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JPS61269995A - Engraving method by laser light - Google Patents

Engraving method by laser light

Info

Publication number
JPS61269995A
JPS61269995A JP60111770A JP11177085A JPS61269995A JP S61269995 A JPS61269995 A JP S61269995A JP 60111770 A JP60111770 A JP 60111770A JP 11177085 A JP11177085 A JP 11177085A JP S61269995 A JPS61269995 A JP S61269995A
Authority
JP
Japan
Prior art keywords
mask
metal layer
film
laser
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60111770A
Other languages
Japanese (ja)
Other versions
JPH0448552B2 (en
Inventor
Jiro Manabe
真部 次郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TAKATOU SEIKAN KK
Original Assignee
TAKATOU SEIKAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TAKATOU SEIKAN KK filed Critical TAKATOU SEIKAN KK
Priority to JP60111770A priority Critical patent/JPS61269995A/en
Publication of JPS61269995A publication Critical patent/JPS61269995A/en
Publication of JPH0448552B2 publication Critical patent/JPH0448552B2/ja
Granted legal-status Critical Current

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  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To make possible the engraving of a realistic image on wood, etc. by a laser light by subjecting a mask material consisting of a metallic layer lined with a corrosion resistant film which is a base material to photoetching using a photomask of a halftone negative film to form a laser mask and using such mask. CONSTITUTION:The mask material (m) is formed by lining integrally the metallic layer 2 to the corrosion resistant film 1 which is the base material and laminating the photoresist film 3 on the surface of the metallic layer 2. The photomask 4 consisting of the halftone negative film formed preliminarily from a photographic original is superposed on the mask material (m) and the metallic layer 2 of the material (m) is etched away by photoetching method to form the laser mask LM having the metallic layer of the same pattern as the pattern of the mask 4 left on the film 1. Such LM is superposed on the surface of a material 5 to be worked and the laser light L is irradiated thereon from above, by which the pattern formed of the layer 2 is embossed on the surface of the material 5.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、レーザ光線が有する鋭い指向性とエネルギ密
度の高い性質を利用して、木材や合成樹脂板に図形や文
字等の画像を精巧に彫刻する方法に関する。
Detailed Description of the Invention (Field of Industrial Application) The present invention utilizes the sharp directivity and high energy density properties of laser beams to create elaborate images such as figures and characters on wood or synthetic resin boards. on how to engrave.

(従来の技術) レーザ光線によるこの種の彫刻方法としては、銅または
真ちゅうのようなレーザ光線を遮る金属板に、加工形状
に対応するパターンの透孔を穿設して型板を作り、この
型板を木材等の被加工材の表面に重ね、上方からレーザ
光線を照射して透孔部分のみを焼き削ることにより、被
加工材に型板の透孔と同じパターンの形状を加工する方
法が従来知られている(たとえば特公昭58−1523
2号公報、特開昭58−71000号公報)。
(Prior art) This type of engraving method using a laser beam involves making a template by drilling holes in a pattern corresponding to the shape to be processed in a metal plate such as copper or brass that blocks the laser beam. A method of machining the same pattern as the holes in the template into the workpiece by stacking the template on the surface of the workpiece such as wood and irradiating the laser beam from above to burn off only the holes. is conventionally known (for example, Japanese Patent Publication No. 58-1523)
No. 2, JP-A-58-71000).

(発明が解決しようとする問題点) しかし従来の型板による方法では、ループ状に閉じた透
孔は型板の一部が脱落してしまうため穿設できない、透
孔を穿つ場合には必ず型板全体を一体的に保つための所
謂ブリッジが必要である。
(Problem to be solved by the invention) However, with the conventional method using a template, it is impossible to drill a loop-shaped closed hole because part of the template falls off. A so-called bridge is required to keep the entire template together.

従って従来は文字や図形の外縁全周を被加工材の表面に
彫り下げて完全な形状に形成することは不可能であった
Φ このように従来は彫刻できる形状には著しい制約があり
、このため例えばポートレートや絵画などを彫刻する場
合、これら原稿となる画像にブリッジを付加するなど一
定のデザインを施したうえでなければ彫刻できないから
、出来上った彫刻は原稿と形状が異なり写実性に甚だ欠
けるものであった。
Therefore, in the past, it was impossible to carve the entire outer edge of a character or figure onto the surface of the workpiece to form a complete shape. Therefore, for example, when engraving a portrait or a painting, the engraving requires a certain design such as adding a bridge to the original image, so the finished sculpture has a different shape from the original and is less realistic. It was severely lacking.

本発明はこのような事情に鑑み、従来の型板を改良する
ことにより、写真のように写実的な画像をレーザ光線を
使って木材等に彫刻することを目的とする。
In view of the above circumstances, an object of the present invention is to improve the conventional template to engrave a photo-realistic image on wood or the like using a laser beam.

(問題点を解決するための手段) 本発明では、先づ耐蝕性の基材フィルムに金属層を張り
合せ、その金属層の表面にフォトレジスト膜を積層して
マスク材を形成する。そして予め写真原稿をもとに形成
した網ネガフィルムから成るフォトマスクを前記マスク
材に重ねてフォトエツチング法により金属層を打抜き、
これにより基材フィルム上にフォトマスクと同一パター
ンの金属層を残したレーザマスクを形成する0次に当該
レーザマスクを木材のような被加工材の表面に重ねて、
その上方よりレーザ光線を全面に照射して金属層で遮光
した部分以外を焼き削り、被加工材の表面に前記金属層
で形成されるパターンを浮彫にする。
(Means for Solving the Problems) In the present invention, a metal layer is first attached to a corrosion-resistant base film, and a photoresist film is laminated on the surface of the metal layer to form a mask material. Then, a photomask made of a mesh negative film formed in advance based on a photographic original is placed on the mask material, and the metal layer is punched out using a photoetching method.
This forms a laser mask that leaves a metal layer with the same pattern as the photomask on the base film.Next, the laser mask is superimposed on the surface of a workpiece such as wood.
A laser beam is irradiated onto the entire surface from above to burn off the area other than the area shielded by the metal layer, thereby embossing the pattern formed by the metal layer on the surface of the workpiece.

(作用) しかして網ネガフィルムのフォトマスクラ用いてマスク
材の金属層をフォトエツチングすると、金属層はフォト
マスクの網点と同一パターンの網目状にエツチングされ
るが、この金属層は耐蝕性の基材フィルムに裏打ちされ
ているので各網点の金属層はばらばらに分離しないで基
材フィルム上に一体的に保持される。
(Function) When the metal layer of the mask material is photo-etched using a net negative film photomaskler, the metal layer is etched into a mesh pattern with the same pattern as the dots of the photomask, but this metal layer has corrosion resistance. Since it is backed by the base film, the metal layer of each halftone dot is not separated into pieces but is held integrally on the base film.

このようにして得られたレーザマスクにより被加工材を
覆って上方からレーザ光線を照射すると、レーザマスク
の金属層で遮られた部分を除く他の被加工面が一定の深
さだけ蒸発して焼き削られた状態となり、金属層と同一
パターン即ちフォトマスクの網ネガと同一パターンが被
加工面に残って浮彫になる。
When the workpiece is covered with the laser mask obtained in this way and a laser beam is irradiated from above, the workpiece surface other than the part blocked by the metal layer of the laser mask is evaporated to a certain depth. It is baked and shaved, and the same pattern as the metal layer, that is, the same pattern as the net negative of the photomask, remains on the processed surface and becomes embossed.

(実施例) 次に本発明の実施例を図面に示して説明する。(Example) Next, embodiments of the present invention will be described with reference to the drawings.

lはエツチングで腐食しないような耐蝕性の材質たとえ
ばポリエステル等から成る厚さ20終乃至50#L程度
の基材フィルムで、これに鉄、銅。
1 is a base film with a thickness of about 20 to 50 L made of a corrosion-resistant material such as polyester that will not corrode by etching, and iron and copper.

真鋳のような金属で厚さがエツチング可能な100ル未
溝の金属層2を一体的に張り合せ、さらにこの金属層2
の表面に、フォトレジスト膜3を積層して、マスク材m
を形成する(第2図)。
A metal layer 2 made of brass-like metal with a thickness of 100 mm that can be etched and has no grooves is integrally laminated, and this metal layer 2 is
A photoresist film 3 is laminated on the surface of the mask material m.
(Figure 2).

フォトレジスト膜3はフィルム状のレジストを金属層2
の表面に加熱、加圧してラミネートするか、液状のレジ
ストを塗布して形成する。
The photoresist film 3 is a film-like resist that is attached to the metal layer 2.
It is formed by laminating the surface by applying heat and pressure, or by applying a liquid resist.

次にこのマスク材mをフォトエツチングするのであるが
、その際に用いるフォトマスク4には次のようにして作
った網ネガフィルムを使う。
Next, this mask material m is photoetched, and the photomask 4 used at that time is a net negative film made as follows.

先づポートレートのような黒白の連続諧調の写真原稿を
用意し、小さな網目のある網目スクリーン(コンタクト
スクリーンともいう)を感光性フィルムの乳剤面に密着
させて前記原稿を撮影し、網ネガフィルムを作る。この
感光性フィルムは、感光すると臨界露光量を越えた部分
は黒化4aし、それ以下では透明4bになる性質がある
First, prepare a black-and-white continuous tone photographic original, such as a portrait, and photograph the original by placing a mesh screen (also called a contact screen) with small meshes in close contact with the emulsion surface of a photosensitive film, and then transfer it to a mesh negative film. make. This photosensitive film has the property that when exposed to light, the portions exceeding the critical exposure amount turn black 4a, and the portions below that amount become transparent 4b.

このため網目スクリーンの網目は均一ではあるが、原稿
の濃い部分(暗い部分)は、網目を通過する光量が少な
いからこの感光性フィルムを現像すると小さな黒い網点
になり、また淡い部分(明るい部分)は、光量が多いか
ら大きな黒い網点になって、他は透明な網ネガフィルム
が得られる。
For this reason, the mesh on the mesh screen is uniform, but because the amount of light that passes through the mesh is small in dark areas of the original, when this photosensitive film is developed, it becomes small black dots, and in light areas (light areas), the amount of light that passes through the mesh is small. ) produces large black halftone dots due to the large amount of light, and a halftone negative film that is otherwise transparent.

このような網ネガフィルムの作り方は、写真や絵のよう
な濃淡が連続する連続諧調の原稿をトーンセパレートし
て印刷をするための網版法として知られており、網目ス
クリーンにも網目が格子状のものの他、平行線、破線、
同心円、砂目等、各゛ 種部品化されており、そのいづ
れを使ってもよい、もっともいづれを使うかによって網
ネガフィルムの網点の形状が異なることはいうまでもな
い、たとえば平行線の網目スクリーン、を用いると、原
稿の濃い部分は黒色ストライブの巾が広く淡い部分はそ
の巾が狭くなり、このように平行なストライプの巾が広
狭に変化することにより連続諧調をトーンセパレートす
る。
This method of making mesh negative film is known as the halftone printing method, which is used to separate and print continuous tone manuscripts with continuous shading, such as photographs and paintings. In addition to shaped lines, parallel lines, broken lines,
There are various types of parts such as concentric circles, grains, etc., and you can use any of them, but it goes without saying that the shape of the halftone dots on the mesh negative film will differ depending on which one you use. When a mesh screen is used, the width of the black stripes is wide in dark areas of the original, and narrow in the light areas, and by changing the width of the parallel stripes in this way, continuous tones are tone-separated.

また網ネガフィルムを作るのに写真等の原稿を網目スク
リーンを用いて、−亘、網ポジの印画紙に焼き、この印
画紙を反転して網ネガフィルムを作ってもよい、このよ
うに一旦、印画紙に焼き付けると画像を容易に修正でき
る利点がある。
Alternatively, to make a mesh negative film, you can use a mesh screen to print an original such as a photograph onto a mesh positive photographic paper, and then turn the photographic paper over to make a mesh negative film. , printing on photographic paper has the advantage that the image can be easily corrected.

網ネガフィルムが出来上ったら、これをフォトマスク4
として、前記のマスク材mに重ねて(マスキングして)
フォトエツチングする。
Once the net negative film is completed, apply it to photomask 4.
, overlap (masking) the above mask material m.
Photoetch.

それにはマスク材mのフォトレジスト膜3に網ネガフィ
ルムの乳剤面を重ね合せ、真空焼枠を用いて密着露光し
た後(第2図)、マスク材mを現像液中に漬は込んで現
像する。現像が終ったら被感光部分の溶解したレジスト
かすを水で洗い落して(第3図)、腐食機(図示しない
)に送り込みエツチング液を吹き付けてレジスト膜より
露出した部分の金属層2を腐食除去して(ケミカルブラ
ンキング)、基材フィルム1の上にフォトマスクの網ネ
ガフィルムと同じパターンの金属層を残したレーザマス
クLMを形成する。(第4図)。
To do this, the emulsion side of the mesh negative film is superimposed on the photoresist film 3 of the mask material m, and after close exposure using a vacuum printing frame (Fig. 2), the mask material m is immersed in a developer and developed. do. After the development is completed, the dissolved resist residue in the exposed area is washed away with water (Figure 3), and the metal layer 2 exposed from the resist film is corroded away by being sent to a corrosive machine (not shown) and sprayed with an etching solution. (chemical blanking) to form a laser mask LM on the base film 1, leaving a metal layer with the same pattern as the net negative film of the photomask. (Figure 4).

次にこのレーザマスクLMをアクリル樹脂のような合成
樹脂または木材等の被加工材5の表面に密着し、その上
方から炭斂ガスレーザのようなレーザ光線りを全面に照
射する。この場合、被加工材5とレーザ光線りを互いに
交差するX輌及びY軸方向に相対的に移動してレーザ光
線りを走査すれば、レーザマスクLMの全面にわたって
適確にレーザ光線を照射できる。
Next, this laser mask LM is closely attached to the surface of a workpiece 5 such as a synthetic resin such as acrylic resin or wood, and a laser beam such as an anthrax gas laser is irradiated onto the entire surface from above. In this case, by scanning the laser beam by moving the workpiece 5 and the laser beam relatively in the X- and Y-axis directions that intersect with each other, the entire surface of the laser mask LM can be accurately irradiated with the laser beam. .

レーザ光線りを照射すると、レーザ光線りは金属層2で
遮断されレーザマスクLMの7オトレジスト膜3のみを
蒸発させるが、基材フィルムlが露出した部分では基材
フィルム1を通過して被加工材5の表面をある深さく゛
1ミリ乃至3ミリ)まで蒸発させて、凹部6を彫り込み
(第6図)、その結果、被加工材4の表面に金属層2の
パターンと同一のパターンすなわちフォトマスク4の網
ネガと同一パターンが被加工面に残って浮彫りにな  
 する(第1図)。
When irradiated with a laser beam, the laser beam is blocked by the metal layer 2 and evaporates only the photoresist film 3 of the laser mask LM, but in the exposed portion of the base film 1, it passes through the base film 1 and is processed. The surface of the workpiece 5 is evaporated to a certain depth (1 mm to 3 mm) and a recess 6 is carved (Fig. 6). As a result, a pattern identical to the pattern of the metal layer 2 is formed on the surface of the workpiece 4. The same pattern as the net negative of Mask 4 remains on the processed surface and becomes embossed.
(Figure 1).

その後、金属層2は基材フィルムlと共に被加工材4の
表面から取り去ってもよいが、基材フィルムlの裏面に
あらかじめ接着剤を塗布しておきレーザ光線照射前にレ
ーザマスクLMを被加工材5の表面に接着させておけば
、所定パターンの浮彫と同時に、浮き出たパターンの表
面にそれと全く同じ峡部の光沢に富む金属層が一工程で
被着できる。なおこの場合、基材フィルムlの裏面に接
着剤を塗布するかわりに、基材フィルム1と被加工材4
の間に両面接着シートを介装して金属層を接着させても
よいことはいうまでもない。
Thereafter, the metal layer 2 may be removed from the surface of the workpiece 4 together with the base film l, but an adhesive may be applied to the back surface of the base film l in advance and the laser mask LM is attached to the workpiece before laser beam irradiation. By adhering it to the surface of the material 5, at the same time as the predetermined pattern is embossed, a glossy metal layer having the same isthmus can be applied to the surface of the embossed pattern in one step. In this case, instead of applying adhesive to the back surface of the base film 1, the base film 1 and the workpiece 4 are
Needless to say, a double-sided adhesive sheet may be interposed between the two to bond the metal layer.

またフォトレジスト膜に、感光すると可溶性になるタイ
プのものを用いて金属層2を前述の実施例とはネガティ
ブのパターンにエツチングすれば、被加工材5の表面の
凹凸が第1図と正反対になる。
Furthermore, if the metal layer 2 is etched into a negative pattern compared to the above embodiment using a photoresist film that becomes soluble when exposed to light, the unevenness on the surface of the workpiece 5 will be exactly opposite to that shown in FIG. Become.

さらに網′ネガフィルムの代りにハイコントラストフィ
ルムで中間色を捨て濃淡を強調させたものをフォトマス
クに用いても、原稿に近い画像を木材等に彫刻できる。
Furthermore, if a high-contrast film that emphasizes shading while eliminating neutral colors is used as a photomask instead of a net negative film, an image close to the original can be engraved on wood or the like.

(発明の効果) このように本発明では、レーザマスクLMを作るための
材料となるマスク材mには耐蝕性の基材フィルム1を積
層するので、金属層2をフォトエツチングにより打抜い
ても、金属層2が基材フィルムl上に保持されて残りば
らばらに分離しない、そのため従来のような型板を一体
的に保つためのブリッジを必要としないから、レーザマ
スクを作るうえでデザイン上の制約がなくなり、さらに
この長所に加えて、本発明では写真原稿をもとに作成し
た網ネガフィルムを、フォトマスク4としてマスク材に
マスキングし、フォトエツチング法によりレーザマスク
を作るので、写真印刷に使用する網版と同様の金属層に
よる微細な網点状のパターンを備えたレーザマスクLM
が形成できる。
(Effects of the Invention) In this way, in the present invention, since the corrosion-resistant base film 1 is laminated on the mask material m, which is the material for making the laser mask LM, the metal layer 2 can be punched out by photoetching. , since the metal layer 2 is held on the base film l and does not separate into pieces, there is no need for a conventional bridge to keep the template together, so there are no design issues when making a laser mask. In addition to this advantage, in the present invention, a mesh negative film made based on a photographic original is masked on a mask material as the photomask 4, and a laser mask is made by the photoetching method, so it is suitable for photographic printing. Laser mask LM with a fine halftone pattern made of a metal layer similar to the halftone plate used
can be formed.

従ってこのレーザマスクLMを被加工材に重ねてレーザ
光線を照射すると、レーザマスクLMの金属層により遮
ぎられた部分に金属層と同一パターンの、すなわちフォ
トマスクの網ネガと同一パターンの形状が被加工面に残
って極めて微細な網点状の浮彫となり、あたかも写真印
刷用の凸版のような形状に加工されるので、全体として
見るときは被加工面の網点の大きさく面積)により原稿
の濃淡が忠実に再現され、極めて写実的な画像が得られ
るという効果を奏する。
Therefore, when this laser mask LM is placed over the workpiece and irradiated with a laser beam, a shape with the same pattern as the metal layer, that is, the same pattern as the net negative of the photomask, appears in the part blocked by the metal layer of the laser mask LM. It remains on the processed surface as an extremely fine halftone dot-like relief, and is processed into a shape similar to a relief plate for photographic printing, so when viewed as a whole, the original is determined by the size and area of the halftone dots on the processed surface. This has the effect of faithfully reproducing the shading and producing extremely realistic images.

本発明によればポートレートや絵画のほか毛筆の書や魚
拓も原稿を忠実に再現して彫刻でき、広く木材等の装飾
に利用できる。
According to the present invention, in addition to portraits and paintings, brush calligraphy and fish prints can be engraved by faithfully reproducing manuscripts, and can be widely used to decorate wood and the like.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明方法により彫刻した被加工材の拡大斜視
図“、第2乃至6図は本発明を実施した彫刻方法の各工
程を示す断面図である。 lは基材フィルム、2は金属層、3はフォトレジスト膜
、4はフォトマスク、5は被加工材、mはマスク材、L
Mはレーザマスク、Lはレーザ光線。
FIG. 1 is an enlarged perspective view of a workpiece engraved by the method of the present invention, and FIGS. 2 to 6 are cross-sectional views showing each step of the engraving method according to the present invention. 1 is a base film, 2 is a metal layer, 3 is a photoresist film, 4 is a photomask, 5 is a workpiece, m is a mask material, L
M is a laser mask, L is a laser beam.

Claims (1)

【特許請求の範囲】[Claims] 耐蝕性の基材フィルムを裏面に張り合せた金属層の表面
にフォトレジスト膜を積層してマスク材を形成し、予め
写真原稿をもとに作成した網ネガフィルムから成るフォ
トマスクを前記マスク材に重ねてフォトエッチング法に
よりマスク材の金属層を打抜き、これにより基材フィル
ム上にフォトマスクと同一パターンの金属層を残したレ
ーザマスクを形成し、次に当該レーザマスクを被加工材
の表面に重ねて、その上方よりレーザ光線を照射して前
記金属層で形成されるパターンを被加工材表面に浮彫に
することを特徴とするレーザ光線による彫刻方法。
A photoresist film is laminated on the surface of a metal layer with a corrosion-resistant base film pasted on the back side to form a mask material, and a photomask made of a mesh negative film prepared in advance based on a photographic original is applied to the mask material. The metal layer of the mask material is punched out using a photo-etching method, thereby forming a laser mask that leaves a metal layer with the same pattern as the photomask on the base film, and then attaching the laser mask to the surface of the workpiece. An engraving method using a laser beam, characterized in that the pattern formed by the metal layer is embossed on the surface of the workpiece by superimposing the metal layer on the metal layer and irradiating the laser beam from above.
JP60111770A 1985-05-23 1985-05-23 Engraving method by laser light Granted JPS61269995A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60111770A JPS61269995A (en) 1985-05-23 1985-05-23 Engraving method by laser light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60111770A JPS61269995A (en) 1985-05-23 1985-05-23 Engraving method by laser light

Publications (2)

Publication Number Publication Date
JPS61269995A true JPS61269995A (en) 1986-11-29
JPH0448552B2 JPH0448552B2 (en) 1992-08-07

Family

ID=14569729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60111770A Granted JPS61269995A (en) 1985-05-23 1985-05-23 Engraving method by laser light

Country Status (1)

Country Link
JP (1) JPS61269995A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0648097A (en) * 1992-07-29 1994-02-22 Utsudo Retsukusu:Kk Method of carving by laser beam
JP2008073768A (en) * 2006-08-25 2008-04-03 Semiconductor Energy Lab Co Ltd Method for manufacturing semiconductor device
US8088268B2 (en) 2007-12-13 2012-01-03 Hyundai Motor Company Method of fabricating mask for forming wood grain patterns

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50106701A (en) * 1972-08-25 1975-08-22
JPS5279964A (en) * 1975-12-25 1977-07-05 Citizen Watch Co Ltd Watch
JPS597553A (en) * 1982-06-29 1984-01-14 Nippon Seiko Kk Method for grinding and shaping elliptic ring having uniform thickness

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50106701A (en) * 1972-08-25 1975-08-22
JPS5279964A (en) * 1975-12-25 1977-07-05 Citizen Watch Co Ltd Watch
JPS597553A (en) * 1982-06-29 1984-01-14 Nippon Seiko Kk Method for grinding and shaping elliptic ring having uniform thickness

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0648097A (en) * 1992-07-29 1994-02-22 Utsudo Retsukusu:Kk Method of carving by laser beam
JP2008073768A (en) * 2006-08-25 2008-04-03 Semiconductor Energy Lab Co Ltd Method for manufacturing semiconductor device
US8088268B2 (en) 2007-12-13 2012-01-03 Hyundai Motor Company Method of fabricating mask for forming wood grain patterns

Also Published As

Publication number Publication date
JPH0448552B2 (en) 1992-08-07

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