JPS62172126A - Cleaning device - Google Patents

Abstract

PURPOSE:To realize a local cleaning operation and improve a degree of cleanliness by a method wherein a cleaning unit for transporting or storing processed items to each of processing portions separately is arranged for each multi-stage processing device and cleaning air is separately supplied for each of cleaning units. CONSTITUTION:Compressed air 6 guided into a fan box 10 is cleaned through a filter 14 arranged as a cleaning mechanism at a lower surface of a fan box 10, thereafter is introduced into a cleaning area 16 as indicated by an arrow A. The cleaning area 16 has a floor surface formed by porous plate 18 and below the porous plate 18 are mounted a discharging duct 20 and a transporting mechanism 22 for use in transporting the processed items. Within the transporting mechanism 22 is placed a mounting block 24 for use in mounting the processed items extending from the porous plate 18 and to within the cleaning area 6. Semiconductor wafer or the like of the processed items are transported to the processing part together with a circuit board and can be stored.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a cleaning device for storing or transferring stored objects such as semiconductor wafers in a clean state, and in particular, the present invention relates to a cleaning device for storing or transferring stored objects such as semiconductor wafers in a clean state. Regarding cleanliness.

[Conventional technology]

Conventionally, when transferring or storing semiconductor wafers to multi-stage processing equipment such as multi-stage heat processing equipment that can process multiple sets of semiconductor wafers simultaneously, it is necessary to clean the entire processing chamber where the multi-stage processing equipment is installed. It has become

In such a cleaning process, a filter and a fan unit are integrated to send clean air into a processing chamber for cleaning.

[Problem that the invention seeks to solve]

By the way, as multi-stage processing equipment becomes larger, vast cleaning rooms (clean rooms) are required, and it is well known that in the manufacture of semiconductor devices, the cost required for cleaning them is also significant. It is.

Moreover, as the density of semiconductor devices has increased, the level of cleanliness has also increased, and cleaning the entire processing chamber not only increases the cost of cleaning, but also limits the level of cleanliness.

Therefore, an object of the present invention is to provide a cleaning device that achieves localized cleaning and improves the level of cleanliness.

[Means for solving problems]

As shown in FIGS. 1 and 2, the cleaning device of the present invention has a cleaning unit 2 that individually transfers or stores the objects to be processed to each processing section of each multistage processing device in correspondence with the multistage processing device. 8 to 2D are installed, and a cleaning mechanism (filter 14) for passing clean air through each cleaning unit is installed individually.

[For production]

In the cleaning device of the present invention, by installing a cleaning area corresponding to each processing section of the multi-stage processing device, it is possible to transfer and store the processed material to each processing section.

〔Example〕

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 and FIG. 2 show an embodiment of the cleaning device of the present invention.

As shown in FIGS. 1 and 2, the cleaning apparatus of this embodiment has a four-stage cleaning unit with two people corresponding to the number of stages of a multi-stage processing apparatus such as a four-stage heating furnace (not shown). ,2
B, 2C12D is installed.

A ventilation duct 4 is installed on the back surface of each of the cleaning units 2A to 2D, and the compressed air 6 from the air pressure feeding means (not shown) is sent into the fan box 10 through the air passage 8. lead. In this case, the inside of the air passage 8 contains pressurized air 6.
An adjustment damper 12 is installed to adjust the amount of air passing through the fan box 10, and the amount of air flowing into the fan box 10 can be adjusted by adjusting its angle.

The pressurized air 6 guided into the fan box 10 (after being purified through the filter 14 installed as a cleaning mechanism on the bottom side of the fan box 10, is then introduced into the cleaning area 16 as shown by arrow A). be introduced.

In the cleaning area 16, a floor surface is formed by the perforated plate 11N, and an exhaust duct 20 and a conveyance mechanism 22 for conveying the object to be treated are installed on the lower surface side of the perforated plate 18.

In the transport mechanism 22, a mounting table 24 on which the object to be processed is placed faces into the cleaning area 16 from the perforated plate 18.
By driving the transport mechanism 22, it is movable in the front and rear directions.

In this case, a semiconductor wafer or the like as an object to be processed can be placed on the mounting table 24 together with the boat and transferred to the processing section of the multi-stage processing apparatus, or the semiconductor wafer can be stored together with the boat during transfer. .

Each of the cleaning units 2A to 2D has a plurality of doors 26 attached to its front surface that can be slid to open and close, and the doors 26 at arbitrary positions can be opened and closed to adjust the interior. I can do it.

Therefore, in such a cleaning device, the cleaning units 2A to 2D can be installed individually corresponding to the processing sections of the multi-stage processing device to clean, transport and store each processing object. Since this is carried out locally depending on the processing section, a higher degree of cleanliness can be maintained compared to when cleaning the entire processing chamber, and the cleanliness can also be adjusted depending on the processing section. Therefore, the atmospheres of the cleaning units 2A to 2D do not mix.

In particular, compared to the case where the entire processing chamber is cleaned, various costs such as electric power due to cleaning can be reduced.

Note that the exhaust duct 20 may be replaced with a damper slit to perform natural exhaust.

〔Effect of the invention〕

As explained above, according to the present invention, the following effects can be obtained.

(al) By installing a cleaning area corresponding to each processing section of the multi-stage processing apparatus, it is possible to transfer and store the processed material to each processing section.

tb+ Local cleaning can be achieved and the cleanliness can be maintained at a high level.

(Compared to the case where the entire C1 processing chamber is cleaned, the cost required for cleanliness can be reduced.

(d) Maintenance and management are easy, and the cleanliness level can be set according to the process without mixing the cleanliness levels of each stage.

[Brief explanation of drawings]

FIG. 1 is a sectional view showing an embodiment of the cleaning device of the present invention;
FIG. 2 is a perspective view showing an embodiment of the cleaning device of the present invention. 2A to 2D...Cleaning unit, 14... Filter as a cleaning mechanism. Figure 1

Claims (1)

[Claims] A cleaning mechanism that installs a cleaning unit that individually transfers or stores the processed material to each processing section of each multistage processing device in response to a multistage processing device, and that flows clean air individually to each cleaning unit. A cleaning device characterized by being installed with.