JPS6245005Y2 - - Google Patents

Description

[Detailed Description of the Invention] This invention relates to a masking device for masking an article to be treated when performing plating treatment, electrolytic treatment, etc.

BACKGROUND ART Conventionally, when plating, alumite, or the like is applied to a part of an article, the part to be plated, etc. is covered in advance with a masking material for masking. In order to carry out this masking work continuously and in large quantities, the articles are hung on a conveyor chain, etc., and while the articles are running, they are partially immersed in a masking tank containing molten masking material. ing.

However, with this masking method,
In order to immerse an article in the masking tank, it is necessary to move the article downward, immerse it in the molten masking material, and then pull it upwards again to separate it from the masking material. As a result, the structure and operation of the conveyor chain become complicated. Further, since the masking material is continuously applied to the article, the liquid level of the molten masking material in the masking tank decreases, and the masking area changes. Therefore, a liquid level adjusting means is required to keep the liquid level constant, which increases equipment costs. Furthermore, since the temperature of the surface of the molten masking material is cooled and lowered, constant stirring is required, which also has the disadvantage of increasing equipment costs.

This idea was made in view of the above circumstances,
It is an object of the present invention to provide a masking device that eliminates the drawbacks associated with the conventional masking devices described above and can perform masking operations efficiently.

Hereinafter, the present invention will be described in detail with reference to the drawings.

FIGS. 1 and 2 show an example of the masking device of the present invention, and reference numeral 1 in the figures represents a melting tank for melting and storing masking material. In this melting tank 1, a masking material M made of paraffin, synthetic resin, etc. is stored in a heated and molten state by a heater (not shown). Further, the melting tank 1 is provided with a rotating drum 2. This rotating drum 2 is
About 1/3 to 1/2 of its circumferential surface is immersed in the molten masking material M, and is pivoted to the melting tank 1,
It is designed to rotate in the direction of the arrow in the figure at a rotation speed within a predetermined range by a drive device (not shown).

Also, on the side of the rotating drum 2 (on the right side in the figure) and above the liquid level of the masking material M in the melting tank 1,
A dipping tank 3 is provided. This immersion tank 3 has a gutter-like appearance and is installed so that its longitudinal direction is parallel to the rotation axis of the rotating drum 2, and its longitudinal dimension is slightly longer than the axial length of the rotating drum 2. It has long dimensions. The immersion tank 3 is provided with a bottom plate 4, two side plates 5, 5 extending upward from both ends of the bottom plate 4 in the longitudinal direction, and two side plates 5, 5 extending perpendicularly to the side plates 5, 5 on both ends of the bottom plate 4 in the short direction. It consists of two weir plates 6, 6 and a partition plate 7 erected at the upper ends of these weir plates 6, 6. Of the side plates 5, 5, the side plate 5 on the side of the rotating drum 2 is slightly inclined, and its upper end edge lightly contacts the circumferential surface of the drum 2. Also,
As shown in FIG. 1, the weir plate 6 has a large cutout substantially in the center thereof, and serves as an outlet 8 for the masking material M. Further, the partition plate 7 is provided at a position of the weir plates 6, 6 near the rotating drum 2, and substantially parallel to the side plates 5, 5.

When the rotating drum 2 rotates in the direction of the arrow, the highly viscous molten masking material M adheres to the circumferential surface of the rotating drum 2 and is pulled up onto the rotating drum 2, as shown by the dashed line in FIG. is further processed by the side plate 5 on the side of the drum 2 of the dipping tank 3,
Most of it flows into the dipping tank 3. The inflowing masking material M flows out from the outflow ports 8, 8 of the weir plates 6, 6 and returns to the melting tank 1, but when the inflow amount of the masking material M becomes equal to the outflow amount, it flows out in the dipping tank 3. A predetermined amount of masking material M will accumulate while maintaining a certain liquid level. This liquid level can be determined by keeping the opening areas of the outflow ports 8, 8 of the weir plates 6, 6 constant, and increasing the rotation speed of the rotary drum 2 to increase the inflow amount, and decreasing the rotation speed of the rotary drum 2 to increase the inflow amount. descend. Further, even if the rotational speed of the rotary drum 2 is kept constant and the opening areas of the outflow ports 8, 8 of the weir plates 6, 6 are changed, the position of the liquid level can be moved up or down.

Furthermore, since the masking material M in the molten state has a high viscosity, the liquid level of the masking material M that has flowed into the dipping tank 3 tends to be high in the area near the rotating drum 2; In the area outside the partition plate 7 (on the right side in the figure), it becomes horizontal as shown by the dashed line in FIG. In addition, the flow of liquid to the right is suppressed, and the liquid level becomes even.

When the molten masking material M has accumulated in the dipping tank 3 at a predetermined liquid level in this way, the article S to be masked suspended on the conveyor chain 9 is placed in this state as shown in FIG. Continuously lead to the immersion tank 3 and perform masking. That is, the article S is placed at the outlet 8 of one weir plate 6 of the dipping tank 3.
The article S enters the dipping tank 3 where the masking material M is stored, moves along the side plates 5, 5, moves with the lower part of the article S immersed in the masking material M, and then enters the dipping tank 3 where the masking material M is stored. Get out. The lower part of the article S coming out of the outlet 8 is covered with a masking material M, and then cooled with air, water, etc., the masking material M solidifies, and the masking work is completed.

The masking area of the article S can be adjusted by adjusting the liquid level of the masking material M in the dipping tank 3, adjusting the hanging length from the conveyor chain 9, or adjusting the height of the entire masking device. can.

According to such a masking device, the immersion tank 3
Since the masking material M inside is constantly flowing and circulating, the masking material M is constantly stirred, the temperature of the masking material M becomes constant, and uniform masking work is performed. In addition, as the masking work progresses, the total amount of masking material M will decrease, but since the liquid level of masking material M in the dipping tank 3 is always constant, replenishment of masking material M is easy. In addition, the masking coating can be correctly formed on a predetermined portion of the article S. Furthermore, the article S is placed in the liquid reservoir part of the masking material M between the outlet ports 8 and 8 of the weir plates 6 and 6 of the dipping tank 3.
Since the conveyor chain 9 is made to travel, there is no need to move the article S up and down in order to contact or immerse it in the masking material M, the structure of the conveyor chain 9 is simplified, and the masking line can be easily changed.

Note that the shape, opening area, opening dimensions, etc. of the outlet of the weir plate 6 are preferably varied depending on the shape of the article S and the amount of molten masking material M accumulated in the dipping tank 3. 6, 6 may be made removable, and weir plates 6 of various shapes may be attached as appropriate.

4 and 5 both show a continuous masking line equipped with such a masking device. In the case shown in FIG. 4, the article S is attached to the conveyor chain 9 at point A, and if preheating is required, it is first fed into the preheating furnace 10. Hot air of 70 to 120° C. is supplied to the preheating furnace 10, and the article S is preheated here. It is then sent to the masking device 11 and masked as described above. The article S leaving the masking device 11 passes through an air cooling zone and is sufficiently cooled, and then passes through the beard trimming device 1.
2, the masking material M is removed from the conveyor chain 9 at point B after the whiskers of the masking material M are removed. Similarly, in the line shown in FIG.
Article S attached to conveyor chain 9 at point
is sent to the masking device 11 through the preheating furnace 10, and then guided to the water cooling device 13 to be cooled.
It is designed to be removed at point B.

As explained above, the masking device of the present invention includes a melting tank that stores a highly viscous molten masking material, and a melting tank that is immersed in the masking material of the melting tank and adheres the molten masking material to the circumferential surface of the melting tank. A rotating drum for receiving and temporarily storing the molten masking material pulled up by the rotating drum, and immersing the masked article in the stored molten masking material, and disposed above the melting tank. It has a gutter-like dipping tank, and is provided with a partition plate that regulates the liquid level of the masking material flowing into the dipping tank and suppresses the flow of the masking material. Therefore, according to this masking device, the molten masking material circulates from the melting tank to the melting tank via the rotating drum and the immersion tank, so the molten masking material can be stirred and the material inside the immersion tank can be stirred without intentionally providing a stirring means. The molten masking material always has a predetermined temperature, and uniform masking is performed. In addition, although the molten masking material gradually decreases as the work progresses, the level of the molten masking material in the dipping tank remains constant and remains calm without any disturbance, allowing the desired part of the article to be removed. A film of masking material can be formed correctly on the surface. Further, it is possible to immerse the article in the molten masking material without moving it up and down, and it is possible to obtain advantages such as simplifying the structure of a conveyor chain or other conveying device for continuous operation.

[Brief explanation of the drawing]

Figures 1 and 2 show an example of the masking device of the present invention, with Figure 1 being a schematic perspective view and Figure 2 being a schematic perspective view.
The figure is a side sectional view, Figure 3 is a schematic configuration diagram showing a continuous masking work situation using this device, and Figures 4 and 5 are both schematic configuration diagrams showing a continuous masking line equipped with the device of the present invention. It is. 1... Melting tank, M... Masking material, 2... Rotating drum, 3... Dipping tank, S... Article, 11...
Masking device, 7... partition plate.

Claims (1)

[Scope of Claim for Utility Model Registration] A melting tank that stores a highly viscous molten masking material, and a molten masking material that is immersed in the molten masking material of the melting tank, and that the molten masking material is attached to the circumferential surface of the melting tank. A rotating drum for pulling up, and a melting tank for receiving and temporarily storing the molten masking material pulled up by the rotating drum, and for masking the article by immersing it in the stored molten masking material. A gutter-like dipping tank is provided, and the dipping tank is equipped with a partition plate that regulates the liquid level of the masking material that has flowed in and suppresses the flow of the masking material. masking device.