JPS62211365A - Surface treatment - Google Patents
Surface treatmentInfo
- Publication number
- JPS62211365A JPS62211365A JP2419686A JP2419686A JPS62211365A JP S62211365 A JPS62211365 A JP S62211365A JP 2419686 A JP2419686 A JP 2419686A JP 2419686 A JP2419686 A JP 2419686A JP S62211365 A JPS62211365 A JP S62211365A
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- plasma
- tin
- gas
- gaseous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は例えばT1などの基材の表面を窒化する方法
に関する。よシ詳しくは被加工物とプラズマ加工装置と
をN2ガスの中に備えて、この被加工物の表面に窒素ガ
スのプラズマを吹き付けTINなど金属の窒化物の薄膜
を形成する表面処理方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for nitriding the surface of a substrate such as T1. More specifically, the present invention relates to a surface treatment method in which a workpiece and a plasma processing device are placed in N2 gas, and nitrogen gas plasma is sprayed onto the surface of the workpiece to form a thin film of metal nitride such as TIN.
従来、Tlなど窒素と化合してTiNの被膜を形成させ
る方法としてはスパッタリング方法(PVD又はSP)
、化学的気相析出反応による方法(CVD)、プラズマ
溶射による方法がある。Conventionally, a sputtering method (PVD or SP) has been used to form a TiN film by combining with nitrogen such as Tl.
, a method using chemical vapor deposition (CVD), and a method using plasma spraying.
スパッタリングによる方法はN2ガスが入っている低圧
容器の中に陰極と、この陰極と一定距離を隔てて被加工
物(Tiなど窒素と化合する物質)を設け、上記被加工
物を加熱すると共に上記の陰極と液加゛工物の間に電位
差を与えればグロー放電を起し、陰極より飛び出した電
子は残留N2ガスに衝突してこの窒素ガスをイオン化し
、このイオンと被加工物(T1)が結合してTiNの薄
膜を形成する方法(直流2極スパツタリング方法)があ
る。In the sputtering method, a cathode is placed in a low-pressure container containing N2 gas, and a workpiece (a substance that combines with nitrogen, such as Ti) is placed at a certain distance from the cathode, and the workpiece is heated and the When a potential difference is applied between the cathode and the liquid workpiece, a glow discharge occurs, and the electrons ejected from the cathode collide with the residual N2 gas and ionize this nitrogen gas, and these ions and the workpiece (T1) There is a method (DC bipolar sputtering method) in which TiN is bonded to form a thin film of TiN.
CVDによる方法はN!バガス中に被加工物を置き、こ
の被加工物の近傍にレーザを導入し、N!バガスイオン
に分離して被加工物と反応させTiNの層を形成するも
のであるが、いずれも蒸着速度が遅いと言う欠点がある
。CVD method is N! A workpiece is placed in bagasse, a laser is introduced near the workpiece, and N! These methods separate bagasse ions and react with the workpiece to form a TiN layer, but both have the drawback of slow vapor deposition speed.
またプラズマ溶射による方法は、TINの粉末をプラズ
マ溶射する方法であるが、TiNなど金属の窒化物は昇
華し易いので溶射には困難がある。Further, the plasma spraying method is a method in which TIN powder is plasma sprayed, but it is difficult to spray because metal nitrides such as TiN easily sublime.
又TINの大気中での溶射は大気中の酸素と反応して形
成層の品質が変動すると言う問題があった。Furthermore, when TIN is sprayed in the atmosphere, there is a problem in that the quality of the formed layer changes due to reaction with oxygen in the atmosphere.
この発明に係る表面処理方法においては、N鵞ガスによ
ってシールドされたPg s Tl # AA e S
i又はZr等の金属材料を基材とする被加工物に他のN
。In the surface treatment method according to the present invention, Pg s Tl # AA e S shielded by N gas
If the workpiece is made of a metal material such as i or Zr, other N
.
ガスのプラズマを吹き付け、上記被加工物の表面を窒化
するようにした。The surface of the workpiece was nitrided by spraying gas plasma.
この発明においては、N!ガスによってシールドした状
態のもとで窒素プラズマ炎を照射するので、酸化される
ことなく被加工物の表面に例えばTINの薄膜を形成す
る。In this invention, N! Since the nitrogen plasma flame is irradiated under a gas-shielded state, a thin film of, for example, TIN is formed on the surface of the workpiece without being oxidized.
第1図はこの発明の一実施例を示す表面処理方法の説明
図である。図において、1は被加工物、2はこの被加工
物1を空気からシールドしているN2ガス、6は被加工
物1の上部に設は窒素のプラズマジェットを吹き出すだ
めの水冷鋼ノズル、−4はこの水冷鋼ノズル3
の中に設けた電極、5はこの電極4と水冷銅ノズル3と
の間に導入されるN、ガス、6はこの穐ガス5がグロー
放電によってイオンに分解して噴出しているプラズマジ
ェット、7は被加工物1の表面に形成されたTiN層で
ある。FIG. 1 is an explanatory diagram of a surface treatment method showing an embodiment of the present invention. In the figure, 1 is the workpiece, 2 is the N2 gas that shields the workpiece 1 from the air, 6 is a water-cooled steel nozzle installed above the workpiece 1 to blow out a nitrogen plasma jet, - 4 is an electrode provided in this water-cooled steel nozzle 3, 5 is nitrogen gas introduced between this electrode 4 and the water-cooled copper nozzle 3, and 6 is a nitrogen gas 5 decomposed into ions by glow discharge. The ejected plasma jet 7 is a TiN layer formed on the surface of the workpiece 1.
次にこの動作について説明する。先ず、被加工物1をN
2ガスによってシールドする。このシールドには例えば
容器(図示せず)の中に被加工物1と共にプラズマ発生
装置の水冷鋼ノズル部を入れてN2ガス2を導入する。Next, this operation will be explained. First, the workpiece 1 is
Shield with 2 gases. For example, a water-cooled steel nozzle of a plasma generator is placed in a container (not shown) together with a workpiece 1, and N2 gas 2 is introduced into the shield.
阜スるN2ガス2の圧力は被加工物の使用目的などによ
って異るがほぼ1〜200 Torr (らいに制御す
る。次に水冷鋼ノズル3と電極4との間に他のN!ガス
を導きながら直流電圧(30〜50v)を加えればN2
ガス5はイオンに分解してプラズマジェット6を噴出す
る。このプラズマジェット6は高温であると共にN イ
オンを多量に含むものであるから被加工物1の表面Kf
iると被加工物の窒化物7(例えばTIN )を形成す
る。このようにして形成したTiN 、 AtN 。The pressure of the N2 gas 2 varies depending on the purpose of use of the workpiece, but is controlled at approximately 1 to 200 Torr.Next, another N2 gas is injected between the water-cooled steel nozzle 3 and the electrode 4. If you apply DC voltage (30 to 50v) while guiding, N2
The gas 5 is decomposed into ions and a plasma jet 6 is ejected. Since this plasma jet 6 has a high temperature and contains a large amount of N ions, the surface Kf of the workpiece 1 is
i to form a nitride 7 (eg TIN) of the workpiece. TiN and AtN thus formed.
SIN 、 ZrNなどは一般にセラミックスとも呼ば
れ、薄膜でありながら強靭で、かつ耐食性、耐摩耗性、
耐熱性などの優れた性質を有するものである。SIN, ZrN, etc. are generally called ceramics, and although they are thin films, they are strong, and have corrosion resistance, wear resistance,
It has excellent properties such as heat resistance.
次に示す表は、プラズマ出力600AK80V。The table below shows plasma output of 600AK80V.
プラズマジェット乙の成分は窒素イオンと電子、シール
ドにはN2ガス2を用い200 Torrの条件によっ
てTi基材を加工したものを従来技術と比較対象して示
した。The components of Plasma Jet B are nitrogen ions and electrons, the shield is N2 gas 2, and a Ti base material processed under conditions of 200 Torr is shown for comparison with the conventional technology.
又この表中の各々の試験方法は下記のようにした。Each test method in this table was as follows.
囚酸化性試験方法は大気中、9oo℃、5時間放置。The oxidation test method was to leave the product in the air at 90°C for 5 hours.
(B)腐食性試験方法は80’c、15%HCLに浸漬
。(B) Corrosion test method: immersion in 80'C, 15% HCL.
(C)摩耗性試験方法はピンオンディスク法により回転
ディスク上で5 km走行させた時の摩耗量とした。(C) Abrasion test method: Pin-on-disk method was used to determine the amount of wear when running 5 km on a rotating disk.
上記のデータによって本発明の優秀性が証明できる。The above data can prove the superiority of the present invention.
この発明は以上説明した通シ、被加工物をN2ガスによ
ってシールドしながら他のN2ガスのプラズマジェット
を直接被加工物(例えばTI)の表面に吹き付けるよう
にしたので極めて簡単な方法であシながら強靭でかつ耐
摩耗性、耐食性、耐熱性などの優れたセラミックの層を
得られる効果がある。This invention is an extremely simple method, as described above, in which the workpiece is shielded by N2 gas while a plasma jet of another N2 gas is directly sprayed onto the surface of the workpiece (for example, TI). However, it is effective in obtaining a ceramic layer that is strong and has excellent wear resistance, corrosion resistance, and heat resistance.
第1図はこの発明の一実施例を示す表面処理方法の説明
図である。
図において、1は被加工物、2はN!ガス、6は水冷鋼
ノズル、4は電極、5はN2ガス、6はプラズマジェッ
ト、7はTiN層である。FIG. 1 is an explanatory diagram of a surface treatment method showing an embodiment of the present invention. In the figure, 1 is the workpiece and 2 is N! 6 is a water-cooled steel nozzle, 4 is an electrode, 5 is N2 gas, 6 is a plasma jet, and 7 is a TiN layer.
Claims (1)
Si又はZr等の金属材料を基材とする被加工物に他の
N_2ガスのプラズマを吹き付け、上記被加工物の表面
を窒化することを特徴とする表面処理方法。Fe, Ti, Al, shielded by N_2 gas
A surface treatment method characterized in that a plasma of another N_2 gas is sprayed onto a workpiece whose base material is a metal material such as Si or Zr, and the surface of the workpiece is nitrided.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2419686A JPS62211365A (en) | 1986-02-07 | 1986-02-07 | Surface treatment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2419686A JPS62211365A (en) | 1986-02-07 | 1986-02-07 | Surface treatment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62211365A true JPS62211365A (en) | 1987-09-17 |
Family
ID=12131570
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2419686A Pending JPS62211365A (en) | 1986-02-07 | 1986-02-07 | Surface treatment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62211365A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2324539A (en) * | 1997-04-26 | 1998-10-28 | Daimler Benz Ag | Aluminium nitride coating of cylinder running surface |
-
1986
- 1986-02-07 JP JP2419686A patent/JPS62211365A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2324539A (en) * | 1997-04-26 | 1998-10-28 | Daimler Benz Ag | Aluminium nitride coating of cylinder running surface |
GB2324539B (en) * | 1997-04-26 | 2000-01-26 | Daimler Benz Ag | Method for aluminium nitride coating |
US6180189B1 (en) | 1997-04-26 | 2001-01-30 | Daimlerchrysler Ag | Method and apparatus for aluminum nitride coating of a contact surface, especially a cylinder contact surface of a crankcase made of an aluminum basic alloy |
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