JPS62191095A - Drain treatment apparatus - Google Patents
Drain treatment apparatusInfo
- Publication number
- JPS62191095A JPS62191095A JP61031182A JP3118286A JPS62191095A JP S62191095 A JPS62191095 A JP S62191095A JP 61031182 A JP61031182 A JP 61031182A JP 3118286 A JP3118286 A JP 3118286A JP S62191095 A JPS62191095 A JP S62191095A
- Authority
- JP
- Japan
- Prior art keywords
- treatment device
- gas
- aeration
- treated
- wastewater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005273 aeration Methods 0.000 claims abstract description 16
- 239000003513 alkali Substances 0.000 claims abstract description 9
- 150000002896 organic halogen compounds Chemical class 0.000 claims abstract description 7
- 239000002351 wastewater Substances 0.000 claims description 17
- 238000004065 wastewater treatment Methods 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 7
- 239000007789 gas Substances 0.000 abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 abstract description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract description 2
- 239000002253 acid Substances 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- -1 trichloroethylene, tetrachloroethylene Chemical group 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 8
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 4
- 229950011008 tetrachloroethylene Drugs 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000007084 catalytic combustion reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000004045 organic chlorine compounds Chemical class 0.000 description 1
Landscapes
- Physical Water Treatments (AREA)
- Treating Waste Gases (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は有機ハロゲン化合物を含有する排水を浄化する
排水処理装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a wastewater treatment device for purifying wastewater containing organic halogen compounds.
［従来の技術］
従来より排水を浄化する目的で曝気処理装置が幅広く用
いられている。[Prior Art] Aeration treatment devices have been widely used for the purpose of purifying wastewater.
［発明が解決しようとする問題点コ
周知のように現在電子工業、精密工業等で有機溶剤、例
えばトリクロロエチレン、テトラクロロエチレン等が多
聞に使用されており、このような分野に携わる工場等か
ら排出される排水には上記有機溶剤を含むものが多い。[Problems to be Solved by the Invention] As is well known, organic solvents such as trichlorethylene and tetrachlorethylene are currently widely used in the electronics industry, precision industry, etc., and are discharged from factories involved in these fields. Many wastewaters contain the above-mentioned organic solvents.
しかしながらこれらの排水を浄化するために処理コスト
の低い従来の曝気処理１置、例えば生物処理装置を用い
た場合には、排水中に含有する有機成分については効率
よく処理することが出来るが上記トリクロロエチレン、
テトラクロロエチレン等の有機ハロゲン化合物について
は処理は困難でありしかも大気中に放散されれば大気を
汚染するという大きな問題がある。However, when using a conventional aeration treatment system with low processing costs, such as a biological treatment device, to purify these wastewaters, the organic components contained in the wastewaters can be efficiently treated, but the trichlorethylene mentioned above can be efficiently treated. ,
Organic halogen compounds such as tetrachlorethylene are difficult to treat, and there is a major problem in that they pollute the atmosphere if released into the atmosphere.
そこでこれら有機ハロゲン化合物を含む排水については
燃焼処理、触媒燃焼処理などを行ない無害化処理を行な
っているがこの場合には設備費、処理費用の点で問題を
有している。Therefore, wastewater containing these organic halogen compounds is detoxified by combustion treatment, catalytic combustion treatment, etc., but in this case, there are problems in terms of equipment costs and treatment costs.
この発明の目的は上記諸問題を解決した排水処理装置を
提供することにある。An object of the present invention is to provide a wastewater treatment device that solves the above-mentioned problems.
［問題点を解決するための手段］
本発明は、有機ハロゲン化合物を含有する排水を浄化す
る排水処理装置において、排水を曝気する曝気処理装置
と、この曝気処理装置から排出されるガスを紫外線照射
する紫外線照射処理装置と、この紫外線照射処理装置か
ら排出されるガスをアルカリで処理するアルカリ洗浄装
置とを具備してなることを特徴とする排水処理装置であ
る。[Means for Solving the Problems] The present invention provides a wastewater treatment device for purifying wastewater containing organic halogen compounds. This is a wastewater treatment device characterized by comprising an ultraviolet irradiation treatment device that processes the ultraviolet irradiation treatment device, and an alkali cleaning device that treats gas discharged from the ultraviolet irradiation treatment device with an alkali.
［実施例］
次に本発明の一実施例を図面を参照しながら詳細に説明
する。[Example] Next, an example of the present invention will be described in detail with reference to the drawings.
第１図は本発明の一実施例を示すブロック図である。第
１図中、符号１はトリクロロエチレン、テトラクロロエ
チレン等の有機塩素化合物を含有する排水である。排水
１はまずブロワ−等の送気装＠３に接続した散気機構４
が配設されている曝気処理装＠２に送られ、敗気機１４
から放出される空気により曝気処理される。曝気処理さ
れた排水は処理水５として排出され、一方、放散された
排ガス６、たとえばトリクロロエチレン、テトラクロロ
エチレンを含むガスは内部照射型の低圧水銀ランプで構
成された紫外線照射処理装置７に送られ、紫外線照射処
理される。その結果、排ガスは分解して塩化水素等の酸
性の分解ガス８となり、このガスは次いでアルカリ洗浄
装置９に送られて無害化処理される。FIG. 1 is a block diagram showing one embodiment of the present invention. In FIG. 1, reference numeral 1 indicates wastewater containing organic chlorine compounds such as trichlorethylene and tetrachlorethylene. The waste water 1 is first fed to the air diffuser 4 connected to the air supply system @ 3 such as a blower.
is sent to the aeration processing unit @2 where
Aerated with air released from the The aerated wastewater is discharged as treated water 5, while the emitted exhaust gas 6, for example, gas containing trichlorethylene and tetrachlorethylene, is sent to an ultraviolet irradiation treatment device 7 composed of an internally irradiated low-pressure mercury lamp, where it is exposed to ultraviolet rays. Irradiated. As a result, the exhaust gas is decomposed to become an acidic decomposed gas 8 such as hydrogen chloride, and this gas is then sent to an alkaline cleaning device 9 where it is rendered harmless.
次に上記のように構成された排水処理装置を用いて排水
の浄化処理を行なった。Next, the wastewater was purified using the wastewater treatment apparatus configured as described above.
３００ｎ＋ａ＃！の８１度のトリクロロエチレンを含む
排水１を空気量８５ Ｎｍ３／Ｉｌｒ 、気液比８５０
倍で１時間曝気処理を行なった。曝気処理後の処理水５
中のトリクロロエチレンの濃度は０．０２１１１ｇ／Ａ
、発生したガス６中のトリクロロエチレンの濃度は６
０ｐｐｍでめった。次に曝気処理によって発生したガス
６を内部照射型の３２Ｗの低圧水銀ランプにより紫外線
照射処理を行ない、続いて紫外線照射処理によって発生
した分解ガス８をアルカリ洗浄装置で無害化処理した。300n+a#! Waste water 1 containing trichlorethylene at 81 degrees Celsius was heated to an air volume of 85 Nm3/Ilr and a gas-liquid ratio of 850.
Aeration treatment was carried out for 1 hour at double magnification. Treated water after aeration treatment 5
The concentration of trichlorethylene in it is 0.02111g/A
, the concentration of trichlorethylene in the generated gas 6 is 6
It was rare at 0 ppm. Next, the gas 6 generated by the aeration treatment was subjected to ultraviolet irradiation treatment using an internal irradiation type 32W low-pressure mercury lamp, and then the decomposed gas 8 generated by the ultraviolet irradiation treatment was rendered harmless using an alkaline cleaning device.
この処理ガス１ｏ中の１〜リクロロエチレンの濃度は０
． ｈａｍであった。The concentration of 1-lichlorethylene in 10 of this processing gas is 0
．． It was ham.
このように本発明の排水処理装置を用いると、曝気処理
により排水中のトリクロロエチレン濃度を０．０２ｍｇ
／Ｊ２と公共用水域への排水の抑制に関する管理目標値
０．３ｍｐ＃！以下に処理出来しかも、曝気処理により
発生したガスを紫外線照射処理、アルカリ洗浄処理によ
り大気中に放散することなく効率よく処理することが出
来た。In this way, when the wastewater treatment device of the present invention is used, the trichlorethylene concentration in wastewater can be reduced to 0.02mg by aeration treatment.
/J2 and the management target value for controlling wastewater into public water bodies: 0.3mp#! In addition, the gas generated by the aeration process could be efficiently treated by ultraviolet irradiation treatment and alkali cleaning treatment without dissipating into the atmosphere.
［発明の効果コ
以上のように本発明による排水処理装置により、排水中
に含まれる有機ハロゲン化合物を曝気処理、紫外線照射
処理、アルカリ洗浄処理によって、大気中に放散するこ
となく分解処理が可能となり、しかも良好な処理水質が
得られた。[Effects of the Invention] As described above, the wastewater treatment device of the present invention makes it possible to decompose organic halogen compounds contained in wastewater through aeration treatment, ultraviolet irradiation treatment, and alkali cleaning treatment without dissipating them into the atmosphere. Moreover, good treated water quality was obtained.
第１図は本発明の排水処理装置の一実施例を示すブロッ
ク図である。
１・・・排水 ２・・・曝気処理Ｉ＠
３・・・送気装置 ４・・・散気機構５・
・・処理水 ６・・・排ガス７・・・紫
外線照射処理装置 ８・・・分解ガス９・・・アルカ
リ洗浄装置 １０・・・処理ガスを一゛
代理人弁理士 内 原 晋、・［−１ｊぐ。FIG. 1 is a block diagram showing one embodiment of the wastewater treatment apparatus of the present invention. 1... Drainage 2... Aeration treatment I@
3... Air supply device 4... Air diffuser mechanism 5.
... Treated water 6 ... Exhaust gas 7 ... Ultraviolet irradiation treatment device 8 ... Decomposition gas 9 ... Alkali cleaning device 10 ... Processed gas 1j.
Claims (1)
水処理装置において、排水を曝気する曝気処理装置と、
この曝気処理装置から排出されるガスを紫外線照射する
紫外線照射処理装置と、この紫外線照射処理装置から排
出されるガスをアルカリで処理するアルカリ洗浄装置と
を具備してなることを特徴とする排水処理装置。(1) In a wastewater treatment device that purifies wastewater containing organic halogen compounds, an aeration treatment device that aerates the wastewater;
A wastewater treatment system comprising: an ultraviolet irradiation device that irradiates the gas discharged from the aeration treatment device with ultraviolet rays; and an alkali cleaning device that treats the gas discharged from the ultraviolet irradiation treatment device with alkali. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61031182A JPS62191095A (en) | 1986-02-14 | 1986-02-14 | Drain treatment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61031182A JPS62191095A (en) | 1986-02-14 | 1986-02-14 | Drain treatment apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62191095A true JPS62191095A (en) | 1987-08-21 |
Family
ID=12324300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61031182A Pending JPS62191095A (en) | 1986-02-14 | 1986-02-14 | Drain treatment apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62191095A (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01300969A (en) * | 1988-05-31 | 1989-12-05 | Matsushita Electric Ind Co Ltd | Decomposing method of halogenoacyclic hydrocarbon compound |
| JPH0275391A (en) * | 1988-09-09 | 1990-03-15 | Nec Corp | Waste water treatment apparatus |
| JPH10323536A (en) * | 1997-05-26 | 1998-12-08 | Kurita Water Ind Ltd | Organic chlorine compound decomposition equipment |
| EP1163946A1 (en) * | 2000-06-16 | 2001-12-19 | Canon Kabushiki Kaisha | Process and system for decomposing pollutants |
| US6497795B1 (en) | 1998-12-16 | 2002-12-24 | Canon Kabushiki Kaisha | Method and apparatus for decomposing gaseous aliphatic hydrocarbon halide compound |
| US6616815B2 (en) | 1998-06-22 | 2003-09-09 | Canon Kabushiki Kaisha | Method of decomposing halogenated aliphatic hydrocarbon compounds or aromatic compounds and apparatus to be used for the same as well as method of clarifying exhaust gas and apparatus to be used for the same |
| US6716399B2 (en) | 1998-11-30 | 2004-04-06 | Canon Kabushiki Kaisha | Apparatus for decomposing halogenated aliphatic hydrocarbon compounds or aromatic compounds |
| US6814875B2 (en) | 2000-10-06 | 2004-11-09 | Yamaha Corporation | Method and device for treating waste liquid, solvent separator, and cleaning device using thereof |
| US6908065B1 (en) | 2002-05-30 | 2005-06-21 | Gregory Ritchie | 3-dimensional bead process |
| US7018514B2 (en) | 2001-11-12 | 2006-03-28 | Canon Kabushiki Kaisha | Method and apparatus for processing substances to be decomposed |
| US7163615B2 (en) | 2001-11-12 | 2007-01-16 | Canon Kabushiki Kaisha | Method of treating substance to be degraded and its apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS599212A (en) * | 1982-07-02 | 1984-01-18 | Toray Ind Inc | Preparation of high-tenacity and highly shrinkable polyester fiber |
| JPS5910382A (en) * | 1982-07-07 | 1984-01-19 | Fuji Electric Corp Res & Dev Ltd | Removing method of trihalomethane and organic halide of low boiling point in city water |
-
1986
- 1986-02-14 JP JP61031182A patent/JPS62191095A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS599212A (en) * | 1982-07-02 | 1984-01-18 | Toray Ind Inc | Preparation of high-tenacity and highly shrinkable polyester fiber |
| JPS5910382A (en) * | 1982-07-07 | 1984-01-19 | Fuji Electric Corp Res & Dev Ltd | Removing method of trihalomethane and organic halide of low boiling point in city water |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01300969A (en) * | 1988-05-31 | 1989-12-05 | Matsushita Electric Ind Co Ltd | Decomposing method of halogenoacyclic hydrocarbon compound |
| JPH0275391A (en) * | 1988-09-09 | 1990-03-15 | Nec Corp | Waste water treatment apparatus |
| JPH10323536A (en) * | 1997-05-26 | 1998-12-08 | Kurita Water Ind Ltd | Organic chlorine compound decomposition equipment |
| US6616815B2 (en) | 1998-06-22 | 2003-09-09 | Canon Kabushiki Kaisha | Method of decomposing halogenated aliphatic hydrocarbon compounds or aromatic compounds and apparatus to be used for the same as well as method of clarifying exhaust gas and apparatus to be used for the same |
| US6716399B2 (en) | 1998-11-30 | 2004-04-06 | Canon Kabushiki Kaisha | Apparatus for decomposing halogenated aliphatic hydrocarbon compounds or aromatic compounds |
| US7163665B2 (en) | 1998-12-16 | 2007-01-16 | Canon Kabushiki Kaisha | Apparatus for decomposing gaseous aliphatic hydrocarbon halide compounds |
| US6497795B1 (en) | 1998-12-16 | 2002-12-24 | Canon Kabushiki Kaisha | Method and apparatus for decomposing gaseous aliphatic hydrocarbon halide compound |
| US6699370B2 (en) | 2000-06-16 | 2004-03-02 | Canon Kabushiki Kaisha | Process and system for decomposing pollutants |
| EP1163946A1 (en) * | 2000-06-16 | 2001-12-19 | Canon Kabushiki Kaisha | Process and system for decomposing pollutants |
| US6814875B2 (en) | 2000-10-06 | 2004-11-09 | Yamaha Corporation | Method and device for treating waste liquid, solvent separator, and cleaning device using thereof |
| US7018514B2 (en) | 2001-11-12 | 2006-03-28 | Canon Kabushiki Kaisha | Method and apparatus for processing substances to be decomposed |
| US7163615B2 (en) | 2001-11-12 | 2007-01-16 | Canon Kabushiki Kaisha | Method of treating substance to be degraded and its apparatus |
| US6908065B1 (en) | 2002-05-30 | 2005-06-21 | Gregory Ritchie | 3-dimensional bead process |
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