JPS6246629B2 - - Google Patents
Info
- Publication number
- JPS6246629B2 JPS6246629B2 JP13970083A JP13970083A JPS6246629B2 JP S6246629 B2 JPS6246629 B2 JP S6246629B2 JP 13970083 A JP13970083 A JP 13970083A JP 13970083 A JP13970083 A JP 13970083A JP S6246629 B2 JPS6246629 B2 JP S6246629B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- synthetic resin
- film layer
- transparent thin
- resin body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
本発明は耐透湿性を有する合成樹脂体に関す
る。
従来より、食品や薬品、化学製品の包装におい
て内容物の変質を避けるために、又、電子工業分
野ではEL素子の保護などのために耐透湿性を有
するものが使用される。
例えば、特開昭51−114483号公報ではポリエス
テルフイルムにアルミニウムを蒸着しているが、
アルミニウムを蒸着すれば当然透明性が損なわれ
てしまい、密着強度も比較的小さいので、限られ
た用途にしか使用できなくなる。又、特公昭53−
12953号公報ではプラスチツクフイルムにSixOy
の薄膜層を設けて透明性を保持しているが、耐透
湿性は不充分なものであつた。
本発明は上記従来の欠点を解消すべく鋭意検討
の結果得られたものであり、透明性を損なわず、
しかも耐透湿性が極めて良好である耐透湿性を有
する合成樹脂体を提供するものである。
本発明において、基材の透明合成樹脂体として
は、ポリ塩化ビニル、ポリスチレン、ポリビニル
ブチラール、ポリエチレン、ポリプロピレン、ポ
リエステル、ポリアミド、セロハン等の透明な合
成樹脂体が使用される。
又、透明合成樹脂体は可撓性に富むフイルム状
体であるが、包装あるいは積層して使用するため
に都合がよい。しかしながら、本発明は基材がフ
イルム状体であるものに限られるのではなく、例
えば板状体、レンズ体のような合成樹脂成形品に
適用され、透湿による合成樹脂体の変質、劣化を
防止することができる。
フイルム状体の透明合成樹脂体は、厚みとして
は5〜300μmで可撓性に富むものとなされ、好
ましくは5〜100μmになされる。フイルム状体
の透明合成樹脂体に対し、酸化物組成物を蒸着等
するには、通常冷却ロールを介した巻取り工程が
必要であるが、フイルム状体の透明合成樹脂体の
厚みが5μm未満であると、しわや亀裂の発生が
生じ易くなり、厚みが300μmを越えると柔軟性
に乏しくなつて連続巻取りが困難になつてしま
う。
透明合成樹脂体の少なくとも片面には透明薄膜
層が形成される。該透明薄膜層はSiO2、B2O3、
BaO、Al2O3からなり、モル比で(SiO2):
(B2O3):(BaO+Al2O3)=2〜4:1〜2:0.3
〜1となされた組成物からなる。BaOとAl2O3
は、その一方が実質的に含まれなくともよい。
透明薄膜層の上記の組成にNa2Oなどのアルカ
リ金属の酸化物が多量に入ると、その親水性のた
めに耐透湿性は損なわれ、真空蒸着を行なうにも
組成が変動し易い欠点を生じる。
又、透明薄膜層のモル比が、上記の範囲を外れ
ると層分離を起こし易くなり、耐透湿性が低下す
る。そして、B2O3の量が大きくなるとその水と
の反応性によつて耐透湿性が悪化し、(BaO+
Al2O3)の量が小さくなると耐水性が劣る傾向と
なる。
上記の酸化物組成物を透明合成樹脂体表面に形
成する方法として最も好ましいのはスパツタリン
グ法であり、スパツタリングのターゲツトを上記
の組成とすることでほゞ同じ組成の透明薄膜層を
形成することができる。
また、真空蒸着法、イオンプレーテイング法に
よつても、上記の組成の透明薄膜層を形成するこ
とができる。真空蒸着法の場合は、蒸気圧の異な
る混合物質をそのまゝの組成で薄膜層を形成する
のは困難であるとされている。しかし、本発明者
等は上記組成物を予め電気炉で溶融しガラス化し
たものを蒸発材として使用し、電子銃加熱方式で
蒸発させれば、略同じ組成の蒸着膜が得られるこ
とを確認した。
又、一般に混合物を真空蒸着する時に用いられ
るフラツシユ蒸着法によつても、上記の組成の蒸
着膜を形成することができる。
本発明においては、真空蒸着法、イオンプレー
テイング法、スパツタリング法のいずれによつて
も、透明薄膜層の基材の透明合成樹脂体に対する
密着性は良好であり、透明性もよい。又、透明薄
膜層を真空蒸着法等で形成したフイルム状の透明
合成樹脂体でカール性が大きな問題とならないの
も本発明の特徴である。これは、従来のSixOyに
比較して本発明(SiO2、B2O3、BaO、Al2O3)の
系では透明薄膜層の残留応力が少ないためであろ
うと考えられる。
真空蒸着法、イオンプレーテイング法、スパツ
タリング法により透明薄膜層を形成するには、通
常2×10-3torr以下の真空雰囲気下で行なわれる
が、不純物の混入による性能の低下を避けるため
には5×10-4torr以下の真空雰囲気下で行なうの
が好ましい。
透明薄膜層は、柔軟性、密着性を良好なものと
するためにその厚みを100〜5000Åの範囲になす
のがよく、更に好ましくは500〜2500Åの範囲に
するのがよい。
透明薄膜層の厚みが5000Åを越えても透明性を
損なうことはないが、フイルム状の透明合成樹脂
体のカール性が問題となつたり、亀裂や剥離が生
じ易くなることがある。又、透明薄膜層の厚みが
100Å未満になると、膜が島状構造となつて耐透
湿性が不充分なものとなる恐れがある。
本発明耐透湿性合成樹脂体を包装体として使用
する場合、ヒートシール性を付与することが望ま
しくなる。その場合、(SiO2、B2O3、BaO、
Al2O3)の糸からなる透明薄膜層の上にヒートシ
ール性を有する合成樹脂フイルムを積層すること
により、本発明耐透湿性合成樹脂体にヒートシー
ル性を付与することができる。
ヒートシール性を有する合成樹脂フイルムとし
ては、ポリエチレン、ポリプロピレン、エチレン
酢酸ビニル共重合体、エチレン系アイオノマー等
が挙げられ、透明性を失なわないものとされる。
ヒートシール性を有する合成樹脂フイルムを積
層するには、接着剤を用いる法(ドライラミネー
ト法)、合成樹脂をフイルム状に溶融押出して基
材に圧着する法(エクストルージヨンラミネート
法)がある。
ドライラミネート法においては、合成樹脂フイ
ルムによつて使用する接着剤が変つてくるが、一
般にイソシアネート系の接着剤が使われる。エク
ストルージヨンラミネート法においては、透明薄
膜層にアンカー効果が発現されるため、通常行な
われる有機チタネート系、イソシアネート系、ポ
リエチレンイミン系のアンカー剤によるアンカー
処理が不要となる。従つて、従来の有機溶剤を使
用する必要がなくなり、製造作業環境を悪化する
ことも、製品中に有機溶剤が残存することもなく
なる。以下に本発明の実施例を示す。
実施例 1
SiO2、B2O3、BaO、Al2O3のモル比を3:1:
0.67:0.33とした酸化物の混合物を電気炉で溶解
しガラス化したものを5×-5torrの真空下で電子
銃加熱方式で加熱蒸発させ、ポリエチレンテレフ
タレート(PET)フイルム(15μm厚)上に
1000Åの厚みの透明薄膜層を形成した。透明薄膜
層の厚みは水晶発振式のモニターにより計測し
た。透明薄膜層の組成は、x線マイクロアナライ
ザーで分析したところ、当初の混合物の組成と略
同等であつた。
形成された透明薄膜層の密着性はJIS D0202で
確認したが非常に良好であつた。
又、透明薄膜層を形成したフイルムの光透過率
は未蒸着フイルム略同等であり、透明性は良好で
あつた。
透湿度は40℃、相対湿度90%RHにおいて、JIS
Z0208(カツプによる重量法)及び湿度計法で測
定したが、両者の値は略同等であつた。
実施例 2
実施例1において、透明薄膜層の厚みを2000Å
とした。
実施例 3、4
実施例1のPETフイルムに代えて、二軸延伸
ポリプロピレン(OPP)フイルム(25μm厚)
を使用した。
実施例 5〜8
実施例1の混合物組成に代えて、表に示した組
成のものを使用して、透明薄膜層を形成した。
比較例 1、2
実施例1の混合物組成に代えて、本発明のモル
比組成の範囲から外れるものを使用して、透明薄
膜層を形成した。
比較例 3、4
従来公知の耐透湿性透明薄膜層を形成するSiO
及びSiO2を使用して、透明薄膜層を形成した。
比較例 5
不透明であるが、耐透湿性が良好であると言わ
れているAl薄膜層を、PETフイルム上に形成さ
せた。
The present invention relates to a synthetic resin body having moisture permeability resistance. Conventionally, moisture permeable materials have been used in the packaging of foods, medicines, and chemical products to avoid deterioration of the contents, and in the electronic industry to protect EL elements. For example, in Japanese Patent Application Laid-open No. 51-114483, aluminum is vapor-deposited on a polyester film.
If aluminum is vapor-deposited, the transparency will naturally be impaired and the adhesion strength will be relatively low, so it can only be used for limited purposes. Also, special public service in 1977-
In Publication No. 12953, SixOy is applied to plastic film.
Although transparency was maintained by providing a thin film layer, the moisture permeation resistance was insufficient. The present invention was obtained as a result of intensive studies to eliminate the above-mentioned conventional drawbacks, and does not impair transparency.
Furthermore, the present invention provides a synthetic resin body having extremely good moisture permeability resistance. In the present invention, transparent synthetic resin bodies such as polyvinyl chloride, polystyrene, polyvinyl butyral, polyethylene, polypropylene, polyester, polyamide, and cellophane are used as the base material. Furthermore, the transparent synthetic resin body is a highly flexible film-like body, which is convenient for use in packaging or stacking. However, the present invention is not limited to those in which the base material is a film-like body, but can be applied to synthetic resin molded products such as plate-like bodies and lens bodies, and can prevent deterioration and deterioration of synthetic resin bodies due to moisture permeation. It can be prevented. The film-like transparent synthetic resin body has a thickness of 5 to 300 μm and is highly flexible, preferably 5 to 100 μm. In order to vapor-deposit an oxide composition on a film-like transparent synthetic resin body, a winding process using a cooling roll is normally required, but if the film-like transparent synthetic resin body has a thickness of less than 5 μm If so, wrinkles and cracks are likely to occur, and if the thickness exceeds 300 μm, flexibility becomes poor and continuous winding becomes difficult. A transparent thin film layer is formed on at least one side of the transparent synthetic resin body. The transparent thin film layer is made of SiO 2 , B 2 O 3 ,
Consisting of BaO, Al 2 O 3 , in molar ratio (SiO 2 ):
(B 2 O 3 ): (BaO + Al 2 O 3 ) = 2-4:1-2:0.3
~1. BaO and Al2O3
may not include substantially one of them. If a large amount of alkali metal oxides such as Na 2 O are included in the above composition of the transparent thin film layer, the moisture permeability will be impaired due to its hydrophilic nature, and even if vacuum evaporation is performed, the composition will easily fluctuate. arise. Furthermore, if the molar ratio of the transparent thin film layer is out of the above range, layer separation tends to occur and moisture permeation resistance decreases. When the amount of B 2 O 3 increases, the moisture permeability deteriorates due to its reactivity with water, and (BaO +
As the amount of Al 2 O 3 ) decreases, water resistance tends to deteriorate. The most preferable method for forming the above oxide composition on the surface of a transparent synthetic resin body is sputtering, and by setting the sputtering target to the above composition, it is possible to form a transparent thin film layer having almost the same composition. can. Further, a transparent thin film layer having the above composition can also be formed by a vacuum evaporation method or an ion plating method. In the case of vacuum evaporation, it is said to be difficult to form a thin film layer using mixed substances having different vapor pressures with the same composition. However, the present inventors have confirmed that if the above composition is melted in advance in an electric furnace and vitrified, then used as an evaporator and evaporated using an electron gun heating method, a deposited film with approximately the same composition can be obtained. did. Further, a deposited film having the above composition can also be formed by a flash deposition method which is generally used when vacuum depositing a mixture. In the present invention, the adhesiveness of the transparent thin film layer to the transparent synthetic resin body of the base material of the transparent thin film layer is good, and the transparency is also good, regardless of whether the vacuum evaporation method, the ion plating method, or the sputtering method is used. Another feature of the present invention is that curling does not pose a major problem in a film-like transparent synthetic resin body in which a transparent thin film layer is formed by a vacuum evaporation method or the like. This is probably because the system of the present invention (SiO 2 , B 2 O 3 , BaO, Al 2 O 3 ) has less residual stress in the transparent thin film layer than the conventional SixOy. Forming a transparent thin film layer by vacuum evaporation, ion plating, or sputtering is usually carried out in a vacuum atmosphere of 2×10 -3 torr or less, but in order to avoid deterioration in performance due to contamination with impurities, It is preferable to carry out under a vacuum atmosphere of 5×10 −4 torr or less. The thickness of the transparent thin film layer is preferably in the range of 100 to 5,000 Å, more preferably in the range of 500 to 2,500 Å in order to have good flexibility and adhesion. Even if the thickness of the transparent thin film layer exceeds 5000 Å, the transparency will not be impaired, but the curling property of the film-like transparent synthetic resin body may become a problem, and cracks and peeling may occur easily. Also, the thickness of the transparent thin film layer is
When the thickness is less than 100 Å, the film may form an island-like structure, resulting in insufficient moisture permeation resistance. When the moisture permeable synthetic resin body of the present invention is used as a packaging body, it is desirable to impart heat sealability to it. In that case, (SiO 2 , B 2 O 3 , BaO,
By laminating a synthetic resin film having heat-sealing properties on a transparent thin film layer made of threads of Al 2 O 3 ), heat-sealing properties can be imparted to the moisture permeable synthetic resin body of the present invention. Examples of the synthetic resin film having heat-sealing properties include polyethylene, polypropylene, ethylene-vinyl acetate copolymer, ethylene-based ionomer, etc., which do not lose transparency. To laminate synthetic resin films having heat-sealing properties, there are a method using an adhesive (dry lamination method) and a method of melt-extruding a synthetic resin into a film and pressing it onto a base material (extrusion lamination method). In the dry lamination method, the adhesive used varies depending on the synthetic resin film, but isocyanate-based adhesives are generally used. In the extrusion lamination method, the transparent thin film layer exhibits an anchoring effect, so that the usual anchoring treatment using an organic titanate-based, isocyanate-based, or polyethyleneimine-based anchoring agent is not necessary. Therefore, there is no need to use conventional organic solvents, and there is no need to degrade the manufacturing work environment or leave organic solvents in the product. Examples of the present invention are shown below. Example 1 The molar ratio of SiO 2 , B 2 O 3 , BaO, and Al 2 O 3 was 3:1:
A mixture of oxides with a ratio of 0.67:0.33 was melted in an electric furnace and vitrified, then heated and evaporated using an electron gun heating method under a vacuum of 5 × -5 torr and deposited on a polyethylene terephthalate (PET) film (15 μm thick).
A transparent thin film layer with a thickness of 1000 Å was formed. The thickness of the transparent thin film layer was measured using a crystal oscillation type monitor. The composition of the transparent thin film layer was analyzed using an x-ray microanalyzer and was found to be approximately the same as the composition of the initial mixture. The adhesion of the formed transparent thin film layer was checked using JIS D0202 and was found to be very good. Further, the light transmittance of the film on which the transparent thin film layer was formed was approximately the same as that of the undeposited film, and the transparency was good. Moisture permeability is JIS at 40℃ and relative humidity 90%RH.
It was measured using Z0208 (gravimetric method using cup) and hygrometer method, and both values were approximately the same. Example 2 In Example 1, the thickness of the transparent thin film layer was set to 2000 Å.
And so. Examples 3 and 4 Biaxially oriented polypropylene (OPP) film (25 μm thick) was used instead of the PET film in Example 1.
It was used. Examples 5 to 8 In place of the mixture composition of Example 1, the compositions shown in the table were used to form transparent thin film layers. Comparative Examples 1 and 2 In place of the mixture composition of Example 1, a transparent thin film layer was formed using a mixture having a molar ratio composition outside the range of the present invention. Comparative Examples 3 and 4 SiO forming a conventionally known moisture-resistant transparent thin film layer
and SiO 2 to form a transparent thin film layer. Comparative Example 5 An Al thin film layer, which is opaque but is said to have good moisture permeability, was formed on a PET film.
【表】
以上詳述した通り、本発明耐透明性合成樹脂体
は透明性を損なうことなく、従来得られなかつた
極めて良好な耐透湿性を得ることができ、食品や
薬品の包装体として、EL素子の保護体として使
用することができる。[Table] As detailed above, the transparent synthetic resin body of the present invention can obtain extremely good moisture permeability, which has not been available in the past, without impairing transparency, and can be used as packaging bodies for foods and medicines. It can be used as a protector for EL elements.
Claims (1)
SiO2、B2O3、BaO、Al2O3がモル比で、(SiO2);
(B2O3);(BaO+Al2O3)=2〜4;1〜2:0.3
〜1となされた組成物の透明薄膜層が形成されて
なることを特徴とする耐透湿性を有する合成樹脂
体。 2 透明合成樹脂体が厚み5〜300μmの可撓性
に富むフイルム状体であり、透明薄膜層が厚み
100〜5000Åである特許請求の範囲第1項記載の
耐透湿性を有する合成樹脂体。 3 透明薄膜層が真空蒸着法またはイオンプレー
テイング法またはスパツタリング法によつて形成
されている特許請求の範囲第1項または第2項記
載の耐透湿性を有する合成樹脂体。[Claims] 1. On at least one side of the transparent synthetic resin body,
SiO 2 , B 2 O 3 , BaO, Al 2 O 3 in molar ratio, (SiO 2 );
( B2O3 ); (BaO + Al2O3 )= 2-4 ;1-2:0.3
1. A synthetic resin body having moisture permeability, characterized in that it is formed with a transparent thin film layer of a composition of 1 to 1. 2 The transparent synthetic resin body is a highly flexible film-like body with a thickness of 5 to 300 μm, and the transparent thin film layer has a thickness of 5 to 300 μm.
A synthetic resin body having moisture permeability resistance according to claim 1, which has a moisture permeability of 100 to 5000 Å. 3. A synthetic resin body having moisture permeability resistance according to claim 1 or 2, wherein the transparent thin film layer is formed by a vacuum evaporation method, an ion plating method, or a sputtering method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13970083A JPS6029465A (en) | 1983-07-29 | 1983-07-29 | Plastic body having moisture permeation resistance |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13970083A JPS6029465A (en) | 1983-07-29 | 1983-07-29 | Plastic body having moisture permeation resistance |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6029465A JPS6029465A (en) | 1985-02-14 |
JPS6246629B2 true JPS6246629B2 (en) | 1987-10-02 |
Family
ID=15251382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13970083A Granted JPS6029465A (en) | 1983-07-29 | 1983-07-29 | Plastic body having moisture permeation resistance |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6029465A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6283324A (en) * | 1985-10-07 | 1987-04-16 | Kogyo Kaihatsu Kenkyusho | Production of optical glass |
JP2612602B2 (en) * | 1987-12-17 | 1997-05-21 | 東洋インキ製造 株式会社 | Manufacturing method and apparatus for continuous vapor deposition film |
EP0549528A1 (en) * | 1991-12-20 | 1993-06-30 | Alusuisse-Lonza Services Ag | Method for fabrication of coated substrates |
DE4305856C2 (en) * | 1993-02-25 | 1997-11-13 | Fraunhofer Ges Forschung | Process for the production of vacuum-deposited barrier layers for the packaging industry and vapor-deposition material for their production |
-
1983
- 1983-07-29 JP JP13970083A patent/JPS6029465A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6029465A (en) | 1985-02-14 |
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