が小さく、セラミックス板の板厚管理
が行い易い等の効果を生ずるものである。また本発明に
おいては保持治具上に多数のセラミックス板を確実に保
持させることができるので、大量研摩ができる利点もあ
る。よって本発明は従来のこの種セラミックス板の研摩
加工方法の問題点を解決したものとして、業界に寄与す
るところは極めて大である。(Effects of the Invention) As is clear from the above description, the present invention improves polishing efficiency by bonding the ceramic plate together with the carrier to the surface of a sufficiently thick holding jig and polishing it from one side. This method is excellent in that there is little possibility that fragments generated during processing will damage other ceramic plates, and the thickness of the ceramic plates can be easily controlled. Further, in the present invention, since a large number of ceramic plates can be reliably held on the holding jig, there is an advantage that a large amount of polishing can be performed. Therefore, the present invention makes an extremely large contribution to the industry as it solves the problems of the conventional polishing method for ceramic plates of this type.
第1図は本発明の実施状態を示す一部切欠平面図、第2
図は同じく一部切欠正面図である。
(1):上定盤7、(3):下定盤、(6):キャリア
、(8):保持治具、(30) : セラミックス板。FIG. 1 is a partially cutaway plan view showing the implementation state of the present invention, and FIG.
The figure is also a partially cutaway front view. (1): Upper surface plate 7, (3): Lower surface plate, (6): Carrier, (8): Holding jig, (30): Ceramic plate.
Claims (1)
リアの透孔内に保持させたセラミックス板を挟み、キャ
リアを遊星回転運動させながら研摩を行うセラミックス
板の研摩加工方法において、キャリアとセラミックス板
とを十分に肉厚の円盤状の保持治具の表面に接着し、セ
ラミックス板を片面から研摩することを特徴とするセラ
ミックス板の研摩加工方法。A ceramic plate polishing method in which a ceramic plate held in a hole in a disc-shaped carrier is sandwiched between an upper surface plate and a lower surface plate that rotate relatively, and polishing is performed while the carrier is rotated planetarily. A method for polishing a ceramic plate, which comprises bonding a carrier and a ceramic plate to the surface of a sufficiently thick disc-shaped holding jig, and polishing the ceramic plate from one side.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60215650A JPS6274567A (en) | 1985-09-28 | 1985-09-28 | Polishing method for ceramic plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60215650A JPS6274567A (en) | 1985-09-28 | 1985-09-28 | Polishing method for ceramic plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6274567A true JPS6274567A (en) | 1987-04-06 |
Family
ID=16675913
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60215650A Pending JPS6274567A (en) | 1985-09-28 | 1985-09-28 | Polishing method for ceramic plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6274567A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56139873A (en) * | 1980-03-31 | 1981-10-31 | Toshiba Corp | Supporting jig used for polishing |
JPS59196161A (en) * | 1983-04-21 | 1984-11-07 | Tohoku Metal Ind Ltd | Grinding method |
-
1985
- 1985-09-28 JP JP60215650A patent/JPS6274567A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56139873A (en) * | 1980-03-31 | 1981-10-31 | Toshiba Corp | Supporting jig used for polishing |
JPS59196161A (en) * | 1983-04-21 | 1984-11-07 | Tohoku Metal Ind Ltd | Grinding method |
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