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JPS61282910A - input device - Google Patents

input device

Info

Publication number
JPS61282910A
JPS61282910A JP60123603A JP12360385A JPS61282910A JP S61282910 A JPS61282910 A JP S61282910A JP 60123603 A JP60123603 A JP 60123603A JP 12360385 A JP12360385 A JP 12360385A JP S61282910 A JPS61282910 A JP S61282910A
Authority
JP
Japan
Prior art keywords
electrode
input
input device
potential gradient
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60123603A
Other languages
Japanese (ja)
Inventor
Kazufumi Matsuzawa
松澤 和文
Minoru Ikegami
稔 池上
Akihiro Hachiman
明宏 八幡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP60123603A priority Critical patent/JPS61282910A/en
Publication of JPS61282910A publication Critical patent/JPS61282910A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an input device of high precision by providing slits in an electrode for input along a potential gradient. CONSTITUTION:An electrode 2 for input is formed approximately uniformly on surfaces of a pair of substrates 1 for input, and the potential gradient is given in the direction crossing the electrode 2 for input, and slits 4 are provided along the potential gradient in the electrode for input. Thus, the position detection error due to ununiformity of electrode resistors on substrates is corrected to detect positions with high precision.

Description

【発明の詳細な説明】 〔発明の属する利用分野〕 本発明は、高精度の入力装置に閏すす。[Detailed description of the invention] [Field of application to which the invention pertains] The present invention is directed to a highly accurate input device.

〔従来の技術〕[Conventional technology]

従来のこの種装置は、入力装置上の押下点の位置を高精
度に検出する際、入力装置を構成している2枚の基板上
の電極の抵抗値が完全に均一であることが必要であった
。しかし、この基板上の電極の抵抗値を完全に均一にし
ようとするには、電極の膜厚を完全に一定することが必
要であるが、電極の製造上、これは実際には不可能であ
りた。
In conventional devices of this type, when detecting the position of a pressed point on an input device with high precision, it is necessary that the resistance values of the electrodes on the two substrates that make up the input device be completely uniform. there were. However, in order to make the resistance value of the electrodes on this substrate completely uniform, it is necessary to make the film thickness of the electrodes completely constant, but this is actually impossible due to the manufacturing of the electrodes. There was.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

よって、このような従来の入力装置にあっては、基板上
の電極の抵抗値を全面に渡って均一に形成する事ができ
ないため、押下点の位置を高精度に検出する事ができな
いという問題点があった。
Therefore, in such conventional input devices, the resistance value of the electrode on the board cannot be formed uniformly over the entire surface, so there is a problem that the position of the pressed point cannot be detected with high precision. There was a point.

本発明はこのような従来の問題点を解決するためになさ
れた・もので、基板上の電極の抵抗値が全面に渡って均
一でなくても、押下点の位置を高精度に検出できること
を目的としている。
The present invention was made to solve these conventional problems, and it is possible to detect the position of the pressed point with high accuracy even if the resistance value of the electrode on the substrate is not uniform over the entire surface. The purpose is

〔問題点を解決する手段〕[Means to solve problems]

表面にほぼ均一に電極を形成し、該電極の両端に電極端
子を有する2枚の基板を、前記電極面を対向するように
し、かつ前記電極端子を交差する方向に合わされた入力
装置を構成し、前記電極全面に切れ目を入れる事により
、前記電極端子間の抵抗値を変化させ、前記電極間の抵
抗均一性を向上させる。
An input device is constituted by two substrates having electrodes formed almost uniformly on their surfaces and having electrode terminals at both ends of the electrodes, with the electrode surfaces facing each other and aligned in a direction that intersects the electrode terminals. By making cuts in the entire surface of the electrode, the resistance value between the electrode terminals is changed and the resistance uniformity between the electrodes is improved.

〔作用〕[Effect]

本発明の作用を図面に基づいて詳細に説明する。第1図
は、本発明の基本構造を示す。
The operation of the present invention will be explained in detail based on the drawings. FIG. 1 shows the basic structure of the invention.

第1図(α)において、切れ目4により、電極端子3間
の電極2の抵抗を補正する。第1図(b)に、補正の原
理を示す。電極2は、第1図(b)のR1〜RIOと分
割して考えられ、切れ目4の入れる本数により、R,=
R,:・・・R,=R,。となるようにするわけである
。すなわち、電極2を、複数のブロックに分割し、その
面積変化により、各ブロック抵抗値を、変化させ、補正
する。
In FIG. 1 (α), the resistance of the electrode 2 between the electrode terminals 3 is corrected by the cut 4. FIG. 1(b) shows the principle of correction. The electrode 2 can be considered as being divided into R1 to RIO in FIG. 1(b), and depending on the number of cuts 4, R,=
R,:...R,=R,. In other words, it is made so that That is, the electrode 2 is divided into a plurality of blocks, and the resistance value of each block is changed and corrected by changing the area.

次に各ブロックの面積変化率の算出し方について説明す
る。第2図に示す、dle’!e・・・dk・・・d5
・・・d  が、各ブロックである。電極端+5+1 3間に、電圧Vを印加し、電極2上の電位を第2図の様
に(%×鴇)ケ所測定する。各fZラインの平均電位は
、 v(/” I ’1 )+V(/” * ’z )+・
” ”−+V (fZ s gm)υ X= ・・・・・・・・・(1) と表わされ、まず〔υ1 、v2・・・・・・υn〕を
求める。次に各ブロックの理論電圧降下υTHは、は v d se= v   −v x        =
(a)、X・1 と表わされ、次に理論理論電圧νTHとの差を算出する
Next, a method of calculating the area change rate of each block will be explained. As shown in FIG. 2, dle'! e...dk...d5
...d is each block. A voltage V is applied between the electrode ends +5+13, and the potential on the electrode 2 is measured at (% x 1) points as shown in FIG. The average potential of each fZ line is v(/"I '1)+V(/"*'z)+・
” ”−+V (fZ s gm) υ X= (1) First, find [υ1, v2...υn]. Next, the theoretical voltage drop υTH of each block is v d se = v − v x =
(a), expressed as X·1, and then calculate the difference from the theoretical voltage νTH.

υ(dz−TH)=  vdsc−υTH……(4)(
4)式で求めたυ(dx−TH)の最大値のブロックを
最大抵抗値ブロックとして、他のブロック抵抗値を、そ
の最大抵抗値にするため、以下の計算をする。最大値ブ
ロックの電圧降下を(l dmax とすると、 となる。すなわち、各ブロックの面積を、Pの割り合い
で小さくすれば、電極端子3間の抵抗は均一に近づく。
υ(dz-TH)=vdsc-υTH...(4)(
4) The block with the maximum value of υ(dx-TH) determined by the formula is set as the maximum resistance value block, and the following calculations are performed to set the resistance values of the other blocks to their maximum resistance values. If the voltage drop of the maximum value block is (ldmax), then the following equation is obtained.In other words, if the area of each block is reduced by the ratio of P, the resistance between the electrode terminals 3 approaches uniformity.

〔実施例〕〔Example〕

以下、本発明の実施例を図面に基づいて説明する。 Embodiments of the present invention will be described below based on the drawings.

(実施例1) 第3図は、上基板にPET(188μ)フィルム、下基
板にガラス(1,1t ) 、電極に蒸着工TO9電極
端子にへ2ペースト、を使用し、電極工TOへ切れ目を
レーザー(ヤング)より入れ、電圧検出型入力装置を試
作した。上基板と下基板の間には、数十μのスペーサを
置き、四方向にはシール接着剤を配した。基板サイズは
、約100×180mmであり、切れ目ブロックは、2
0 am Pitchで第3図の様に入れた。レーザー
スt’ツ)径は、約25μで行った。抵抗均一性は、こ
の捕正により格段に良くなり、未処理時における測定電
位と理wII電位の差は、′/3以下になった。また、
直線性誤差的に考えると 未処理時2.4%が、0.7%に補正された。この入力
装置を128X256ドツト(ドツトピッチα47 )
の液晶表示モジニナル上に設置し、ドツト対応動作され
たところ、未処理時、抑圧下ズレ上5ドツトのものが、
補正後、±2ドツトに補正された。
(Example 1) Figure 3 shows a PET (188 μ) film for the upper substrate, glass (1,1 t) for the lower substrate, vapor deposition TO 9 electrode terminal, 2 paste for the electrode terminal, and a cut in the electrode TO. A prototype voltage detection type input device was fabricated using a laser (Young). A spacer of several tens of microns was placed between the upper and lower substrates, and sealing adhesive was placed on all four sides. The board size is approximately 100 x 180 mm, and the cut block is 2
The pitch was set at 0 am pitch as shown in Figure 3. The diameter of the laser tube was approximately 25μ. The resistance uniformity was significantly improved by this correction, and the difference between the measured potential in the untreated state and the wII potential was less than '/3. Also,
Considering the linearity error, 2.4% when untreated was corrected to 0.7%. This input device is 128 x 256 dots (dot pitch α47)
When it was installed on a digital LCD display and operated for dots, the one with 5 dots on the top of the suppression shift when unprocessed,
After correction, it was corrected to ±2 dots.

(実施例2] 実施例1における、切れ目ピッチを511!111にし
て同様の補正を行ったところ、抵抗均一性は、実施例1
以上に良くなり、直線性誤差で、1.9%が、O,S%
にできた。
(Example 2) When the same correction as in Example 1 was made by changing the cut pitch to 511!111, the resistance uniformity was the same as in Example 1.
The linearity error is 1.9%, O,S%
I was able to.

(実施例3) 実施例1における、切れ目ピッチをQ、57IIffi
にして、同様の補正を行りたところ、抵抗均一性は、実
施例2以上に良くなり、直線性誤差で、2.0%が、1
4%にできた。
(Example 3) In Example 1, the cut pitch is Q, 57IIffi
When the same correction was performed, the resistance uniformity was better than that in Example 2, and the linearity error of 2.0% was
I was able to make it 4%.

(実施例4) 実施例1から実施例4において、切れ目の入れ方を、第
4fM(b)のようにして行った。すなわち、レーザト
リマの動作距離を少なくして、全体に一本づつ入れる第
4図(α)と同様の抵抗変化を可能にさせたわけである
。入力不可能の部分8は、分解能にあわせればよく、本
実施例においては、LODDOTサイズ、Q、amから
、100μとして行った。抵抗均一性は実施例1から実
施例4と同様のレベルに補正できた。また、LaD上(
DOTサイズQ、4)にのせて動作させてみたところ、
全領域にわたって入力でき、まったく問題なかった。な
お、長さtは10〜50μがよい。
(Example 4) In Examples 1 to 4, the cuts were made as shown in 4th fM(b). In other words, by reducing the operating distance of the laser trimmer, it is possible to achieve the same resistance change as shown in FIG. The input-inhibitable portion 8 may be adjusted according to the resolution, and in this embodiment, it is set to 100μ based on the LODDOT size, Q, and am. The resistance uniformity could be corrected to the same level as in Examples 1 to 4. Also, on LaD (
When I tried operating it on DOT size Q, 4),
I was able to input data in all areas and had no problems at all. Note that the length t is preferably 10 to 50 μ.

なお、本発明の入力装置を、電圧検出型のかわりに電流
検出型としてもよい。また、基板は、透明でも、不透明
でも良く、電極も同様である。また、レーザによる切れ
目は、エツチング、カッター等によるものでも、同様に
実現できる。
Note that the input device of the present invention may be of a current detection type instead of a voltage detection type. Furthermore, the substrate may be transparent or opaque, and the same applies to the electrodes. Furthermore, the cut by laser can be similarly achieved by etching, cutter, etc.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明は、基板上の電極抵抗体の
不均一から生ずる位置検出の誤差が補正され、高精度の
位置検出が可能となった。また、基板上の電極抵抗体を
均一に形成するという、製造上難かしいことを、工程中
にレーザ等で、切れ目を入れるという方法に変える事が
でき、高精度の入力装置を提供することが容易になった
As described above, according to the present invention, errors in position detection caused by non-uniformity of electrode resistors on a substrate are corrected, and highly accurate position detection becomes possible. In addition, the difficult manufacturing process of uniformly forming electrode resistors on the substrate can be replaced with a method of making cuts using a laser or the like during the process, making it possible to provide a highly accurate input device. It got easier.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は(αi(1、本発明の基本構造1第2図は、本
発明の実行例、第3図は、本発明の入力装置の実施例に
おける入力部、第4図は、本発明の他の実施例を示す。 1・・・・・・基 板 2・・・・・・電 極 3・・・・・・電極端子 4・・・・・・切れ目 5・・・・・・有効エリア境界線 6・・・・・・電位測定点 である。 以上
FIG. 1 shows (αi(1, basic structure 1 of the present invention) FIG. 2 shows an implementation example of the present invention, FIG. 3 shows an input section in an embodiment of the input device of the present invention, and FIG. 4 shows a basic structure of the present invention. Another example is shown below. 1... Substrate 2... Electrode 3... Electrode terminal 4... Cut 5... Effective area boundary line 6...This is the potential measurement point.

Claims (1)

【特許請求の範囲】[Claims] 入力部を構成する一対の入力用基板の表面にほぼ均一に
入力用電極を形成し、前記入力用電極にそれぞれ交差す
る方向に電位勾配をもたせると共に前記電位勾配に沿っ
て前記入力用電極に切れ目を設けたことを特徴とする入
力装置。
Input electrodes are formed almost uniformly on the surfaces of a pair of input substrates constituting an input section, and each input electrode has a potential gradient in a direction that intersects with each other, and cuts are made in the input electrode along the potential gradient. An input device characterized by being provided with.
JP60123603A 1985-06-07 1985-06-07 input device Pending JPS61282910A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60123603A JPS61282910A (en) 1985-06-07 1985-06-07 input device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60123603A JPS61282910A (en) 1985-06-07 1985-06-07 input device

Publications (1)

Publication Number Publication Date
JPS61282910A true JPS61282910A (en) 1986-12-13

Family

ID=14864697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60123603A Pending JPS61282910A (en) 1985-06-07 1985-06-07 input device

Country Status (1)

Country Link
JP (1) JPS61282910A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009282558A (en) * 2008-05-19 2009-12-03 Fujitsu Component Ltd Method for manufacturing coordinate detection device
JP2020187576A (en) * 2019-05-15 2020-11-19 富士通コンポーネント株式会社 Touch panel device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009282558A (en) * 2008-05-19 2009-12-03 Fujitsu Component Ltd Method for manufacturing coordinate detection device
JP2020187576A (en) * 2019-05-15 2020-11-19 富士通コンポーネント株式会社 Touch panel device

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