JPS6226175B2 - - Google Patents
Info
- Publication number
- JPS6226175B2 JPS6226175B2 JP19720782A JP19720782A JPS6226175B2 JP S6226175 B2 JPS6226175 B2 JP S6226175B2 JP 19720782 A JP19720782 A JP 19720782A JP 19720782 A JP19720782 A JP 19720782A JP S6226175 B2 JPS6226175 B2 JP S6226175B2
- Authority
- JP
- Japan
- Prior art keywords
- thin plate
- plate material
- tubular shaft
- guide body
- cleaning device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
- B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は、半導体ウエーハやウエーハの製造
工程に使用されるガラスマスクなど、薄板状材に
付着したほこりなどの異物を除去する、薄板状材
の洗浄装置に関する。[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to a method for removing foreign matter such as dust attached to thin plate-shaped materials such as semiconductor wafers and glass masks used in wafer manufacturing processes. Regarding cleaning equipment.
従来のガラスマスクの洗浄装置は、第1図に要
部を断面図で示すようになつていた。1は半導体
ウエーハの製造工程において、パターン形成のた
め使用されるガラスマスク、2は高圧水吹付けノ
ズルで、高圧水3が供給されガラスマスク1面に
射出され、表面を洗浄するようにしている。
A conventional glass mask cleaning device has a main part shown in cross-section in FIG. 1. 1 is a glass mask used for pattern formation in the manufacturing process of semiconductor wafers, 2 is a high-pressure water spray nozzle, and high-pressure water 3 is supplied and injected onto the surface of the glass mask to clean the surface. .
上記従来の装置において、高圧水2には約100
気圧の純水が供給され、吹付けノズル2の先端の
約100μmの孔から射出され、約3000rpmで回転
されているガラスマスク1に吹付け、吹付けノズ
ル2がガラスマスク1の中心位置から半径方向に
移動し、表面に付着している汚れを除去するよう
にしている。 In the above conventional device, high pressure water 2 has approximately 100
Pure water at atmospheric pressure is supplied and injected from the approximately 100 μm hole at the tip of the spray nozzle 2, and is sprayed onto the glass mask 1 which is rotating at approximately 3000 rpm. It moves in a direction to remove dirt attached to the surface.
上記従来の装置では、高圧水の吹付けによつて
コロナ放電が発生し、ガラスマスク1表面に形成
してある金属薄膜パターンの先端が除去される現
象が生じ、マスク洗浄回数が制限される欠点があ
つた。 In the above-mentioned conventional apparatus, a corona discharge occurs due to the spraying of high-pressure water, and the tip of the metal thin film pattern formed on the surface of the glass mask 1 is removed, which limits the number of times the mask can be cleaned. It was hot.
また、従来のガラスマスクの洗浄装置の他の例
を、第2図に要部断面図で示す。4はブラシで、
高速回転され、高速回転されているガラスマスク
1の表面に接触し、ガラスマスク1の中心位置か
ら半径方向に移動し、ブラシの中央又は毛先部に
外部から供給の純水を潤滑剤として注水し、ガラ
スマスク1表面に付着している汚れを除くように
している。 Another example of the conventional glass mask cleaning device is shown in FIG. 2 as a sectional view of the main parts. 4 is a brush,
The brush contacts the surface of the glass mask 1 that is being rotated at high speed, moves in the radial direction from the center position of the glass mask 1, and injects pure water supplied from the outside as a lubricant into the center or tip of the brush. Then, dirt adhering to the surface of the glass mask 1 is removed.
この第2図に示す従来の装置では、ブラシ4が
ガラスマスク1表面に接しているため、ブラシ4
の汚れなどがかえつてガラスマスク1に付着した
り、さらに、ガラスマスク1の金属薄膜パターン
のリフトオフ修正箇所における蒸着金属膜のはく
離等を生じる欠点があつた。 In the conventional device shown in FIG. 2, since the brush 4 is in contact with the surface of the glass mask 1, the brush 4
This has disadvantages in that dirt and the like may instead adhere to the glass mask 1, and furthermore, the vapor-deposited metal film may peel off at the lift-off correction location of the metal thin film pattern of the glass mask 1.
この発明は、上記従来装置の欠点をなくするた
めになされたもので、円筒形をなし内径側から外
径側に連通する無数の小すき間を有する案内体
を、多数の小穴があけられた管状軸にはめ込み固
着し、薄板状材の少なくとも片側面を上記案内体
の外径部に小すき間をあけて配し、管状軸により
案内体を高速回転しながら管状軸内に供給する純
水を案内体により噴出して薄板状材面を洗い流
し、薄板状材の表面を損傷することなく汚れを確
実に除去する、薄板状材の洗浄装置を提供するこ
とを目的としている。
This invention was made in order to eliminate the drawbacks of the above-mentioned conventional devices, and the guide body has a cylindrical shape and has countless small gaps communicating from the inner diameter side to the outer diameter side. The thin plate material is fitted and fixed to the shaft, and at least one side of the thin plate material is placed on the outer diameter of the guide body with a small gap, and the pure water to be supplied into the tubular shaft is guided by rotating the guide body at high speed by the tubular shaft. It is an object of the present invention to provide a cleaning device for a thin plate-shaped material, which sprays water onto the surface of the thin plate-shaped material and reliably removes dirt without damaging the surface of the thin plate-shaped material.
第3図はこの発明の一実施例によるガラスマス
クの洗浄装置の要部を示す縦断面図である。10
は縦に平行配設の1対の管状軸で、上側の周囲に
多数の小穴11が設けられ、図示を略した下部の
駆動装置により高速回転される。12は管状軸1
0の上端をふさぐふた、13は円筒形をなし、無
数の海綿状すき間を有して内径側から外径側に連
通している1対のスポンジ体で、それぞれ管状軸
10にはめ込み固着されている。双方のスポンジ
体13間の中間には、ガラスマスク1が小すき間
(約1mm)をあけて配置されている。
FIG. 3 is a longitudinal cross-sectional view showing a main part of a glass mask cleaning apparatus according to an embodiment of the present invention. 10
are a pair of tubular shafts arranged vertically in parallel, each having a large number of small holes 11 around the upper side, and is rotated at high speed by a lower driving device (not shown). 12 is the tubular shaft 1
The lid 13 that closes the upper end of 0 is a pair of sponge bodies having a cylindrical shape and communicating from the inner diameter side to the outer diameter side with countless spongy gaps, each of which is fitted and fixed to the tubular shaft 10. There is. A glass mask 1 is placed between both sponge bodies 13 with a small gap (approximately 1 mm) between them.
管状軸10に固着されたスポンジ体13を、第
4図に一部を破断した斜視図で示す。管状軸10
は金属材又はテフロン材など合成樹脂材からな
り、直径約5mmの小穴11が多数設けられてあ
る。管状軸10には下方から超純水14が供給さ
れ、小穴11からスポンジ体13内に流動し外径
側から両状に噴出する。 The sponge body 13 fixed to the tubular shaft 10 is shown in a partially cut away perspective view in FIG. tubular shaft 10
is made of a metal material or a synthetic resin material such as Teflon material, and is provided with a large number of small holes 11 each having a diameter of approximately 5 mm. Ultrapure water 14 is supplied to the tubular shaft 10 from below, flows into the sponge body 13 through the small holes 11, and is ejected from the outer diameter side in both directions.
上記一実施例の装置の洗浄作用は、次のように
なる。双方の管状軸10を約3000rpmの高速回転
し、各スポンジ体13を回転させる。これによ
り、高速回転するスポンジ体13の外径部から超
純水14が遠心力により噴出し、双方のスポンジ
体13に対し相対的平行移動するガラスマスク1
の両側面に当り、付着している汚れを洗い流す。 The cleaning action of the apparatus of the above embodiment is as follows. Both tubular shafts 10 are rotated at a high speed of about 3000 rpm to rotate each sponge body 13. As a result, ultrapure water 14 is ejected from the outer diameter part of the sponge body 13 rotating at high speed due to centrifugal force, and the glass mask 1 moves in parallel relative to both sponge bodies 13.
Wash away any dirt that has adhered to both sides.
このように、ガラスマスク1の全面に一様に純
水14が当るので、従来の高圧水吹付けのよう
に、コロナ放電によるパターンの削れがなくな
り、また、従来のブラシ4によるように、ガラス
マスク1に接触することなく、非接触であるの
で、汚れの再付着や金属薄膜のはく離等の現象が
生じなくなる。実使用結果によれば、洗浄効果は
第1図の従来装置と同一であり、ガラスマスク1
の寿命が延長された。 In this way, the pure water 14 uniformly hits the entire surface of the glass mask 1, so there is no scratching of the pattern due to corona discharge, unlike conventional high-pressure water spraying. Since there is no contact with the mask 1, phenomena such as redeposition of dirt and peeling of the thin metal film do not occur. According to the results of actual use, the cleaning effect is the same as that of the conventional device shown in Fig.
lifespan has been extended.
なお、上記実施例では、洗浄する薄板状材とし
てガラスマスク1の場合を示したが、他の材質の
マスクであつてもよく、さらに、半導体ウエー
ハ、又はパターンなどが施された薄板状材の場合
にも適用できるものである。 In the above embodiment, the glass mask 1 is used as the thin plate-like material to be cleaned, but the mask may be made of other materials. It can also be applied to cases where
また、上記実施例では洗浄液として超純水を使
用した場合を説明したが、純水、又は対象薄板状
材によつては、それに適応した洗浄液を用いても
よい。 Further, in the above embodiment, a case was explained in which ultrapure water was used as the cleaning liquid, but pure water or a cleaning liquid suitable for the target thin plate material may be used.
さらに、上記実施例では、ガラスマスク1の両
面を同時に洗浄する場合を示したが、片面でよい
場合は、スポンンジ体状13を一方側のみに配設
した装置にしてもよい。 Further, in the above embodiment, a case was shown in which both sides of the glass mask 1 are cleaned at the same time, but if only one side is required, an apparatus may be used in which the sponge body 13 is disposed only on one side.
なおまた、上記実施例では、内径側から外径側
に連通する無数の小すき間を有する円筒状の案内
体として、スポンジ体13を用いたが、これに限
らず、例えば円筒状のブラシを用いてもよい。 Furthermore, in the above embodiment, the sponge body 13 is used as the cylindrical guide body having countless small gaps communicating from the inner diameter side to the outer diameter side, but the invention is not limited to this, and for example, a cylindrical brush may be used. It's okay.
以上のように、この発明によれば、内径側から
外径側に連通する無数の小すき間を有する円筒状
の案内体を、多数の小穴があけられた管状軸には
め込み、薄板状材の表面に対し上記案内体の外周
面を小すき間をあけて配し、管状軸により案内体
を高速回転させ、管状軸内に洗浄液を供給し案内
体の外周から噴出し薄板状材面を洗い流すように
したので、薄板状材の表面を損傷することなく汚
れが除去され、ガラスマスクなどの場合は、使用
寿命が延長される効果がある。
As described above, according to the present invention, a cylindrical guide body having countless small gaps communicating from the inner diameter side to the outer diameter side is fitted into a tubular shaft having a large number of small holes, and the surface of the thin plate material is In contrast, the outer circumferential surface of the guide body is arranged with a small gap, the guide body is rotated at high speed by a tubular shaft, and the cleaning liquid is supplied into the tubular shaft and sprayed from the outer circumference of the guide body to wash away the thin plate material surface. Therefore, dirt can be removed without damaging the surface of the thin plate-like material, and in the case of glass masks, the useful life can be extended.
第1図は従来のガラスマスクの洗浄装置を示す
要部の正面断面図、第2図は従来の他の例のガラ
スマスクの洗浄装置を示す要部の正面断面図、第
3図はこの発明の一実施例によるガラスマスクの
洗浄装置を示す要部の縦断面図、第4図は第3図
のスポンジ体部を一部破断して示す斜視図であ
る。
図において、1…薄板状材をなすガラスマス
ク、10…管状軸、11…小孔、13…案内体を
なすスポンジ体、14…洗浄液をなす純水。な
お、図中同一符号は同一又は相当部分を示す。
FIG. 1 is a front sectional view of the main parts of a conventional glass mask cleaning device, FIG. 2 is a front sectional view of the main parts of another conventional glass mask cleaning device, and FIG. 3 is the invention. FIG. 4 is a longitudinal sectional view of a main part of a glass mask cleaning device according to an embodiment of the present invention, and FIG. 4 is a partially cutaway perspective view of the sponge body shown in FIG. In the figure, 1... a glass mask forming a thin plate-like material, 10... a tubular shaft, 11... a small hole, 13... a sponge body forming a guide, 14... pure water forming a cleaning liquid. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
回転され内部に供給される洗浄液を上記各小孔か
ら放射する管状軸、及び円筒形をなし、無数の小
すき間が形成されていて互いに内径側から外径側
に連通しており、上記管状軸の外円周部にはめ込
み固着されていて高速回転され、管状軸の各小孔
からの上記洗浄液を外径側から雨状に噴出する案
内体を備え、この案内体の外径部に対し小すき間
をあけて薄板状材を平行に配し、この薄板状材を
案内体に相対的に平行移動させ表面の汚れを上記
噴出する洗浄液により流し落すようにした薄板状
材の洗浄装置。 2 管状軸に案内体を固着した1対の組を、双方
の案内体の外径部間を間隔をあけて平行配置し、
これらの案内体間に薄板状材を両面側とも小すき
間をあけて平行に配し、両面を同時に洗浄するよ
うにしたことを特徴とする特許請求の範囲第1項
記載の薄板状材の洗浄装置。 3 案内体はスポンジ体からなることを特徴とす
る特許請求の範囲第1項又は第2項記載の薄板状
材の洗浄装置。 4 案内体はブラシ体からなることを特徴とする
特許請求の範囲第1項又は第2項記載の薄板状材
の洗浄装置。 5 薄板状材はガラスマスクからなり、洗浄液に
純水を用いたことを特徴とする特許請求の範囲第
1項ないし第4項のいづれかの項記載の薄板状材
の洗浄装置。 6 薄板状材は半導体ウエーハからなり、洗浄液
に純水を用いたことを特徴とする特許請求の範囲
第1項ないし第4項のいづれかの項記載の薄板状
材の洗浄装置。[Scope of Claims] 1. A tubular shaft having a large number of small holes in the circumference, which is rotated at high speed and radiates the cleaning liquid supplied inside from each of the small holes, and a cylindrical shaft with numerous small holes. A gap is formed and they communicate with each other from the inner diameter side to the outer diameter side, and are fitted and fixed to the outer circumference of the tubular shaft and rotated at high speed, allowing the cleaning liquid from each small hole of the tubular shaft to flow through the outer diameter side. It is equipped with a guide body that spouts out like rain from the side, and a thin plate-like material is arranged parallel to the outer diameter of the guide body with a small gap, and the thin plate-like material is moved parallel to the guide body so that the surface A cleaning device for thin plate-shaped materials, which is configured to wash off dirt with the jetting cleaning liquid. 2 A pair of guide bodies fixed to a tubular shaft are arranged in parallel with a space between the outer diameters of both guide bodies,
Cleaning of a thin plate material according to claim 1, characterized in that the thin plate material is arranged in parallel with a small gap on both sides between these guide bodies, and both sides are cleaned at the same time. Device. 3. The thin plate material cleaning device according to claim 1 or 2, wherein the guide body is made of a sponge body. 4. The thin plate material cleaning device according to claim 1 or 2, wherein the guide body is a brush body. 5. A cleaning device for a thin plate material according to any one of claims 1 to 4, wherein the thin plate material is made of a glass mask, and pure water is used as the cleaning liquid. 6. A cleaning device for a thin plate material according to any one of claims 1 to 4, characterized in that the thin plate material is made of a semiconductor wafer, and pure water is used as the cleaning liquid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57197207A JPS5986226A (en) | 1982-11-08 | 1982-11-08 | Cleaning equipment for thin plate materials |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57197207A JPS5986226A (en) | 1982-11-08 | 1982-11-08 | Cleaning equipment for thin plate materials |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5986226A JPS5986226A (en) | 1984-05-18 |
JPS6226175B2 true JPS6226175B2 (en) | 1987-06-08 |
Family
ID=16370598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57197207A Granted JPS5986226A (en) | 1982-11-08 | 1982-11-08 | Cleaning equipment for thin plate materials |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5986226A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0914216B1 (en) * | 1995-10-13 | 2002-03-20 | Lam Research Corporation | Apparatus for delivery of two chemical products through a brush |
US5875507A (en) * | 1996-07-15 | 1999-03-02 | Oliver Design, Inc. | Wafer cleaning apparatus |
US6230753B1 (en) | 1996-07-15 | 2001-05-15 | Lam Research Corporation | Wafer cleaning apparatus |
US6247197B1 (en) * | 1998-07-09 | 2001-06-19 | Lam Research Corporation | Brush interflow distributor |
US6240588B1 (en) * | 1999-12-03 | 2001-06-05 | Lam Research Corporation | Wafer scrubbing brush core |
US8656545B2 (en) * | 2003-12-26 | 2014-02-25 | Aion Co., Ltd. | Core for washing sponge roller |
-
1982
- 1982-11-08 JP JP57197207A patent/JPS5986226A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5986226A (en) | 1984-05-18 |
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