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JPS6244851B2 - - Google Patents

Info

Publication number
JPS6244851B2
JPS6244851B2 JP56149098A JP14909881A JPS6244851B2 JP S6244851 B2 JPS6244851 B2 JP S6244851B2 JP 56149098 A JP56149098 A JP 56149098A JP 14909881 A JP14909881 A JP 14909881A JP S6244851 B2 JPS6244851 B2 JP S6244851B2
Authority
JP
Japan
Prior art keywords
resin
lsi chip
substrate
bump
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56149098A
Other languages
Japanese (ja)
Other versions
JPS5848947A (en
Inventor
Yoshio Okajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP56149098A priority Critical patent/JPS5848947A/en
Publication of JPS5848947A publication Critical patent/JPS5848947A/en
Publication of JPS6244851B2 publication Critical patent/JPS6244851B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】 本発明は半導体装置の製法、特に半導体素子
(主として半導体集積回路素子)の実装に関する
ものであり、その目的とするところは、基板へボ
ンデイングされた不良半導体素子の交換を容易に
行わしめるにある。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a semiconductor device, and in particular to the mounting of semiconductor elements (mainly semiconductor integrated circuit elements), and its purpose is to replace defective semiconductor elements bonded to a substrate. It's easy to do.

従来、例えば液晶セルを構成する、二枚のガラ
ス板の少なくとも一方を延長し、この延長部分に
Lsiチツプを実装したり、或いは各種の回路基板
にLsiチツプがしばしば実装される。この場合、
一般に従来の実装法はLsiチツプに設けた複数個
のバンプと基板上の配線導体とを同時にボンデイ
ングし、しかる後、Lsiチツプを樹脂封止する方
法が採られている。
Conventionally, for example, at least one of the two glass plates that make up a liquid crystal cell is extended, and a
LSI chips are often mounted on various circuit boards. in this case,
In general, conventional mounting methods involve simultaneously bonding a plurality of bumps provided on an LSI chip and wiring conductors on a substrate, and then sealing the LSI chip with a resin.

しかし、特に1枚の基板上へ多数のLsiチツプ
を実装する(マルチ・チツプ化)場合、不良チツ
プの交換が必要となり、従来方法では封止樹脂と
基板とが接着している為、Lsiチツプの取り換え
に際して、ガラス等の基板や基板上のパーツに対
して損傷を与えることが多く、かつ取換えに時間
を要し、Lsiチツプ取換え後、破損あるいは亀裂
した基板や部品を再度使用することはできず、不
良チツプの場合、基板ごと捨てる結果となり、基
板の歩留りが著しく低下するなどの欠点があつ
た。
However, especially when mounting a large number of LSI chips on one board (multi-chip implementation), it is necessary to replace defective chips. When replacing the LSI chip, it often damages the substrate such as glass or the parts on the substrate, and it takes time to replace it, and after replacing the LSI chip, it is difficult to use the damaged or cracked substrate or parts again. In the case of a defective chip, the entire board was thrown away, resulting in a significant drop in the yield of the board.

本発明は上記の点に鑑みてなされたもので、特
にボンデイング前にバンプ部分を残して半導体素
子を樹脂封止することにより、封止樹脂と基板と
の接着を防止し、不良品半導体素子の交換を容易
に行えるようにした半導体装置の製法を提供せん
とするものである。
The present invention has been made in view of the above points, and in particular, by sealing the semiconductor element with resin while leaving the bump portion before bonding, it is possible to prevent the sealing resin from adhering to the substrate and prevent defective semiconductor elements. It is an object of the present invention to provide a method for manufacturing a semiconductor device that allows easy replacement.

以下、本発明の一実施例について図面を参照し
て説明する。
An embodiment of the present invention will be described below with reference to the drawings.

第1図乃至第4図は本発明による製法に基づい
て製造される半導体装置の一例の製造工程を示し
ている。
1 to 4 show the manufacturing process of an example of a semiconductor device manufactured based on the manufacturing method according to the present invention.

第1図はバンプ形成後のLsiチツプを示し、1
はLsiチツプ、2はチツプ上に突出した接続端子
であるバンプである。第2図において、上記Lsi
チツプ1に封止樹脂4(例えば、エポキシ系等)
をはじく物質3、例えばシリコン系樹脂等をバン
プ2の先端部に塗布する上記Lsiチツプ1を封止
樹脂4中にデイツピングし、引きあげ、又はスプ
レー法により樹脂を塗布するとバンプ2の先端部
分には封止樹脂4は塗布されない(第3図)。上
記樹脂4に熱等を加えて硬化した後、上記封止樹
脂4をはじく物質3を除去し、基板5上の配線導
体6とバンプ2とを同時にボンデイングし、半導
体装置を製造する。なお、物質3の膜が薄い場合
は、とくに除去することなくそのままボンデイン
グすることができる(第4図)。この前記方法は
フラツトパツケージ、フイルムキヤリアー方式等
の実装法に比べ小型にでき且つ高密度実装を可能
にする。また通常の雰囲気中でボンデイングが行
え、空調設備が不要である。なお、バンプ部分に
形成される封止樹脂と接着しないあるいはしにく
い樹脂等のコーテイング物質をバンプ全体に形成
するかバンプの一部分に形成するかは実験的或い
は試験的に決められる。
Figure 1 shows the Lsi chip after bump formation;
is an LSI chip, and 2 is a bump that is a connection terminal protruding from the chip. In Figure 2, the above Lsi
A sealing resin 4 (for example, epoxy type, etc.) is applied to the chip 1.
Apply a substance 3 that repels the above, such as silicone resin, to the tip of the bump 2. Dip the LSI chip 1 into the sealing resin 4, pull it out, or apply the resin by spraying, and the tip of the bump 2 Sealing resin 4 is not applied (FIG. 3). After the resin 4 is cured by applying heat or the like, the substance 3 that repels the sealing resin 4 is removed, and the wiring conductors 6 on the substrate 5 and the bumps 2 are simultaneously bonded to manufacture a semiconductor device. Note that if the film of substance 3 is thin, it can be bonded as is without any particular removal (FIG. 4). This method allows for smaller size and higher density mounting compared to mounting methods such as flat package and film carrier methods. Furthermore, bonding can be performed in a normal atmosphere, and air conditioning equipment is not required. Note that whether a coating material such as a resin that does not adhere or is difficult to adhere to the sealing resin formed on the bump portion is formed on the entire bump or on a portion of the bump can be determined experimentally or experimentally.

以上説明したように、本発明によれば、Lsiチ
ツプを樹脂封止する場合に、バンプに樹脂をはじ
く物質を塗布しておき、このようなLsiチツプを
樹脂封止しているため、樹脂をはじく物質が塗布
された以外のチツプ部分を全に樹脂封止でき、こ
の樹脂封止も簡単になる。しかも、この樹脂封止
したLsiチツプを、基板へボンデイングするた
め、不良のLsiチツプの基板への交換がきわめて
簡単になり、かつ基板の歩留まりが向上しコスト
低下に大きな効果を奏する。
As explained above, according to the present invention, when an LSI chip is encapsulated with resin, a substance that repels the resin is applied to the bumps, and such an LSI chip is encapsulated with resin, so that the resin is not removed. All parts of the chip other than those coated with the repellent substance can be sealed with resin, and this resin sealing becomes easy. Moreover, since this resin-sealed LSI chip is bonded to the substrate, it is extremely easy to replace a defective LSI chip with a substrate, and the yield of the substrate is improved, which has a significant effect on cost reduction.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図乃至第4図は本発明に係わる半導体装置
の一例の製造工程を示す断面図である。 図中、1:半導体素子、2:バンプ、3:コー
テイング物質、4:封止樹脂、5:基板、6:配
線導体。
1 to 4 are cross-sectional views showing the manufacturing process of an example of a semiconductor device according to the present invention. In the figure, 1: semiconductor element, 2: bump, 3: coating material, 4: sealing resin, 5: substrate, 6: wiring conductor.

Claims (1)

【特許請求の範囲】 1 複数個の電極接続用のバンプを有する半導体
素子であるLsiチツプを、配線導体が形成された
電極基板上に載置し、上記複数個のバンプと配線
導体とを同時にボンデイングする半導体装置の製
法において、 上記ボンデイング前に少なくとも上記バンプの
先端部分に上記Lsiチツプを封止するための樹脂
をはじく物質を塗布した上記Lsiチツプを樹脂封
止することを特徴とする半導体装置の製法。
[Claims] 1. An LSI chip, which is a semiconductor element having a plurality of bumps for connecting electrodes, is placed on an electrode substrate on which a wiring conductor is formed, and the plurality of bumps and the wiring conductor are connected at the same time. A method of manufacturing a semiconductor device by bonding, wherein the LSI chip is sealed with a resin by applying a resin-repellent substance to at least the tip of the bump before the bonding. manufacturing method.
JP56149098A 1981-09-18 1981-09-18 Manufacture of semiconductor device Granted JPS5848947A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56149098A JPS5848947A (en) 1981-09-18 1981-09-18 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56149098A JPS5848947A (en) 1981-09-18 1981-09-18 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5848947A JPS5848947A (en) 1983-03-23
JPS6244851B2 true JPS6244851B2 (en) 1987-09-22

Family

ID=15467647

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56149098A Granted JPS5848947A (en) 1981-09-18 1981-09-18 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5848947A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02189926A (en) * 1989-01-18 1990-07-25 Nec Corp Semiconductor integrated circuit device
US5139969A (en) * 1990-05-30 1992-08-18 Mitsubishi Denki Kabushiki Kaisha Method of making resin molded semiconductor device
JPH0547958A (en) * 1991-08-12 1993-02-26 Mitsubishi Electric Corp Resin sealed semiconductor device
US6168972B1 (en) 1998-12-22 2001-01-02 Fujitsu Limited Flip chip pre-assembly underfill process

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5361277A (en) * 1976-11-15 1978-06-01 Hitachi Ltd Semiconductor element

Also Published As

Publication number Publication date
JPS5848947A (en) 1983-03-23

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