JPS62247553A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS62247553A JPS62247553A JP61090932A JP9093286A JPS62247553A JP S62247553 A JPS62247553 A JP S62247553A JP 61090932 A JP61090932 A JP 61090932A JP 9093286 A JP9093286 A JP 9093286A JP S62247553 A JPS62247553 A JP S62247553A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- burr
- resin
- lead
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 239000011347 resin Substances 0.000 claims abstract description 7
- 229920005989 resin Polymers 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 16
- 239000012530 fluid Substances 0.000 claims description 8
- 238000005507 spraying Methods 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 230000000694 effects Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は樹脂封止半導体装置の製造方法lこ係り、特
に樹脂封止後のバリ取り方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a resin-sealed semiconductor device, and particularly to a method for removing burrs after resin-sealing.
第2図は樹脂封止型半導体装置の部分斜視断面図であり
、【1)は半導体テップやリードフレームの一部が樹脂
で固められた樹脂封止半導体装置本体。FIG. 2 is a partial perspective cross-sectional view of a resin-sealed semiconductor device, and [1] shows the main body of the resin-sealed semiconductor device in which a portion of the semiconductor tip and lead frame are hardened with resin.
(2)はリード、(3)は一時的にリード(2)間を結
合し、完成時除去されるタイバ、(4)はリード【2)
とタイバ(3)、本体+1)の間に生ずる樹脂はみ出し
部分であるバリ、 (4a)はリード(2)間に生r
るパ1月4)の部分、(4b)はリード(2)表面上に
生ずる31月4)の部分である。(2) is the lead, (3) is a tie bar that temporarily connects the leads (2) and is removed when completed, (4) is the lead [2]
(4a) is the burr that protrudes from the resin between the lead (2) and the tie bar (3), and the main body +1).
(4b) is the portion of lead (2) that occurs on the surface of lead (2).
従来の方法は、第2図のリード(2)間のバリ(ム)を
除去するのlこ、リード(2)、タイバ(3)、本体(
1)とで囲まれる空間にぴったりは彼り込む雄の金型と
こnに対応した雌の金型を用意し、雄の金型を押し込み
、バIJ (4a)を除去する方法が取られていた。The conventional method is to remove the burr between the lead (2) shown in Figure 2, the lead (2), the tie bar (3), and the main body (
1) The method used is to prepare a male mold that fits perfectly in the space surrounded by and a corresponding female mold, push the male mold in, and remove the bar IJ (4a). Ta.
上記の如き従来の半導体装置の製造方法では。 In the conventional method of manufacturing a semiconductor device as described above.
リード(2)間バIJ (4a)を除去するのに半導体
装置の機種ごとに金型をあつらえ、これをリード(2)
間に押し込むと云った方法を取っていたため、多品種少
量生産の製品群に適用する場合コスト高になると云った
問題点があった。To remove the IJ (4a) between the leads (2), a mold is custom made for each semiconductor device model, and this is used to remove the IJ (4a) between the leads (2).
Since this method was used to push the parts in between, there was a problem in that the cost would be high when applied to a group of products that were produced in a wide variety of small quantities.
この発明は上記の如き問題点を解決するためになされた
もので、多品種少量生産の場合に安価にできる半導体装
置の製造方法を提供することを目的とする。The present invention was made to solve the above-mentioned problems, and it is an object of the present invention to provide a method for manufacturing semiconductor devices that can be manufactured at low cost in the case of high-mix, low-volume production.
また、この発明の別の発明は上記の目的をより効果的に
達成する半導体装置の製造方法を提供することを目的と
する。Another object of the present invention is to provide a method for manufacturing a semiconductor device that more effectively achieves the above object.
〔問題点を解決するための手段]
この発明に係る半導体装置の製造方法は、リードフレー
ムを樹脂封止し、樹脂封止された前記リードフレームの
リード間3よびそれらの表面上にあるバリを7−ザ照射
により除去する方法である。[Means for Solving the Problems] A method for manufacturing a semiconductor device according to the present invention seals a lead frame with a resin, and removes burrs between the leads 3 of the resin-sealed lead frame and on their surfaces. 7-This is a method of removing by irradiation with laser.
また、この発明の別の発明に係る半導体装置の製造方法
はリードフレームを樹脂封止し、樹脂封止された前記リ
ードフレームのリード間およびそれらの表面上にあるバ
リの一部をレーザ照射により除去し、その残部を高圧流
体を吹き付けて除去するようにした方法である。Further, in a method for manufacturing a semiconductor device according to another aspect of the present invention, a lead frame is sealed with a resin, and a portion of burrs between the leads of the resin-sealed lead frame and on the surfaces thereof are removed by laser irradiation. In this method, the remaining particles are removed by spraying high-pressure fluid.
この発明においては、レーザ照射によりハIJを除去す
る。In this invention, high IJ is removed by laser irradiation.
また、この発明の別の発明においては、バリの一部をレ
ーザ照射により、残部を高圧流体吹き付けにより除去す
る。Further, in another aspect of the present invention, a part of the burr is removed by laser irradiation, and the remaining part is removed by high-pressure fluid spraying.
第1図fal 、 [b) 、 (clはこの発明の一
実施例を示す一連の断面図であり、(1)〜(4) 、
(4a) 、 (4b)は、いずれも従来の同一符号
のものと同一または相当部分、(5a) 、 (5b)
は、いずれもレーザビームであり、前者がリード(2)
、タイバ(3)、本体(1)に沿って、一方の側から他
方の側にバIJ (m)を突き抜くまで照射されるもの
、後者がリード(2)またはタイバ(3)上のバIJ
(4b)を除去するため両側から照射されるもの、(4
c)は周囲をレーザビーム(5a)により除去されたバ
IJ (4b)の残部、(6)は残部(4C)を吹きつ
けることにより除去する高圧力流体であって、この実施
例では、高圧力水である。Figure 1 fal, [b), (cl is a series of sectional views showing one embodiment of the present invention, (1) to (4),
(4a) and (4b) are the same or corresponding parts to the conventional ones with the same symbol, (5a) and (5b)
are both laser beams, and the former is the lead (2)
, tie bar (3), which is irradiated along the main body (1) from one side to the other until it pierces the bar IJ (m), the latter on the lead (2) or on the tie bar (3). I.J.
(4b), which is irradiated from both sides to remove (4b);
c) is the remaining part of the bar IJ (4b) removed by the laser beam (5a), and (6) is the high-pressure fluid that is removed by spraying the remaining part (4C). It is pressure water.
この実施例の方法は樹脂封止が完了した半導装置に第1
図(atの如くレーザビーム(5a) 、 (sb)を
照射する。次に、リード(2)、タイバ(3)表面のバ
リ(5b)、および、リード(2)、タイバ(3)、本
体(1)に沿ったバリ(4a)の周囲が除去され、残さ
れバIJ (4a)の残部(4C)に第3図(blの如
く、高圧力水(6)を吹き付けるその結果第3図(c)
の構造が得られる。In the method of this embodiment, the semiconductor device which has been resin-sealed is
Laser beams (5a) and (sb) are irradiated as shown in figure (at). Next, burrs (5b) on the surfaces of the lead (2), tie bar (3), The area around the burr (4a) along (1) is removed, and the remaining part (4C) of the remaining burr IJ (4a) is sprayed with high pressure water (6) as shown in Figure 3 (bl). (c)
The structure is obtained.
さて、前記の問題点については、レーザビーム(5a)
、 (5b)の照射位置は任音番こ設♀可能である力
1ら−多品種少量生産の半導体装置の製造に適用しても
コストアンプにならず解決されることは明らかである。Now, regarding the above problem, the laser beam (5a)
It is clear that the irradiation position in (5b) can be set at any arbitrary number.It is clear that the problem can be solved without causing a cost increase even when applied to the manufacture of semiconductor devices of high variety and low volume production.
なお、上記実施例では2高圧力水を用いたが。In addition, in the above example, 2 high pressure water was used.
高圧空気など、他の液体、気体等高圧力流体であっても
よい。Other liquids such as high-pressure air, high-pressure fluids such as gases, etc. may also be used.
所で上記実施例では高圧力流体の吹き付けを併用する場
合lこついて述べたが1例えば第1図(a)のレーザビ
ーム(5a)の幅を充分大にすれば、レーザ照射のみで
除去することも可能である。By the way, in the above embodiment, it was mentioned that the spraying of high-pressure fluid is also used.1 For example, if the width of the laser beam (5a) in FIG. 1(a) is made sufficiently large, it can be removed by laser irradiation alone. It is also possible.
この発明は以上説明したと3つ、レーザ照射によりバリ
を除去するので、多品種少量生産の半導体装置に適用し
て生産コストを低減できる効果がある。In addition to the three points described above, this invention removes burrs by laser irradiation, so it can be applied to semiconductor devices produced in a wide variety of small quantities and has the effect of reducing production costs.
また、この発明の別の発明は、レーザ照射と高圧流体の
吹き付けによりバリを除去することにより、さらに生産
コストを引き下げられる効果がある。Another aspect of the present invention has the effect of further reducing production costs by removing burrs by laser irradiation and spraying of high-pressure fluid.
gi図(al、 (b)、 fclはこの発明の一実施
例を示す一連の断面図、第2図は従来の半導体装置の製
造方法を説明するため1部分斜視断面図、!g3図はこ
の発明の変形例を示す断面図である。
図に2いて、C1)は本体、(2)はリード、(3)は
タイバ、(4)はバリ、(5aン、 (sb)はいずれ
もレーザビーム、(6)は高圧力流体である。
各図中、同一符号は同一、または相当部分を示す。gi (al, (b)), fcl are a series of sectional views showing one embodiment of the present invention, Fig. 2 is a partial perspective sectional view for explaining the conventional method of manufacturing a semiconductor device, and !g3 is a series of sectional views showing one embodiment of the present invention. It is a sectional view showing a modification of the invention. In the figure, C1) is the main body, (2) is the lead, (3) is the tie bar, (4) is the burr, (5a), and (sb) are all lasers. The beam (6) is a high pressure fluid. In each figure, the same reference numerals indicate the same or corresponding parts.
Claims (5)
れた前記リードフレームのリード間およびそれらの表面
上にあるバリをレーザ照射により除去する工程とを 備えた半導体装置の製造方法。(1) A method for manufacturing a semiconductor device, comprising the steps of: sealing a lead frame with a resin; and removing burrs between and on the surfaces of the leads of the resin-sealed lead frame by laser irradiation.
照射し除去することを特徴とする特許請求の範囲第1項
記載の半導体装置の製造方法。(2) The method for manufacturing a semiconductor device according to claim 1, characterized in that burrs on both the upper and lower surfaces of the lead are removed by separately irradiating laser beams.
けるまでレーザ照射し、前記バリをくり抜いて除去する
ことを特徴とする特許請求の範囲第1項記載の半導体装
置の製造方法。(3) A method for manufacturing a semiconductor device according to claim 1, characterized in that the burr between the leads is irradiated with a laser until it penetrates from one side to the other, and the burr is hollowed out and removed.
れた前記リードフレームのリード間およびそれらの表面
上にあるバリの一部をレーザ照射により除去し、その残
部を高圧流体を吹き付けて除去する工程とを 備えた半導体装置の製造方法。(4) Step of sealing the lead frame with resin, and removing some of the burrs between the leads of the resin-sealed lead frame and on their surfaces by laser irradiation, and removing the remaining part by spraying high-pressure fluid. A method for manufacturing a semiconductor device, comprising the steps of:
を一方の側からレーザ照射して除去し、その残部を同一
方向から高圧吹き付けて除去することを特徴とする特許
請求の範囲第4項記載の半導体装置の製造方法。(5) Part of the burr between the leads and on their surface is removed by laser irradiation from one side, and the remaining part is removed by high-pressure spraying from the same direction. A method for manufacturing a semiconductor device according to section 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61090932A JPS62247553A (en) | 1986-04-18 | 1986-04-18 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61090932A JPS62247553A (en) | 1986-04-18 | 1986-04-18 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62247553A true JPS62247553A (en) | 1987-10-28 |
Family
ID=14012218
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61090932A Pending JPS62247553A (en) | 1986-04-18 | 1986-04-18 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62247553A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5700697A (en) * | 1993-02-01 | 1997-12-23 | Silicon Packaging Technology | Method for packaging an integrated circuit using a reconstructed package |
KR100242362B1 (en) * | 1995-01-18 | 2000-02-01 | 가네꼬 히사시 | Lead frame for a resin sealed semiconductor device and a manufacturing method for a resin sealed semiconductor device |
EP1130637A1 (en) * | 2000-03-03 | 2001-09-05 | STMicroelectronics S.r.l. | A method of removing moulding residues during the manufacture of plastic packages for semiconductor devices |
JP2002289757A (en) * | 2001-03-27 | 2002-10-04 | New Japan Radio Co Ltd | Lead cutting method of electronic component |
US6813828B2 (en) | 2002-01-07 | 2004-11-09 | Gel Pak L.L.C. | Method for deconstructing an integrated circuit package using lapping |
JP2004343038A (en) * | 2003-05-12 | 2004-12-02 | Jettech Ltd | Semiconductor package having cutting groove on side flash, method of forming this cutting groove, deflashing method in semiconductor package having cutting groove |
US6884663B2 (en) | 2002-01-07 | 2005-04-26 | Delphon Industries, Llc | Method for reconstructing an integrated circuit package using lapping |
JP2008252005A (en) * | 2007-03-30 | 2008-10-16 | Sanyo Electric Co Ltd | Deburring method and semiconductor device manufacturing method |
CN102623360A (en) * | 2011-01-31 | 2012-08-01 | 三菱电机株式会社 | Method for manufacturing semiconductor device |
JP2015149320A (en) * | 2014-02-04 | 2015-08-20 | 新電元工業株式会社 | Method of manufacturing resin sealed type semiconductor device, resin sealed type semiconductor device, and device of manufacturing resin sealed type semiconductor device |
WO2021020398A1 (en) * | 2019-07-29 | 2021-02-04 | 有限会社中島精工 | Corner part shaping device and corner part shaping method |
-
1986
- 1986-04-18 JP JP61090932A patent/JPS62247553A/en active Pending
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5700697A (en) * | 1993-02-01 | 1997-12-23 | Silicon Packaging Technology | Method for packaging an integrated circuit using a reconstructed package |
KR100242362B1 (en) * | 1995-01-18 | 2000-02-01 | 가네꼬 히사시 | Lead frame for a resin sealed semiconductor device and a manufacturing method for a resin sealed semiconductor device |
EP1130637A1 (en) * | 2000-03-03 | 2001-09-05 | STMicroelectronics S.r.l. | A method of removing moulding residues during the manufacture of plastic packages for semiconductor devices |
JP2002289757A (en) * | 2001-03-27 | 2002-10-04 | New Japan Radio Co Ltd | Lead cutting method of electronic component |
US6884663B2 (en) | 2002-01-07 | 2005-04-26 | Delphon Industries, Llc | Method for reconstructing an integrated circuit package using lapping |
US6813828B2 (en) | 2002-01-07 | 2004-11-09 | Gel Pak L.L.C. | Method for deconstructing an integrated circuit package using lapping |
JP2004343038A (en) * | 2003-05-12 | 2004-12-02 | Jettech Ltd | Semiconductor package having cutting groove on side flash, method of forming this cutting groove, deflashing method in semiconductor package having cutting groove |
JP2008252005A (en) * | 2007-03-30 | 2008-10-16 | Sanyo Electric Co Ltd | Deburring method and semiconductor device manufacturing method |
CN102623360A (en) * | 2011-01-31 | 2012-08-01 | 三菱电机株式会社 | Method for manufacturing semiconductor device |
US20120196405A1 (en) * | 2011-01-31 | 2012-08-02 | Mitsubishi Electric Corporation | Method for manufacturing semiconductor device |
US8518751B2 (en) * | 2011-01-31 | 2013-08-27 | Mitsubishi Electric Corporation | Method for manufacturing semiconductor device including removing a resin burr |
JP2015149320A (en) * | 2014-02-04 | 2015-08-20 | 新電元工業株式会社 | Method of manufacturing resin sealed type semiconductor device, resin sealed type semiconductor device, and device of manufacturing resin sealed type semiconductor device |
WO2021020398A1 (en) * | 2019-07-29 | 2021-02-04 | 有限会社中島精工 | Corner part shaping device and corner part shaping method |
JP6868316B1 (en) * | 2019-07-29 | 2021-05-12 | 有限会社中島精工 | Corner shaping device and corner shaping method |
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