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JPS6220210B2 - - Google Patents

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Publication number
JPS6220210B2
JPS6220210B2 JP16276883A JP16276883A JPS6220210B2 JP S6220210 B2 JPS6220210 B2 JP S6220210B2 JP 16276883 A JP16276883 A JP 16276883A JP 16276883 A JP16276883 A JP 16276883A JP S6220210 B2 JPS6220210 B2 JP S6220210B2
Authority
JP
Japan
Prior art keywords
solution
ether
formula
reaction
under reduced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16276883A
Other languages
Japanese (ja)
Other versions
JPS6053518A (en
Inventor
Shoji Watanabe
Shohei Kosakai
Masao Kato
Kunihiro Ichimura
Masao Suda
Norinaga Fujishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP16276883A priority Critical patent/JPS6053518A/en
Publication of JPS6053518A publication Critical patent/JPS6053518A/en
Publication of JPS6220210B2 publication Critical patent/JPS6220210B2/ja
Granted legal-status Critical Current

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  • Phenolic Resins Or Amino Resins (AREA)

Description

【発明の詳細な説明】 本発明は、アルケニルオキシ単位を有する反応
性重合体の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing reactive polymers having alkenyloxy units.

従来、官能基を有するフエニル基を構成単位と
して含む高分子化合物は、活性なハロゲン原子を
有するポリハロメチルスチレンに、そのハロメチ
ル基と反応する官能基を反応させて得られる。ま
た、芳香環に水酸基を有するポリスチレンに反応
性官能基をエステル化、エーテル化反応などによ
り導入することによつても得られる。それらの例
としては、ポリ(4−ビニルフエニルシンナメ−
ト)、ポリ(4−ビニルフエニルアリルエーテ
ル)、ポリ(4−ビニルフエニルグリシジルエー
テル)、ポリ(4−ビニルフエニルプロパギルエ
ーテル)、または、ノボラツク樹脂にシンナモイ
ル基を導入した樹脂(特公昭50−15026号公報)
などに代表される。しかし、これらの樹脂を塗膜
形成用組成物の構成成分とする樹脂に利用した
り、感光性樹脂組成物を構成する高分子化合物等
に利用するに際して、その反応性が充分ではない
などの欠点を有している。
Conventionally, a polymer compound containing a phenyl group having a functional group as a constituent unit is obtained by reacting polyhalomethylstyrene having an active halogen atom with a functional group that reacts with the halomethyl group. It can also be obtained by introducing a reactive functional group into polystyrene having a hydroxyl group in its aromatic ring by esterification, etherification, or the like. Examples of these include poly(4-vinylphenyl cinnameral)
), poly(4-vinylphenyl allyl ether), poly(4-vinylphenyl glycidyl ether), poly(4-vinylphenyl propagyl ether), or a resin in which a cinnamoyl group is introduced into a novolac resin (especially Publication number 50-15026)
It is represented by However, when these resins are used as constituent components of paint film-forming compositions or as polymer compounds that constitute photosensitive resin compositions, there are drawbacks such as insufficient reactivity. have.

本発明者等は、このような従来の反応性を有す
る重合体のもつ欠点を改良すべく、鋭意研究を重
ねた結果、本発明を成すに至つた。
The present inventors have conducted extensive research in order to improve the drawbacks of conventional reactive polymers, and as a result have accomplished the present invention.

すなわち、本発明は、 一般式 で表わされる構成単位を有するフエノール系ノボ
ラツク樹脂に不活性溶媒中、アルカリ触媒の存在
下、2−ハロゲノエチルビニルエーテルを反応さ
せることを特徴とする 式 で示される構成単位と、 式 で示される構成単位とが直列に結合した構造を有
し、かつ式()の含有量が少なくとも2モル%
である反応性重合体の製造方法を提供するもので
ある。上記一般式()で表わされる循環単位か
ら構成されるフエノール系ノボラツク樹脂はフエ
ノール樹脂として知られており、フエノールとホ
ルムアルデヒドの縮合生成物で、これは乾式法ま
たは湿式法のいずれによつて製造されたものでも
よい。
That is, the present invention has the following general formula: 2-halogenoethyl vinyl ether is reacted with a phenolic novolak resin having a structural unit represented by the formula in an inert solvent in the presence of an alkali catalyst. The structural unit shown by and the formula It has a structure in which the structural units represented by are bonded in series, and the content of formula () is at least 2 mol%
The present invention provides a method for producing a reactive polymer. Phenolic novolak resins composed of circulating units represented by the general formula () above are known as phenolic resins, and are condensation products of phenol and formaldehyde, which can be produced by either dry or wet methods. It may be something you have.

式()で表わされる構成単位は、2−ハロゲ
ノエチルビニルエーテルと式()で表わされる
構成単位中の水酸基を反応させて得ることが出来
る。反応に際しては、適当な縮合剤、例えば無水
炭酸ナトリウム、炭酸カリウム、水素化ナトリウ
ム、金属ナトリウムなどのアルカリ金属化合物、
ナトリウムメチラート、ナトリウムエチラート、
ナトリウムブチラート等のアルカリ金属アルコラ
ート、トリエチルベンジルアンモニウムクロライ
ド、テトラエチルアンモニウムクロライド、トリ
ブチルベンジルアンモニウムクロライドなどの四
級アンモニウム塩化合物等を添加して反応を促進
させることも出来る。反応は不活性溶媒、たとえ
ばエチルセロソルブ、ジメチルスルホキシド、エ
チルレングリコールモノメチルエーテル、ジメチ
ルアセトアミドのような溶媒中で行うことが出来
る。また、反応温度に特に制限はないが室温から
100℃の範囲が望ましい。このようにして得られ
る反応溶液を濃縮し、あるいは乾固等の適当な手
段により固体を回収し、ジクロルタン、ジエチル
エーテルなどの溶剤に可溶な部分を採取し、得ら
れた溶液を多量のヘキサンに注加することにより
目的の反応性重合体を得ることが出来る。
The structural unit represented by formula () can be obtained by reacting 2-halogenoethyl vinyl ether with the hydroxyl group in the structural unit represented by formula (). In the reaction, a suitable condensing agent, such as an alkali metal compound such as anhydrous sodium carbonate, potassium carbonate, sodium hydride, metallic sodium,
sodium methylate, sodium ethylate,
The reaction can also be accelerated by adding an alkali metal alcoholate such as sodium butyrate, a quaternary ammonium salt compound such as triethylbenzylammonium chloride, tetraethylammonium chloride, tributylbenzylammonium chloride, etc. The reaction can be carried out in an inert solvent such as ethyl cellosolve, dimethyl sulfoxide, ethyllene glycol monomethyl ether, dimethyl acetamide. In addition, there is no particular restriction on the reaction temperature, but from room temperature to
A range of 100℃ is desirable. The reaction solution obtained in this way is concentrated or the solid is collected by an appropriate means such as drying, the part soluble in a solvent such as dichlorotane or diethyl ether is collected, and the obtained solution is mixed with a large amount of hexane. The desired reactive polymer can be obtained by adding it to.

このような反応性重合体の製造方法によつて得
られる反応性重合体は、白色粉末で赤外線吸収ス
ペクトルにおいてオレフインに基づく1602cm-1
975cm-1、およびエーテル結合に基づく1240cm-1
の特性吸収を示す。このものは、アセトン、ジメ
チルアセトアミド、ジメチルホルムアミド、エチ
レレングリコールモノエーテル、ジエチルエーテ
ル、ジオキサンなどの有機溶媒にも可溶である。
しかしながら、n−ヘキサンには不溶である。
The reactive polymer obtained by this reactive polymer production method is a white powder with an infrared absorption spectrum of 1602 cm -1 based on olefin.
975cm -1 , and 1240cm -1 based on ether bonds
It shows the characteristic absorption of. It is also soluble in organic solvents such as acetone, dimethylacetamide, dimethylformamide, ethylene glycol monoether, diethyl ether, and dioxane.
However, it is insoluble in n-hexane.

本発明の反応重合体の製造によつて得られる重
合体はその構成単位にルイス酸、プロトン酸、陽
イオンなどの酸性物質に対して高い反応性を有す
るアルケニルオキシ基をもつ。
The polymer obtained by producing the reactive polymer of the present invention has an alkenyloxy group in its constitutional unit that is highly reactive to acidic substances such as Lewis acids, protonic acids, and cations.

このような反応性重合体を適当な有機溶剤に溶
解させ、前記のような活性物質を加えて、支持体
に塗布し、乾燥すると硬化する。また、光照射す
ることにより、反応性重合体に活性となる物質の
発生剤を反応性重合体、溶剤に添加し、この溶液
をアルミニウム板、銅板、亜鉛板、銅張り積層板
などの支持体表面上に流延、吹付け、塗布などの
手段で施し、乾燥して製膜することが出来る。こ
のようにして得られた塗膜にネガを通して光照射
を行い、未露光部を溶剤で除去すると陰画像が出
来る。この光反応はアルケニルオキシ基の重合反
応によるもので極めて短い時間で反応が終了し、
従来の二量化型感光性樹脂の性能をしのぐもので
あり、しかも酸素の影響を全く受けないという利
点もある。
Such a reactive polymer is dissolved in a suitable organic solvent, the above-mentioned active substance is added thereto, applied to a support, and cured by drying. In addition, a generator of a substance that becomes active on the reactive polymer when irradiated with light is added to the reactive polymer and solvent, and this solution is applied to a support such as an aluminum plate, copper plate, zinc plate, or copper-clad laminate. It can be applied onto a surface by means such as casting, spraying, or coating, and then dried to form a film. The coating film thus obtained is irradiated with light through a negative film, and the unexposed areas are removed with a solvent to form a negative image. This photoreaction is due to the polymerization reaction of alkenyloxy groups, and the reaction is completed in an extremely short time.
It has the advantage that it surpasses the performance of conventional dimerized photosensitive resins and is not affected by oxygen at all.

以上述べたように、本発明により得られる反応
性重合体は感光性樹脂、硬化性塗料へ利用し得る
だけでなく、プリント回路等のケミカルミリング
用樹脂、光硬化性印刷インキなどにも利用出来
る。
As mentioned above, the reactive polymer obtained by the present invention can be used not only for photosensitive resins and curable paints, but also for chemical milling resins for printed circuits, photocurable printing inks, etc. .

次に実施例により本発明をさらに詳細に説明す
る。
Next, the present invention will be explained in more detail with reference to Examples.

実施例 1 窒素を導入した反応容器にヘキサンで洗浄した
50%水素化ナトリウム4.8gと乾燥したN・N−
ジメチルアセトアミド25mlを仕込み、この溶液に
数平均分子量900のノボラツク型フエノール樹脂
10.6gを乾燥したN・Nジメチルアセトアミド70
mlに溶解した溶液を加え、約2時間撹拌を続け
た。次いでこの溶液に2−クロロエチルビニルエ
ーテル30g、無水炭酸ナトリオム1.5g、トリエ
チルベンジルアンモニウムクロライド0.05gを加
え、80℃で24時間反応させた。反応溶液90℃、減
圧下で蒸留することにより大部分のN・N−ジメ
チルアセトアミド、未反応の2−クロロエチルビ
ニルエーテルを除く。残渣にジエチルエーテルを
加え、均一溶液とする。得られた均一溶液を飽和
炭酸水素ナトリウム溶液で3回洗い、無水硫酸ナ
トリウムで乾燥した後、乾燥剤をろ別により除去
する。得られた溶液を減圧蒸留することにより固
型の残渣が得られる。この残渣を少量の塩化メチ
レンを含むジエチルエーテルに溶かし、この溶液
を激しく撹拌した多量のヘキサン中に注加し、生
成した沈澱物をろ別し、減圧乾燥した。得られた
生成物は13.5gで、その赤外線吸収スペクトルか
ら1602cm-1と975cm-1にビニル基による吸収、
1220cm-1にエーテル結合に基づく吸収が認められ
た。元素分析により求めた置換率は95%であつ
た。
Example 1 A reaction vessel introduced with nitrogen was washed with hexane.
4.8 g of 50% sodium hydride and dried N・N−
Pour 25ml of dimethylacetamide and add a novolak type phenolic resin with a number average molecular weight of 900 to this solution.
10.6g dried N/N dimethylacetamide 70
ml of the solution was added and stirring was continued for about 2 hours. Next, 30 g of 2-chloroethyl vinyl ether, 1.5 g of anhydrous sodium carbonate, and 0.05 g of triethylbenzylammonium chloride were added to this solution, and the mixture was reacted at 80° C. for 24 hours. Most of the N·N-dimethylacetamide and unreacted 2-chloroethyl vinyl ether were removed by distilling the reaction solution at 90°C under reduced pressure. Add diethyl ether to the residue to make a homogeneous solution. The resulting homogeneous solution is washed three times with saturated sodium bicarbonate solution, dried over anhydrous sodium sulfate, and then the desiccant is removed by filtration. A solid residue is obtained by distilling the obtained solution under reduced pressure. This residue was dissolved in diethyl ether containing a small amount of methylene chloride, this solution was poured into a large amount of vigorously stirred hexane, and the formed precipitate was filtered off and dried under reduced pressure. The obtained product weighed 13.5 g, and its infrared absorption spectrum showed absorption by vinyl groups at 1602 cm -1 and 975 cm -1 ,
Absorption based on ether bonds was observed at 1220 cm -1 . The substitution rate determined by elemental analysis was 95%.

実施例 2 窒素を導入した反応容器に85%水酸化カリウム
6.6gと乾燥したメチルカルビトール70mlを仕込
みこの溶液に数平均分子量850のノボラツク型フ
エノール樹脂13gを乾燥したメチルカルビトール
80mlに溶解した溶液を加え、約3時間撹拌を続け
た。次いでこの溶液に2−クロロエチルビニルエ
ーテル31g、炭酸カリウム1.8gを加え、90℃で
28時間反応させた。反応溶液を90℃、減圧下で蒸
留することにより大部分のメチルカルビトール、
未反応の2−クロロエチルビニルエーテル除く。
残渣にジエチルエーテルを加え、均一溶液とす
る。得られた均一溶液を飽和炭酸水素ナトリウム
溶液で3回洗い無水硫酸ナトリウムで乾燥した
後、乾燥剤をろ別により除去する。得られた溶液
を減圧蒸留することにより固型の残渣が得られ
る。この残渣を少量の塩化メチレンを含むジエチ
ルエーテルに溶かし、この溶液を激しく撹拌した
多量のヘキサン中に注加し、生成した沈澱物をろ
別し、減圧乾燥した。得られた生成物は16.4g
で、その赤外線吸収スペクトルから1600cm-1
980cm-1にビニル基による吸収、1230cm-1にエー
テル結合に基づく吸収が認められた。元素分析よ
り求めた置換率は90%であつた。
Example 2 85% potassium hydroxide in a reaction vessel introduced with nitrogen
Add 6.6 g of dried methyl carbitol and 70 ml of dried methyl carbitol, add 13 g of novolac type phenolic resin with a number average molecular weight of 850 to this solution, and add 13 g of dried methyl carbitol.
A solution dissolved in 80 ml was added and stirring was continued for about 3 hours. Next, 31 g of 2-chloroethyl vinyl ether and 1.8 g of potassium carbonate were added to this solution, and the mixture was heated at 90°C.
The reaction was allowed to proceed for 28 hours. Most of the methyl carbitol was removed by distilling the reaction solution at 90°C under reduced pressure.
Remove unreacted 2-chloroethyl vinyl ether.
Add diethyl ether to the residue to make a homogeneous solution. The resulting homogeneous solution is washed three times with saturated sodium bicarbonate solution and dried over anhydrous sodium sulfate, and then the desiccant is removed by filtration. A solid residue is obtained by distilling the obtained solution under reduced pressure. This residue was dissolved in diethyl ether containing a small amount of methylene chloride, this solution was poured into a large amount of vigorously stirred hexane, and the formed precipitate was filtered off and dried under reduced pressure. The product obtained was 16.4g
So, from its infrared absorption spectrum, it is 1600 cm -1 .
Absorption due to vinyl groups was observed at 980 cm -1 and absorption due to ether bonds was observed at 1230 cm -1 . The substitution rate determined by elemental analysis was 90%.

実施例 3 窒素を導入した反応容器にヘキサンで洗浄した
50%水素化ナトリウム4.5gと乾燥したジメチル
スルホキサイド30mlを仕込み、この溶液に数平均
分子量980のノボラツク型フエノール樹脂11.5g
を乾燥したジメチルホキサイド80mlに溶解した溶
液を加え、約1時間撹拌を続けた。次いでこの溶
液に2−クロロエチルビニルエーテル35g、無水
炭酸ナトリウム2.5g、テトラブチルアンモニウ
ムブロマイド2.5gを加え、90℃で32時間反応さ
せた。反応溶液を95℃、減圧下で蒸留することに
より大部分のジメチルスルホキシド、未反応の2
−クロロエチルビニルエーテルを除く。残渣にジ
エチルエーテルを加え、均一溶液とする。得られ
た均一溶液を飽和炭酸水素ナトリウム溶液で3回
洗い無水硫酸ナトリウムで乾燥した後、乾燥剤を
ろ別により除去する。得られた溶液を減圧蒸留す
ることにより固型の残渣が得られる。この残渣を
少量の塩化メチレンを含むジエチルエーテルに溶
かし、この溶液を激しく撹拌した多量のヘキサン
中に注加し、生成した沈澱物をろ別し、減圧乾燥
した。得られた生成物は14.5gで、その赤外線吸
収スペクトルから1600cm-1と975-1にビニル基に
よる吸収、1220cm-1にエーテル結合に基づく吸収
が認められた。元素分析より求めた置換率は96%
であつた。
Example 3 A reaction vessel introduced with nitrogen was washed with hexane.
Add 4.5 g of 50% sodium hydride and 30 ml of dried dimethyl sulfoxide, and add 11.5 g of novolac type phenolic resin with a number average molecular weight of 980 to this solution.
A solution prepared by dissolving the above in 80 ml of dry dimethyl oxide was added, and stirring was continued for about 1 hour. Next, 35 g of 2-chloroethyl vinyl ether, 2.5 g of anhydrous sodium carbonate, and 2.5 g of tetrabutylammonium bromide were added to this solution, and the mixture was reacted at 90°C for 32 hours. Most of the dimethyl sulfoxide and unreacted 2 were removed by distilling the reaction solution at 95°C under reduced pressure.
-Excluding chloroethyl vinyl ether. Add diethyl ether to the residue to make a homogeneous solution. The resulting homogeneous solution is washed three times with saturated sodium bicarbonate solution and dried over anhydrous sodium sulfate, and then the desiccant is removed by filtration. A solid residue is obtained by distilling the obtained solution under reduced pressure. This residue was dissolved in diethyl ether containing a small amount of methylene chloride, this solution was poured into a large amount of vigorously stirred hexane, and the formed precipitate was filtered off and dried under reduced pressure. The obtained product weighed 14.5 g, and its infrared absorption spectrum showed absorption due to vinyl groups at 1600 cm -1 and 975 -1 and absorption based on ether bond at 1220 cm -1 . Replacement rate determined from elemental analysis is 96%
It was hot.

実施例 4 窒素を導入した反応容器に金属ナトリウム2.3
gと乾燥したメチルカルビトール70mlを仕込み、
この溶液に数平均分子量1200のノボラツク型フエ
ノール樹脂12.2gを乾燥したメチルカルビトール
80mlに溶解した溶液を加え、約2時間撹拌を続け
た。次いでこの溶液に2−クロロエチルビニルエ
ーテル30g、炭酸ナトリウム1.5gを加え、70℃
で28時間反応させた。反応溶液を80℃、減圧下で
蒸留することにより大部分のメチルカルビトー
ル、未反応の2−クロロエチルビニルエーテルを
除く。残渣にジエチルエーテルを加え、均一溶液
とする。得られた均一溶液を飽和炭酸水素ナトリ
ウム溶液で3回洗い無水硫酸ナトリウムで乾燥し
た後、乾燥剤をろ別により除去する。得られた溶
液を減圧蒸留することにより固型の残渣が得られ
る。
Example 4 Metallic sodium 2.3 was added to a reaction vessel into which nitrogen was introduced.
Prepare g and 70ml of dried methyl carbitol,
Add 12.2g of novolak type phenolic resin with a number average molecular weight of 1200 to this solution and dry methyl carbitol.
A solution dissolved in 80 ml was added and stirring was continued for about 2 hours. Next, 30 g of 2-chloroethyl vinyl ether and 1.5 g of sodium carbonate were added to this solution, and the mixture was heated at 70°C.
The mixture was allowed to react for 28 hours. Most of the methyl carbitol and unreacted 2-chloroethyl vinyl ether are removed by distilling the reaction solution at 80°C under reduced pressure. Add diethyl ether to the residue to make a homogeneous solution. The resulting homogeneous solution is washed three times with saturated sodium bicarbonate solution and dried over anhydrous sodium sulfate, and then the desiccant is removed by filtration. A solid residue is obtained by distilling the obtained solution under reduced pressure.

この残渣を少量の塩化メチレンを含むジエチル
エーテルに溶かし、この溶液を激しく撹拌した多
量のヘキサン中に注加し、生成した沈澱物をろ別
し減圧乾燥した。得られた生成物は15.3gでその
赤外線吸収スペクトルから1600cm-1と975cm-1
ビニル基による吸収、1220cm-1にエーテル結合に
基づく吸収が認められた。元素分析より求めた置
換率は97%であつた。
This residue was dissolved in diethyl ether containing a small amount of methylene chloride, this solution was poured into a large amount of vigorously stirred hexane, and the formed precipitate was filtered off and dried under reduced pressure. The obtained product weighed 15.3 g, and its infrared absorption spectrum showed absorption due to vinyl groups at 1600 cm -1 and 975 cm -1 and absorption based on ether bond at 1220 cm -1 . The substitution rate determined by elemental analysis was 97%.

Claims (1)

【特許請求の範囲】 1 一般式 で表わされる構成単位を有するフエノール系ノボ
ラツク樹脂に不活性溶媒中、アルカリ触媒の存在
下、2−ハロゲノエチルビニルエーテルを反応さ
せることを特徴とする 式 で示される構成単位と、 式 で示される構成単位とが直列に結合した構造を有
し、かつ式()の含有量が少なくとも2モル%
である反応性重合体の製造方法。
[Claims] 1. General formula 2-halogenoethyl vinyl ether is reacted with a phenolic novolak resin having a structural unit represented by the formula in an inert solvent in the presence of an alkali catalyst. The structural unit shown by and the formula It has a structure in which the structural units represented by are bonded in series, and the content of formula () is at least 2 mol%
A method for producing a reactive polymer.
JP16276883A 1983-09-05 1983-09-05 Preparation of reactive polymer Granted JPS6053518A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16276883A JPS6053518A (en) 1983-09-05 1983-09-05 Preparation of reactive polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16276883A JPS6053518A (en) 1983-09-05 1983-09-05 Preparation of reactive polymer

Publications (2)

Publication Number Publication Date
JPS6053518A JPS6053518A (en) 1985-03-27
JPS6220210B2 true JPS6220210B2 (en) 1987-05-06

Family

ID=15760851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16276883A Granted JPS6053518A (en) 1983-09-05 1983-09-05 Preparation of reactive polymer

Country Status (1)

Country Link
JP (1) JPS6053518A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6468517A (en) * 1987-05-20 1989-03-14 Gunei Kagaku Kogyo Kk Production of phenolic fiber

Also Published As

Publication number Publication date
JPS6053518A (en) 1985-03-27

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