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JPS61284037A - Sample board for ion milling - Google Patents

Sample board for ion milling

Info

Publication number
JPS61284037A
JPS61284037A JP60123679A JP12367985A JPS61284037A JP S61284037 A JPS61284037 A JP S61284037A JP 60123679 A JP60123679 A JP 60123679A JP 12367985 A JP12367985 A JP 12367985A JP S61284037 A JPS61284037 A JP S61284037A
Authority
JP
Japan
Prior art keywords
carbon
sample
electron
upper plate
ion milling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60123679A
Other languages
Japanese (ja)
Inventor
Yoshio Igarashi
芳夫 五十嵐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP60123679A priority Critical patent/JPS61284037A/en
Publication of JPS61284037A publication Critical patent/JPS61284037A/en
Pending legal-status Critical Current

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  • Sampling And Sample Adjustment (AREA)

Abstract

PURPOSE:To prevent spattering yield, by preparing a sample board made of carbon and a sample consisting of a composite of a metal whose outer surface is covered by carbon. CONSTITUTION:An upper plate 1 and a lower plate 2 of a sample board are combined by supports 3, a sample S is installed in a recessed hole 5 of the upper plate, and the whole surfaces of them are covered with carbon 6. Although carbon is attached on the sample by using carbon as the covering material, absorption of electron-rays is little and troubles of observation by a permeable electron microscope are few, since carbon is a lighter element than heavy metals such as molybdenum. Also, for the problem of electron-ray diffraction by the electron microscope or for the analysis problem such as the fluorescent X-ray analyzing, the presence of carbon can be ignored. furthermore, when the sample of an insulator is observed and analyzed, a preliminary process such as the vacuum evaporation of carbon or the like to prevent a charge up of electron- rays is unnecessary, since a thin carbon coating is already placed over the sample.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、透過電子顕微鏡用試料作成装置としてのイオ
ンミリング装置に用いられる、イオンミリング用試料台
(以下に試料台と略称す)に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an ion milling sample stand (hereinafter abbreviated as sample stand) used in an ion milling device as a sample preparation device for a transmission electron microscope. It is.

[従来の技術] イオンミリングはアルゴンガス又は他のガスをイオン化
し、これを試料に入射してスパッタリングにより試料を
薄くする方法である。試料を保持する試料台には、モリ
ブデン等のスパッタリングイールドし難い材料が用いら
れている。
[Prior Art] Ion milling is a method of ionizing argon gas or other gas, injecting it into a sample, and thinning the sample by sputtering. The sample stage that holds the sample is made of a material that is difficult to produce sputtering yield, such as molybdenum.

[発明が解決しようする問題点コ 試料台が、先に記述したモリブデン等の重金属で作られ
ていても、若干のスパッタリングイールドが生じて気散
し、加工中の試料面に付着して、電子顕微鏡による観察
や分析を阻害する。
[Problems to be Solved by the Invention] Even if the sample stage is made of heavy metals such as molybdenum as described above, some sputtering yield will occur and be scattered, adhering to the surface of the sample being processed and causing electron Obstructs microscopic observation and analysis.

本発明の目的は、スパッタリングイールドが生じ難く、
且つ観察や分析を阻害しない試料台を提供することであ
る。
The purpose of the present invention is to reduce the occurrence of sputtering yield,
Another object of the present invention is to provide a sample stage that does not hinder observation or analysis.

[問題点を解決するための手段] 本発明は、材料が炭素からなる試料台、及び材料が金属
の外表面に炭素を被覆した複合体からなるイオンミリン
グ用試料台である。
[Means for Solving the Problems] The present invention provides a sample stand made of carbon, and a sample stand for ion milling made of a composite material in which the outer surface of metal is coated with carbon.

本発明において、材料に炭素を用いることにより、スパ
ッタリングイールドを従来の金属よりも軽減することが
可能である。即ち、Arイオンの加速電圧400evに
おいて、炭素のスパッタリングイールドは、モリブデン
などにくらべ約115〜1/7と小さい。このことは、
イオンビームによる試料台の消耗がモリブデンなどにく
らべ少なく、寿命が従来より、約5〜7倍向上する。
In the present invention, by using carbon as a material, it is possible to reduce the sputtering yield compared to conventional metals. That is, at an acceleration voltage of 400 ev for Ar ions, the sputtering yield of carbon is about 115 to 1/7 smaller than that of molybdenum. This means that
The consumption of the sample stage by the ion beam is less than that of molybdenum, and the lifespan is approximately 5 to 7 times longer than that of conventional materials.

次いで、材料として炭素を用いた場合、試料面に炭素が
付着してもモリブデン等の重金属に比し軽元素であるた
め、電子線の吸収が少なく透過電子顕微鏡観察上の問題
が少ない。また、電子顕微鏡による電子線回折や螢光X
線分析等の分析上の問題も、炭素の存在は無視すること
ができる・さらに、絶縁物試料を観察9分析する場合は
、試料上に炭素が薄くコーティングされていることによ
り、電子線のチャージアップを防止するための炭素など
の真空蒸着等の前処理を施す必要がない。
Next, when carbon is used as a material, even if carbon adheres to the sample surface, since it is a lighter element than heavy metals such as molybdenum, it absorbs less electron beams and causes fewer problems in transmission electron microscopy. In addition, electron diffraction using an electron microscope and fluorescence
The presence of carbon can also be ignored when it comes to analytical problems such as beam analysis.Furthermore, when observing and analyzing insulator samples, the thin carbon coating on the sample prevents the charge of the electron beam. There is no need to perform pre-treatment such as vacuum deposition of carbon or the like to prevent build-up.

試料台を製造するに際し、炭素は加工性が良く製造上何
ら問題はない。ただし、試料台の取扱いにおいて破損す
ることを防止するために、金属製の試料台の全面に、炭
素を真空蒸着等の方法により被覆し、試料台を炭素と金
属の複合体にしてもよい。
When manufacturing a sample stage, carbon has good workability and there are no problems in manufacturing. However, in order to prevent the sample stand from being damaged during handling, the entire surface of the metal sample stand may be coated with carbon by a method such as vacuum evaporation, thereby making the sample stand a composite of carbon and metal.

[実施例〕 第1図は、炭素で製作した試料台の断面図を示す。上プ
レート1と下プレート2は、支柱3により連結されてい
る。試料Sは、上プレートのミゾ穴5に装着されている
[Example] FIG. 1 shows a cross-sectional view of a sample stage made of carbon. The upper plate 1 and the lower plate 2 are connected by a support 3. The sample S is mounted in the groove 5 of the upper plate.

第2図は、第1図に示す試料台の構成体の金属製試料台
において、その全面に炭素6を被覆した断面図を示し、
試料Sは上プレートのミゾ穴5に装着されている。
FIG. 2 shows a cross-sectional view of the metal sample stand of the sample stand structure shown in FIG. 1, the entire surface of which is coated with carbon 6,
The sample S is attached to the groove 5 of the upper plate.

第1図及び第2図の試料台をイオンミーリング装置に装
着し、アルゴンガスを用いてイオンミーリングした試料
を、電子顕微鏡による透過観察及び螢光X線分析に供し
た結果、観察面上には重金属の汚染はなく、元素分析に
おいても何ら支障なく用いることができた。
The sample stage shown in Figures 1 and 2 was attached to an ion milling device, and the sample, which had been ion milled using argon gas, was subjected to transmission observation and fluorescence X-ray analysis using an electron microscope. There was no heavy metal contamination and it could be used for elemental analysis without any problems.

[発明の効果] 本発明によれば、従来の重金属で製造されていた試料台
のスパッター粒子が試料面に付着することがなく、しか
も分析においてもスパッター粒子の妨害がなく、電子顕
微鏡による観察2分析が容易にしかも効率よく行うこと
ができる。
[Effects of the Invention] According to the present invention, the sputtered particles of the conventional sample stage made of heavy metals do not adhere to the sample surface, and there is no interference from the sputtered particles during analysis, making it easier to observe with an electron microscope. Analysis can be performed easily and efficiently.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、試料台は本発明の炭素を材料とする試料台の
一実施例を示す断面図、第2図は、本発明による金属を
材料とする試料台に、炭素を被覆した。一実施例を示す
断面図である。 1;上プレート  2:下プレート 3:支柱     4:ボルト 5;ミゾ穴    6;炭素被覆層 S;試料 祇痺ん  弁理士高石橘馬
FIG. 1 is a sectional view showing an embodiment of the sample stand made of carbon according to the present invention, and FIG. 2 is a sample stand made of metal according to the present invention coated with carbon. FIG. 3 is a cross-sectional view showing one embodiment. 1; Upper plate 2: Lower plate 3: Strut 4: Bolt 5; Groove hole 6; Carbon coating layer S; Sample Gina Patent attorney Tachibana Takaishi

Claims (1)

【特許請求の範囲】 1、少なくとも一部が、炭素材料から構成したことを特
徴とするイオンミリング用試料台。 2、金属材料の外表面に炭素を被覆した複合体材料から
構成したことを特徴とするイオンミリング用試料台。
[Claims] 1. A sample stage for ion milling, characterized in that at least a portion thereof is made of a carbon material. 2. A sample stand for ion milling, characterized in that it is made of a composite material in which the outer surface of a metal material is coated with carbon.
JP60123679A 1985-06-07 1985-06-07 Sample board for ion milling Pending JPS61284037A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60123679A JPS61284037A (en) 1985-06-07 1985-06-07 Sample board for ion milling

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60123679A JPS61284037A (en) 1985-06-07 1985-06-07 Sample board for ion milling

Publications (1)

Publication Number Publication Date
JPS61284037A true JPS61284037A (en) 1986-12-15

Family

ID=14866621

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60123679A Pending JPS61284037A (en) 1985-06-07 1985-06-07 Sample board for ion milling

Country Status (1)

Country Link
JP (1) JPS61284037A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006172958A (en) * 2004-12-17 2006-06-29 Hitachi High-Technologies Corp Focused ion beam processing apparatus and sample stage used therefor
WO2014208307A1 (en) * 2013-06-24 2014-12-31 株式会社日立ハイテクノロジーズ Ion milling device
US12224155B2 (en) 2019-12-24 2025-02-11 Hitachi High-Tech Corporation Ion milling device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006172958A (en) * 2004-12-17 2006-06-29 Hitachi High-Technologies Corp Focused ion beam processing apparatus and sample stage used therefor
WO2014208307A1 (en) * 2013-06-24 2014-12-31 株式会社日立ハイテクノロジーズ Ion milling device
US12224155B2 (en) 2019-12-24 2025-02-11 Hitachi High-Tech Corporation Ion milling device

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