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JPS6247813A - Double azimuth thin film magnetic head - Google Patents

Double azimuth thin film magnetic head

Info

Publication number
JPS6247813A
JPS6247813A JP18721985A JP18721985A JPS6247813A JP S6247813 A JPS6247813 A JP S6247813A JP 18721985 A JP18721985 A JP 18721985A JP 18721985 A JP18721985 A JP 18721985A JP S6247813 A JPS6247813 A JP S6247813A
Authority
JP
Japan
Prior art keywords
thin film
magnetic
substrate
head
magnetic head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18721985A
Other languages
Japanese (ja)
Inventor
Isao Oshima
大島 勲
Hiroaki Ono
裕明 小野
Hiroshi Akai
寛 赤井
Mitsuo Abe
阿部 光雄
Seiji Kishimoto
清治 岸本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18721985A priority Critical patent/JPS6247813A/en
Publication of JPS6247813A publication Critical patent/JPS6247813A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/3116Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/48Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
    • G11B5/52Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with simultaneous movement of head and record carrier, e.g. rotation of head
    • G11B5/53Disposition or mounting of heads on rotating support
    • G11B5/531Disposition of more than one recording or reproducing head on support rotating cyclically around an axis

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、VTR,等に用いるのに好適なダブルアジマ
ス角度を有する薄膜ヘッドに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a thin film head having a double azimuth angle suitable for use in a VTR, etc.

〔発明の背景〕[Background of the invention]

磁気記録の高密度化に対応して、高抗力母気記録媒体の
開発と共に磁気ヘッドの高精度化が図られている。高梢
度母気ヘッドとして、非磁性基板(以下、単に基板と記
す)上にフォ) IJングラフイ技法であるいは真空蒸
着等によって磁性膜、ギャップ材、コイル導体等のヘッ
ド構成材を積層、パターニングして一体構造とする薄膜
磁気ヘッドが発明されている(例えば、特開昭54−8
1818号公報、特開昭58−80121号公報等)。
In response to the increasing density of magnetic recording, efforts are being made to develop high drag mother air recording media and to improve the precision of magnetic heads. As a high-temperature matrix head, head constituent materials such as a magnetic film, gap material, and coil conductor are laminated and patterned on a non-magnetic substrate (hereinafter simply referred to as the substrate) using the IJ printing technique or vacuum evaporation. A thin film magnetic head having an integral structure has been invented (for example, in Japanese Patent Application Laid-Open No. 1986-8
1818, JP-A-58-80121, etc.).

ところでVTRなどに使用する磁気ヘッド&−トランク
方向に対して磁気ギャップを傾斜させたいわゆるアジマ
ス角付薄膜磁気ヘッドが主である。この種の簿膜磁気ヘ
ッドは、例えば特開】昭57−55526号公報に記載
されたよつK。
Incidentally, what is mainly used in VTRs and the like is a so-called angular azimuth thin film magnetic head in which the magnetic gap is inclined with respect to the magnetic head & trunk direction. A film magnetic head of this type is, for example, the Yotsu K described in Japanese Patent Application Laid-Open No. 57-55526.

基板上に矛1の磁性膜下部コアを形成した後、その一部
ン除去して磁気ギャップ形成面を形成させる。このとぎ
、磁気ギャップ形成面と基板の面の法線との傾き角が5
〜25度(例えば、10度)となるように設定する。
After forming the magnetic film lower core of the spear 1 on the substrate, a portion thereof is removed to form a magnetic gap forming surface. At this point, the inclination angle between the magnetic gap forming surface and the normal to the substrate surface is 5.
-25 degrees (for example, 10 degrees).

この角度がアジマス角に相当する。次に、この磁気ギャ
ップ形成面と矛1の磁性膜乞除去した部分の上に磁気ヘ
ッドギャップ間隔となる厚さに非磁性層を形成し、さら
にその上に矛2の磁性膜上部コアを形成する。その後研
摩や保護基板の接着等の処理を施してアジマス角付き薄
膜磁気ヘッドを得ている。しかしながら、矛2の磁性膜
はアジマス角に対応する例えば80度という大きく傾斜
した面に形成するため・膜質や磁気特性等の低下を招き
製品バラツキが大きくなり、またマスクスパッタを行う
には基板を傾ける等、製造工程が複雑となり、量産性に
問題を残していた。
This angle corresponds to the azimuth angle. Next, a non-magnetic layer is formed on the magnetic gap forming surface and the removed portion of the magnetic film of the spear 1 to a thickness corresponding to the magnetic head gap distance, and furthermore, the upper core of the magnetic film of the spear 2 is formed on top of the non-magnetic layer. do. Thereafter, processing such as polishing and adhesion of a protective substrate is performed to obtain a thin film magnetic head with an azimuth angle. However, since the magnetic film of Spear 2 is formed on a surface with a large slope of, for example, 80 degrees corresponding to the azimuth angle, the film quality and magnetic properties deteriorate, resulting in large product variations.Also, the substrate is not suitable for mask sputtering. The manufacturing process was complicated, such as by tilting, and there were problems with mass production.

このようなことは、特開昭57−141008号公報に
記載されたように、)ラック方向に対してそれぞれの磁
気ギャップを所定角度傾斜させたいわゆるダブルアジマ
ス薄膜磁気ヘッドについても同様である。
This also applies to a so-called double azimuth thin film magnetic head in which each magnetic gap is inclined at a predetermined angle with respect to the rack direction, as described in Japanese Patent Laid-Open No. 57-141008.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、上記従来技術の問題を解消し、磁性膜
の膜質や磁気特性を損なわず、製造容易かつ製品歩留り
が良(、量産性に適合したダブルアジマス薄膜磁気ヘッ
ドケ提供するにある。
An object of the present invention is to solve the problems of the prior art described above, and to provide a double azimuth thin film magnetic head that does not impair the film quality or magnetic properties of the magnetic film, is easy to manufacture, and has a high product yield (and is suitable for mass production).

〔発明の概要〕 この目的を達成するために、本発明は、基板の表裏両面
に設けられた下部コアの少なくとも磁気ギャップ部に相
当する位置に、それぞれのアジマス角に相当する傾斜面
を形成し、この傾斜面の角度を維持するように磁気ギャ
ップを形成した点に特徴がある。
[Summary of the Invention] In order to achieve this object, the present invention forms inclined surfaces corresponding to the respective azimuth angles at least at positions corresponding to the magnetic gap portions of the lower core provided on both the front and back surfaces of the substrate. The feature is that a magnetic gap is formed so as to maintain the angle of this inclined surface.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の実施例を図面を用いて説明する。 Embodiments of the present invention will be described below with reference to the drawings.

、1’1図は本発明によるダブルアジマス薄膜磁気ヘッ
ドの一実施例を示す斜視図であって、1は非出性の平坦
な基板で、その表裏にそれぞれ一対の薄膜ヘッドが形成
された構造である。以後、才1図の表土側のヘッドな矛
1ヘッド、裏下側のヘッドな矛2ヘッドと称し、基板1
に近い側のコアを下部コア、遠い方を上部コアと称する
。20.21はそれぞれ矛1ヘッドと矛2ヘッドの下部
コアであり、50.51および30.31は同様にそれ
ぞれ才1ヘッドと矛2ヘッドのギャップと上部コアであ
る。4は信号を記録又は再生する信号コイルで、6は眉
間絶縁材(才2ヘッドのコイル、眉間材は省略)である
, 1' Fig. 1 is a perspective view showing an embodiment of the double azimuth thin film magnetic head according to the present invention, in which 1 is a non-extrusion flat substrate and has a structure in which a pair of thin film heads are respectively formed on the front and back sides of the substrate. It is. Hereinafter, the head on the topsoil side of Figure 1 will be referred to as Head 1, the head on the bottom side of the bottom will be referred to as Head 2, and substrate 1.
The core closer to the core is called the lower core, and the one farther away is called the upper core. 20.21 is the lower core of the spear 1 head and the spear 2 head, respectively, and 50.51 and 30.31 are the gap and upper core of the spear 1 head and the spear 2 head, respectively. 4 is a signal coil for recording or reproducing signals, and 6 is an insulating material between the eyebrows (the coil for the second head, the material between the eyebrows is omitted).

同図において、雨下部コア20.21は平坦な基板IK
対してそれぞれアジマス角に相当する角度θ乞なし、そ
れぞれのギャップ50.51が平行にならないように形
式されている。このアジマス角θの傾斜面は平坦な基板
1に磁性膜ヲスハッタリング、蒸着又はメッキ等の方法
で形成した後、ラッピング又はバイト切削等により得る
ことができる。アジマス角θの傾斜面をもった下部コア
20.21の上面に基板1を平坦に保ったまま、ギヤラ
グ材50.51、信号コイル4、絶縁層6および上部コ
ア30.3+等をICg造と類似の成膜とフォトエツチ
ングを順次繰返して積層形成する。な窓、コイルは1タ
ーンとして示しであるが、多ターンでもよい。
In the same figure, the rain lower core 20.21 is a flat substrate IK.
On the other hand, the angles θ corresponding to the azimuth angles and the respective gaps 50 and 51 are arranged so that they are not parallel to each other. This inclined surface having an azimuth angle θ can be obtained by forming a magnetic film on the flat substrate 1 by a method such as hattering, vapor deposition, or plating, and then lapping or cutting with a cutting tool. While keeping the substrate 1 flat on the upper surface of the lower core 20.21 having an inclined surface with an azimuth angle θ, the gear lug material 50.51, the signal coil 4, the insulating layer 6, the upper core 30.3+, etc. are attached to the ICg structure. Similar film formation and photoetching are sequentially repeated to form a layer. Although the windows and coils are shown as having one turn, they may have multiple turns.

また、アジマス角は5〜25度が一般的であるので、図
示のような下部コア2の緩慢な傾斜面では、ステップカ
バレッジの問題は全(なく、傾斜面に形成する上部コア
so、stの磁性膜は平坦面に形成した磁性1嘆と比較
して有意差はない。
In addition, since the azimuth angle is generally 5 to 25 degrees, on the gently sloped surface of the lower core 2 as shown in the figure, there is no problem with step coverage, and the upper core so, st formed on the slope There is no significant difference between the magnetic film and the magnetic layer formed on a flat surface.

上部コア30.31?:形成した後、この上に保護膜(
図示せず)を形成し、チップ整形してダブルアジマス薄
膜磁気ヘッドを得る。
Upper core 30.31? : After forming, a protective film (
(not shown) and chip shaping to obtain a double azimuth thin film magnetic head.

矛1ヘッドと矛2ヘッドのギャップ間隔(中央1i7)
間隔) t Gは水平同期信号(TVの水平走IF巌1
本分)に相当する距離のn倍又はn−7倍に設計される
。従来の二つのヘッドを貼り合せる方法では、矛1ヘッ
ドと矛2ヘッドのトランク幅中心値を合せることが難し
いばかりでなく、貼合せの樹脂や低融点ガラスを用いる
の1で、この凝着層を一定尤保っことがみずかしく、実
質的に矛1ヘッドと矛2ヘクトのギヤツブ間隔lG′?
:高精度形成することは困難であり、そのため信号の遅
延回路を個別に補正する必要があった。
Gap distance between spear 1 head and spear 2 head (center 1i7)
interval) tG is the horizontal synchronization signal (TV horizontal running IF Iwao 1
It is designed to be n times or n-7 times the distance corresponding to the main duty). In the conventional method of bonding two heads together, it is not only difficult to match the center widths of the trunk widths of head 1 and head 2, but also because the bonding resin or low-melting glass is used. Is it possible to keep it constant, and the gear spacing between 1 head and 2 hects is actually lG'?
: It is difficult to form with high precision, so it was necessary to individually correct the signal delay circuit.

これに対し本発明では、基板1の表裏にヘッドを形成す
るのでギャップ間隔IQは基板1の厚さtdと側下部コ
ア20.21厚さに依存する。而して、基板1の厚さt
dも下部コア20゜21の厚さも両方とも数μmの精度
に収めろことができ、アジマス角の形成も下部コア磁性
体の膜面を、imにして、バイト切削等で加工できるの
で、ギャップ間隔’Gを高精度に形成できることになる
。よって、このギャップ間隔tGの扁精度化により、前
記遅延回路の調整が不要となり、価格の安い固定の遅延
回路の適用が可能となる。
On the other hand, in the present invention, since the heads are formed on the front and back sides of the substrate 1, the gap distance IQ depends on the thickness td of the substrate 1 and the thickness of the lower side cores 20 and 21. Therefore, the thickness t of the substrate 1
Both d and the thickness of the lower core 20°21 can be adjusted to an accuracy of several μm, and the azimuth angle can be formed by cutting the film surface of the lower core magnetic material with a cutting tool, etc., so that the gap can be reduced. This means that the interval 'G can be formed with high precision. Therefore, by increasing the precision of the gap interval tG, adjustment of the delay circuit becomes unnecessary, and an inexpensive fixed delay circuit can be used.

なお、本実施例では下部コア20.21g全面に形成し
た例を示したが、下部コア50.31とそれぞれ閉母路
を形成するようにパタニングしてあってもかまわないし
、才1ヘッドと牙2ヘッドのトラック幅をかえてそれぞ
れ、傾単モード、長時間モード等に対応させたヘッドに
形成することも可能である。
In this embodiment, an example is shown in which the lower core 20.21g is formed on the entire surface, but it may be patterned to form a closed bus path with the lower core 50.31. It is also possible to change the track widths of the two heads to form heads that are compatible with the tilting mode, long-time mode, etc., respectively.

、?2図は矛1図に示した本発明によるダブルアジマス
薄膜磁気ヘッドを量産するためにウェハ上に多数のチッ
プを展開したオー例の斜視図であり、1は基板、20.
21は下部コア、30゜31は上部コア、4はコイル、
7はチップ化のための切断線である。
,? FIG. 2 is a perspective view of an example in which a large number of chips are developed on a wafer in order to mass produce the double azimuth thin film magnetic head according to the present invention shown in FIG. 1, in which 1 is a substrate, 20.
21 is the lower core, 30°31 is the upper core, 4 is the coil,
7 is a cutting line for chipping.

同喝において、基板1となるウェハの表裏両面1心下部
コア20.21となる多数の傾斜面なもった磁性膜を形
成し、前記と同様の方法により多数のダブルアジマス薄
膜磁気へラドチップを搭載する。このウェハを切断線7
に沿って高速らライザ(図示せず)により切断し、個々
のヘッドチップに分離して多数のダブルアジマス薄膜磁
気ヘッドを得るものである。
In the same process, a large number of magnetic films with inclined planes, which will become the lower core 20. do. Cut this wafer at line 7
A high-speed riser (not shown) is used to cut the magnetic head along the same direction and separate the head chips into individual head chips to obtain a large number of double azimuth thin film magnetic heads.

、IF3図は矛1図に示した本発明によるダブルアジマ
ス薄膜磁気ヘッドを量産するためにウニ1ハ上に多数の
チップを展開したオニVllの斜視図であり、逆アジマ
ス角の傾斜面を同一基板の下部コアに形成したものであ
って、1.2Q、21および7は矛2図と同様の部分を
示し、201゜211は下部コア20.21に対する逆
アジママの下部コアを示す。
, IF3 is a perspective view of Oni Vll, in which a large number of chips are developed on Uni 1 in order to mass produce the double azimuth thin film magnetic head according to the present invention shown in Figure 1. It is formed in the lower core of the substrate, and 1.2Q, 21 and 7 indicate the same parts as in Figure 2, and 201° and 211 indicate the lower core of the reverse azimuth with respect to the lower core 20.21.

同図九おいて、下部コアに形成するアジマス角、逆アジ
マス角に対応する傾斜面は、才2図と同様九基板1上に
母性膜を形成後、ラッピングあるいはバイト切削圧より
形成する。この例によれば、アジマス角付きと逆アジマ
ス角付きの両者?同一ウェハ上で量産することができる
In FIG. 9, the inclined surfaces corresponding to the azimuth angle and the reverse azimuth angle formed on the lower core are formed by lapping or cutting pressure with a cutting tool after forming a mother film on the substrate 1, as in FIG. According to this example, both azimuth angle and reverse azimuth angle? It can be mass-produced on the same wafer.

、i−4図は本発明によるダブルアジマス薄膜山気へラ
ドを量産するために多数のチップを展開した矛三例の斜
視図であって、1は非磁性基板20.21は下部コア、
7は切tfrd、80,81は非磁性膜である。なお、
上部コア、コイル等は省略しである。
, i-4 is a perspective view of three examples in which a large number of chips are developed to mass-produce the double azimuth thin film mount according to the present invention, in which 1 is a non-magnetic substrate 20, 21 is a lower core,
7 is a cut tfrd, and 80 and 81 are nonmagnetic films. In addition,
The upper core, coil, etc. are omitted.

同図において、基板1は平坦面をもつものであり、この
表裏両面上に切削等の機械加工がしやすい非磁性膜80
.81をそれぞれ形成する。
In the figure, a substrate 1 has a flat surface, and a nonmagnetic film 80 that is easy to machine, such as cutting, is formed on both the front and back surfaces.
.. 81 respectively.

非磁性膜80.81は、CuAz、 SUB、 S i
o、 *Tie、あるいはガラス材、セラミック材等で
あり、これを(幾械加工によりアジマス角に相当する傾
斜面を形成し、その上に下部コア2へ21となる磁性膜
をそれぞれ形成するものである。
The non-magnetic film 80.81 is CuAz, SUB, Si
o, *Tie, or a glass material, a ceramic material, etc., which is formed by geometric processing to form an inclined surface corresponding to the azimuth angle, and a magnetic film 21 is formed on the lower core 2. It is.

これによれば、非磁性膜80,81のアジマス角は下部
コア20.21の上面に転写維持され、以下上記と同様
の方法でダブルアジマス薄膜磁気ヘッドを得ることがで
きる。
According to this, the azimuth angles of the nonmagnetic films 80, 81 are transferred and maintained on the upper surface of the lower core 20, 21, and a double azimuth thin film magnetic head can be obtained by the same method as described above.

才5図は本発明によるダブルアジマス薄膜磁気ヘッドW
*産するためにウエノ・上に多数のチップを展開した才
四例の斜視図であって、20゜21は下部コア、7は切
断線、11は非磁性の基板で、その他の構成部分は省略
しである。
Figure 5 shows a double azimuth thin film magnetic head W according to the present invention.
*This is a perspective view of a multi-chip structure in which a large number of chips are deployed on Ueno for production. 20° 21 is the lower core, 7 is the cutting line, 11 is the non-magnetic substrate, and the other components are It is omitted.

同図において、基板11は機械加工がじやすい上記のよ
うな非磁性材料を用い、・これの表裏両面をアジマス角
に相当する傾斜面をもつように機械力a工し、それぞれ
の上に下部コア20゜21となる磁性膜を形成するもの
である。これによれば、基板11のアジマス角は、上記
例と同様に下部コア20.21の上面に転写維持され、
以下同様の方法でダブルアジマス薄膜H1fiヘッドを
得ることができる。
In the same figure, the substrate 11 is made of the above-mentioned non-magnetic material that is easy to machine, and is mechanically machined on both the front and back surfaces so that it has an inclined surface corresponding to the azimuth angle. This is to form a magnetic film that will become the core 20°21. According to this, the azimuth angle of the substrate 11 is transferred and maintained on the upper surface of the lower core 20.21 as in the above example,
Thereafter, a double azimuth thin film H1fi head can be obtained in the same manner.

矛6図は本発明によるダブルアジマス薄膜ミ気ヘッドv
t産するためにウェハ上に多数のチツプン展開したオニ
例の斜視図であって、1・20・21および7は前記と
同様の部分を示し28.29はギャップ形成位置である
Figure 6 shows a double azimuth thin film head according to the present invention.
It is a perspective view of an example in which a large number of chips are developed on a wafer for production, in which 1, 20, 21 and 7 indicate the same parts as above, and 28 and 29 are gap forming positions.

同図において、平坦な基板1の表裏両面に形成した下部
コア20.21のギャップ形成位置28.29にそれぞ
れアジマス角に相当てる部分的傾斜面部を加工する。こ
の傾斜面部と他の平坦部との接続部は連続するように適
度のテーパなもたせているので、その後に形成する上部
コア(図示せず)の磁性膜形成工程でのステップカバレ
ッジに問題はない。
In the figure, partial inclined surfaces corresponding to the azimuth angle are formed at gap forming positions 28 and 29 of the lower core 20 and 21 formed on both the front and back surfaces of the flat substrate 1, respectively. Since the connecting part between this inclined surface part and the other flat part has an appropriate taper so as to be continuous, there is no problem with step coverage in the magnetic film forming process of the upper core (not shown) that will be formed later. .

なお、同図においては、平坦面においては、平坦面に形
成した下部コア20.21のギャップ形成位置28.2
9に部分的傾斜面部を加工したが基板1のギャップ形成
位置に部分的傾斜面部を力■工してもよい。
In addition, in the same figure, on a flat surface, the gap forming position 28.2 of the lower core 20.21 formed on the flat surface is
Although the partially inclined surface portion was machined in 9, the partially inclined surface portion may be machined by force at the gap forming position of the substrate 1.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、それぞれのアジ
マス角に相当する傾斜面をゆるやかにでき、コアをその
磁気特性を損なわずに形成することができるので、製造
歩留まりがよく量産性−のよいダブルアジマス薄膜磁気
ヘッドを得ることができ、上記従来技術の問題を解消し
て優れた機能のダブルアジマス薄膜磁気ヘッドを提供す
ることができる。
As explained above, according to the present invention, the slopes corresponding to each azimuth angle can be made gentle, and the core can be formed without impairing its magnetic properties, resulting in high manufacturing yield and ease of mass production. A good double azimuth thin film magnetic head can be obtained, and the problems of the prior art described above can be solved and a double azimuth thin film magnetic head with excellent functions can be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

矛1図は本発明によるダブルアジマス薄膜磁気ヘッドの
一実施例を示す斜視図、才2図は本発明によるダブルア
ジマス薄膜磁気ヘッドのチップをウェハ上に多数展開し
たオー例の斜視図−矛6図は不発明によるダブルアジマ
ス薄膜磁気ヘッドのチップを逆アジマス角の薄膜磁気ヘ
ッドと共にウェハ上に多数展開したオニ例の斜視図、矛
4図は本発明によるダブルアジマス薄膜。 磁気ヘッドのチップをウェハ上に多数展開したオニ例の
斜視図1,175図は本発明によるダブルアジマス薄膜
磁気ヘッドのチップをウェハ上に多数展開した矛四例の
斜視図、オ6図は本発明によるダブルアジマス薄膜磁気
ヘッドのチンプ乞つェハ上に多数展開したオニ例の斜視
図である。 1.11・・・非磁性の基板、20.21,201゜2
11・・・下部コア、30.31・・・上部コア、4・
・・コイル、5・・・ギャップ材。 、・′) 代理人弁1士 小 川 勝(男゛ 第 1 図 躬 20 第 3 口
Figure 1 is a perspective view showing an embodiment of the double azimuth thin film magnetic head according to the present invention, and Figure 2 is a perspective view of an example in which a large number of chips of the double azimuth thin film magnetic head according to the present invention are developed on a wafer. The figure is a perspective view of an example in which a large number of double azimuth thin film magnetic head chips according to the present invention are developed on a wafer together with thin film magnetic heads having opposite azimuth angles, and Figure 4 is a double azimuth thin film according to the present invention. Figure 1, 175 is a perspective view of an example in which a large number of magnetic head chips are developed on a wafer, and Figure 175 is a perspective view of four examples in which a large number of double azimuth thin film magnetic head chips according to the present invention are developed on a wafer. FIG. 2 is a perspective view of a large number of double azimuth thin film magnetic heads according to the invention developed on a chimp wafer. 1.11...Nonmagnetic substrate, 20.21, 201°2
11...Lower core, 30.31...Upper core, 4.
...Coil, 5...Gap material. ,・') Attorney 1 Masaru Ogawa (Male 1st 20th Term)

Claims (1)

【特許請求の範囲】[Claims] 非磁性の基板の表裏両面に下部コア、ギャップ材、絶縁
材、上部コア等をそれぞれ順次積層形成して成るダブル
アジマス薄膜磁気ヘッドにおいて、前記表裏両下部コア
の少なくとも磁気ギャップ形成部分に前記基板に対して
アジマス角に相当する傾斜面を有することを特徴とする
ダブルアジマス薄膜磁気ヘッド。
In a double azimuth thin film magnetic head in which a lower core, a gap material, an insulating material, an upper core, etc. are sequentially laminated on both the front and back surfaces of a non-magnetic substrate, at least the magnetic gap forming portions of the front and back lower cores are coated with the substrate. A double azimuth thin film magnetic head characterized in that it has an inclined surface corresponding to an azimuth angle.
JP18721985A 1985-08-28 1985-08-28 Double azimuth thin film magnetic head Pending JPS6247813A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18721985A JPS6247813A (en) 1985-08-28 1985-08-28 Double azimuth thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18721985A JPS6247813A (en) 1985-08-28 1985-08-28 Double azimuth thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS6247813A true JPS6247813A (en) 1987-03-02

Family

ID=16202153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18721985A Pending JPS6247813A (en) 1985-08-28 1985-08-28 Double azimuth thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS6247813A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63279411A (en) * 1987-05-11 1988-11-16 Hitachi Ltd Film magnetic head
JPH03252910A (en) * 1990-02-28 1991-11-12 Sanyo Electric Co Ltd Thin-film magnetic head
EP0883109A2 (en) * 1997-06-02 1998-12-09 Deutsche Thomson-Brandt Gmbh Head drum with thin film heads

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5552520A (en) * 1978-10-09 1980-04-17 Sharp Corp Multi-element thin-film magnetic head assembly

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5552520A (en) * 1978-10-09 1980-04-17 Sharp Corp Multi-element thin-film magnetic head assembly

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63279411A (en) * 1987-05-11 1988-11-16 Hitachi Ltd Film magnetic head
JPH03252910A (en) * 1990-02-28 1991-11-12 Sanyo Electric Co Ltd Thin-film magnetic head
EP0883109A2 (en) * 1997-06-02 1998-12-09 Deutsche Thomson-Brandt Gmbh Head drum with thin film heads
EP0883109A3 (en) * 1997-06-02 2000-06-28 Deutsche Thomson-Brandt Gmbh Head drum with thin film heads

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