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JPS615554A - Substrate for mounting semiconductor element - Google Patents

Substrate for mounting semiconductor element

Info

Publication number
JPS615554A
JPS615554A JP59126731A JP12673184A JPS615554A JP S615554 A JPS615554 A JP S615554A JP 59126731 A JP59126731 A JP 59126731A JP 12673184 A JP12673184 A JP 12673184A JP S615554 A JPS615554 A JP S615554A
Authority
JP
Japan
Prior art keywords
semiconductor element
sheet
conductive pattern
semiconductor
silicon nitride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59126731A
Other languages
Japanese (ja)
Inventor
Yoichi Hagiwara
洋一 萩原
Kenichi Shimizu
憲一 清水
Satoshi Tanaka
智 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP59126731A priority Critical patent/JPS615554A/en
Publication of JPS615554A publication Critical patent/JPS615554A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/15Ceramic or glass substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Die Bonding (AREA)

Abstract

PURPOSE:To mount a semiconductor element securely while preventing any crack or breakage due to thermal stress from happening while making the element operate normally and stably for a long time by a method wherein a section placing or containing the semiconductor element is composed of silicon nitride sintered body with thermal expansion coefficient similar to that of the semiconductor element. CONSTITUTION:A sludge comprising silicon nitride powder added with sintering assistant and bonding agent is formed into a sheet. Within such a sheet, an empty space to form a cavity 4 containing semiconductor element 2 as well as a leading hole to lead a conductive pattern 5 from the cavity 4 on a base 3 to the bottom of base 3 are formed and then a conductive pattern 5 to connect the surface of sheet formed of the leading hole and the conductive hole to the semiconductor element 2 and external lead terminals 6 is formed. Next the sheet is laminated to hold the conductive pattern 5 formed on the surface between itself being fixed by thermal pressure to be cut and separated into multiple pairs of packages 1 and further baked to sinter into one body. Finally the external lead terminals 6 made of Koval, etc. are brazed using silver wax material, etc.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は半導体素子実装用基板嘉こ関し、特にシリコン
単結晶等により構成される半導体素子を、載置、収納す
る多層配線基板や半導体パッケージ等の半導体素子実装
用基板番こ関する。
[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to substrates for mounting semiconductor elements, and in particular to multilayer wiring boards and semiconductor packages on which semiconductor elements made of single crystal silicon or the like are mounted and housed. Related to substrate numbers for mounting semiconductor elements such as.

〈発明の背景〉 近時、シリコン単結晶等により構成される半導体素子、
特に集積回路素子は、メモリー容量の増大や回路要素の
高集積化に伴ない形状が大形化するとともに作動時に発
生する熱量も、増大する傾向にある。そのため、これら
半導体素子を載置、収納する半導体素子実装用基板は電
気絶縁性に優れかつ機械的強度が大であることは勿論、
半導体素子と熱膨張率が近似した材料で構成されること
が要求されて&−る。
<Background of the Invention> Recently, semiconductor devices made of silicon single crystal, etc.
In particular, integrated circuit elements tend to become larger in size as memory capacity increases and circuit elements become more highly integrated, and the amount of heat generated during operation also tends to increase. Therefore, the semiconductor element mounting substrates on which these semiconductor elements are mounted and housed need to have excellent electrical insulation and high mechanical strength.
It is required that the semiconductor device be made of a material having a coefficient of thermal expansion similar to that of the semiconductor element.

〈従来の技術及び発明が解決しようとする問題点〉従来
、周知のように酸化アルミニウム(アルミナ; AJs
Oa)は電気絶縁性に優れかつ機械的強度が    大
であることから半導体素子を載置、収納する半導体素子
実装用基板の材料として多用されている。
<Problems to be solved by the prior art and the invention> As is well known, aluminum oxide (alumina; AJs
Oa) has excellent electrical insulation properties and high mechanical strength, so it is often used as a material for semiconductor element mounting substrates on which semiconductor elements are placed and housed.

しかし乍ら、このアルミナ(Al2O5)は熱膨張係数
が7〜7.5 X 110−6K’であり、半導体素子
を構成するシリコン単結晶の熱膨張係数3〜3.5X1
0K とは大きく相違している。そのためアルミナから
成る半導体素子実装用基板上番こ形成された各電気配線
パターン上に1.それに対応する半導体素子の各電極を
接続ムるように両者をロウ材等、の接着部材により接合
する場合、ロウ材を溶融させる熱によって実装用基板の
方が半導体素子より太きく膨張し、半導体素子の各電極
と実装基板に形成した電気配線パターンとの間に位置づ
れを生じ、半導体素子の各電極を実装用基板の各電気配
線パターンに適確に接続させることができないという欠
点があり、このことは特に高密度の配線パターンを有す
る実装用基板に顕著である。
However, this alumina (Al2O5) has a thermal expansion coefficient of 7 to 7.5 x 110-6 K', and a thermal expansion coefficient of 3 to 3.5 x 1 of the silicon single crystal that constitutes the semiconductor element.
It is very different from 0K. Therefore, 1. When joining each electrode of a corresponding semiconductor element using an adhesive material such as a brazing material, the mounting board expands more than the semiconductor element due to the heat that melts the brazing material. There is a disadvantage that positional misalignment occurs between each electrode of the element and the electrical wiring pattern formed on the mounting board, and it is not possible to properly connect each electrode of the semiconductor element to each electrical wiring pattern of the mounting board. This is particularly noticeable in mounting substrates having high-density wiring patterns.

また半導体素子を実装用基板に実装後、作動させる場合
、半導体素子が発生する熱によって実装用基板と半導体
素子との接合部に両者の熱膨張係数の相違に起因する熱
応力が発生し一該熱応カfこよって半導体素子が破壊し
たり、クラックを発生したりして半導体素子を正常にか
つ安定に作動させることができないという欠点もある。
Furthermore, when operating a semiconductor element after mounting it on a mounting board, the heat generated by the semiconductor element generates thermal stress at the joint between the mounting board and the semiconductor element due to the difference in coefficient of thermal expansion between the two. There is also the disadvantage that the semiconductor element may be destroyed or cracked due to thermal stress, making it impossible to operate the semiconductor element normally and stably.

〈発明の目的〉 本発明は上記欠点に鑑み案出されたものであり、その目
的は半導体素子の各電極と半導体素子実装用基板に形成
した電気配線パターンとの接続を確実となすとともに、
半導体素子に印加される熱応力を極小とし半導体素子で
のクラック発生や破壊を皆無として半導体素子を常に正
常かつ安定に作動させることができる半導体素子実装用
基板を提供することにある。
<Object of the Invention> The present invention has been devised in view of the above-mentioned drawbacks, and its purpose is to ensure the connection between each electrode of a semiconductor element and an electrical wiring pattern formed on a substrate for mounting a semiconductor element, and to
To provide a substrate for mounting a semiconductor element, which minimizes the thermal stress applied to the semiconductor element, eliminates cracking or destruction of the semiconductor element, and allows the semiconductor element to always operate normally and stably.

く問題点を解決するための手段〉 本発明の半導体素子実装用基板は少なくとも半導体素子
が載置、収納される部位を窒化珪素質焼結体で構成した
ことを特徴とする。
Means for Solving Problems> The substrate for mounting a semiconductor element of the present invention is characterized in that at least a portion on which a semiconductor element is placed and housed is made of a silicon nitride sintered body.

〈作用〉 以下、本発明の半導体素子実装用基板を添付の第1図及
び第2図に基づき詳細に説明する。
<Function> Hereinafter, the semiconductor element mounting substrate of the present invention will be explained in detail based on the attached FIGS. 1 and 2.

第1図は、本発明の半導体素子実装用基板を半導体素子
を収納する半導体パッケージに適用した場合の解放斜視
図を示し、1は半導体パッケージ1.2はシリコン単結
晶等により構成される半導体素子である。前記半導体パ
ッケージ1は窒化珪素質焼結体より成り、パッケージの
主要部を構成する台座3の略中央部に半導体素子2を取
着固定するためのキャビティ4が設けられている。
FIG. 1 shows an open perspective view when the semiconductor element mounting substrate of the present invention is applied to a semiconductor package that houses a semiconductor element, in which 1 is a semiconductor package 1, 2 is a semiconductor element made of silicon single crystal, etc. It is. The semiconductor package 1 is made of a silicon nitride sintered body, and is provided with a cavity 4 for mounting and fixing a semiconductor element 2 approximately in the center of a pedestal 3 that constitutes the main part of the package.

前記半導体素子2の各電極(不図示)は台座3中に埋設
された導電パターンの一部露出部5にロウ材等の接着部
材を介してダイボンドされ、該導電パターン5が底面に
まで延在し七設けられた終   一端に外部リード端子
6がロウ材されて各々の導出    1端子を構成して
いる。
Each electrode (not shown) of the semiconductor element 2 is die-bonded to a partially exposed portion 5 of a conductive pattern buried in the pedestal 3 via an adhesive material such as brazing material, and the conductive pattern 5 extends to the bottom surface. An external lead terminal 6 is soldered to one end of each of the terminals provided, thereby forming one lead-out terminal.

前記台座3の上面にはキャビティ4を閉蓋する如く蓋部
材7が銀ロウ材、ガラス、樹脂等薔こより溶着され、キ
ャビティ4中と外気とが気密状iに封止されて半導体装
置となる。
A lid member 7 is welded to the top surface of the pedestal 3 using silver brazing material, glass, resin, etc. to close the cavity 4, and the inside of the cavity 4 is hermetically sealed from the outside air to form a semiconductor device. .

本発明によれば、半導体素子2′がダイ゛ボンドされる
台座3′がシリコン単結晶の熱膨張係数(3,0〜3.
5 X 10−’に−1)と極めて近似した熱膨張係数
(2,6〜3.3X10  K  )を有する窒化珪素
質焼結□体で構成されている。したがって半導体素子2
を半導体パフケージ1のキャビティ4に□ロウ材する場
合あるいは半導体素子2を作動させる場合において、半
導体素子2及び半導体パフケージ1の台座3にロウ材の
溶融熱や半導体素子自身が発する熱が印加されたとして
も半導体素子2と台座3の熱膨張係数が極めて近似して
いることから両者の熱膨張の量は略同−となり、半導体
素子2の各電′極は台座3に形成した導電パターン5に
位置ずれ゛を生じることなく適確に接続させることがで
きる。
According to the present invention, the pedestal 3' to which the semiconductor element 2' is die-bonded has a thermal expansion coefficient of silicon single crystal (3.0 to 3.0.
It is composed of a silicon nitride sintered body having a coefficient of thermal expansion (2.6 to 3.3 x 10 K) extremely close to 5 x 10-' (-1). Therefore, semiconductor element 2
When soldering □ into the cavity 4 of the semiconductor puff cage 1 or when operating the semiconductor element 2, the melting heat of the brazing material or the heat generated by the semiconductor element itself is applied to the semiconductor element 2 and the pedestal 3 of the semiconductor puff cage 1. However, since the thermal expansion coefficients of the semiconductor element 2 and the pedestal 3 are very similar, the amount of thermal expansion of both is approximately the same, and each electrode of the semiconductor element 2 is connected to the conductive pattern 5 formed on the pedestal 3. Proper connection can be achieved without causing positional deviation.

また同時に両者間に発生する熱膨張差に起因する熱応力
も極小となって半導体素子に詔けるクラックの発生や破
壊も壺無となすことができ半導体素子を正常かつ安定に
作動させることが可能となる。
At the same time, the thermal stress caused by the difference in thermal expansion between the two is minimized, eliminating the possibility of cracking or breaking the semiconductor element, allowing the semiconductor element to operate normally and stably. becomes.

尚、台座3を構成する窒化珪素質焼結体は体積抵抗率が
1014Q−011以上で極めて電気絶縁性に優れてぶ
り、かつ誘電率(IMHz)(窒化珪素8ニア素0.0
32 :アルミナ0.04 )及び機械的強度等の点に
セいてもアルミナとほぼ同等、あるいはそれ以上の優れ
た特性を有していることから、半導体素子実装用基板の
材料として極めて好適である。
The silicon nitride sintered body constituting the pedestal 3 has a volume resistivity of 1014Q-011 or more, which shows extremely excellent electrical insulation, and a dielectric constant (IMHz) (silicon nitride 8 N 0.0
32: Alumina 0.04) and has excellent properties that are almost equal to or better than alumina in terms of mechanical strength, etc., so it is extremely suitable as a material for semiconductor device mounting substrates. .

〈実施例〉 次に窒化珪素質焼結体から成る半導体パッケージの製造
方法を以下に詳述する。
<Example> Next, a method for manufacturing a semiconductor package made of a silicon nitride sintered body will be described in detail below.

まず、平均粒子径を10μm以下に精製した窒化珪素粉
末にマグネシア(MgO)、ベリリア(Bed)、アル
ミナ(AJ!!03)等の焼結助剤及びポリメチルメタ
クリレートやポリビニルブチラール等の結合剤を添加し
て泥漿物と成すとともIここれを従来周知のドクターブ
レード法を採用することにより複数枚のシート状に成形
する。
First, sintering aids such as magnesia (MgO), beryllia (Bed), and alumina (AJ!!03) and binders such as polymethyl methacrylate and polyvinyl butyral are added to silicon nitride powder refined to an average particle size of 10 μm or less. This is added to form a slurry, which is then formed into a plurality of sheets by employing a conventionally well-known doctor blade method.

次に、前記シートに半導体素子2を収納するキャビティ
部4を形成するための空所及び導電パターンを台座3の
キャビティ部4から台座3底面に導出するための導通孔
をそれぞれ従来周知の打抜加工法により形成し、導通孔
を形成したシートの表面及び導通孔内に半導体素子2と
外部リード端子6を接続するための導電パターン5を形
成する。
Next, a cavity for forming a cavity portion 4 for housing the semiconductor element 2 and a conductive hole for leading out the conductive pattern from the cavity portion 4 of the pedestal 3 to the bottom surface of the pedestal 3 are each punched out using a conventional well-known method. A conductive pattern 5 for connecting the semiconductor element 2 and the external lead terminal 6 is formed on the surface of the sheet formed by a processing method and in the conductive hole.

尚、導電パターン5はタングステン(ロ)やモリブデン
(MO)等の高融点金属粉末に有機バインダー及び溶剤
を添加してペースト状となしたものを例えばスクリーン
印刷法等により印刷塗布することによってシート上に形
成される。
The conductive pattern 5 is formed on a sheet by applying a paste made by adding an organic binder and a solvent to high melting point metal powder such as tungsten (B) or molybdenum (MO) using, for example, a screen printing method. is formed.

そして次膠こ前記シートを表面に形成した導電パターン
5がシート間に挾持されるように積層し、約50〜15
0℃の温度で熱圧着するとともに複数組のパッケージ形
状に切断分離して非酸化雰囲気巾約1300℃〜160
0℃の温度で焼成することによって焼結一体化し、最后
にコーパルや42 A11ay等から成る外部リード端
子6を銀ロウ材等憂こよりロウ付けすることによって完
成する。
Next, the conductive pattern 5 formed on the surface of the glue sheet is laminated so as to be sandwiched between the sheets.
Thermocompression bonded at a temperature of 0℃, cut and separated into multiple package shapes, and non-oxidizing atmosphere width of approximately 1300℃~160℃
They are sintered and integrated by firing at a temperature of 0° C., and finally, the external lead terminals 6 made of copal, 42 A11ay, or the like are soldered with silver brazing material or the like.

尚、本発明においては第2図に示すように、半導体パフ
ケージ1の台座3として半導体素子2が載置される板材
8部のみを窒化珪素で形成し、空所を設けたシート9を
窒化珪素以外の部材で形成しておくことも可能であり、
前述した構成と同一の作用を奏することは当業者には容
易に理解されよう。
In the present invention, as shown in FIG. 2, only the plate 8 portion on which the semiconductor element 2 is placed as the pedestal 3 of the semiconductor puff cage 1 is made of silicon nitride, and the sheet 9 with the void space is made of silicon nitride. It is also possible to form it with other materials,
Those skilled in the art will easily understand that this configuration has the same effect as the configuration described above.

〈発明の効果〉 かくして本発明の半導体素子実装用基板によれば、少な
くとも半導体素子が載置、収納される部位を半導体素子
と熱膨゛張係数が近似した窒化珪素質焼結体で構成した
ことにより、半導体素子の装着時や作動時に半導体素子
と半導体素子実装用基板が加熱されたとしても半導体素
子を実装用基板の所定位置に確実に実装することができ
るとともに半導体素子の熱応力によるクラックや破壊の
発生を皆無として半導体素子を長期間にわたり正常かつ
安定に作動させることが可能である。       ′
<Effects of the Invention> Thus, according to the semiconductor element mounting substrate of the present invention, at least the portion where the semiconductor element is placed and housed is made of a silicon nitride sintered body having a coefficient of thermal expansion similar to that of the semiconductor element. As a result, even if the semiconductor element and the semiconductor element mounting substrate are heated during mounting or operation of the semiconductor element, the semiconductor element can be reliably mounted in the specified position on the mounting substrate, and cracks due to thermal stress on the semiconductor element can be prevented. It is possible to operate the semiconductor device normally and stably for a long period of time without causing any damage or damage. ′

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の半導体パッケージの解放斜視図、第2
図は本発明の半導体パッケージの一部分解斜視図である
。 1・・・半導体パッケージ 2・・・半導体素子 3・・・台     座 4・・・キャビティ部 5・・・外部リード端子
FIG. 1 is an open perspective view of the semiconductor package of the present invention, and FIG.
The figure is a partially exploded perspective view of the semiconductor package of the present invention. 1... Semiconductor package 2... Semiconductor element 3... Pedestal 4... Cavity part 5... External lead terminal

Claims (1)

【特許請求の範囲】[Claims] 少なくとも半導体素子が載置、収納される部位を窒化珪
素質焼結体で構成したことを特徴とする半導体素子実装
用基板。
1. A substrate for mounting a semiconductor device, characterized in that at least a portion on which a semiconductor device is mounted and housed is made of a silicon nitride sintered body.
JP59126731A 1984-06-19 1984-06-19 Substrate for mounting semiconductor element Pending JPS615554A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59126731A JPS615554A (en) 1984-06-19 1984-06-19 Substrate for mounting semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59126731A JPS615554A (en) 1984-06-19 1984-06-19 Substrate for mounting semiconductor element

Publications (1)

Publication Number Publication Date
JPS615554A true JPS615554A (en) 1986-01-11

Family

ID=14942482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59126731A Pending JPS615554A (en) 1984-06-19 1984-06-19 Substrate for mounting semiconductor element

Country Status (1)

Country Link
JP (1) JPS615554A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03203256A (en) * 1989-12-29 1991-09-04 Ngk Spark Plug Co Ltd Silicon nitride package and its manufacture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03203256A (en) * 1989-12-29 1991-09-04 Ngk Spark Plug Co Ltd Silicon nitride package and its manufacture

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