JPS62211363A - Low-pressure plasma working method - Google Patents
Low-pressure plasma working methodInfo
- Publication number
- JPS62211363A JPS62211363A JP2419586A JP2419586A JPS62211363A JP S62211363 A JPS62211363 A JP S62211363A JP 2419586 A JP2419586 A JP 2419586A JP 2419586 A JP2419586 A JP 2419586A JP S62211363 A JPS62211363 A JP S62211363A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- ceramics
- low
- plasma
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 11
- 239000000463 material Substances 0.000 claims abstract description 28
- 239000002184 metal Substances 0.000 claims abstract description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 22
- 239000000919 ceramic Substances 0.000 claims abstract description 19
- 238000007750 plasma spraying Methods 0.000 claims abstract description 8
- 238000003672 processing method Methods 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 abstract description 8
- 230000007797 corrosion Effects 0.000 abstract description 8
- 239000000843 powder Substances 0.000 abstract description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 7
- 239000011247 coating layer Substances 0.000 abstract description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052802 copper Inorganic materials 0.000 abstract description 2
- 239000010949 copper Substances 0.000 abstract description 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 238000005524 ceramic coating Methods 0.000 abstract 1
- 229910000831 Steel Inorganic materials 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 239000010959 steel Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000010998 test method Methods 0.000 description 3
- 238000007751 thermal spraying Methods 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- -1 nitrogen ions Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000012080 ambient air Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Coating By Spraying Or Casting (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分胃〕
この発明は例え、ば鋼板の表面にセラミックスなどの層
を形成する方法に関する。より詳しくはプラズマ溶射の
原理を応用して金属の表面にＴｉＮなとセラミックスの
層を形成する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Applications] The present invention relates to, for example, a method for forming a layer of ceramics or the like on the surface of a steel plate. More specifically, the present invention relates to a method of forming a layer of TiN or other ceramics on a metal surface by applying the principle of plasma spraying.
第３図は低圧プラズマ溶射の原理によって金属基材１の
上にＴｉＮの被膜を形成する従来の方法を示す説明図で
ある。図において、１はプラズマ加工装置を収容するチ
ャンバー、２はこのチャンバー内の空間、３はこの空間
内を低圧（２００〜ＩＴｏｒｒ）にするための気体の排
出方向を示す矢印、１１は被加工物である金属基材、１
２は電極１３を収容し水冷装置を併設（図示せず）して
いる水冷鋼ノズル、１４はこの水冷鋼ノズル１２と電極
１３との間に導入される動作ガス（例えばＮｔｌＡｒ、
Ｎｏなど）、
１５はこの動作ガス１４を導入するパイプ、１６は水冷
鋼ノズルの先端直前部に設けたパイプ、１７はこのパイ
プ１６に導入される溶射被膜３２の原料となる粉末、
１８は水冷鋼ノズル１２の先端から噴射されているプラ
ズマジェット３１の途中に設けたパイプ、１９はこのパ
イプ１８を通じて導入され原料となる粉末、２１は水冷
鋼ノズル１２と金属基材１１との間に電位差を与えプラ
ズマを形成させる直流電源、２２は電極１３と水冷鋼ノ
ズル１２との間にプラズマを形成させる直流電源、図中
ｅ１ｅはこの直流電源の極性を示す記号である。FIG. 3 is an explanatory diagram showing a conventional method of forming a TiN film on a metal substrate 1 using the principle of low-pressure plasma spraying. In the figure, 1 is a chamber that accommodates a plasma processing device, 2 is a space inside this chamber, 3 is an arrow indicating the direction of gas discharge to make the inside of this space a low pressure (200 to I Torr), and 11 is a workpiece A metal base material that is 1
2 is a water-cooled steel nozzle that accommodates the electrode 13 and is equipped with a water cooling device (not shown); 14 is a working gas (for example, NtlAr,
15 is a pipe for introducing this working gas 14, 16 is a pipe provided just before the tip of the water-cooled steel nozzle, 17 is a powder that is the raw material for the thermal spray coating 32 introduced into this pipe 16, 18 is a water-cooled pipe. A pipe 19 is provided in the middle of the plasma jet 31 that is injected from the tip of the steel nozzle 12, 19 is a powder introduced through this pipe 18 to serve as a raw material, and 21 is a material that creates a potential difference between the water-cooled steel nozzle 12 and the metal base material 11. 22 is a DC power source that generates plasma between the electrode 13 and the water-cooled steel nozzle 12, and e1e in the figure is a symbol indicating the polarity of this DC power source.
次にこの動作について説明する。金属基材１１とプラズ
マ発生装置とをチャンバー１内に収容して排気３ （５
Ｔｏｒｒ） ｊ、ながらパイプ１５より例えばＮ２ガス
を導入し水冷鋼ノズル１２と電極１３とめ間に電位差（
３０〜５０ｖ）を与えればグロー放電を開始し、Ｎ、ガ
スはプラズマとなって水冷鋼ノズル１２のの先端より噴
射する。Next, this operation will be explained. The metal base material 11 and the plasma generator are housed in the chamber 1, and the exhaust gas 3 (5
Torr) j, for example, N2 gas is introduced from the pipe 15 to create a potential difference (
When a voltage of 30 to 50 V) is applied, a glow discharge starts, and the N gas becomes plasma and is injected from the tip of the water-cooled steel nozzle 12.
ここでパイプ１６又は１８よりＴｉの粉末１７又は１９
を導入すればプラズマのエネルギーはＴｉ粉末を半溶融
状態にすると共にＴｉＮを含むプラズマジェット３１と
なって金属基材１１の上に溶射被＃３２を形成する。Here, from the pipe 16 or 18, Ti powder 17 or 19 is
When the plasma energy is introduced, the Ti powder becomes a semi-molten state and becomes a plasma jet 31 containing TiN to form a sprayed coating #32 on the metal base material 11.
チャンバー１内の空間２を低圧にする理由はプラズマジ
ェット３１の噴出速度を上昇させなり溶射粒子の酸化を
防止するためでこれを低圧プラズマ溶射と言う。The reason why the pressure in the space 2 in the chamber 1 is made low is to increase the ejection speed of the plasma jet 31 and prevent oxidation of the sprayed particles, and this is called low-pressure plasma spraying.
ところが此様にして形成したＴｉＮを含む溶射被膜３２
は金属基材１１への密着力、粒径分布、耐蝕性、気孔率
などの点で問題があった。However, the thermal spray coating 32 containing TiN formed in this way
had problems in terms of adhesion to the metal substrate 11, particle size distribution, corrosion resistance, porosity, etc.
上記のような従来の低圧プラズマ溶射方法においては、
例えば鋼板とＴｉＮを含む溶射粒との密着力、噴射ノズ
ルと被加工物との距離による溶着粒子の粒径分布のバラ
ツキ、溶射粒子相互間に生ずる気孔率のバラツキ、この
気孔率に起因する耐蝕性の劣化、被加工物（基材）と溶
射粒子（セラミックス）間の熱膨張率の差による亀裂の
発生などの問題があった。In the conventional low pressure plasma spraying method as described above,
For example, the adhesion between the steel plate and the spray particles containing TiN, the variation in the particle size distribution of the deposited particles due to the distance between the spray nozzle and the workpiece, the variation in porosity that occurs between the spray particles, and the corrosion resistance caused by this porosity. There were problems such as deterioration in properties and the occurrence of cracks due to the difference in coefficient of thermal expansion between the workpiece (base material) and the sprayed particles (ceramics).
この発明に係る低圧プラズマ加工法においては、金属基
材の上にセラミックスの層を形成する工法において、第
１工程は上記金属基材に上記セラミックスの母材となる
金属をプラズマ溶射し、第２工程はこの母材と結合して
セラミックスを形成する元素を注入するようにしたもの
である。In the low-pressure plasma processing method according to the present invention, in the method of forming a ceramic layer on a metal base material, the first step is plasma spraying of a metal that will become the base material of the ceramics onto the metal base material, and the second step is The process involves injecting elements that combine with this base material to form ceramics.
この発明においては、被加工物とプラズマ加工装置を低
圧容器（チャンバー）の中に設け、第１工程はこの容器
を真空にすると共に、水冷銅ノズルと被加工物（基材）
との間に不活性ガスのプラズマを発生させ、このプラズ
マ内に溶射用金属の粉末を導入して基材の上に被加工物
の母材（例えば′ｒｉのみ）を溶射し金属被膜を形成し
、第２工程はＮ２などのプラズマジェットを吹き付けて
、この被膜を窒化する。In this invention, the workpiece and the plasma processing device are placed in a low-pressure container (chamber), and in the first step, this container is evacuated, and the water-cooled copper nozzle and the workpiece (substrate material) are
An inert gas plasma is generated between the two, and a metal powder for thermal spraying is introduced into the plasma, and the base material of the workpiece (for example, only 'ri) is thermally sprayed onto the base material to form a metal coating. However, in the second step, this coating is nitrided by spraying a plasma jet of N2 or the like.
第１図はこの発明の一実施例を示す第１工程の低圧プラ
ズマ加工方法の説明図である。図において、チャンバー
１は省略し、３．１１．１２．１３．１４．１９．２２
．３１は第３図に示す従来の装置と同−又は相当部分を
示す。FIG. 1 is an explanatory diagram of a first step of a low-pressure plasma processing method showing an embodiment of the present invention. In the figure, chamber 1 is omitted, and 3.11.12.13.14.19.22
．． Reference numeral 31 indicates the same or equivalent portion of the conventional device shown in FIG.
次にこの動作について説明する。プラズマ溶射の動作原
理は第３図に示した従来装置と同様であるが、この第１
工程においては基材１１の表面にＴｉの溶射被膜３２だ
けを形成する。Ｔｉは金属基材１１と共に純金属である
から被膜の密着性、粒子間の一合性などは極めて良いと
言う特徴を利用したものである。Next, this operation will be explained. The operating principle of plasma spraying is the same as that of the conventional apparatus shown in Figure 3, but this first
In the process, only the sprayed Ti coating 32 is formed on the surface of the base material 11. Since Ti is a pure metal together with the metal base material 11, the adhesion of the film and the consistency between particles are extremely good.
第２図はこの発明の一実施例の第２工程を示す低圧プラ
ズマ加工方法の説明図である。図において、基本的構成
は第１図と同様であるが、ここでは上記第１工程で溶射
したＴｉの溶射被膜３２に対してＮ、のプラズマジェッ
ト３１（窒素イオン）を吹付ける。FIG. 2 is an explanatory diagram of a low-pressure plasma processing method showing the second step of an embodiment of the present invention. In the figure, the basic configuration is the same as that in FIG. 1, but here a N plasma jet 31 (nitrogen ions) is sprayed onto the Ti thermal spray coating 32 thermally sprayed in the first step.
窒素イオンはその高温なプラズマと共に反応して、先に
形成されていた溶射被膜３２の表面に新たにＴｉＮの薄
い層３４を形成する。この第２工程によるＮ３４はセラ
ミックスの層であると共にその密着力、均一性、耐蝕性
、耐摩耗性などの性質は極めて優秀なものである。The nitrogen ions react with the high temperature plasma to form a new thin layer 34 of TiN on the surface of the previously formed thermally sprayed coating 32. The N34 produced in this second step is a ceramic layer and has extremely excellent properties such as adhesion, uniformity, corrosion resistance, and abrasion resistance.
次に上記第１図（第１工Ｎ） 、第２図（第２工程）に
示した低圧プラズマ加工方法によって次の溶射条件のも
とに実施した結果と従来技術による結果とを比較対象し
た。Next, we compared the results obtained using the low-pressure plasma processing method shown in Figure 1 (1st process N) and Figure 2 (2nd process) under the following thermal spraying conditions with the results obtained using the conventional technique. .
溶射条件
第１工程・・・プラズマ出力４８ ｋＷ （６００Ａ、
８０ｒ）プラズマガスＡｒ−５Ｘｆ［２，５Ｔｏｒｒ
第２工程・・・プラズマ出力４８ ｋＷ （６００Ａ、
８０ｒ）プラズマガＸＮｔ、２００ Ｔｏｒｒ （８
１％囲気）酸化性 腐食性 摩耗性
又その試験条件は下記の通りである。Thermal spraying conditions 1st step...Plasma output 48 kW (600A,
80r) Plasma gas Ar-5Xf [2,5Torr
2nd step...Plasma output 48 kW (600A,
80r) Plasmaga XNt, 200 Torr (8
1% ambient air) Oxidizing, corrosive, and abrasive properties and the test conditions are as follows.
（Ａ）酸化性試験方法 大気中９０℃で５時間放置して単位重量増加を測定。(A) Oxidizing test method The unit weight increase was measured after being left in the atmosphere at 90°C for 5 hours.
（Ｂ）腐食性試験方法 １５％Ｈｅｌに浸漬、８０℃下で腐食減量を測定した。(B) Corrosion test method It was immersed in 15% Hel and the corrosion loss was measured at 80°C.
（Ｃ）摩耗試験方法
ピンオンデスク法によって回転デスクを５ｋｍ走行させ
た時の摩耗量を測定した。(C) Wear test method The amount of wear was measured by the pin-on-desk method when the rotary desk was run for 5 km.
以上のように従来技術に比較して本発明は顕著な効果を
示している。As described above, the present invention has shown remarkable effects compared to the prior art.
この発明は以上説明した通り低圧プラズマ加工方法を用
いて金属基材の表面にセラミックスの層を形成させるた
めに、第１工程においてセラミックスの母材の粒子を溶
射して金属被膜層を形成し、第２工程においてはこの層
と化合してセラミックスを形成するようにしたので、セ
ラミックスの薄膜でありながら各層にわたって気孔がほ
とんどなく、密着性、耐摩耗性、耐蝕性など従来の欠点
を克服して余りある効果を有する。As explained above, in order to form a ceramic layer on the surface of a metal base material using a low-pressure plasma processing method, in the first step, particles of a ceramic base material are sprayed to form a metal coating layer, In the second step, this layer is combined to form ceramics, so even though it is a thin ceramic film, there are almost no pores in each layer, and it overcomes the conventional drawbacks such as adhesion, abrasion resistance, and corrosion resistance. It has a lot of effects.
第１図は此の発明の一実施例の第１工程を示す説明図、
第２図は此の発明の一実施例の第２工程を示す説明図、
第３図は従来の技術を示す説明図である。
図において、１１は金属基材、１２は水冷鋼ノズル、１
３は電極、１４は動作ガス、１９は粉末、３１はプラズ
マジェット、３２は溶射被膜、３４は層である。
代理人 弁理士 佐 藤 正 年
第１図FIG. 1 is an explanatory diagram showing the first step of an embodiment of this invention,
FIG. 2 is an explanatory diagram showing the second step of an embodiment of this invention,
FIG. 3 is an explanatory diagram showing a conventional technique. In the figure, 11 is a metal base material, 12 is a water-cooled steel nozzle, 1
3 is an electrode, 14 is a working gas, 19 is a powder, 31 is a plasma jet, 32 is a thermal spray coating, and 34 is a layer. Agent Patent Attorney Tadashi Sato Figure 1
Claims (1)
て、第１工程は上記金属基材に上記セラミックスの母材
となる金属をプラズマ溶射し、第２工程はこの母材と結
合してセラミックスを形成する元素を注入することを特
徴とする低圧プラズマ加工方法。In the method of forming a ceramic layer on a metal base material, the first step is plasma spraying of a metal that will become the base material of the ceramics onto the metal base material, and the second step is to bond with this base material to form the ceramics. A low-pressure plasma processing method characterized by implanting elements to be formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2419586A JPS62211363A (en) | 1986-02-07 | 1986-02-07 | Low-pressure plasma working method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2419586A JPS62211363A (en) | 1986-02-07 | 1986-02-07 | Low-pressure plasma working method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62211363A true JPS62211363A (en) | 1987-09-17 |
Family
ID=12131542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2419586A Pending JPS62211363A (en) | 1986-02-07 | 1986-02-07 | Low-pressure plasma working method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62211363A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100248975B1 (en) * | 1997-06-21 | 2000-04-01 | 지종기 | The high frequency induction plasma torch using thin film coating and gas phase synthesis of the diamond and non-oxide ceramic powder |
| US7916447B2 (en) * | 2003-07-08 | 2011-03-29 | Future Vision Inc. | Electrostatic chuck for substrate stage, electrode used for the chuck, and treating system having the chuck and electrode |
-
1986
- 1986-02-07 JP JP2419586A patent/JPS62211363A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100248975B1 (en) * | 1997-06-21 | 2000-04-01 | 지종기 | The high frequency induction plasma torch using thin film coating and gas phase synthesis of the diamond and non-oxide ceramic powder |
| US7916447B2 (en) * | 2003-07-08 | 2011-03-29 | Future Vision Inc. | Electrostatic chuck for substrate stage, electrode used for the chuck, and treating system having the chuck and electrode |
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