JPS6158818A - Silica glass manufacturing method - Google Patents
Silica glass manufacturing methodInfo
- Publication number
- JPS6158818A JPS6158818A JP17781984A JP17781984A JPS6158818A JP S6158818 A JPS6158818 A JP S6158818A JP 17781984 A JP17781984 A JP 17781984A JP 17781984 A JP17781984 A JP 17781984A JP S6158818 A JPS6158818 A JP S6158818A
- Authority
- JP
- Japan
- Prior art keywords
- sol
- centrifugation
- quartz glass
- viscosity
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 19
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000005119 centrifugation Methods 0.000 claims description 19
- 239000002245 particle Substances 0.000 claims description 14
- 238000002360 preparation method Methods 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- -1 alkyl silicate Chemical compound 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- 238000003980 solgel method Methods 0.000 claims description 3
- 239000011521 glass Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- 239000002612 dispersion medium Substances 0.000 description 4
- 239000000499 gel Substances 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000003872 anastomosis Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ゾル−ゲル法による石英ガラスの製造方法に
関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing quartz glass by a sol-gel method.
従来の、アルキルシリケートおよび微粉末シリカを主原
料として用いるゾル−ゲル法による石英ガラス製造にお
いては、ゾA/ill製の際、工程中ニ遠心分離処理が
無いかあるいは、含まれていてもその際のゾルの状態を
特に考慮していなかった。In the conventional quartz glass production using the sol-gel method using alkyl silicate and finely powdered silica as the main raw materials, there is no centrifugation treatment during the process, or even if it is included, there is no centrifugation treatment during the process. No particular consideration was given to the state of the sol at that time.
しかし、前述の従来技術では、ゾル調製工程中遠心分離
処理が無い場合、該ゾル中に分散不充分でi集している
大粒子および不純物含有量の多い大粒子が残存し、これ
が焼結後のガラス中の異物(結晶、気泡など)の原因と
なる。また、遠心分離をした場合でも、遠心分離の際の
ゾル状態を考慮していないため、分離効率が悪く処理後
のゾル状態が一定でなく、後工程の焼結条件が定まらな
いなどの問題点を有する。However, in the above-mentioned conventional technology, if there is no centrifugation treatment during the sol preparation process, large particles with insufficient dispersion and agglomeration and large particles with high impurity content remain in the sol, and these particles remain after sintering. may cause foreign matter (crystals, bubbles, etc.) in the glass. Furthermore, even if centrifugation is used, the sol state during centrifugation is not taken into consideration, resulting in problems such as poor separation efficiency and uneven sol state after treatment, making it difficult to determine the sintering conditions for the post-process. has.
そこで本発明は、このような問題点を解決するもので、
その目的とするところは、調製ゾル中から、焼結後のガ
ラス中の異物の原因となる凝集した粒子および不純吻合
有毒の多い大粒子をより効果率的に除去、しかも、処理
後のゾル状態が一定となるような遠心分離処理法を提供
するところにある。Therefore, the present invention aims to solve these problems.
The purpose of this is to more effectively remove agglomerated particles that cause foreign matter in the glass after sintering and large particles that are highly toxic to anastomoses from the prepared sol, and to improve the sol state after treatment. The object of the present invention is to provide a centrifugal separation method that keeps the amount constant.
本発明の遠心分離工程は、遠心分離工程前および工程中
のゾルの状態を限定するものであり・■ゾルの遠心分離
をゾル温度1・r3〜501に保持した状態で行なう、
■ゾル温度を10〜50℃に保持した際、該ゾルの粘度
が10o七ンチボアズ以下である、■遠心分離工程前の
ゾル中に1μm以上の粒子力;ない、以上■〜■を特徴
とする心〔作 用〕
遠心分離により分離可能な粒子径は、回転数、回転半径
、沈降距離、粒子密度、分散媒密度、分散媒粘度、およ
び時間によって決まる。これらの因子中、分散媒粘度す
なわちゾルの粘度は・温度や、エチルシリケートの加水
分解溶液中の5t(oH)+の集合度により変わる0他
の因子は、−律に限定できるが、分散媒粘度だけは、温
度、重合度の影響を受けるため限定が困難である。そこ
で本発明においては温度範囲を設定することにより、重
合度ならびに分散媒粘度が一定になる0まだ、遠心分離
前の分散工程により1μ濯以上の粒子が存在しないよう
な分散状態とすることにより、ゾル中の微粉末シリカ濃
度を一定にするものである。The centrifugation step of the present invention limits the state of the sol before and during the centrifugation step. ・Centrifugation of the sol is carried out while maintaining the sol temperature at 1.r3 to 501.
■ When the sol temperature is maintained at 10 to 50°C, the viscosity of the sol is 10°C or less, ■ There is no particle force of 1 μm or more in the sol before the centrifugation process. Effect: The particle diameter that can be separated by centrifugation is determined by the rotation speed, radius of rotation, sedimentation distance, particle density, dispersion medium density, dispersion medium viscosity, and time. Among these factors, the viscosity of the dispersion medium, that is, the viscosity of the sol, varies depending on the temperature and the degree of aggregation of 5t(oH)+ in the hydrolyzed solution of ethyl silicate. Viscosity alone is difficult to limit because it is affected by temperature and degree of polymerization. Therefore, in the present invention, by setting the temperature range, the degree of polymerization and the viscosity of the dispersion medium are kept constant.However, by the dispersion process before centrifugation, a dispersed state is created in which no particles larger than 1 μm are present. This is to keep the concentration of fine powdered silica in the sol constant.
市販のエチルシリケート(Si(OKg)、)330t
nfLと0.02NH01155mKとを混合し、激し
く攪拌すると加水分解反応により30分間はどで均一透
明な溶液となった。さらにH,o i 5smAを該溶
液に加えると初期には白濁したものの20分程度の攪拌
で均一透明化した。該溶液に微粉末シリカ(商品名:ア
エロジル0X5QCDaqq%j4社))112.5f
を添加し、攪拌2〜3時間、超音波照射(攪拌併用)2
〜5時間を行ない外見は均一な白色ゾルとなった。ここ
での超音波照射は該ゾル中の1μ情以上の粒子がなくな
るまで適宜2〜5時間行なった。な訃粒度分布測定装置
を用いた。あるいは、上記の原料を同時に混合し、同様
の散散処理を行なった場合にも、同様の白色ゾルが調製
できた。Commercially available ethyl silicate (Si (OKg),) 330t
When nfL and 0.02NH01155mK were mixed and stirred vigorously, a homogeneous and transparent solution was formed within 30 minutes due to a hydrolysis reaction. Further, when H, o i 5smA was added to the solution, the solution initially became cloudy, but became uniformly transparent after stirring for about 20 minutes. 112.5f of finely powdered silica (trade name: Aerosil 0X5QCDaqq%j4 Company) was added to the solution.
Added, stirred for 2 to 3 hours, and irradiated with ultrasonic waves (combined with stirring) 2
After 5 hours, the appearance became a uniform white sol. The ultrasonic irradiation was carried out for 2 to 5 hours until there were no particles larger than 1 μm in the sol. A particle size distribution measuring device was used. Alternatively, a similar white sol could be prepared by mixing the above raw materials at the same time and performing the same dispersion treatment.
以上のようにして調製したゾルの温度を下表のように調
節し、次工程の遠心分離を行なった〇前表を見るとわか
るように、ゾルの粘度の温度依存性は、顕著ではない。The temperature of the sol prepared as described above was adjusted as shown in the table below, and the next step of centrifugation was carried out. As can be seen from the table above, the temperature dependence of the viscosity of the sol is not significant.
これは、ゾル中の81(OH)4の暉水縮重合反応の進
行程度がゾルの粘性に大きな影響を及ぼすためであり、
遠心分離工程に至るまでのゾル調製時間、熱履歴などに
より重合度が異なる。したがって、ゾル温度が等しくて
も粘性に大きな差が生じることになる。なお遠心分離条
件は回転数500 Orpm時間20分として行った遠
心分離後、各ゾルに0.1Nアンモニア水を攪拌しなが
ら滴下し、pH値を3〜5に調整した。これらのゾルを
それぞれ、大きさ36X2ax12cc+n)のポリプ
ロピレン製の容器に6001投入し、フタをして密閉状
思にてゲル化させた。各ゾルのゲル化後、収縮が始まっ
た時点で、容器の7タを乾燥速度調節のため、穴あきの
所定の開孔率のものに変え、乾燥機に入れ、室温から昇
温速度5℃/hrで60℃〜80°0にし、以降この温
度で収縮乾燥させ、7〜10日間で、遠心分離時の条件
により多少異なるが、大きさく 24.5〜25.5
)X (18,5〜20.0 ) X (0,35〜o
、 s s )〔Cm’:lの乾燥ゲルを得た、これら
の乾燥ゲルを焼結炉に投入し、所定の昇温方法により加
熱焼結し1300℃(5〜120分)にて透明な大きさ
く1a、o 〜19o)x(14,o 〜1s、o)x
(o、so 〜0.〜50)〔cm〕重量1757前後
のガラス体を得た〇次表に各サンプル毎に、焼結時間(
透明化するまでの1300℃保持時間)、ガラス内部の
欠陥(結晶、ゴミ、気泡)を示す。この表かられかるよ
うに・遠心処理条件によりかなり大きな差が生じること
がわかるが、本発明の処理条件内のものについてはほぼ
、焼結時間が一定でしかも高品質な同レベルのガラスか
得られた。これらのガラスに関する諸物性分析の結果は
どのサブプルについても、ビッカース硬度800す/賜
2、比重2.2、赤外吸収スペクトル、近赤外吸収スペ
クトル1および屈折率など溶融石英ガラスと一致した。This is because the degree of progress of the hydrocondensation reaction of 81(OH)4 in the sol has a large effect on the viscosity of the sol.
The degree of polymerization varies depending on the sol preparation time and thermal history up to the centrifugation step. Therefore, even if the sol temperatures are the same, there will be a large difference in viscosity. The centrifugation conditions were 500 rpm and 20 minutes. After centrifugation, 0.1N ammonia water was added dropwise to each sol while stirring, and the pH value was adjusted to 3 to 5. Each of these sols was put into a polypropylene container 6001 having a size of 36 x 2 ax 12 cc + n), and the container was covered with a lid to form a gel in an airtight state. After gelation of each sol, at the point when it starts to shrink, the container is changed to one with holes of a predetermined porosity in order to adjust the drying speed, and placed in a dryer at a heating rate of 5°C / hr to 60°C to 80°0, then shrink and dry at this temperature for 7 to 10 days, depending on the conditions during centrifugation, but the size will increase to 24.5 to 25.5.
)X (18,5~20.0)X (0,35~o
, s s ) [Cm':L dry gels were obtained. These dried gels were put into a sintering furnace, heated and sintered using a prescribed heating method, and heated to 1300°C (5 to 120 minutes) to form a transparent gel. Size 1a, o ~ 19o) x (14, o ~ 1s, o) x
(o, so ~0.~50) [cm] A glass body with a weight of around 1757 was obtained. The following table shows the sintering time (
(holding time at 1300°C until it becomes transparent) and defects inside the glass (crystals, dust, bubbles). As can be seen from this table, it can be seen that there are quite large differences depending on the centrifugal processing conditions, but under the processing conditions of the present invention, the sintering time is constant and glass of the same level of high quality can be obtained. It was done. The results of various physical property analyzes regarding these glasses were consistent with fused silica glass, including Vickers hardness of 800 S/2, specific gravity of 2.2, infrared absorption spectrum, near-infrared absorption spectrum of 1, and refractive index for all sub-pulls.
このようにして、本発明により製造される石英ガラスは
、ゾル調製工程中の遠心処理の際のゾル状態を限定する
ことにより、調製ゾル中から、焼結後のガラス中の異物
の原因となる凝集大粒子および不純物含有量の多い大粒
子が効率的に除宍でき、処理後のゾル状態もほぼ一定で
あることにより、安定した品質でしかも高水準なガラス
である。In this way, by limiting the sol state during centrifugation during the sol preparation process, the quartz glass produced according to the present invention can be prevented from causing foreign matter in the prepared sol and in the glass after sintering. Large agglomerated particles and large particles with a high impurity content can be efficiently removed, and the sol state after treatment remains almost constant, resulting in a glass of stable quality and of a high standard.
また、溶融法などに比べ、かなり低コストで製造できる
など曳大きな利点を有する。したがって、これまで石英
ガラスを使用していた分野ではもちろんのこと、品質的
にも、高純度、欠陥が少ないなど良好な石英ガラスが容
易に製造可能であることから、工0用フォトマスク基板
、光フアイバー用母材など、種々の分野に応用が広がる
ものと考える。Additionally, it has the great advantage of being able to be manufactured at considerably lower cost than the melting method. Therefore, not only in fields where quartz glass has been used up until now, but also in terms of quality, as quartz glass with high purity and few defects can be easily manufactured, photomask substrates for process 0, We believe that its application will expand to a variety of fields, including as base materials for optical fibers.
Claims (3)
として用いるゾル−ゲル法による石英ガラスの製造にお
いて、ゾル調製工程中、該ゾルの遠心分離を、ゾル温度
10〜50℃に保持した状態で行なうことを特徴とする
石英ガラスの製造方法。(1) In the production of quartz glass by the sol-gel method using alkyl silicate and finely powdered silica as the main raw materials, centrifugation of the sol is performed while maintaining the sol temperature at 10 to 50°C during the sol preparation process. A method for producing quartz glass characterized by:
度が100センチポアズ以下であることを特徴ちする特
許請求の範囲第1項記載の石英ガラスの製造方法。(2) The method for producing quartz glass according to claim 1, wherein the viscosity of the sol is 100 centipoise or less when the sol temperature is maintained at 10 to 50°C.
状態であることを特徴とする特許請求の範囲第2項記載
の石英ガラスの製造方法。(3) The method for producing quartz glass according to claim 2, wherein the sol before centrifugation contains no particles of 1 μm or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17781984A JPS6158818A (en) | 1984-08-27 | 1984-08-27 | Silica glass manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17781984A JPS6158818A (en) | 1984-08-27 | 1984-08-27 | Silica glass manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6158818A true JPS6158818A (en) | 1986-03-26 |
Family
ID=16037651
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17781984A Pending JPS6158818A (en) | 1984-08-27 | 1984-08-27 | Silica glass manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6158818A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62246827A (en) * | 1986-04-16 | 1987-10-28 | Seiko Epson Corp | Production of glass |
-
1984
- 1984-08-27 JP JP17781984A patent/JPS6158818A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62246827A (en) * | 1986-04-16 | 1987-10-28 | Seiko Epson Corp | Production of glass |
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