JPS62212329A - Production of alpha-hydroxycarboxylic acid derivative - Google Patents
Production of alpha-hydroxycarboxylic acid derivativeInfo
- Publication number
- JPS62212329A JPS62212329A JP61056471A JP5647186A JPS62212329A JP S62212329 A JPS62212329 A JP S62212329A JP 61056471 A JP61056471 A JP 61056471A JP 5647186 A JP5647186 A JP 5647186A JP S62212329 A JPS62212329 A JP S62212329A
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- formula
- phenyl
- formulas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 27
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 26
- 150000001875 compounds Chemical class 0.000 claims abstract description 19
- 125000005843 halogen group Chemical group 0.000 claims abstract description 8
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 6
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 5
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 5
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 5
- 239000002585 base Substances 0.000 claims abstract description 5
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 5
- 125000001424 substituent group Chemical group 0.000 claims description 49
- 239000000126 substance Substances 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 239000011777 magnesium Substances 0.000 claims description 7
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 5
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 5
- 239000000460 chlorine Substances 0.000 claims description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 4
- 239000011630 iodine Chemical group 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 3
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical group O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 claims description 3
- 125000006570 (C5-C6) heteroaryl group Chemical group 0.000 claims 4
- 125000006239 protecting group Chemical group 0.000 claims 2
- OTGHWLKHGCENJV-UHFFFAOYSA-N glycidic acid Chemical class OC(=O)C1CO1 OTGHWLKHGCENJV-UHFFFAOYSA-N 0.000 abstract description 13
- -1 OH-protecting group Chemical group 0.000 abstract description 8
- 239000012434 nucleophilic reagent Substances 0.000 abstract description 3
- 150000003354 serine derivatives Chemical class 0.000 abstract description 3
- 239000007858 starting material Substances 0.000 abstract description 3
- 108010061435 Enalapril Proteins 0.000 abstract description 2
- GBXSMTUPTTWBMN-XIRDDKMYSA-N enalapril Chemical compound C([C@@H](C(=O)OCC)N[C@@H](C)C(=O)N1[C@@H](CCC1)C(O)=O)CC1=CC=CC=C1 GBXSMTUPTTWBMN-XIRDDKMYSA-N 0.000 abstract description 2
- 229960000873 enalapril Drugs 0.000 abstract description 2
- 230000001766 physiological effect Effects 0.000 abstract description 2
- 239000003375 plant hormone Substances 0.000 abstract description 2
- 239000002994 raw material Substances 0.000 abstract 2
- JNJCEALGCZSIGB-VIFPVBQESA-N (2s)-2-hydroxy-4-phenylbutanoic acid Chemical compound OC(=O)[C@@H](O)CCC1=CC=CC=C1 JNJCEALGCZSIGB-VIFPVBQESA-N 0.000 abstract 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical class OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 abstract 1
- 125000003277 amino group Chemical group 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 36
- 239000000047 product Substances 0.000 description 19
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- OTGHWLKHGCENJV-UWTATZPHSA-N (2r)-oxirane-2-carboxylic acid Chemical compound OC(=O)[C@H]1CO1 OTGHWLKHGCENJV-UWTATZPHSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 9
- PHSLYQFWLCWIBU-UHFFFAOYSA-M magnesium;1-chloro-2-methanidylbenzene;chloride Chemical compound [Mg+2].[Cl-].[CH2-]C1=CC=CC=C1Cl PHSLYQFWLCWIBU-UHFFFAOYSA-M 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 6
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 5
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 5
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 5
- 229940045803 cuprous chloride Drugs 0.000 description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- OTGHWLKHGCENJV-REOHCLBHSA-N (2s)-oxirane-2-carboxylic acid Chemical compound OC(=O)[C@@H]1CO1 OTGHWLKHGCENJV-REOHCLBHSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N DMSO Substances CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 4
- 235000019341 magnesium sulphate Nutrition 0.000 description 4
- SCEZYJKGDJPHQO-UHFFFAOYSA-M magnesium;methanidylbenzene;chloride Chemical compound [Mg+2].[Cl-].[CH2-]C1=CC=CC=C1 SCEZYJKGDJPHQO-UHFFFAOYSA-M 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- VOXXWSYKYCBWHO-QMMMGPOBSA-N (S)-3-phenyllactic acid Chemical compound OC(=O)[C@@H](O)CC1=CC=CC=C1 VOXXWSYKYCBWHO-QMMMGPOBSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000006164 6-membered heteroaryl group Chemical group 0.000 description 2
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 2
- 239000007818 Grignard reagent Substances 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- MTCFGRXMJLQNBG-UHFFFAOYSA-N Serine Natural products OCC(N)C(O)=O MTCFGRXMJLQNBG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- YPJGFXMVFBGFBS-UHFFFAOYSA-M [Cl-].CC1=CC=CC=C1C[Mg+] Chemical compound [Cl-].CC1=CC=CC=C1C[Mg+] YPJGFXMVFBGFBS-UHFFFAOYSA-M 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000003931 anilides Chemical class 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 150000004795 grignard reagents Chemical class 0.000 description 2
- MPIXEEVXDGICED-UHFFFAOYSA-M magnesium;1-methanidyl-3-methylbenzene;chloride Chemical compound [Mg+2].[Cl-].CC1=CC=CC([CH2-])=C1 MPIXEEVXDGICED-UHFFFAOYSA-M 0.000 description 2
- CQRPUKWAZPZXTO-UHFFFAOYSA-M magnesium;2-methylpropane;chloride Chemical compound [Mg+2].[Cl-].C[C-](C)C CQRPUKWAZPZXTO-UHFFFAOYSA-M 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- ANRQGKOBLBYXFM-UHFFFAOYSA-M phenylmagnesium bromide Chemical compound Br[Mg]C1=CC=CC=C1 ANRQGKOBLBYXFM-UHFFFAOYSA-M 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 2
- JNJCEALGCZSIGB-SECBINFHSA-N (2r)-2-hydroxy-4-phenylbutanoic acid Chemical compound OC(=O)[C@H](O)CCC1=CC=CC=C1 JNJCEALGCZSIGB-SECBINFHSA-N 0.000 description 1
- OPBFFNZNNJKRCS-YFKPBYRVSA-N (2s)-2-hydroxy-4,4-dimethylpentanoic acid Chemical compound CC(C)(C)C[C@H](O)C(O)=O OPBFFNZNNJKRCS-YFKPBYRVSA-N 0.000 description 1
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- NVNPLEPBDPJYRZ-UHFFFAOYSA-N 1-(bromomethyl)-4-fluorobenzene Chemical compound FC1=CC=C(CBr)C=C1 NVNPLEPBDPJYRZ-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006163 5-membered heteroaryl group Chemical group 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N Lactic Acid Natural products CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- YUXBERNRHDAYRR-UHFFFAOYSA-N [Mg]CC1=CC=CC=C1Cl Chemical compound [Mg]CC1=CC=CC=C1Cl YUXBERNRHDAYRR-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- SLUNEGLMXGHOLY-UHFFFAOYSA-N benzene;hexane Chemical compound CCCCCC.C1=CC=CC=C1 SLUNEGLMXGHOLY-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 239000012230 colorless oil Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- PXJJSXABGXMUSU-UHFFFAOYSA-N disulfur dichloride Chemical compound ClSSCl PXJJSXABGXMUSU-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- FRIJBUGBVQZNTB-UHFFFAOYSA-M magnesium;ethane;bromide Chemical compound [Mg+2].[Br-].[CH2-]C FRIJBUGBVQZNTB-UHFFFAOYSA-M 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229960003424 phenylacetic acid Drugs 0.000 description 1
- 239000003279 phenylacetic acid Substances 0.000 description 1
- NHKJPPKXDNZFBJ-UHFFFAOYSA-N phenyllithium Chemical compound [Li]C1=CC=CC=C1 NHKJPPKXDNZFBJ-UHFFFAOYSA-N 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 description 1
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 125000004632 tetrahydrothiopyranyl group Chemical group S1C(CCCC1)* 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000007039 two-step reaction Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Epoxy Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
発明の目的
α−ハイドロキシカルボン酸誘導体は有用な医薬品、た
とえばエナラプリルおよびその誘導体の合成における重
要中間体であることおよびα−ハイドロサシカルボン酸
は植物ホルモンの生理活性を有することが知られている
。従ってα−ハイドロキシカルボン酸の実用的な合成法
の開発が望まれている。発明者等はセリン誘導体を出発
物質として好収率でα−ハイドロキシカルボン酸が得ら
れる方法を見い出し、本発明を完成した。Detailed Description of the Invention Object of the invention α-hydroxycarboxylic acid derivatives are important intermediates in the synthesis of useful pharmaceuticals, such as enalapril and its derivatives, and α-hydroxycarboxylic acid has the physiological activity of a plant hormone. It is known. Therefore, the development of a practical method for synthesizing α-hydroxycarboxylic acids is desired. The inventors discovered a method for obtaining α-hydroxycarboxylic acid in good yield using a serine derivative as a starting material, and completed the present invention.
発明の構成
〔式中、R1およびR2は、同一または異なって、水素
原子、アルキル基または置換基を有してもよいフェニル
基を示し、R3は、水酸基。Structure of the Invention [In the formula, R1 and R2 are the same or different and represent a hydrogen atom, an alkyl group, or a phenyl group which may have a substituent, and R3 is a hydroxyl group.
OR’基(nAは、アルキル基、水酸基の保護基、置換
基を有してもよいフェニル基、スクシンイミド基または
−N:CH−C> 基を示す。)、SR5基(R5は、
アルキル基、置換基を有しても よいフェニル基または
置換基を有してもよい5j&もしくは6員環ヘテロアリ
ール基を示す。)、NR6B’基(R6およびR7は、
同一または異なって、水素原子、C1〜C10のアルキ
ル基、 置換基を有してもよいフェニル基、置換基を有
してもよいアラルキル基またはR6とR7が一緒になっ
て−(CH2)n−基(n = 3.4.5を示す。)
、またはNHNHR8基(R8は、水素原子、アルキル
基またはフェニル基を示・す。)を示し、Yは、ハロゲ
ン原子を示す。〕を有する化合物を塩基で処理して
〔式中、R’、R2およびR3は、前述したものと同意
義を示す。〕を有する化合物に導き、ついでこの化合物
に
式 RM
(311m式中、Rは、アルキル基、アルケニル基
0、置換基を有してもよいフェニル基、置換基を有して
もよいベンジル基、置換基を有してもよい5員もしくは
sl珈へテロアリール基または置換基を有してもよい5
員もしくは6員珈ヘテロアリールメチル基を示し、Mは
、MgX (Mgはマグネシウムを示し、Xは、塩素、
臭素または沃素を示す。)またはアルカリ金属を示す。OR' group (nA represents an alkyl group, a hydroxyl protecting group, a phenyl group which may have a substituent, a succinimide group or a -N:CH-C> group), an SR5 group (R5 is
It represents an alkyl group, a phenyl group which may have a substituent, or a 5j& or 6-membered heteroaryl group which may have a substituent. ), NR6B' group (R6 and R7 are
The same or different hydrogen atom, C1-C10 alkyl group, phenyl group which may have a substituent, aralkyl group which may have a substituent, or R6 and R7 taken together -(CH2)n - group (indicates n = 3.4.5)
, or NHNHR8 group (R8 represents a hydrogen atom, an alkyl group, or a phenyl group), and Y represents a halogen atom. ] is treated with a base to produce [wherein R', R2 and R3 have the same meanings as described above. ] and then give this compound the formula RM
(In formula 311m, R is an alkyl group, an alkenyl group 0, a phenyl group which may have a substituent, a benzyl group which may have a substituent, a 5-membered or sl group which may have a substituent) 5 which may have a heteroaryl group or a substituent
or 6-membered heteroarylmethyl group, M is MgX (Mg is magnesium, X is chlorine,
Indicates bromine or iodine. ) or alkali metal.
〕を有する化合物を反応させることを特徴とする〔式中
、R,R’、R2およびR3は、 前述したものと同意
義を示す。〕を有する化合物の製法である。] [wherein R, R', R2 and R3 have the same meanings as described above. ] is a method for producing a compound having the following.
上記説明中、R’、 R2,R’、 R5,R8および
Rにおけるアルキル基は、たとえばメチル、エチル、プ
ロピル、イソプロピル、ブチル、イソブチル、S−ブチ
ルまたはt−ブチルがあげられる。In the above description, the alkyl groups in R', R2, R', R5, R8 and R include, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, S-butyl or t-butyl.
R’、 R2,R’# R5,R’、 17およびRに
おける置換基を有するフェニル基の置換基は、たとえば
アルキル、アルコキシ基、ハロゲン原子、トリフルオロ
メチル基、ニトロ基またはシアノ基があけられ、そのア
ルキル基は、たとえばメチル、エチル、プロピルまたは
イソプロピル基があげられ、アルコキシ基は、たとえは
メトキシ、エトキシまたはプロポキシがあげられ、ハロ
ゲン原子は、弗素、塩素または臭素原子があげられる。R', R2, R'# R5, R', 17 and the substituent of the phenyl group having a substituent in R are, for example, alkyl, alkoxy group, halogen atom, trifluoromethyl group, nitro group or cyano group. The alkyl group is, for example, a methyl, ethyl, propyl or isopropyl group, the alkoxy group is, for example, methoxy, ethoxy or propoxy, and the halogen atom is a fluorine, chlorine or bromine atom.
R5およびRにおける5員もしくは6員環ヘテロアリー
ル基は、たとえはフリル、チェニル、チアゾリルまたは
ピリジルがあげられ、これらの基が置換基を有する場合
の置換基は、前述したフェニル基の置換基の例示と同じ
である。Examples of the 5-membered or 6-membered heteroaryl group in R5 and R include furyl, chenyl, thiazolyl, or pyridyl, and when these groups have a substituent, the substituent is the same as the substituent of the phenyl group described above. Same as the example.
R6およびR7のアルキル基は、たとえばベンジル、2
−フェネチル、1−フエネチルマタハ3−フェニルプロ
ピルがあげられ、置換基を有するアラルキル基の置換基
は、前述したフェニル基の置換基の例示と同じである、
Rの置換基を有するベンジル基の置換基は、前述したフ
ェニル基の置換基の例示と同じである。Rのへテロアリ
ールメチル基のへテロアリール基は、前述したヘテロア
リール基の例示と同じであり、置換基を有するヘテロア
リールメチル基の置換基は、前述したフェニル基の置換
基の例示と同じである。The alkyl group of R6 and R7 is, for example, benzyl, 2
-Phenethyl, 1-phenethylmataha, 3-phenylpropyl, and the substituent of the aralkyl group having a substituent is the same as the above-mentioned examples of the substituent of the phenyl group.The substituent of the benzyl group having a substituent of R are the same as the examples of substituents for the phenyl group described above. The heteroaryl group of the heteroarylmethyl group of R is the same as the above-mentioned heteroaryl group, and the substituent of the heteroarylmethyl group having a substituent is the same as the above-mentioned substituent of the phenyl group. be.
R4の水酸基の保設基は、たとえばt−ブチル、アリル
、テトラヒドロピラニル、テトラヒドロチオピラニル、
置換メチル基(該置換基は、たとえばメトキシ、エトキ
シまたはクロロメチメチルチオ、フェニルスルホニルマ
タハニトロフェニルチオがあげられる。)、置換基を有
してもよいアラルキル基(アラルキル基は、たとえばベ
ンジル、ジフェニルメチルまたはトリフェニルメチルが
あげられ、該置換基は、たとえばメチル、エチル、メト
キシまたはエトキシがあげられる。)、−C(O19)
5基(R9は、メチル、エチル、プロピルまたはイソプ
ロピルのようなアルキル基な示す。)またはトリ置換シ
リル基(該置換基は、たとえば同一または異なって、メ
チル、エチル、プロピル、ブチル、t−ブチル、フェニ
ル、メトキシ、エトキシ、プロポキシまたはブトキシが
あげられる。)があげられる。The hydroxyl retaining group of R4 is, for example, t-butyl, allyl, tetrahydropyranyl, tetrahydrothiopyranyl,
Substituted methyl groups (such substituents include, for example, methoxy, ethoxy or chloromethymethylthio, phenylsulfonylmatahanitrophenylthio), aralkyl groups which may have substituents (such as benzyl, diphenylmethyl, or triphenylmethyl, and the substituent is, for example, methyl, ethyl, methoxy or ethoxy), -C(O19)
5 groups (R9 represents an alkyl group such as methyl, ethyl, propyl or isopropyl) or a trisubstituted silyl group (the substituents may be the same or different, for example, methyl, ethyl, propyl, butyl, t-butyl) , phenyl, methoxy, ethoxy, propoxy or butoxy).
R6およびR7のC1〜C1゜のアルキル基は、たとえ
ばメチル、エチル、プロピル、インプロピル、フチル、
t−ブチル、ペンチル、S−ペンチル、ヘキシル、ヘプ
チル、オクチル、ノニルまたはデシルがあげられる。The C1-C1° alkyl group of R6 and R7 is, for example, methyl, ethyl, propyl, inpropyl, phthyl,
Mention may be made of t-butyl, pentyl, S-pentyl, hexyl, heptyl, octyl, nonyl or decyl.
Rのアルケニル基は、たとえばビニルまたはアリルがあ
げられる。Examples of the alkenyl group for R include vinyl or allyl.
Mのアルカリ金属は、たとえばリチウム、ナトリウムま
たはカリウムがあげられる。Examples of the alkali metal M include lithium, sodium or potassium.
Yのハロゲン原子は、たとえば塩素、臭素または沃素原
子があげられる。Examples of the halogen atom of Y include chlorine, bromine, or iodine.
本発明の製法を反応式で示すと次のとおりである。The reaction formula of the production method of the present invention is as follows.
〔式中、R’、 R2,Y、 RおよびMは、前述した
ものと同意義を示す。〕
セリン訪導体の7ミノ基を常法に従ってハロゲン原子に
変換して得られる化合物(11を塩基で処理しグリシド
酸誘導体(2)へ導き(第1工程)、この化合物に求核
試薬(3)を反応(第2工程)させるとα−ハイドロキ
シカルボン酸誘導体(41が得られる。[In the formula, R', R2, Y, R and M have the same meanings as described above. ] A compound obtained by converting the 7-mino group of the serine conductor to a halogen atom (11) is treated with a base to form a glycidic acid derivative (2) (first step), and this compound is treated with a nucleophilic reagent (3). ) is reacted (second step) to obtain an α-hydroxycarboxylic acid derivative (41).
第1工程:本反応は、水、メタノール、エタノール、ア
セトン、アセトニトリル、テトラヒドロフラン、ジオキ
サン、ベンゼン、トルエン、酢酸エチル、塩化メチレン
または1.2−ジクロロエタン中、2当量以上、好まし
くはz1〜3当量の塩基(たとえば水酸化カリウム、水
酸化ナトリウム、水酸化リチウム、水酸化カルシウム、
炭酸ナトリウム、炭酸水素ナトリウム、トリエチルアミ
ン、N−メチルモルホリンまたは1.8一ジアザビシク
ロ(S、4.0)ウンデカ−γ−エンがあげられる。)
の存在下、06〜室温でQ、5〜!時間行う。反応液に
*(たとえば硫酸水素カリウム、硫酸水素ナトリウム、
硫酸、塩酸、臭化水素酸、硝酸、トリフルオロ酢酸、ト
リクロロ酢酸、モノクロロ酢酸、メタンスルホン酸、ベ
ンゼンスルホン酸マたはトルエンスルホン酸があげられ
る。)の水浴液を加え中和後溶媒(たとえば第1工程の
反応に使用する溶媒のうち水と混合しない溶媒があげら
れる。)で抽出するとグリシド酸誘導体(21が得られ
る。こ瓦に得られた化合物(2)は必要に応じて再結晶
またはクロマトグラフィーにより精製できるが、精製せ
ず次の反応に用いることもできる。1st step: This reaction is carried out using 2 equivalents or more, preferably z1 to 3 equivalents, of Bases (e.g. potassium hydroxide, sodium hydroxide, lithium hydroxide, calcium hydroxide,
Mention may be made of sodium carbonate, sodium hydrogen carbonate, triethylamine, N-methylmorpholine or 1.8-diazabicyclo(S, 4.0)undec-γ-ene. )
In the presence of Q, 5~ at room temperature from 06~! Do time. * (e.g. potassium hydrogen sulfate, sodium hydrogen sulfate,
Examples include sulfuric acid, hydrochloric acid, hydrobromic acid, nitric acid, trifluoroacetic acid, trichloroacetic acid, monochloroacetic acid, methanesulfonic acid, benzenesulfonic acid, and toluenesulfonic acid. ), and after neutralization, extract with a solvent (for example, a solvent that is immiscible with water among the solvents used in the reaction in the first step) to obtain the glycidic acid derivative (21). Compound (2) can be purified by recrystallization or chromatography if necessary, but can also be used in the next reaction without being purified.
第2工程二本反応はエーテルまたはテトラヒドロフラン
中、−78°〜50℃好ましくは−201:〜室温で1
0分間〜5時間好ましくは0.5〜2時間行う。化合物
(3)は化合物(2)に対して1〜5当量。The second step two-step reaction is carried out in ether or tetrahydrofuran at -78° to 50°C, preferably at -201: to room temperature.
It is carried out for 0 minutes to 5 hours, preferably 0.5 to 2 hours. Compound (3) is 1 to 5 equivalents relative to compound (2).
好ましくは1〜3当量であり、化合物(3)がグリニヤ
試薬である場合には本反応にハロゲン化鋼(たとえば塩
化第一銅、臭化第一鋼または沃化第一銅があげられる)
をグリニヤ試薬に対して0.1〜0.3当量加えると目
的物の収率が向上する。It is preferably 1 to 3 equivalents, and when compound (3) is a Grignard reagent, halogenated steel (for example, cuprous chloride, cuprous bromide, or cuprous iodide) is used in this reaction.
When 0.1 to 0.3 equivalents are added to the Grignard reagent, the yield of the target product is improved.
本反応終了後常法に従って処理すると目的物(4)が得
られ、必要ならば再結晶またはクロマトグラフィーによ
り!#製することができる。After completion of this reaction, the desired product (4) can be obtained by processing according to conventional methods, and if necessary, by recrystallization or chromatography! #Can be made.
発明の効果
グリシド酸誘導体(2)に対し求核試薬(31は位置選
択的反応してα−ハイドロキシカルボンravj導体(
4)を与え、光学活性なセリン命導体から導かれるグリ
シド酸誘導体を用いて本反応を行うと立体選択的に光学
活性なα−ハイドロキシカルボン酸(41が好収率で得
られる。Effects of the Invention Nucleophilic reagent (31) reacts regioselectively with glycidic acid derivative (2) to form α-hydroxycarbon ravj conductor (
4) and conduct this reaction using a glycidic acid derivative derived from an optically active serine life conductor, stereoselectively optically active α-hydroxycarboxylic acid (41) can be obtained in good yield.
以下に実施例をあげ本発明を具体的に説明する。EXAMPLES The present invention will be specifically explained with reference to Examples below.
実施例1゜
L−七り7 tss、o f ニ(lk硫m 210
mlと水2350−の混合液を加え一5℃に冷却した。Example 1゜L-7 tss, of ni (lk sulfur m 210
A mixture of 2,350ml of water was added and the mixture was cooled to -5°C.
これに臭化カリウム65401 Fを添加後、亜硝酸ソ
ーダ11器3gを水560―に溶かした溶液を滴加し。After adding 65401 F of potassium bromide to this, a solution of 3 g of sodium nitrite dissolved in 560 g of water was added dropwise.
次いで室温で1時間攪拌後、窒素を通して溶液中の一酸
化窒素ガスを除いた。生成物を酢酸エチル1Jで抽出し
、さらに酢酸エチル500m1で4回抽出後、有機層を
合わせ減圧下、amすると(S)−α−プロモーβ−ハ
イドロキシププロオン@2rJS、41が得られた。こ
れを水600m1 に浴かし、O〜5″Cに冷却し、
苛性ソーダ102gを水Boostに溶かした溶液な注
加後、室温で1時間攪拌した。反応液を0〜5℃に冷却
し、 30%硫酸水素カリウム水溶液860耐を加えた
後、酢酸エチル81で抽出、さらに水層を酢酸エチル5
jで2回抽出後、有機層を減圧下濃縮すると無色油状物
1054f(収率9T、8%)が得られた。After stirring at room temperature for 1 hour, nitrogen monoxide gas in the solution was removed by passing nitrogen through the solution. The product was extracted with 1 J of ethyl acetate, and then extracted 4 times with 500 ml of ethyl acetate, and the organic layers were combined and ampered under reduced pressure to obtain (S)-α-promo β-hydroxypropproone @2rJS, 41. . This was soaked in 600ml of water and cooled to 0~5''C.
A solution prepared by dissolving 102 g of caustic soda in water Boost was added, and the mixture was stirred at room temperature for 1 hour. The reaction solution was cooled to 0 to 5°C, and 30% potassium hydrogen sulfate aqueous solution 860 ml was added, extracted with 81 ml of ethyl acetate, and the aqueous layer was diluted with 5 ml of ethyl acetate.
After extraction with J twice, the organic layer was concentrated under reduced pressure to obtain colorless oil 1054f (yield 9T, 8%).
NMR(CDCj3)δppm :
3.00 (2H,d、 J=3Hz )、
3.50 (IH,LJ==3Hz ) 、 11
.15 (S、 IH)IR: y:!7 : 304
0.1730.126G、 so。NMR (CDCj3) δppm: 3.00 (2H, d, J=3Hz),
3.50 (IH, LJ==3Hz), 11
.. 15 (S, IH)IR: y:! 7: 304
0.1730.126G, so.
mp、43′c(ベンゼン−ヘキサンより再結晶)〔α
) D+30.4 ((=1.5. CH3CN )実
施例2
D−セリy10fを出発原料とし、実施例1と同様の操
作を行い目的物6.5gが油状物として得られた。mp, 43'c (recrystallized from benzene-hexane) [α
) D+30.4 ((=1.5. CH3CN) Example 2 Using D-Seri y10f as a starting material, the same operation as in Example 1 was carried out to obtain 6.5 g of the target product as an oily substance.
NMR(cncj5)δpprtt : 3,05 (
2)1.d、J==a′Hz )−L57 (IH,t
、 J=3)iz )、 11.10 (IH,s )
neat 。NMR (cncj5) δpprtt: 3,05 (
2)1. d, J = = a'Hz ) - L57 (IH, t
, J=3)iz), 11.10 (IH,s)
neat.
IRν 、 3020.1715.1250(:r’
〔α] o 30.0 (C=1.0 ICH3C
N )実施例1
(R) −2−ハイドロキシ−4−フェニル酪酸窒素気
流下、ベンジルマグネシウムクロリド(IM/j−テト
ラヒドロフラン以下THFと略す。)18.1−を−1
0℃に冷却した。 これにヨウ化第−銅1.491を加
え、そのままの温度で10 分間攪拌した。これに(R
)−グリシド酸2.291をT)IF 20−に洛かし
た液を一10″Cを保つようにカリウム水溶液100耐
中へゆっくりとそそぎ、酢酸エチル10ローで2回抽出
した。その酢酸エチル層を飽和1そう水100 mで3
回抽出し1次にこの水層な塩酸でpH中1.5に調整し
、酢酸エチル(100m)で3回抽出した。無水硫酸マ
グネシウムで乾燥、r通抜溶媒を減圧下留去し、トルエ
ンで再結晶すると、目的の(R) −2−八mD115
〜116℃
〔α鮎= −8,s (c=1. gtolNMR(c
ncj3 )δppm : 1.83〜2.35 (2
H0m)。IRν, 3020.1715.1250(:r' [α] o 30.0 (C=1.0 ICH3C
N) Example 1 (R) -2-Hydroxy-4-phenylbutyric acid Under a nitrogen atmosphere, benzylmagnesium chloride (IM/j-tetrahydrofuran, hereinafter abbreviated as THF) 18.1- was converted to -1
Cooled to 0°C. To this was added 1.491 g of cupric iodide, and the mixture was stirred at the same temperature for 10 minutes. To this (R
2.291 of )-glycidic acid was dissolved in T)IF 20-, and the solution was slowly poured into a 100% potassium aqueous solution while maintaining the temperature at -10"C, and extracted twice with 100% ethyl acetate. Saturate the layer 1 with 100 m of water
The aqueous layer was extracted twice, the pH of the aqueous layer was adjusted to 1.5 with hydrochloric acid, and the mixture was extracted three times with ethyl acetate (100ml). Dry over anhydrous magnesium sulfate, remove the solvent under reduced pressure, and recrystallize from toluene to obtain the desired (R)-2-8mD115.
~116℃ [αAyu=-8,s (c=1.gtolNMR(c
ncj3) δppm: 1.83 to 2.35 (2
H0m).
2.79 (2H,t、J=7Hz)、4.23
(IH,dd。2.79 (2H, t, J=7Hz), 4.23
(IH, dd.
J=7.5H2)、 7.00 (2)I、 br、
8 )、 7.20 (SR,8)実施例4゜
(S)−グリシド酸とベンジルマグネシワムクロリドを
用い、実施例3と同様に操作すると(S) −2−ハイ
ドロキシ−4−フェニル醋酸力8896の収率で得られ
た。J=7.5H2), 7.00 (2)I, br,
8), 7.20 (SR, 8) Example 4 Using (S)-glycidic acid and benzylmagnesium chloride and operating in the same manner as in Example 3, (S)-2-hydroxy-4-phenyl acetic acid Obtained in a yield of 8896.
〔α〕。+8.3 ((=l、 gtol実施例5゜
(R8)−グリシド酸とベンジルマグネシウムクロリド
を用い、実施例3と同様に操作して(R8) −2−ハ
イドロキシ−4−フェニル酪酸が90%の収率で得られ
た。[α]. +8.3 ((=l, gtolExample 5゜Using (R8)-glycidic acid and benzylmagnesium chloride, the same procedure as in Example 3 was carried out until (R8)-2-hydroxy-4-phenylbutyric acid was 90% was obtained in a yield of .
実施例6゜
ヨを化第−銅600ηを一10″Cでフェニルマグネシ
ュウムプロミド(2M/j −THF )溶液17 d
K加え、窒素雰囲気下30分攪拌した。これに(B)−
グリシド酸1gの’rHF10−の溶液な内温−10〜
−5′cに保ちながら膚加し、同温度で1時間攪拌後、
室温でさらに1時間攪拌を続けた。反応液を水冷下30
優硫酸水素カリ 水溶液5Q−中へ注ぎ、次いで酢酸エ
チルSomeで2回抽出し、抽出液を重そう水溶液50
g/で3回抽出し、水層なam酸でputにした後、酢
酸エチル(51ので3回抽出した。硫酸マグネシウムで
乾燥、r通抜、溶媒を減圧下留去すると白色結晶の目的
物1.719(収率90 * )が得られた。Example 6 A solution of phenylmagnesium bromide (2M/j-THF) was prepared by adding 600η of cupric oxide at -10"C to 17d.
K was added thereto, and the mixture was stirred for 30 minutes under a nitrogen atmosphere. To this (B)-
The internal temperature of a solution of 1 g of glycidic acid in 'rHF10-10~
Add the skin while keeping it at -5'c, and after stirring for 1 hour at the same temperature,
Stirring was continued for an additional hour at room temperature. Cool the reaction solution with water for 30 minutes.
Pour into a 5Q aqueous solution of potassium hydrogen sulfate, then extract twice with ethyl acetate, and add the extract to a 50% aqueous solution of potassium hydrogen sulfate.
The aqueous layer was extracted with amic acid and extracted three times with ethyl acetate (51). Dry over magnesium sulfate, evacuate through R, and evaporate the solvent under reduced pressure to obtain the desired product as white crystals. 1.719 (yield 90*) was obtained.
〔α] D + 29−32 ((==l * CH3
0N )NMR(CDCj3 + d’−0M80 )
δppm : 2.113〜3.17(2H* rn)
a 433 (IH# dd、J==7.5Hz
)。[α] D + 29-32 ((==l * CH3
0N) NMR (CDCj3 + d'-0M80)
δppm: 2.113 to 3.17 (2H*rn)
a 433 (IH# dd, J==7.5Hz
).
7.23 (5H,s)、、7.50 (2H,brJ
)実施例T。7.23 (5H,s), 7.50 (2H,brJ
) Example T.
(S)−β−フェニル乳酸
<S>−グリシド酸とフェニルマグネシウムプロミドを
用い、実施例日と同様に操作して(8)−β−フェニル
乳酸が91%の収率で得られた。(S)-β-Phenyl lactic acid <S>-Glycidic acid and phenylmagnesium bromide were used in the same manner as in Example 1 to obtain (8)-β-Phenyl lactic acid in a yield of 91%.
〔α)’Ij −29,50(C=1. CH3CN)
実施例8゜
(R) −3−t−グチル乳酸
t−ブチルマグネシュウムクロリド17.3gZ(25
%エーテル溶液)を−10℃に冷却し、塩化第一銅30
0 Qを加え、窒素気流下同温度で30分攪拌した後、
(R)−グリシド酸1fIの’i’)iF1Gml溶液
な内温−10〜−s’cに保ちながら滴加し、次いで室
温で1時間30分攪拌をつづけた。実施例3と同様に後
処理を行い目的物147jl(収率88%)が白色結晶
として得られた。[α)'Ij -29,50 (C=1.CH3CN)
Example 8゜(R)-3-t-glylactic acid t-butylmagnesium chloride 17.3gZ (25
% ether solution) was cooled to -10°C and diluted with cuprous chloride (30%).
After adding 0 Q and stirring at the same temperature under nitrogen stream for 30 minutes,
A solution of (R)-glycidic acid 1fI in 'i')iF1Gml was added dropwise while maintaining the internal temperature at -10 to -s'c, and then stirring was continued for 1 hour and 30 minutes at room temperature. Post-treatment was carried out in the same manner as in Example 3, and 147jl (yield: 88%) of the target product was obtained as white crystals.
〔α] 、 +5.35 (c==0.986. CH
,CN )NMR(CDCj5+d’−DM80 )δ
” 1.03 (9)t−8)jpm e
1.30〜1−69 (2H−m)−4,10(1He
dd、J=7.5Hz )、 8.30 (IH,b
r、s )実施例9゜
(8) −3−t−ブチル乳酸
(8)−グリシド酸とt−グチルマグネシウムクロリド
を用い実施例8と同様に操作して(S)−3−t−ブチ
ル乳酸が85%の収率で得られた。[α], +5.35 (c==0.986.CH
,CN)NMR(CDCj5+d'-DM80)δ
” 1.03 (9)t-8)jpm e 1.30~1-69 (2H-m)-4,10(1He
dd, J=7.5Hz), 8.30 (IH, b
r, s) Example 9゜(8) -3-t-Butyl lactic acid (8) Using the same procedure as in Example 8 using (8)-glycidic acid and t-butylmagnesium chloride, (S)-3-t-butyl Lactic acid was obtained with a yield of 85%.
〔α〕0−5.s (C:1. CH,CN)実施例1
0゜
4−フルオロベンジルプロミド5.63f、hマグネシ
ュウム1.11とより調整した4−フルオロペンジルマ
グネシウムプロミドのTHF浴液を一10′cに冷却し
、これにヨウ化第−銅600■を加えて同温度で30分
間攪拌し、た。(R)−グリシド酸1.031のTI(
F t(l s/、浴液な−10〜−5℃に保ちながら
滴加し、次いで室温に戻して1時間攪拌後実施例aと同
様に後処理を行い目的物1ll(収率92%)を得た。[α]0-5. s (C: 1. CH, CN) Example 1
A THF bath solution of 4-fluoropenzylmagnesium bromide prepared with 5.63 f of 4-fluorobenzyl bromide and 1.11 h of magnesium was cooled to -10'C, and 600 g of cupric iodide was added to the solution. (2) was added and stirred at the same temperature for 30 minutes. TI of (R)-glycidic acid 1.031 (
F t (l s/, added dropwise to the bath liquid while keeping it at -10 to -5°C, then returned to room temperature, stirred for 1 hour, and then post-treated in the same manner as in Example a to obtain 1 liter of the target product (yield 92%). ) was obtained.
NMIL (CI)3COCD、 )299m ; 1
.66〜150 (2H,m)。NMIL (CI)3COCD, )299m; 1
.. 66-150 (2H, m).
2.80 (2H,t、 J=7Hz)、 4.19
(IH,dd。2.80 (2H, t, J=7Hz), 4.19
(IH, dd.
J=4.5)tz)、 6.80〜7.48 (4)t
、 m)、 T、TG(2H1br、8 )
実施例11゜
シ品酸
3−メチルベンジルマグネシウムクロリドと(R)−グ
リシド酸を塩化第一銅の共存下実施例3と同様に操作し
て目的物が87%の収率で得られた。J=4.5)tz), 6.80~7.48 (4)t
, m), T, TG (2H1br, 8) Example 11 3-Methylbenzylmagnesium chloride and (R)-glycidic acid were treated in the same manner as in Example 3 in the coexistence of cuprous chloride to achieve the objective. was obtained with a yield of 87%.
NMR(d’−DM80十CDCj5) 299m
; 1.a1〜2−40 (2H−m)−2,30(
3に、a)−2,65〜3.05 (2)I、 m)、
4.20 (1)I、 dd、 Jニア、5H2)6
.85〜7.35 (4H,m)、 8.90 (21
,br、 8)実施例12゜
シrIAW1
(S)−グリシド酸と3−メチルベンジルマグネシウム
クロリドを用い、実施例11と同様に操作して(S)
−4−(3−)リル)−2−ノーイドロキシ酪酸が85
%の収率で得られた。NMR (d'-DM80+CDCj5) 299m
;1. a1~2-40 (2H-m)-2,30(
3, a) -2,65 to 3.05 (2) I, m),
4.20 (1) I, dd, J near, 5H2)6
.. 85-7.35 (4H, m), 8.90 (21
,br, 8) Example 12゜SirIAW1 Using (S)-glycidic acid and 3-methylbenzylmagnesium chloride, the same procedure as in Example 11 was carried out to prepare (S).
-4-(3-)lyl)-2-noydroxybutyric acid is 85
% yield.
実施例13゜
2−トリフルオロメチルベンジルマグネシウムプロミド
と(R)−グリシド酸を臭化第一銅の共存下実施例3と
同様に操作して目的物が93%の収率で得られた。Example 13 2-Trifluoromethylbenzylmagnesium bromide and (R)-glycidic acid were operated in the same manner as in Example 3 in the presence of cuprous bromide to obtain the desired product in a yield of 93%. .
NMR(CDCj、+d6−DM80)299m ;
1.80〜2.50(2H,m)、 170〜3.2
1 (21(、m)、 4.31(IHs dd*
J=Ts5Hz ) # 7−10〜1−B 2 (
4H−m) −11、IQ (2)t、 br、 ’a
) 。NMR (CDCj, +d6-DM80) 299m;
1.80-2.50 (2H, m), 170-3.2
1 (21 (, m), 4.31 (IHs dd*
J=Ts5Hz) #7-10~1-B2 (
4H-m) -11, IQ (2)t, br, 'a
).
実施例14゜
(S)−グリシド酸と2−トリフルオロメチルベンジル
マグネシウムプロミドを用い、実施例13と同様に操作
して(8)−4−(2−)リフルオロメチルフェニル)
−2−ノーイドロキシ醋酸が86%収率で得られた。Example 14 (8)-4-(2-) Lifluoromethylphenyl)
-2-nohydroxyacetic acid was obtained with a yield of 86%.
実施例15゜
2−メトキシベンジルマグネシウムプロミドと(R)−
グリシド酸とを臭化第一銅の共存下実施例6と同様に操
作して目的物が86%の収率で得られた。Example 15゜2-methoxybenzylmagnesium bromide and (R)-
The desired product was obtained in a yield of 86% using glycidic acid in the same manner as in Example 6 in the presence of cuprous bromide.
NMR(CD(J3+d6−DMSO) δI)pm
: 1.77〜2.40(2H,m)、2.71 〜
3.04 (2H,m)、3.76(3H,s)、
4.25 (IH,dd、 J=7.5H2)1
6.51 〜7.52 (4H,m)、 7.95
(2)1. br、s)実施例16゜
シ陥酸
2−メチルベンジルマグネシウムクロリドと(R)−グ
リシド酸を塩化第一銅の共存下実施例3と同様に操作し
て目的物が90%の収率で得られた。 。NMR(CD(J3+d6-DMSO) δI)pm
: 1.77~2.40 (2H, m), 2.71~
3.04 (2H, m), 3.76 (3H, s),
4.25 (IH, dd, J=7.5H2)1
6.51 ~7.52 (4H, m), 7.95
(2)1. br, s) Example 16 2-Methylbenzylmagnesium chloride and (R)-glycidic acid were treated in the same manner as in Example 3 in the presence of cuprous chloride to obtain the desired product with a yield of 90%. Obtained. .
NMR(d’ −0M80 ) 209m : 1
.75〜2.35 (2H。NMR (d'-0M80) 209m: 1
.. 75-2.35 (2H.
m)、 2.21 (3H,S)、 2.65〜101
(2H,m)。m), 2.21 (3H, S), 2.65-101
(2H, m).
4.22 (IH,dd、 J=7.5Hz )、 7
.1(4nns)*7.91 (2H,br、 s )
実施例17゜
シri6酸
(S)−グリシド酸と2−メチルベンジルマグネシウム
クロリドを用いて実施例16 と同様に操作し、(S)
−4−(2−トリル)−2−ハイドロキシ酪酸が収率
85%で得られた。4.22 (IH, dd, J=7.5Hz), 7
.. 1(4nns)*7.91 (2H, br, s) Example 17゜Siri6 acid (S)-glycidic acid and 2-methylbenzylmagnesium chloride were used in the same manner as in Example 16, and (S)
-4-(2-tolyl)-2-hydroxybutyric acid was obtained with a yield of 85%.
実施例1B。Example 1B.
2−クロロベンジルマグネシウムクロリドト(R)−グ
リシド酸を塩化第一銅の共存下実施例3と同様に操作し
て目的物が93%の収率で得られた。2-Chlorobenzylmagnesium chlorideto(R)-glycidic acid was operated in the same manner as in Example 3 in the presence of cuprous chloride to obtain the desired product in a yield of 93%.
NMR(CDCI5+d’−DMSO)δppm;1.
85〜2.51(2H,m)、 175〜L18 (2
H,m)、 4.30(IH,dd、 J=7,5Hz
)、 6.91〜7.52 (4H,m)。NMR (CDCI5+d'-DMSO) δppm; 1.
85-2.51 (2H, m), 175-L18 (2
H, m), 4.30 (IH, dd, J=7,5Hz
), 6.91-7.52 (4H, m).
7.65 (2H,br、 s )
実施例19゜
(S)−グリシド酸と2−クロロベンジルマグネシウム
クロリドを用い実施例18と同様に操作して(s) −
4−(2−クロロフェニル)−2−へブドロキシ面酸が
85%の収率で得られた。7.65 (2H, br, s) Example 19 Using the same procedure as in Example 18 using (S)-glycidic acid and 2-chlorobenzylmagnesium chloride, (s) -
4-(2-chlorophenyl)-2-hebutroxyfadic acid was obtained with a yield of 85%.
実施例20゜
3−メトキシベンジルマグネシウムプロミドと(R)−
グリシド酸を臭化第一銅の共存下実施例3と同様に操作
して目的物が86%の収率で得られた。Example 20゜3-methoxybenzylmagnesium bromide and (R)-
The desired product was obtained in a yield of 86% using glycidic acid in the same manner as in Example 3 in the presence of cuprous bromide.
NMR(CDCJ5+d6−0M80)δppm :
1.82〜2.42(2H= mL 170〜3.07
(2Hs mL 3−74 (3H。NMR (CDCJ5+d6-0M80) δppm:
1.82-2.42 (2H=mL 170-3.07
(2Hs mL 3-74 (3H.
S)、 4.15 (IH,dd、 r、5uz)、
6.62〜7.46(4HI m)I 9.20 (2
HI br、r)実施例21゜
4−メトキシベンジルマグネシウムクロリドと(R)−
グリシド酸をヨウ化第−銅の共存下実施例3と同様に操
作して目的物が88 %の収率で得られた。S), 4.15 (IH, dd, r, 5uz),
6.62-7.46 (4HI m) I 9.20 (2
HI br, r) Example 21゜4-Methoxybenzylmagnesium chloride and (R)-
The desired product was obtained in a yield of 88% using glycidic acid in the same manner as in Example 3 in the presence of cupric iodide.
NMR(CDCj5+d6−0M80)δppm ;
1.76〜2.311(2H,m)、 2.66〜3
.02 (2H,m)、 3.50 (3H。NMR (CDCj5+d6-0M80) δppm;
1.76-2.311 (2H, m), 2.66-3
.. 02 (2H, m), 3.50 (3H.
s)、 4.11 (IH,dd、J=7.5Hz
)、 6.75 (2H。s), 4.11 (IH, dd, J=7.5Hz
), 6.75 (2H.
d、J==8Hz)、7.15 (2H,d、J==
8Hz)e 9.20(2H,br、s)
実施例22゜
4−ブロモベンジルマグネシウムプロミドと(R)−グ
リシド酸を臭化第一銅の共存下実施例3と同様に操作し
て目的物が87%の収率で得られた。d, J==8Hz), 7.15 (2H, d, J==
8Hz) e 9.20 (2H, br, s) Example 22゜4-bromobenzylmagnesium bromide and (R)-glycidic acid were treated in the same manner as in Example 3 in the presence of cuprous bromide to achieve the objective. was obtained with a yield of 87%.
NMR(cpcJ3+a’−DMSO)δppm ;
1.65〜2.33(2I(、m)、 2.55〜3
.02 (2H,m)、 4.17 (II(。NMR (cpcJ3+a'-DMSO) δppm;
1.65-2.33 (2I(,m), 2.55-3
.. 02 (2H, m), 4.17 (II(.
dd、 J=7.5Hz)、 7.03 (2H,d、
J:8H2)。dd, J=7.5Hz), 7.03 (2H,d,
J:8H2).
7.35 (2Hs d= J=8Hz)、8.96
(IHlbr−s)実施例23゜
4−ニトロベンジルマグネシウムクロリドと(R)−グ
リシド酸を臭化第一銅の共存下実施例3と同様に操作し
て目的物が93%の収率で得られた。7.35 (2Hs d= J=8Hz), 8.96
(IHlbr-s) Example 23゜4-Nitrobenzylmagnesium chloride and (R)-glycidic acid were operated in the same manner as in Example 3 in the coexistence of cuprous bromide to obtain the desired product with a yield of 93%. It was done.
NMR(d6−DMSO)299m ; 1.85〜2
.52 (2H,m)e2.71〜3.22 (2H,
m)s ム、28 (IH,dd、 5=−7,5H
z)、 7.4Q (2H,d、 J=:91(z)
。NMR (d6-DMSO) 299m; 1.85-2
.. 52 (2H, m)e2.71~3.22 (2H,
m) s m, 28 (IH, dd, 5=-7,5H
z), 7.4Q (2H, d, J=:91(z)
.
8.11 (+2H,、d、 J=9Hz )、 9.
70 (2H,br、 s )実施例24゜
2−t−ブチルジメチルシリルオキシペンジルマグネシ
ウムクロリドと(R)−グリシド°酸を臭化第一鋼の共
存下実施例3と同様の操作を行い目的物の2−t−ブチ
ルジメチルシリル体力t90%の収率で得られた。これ
を弗化テトラブチルアンモニウム又は弗化カリと常法に
従って処理する事により目的物が得られた。8.11 (+2H,,d, J=9Hz), 9.
70 (2H, br, s) Example 24 The same operation as in Example 3 was carried out using 2-t-butyldimethylsilyloxypenzylmagnesium chloride and (R)-glycidic acid in the coexistence of ferrous steel bromide. The desired product, 2-t-butyldimethylsilyl, was obtained in a yield of 90%. The desired product was obtained by treating this with tetrabutylammonium fluoride or potassium fluoride in a conventional manner.
NMR(d’−DMSO+CDCJ5 )299m ;
1.55−2.04(2H,m)、 ′L72〜3.
05 (2H,m)、 4.22 (IH。NMR (d'-DMSO+CDCJ5) 299m;
1.55-2.04 (2H, m), 'L72~3.
05 (2H, m), 4.22 (IH.
dd、 Jニア、5Hz)、 6.45〜7.40 (
41(、m)s9.66 (3H,br、s)
実施例25゜
(R)−β−フェニル乳酸
(R)−グリシド酸1f/をTHF10鱈lに溶かし一
30″cK冷却した。これにフェニルリチウムの溶*
12.6 ml (2M/ J−シクロヘキサン−ジエ
チルエーテル)を滴加し、−5〜5℃で2時間攪拌後1
N塩酸20−を加え、次いで酢酸エチル50、tで抽出
した。飽和重a水30m1で抽出し、水層に酢酸エチル
Sodと濃塩酸5dを加えて抽出を行い、有機層を硫酸
マグネシウムで乾燥後、r過、Saすると目的物が85
%の収率で得られた。このものへ物理データは実施例6
のそれらと一致した。dd, J near, 5Hz), 6.45-7.40 (
41 (, m) s9.66 (3H, br, s) Example 2 1f/(R)-β-phenyllactic acid (R)-glycidic acid was dissolved in 10 liters of THF and cooled to -30"cK. Dissolution of phenyllithium*
12.6 ml (2M/J-cyclohexane-diethyl ether) was added dropwise and stirred at -5 to 5°C for 2 hours.
20 ml of N-hydrochloric acid was added and then extracted with 50 t of ethyl acetate. Extract with 30 ml of saturated deuterated aqueous water, add ethyl acetate Sod and 5 d of concentrated hydrochloric acid to the aqueous layer for extraction, dry the organic layer over magnesium sulfate, filtrate with sulfur chloride, and extract the desired product.
% yield. The physical data for this item is Example 6
matched those of .
実施例26゜
(R)−グリシド(4−メトキシ)アニリド1ダをTH
FIO−に溶かし、 これをエチルマグネシウムプロミ
ド10震t (3M/j−エーテル)、THF 10
mlおよびヨウ化第−銅0.6gの混合液に一20℃〜
−10℃で滴加した。0℃で1時間 攪拌後、反応液を
氷冷した30%硫酸水素カリウム水溶液30−に注ぎ、
酢酸エチル50耐で3回抽出し、硫酸マグネシウムで乾
燥、f通抜、減圧下溶媒を留去して目的物0.92f(
収率80%)が白色粉末として得られた。Example 26゜(R)-glycid(4-methoxy)anilide 1 da was TH
Dissolve in FIO-, add 10 t of ethylmagnesium bromide (3M/j-ether) and 10 t of THF.
ml and 0.6 g of cupric iodide at -20℃~
It was added dropwise at -10°C. After stirring at 0°C for 1 hour, the reaction solution was poured into an ice-cooled 30% aqueous solution of potassium hydrogen sulfate.
Extracted 3 times with 50% ethyl acetate, dried over magnesium sulfate, passed through f and distilled off the solvent under reduced pressure to obtain the desired product (0.92 f).
80% yield) was obtained as a white powder.
NMR(CDCj5)δE’pm ; Q、70〜′L
30 (7H* rn)−3,75(SL sL 3.
90 (IHs br−5)e4、QO〜4.40 (
IH,m)、 6.78 (2H,d、 J=9Hz)
、 7.40 (2H,d、 J=9H2)、 8.5
0 (IH。NMR (CDCj5) δE'pm; Q, 70~'L
30 (7H*rn)-3,75(SL sL 3.
90 (IHs br-5) e4, QO ~ 4.40 (
IH, m), 6.78 (2H, d, J=9Hz)
, 7.40 (2H, d, J=9H2), 8.5
0 (IH.
br、s)
実施例27゜
(R)−グリシド(4−メトキシ)アニリド11 it
THF 1G mlに溶かし、 これをベンジルマグ
ネシウムクロリドIJ f / THF 2G−とヨウ
化第−銅a、3yの混合液中に内温−20〜−10℃に
保ちながら滴加した。滴加後室温で2時間攪拌した後、
30%硫酸水素カリ水溶液30d中に注加し、酢酸エチ
ル60W1tで2回抽出後、硫酸マグネシウムで乾燥し
、減圧濃縮すると目的物1.19g(収率81g6)が
得られた。br, s) Example 27゜(R)-glycid(4-methoxy)anilide 11 it
The solution was dissolved in 1G ml of THF and added dropwise to a mixed solution of benzylmagnesium chloride IJf/THF 2G- and cupric iodide a, 3y while maintaining the internal temperature at -20 to -10°C. After the dropwise addition and stirring at room temperature for 2 hours,
The mixture was poured into 30 d of 30% aqueous potassium hydrogen sulfate solution, extracted twice with 60 W 1 t of ethyl acetate, dried over magnesium sulfate, and concentrated under reduced pressure to obtain 1.19 g (yield: 81 g6) of the desired product.
NMR(CDCj5+d’−DMSO)299m ;
t、70−2.30(2に、 m)、 2.50−4.
QO(2H,m)、 S、T2 (3)I。NMR (CDCj5+d'-DMSO) 299m;
t, 70-2.30 (in 2, m), 2.50-4.
QO(2H,m), S, T2 (3)I.
s)、 4.30〜4.55 (11,m)、 5.2
0 (IH,br。s), 4.30-4.55 (11, m), 5.2
0 (IH, br.
S)、 6.82 (2H,d、 J=9)IZ)、
7.20 (5H,S)。S), 6.82 (2H, d, J=9)IZ),
7.20 (5H,S).
Claims (1)
水素原子、アルキル基または置換基を有してもよいフェ
ニル基を示し、R^3は、水酸基、OR^4基(R^4
は、アルキル基、水酸基の保護基、置換基を有してもよ
いフェニル基、スクシンイミド基または▲数式、化学式
、表等があります▼基を示す。)、SR^5基(R^5
は、アルキル基、置換基を有してもよいフェニル基また
は置換基を有してもよい5員もしくは6員環ヘテロアリ
ール基を示す。)、NR^6R^7基(R^6およびR
^7は、同一または異なつて、水素原子、C_1〜C_
1_0のアルキル基、置換基を有してもよいフェニル基
、置換基を有してもよいアラルキル基またはR^6とR
^7が一緒になつて−(CH_2)_n−基(n=3、
4、5を示す。)、▲数式、化学式、表等があります▼
基もしくは▲数式、化学式、表等があります▼基を示す
。) またはNHNHR^8基(R^8は、水素原子、アルキ
ル基またはフェニル基を示す。)を示す。〕を有する化
合物に 式RM 〔式中、Rは、アルキル基、アルケニル基、置換基を有
してもよいフェニル基、置換基を有してもよいベンジル
基、置換基を有してもよい5員もしくは6員環ヘテロア
リール基または置換基を有してもよい5員もしくは6員
環ヘテロアリールメチル基を示し、Mは、MgX(Mg
はマグネシウムを示し、Xは、塩素、臭素または沃素を
示す。)またはアルカリ金属を示す。〕を有する化合物
を反応させることを特徴とする式▲数式、化学式、表等
があります▼ 〔式中、R、R^1、R^2およびR^3は、前述した
ものと同意義を示す。〕を有するα−ハイドロキシカル
ボン酸誘導体の製法。 2)式▲数式、化学式、表等があります▼ 〔式中、R^1およびR^2は、同一または異なつて、
水素原子、アルキル基または置換基を有してもよいフェ
ニル基を示し、R^3は、水酸基、OR^4基(R^4
は、アルキル基、水酸基の保護基、置換基を有してもよ
いフェニル基、スクシンイミド基または▲数式、化学式
、表等があります▼を示す。)、SR^5基(R^5は
、アルキル基、置換基を有してもよいフェニル基または
置換基を有してもよい5員もしくは6員環ヘテロアリー
ル基を示す。)、NR^6R^7基(R^6およびR^
7は、同一または異なつて、水素原子、C_1〜C_1
_0のアルキル基、置換基を有してもよいフェニル基、
置換基を有してもよいアラルキル基またはR^6とR^
7が一緒になつて−(CH_2)_n−基(n=3、4
、5を示す。)、▲数式、化学式、表等があります▼基
もしくは▲数式、化学式、表等があります▼基を示す。 )また はNHNHR^8基(R^8は、水素原子、アルキル基
またはフェニル基を示す。)を示し、Yは、ハロゲン原
子を示す。〕を有する化合物を塩基で処理して 式▲数式、化学式、表等があります▼ 〔式中、R^1、R^2およびR^3は、前述したもの
と同意義を示す。〕を有する化合物に導き、ついでこの
化合物に 式RM 〔式中、Rは、アルキル基、アルケニル基、置換基を有
してもよいフェニル基、置換基を有してもよいベンジル
基、置換基を有してもよい5員もしくは6員環ヘテロア
リール基または置換基を有してもよい5員もしくは6員
環ヘテロアリールメチル基を示し、Mは、MgX(Mg
はマグネシウムを示し、Xは、塩素、臭素または沃素を
示す。)またはアルカリ金属を示す。〕を有する化合物
を反応させることを特徴とする式 ▲数式、化学式、表等があります▼ 〔式中、R、R^1、R^2およびR^3は、前述した
ものと同意義を示す。〕を有する化合物の製法。[Claims] 1) Formula ▲ Numerical formula, chemical formula, table, etc. ▼ [In the formula, R^1 and R^2 are the same or different,
It represents a hydrogen atom, an alkyl group, or a phenyl group which may have a substituent, and R^3 is a hydroxyl group, an OR^4 group (R^4
indicates an alkyl group, a protecting group for a hydroxyl group, a phenyl group which may have a substituent, a succinimide group, or a ▲ mathematical formula, chemical formula, table, etc. ▼ group. ), SR^5 groups (R^5
represents an alkyl group, a phenyl group which may have a substituent, or a 5- or 6-membered heteroaryl group which may have a substituent. ), NR^6R^7 groups (R^6 and R
^7 is the same or different and is a hydrogen atom, C_1 to C_
1_0 alkyl group, phenyl group that may have a substituent, aralkyl group that may have a substituent, or R^6 and R
^7 together form -(CH_2)_n- group (n=3,
4 and 5 are shown. ), ▲Mathematical formulas, chemical formulas, tables, etc.▼
A group or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Indicates a group. ) or NHNHR^8 group (R^8 represents a hydrogen atom, an alkyl group, or a phenyl group). ] to a compound having the formula RM [wherein R is an alkyl group, an alkenyl group, a phenyl group which may have a substituent, a benzyl group which may have a substituent, a benzyl group which may have a substituent It represents a 5- or 6-membered heteroaryl group or a 5- or 6-membered heteroarylmethyl group that may have a substituent, and M is MgX (Mg
represents magnesium, and X represents chlorine, bromine or iodine. ) or alkali metal. ] There are formulas ▲ mathematical formulas, chemical formulas, tables, etc. that are characterized by reacting compounds having the following ▼ [In the formula, R, R^1, R^2 and R^3 have the same meanings as above . ] A method for producing an α-hydroxycarboxylic acid derivative having the following. 2) Formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [In the formula, R^1 and R^2 are the same or different,
It represents a hydrogen atom, an alkyl group, or a phenyl group which may have a substituent, and R^3 is a hydroxyl group, an OR^4 group (R^4
indicates an alkyl group, a protecting group for a hydroxyl group, a phenyl group which may have a substituent, a succinimide group, or ▲a mathematical formula, a chemical formula, a table, etc.▼. ), SR^5 group (R^5 represents an alkyl group, a phenyl group that may have a substituent, or a 5- or 6-membered heteroaryl group that may have a substituent.), NR^ 6R^7 groups (R^6 and R^
7 is the same or different and is a hydrogen atom, C_1 to C_1
_0 alkyl group, phenyl group which may have a substituent,
Aralkyl group which may have a substituent or R^6 and R^
7 together form -(CH_2)_n- group (n=3, 4
, 5 is shown. ), ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ groups or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Indicates groups. ) or NHNHR^8 group (R^8 represents a hydrogen atom, an alkyl group or a phenyl group), and Y represents a halogen atom. ] Treated with a base, a compound having the formula ▲ has a mathematical formula, a chemical formula, a table, etc. ▼ [In the formula, R^1, R^2 and R^3 have the same meanings as described above. ] and then convert this compound into a compound having the formula RM [wherein R is an alkyl group, an alkenyl group, a phenyl group which may have a substituent, a benzyl group which may have a substituent, a substituent represents a 5- or 6-membered heteroaryl group which may have a substituent, or a 5- or 6-membered heteroarylmethyl group which may have a substituent; M is MgX (Mg
represents magnesium, and X represents chlorine, bromine or iodine. ) or alkali metal. ] There are formulas ▲ mathematical formulas, chemical formulas, tables, etc. that are characterized by reacting compounds having the following ▼ [In the formula, R, R^1, R^2 and R^3 have the same meanings as above . ] A method for producing a compound having the following.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61056471A JPH066539B2 (en) | 1986-03-14 | 1986-03-14 | Process for producing α-hydroxycarboxylic acid derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61056471A JPH066539B2 (en) | 1986-03-14 | 1986-03-14 | Process for producing α-hydroxycarboxylic acid derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62212329A true JPS62212329A (en) | 1987-09-18 |
JPH066539B2 JPH066539B2 (en) | 1994-01-26 |
Family
ID=13028017
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61056471A Expired - Lifetime JPH066539B2 (en) | 1986-03-14 | 1986-03-14 | Process for producing α-hydroxycarboxylic acid derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH066539B2 (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4904822A (en) * | 1988-02-19 | 1990-02-27 | Kuraray Co., Ltd. | Process for the optical resolution of (+)-2-hydroxy-4-phenylbutanoic acid |
JPH03200739A (en) * | 1989-12-28 | 1991-09-02 | Daicel Chem Ind Ltd | Optically active 2-hydroxy-4-phenyl butyric acid and production of ester of same butyric acid |
US5256552A (en) * | 1988-02-08 | 1993-10-26 | Daicel Chemical Industries, Ltd. | Process for the production of optically active 2-hydroxy-4-phenylbutyric acid |
US5296618A (en) * | 1992-05-14 | 1994-03-22 | Orion-Yhtyma Oy Fermion | Method for the manufacture of the derivatives of propionic acid |
WO2001014576A3 (en) * | 1999-08-24 | 2001-08-30 | Agouron Pharma | Process and intermediates for the preparation of isoxazolecaroxamides and analogues |
US6355807B1 (en) | 1999-08-24 | 2002-03-12 | Agouron Pharmaceuticals, Inc. | Efficient synthetic routes for the preparation of rhinovirus protease inhibitors and key intermediates |
US6774243B2 (en) | 1999-08-24 | 2004-08-10 | Agouron Pharmaceuticals, Inc. | Efficient synthetic routes for the preparation of rhinovirus protease inhibitors and key intermediates |
WO2007013555A1 (en) * | 2005-07-28 | 2007-02-01 | Kowa Co., Ltd. | Process for producing optically active 2-hydroxybutyric ester |
CN102675088A (en) * | 2012-05-28 | 2012-09-19 | 温州市工业科学研究院 | Preparation method of alpha-hydroxy-cyclohexanecarboxylic acid |
CN105669423A (en) * | 2016-01-08 | 2016-06-15 | 江西科技师范大学 | New synthesis method of two enantiomers of 4-(4-(benzyloxy)phenyl)-2-hydroxybutyric acid |
WO2017014180A1 (en) * | 2015-07-17 | 2017-01-26 | 株式会社カネカ | Method for producing 2-hydroxy ester |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6156471A (en) * | 1984-07-28 | 1986-03-22 | Fujitsu Ltd | Semiconductor device |
-
1986
- 1986-03-14 JP JP61056471A patent/JPH066539B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6156471A (en) * | 1984-07-28 | 1986-03-22 | Fujitsu Ltd | Semiconductor device |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5256552A (en) * | 1988-02-08 | 1993-10-26 | Daicel Chemical Industries, Ltd. | Process for the production of optically active 2-hydroxy-4-phenylbutyric acid |
US4904822A (en) * | 1988-02-19 | 1990-02-27 | Kuraray Co., Ltd. | Process for the optical resolution of (+)-2-hydroxy-4-phenylbutanoic acid |
JPH03200739A (en) * | 1989-12-28 | 1991-09-02 | Daicel Chem Ind Ltd | Optically active 2-hydroxy-4-phenyl butyric acid and production of ester of same butyric acid |
US5296618A (en) * | 1992-05-14 | 1994-03-22 | Orion-Yhtyma Oy Fermion | Method for the manufacture of the derivatives of propionic acid |
US6774243B2 (en) | 1999-08-24 | 2004-08-10 | Agouron Pharmaceuticals, Inc. | Efficient synthetic routes for the preparation of rhinovirus protease inhibitors and key intermediates |
US6355807B1 (en) | 1999-08-24 | 2002-03-12 | Agouron Pharmaceuticals, Inc. | Efficient synthetic routes for the preparation of rhinovirus protease inhibitors and key intermediates |
WO2001014576A3 (en) * | 1999-08-24 | 2001-08-30 | Agouron Pharma | Process and intermediates for the preparation of isoxazolecaroxamides and analogues |
WO2007013555A1 (en) * | 2005-07-28 | 2007-02-01 | Kowa Co., Ltd. | Process for producing optically active 2-hydroxybutyric ester |
US7767845B2 (en) | 2005-07-28 | 2010-08-03 | Kowa Co., Ltd. | Process for producing optically active 2-hydroxybutyric ester |
JP5094392B2 (en) * | 2005-07-28 | 2012-12-12 | 興和株式会社 | Process for producing optically active 2-hydroxybutyric acid ester |
CN102675088A (en) * | 2012-05-28 | 2012-09-19 | 温州市工业科学研究院 | Preparation method of alpha-hydroxy-cyclohexanecarboxylic acid |
WO2017014180A1 (en) * | 2015-07-17 | 2017-01-26 | 株式会社カネカ | Method for producing 2-hydroxy ester |
CN105669423A (en) * | 2016-01-08 | 2016-06-15 | 江西科技师范大学 | New synthesis method of two enantiomers of 4-(4-(benzyloxy)phenyl)-2-hydroxybutyric acid |
Also Published As
Publication number | Publication date |
---|---|
JPH066539B2 (en) | 1994-01-26 |
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