JPS62145511A - magnetic head - Google Patents
magnetic headInfo
- Publication number
- JPS62145511A JPS62145511A JP28552685A JP28552685A JPS62145511A JP S62145511 A JPS62145511 A JP S62145511A JP 28552685 A JP28552685 A JP 28552685A JP 28552685 A JP28552685 A JP 28552685A JP S62145511 A JPS62145511 A JP S62145511A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- film
- core
- forming
- amorphous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 229910000859 α-Fe Inorganic materials 0.000 claims description 7
- 229910020018 Nb Zr Inorganic materials 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 238000002425 crystallisation Methods 0.000 claims description 2
- 230000008025 crystallization Effects 0.000 claims description 2
- 238000000227 grinding Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 claims 2
- 230000004907 flux Effects 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
- 238000004804 winding Methods 0.000 claims 1
- 239000011651 chromium Substances 0.000 description 11
- 230000006866 deterioration Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000000084 colloidal system Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000004886 head movement Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 239000005300 metallic glass Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 102000010970 Connexin Human genes 0.000 description 1
- 108050001175 Connexin Proteins 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 210000003976 gap junction Anatomy 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は高抗磁力記録媒体と組合せて使用するに好適な
磁気ヘッドに関し、更に詳しくはへラドコア体として磁
性合金材例えばアモルファス金属膜を用いた磁気ヘッド
及びその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic head suitable for use in combination with a high coercive force recording medium, and more specifically to a magnetic head that uses a magnetic alloy material, such as an amorphous metal film, as a helad core body. The present invention relates to a magnetic head and a method for manufacturing the same.
従来の磁気ヘッドに特開昭６０〜１７００１１号に記載
のようにヘッドギャップを有するアモルファス金属膜よ
りなる主コアと、該主コアの両サイドに接合されたフェ
ライトよりなる補助コアにて磁気回路を構成し、上記主
コアのテープ摺動面をＸ字状に構成されてなるものがあ
る。As described in JP-A-60-170011, a conventional magnetic head has a magnetic circuit using a main core made of an amorphous metal film having a head gap and an auxiliary core made of ferrite bonded to both sides of the main core. There is one in which the tape sliding surface of the main core is configured in an X-shape.
しかし上記従来技術は磁気コア（主コア）の磁気特性保
護などの点については充分配慮されておらず、その磁気
コア体の近傍に充填されるガラスなどにより磁気特性が
変化し抗磁力などが犬きくなる問題点があった。However, the above conventional technology does not give sufficient consideration to the protection of the magnetic properties of the magnetic core (main core), and the magnetic properties change due to the glass filled in the vicinity of the magnetic core body, causing the coercive force to deteriorate. There was a problem that I noticed.
磁気コアの磁気特性の劣化は、磁気コアのガラスとの反
応に起因し、特に金属磁性体はガラスとの反応が著しく
、酸化物磁性体例えばフェライトなどに比べ速度も速く
、その反応による磁性劣化も太きい。特に抗磁力ＥＣの
劣化は犬きく、数百エールステッドの磁性膜がガラスと
の反応により生じ数μｍ以上のハード膜が形成されやす
い。The deterioration of the magnetic properties of the magnetic core is due to the reaction of the magnetic core with glass. In particular, metal magnetic materials react significantly with glass, and the reaction rate is faster than that of oxide magnetic materials such as ferrite, and the magnetic deterioration due to this reaction. It's also thick. In particular, the deterioration of the coercive force EC is severe, and a magnetic film of several hundred oersteds tends to react with the glass, resulting in the formation of a hard film of several μm or more.
本発明の目的は磁気コアの磁気特性の劣化の防止が図れ
る磁気ヘッドを提供するにある。An object of the present invention is to provide a magnetic head that can prevent deterioration of the magnetic properties of the magnetic core.
上記目的は非磁性でかつガラスと反応しにぐい非磁性金
属膜を磁性膜上に形成することにより達成される。The above object is achieved by forming a nonmagnetic metal film on a magnetic film, which is nonmagnetic and does not easily react with glass.
上記非磁性金属膜はアモルファス磁性膜と充填ガラスと
の反応を防ぐことになるので、アモルファス磁性膜の劣
化がない。Since the non-magnetic metal film prevents the reaction between the amorphous magnetic film and the filled glass, there is no deterioration of the amorphous magnetic film.
以下本発明の実施例を図面に基づいて説明する。第４図
は本発明の説明に供する従来の磁気ヘッドのテープ摺動
面を示す正面図である。同図において、６，７は補助コ
ア、２（２α、２ｂ）はアモルファス磁性膜、３はガラ
スである。斯るヘッド構造において、磁性コロイド液を
塗布しその磁化状態を観察すると、アモルファス磁性膜
２の近傍にコロイド液が集まり、該部分がハード膜にな
っていることがわかった。そして、この部分によって記
録媒体上の記録信号を消してしまう問題があった。この
問題は例えば第５図に示すように、フロッピー等のディ
スク媒体９上に信号を記録し、次に隣りのトラックにヘ
ッド１０を移動して更に信号を記録ししかるのち最初の
トラックに戻してから上記記録信号を再生するような場
合顕著に現われる。具体的には１５〜３ｃＬＢ の出
力減少が観察された。これは１５〜５ｄＢ の出力減少
が観察された直後、記録−再生をそのトラックにて行な
うと元の出力に戻るので、ヘッドの移動（アクセス）に
より記録信号が減磁されていることに起因する。Embodiments of the present invention will be described below based on the drawings. FIG. 4 is a front view showing the tape sliding surface of a conventional magnetic head for explaining the present invention. In the figure, 6 and 7 are auxiliary cores, 2 (2α, 2b) are amorphous magnetic films, and 3 is glass. In such a head structure, when a magnetic colloid liquid was applied and the state of magnetization thereof was observed, it was found that the colloid liquid gathered near the amorphous magnetic film 2, and this part became a hard film. There is a problem in that this portion erases the recorded signal on the recording medium. This problem can be solved, for example, as shown in FIG. 5, by recording a signal on a disk medium 9 such as a floppy disk, then moving the head 10 to an adjacent track to record more signals, and then returning to the first track. This is noticeable when reproducing the above-mentioned recorded signal from. Specifically, a decrease in output of 15-3 cLB was observed. This is because immediately after a 15 to 5 dB decrease in output is observed, the original output returns when recording and playback is performed on that track, so the recording signal is demagnetized by the movement (access) of the head. .
第２図はヘッド移動回数に対する再生出力を表す特性図
を示し、第４図において寸法αを２７μｍ、９μｍ、Ｏ
とし、第５図においてディスク媒体９上の記録信号に対
し、矢印の方向にヘッド１０を移動し、しかるのち、元
の位置に戻した時の初期出力に対する再生出力を示すも
のである。同図から明らかのように寸法αが太きくなる
程再生出力が低下している。これはアモルファス磁性膜
の表面の劣化が原因になっている。Fig. 2 shows a characteristic diagram showing the reproduction output with respect to the number of head movements.
5 shows the reproduced output relative to the initial output when the head 10 is moved in the direction of the arrow with respect to the recording signal on the disk medium 9 in FIG. 5 and then returned to its original position. As is clear from the figure, the thicker the dimension α, the lower the reproduction output. This is caused by deterioration of the surface of the amorphous magnetic film.
本発明は斯る問題を是正してなるである。The present invention corrects this problem.
第１図は本発明の一実施例を示す磁気ヘッドめ正面図で
ある。同図において、２（２α、２ｈ）は磁気フェライ
トからなる補助コアを示し、該補助コアの相対向する面
は図示の如く２字状（山型）に形成しである。６，７は
アモルファス磁性膜（Ｃｏ −ＨＡ−Ｚデ）からなる主
コアを示し、該主コアはそれぞれ補助コア６．７のＶ字
状の突出面全体に図示の如く形成されている。主コア２
（２α、２ｂ）はその表面に順次積層されたＳ ｉ Ｏ
を等の非磁性酸化膜４．クロム（Ｃｒ）等の非磁性金属
膜５を介して接合（加熱圧接）され、ギャップ８を形成
している。３は主コア２（２α、２ｈ）をＳ ｉ Ｏ！
膜４ 、 Ｃｒ膜５を介して接合した持主コ１６．７の
傾斜面に被着されたＳ ｉ ０２膜４ 、 Ｃｒ膜５と
で形成される２字状の溝（狭トラツクしぼり部）に充填
されたガラス（鉛は５酸系低融点ガラス）である。ここ
で非磁性酸化膜４はフォルテステライト、 ＡＪｉ２０
ｇでもよく、また非磁性金属膜５はＴａ 、 Ｔｉ 、
Ｗ 、 Ｎｏ 等でもよい。FIG. 1 is a front view of a magnetic head showing an embodiment of the present invention. In the figure, 2 (2α, 2h) indicates an auxiliary core made of magnetic ferrite, and the opposing surfaces of the auxiliary core are formed in a double-shape (mountain shape) as shown. Reference numerals 6 and 7 indicate main cores made of an amorphous magnetic film (Co-HA-Z), which are respectively formed on the entire V-shaped protruding surface of the auxiliary core 6 and 7 as shown. Main core 2
(2α, 2b) is S i O layered sequentially on its surface.
Non-magnetic oxide film such as 4. They are bonded (heated and pressure welded) via a non-magnetic metal film 5 such as chromium (Cr) to form a gap 8. 3 is the main core 2 (2α, 2h) S i O!
In the double-shaped groove (narrow track narrowing part) formed by the Si02 film 4 and the Cr film 5, which are adhered to the inclined surface of the holder plate 16.7, which are bonded via the film 4 and the Cr film 5. It is filled with glass (lead is a pentaacid-based low melting point glass). Here, the nonmagnetic oxide film 4 is made of fortesterite, AJi20
Also, the nonmagnetic metal film 5 may be made of Ta, Ti,
W, No, etc. may also be used.
斯る本発明の磁気ヘッドにおいて、上述のように磁性コ
ロイド液を塗布し、その磁化状態を観察したところ、ギ
ャップ８にはコロイド液が集まるも、その他の部分には
集まらないことが確認できた。またヘッド移動回数に対
する再生出力をみるに第２図のΔ印で示すような特性を
示し、つまり寸法αを０とした場合と同一の特性が得ら
れることが確認できた。In the magnetic head of the present invention, when a magnetic colloid liquid was applied as described above and the state of magnetization was observed, it was confirmed that the colloid liquid gathered in gap 8 but not in other parts. . Furthermore, when looking at the reproduction output with respect to the number of head movements, it was confirmed that the characteristics shown by the symbol Δ in FIG. 2 were obtained, that is, the same characteristics as when the dimension α was set to 0 were obtained.
次に第１図に示す磁気ヘッドの製造方法について説明す
る。第３図（α）〜（ｄ）は本発明の磁気ヘッドの製造
方法を示す工程図である。まず第３図（α）に示すよう
にＫｎ −Ｚｎ単結晶フェライト１にＷ字状の溝をダイ
シングソーにより形成し、波溝を洗浄した後スパッタリ
ング法によりＣｏ−Ｎｂ−Ｚｒ三元系アモルファス膜２
を約３０μｍ１層形成する。この時Ｃｏ−Ｎｂ −Ｚｒ
膜はＲＦスパッタ装置にて２．５５ ｒ／、、４のパ
ワーにて行なう。形成された膜組成はＣｏ ： ８１〜
８５ａｔ％ Ｎｂ ： １０〜１４αｔ％ Ｚｒ ：
５αｔｌｒ未満になるようターゲット組成を選定する。Next, a method of manufacturing the magnetic head shown in FIG. 1 will be explained. FIGS. 3(α) to 3(d) are process diagrams showing the method for manufacturing the magnetic head of the present invention. First, as shown in FIG. 3 (α), W-shaped grooves are formed in Kn-Zn single crystal ferrite 1 using a dicing saw, and after cleaning the wave grooves, a Co-Nb-Zr ternary amorphous film is formed by sputtering. 2
One layer of about 30 μm is formed. At this time, Co-Nb-Zr
The film was formed using an RF sputtering system with a power of 2.55 r/.4. The formed film composition was Co: 81~
85at% Nb: 10-14αt% Zr:
The target composition is selected to be less than 5αtlr.
次に第３図（ｂ）に示すようにアモルファス膜２上にＲ
Ｆスパッタ装置にて同様にＳｉＯ２膜４を約１μｍスパ
ッタし続いて、同様にてＣｒ膜５を約１μｍスパッタ形
成する。Next, as shown in FIG. 3(b), R is applied on the amorphous film 2.
A SiO2 film 4 of about 1 .mu.m is sputtered in the same manner using the F sputtering apparatus, and then a Cr film 5 of about 1 .mu.m is formed by sputtering in the same manner.
続いて第３図（ｃ）に示すようにアモルファス膜Ｓ ｚ
Ｏ２膜−Ｃｒ膜が形成されている溝に低融点ガラス３
を充填し、その充填面を研削研磨しギャップ形成面とす
る。充填ガラス３はｐｈｏ ： ｓ。Subsequently, as shown in FIG. 3(c), an amorphous film Sz
Low melting point glass 3 is placed in the groove where the O2 film-Cr film is formed.
The filling surface is ground and polished to form a gap forming surface. Filled glass 3 is pho:s.
〜８５ ｗｔ ％ 、 Ｂ２０５二１０〜１５ ｗｔ憾
、残り５＊０１ｒＡ！２０３の低融点ガラスを用い４２
０〜４６０℃の温度にて溶融充填する。ギャップ面を形
成した後、Ｓ番Ｏ１膜１１をＲＦ装置にて約１２５ＯＡ
形成し一方のコア片（主コア、補助コアの半休）とする
。同様にしてもう一方のコア片（主コア、補助コアのコ
ア片を第３図（ｄ）に示すように突き合わせ加圧加熱し
て接合される。この時のボンディング温度は約４６０℃
にて行なう。このボンディングにより充填ガラス接合面
のＳ ｉ Ｏ！膜（１２５０，（’）は低融点ガラス３
とガラス化反応し、はとんど消えて見えなくなる。しか
しＣｒ膜５ 、５ｉ０２膜４があるため、ギャップ接合
面のＳ ｉ Ｏｚギャップは充填ガラス３による側面か
らの、くわれなどは生じることがない。このようなプロ
セスによるアモルファス膜２の結晶化温度は５０５°以
上が好ましく、熱プロセスによるアモルファス磁性膜の
劣化はない。２つのコア片がボンディングされたブロッ
ク片は第３図（ｄ）に示すように破線にて切断され、所
定の大きさのヘッドチップが作成される。~85wt%, B205210~15wt, 5*01rA left! 42 using low melting point glass of 203
Melt filling at a temperature of 0 to 460°C. After forming the gap surface, the S number O1 film 11 is heated to approximately 125 OA using an RF device.
Form one core piece (main core, half half of auxiliary core). In the same way, the other core pieces (the main core and the auxiliary core pieces are butted together and bonded by pressure and heating as shown in Figure 3(d).The bonding temperature at this time is approximately 460°C.
I'll do it at This bonding allows S i O! of the bonded surface of the filled glass. Film (1250, (') is low melting glass 3
The glass undergoes a vitrification reaction and disappears, becoming invisible. However, because of the presence of the Cr film 5 and the 5i02 film 4, the SiOz gap on the gap junction surface is not dented from the side by the filled glass 3. The crystallization temperature of the amorphous film 2 obtained by such a process is preferably 505° or higher, and the amorphous magnetic film is not deteriorated by the thermal process. The block piece to which the two core pieces are bonded is cut along the broken line as shown in FIG. 3(d) to produce a head chip of a predetermined size.
上記実施例ではＳ Ｌ Ｏ２またＣｒ膜を用いたが、Ｓ
ｉ Ｏｔに代ってフォルテステライト、 Ａ１． Ｏ
，膜をまたＣｒに代ってＴａ 、 Ｔｉ 、 Ｗ、 Ｎ
ｏ膜を用いてもよくまた次のように製造してもよい。In the above embodiment, S L O2 or Cr film was used, but S
i Fortesterite instead of Ot, A1. O
, the film was also made of Ta, Ti, W, N instead of Cr.
o membrane may be used or may be manufactured as follows.
即ちＭｎ−Ｚｎ単結晶基板にＷ字状の溝を形成し、Ｃｏ
−ＨＡ−Ｚｒアモルファス膜を１５μｍ２層形成する。That is, a W-shaped groove is formed in a Mn-Zn single crystal substrate, and a Co
- Form two 15 μm thick HA-Zr amorphous films.
層間材としてはＳ ｔ ０１膜を約７０ＯＡ形成する。As an interlayer material, an St01 film with a thickness of about 70 OA is formed.
次にフォルテステライトをＥＢ蒸着にて約１μｍ形成し
、Ｔａ膜を約１μｍ更にスパッタ形成する。ガラス充填
、研削、ラップ等をへて、非磁性ギャップ材Ｓ ｉ Ｏ
！を上記実施例と同様に形成し、加圧加熱してヘッドを
作成する。Next, fortesterite is formed to a thickness of approximately 1 μm by EB evaporation, and a Ta film is further sputtered to a thickness of approximately 1 μm. After glass filling, grinding, lapping, etc., the non-magnetic gap material S i O
! is formed in the same manner as in the above embodiment, and heated under pressure to create a head.
本発明によれば、Ｃｒ膜等にてアモルファス磁性膜の充
填ガラスによる反応を防止しているので、抗磁力ＥＣの
小さい軟磁性膜の保持が可能となり、信頼性の高い高出
力磁気ヘット８金得ることができる。According to the present invention, since the reaction of the amorphous magnetic film due to the glass filling is prevented using a Cr film or the like, it is possible to maintain a soft magnetic film with a small coercive force EC, and a highly reliable high-output magnetic head with 8-metal gold can be used. Obtainable.
第１図は本発明のヘッド摺動面の構造を示す正面図、第
２図は本発明の説明に供し、アモルファス磁性膜がガラ
スにより劣化しているヘッドの記録信号の消去度合を示
す特性図、第３図は本発明の磁気ヘッドの製造工程を示
す図、第４図、第５図は従来技術の説明に供する正面図
。
平面図である。
１：フェライト基板
２：主コア（アモルファス磁性膜）
５ニガラス
４ ： ５ｉ０２膜
５ニクロム（Ｃｒ）膜
６．７：補助コア（フェライト）
８：ギャップ
＼、−FIG. 1 is a front view showing the structure of the head sliding surface of the present invention, and FIG. 2 is a characteristic diagram for explaining the present invention showing the degree of erasure of recorded signals of a head whose amorphous magnetic film is degraded by glass. , FIG. 3 is a diagram showing the manufacturing process of the magnetic head of the present invention, and FIGS. 4 and 5 are front views for explaining the prior art. FIG. 1: Ferrite substrate 2: Main core (amorphous magnetic film) 5 Ni glass 4: 5i02 film 5 Nichrome (Cr) film 6.7: Auxiliary core (ferrite) 8: Gap\, -
Claims (1)
イドに接合された補助コアにてヘッドコアを構成すると
共に上記主コアが上記補助コアに対し飽和磁束密度の大
きいアモルファス磁性膜からなる磁気ヘッドにおいて、
上記アモルファス磁性膜の表面に非磁性酸化膜非磁性金
属膜を順次積層してなることを特徴とする磁気ヘッド。 ２、上記非磁性酸化膜がＳｉＯ＿２、フェルテステライ
ト、Ａｌ＿２Ｏ＿３、ＴｉＯ＿２膜のいずれかからなり
、上記非磁性金属膜がＣｒ、Ｔｉ、Ｍｏ、Ｗ、Ｔａ膜の
いずれかからなることを特徴とする特許請求の範囲第１
項記載の磁気ヘッド。 ３、少なくとも２つのコア片を接合し、該コア片の少な
くとも一方には巻線用窓となる溝を有した磁気ヘッドに
おいて、フェライト基板にＷ字状の溝を形成する工程と
、該溝にアモルファス磁性膜をスパッタリングに形成す
る工程と、上記アモルファス磁性膜上に非磁性酸化膜お
よび非磁性金属膜の２層膜を形成する工程と、上記溝に
ガラスを充填し、該表面を研削研磨し、所定のトラック
幅およびギャップ形成面を形成する工程と、該ギャップ
形成面にギャップ材となる非磁性膜を形成する工程とか
ら成り、少なくとも上記２つのコア片を突き合わせ加熱
接着してなる磁気ヘッド。 ４、上記アモルファス磁性膜がＣｏ−Ｎｂ−Ｚｒからな
り、該Ｃｏ−Ｎｂ−Ｚｒアモルファス磁性膜の結晶化温
度Ｔｘより４５°以上低い温度で熱処理、ガラス充填を
行なうことを特徴とする特許請求の範囲第１項記載の磁
気ヘッド。[Claims] 1. A head core is composed of a main core having a head gap and auxiliary cores joined to both sides of the main core, and the main core is made of amorphous material having a higher saturation magnetic flux density than the auxiliary core. In a magnetic head made of a magnetic film,
A magnetic head characterized in that a nonmagnetic oxide film and a nonmagnetic metal film are sequentially laminated on the surface of the amorphous magnetic film. 2. A patent characterized in that the non-magnetic oxide film is made of any one of SiO_2, fertesterite, Al_2O_3, and TiO_2 films, and the non-magnetic metal film is made of any one of Cr, Ti, Mo, W, and Ta films. Claim 1
The magnetic head described in Section 1. 3. In a magnetic head in which at least two core pieces are joined and at least one of the core pieces has a groove serving as a window for winding, a step of forming a W-shaped groove in a ferrite substrate, and a step of forming a W-shaped groove in the groove. A step of forming an amorphous magnetic film by sputtering, a step of forming a two-layer film of a non-magnetic oxide film and a non-magnetic metal film on the amorphous magnetic film, filling the groove with glass, and grinding and polishing the surface. , a step of forming a predetermined track width and a gap forming surface, and a step of forming a nonmagnetic film serving as a gap material on the gap forming surface, and a magnetic head formed by butting at least the two core pieces and bonding them by heat. . 4. The amorphous magnetic film is made of Co-Nb-Zr, and the heat treatment and glass filling are performed at a temperature 45° or more lower than the crystallization temperature Tx of the Co-Nb-Zr amorphous magnetic film. A magnetic head according to scope 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28552685A JPS62145511A (en) | 1985-12-20 | 1985-12-20 | magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28552685A JPS62145511A (en) | 1985-12-20 | 1985-12-20 | magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62145511A true JPS62145511A (en) | 1987-06-29 |
Family
ID=17692669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28552685A Pending JPS62145511A (en) | 1985-12-20 | 1985-12-20 | magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62145511A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0254407A (en) * | 1988-08-18 | 1990-02-23 | Nec Kansai Ltd | Production of magnetic head |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59207415A (en) * | 1983-05-11 | 1984-11-24 | Hitachi Ltd | Compound magnetic head and its preparation |
| JPS60205808A (en) * | 1984-03-29 | 1985-10-17 | Sony Corp | Magnetic head |
| JPS61172203A (en) * | 1985-01-26 | 1986-08-02 | Sony Corp | Magnetic head |
-
1985
- 1985-12-20 JP JP28552685A patent/JPS62145511A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59207415A (en) * | 1983-05-11 | 1984-11-24 | Hitachi Ltd | Compound magnetic head and its preparation |
| JPS60205808A (en) * | 1984-03-29 | 1985-10-17 | Sony Corp | Magnetic head |
| JPS61172203A (en) * | 1985-01-26 | 1986-08-02 | Sony Corp | Magnetic head |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0254407A (en) * | 1988-08-18 | 1990-02-23 | Nec Kansai Ltd | Production of magnetic head |
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