JPS61284037A - Sample board for ion milling - Google Patents
Sample board for ion millingInfo
- Publication number
- JPS61284037A JPS61284037A JP60123679A JP12367985A JPS61284037A JP S61284037 A JPS61284037 A JP S61284037A JP 60123679 A JP60123679 A JP 60123679A JP 12367985 A JP12367985 A JP 12367985A JP S61284037 A JPS61284037 A JP S61284037A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- sample
- electron
- upper plate
- ion milling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000992 sputter etching Methods 0.000 title claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 27
- 239000002131 composite material Substances 0.000 claims abstract description 4
- 239000003575 carbonaceous material Substances 0.000 claims 1
- 239000007769 metal material Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 7
- 239000002184 metal Substances 0.000 abstract description 7
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract description 6
- 238000004458 analytical method Methods 0.000 abstract description 6
- 229910052750 molybdenum Inorganic materials 0.000 abstract description 6
- 239000011733 molybdenum Substances 0.000 abstract description 6
- 229910001385 heavy metal Inorganic materials 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 239000012212 insulator Substances 0.000 abstract description 2
- 238000007738 vacuum evaporation Methods 0.000 abstract description 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、透過電子顕微鏡用試料作成装置としてのイオ
ンミリング装置に用いられる、イオンミリング用試料台
(以下に試料台と略称す)に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an ion milling sample stand (hereinafter abbreviated as sample stand) used in an ion milling device as a sample preparation device for a transmission electron microscope. It is.
[従来の技術]
イオンミリングはアルゴンガス又は他のガスをイオン化
し、これを試料に入射してスパッタリングにより試料を
薄くする方法である。試料を保持する試料台には、モリ
ブデン等のスパッタリングイールドし難い材料が用いら
れている。[Prior Art] Ion milling is a method of ionizing argon gas or other gas, injecting it into a sample, and thinning the sample by sputtering. The sample stage that holds the sample is made of a material that is difficult to produce sputtering yield, such as molybdenum.
[発明が解決しようする問題点コ
試料台が、先に記述したモリブデン等の重金属で作られ
ていても、若干のスパッタリングイールドが生じて気散
し、加工中の試料面に付着して、電子顕微鏡による観察
や分析を阻害する。[Problems to be Solved by the Invention] Even if the sample stage is made of heavy metals such as molybdenum as described above, some sputtering yield will occur and be scattered, adhering to the surface of the sample being processed and causing electron Obstructs microscopic observation and analysis.
本発明の目的は、スパッタリングイールドが生じ難く、
且つ観察や分析を阻害しない試料台を提供することであ
る。The purpose of the present invention is to reduce the occurrence of sputtering yield,
Another object of the present invention is to provide a sample stage that does not hinder observation or analysis.
[問題点を解決するための手段]
本発明は、材料が炭素からなる試料台、及び材料が金属
の外表面に炭素を被覆した複合体からなるイオンミリン
グ用試料台である。[Means for Solving the Problems] The present invention provides a sample stand made of carbon, and a sample stand for ion milling made of a composite material in which the outer surface of metal is coated with carbon.
本発明において、材料に炭素を用いることにより、スパ
ッタリングイールドを従来の金属よりも軽減することが
可能である。即ち、Arイオンの加速電圧400evに
おいて、炭素のスパッタリングイールドは、モリブデン
などにくらべ約115〜1/7と小さい。このことは、
イオンビームによる試料台の消耗がモリブデンなどにく
らべ少なく、寿命が従来より、約5〜7倍向上する。In the present invention, by using carbon as a material, it is possible to reduce the sputtering yield compared to conventional metals. That is, at an acceleration voltage of 400 ev for Ar ions, the sputtering yield of carbon is about 115 to 1/7 smaller than that of molybdenum. This means that
The consumption of the sample stage by the ion beam is less than that of molybdenum, and the lifespan is approximately 5 to 7 times longer than that of conventional materials.
次いで、材料として炭素を用いた場合、試料面に炭素が
付着してもモリブデン等の重金属に比し軽元素であるた
め、電子線の吸収が少なく透過電子顕微鏡観察上の問題
が少ない。また、電子顕微鏡による電子線回折や螢光X
線分析等の分析上の問題も、炭素の存在は無視すること
ができる・さらに、絶縁物試料を観察9分析する場合は
、試料上に炭素が薄くコーティングされていることによ
り、電子線のチャージアップを防止するための炭素など
の真空蒸着等の前処理を施す必要がない。Next, when carbon is used as a material, even if carbon adheres to the sample surface, since it is a lighter element than heavy metals such as molybdenum, it absorbs less electron beams and causes fewer problems in transmission electron microscopy. In addition, electron diffraction using an electron microscope and fluorescence
The presence of carbon can also be ignored when it comes to analytical problems such as beam analysis.Furthermore, when observing and analyzing insulator samples, the thin carbon coating on the sample prevents the charge of the electron beam. There is no need to perform pre-treatment such as vacuum deposition of carbon or the like to prevent build-up.
試料台を製造するに際し、炭素は加工性が良く製造上何
ら問題はない。ただし、試料台の取扱いにおいて破損す
ることを防止するために、金属製の試料台の全面に、炭
素を真空蒸着等の方法により被覆し、試料台を炭素と金
属の複合体にしてもよい。When manufacturing a sample stage, carbon has good workability and there are no problems in manufacturing. However, in order to prevent the sample stand from being damaged during handling, the entire surface of the metal sample stand may be coated with carbon by a method such as vacuum evaporation, thereby making the sample stand a composite of carbon and metal.
[実施例〕
第1図は、炭素で製作した試料台の断面図を示す。上プ
レート1と下プレート2は、支柱3により連結されてい
る。試料Sは、上プレートのミゾ穴5に装着されている
。[Example] FIG. 1 shows a cross-sectional view of a sample stage made of carbon. The upper plate 1 and the lower plate 2 are connected by a support 3. The sample S is mounted in the groove 5 of the upper plate.
第2図は、第1図に示す試料台の構成体の金属製試料台
において、その全面に炭素6を被覆した断面図を示し、
試料Sは上プレートのミゾ穴5に装着されている。FIG. 2 shows a cross-sectional view of the metal sample stand of the sample stand structure shown in FIG. 1, the entire surface of which is coated with carbon 6,
The sample S is attached to the groove 5 of the upper plate.
第1図及び第2図の試料台をイオンミーリング装置に装
着し、アルゴンガスを用いてイオンミーリングした試料
を、電子顕微鏡による透過観察及び螢光X線分析に供し
た結果、観察面上には重金属の汚染はなく、元素分析に
おいても何ら支障なく用いることができた。The sample stage shown in Figures 1 and 2 was attached to an ion milling device, and the sample, which had been ion milled using argon gas, was subjected to transmission observation and fluorescence X-ray analysis using an electron microscope. There was no heavy metal contamination and it could be used for elemental analysis without any problems.
[発明の効果]
本発明によれば、従来の重金属で製造されていた試料台
のスパッター粒子が試料面に付着することがなく、しか
も分析においてもスパッター粒子の妨害がなく、電子顕
微鏡による観察2分析が容易にしかも効率よく行うこと
ができる。[Effects of the Invention] According to the present invention, the sputtered particles of the conventional sample stage made of heavy metals do not adhere to the sample surface, and there is no interference from the sputtered particles during analysis, making it easier to observe with an electron microscope. Analysis can be performed easily and efficiently.
第1図は、試料台は本発明の炭素を材料とする試料台の
一実施例を示す断面図、第2図は、本発明による金属を
材料とする試料台に、炭素を被覆した。一実施例を示す
断面図である。
1;上プレート 2:下プレート
3:支柱 4:ボルト
5;ミゾ穴 6;炭素被覆層
S;試料
祇痺ん 弁理士高石橘馬FIG. 1 is a sectional view showing an embodiment of the sample stand made of carbon according to the present invention, and FIG. 2 is a sample stand made of metal according to the present invention coated with carbon. FIG. 3 is a cross-sectional view showing one embodiment. 1; Upper plate 2: Lower plate 3: Strut 4: Bolt 5; Groove hole 6; Carbon coating layer S; Sample Gina Patent attorney Tachibana Takaishi
Claims (1)
徴とするイオンミリング用試料台。 2、金属材料の外表面に炭素を被覆した複合体材料から
構成したことを特徴とするイオンミリング用試料台。[Claims] 1. A sample stage for ion milling, characterized in that at least a portion thereof is made of a carbon material. 2. A sample stand for ion milling, characterized in that it is made of a composite material in which the outer surface of a metal material is coated with carbon.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60123679A JPS61284037A (en) | 1985-06-07 | 1985-06-07 | Sample board for ion milling |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60123679A JPS61284037A (en) | 1985-06-07 | 1985-06-07 | Sample board for ion milling |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61284037A true JPS61284037A (en) | 1986-12-15 |
Family
ID=14866621
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60123679A Pending JPS61284037A (en) | 1985-06-07 | 1985-06-07 | Sample board for ion milling |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61284037A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006172958A (en) * | 2004-12-17 | 2006-06-29 | Hitachi High-Technologies Corp | Focused ion beam processing apparatus and sample stage used therefor |
WO2014208307A1 (en) * | 2013-06-24 | 2014-12-31 | 株式会社日立ハイテクノロジーズ | Ion milling device |
US12224155B2 (en) | 2019-12-24 | 2025-02-11 | Hitachi High-Tech Corporation | Ion milling device |
-
1985
- 1985-06-07 JP JP60123679A patent/JPS61284037A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006172958A (en) * | 2004-12-17 | 2006-06-29 | Hitachi High-Technologies Corp | Focused ion beam processing apparatus and sample stage used therefor |
WO2014208307A1 (en) * | 2013-06-24 | 2014-12-31 | 株式会社日立ハイテクノロジーズ | Ion milling device |
US12224155B2 (en) | 2019-12-24 | 2025-02-11 | Hitachi High-Tech Corporation | Ion milling device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6188068B1 (en) | Methods of examining a specimen and of preparing a specimen for transmission microscopic examination | |
Phaneuf | Applications of focused ion beam microscopy to materials science specimens | |
US8011259B2 (en) | Sample carrier comprising a deformable strip of material folded back upon itself and sample holder | |
JP4628361B2 (en) | Method for preparing a sample for electron microscopy, sample support and transport holder used therefor | |
WO2011074178A1 (en) | Charged particle beam device and sample observation method | |
Li | The focused-ion-beam microscope—more than a precision ion milling machine | |
US20060017016A1 (en) | Method for the removal of a microscopic sample from a substrate | |
JPS61284037A (en) | Sample board for ion milling | |
JP2008122114A (en) | Method for preparing sample for atom probe analysis by FIB and apparatus for implementing the same | |
Li | Advanced techniques in TEM specimen preparation | |
US5563412A (en) | Method of making specimens for an electron microscope | |
Nomizu et al. | Electron microscopy of submicron particles in natural waters—Specimen preparation by centrifugation | |
Apkarian | Analysis of high quality monatomic chromium films used in biological high resolution scanning electron microscopy | |
EP1868225A1 (en) | Sample carrier and sample holder | |
US10741360B2 (en) | Method for producing a TEM sample | |
JP2004179038A (en) | Fixing method of sample for transmission electron microscope and sample table | |
Kupke et al. | Preparation of biological tissue sections for correlative ion, electron, and light microscopy | |
Fellah et al. | Comparative study of ion milling techniques for the preparation of ceramic fibers in transmission electron microscopy | |
JP2009192341A (en) | Preparation method of sliced sample for transmission electron microscope, and sample stand used therefor | |
EP1612836B1 (en) | Method for the removal of a microscopic sample from a substrate | |
Barna et al. | Simple method for the preparation of InP based samples for TEM investigation | |
JP3224625B2 (en) | Sample surface processing chip, manufacturing method thereof and sample surface processing apparatus | |
JP2024022515A (en) | Method for preparing specimens for transmission electron microscopy | |
JP2001242051A (en) | Sample stand for focused ion beam processing device and sample fixing method | |
Panitz et al. | A procedure for increasing the contrast of biological specimens in edge‐projection TEM |