JPS61237216A - Manufacturing method of thin film magnetic head - Google Patents

Abstract

PURPOSE:To form easily a projected part at the leading end part of a magnetic layer by selectively etching the surface of the magnetic layer on which a projected part is to be formed and which is opposed to a recording medium. CONSTITUTION:A lower magnetic-pole layer 22, a gap layer 25, the first insulating layer 26, a thin film coil 27, the second insulating layer 28, an upper magnetic-pole layer 23 and a protective layer 29 are successively formed on a substrate 21, then a photoresist film 24 is coated on the surfaces of both magnetic layers 22 and 23 opposed to a recording medium and the film 24 is formed in a specified pattern by using a photographic method. Subsequently, both magnetic-pole layers 22 and 23 are ion-etched, etc., by using the photoresist film 24 as a mask and then the photoresist film 24 is removed by using a photoresist film removing agent. Then an alumina film or a silicon oxide film is sputtered as a flattening coated film 31. The surface of the coated film 31 is ground. Consequently, angular parts K and L are formed and used for mitigating the magnetic flux generated between the magnetic-pole surfaces and the magnetic recording medium with the angular parts G and H on the surfaces of both magnetic-pole layers 22 and 23 opposed to the magnetic recording medium.

Description

[Detailed Description of the Invention] [Summary] A method for manufacturing a thin-film magnetic head that prevents negative edges in reproduced waveforms, the method includes forming protrusions on the surfaces of the upper magnetic pole layer and the lower magnetic pole layer on the side facing the recording medium. At this time, one surface of the upper magnetic pole layer or the lower magnetic pole layer is selectively etched with a mask to form a protrusion.

[Industrial application field]

The present invention relates to a method of manufacturing a thin film magnetic head, and more particularly to a method of manufacturing a thin film magnetic head that prevents negative edges from occurring in a reproduced waveform.

The magnetic heads used in magnetic disk drives are required to be smaller and lighter.
Thin-film magnetic heads have been proposed that are capable of high-density recording and can be manufactured in bulk.

When reproducing information recorded using such a thin film magnetic head, there is a demand for a thin film magnetic head having a magnetic pole structure that does not generate a noise waveform called a negative edge in the reproduced waveform.

[Conventional technology]

FIG. 3 shows a cross-sectional structure of a main part of such a thin film magnetic head.

As shown in the figure, the thin film magnetic head includes a substrate 1, a lower magnetic pole layer 2, a gap layer 3, a first insulating layer 4, a thin film coil 5,
A second glabellar insulating layer 6, an upper magnetic pole layer 7, and a protective layer 8 are laminated.

When reproducing information recorded using such a thin-film magnetic field, as shown in Figure 4, the isolated waveform of the reproduced signal includes parts A and B called negative edges, which are normal signal waveforms. A noise waveform that falls more to the negative side is generated.

Therefore, the present inventor previously proposed a 'S film magnetic head in which such negative edges would not occur in a patent application filed in 1983.
This was proposed in No.-229901.

The structure of this thin film magnetic head is that, as shown in FIG. 5, a protruding portion C is formed on the side surface of the lower magnetic pole layer 11 facing the gap layer 12 side, and the protruding portion C is formed at the tip of the magnetic pole of the lower magnetic pole layer 11. The concentration of magnetic flux caused by the magnetic flux is moved and dispersed toward the protruding portion C side, thereby reducing the negative edge A shown in FIG.

[Problem that the invention seeks to solve]

An object of the present invention is to provide a method for easily forming the above-mentioned thin film magnetic head.

[Means for solving problems]

The method of the present invention is shown in FIG. 1(a), FIG. 1(b), and FIG.
C) As shown in the figure, a predetermined portion is opened in one or both of the surfaces E and F facing the magnetic recording medium of the lower magnetic pole layer 22 and the upper magnetic pole layer 23 formed on the substrate 21. A mask 24 is provided and etching is performed through this mask 24 to form a projection for eliminating negative edges on either or both of the lower magnetic pole layer 22 and the upper magnetic pole layer 23.

[Effect]

That is, in the method of manufacturing a thin film magnetic head of the present invention, selective etching is performed using a mask to remove the surfaces E of the lower magnetic pole layer 22 and the upper magnetic pole layer 23 that face the magnetic recording medium.

A protrusion is easily formed on the magnetic pole F to alleviate magnetic flux concentration at the magnetic pole tip, which causes a negative edge to occur between the magnetic pole layer 22, 23 and a magnetic recording medium (not shown).

〔Example〕

Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.

First, as shown in FIG. 1(a), a lower magnetic pole layer 22, a gap layer 25, a first insulating layer 26, a thin film coil 27, a second insulating layer 28, an upper magnetic pole layer 23, and a protective layer 29 are placed on a substrate 21.
are sequentially laminated. After that, both magnetic pole layers 22 and 23
After coating the photoresist film 24 on the surface facing the recording medium,
This photoresist film 24 is formed in a predetermined pattern using photolithography.

Next, as shown in FIG. 1(b), a photoresist film 2 is formed.
4 as a mask, both magnetic pole layers 22 and 23 are subjected to ion etching or chemical etching.

Furthermore, as shown in FIG. 1(C), the photoresist film 24 is removed using a photoresist film remover.

Furthermore, as shown in Figure 1(d), alumina (~203)
Film or silicon oxide (Sin)Ill! is deposited as a planarizing film 31 using a sputtering method.

Furthermore, as shown in FIG. 1(e), the surface of this planarizing film 31 is polished to a flat state.

In this way, L is formed at the corners G and H of the magnetic recording medium facing surfaces of both magnetic pole layers 22 and 23 for relaxing the magnetic flux generated between the magnetic recording medium and the magnetic recording medium.

Further, a second embodiment of the present invention is shown in FIGS. 2(a) to 2(f).
) Explain using diagrams.

First, as shown in FIG. 2(a), a lower magnetic pole layer 22, a gap layer 25, a first insulating layer 26, a thin film coil 27, a second insulating layer 28, an upper magnetic pole layer 23, and a protective layer 29 are placed on a substrate 21.
are sequentially laminated. After that, both magnetic pole layers 22 and 23
After applying a first photoresist film 41 to the recording medium facing surfaces E and F, this photoresist film 41 is formed into a predetermined pattern using photolithography.

Next, as shown in FIG. 2(b), this photoresist M1
i! Using 41 as a mask, the recording medium facing surfaces of both magnetic pole layers 22 and 23 are etched by ion etching or chemical etching.

Furthermore, as shown in FIG. 2(C), after removing the photoresist film 41 with a photoresist film remover, a second photoresist film 42 having a larger opening area than this photoresist film 41 is applied to both magnetic pole layers 22 and 23. Formed on the surface facing the recording medium.

Furthermore, as shown in FIG. 2(d), this photoresist film 4
Using 2 as a mask, both magnetic pole layers 22 and 23 are etched by ion etching or chemical etching.

Furthermore, as shown in FIG. 2(e), after removing the photoresist film 42, a surface flattening film 43 made of alumina or 5to2FJ is formed on both magnetic pole layers 22, 23 by sputtering.

After that, as shown in FIG. 2(f), this flattening film 4 is
3 to make the surface flat and complete the thin film magnetic head.

By doing this, unlike the first embodiment, both magnetic pole layers 2
A protrusion 44 is formed on the recording medium facing surface of No. 2.23 at a position deeper into the interior thereof to relax the magnetic flux generated between the recording medium and both magnetic pole layers.

In this example, a photoresist film was used as the mask material, but other materials such as titanium (Ti) and aluminum (All) were used.
A metal thin film such as the above may be used as a mask material.

Further, in this embodiment, protrusions are provided on both the upper magnetic pole layer and the lower magnetic pole layer to eliminate negative edges, but they may be provided on either the upper magnetic pole layer or the lower magnetic pole layer.

〔Effect of the invention〕

As described above, according to the manufacturing method of the present invention, the protruding portion of the magnetic pole in the direction of the surface facing the recording medium is easily formed, so that a thin film magnetic head having good characteristics with a small negative edge in the reproduced waveform can be produced. is obtained. As a result, it is possible to obtain a highly reliable thin film magnetic head in which the position of the peak of the reproduced signal does not shift and the reproduction output fluctuates less.

[Brief explanation of drawings]

1 (Fig. 81 to 1(e) are diagrams for explaining the first embodiment of the method for manufacturing a thin film magnetic head of the present invention, and Fig. 2(a) to 2(f) are diagrams for explaining the first embodiment of the method for manufacturing a thin film magnetic head of the present invention. A diagram for explaining the second embodiment of the present invention; FIG. 3 is a sectional view showing the tip of a conventional general thin-film magnetic head; FIG. 4 is a waveform diagram of a reproduction signal of the thin-film magnetic head; The figure is a cross-sectional view showing the tip of a conventional improved thin-film magnetic head. In the figure, 21 is a substrate, 22 is a lower magnetic pole layer, 23 is an upper magnetic pole layer, 2
4 is a photoresist film, 25 is a gap layer, 26 is a first insulating layer, 27 is a thin film coil, 28 is a second insulating layer, 29
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Claims (1)

[Claims] A gap layer (25) and a thin film coil (27) are laminated with insulating layers (26, 28) interposed between an upper magnetic pole layer (23) and a lower magnetic pole layer (22) formed on a substrate (21). , a method for manufacturing a thin film magnetic head, wherein the tip of at least one of the pole layers (22, 23) has a protrusion facing the recording medium, the method comprising: A method for manufacturing a thin-film magnetic head, characterized in that a protrusion is formed at the tip of the magnetic pole layer (22, 23) by selectively etching the surface facing the recording medium of the magnetic pole layer (22, 23).