JPS62258735A - Apparatus for recirculating chemical liquid - Google Patents
Apparatus for recirculating chemical liquidInfo
- Publication number
- JPS62258735A JPS62258735A JP10138686A JP10138686A JPS62258735A JP S62258735 A JPS62258735 A JP S62258735A JP 10138686 A JP10138686 A JP 10138686A JP 10138686 A JP10138686 A JP 10138686A JP S62258735 A JPS62258735 A JP S62258735A
- Authority
- JP
- Japan
- Prior art keywords
- recovery tank
- chemical liquid
- tank
- chemical
- recovery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000126 substance Substances 0.000 title claims abstract description 52
- 239000007788 liquid Substances 0.000 title claims abstract description 45
- 230000003134 recirculating effect Effects 0.000 title 1
- 238000011084 recovery Methods 0.000 claims abstract description 34
- 239000004065 semiconductor Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 7
- 238000011109 contamination Methods 0.000 abstract description 4
- 239000000428 dust Substances 0.000 abstract description 3
- 238000012993 chemical processing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/002—Avoiding undesirable reactions or side-effects, e.g. avoiding explosions, or improving the yield by suppressing side-reactions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Weting (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は複数枚の半導体基板を薬液等で浸漬処理を行う
半導体基板処理装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor substrate processing apparatus that performs immersion treatment of a plurality of semiconductor substrates in a chemical solution or the like.
従来、この種の半導体基板処理装置は薬液槽から回収し
た薬液をｒ過器に通して浄化し、うず巻ポンプ、ダイア
フラムポンプ、ベローズポンプ等により浄化薬液を再び
薬液槽に戻すことにより薬液処理を行うようになってい
る。Conventionally, this type of semiconductor substrate processing equipment performs chemical processing by passing the chemical recovered from the chemical tank through an R-filter, purifying it, and returning the purified chemical to the chemical tank using a spiral pump, diaphragm pump, bellows pump, etc. It is supposed to be done.
上述した従来の処理装置は回転を支持する軸や軸受を有
するうず巻ポンプや膜や蛇腹の変化を利用するダイアフ
ラムポンプ、ベローズポンプ等を用いているため、ポン
プの軸受や蛇腹等の摺動部分から半導体装置製造上量も
障害となる汚染源を発生させたり、また摩耗部分がある
から薬液の循環装置としての寿命が短命であるという欠
点があった・
本発明の目的は機械的な摩耗部分をな゛くし発塵や薬液
への汚染を防止した薬液循環装置を提供することにある
。The conventional processing equipment described above uses a centrifugal pump that has a shaft or bearing that supports rotation, a diaphragm pump that utilizes changes in membrane or bellows, a bellows pump, etc. This has the disadvantage that it generates a source of contamination that is an obstacle to the production of semiconductor devices, and that the lifespan of a chemical circulation device is short due to the presence of worn parts. It is an object of the present invention to provide a chemical liquid circulation device that prevents dust generation and contamination of the chemical liquid.
本発明は複数の半導体基板を収納した半導体基板収納箱
を薬液槽内に浸漬し、半導体基板の薬液処理を行う処理
装置において、薬液槽と回収槽とを上下に異なる高さ位
置にそれぞれ設置し、薬液槽と回収槽との間にそれぞれ
開閉弁を備えた薬液回収配管と薬液供給用配管とを並列
に設置し、薬液供給用配管に濾過器を設け、さらに回収
槽内に高圧気体を送り込み槽内の空気を圧縮する気体圧
送器を備えたことを特徴とする薬液循環装置である。The present invention provides a processing apparatus for processing semiconductor substrates with a chemical solution by immersing a semiconductor substrate storage box containing a plurality of semiconductor substrates in a chemical solution tank, in which the chemical solution tank and the recovery tank are installed at different vertical positions. A chemical liquid recovery pipe and a chemical liquid supply pipe each equipped with an on-off valve are installed in parallel between the chemical liquid tank and the recovery tank, a filter is installed in the chemical liquid supply pipe, and high pressure gas is sent into the recovery tank. This is a chemical liquid circulation device characterized by being equipped with a gas pressure feeder that compresses air in a tank.
以下、本発明の一実施例を図により説明する。 Hereinafter, one embodiment of the present invention will be described with reference to the drawings.
第１図において、薬液槽２と２つの密閉回収槽Ａ、Ｂと
を上下に異なる高さ位置にそれぞれ設置し、薬液槽２の
底部流出口４から薬液回収配管し、を導出し、これを２
つに分岐させてそれぞれを開閉弁８ａ 、 ＆ｂを介し
て下段の各々の回収槽Ａ、Ｂに開口する。一方、薬液供
給配管り、 、 Ｌ、の一部を回収槽Ａ。In Fig. 1, a chemical solution tank 2 and two closed recovery tanks A and B are installed at different vertical positions, and a chemical solution recovery pipe is led out from the bottom outlet 4 of the chemical solution tank 2. 2
It branches into two collection tanks A and B in the lower stage through respective on-off valves 8a, &b. On the other hand, part of the chemical solution supply piping, L, is installed in the recovery tank A.
Ｂの底部付近に開口し、それぞれ開閉弁７ａ 、 ７ｂ
を介して一本にまとめてこれを濾過器３の入口側に接続
し、濾過器３の出口側を上段の薬液槽２に開口する。さ
らに回収槽Ａ、Ｂ内に高圧気体を圧送する気体圧送器５
を備え、気体圧送器５を開閉弁５ａ、５ｂに通して各回
収槽Ａ、ＩＳに配管し１．Ｌ６により接続する。 Ｌ、
、 Ｌ、は回収槽Ａ、Ｂを大気に開放する配管であり
、各配管り、 、 Ｌ、には開閉弁４ａ 、 ４ｂが設
けである。また各回収槽Ａ、Ｂ内には配管し１の開口高
さ位置で上限の薬液液面を検出する液面検出器９ａ、９
ｂと、配管り、 、 Ｌ、の開口高さ位置で下限の薬液
液面を検出する液面検出器１０ａ 、 １０ｂとを設置
しである。また１本発明の薬液循環装置１から気体圧送
器５を切り離してそれぞれ別途雰囲気中に設置する。Opening near the bottom of B, opening and closing valves 7a and 7b, respectively.
These are connected together to the inlet side of the filter 3 via the filter 3, and the outlet side of the filter 3 is opened to the upper chemical tank 2. Further, a gas pump 5 that pumps high pressure gas into the recovery tanks A and B
1. The gas pressure feeder 5 is passed through the on-off valves 5a and 5b and piped to each collection tank A and IS. Connect via L6. L,
, L are piping that open the recovery tanks A and B to the atmosphere, and each piping, , L, is provided with on-off valves 4a and 4b. In addition, liquid level detectors 9a and 9 are installed in each collection tank A and B to detect the upper limit of the chemical liquid level at the opening height position 1.
b, and liquid level detectors 10a and 10b for detecting the lower limit of the chemical liquid level at the opening height position of the piping, L, and L. Further, the gas pressure feeder 5 is separated from the chemical liquid circulation device 1 of the present invention and installed separately in the atmosphere.
実施例において、薬液槽２の底部に設けた流出口４から
薬液を薬液循環装置１へ自然落下により供給し、同時回
収した薬液を気体で加圧して、濾過及び温度調節等の薬
液管理を行う濾過器３を通して吐出口６より薬液槽２へ
戻す動作を連続的に行う。すなわち、先ず回収槽Ａで弁
７ａを閉じて弁８ａを開け、配管し１の導入口２ａより
薬液を導入して薬液を貯める。このとき、弁５ａを閉じ
て弁４ａを開け、貯液により排除される気体を気体給徘
口３ａより排気口６ａへ排出し、貯液動作を行う。回収
槽Ａにて上述の動作を行っている間、他方の回収槽Ｂで
？＋’ｊ１杯となった薬液の吐出動作を行う。すなわち
弁４ｂを閉じて弁５ｂを開け、清浄な気体を気体圧送器
５より気体給徘口３ｂを通して回収槽Ｂに導入する。こ
のとき、弁８ｂを閉じて弁７ｂを開け、圧送気体により
回収槽Ｂ内の気体を圧縮し、その圧縮気体により加圧さ
れた薬液を排出口１ｂより排出し、吐出動作を行う。In the embodiment, the chemical liquid is supplied to the chemical liquid circulation device 1 by gravity from the outlet 4 provided at the bottom of the chemical liquid tank 2, and the chemical liquid recovered at the same time is pressurized with gas to perform chemical liquid management such as filtration and temperature control. The operation of passing through the filter 3 and returning it to the chemical tank 2 through the discharge port 6 is performed continuously. That is, first, in the recovery tank A, the valve 7a is closed, the valve 8a is opened, and the chemical solution is introduced through the inlet 2a of the piping 1 and stored. At this time, the valve 5a is closed and the valve 4a is opened, and the gas removed by the liquid storage is discharged from the gas supply port 3a to the exhaust port 6a, thereby performing the liquid storage operation. While the above operation is being performed in recovery tank A, what happens in the other recovery tank B? +'j Performs a discharge operation for one cup of chemical liquid. That is, the valve 4b is closed, the valve 5b is opened, and clean gas is introduced into the recovery tank B from the gas pressure feeder 5 through the gas supply port 3b. At this time, the valve 8b is closed and the valve 7b is opened, the gas in the recovery tank B is compressed by the pressurized gas, and the chemical solution pressurized by the compressed gas is discharged from the discharge port 1b to perform a discharge operation.
回収槽Ａ及び回収槽Ｂに設けた液面検出器９ａにより回
収イｔＡの上限を、また一方ロ収イ色Ｂの下限を液面検
出器１０ｂでそれぞれ検出したときに、前述した貯液動
作を回収槽Ｂに行わせ、吐出動作を回収槽Ａが交替して
行うように切替える。When the liquid level detectors 9a provided in the recovery tank A and the recovery tank B detect the upper limit of the recovery time A, and the lower limit of the recovery color B is detected by the liquid level detector 10b, the above-mentioned liquid storage operation is performed. The recovery tank B is made to perform the discharge operation, and the discharge operation is switched so that the recovery tank A takes turns performing the discharge operation.
このようにして液面検出器にてそれぞれの回収槽の液面
状態を検出し、交互に貯液動作と吐出動作をくりかえす
ことにより連続的に薬液循環を行う。In this way, the liquid level state of each collection tank is detected by the liquid level detector, and the chemical solution is continuously circulated by alternately repeating the liquid storing operation and the discharging operation.
以上説明したように本発明は回収槽への貯液を自然落下
により行っていること及び、薬液の加圧を清浄化した圧
縮気体により行うため、発塵や薬液への汚染がなく、機
械動作が少なし＼ため、装置の長寿命化が実現できる効
果がある。As explained above, in the present invention, the liquid is stored in the collection tank by natural fall, and the pressurization of the chemical liquid is performed using clean compressed gas, so there is no dust generation or contamination of the chemical liquid, and the mechanical operation is possible. Since there is less \\, there is an effect that the life of the device can be extended.
第１図は本発明の半導体基板処理槽薬液循環装置の配管
系統図である。FIG. 1 is a piping system diagram of the semiconductor substrate processing tank chemical circulation device of the present invention.
Claims (1)
薬液槽内に浸漬して半導体基板の薬液処理を行う処理装
置において、薬液槽と密閉回収槽とを上下に異なる高さ
位置にそれぞれ設置し、薬液槽と回収槽との間にそれぞ
れ開閉弁を備えた薬液回収用配管と薬液供給用配管とを
並列に設置し、薬液供給用配管にろ過器を設け、さらに
、回収槽内に高圧気体を送り込み槽内の空気を圧縮する
気体圧送器を備えたことを特徴とする薬液循環装置。(1) In a processing device that performs chemical treatment on semiconductor substrates by immersing a semiconductor substrate storage box containing multiple semiconductor substrates into a chemical tank, the chemical tank and sealed recovery tank are installed at different vertical positions. A chemical liquid recovery pipe and a chemical liquid supply pipe each equipped with an on-off valve are installed in parallel between the chemical liquid tank and the recovery tank, a filter is installed in the chemical liquid supply pipe, and a high pressure A chemical liquid circulation device characterized by being equipped with a gas pressure feeder that sends gas and compresses air in a tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61101386A JP2546825B2 (en) | 1986-05-01 | 1986-05-01 | Chemical circulation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61101386A JP2546825B2 (en) | 1986-05-01 | 1986-05-01 | Chemical circulation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62258735A true JPS62258735A (en) | 1987-11-11 |
| JP2546825B2 JP2546825B2 (en) | 1996-10-23 |
Family
ID=14299320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61101386A Expired - Fee Related JP2546825B2 (en) | 1986-05-01 | 1986-05-01 | Chemical circulation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2546825B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0294435A (en) * | 1988-09-29 | 1990-04-05 | Nec Corp | Etching apparatus |
| JPH04256318A (en) * | 1991-02-08 | 1992-09-11 | Nec Yamagata Ltd | Chemical treatment device |
| JP2003174004A (en) * | 2001-12-04 | 2003-06-20 | Nec Electronics Corp | Chemical treatment device for semiconductor substrate |
| JP2008135464A (en) * | 2006-11-27 | 2008-06-12 | Matsushita Electric Works Ltd | Processing apparatus for wiring board and processing method employing it |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49129360A (en) * | 1973-04-16 | 1974-12-11 | ||
| JPS5346292U (en) * | 1976-09-24 | 1978-04-19 | ||
| JPS5416944A (en) * | 1977-07-08 | 1979-02-07 | Hitachi Ltd | Input/output interface control system |
| JPS56152970A (en) * | 1980-04-25 | 1981-11-26 | Oki Electric Ind Co Ltd | Etching device |
| JPS5876135A (en) * | 1981-11-02 | 1983-05-09 | Hitachi Ltd | Mechanism for supplying chemical liquid |
| JPS5877044U (en) * | 1981-11-19 | 1983-05-24 | 富士通株式会社 | Thin film peeling device |
| JPS5887826A (en) * | 1981-11-20 | 1983-05-25 | Hitachi Ltd | Treatment of substance and device thereof |
| JPS58147125A (en) * | 1982-02-26 | 1983-09-01 | Nippon Telegr & Teleph Corp <Ntt> | Wet processing device |
| JPS58193725A (en) * | 1981-12-18 | 1983-11-11 | Nec Kyushu Ltd | Method for supplying organic chemical to production device for semiconductor |
-
1986
- 1986-05-01 JP JP61101386A patent/JP2546825B2/en not_active Expired - Fee Related
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49129360A (en) * | 1973-04-16 | 1974-12-11 | ||
| JPS5346292U (en) * | 1976-09-24 | 1978-04-19 | ||
| JPS5416944A (en) * | 1977-07-08 | 1979-02-07 | Hitachi Ltd | Input/output interface control system |
| JPS56152970A (en) * | 1980-04-25 | 1981-11-26 | Oki Electric Ind Co Ltd | Etching device |
| JPS5876135A (en) * | 1981-11-02 | 1983-05-09 | Hitachi Ltd | Mechanism for supplying chemical liquid |
| JPS5877044U (en) * | 1981-11-19 | 1983-05-24 | 富士通株式会社 | Thin film peeling device |
| JPS5887826A (en) * | 1981-11-20 | 1983-05-25 | Hitachi Ltd | Treatment of substance and device thereof |
| JPS58193725A (en) * | 1981-12-18 | 1983-11-11 | Nec Kyushu Ltd | Method for supplying organic chemical to production device for semiconductor |
| JPS58147125A (en) * | 1982-02-26 | 1983-09-01 | Nippon Telegr & Teleph Corp <Ntt> | Wet processing device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0294435A (en) * | 1988-09-29 | 1990-04-05 | Nec Corp | Etching apparatus |
| JPH04256318A (en) * | 1991-02-08 | 1992-09-11 | Nec Yamagata Ltd | Chemical treatment device |
| JP2003174004A (en) * | 2001-12-04 | 2003-06-20 | Nec Electronics Corp | Chemical treatment device for semiconductor substrate |
| JP2008135464A (en) * | 2006-11-27 | 2008-06-12 | Matsushita Electric Works Ltd | Processing apparatus for wiring board and processing method employing it |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2546825B2 (en) | 1996-10-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |