[go: up one dir, main page]

JPS61227995A - Production of sic whisker - Google Patents

Production of sic whisker

Info

Publication number
JPS61227995A
JPS61227995A JP60066229A JP6622985A JPS61227995A JP S61227995 A JPS61227995 A JP S61227995A JP 60066229 A JP60066229 A JP 60066229A JP 6622985 A JP6622985 A JP 6622985A JP S61227995 A JPS61227995 A JP S61227995A
Authority
JP
Japan
Prior art keywords
crucible
sic
whisker
temp
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60066229A
Other languages
Japanese (ja)
Inventor
Hajime Saito
肇 斎藤
Tetsuro Urakawa
浦川 哲朗
Masataka Suzuki
正隆 鈴木
Masaaki Mori
正章 森
Hideo Nagashima
長島 秀夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP60066229A priority Critical patent/JPS61227995A/en
Publication of JPS61227995A publication Critical patent/JPS61227995A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/005Growth of whiskers or needles
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/36Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To produce an SiC whisker inexpensively and securely by heating a mixture contg. the scum, a C source and an NaF source in the nonoxidizing atmosphere. CONSTITUTION:The scum being the fine powder waste such as quartz contg. about 70wt% SiO2, about 20wt% Al2O3 and about 5 wt% K2O is used and a mixture 2 contg. 1mol part SiO2 caused to the scum, 1.5-5mol part C and 1/24-1/2mol part NaF is packed up to the height A of a base part of a crucible 1 and a space 3 producing a long fiber whisker is formed in the range of B>=5A up to the height B of the upper part thereof. After an inert gas such as Ar is introduced through the introduction pipes 11, 17 and an inflow port 18 and the insides of the crucible 1 and a tube 5 are completely filled with gaseous Ar, the mixture 2 is heated at the prescribed temp. T1 in the range within 1,400-1,700 deg.C with a heater 6 and also while keeping the temp. T2 of the space 3 and the temp. gradient DELTAT2/DELTAZ (the upper a position is, the lower the temp. is) in >=25 deg.C/100mm prescribed value, an SiC whisker having the long fiber of about >=500mum length is produced in the space 3.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は炭化ケイ素(SiC)ウィスカーの製造方法に
係る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing silicon carbide (SiC) whiskers.

[従来の技v#] ケイ素源及び炭素源を含む混合物を非酸化性雰囲気下に
おいて加熱してSiCウィスカーを製造する方法自体は
知られている。そして、ケイ素源として安価な、もみ殻
、しらす等を用いることも提案されている(例えば特公
昭59−9516号公報、特開昭58−20799号公
報参照)。
[Prior Art v#] The method itself for producing SiC whiskers by heating a mixture containing a silicon source and a carbon source in a non-oxidizing atmosphere is known. It has also been proposed to use inexpensive rice husk, whitebait, etc. as a silicon source (see, for example, Japanese Patent Publication No. 59-9516 and Japanese Patent Application Laid-open No. 58-20799).

[発明が解決しようとする問題点] しかし乍ら、ケイ素源としてもみ殻を用いようとする場
合、ウィスカー合成に先立ち、もみ殻を灰化する必要が
あり、操作が煩雑となる点で好ましくない、    □ 一方、シラスは(キラに比べて)組成変動が大きい点で
好ましくない。
[Problems to be Solved by the Invention] However, when attempting to use rice husks as a silicon source, it is necessary to ash the rice husks prior to whisker synthesis, which is undesirable because the operation becomes complicated. , □ On the other hand, whitebait is not preferable because it has a large compositional fluctuation (compared to Kira).

本発明は前記した点に基づきなされたち、のであり、そ
の目的とす〜るところは、安価で、組成が比較的安定し
ており、且つ反応性の良いケイ素源を用いて安価に且つ
確実にSiCウィスカーをWA造する方法を提供するこ
とにある。
The present invention has been made based on the above-mentioned points, and its object is to inexpensively and reliably use a silicon source that is inexpensive, has a relatively stable composition, and has good reactivity. An object of the present invention is to provide a method for manufacturing SiC whiskers by WA.

[問題点を解決するための手段] 本発明によれば、前記した目的は、キラと炭素源とフッ
化ナトリウム源とを含む混合物を非酸化性雰囲気下で加
熱してSiCウィスカーを製造する方法によって達成さ
れる。
[Means for Solving the Problems] According to the present invention, the above object is a method for producing SiC whiskers by heating a mixture containing Kira, a carbon source, and a sodium fluoride source in a non-oxidizing atmosphere. achieved by.

この明細書においてキラとは、粘土質鉱物の生成過程で
生ずる微粉の廃棄物の総称であり、主とて石英、長石、
カオリナイト及び雲母からなり、通常SiO□を約70
重量%、Al2O3を約20!1量%、K2Oを約5重
量%程度含む。
In this specification, Kira is a general term for fine powder waste generated during the production process of clay minerals, mainly quartz, feldspar,
Composed of kaolinite and mica, usually containing about 70% SiO□
It contains about 20!1% by weight of Al2O3 and about 5% by weight of K2O.

[作用及び効果] 本発明によれば、安価で組成が比較的安定しているキラ
がケイ素源として用いられる故に、SiCウィスカーを
比較的安価に且つ容易に製造し得るのみならず、ウィス
カーの合成の際、キラ中(7)Aj! 203 、 K
20などがS i O2、IN a F等と反応してケ
イ酸塩融体を形成して、ウィスカー合成反応を促進し得
る。
[Operations and Effects] According to the present invention, since Chira, which is inexpensive and has a relatively stable composition, is used as a silicon source, SiC whiskers can not only be manufactured relatively cheaply and easily, but also be easily synthesized. At the time, Kira Junior High School (7) Aj! 203, K
20 and the like can react with S i O 2 , IN a F, etc. to form silicate melts and promote whisker synthesis reactions.

また、キラは通常組成の安定した微細粉の形で得られる
故、粉砕、師分などの操作が不要であり、前処理として
は乾燥のみで十分である。
Furthermore, since Kira is usually obtained in the form of a fine powder with a stable composition, operations such as crushing and dividing are not necessary, and drying alone is sufficient as a pretreatment.

混合原料中に加えられるNaFは、非酸化性雰囲気下で
加熱された際、S i 02とケイm塩融体を形成し、
5102とCとの反応を促進し、その結果混合原料から
の810やCoガスの発生を促進し、SICの合成反応
を促進する。
When NaF added to the mixed raw material is heated in a non-oxidizing atmosphere, it forms a silicon salt melt with S i 02,
It promotes the reaction between 5102 and C, thereby promoting the generation of 810 and Co gas from the mixed raw materials, and promoting the SIC synthesis reaction.

NaFの割合は長111NtSiCウィスカーの収率(
Siの量に関して二以下同)に敏感に影響を与え、Na
Fが8102に対してモル比で1124未満の場合、及
び1/2よりも多い場合、長繊維SiCウィスカーの収
率゛が5%以下になる。
The proportion of NaF is determined by the yield of long 111NtSiC whiskers (
Regarding the amount of Si (less than 2), the amount of Na
When the molar ratio of F to 8102 is less than 1124 or more than 1/2, the yield of long fiber SiC whiskers becomes 5% or less.

混合原料中に含まれるNaFの割合が多過ぎる場合、混
合原料を非酸化性雰囲気下で加熱した際に形成されるケ
イ酸塩融体の量が多くなり過ぎ、SiOやCOが急激に
発生し、系外すなわちウィスカー生成領域の外に未反応
のまま排出される3i成分が多くなると考えられる。
If the proportion of NaF contained in the mixed raw material is too high, the amount of silicate melt formed when the mixed raw material is heated in a non-oxidizing atmosphere becomes too large, and SiO and CO are rapidly generated. , it is thought that more 3i components are discharged unreacted to the outside of the system, that is, to the outside of the whisker generation region.

また、フッ化物の分圧が高くなり過ぎ、SiCウィスカ
ーの生成が妨げられると考えられる。
It is also believed that the partial pressure of fluoride becomes too high, which prevents the generation of SiC whiskers.

一方、NaFの割合が少な過ぎる場合には、十分な憬の
ケイ酸塩融体が形成されず、S i O2とCとの反応
に長い時間が必要となり、実際上SICウィスカーの収
率が低下すると考えられる。
On the other hand, if the proportion of NaF is too small, a sufficient amount of silicate melt will not be formed, and a long time will be required for the reaction between SiO2 and C, which will actually reduce the yield of SIC whiskers. It is thought that then.

また、混合原料中には、粉体状のSiCが合成され易く
なる。
Further, powdered SiC is easily synthesized in the mixed raw material.

尚、NaFは、Na5Aj’F6又はAj F3等の他
のフッ化物と比較して蒸気圧が高く生成物中への混入が
少なくてすむ点で好ましいが、場合によりてはNa5A
j’F6等他のフッ化物を用いてもよい。
Note that NaF is preferable compared to other fluorides such as Na5Aj'F6 or AjF3 because it has a high vapor pressure and is less likely to be mixed into the product.
Other fluorides such as j'F6 may also be used.

C源としては、活性炭素等の反応性の高いものでも、カ
ーボンブラック等のグラファイト性のもでもよい。
The C source may be a highly reactive material such as activated carbon or a graphitic material such as carbon black.

混合物中の炭素Cの割合は、5i02とほず過不足なく
反応する程度になるように定められ、Cが5in2に対
してモル比で1.5未満の場合には炭素分が不足して未
反応のSiO2が多量に残る虞れがあり、一方CがS 
i O2に対してモル比で5よりも多い場合には未反応
の炭素分が各社に残る虞れがある。従って、fL料の利
用効率の観点からは、混合原料において炭素源のCが二
酸化ケイ、素源の5i02に対してモル比で1.5〜5
であることが好ましい。
The proportion of carbon C in the mixture is determined so that it reacts with 5i02 in just the right amount, and if the molar ratio of C to 5in2 is less than 1.5, the carbon content is insufficient and unused. There is a risk that a large amount of SiO2 from the reaction will remain, while C is
If the molar ratio to iO2 is more than 5, there is a risk that unreacted carbon will remain in each company. Therefore, from the viewpoint of utilization efficiency of the fL material, the molar ratio of C as a carbon source in the mixed raw material to silicon dioxide and 5i02 as an elementary source is 1.5 to 5.
It is preferable that

尚加熱前において、S+O2,C及びNaFは均一に混
合される−ことが好ましく、場合によっては造粒しても
よい。
It is preferable that S+O2, C and NaF are uniformly mixed before heating, and may be granulated depending on the case.

混合物の加熱の際の非酸化性雰囲気は、Arからなるの
が好ましいが、ArのかわりにHa等の他の希ガス又は
N2を用いてもよい。
The non-oxidizing atmosphere during heating of the mixture is preferably made of Ar, but other rare gases such as Ha or N2 may be used instead of Ar.

尚、混合物を収容した領域及びウィスカー生成領域にA
r等の非酸化性雰囲気気体を単に入れておいても、また
これらの領域にAr等の非酸化性気体を所望の流速で流
すようにしてもよい。
Note that A is applied to the area containing the mixture and the whisker generation area.
A non-oxidizing atmospheric gas such as r may be simply introduced, or a non-oxidizing gas such as Ar may be allowed to flow through these regions at a desired flow rate.

非酸化性雰囲気下における前記混合物の加熱は、好まし
くは、1 、400〜1 、700℃の範囲の温度で行
なわれる。
Heating of the mixture under a non-oxidizing atmosphere is preferably carried out at a temperature in the range 1,400 to 1,700°C.

加熱81度が1400℃未満である場合、反応速度が低
下してSiCウィスカーの収率が低下する虞れがあり、
加熱温度が1700℃よりも高い場合、反応速度が高く
なり過ぎて、SiCのウィスカーよりもSiCの粉体が
生成される虞れがある。
If the heating temperature of 81 degrees is lower than 1400 degrees Celsius, there is a risk that the reaction rate will decrease and the yield of SiC whiskers will decrease.
When the heating temperature is higher than 1700° C., the reaction rate becomes too high and there is a possibility that SiC powder is generated rather than SiC whiskers.

本発明によれば、好ましくは、キラ中の8102を1モ
ル部、Cを1.5〜5モル部、NaFを1/24〜17
2モル部含む混合原料を、非酸化性雰囲気下で1400
〜1100℃に加熱してSiCウィスカーを製造する。
According to the present invention, preferably 1 mol part of 8102, 1.5 to 5 mol parts of C, and 1/24 to 17 mol of NaF in Kira.
A mixed raw material containing 2 mole parts was heated to 1400 molar parts in a non-oxidizing atmosphere.
Heating to ~1100°C produces SiC whiskers.

この場合、本発明によれば、混合原料の表面のウィスカ
ー生成空間に長さ数1程度の長繊維3iCウイスカーを
高収率で生成し得、且つ混合原料内部に長さが100−
前後のSiCウィスカーを生成し得る。
In this case, according to the present invention, long fiber 3iC whiskers with a length of about 1 can be produced in a high yield in the whisker generation space on the surface of the mixed raw material, and at the same time, long fiber 3iC whiskers with a length of about 1
Front and back SiC whiskers can be generated.

尚、この明細書において、S i Cウィスカーについ
て「繊維長が長い」又は1°長繊維」とは、長さが50
0%以上のSICウィスカーを指す。この長繊維SiC
ウィスカーを、例えばA1’*属と複合する複合強化繊
維として用いた場合、その複合効果は、長さが100声
以下のSICウィスカーと比較してはるかにすぐれてい
ると考えられる。
In this specification, regarding S i C whiskers, "long fiber length" or "1° long fiber" refers to a fiber length of 50
Refers to 0% or more SIC whiskers. This long fiber SiC
When a whisker is used as a composite reinforcing fiber composite with, for example, A1'* group, the composite effect is considered to be far superior to that of a SIC whisker having a length of 100 tones or less.

また、この明細1において、SiCウィスカーについて
収率とは、S iの利用量についてみたもので、SiC
ウィスカーを形成しているSi1が混合原料粉中のキラ
中のS i O2の3i量に対して占める割合をいう。
In addition, in Specification 1, the yield for SiC whiskers refers to the amount of Si used;
It refers to the ratio of Si1 forming whiskers to the 3i amount of SiO2 in the filler in the mixed raw material powder.

次に本発明方法を実施するための好ましい一例の装置に
ついて図面に基づいて説明する。
Next, a preferred example of an apparatus for carrying out the method of the present invention will be explained based on the drawings.

第1図において1はグラフフィト族のルツボであり、例
えば内径150−一のルツボ1の下部には、高さA(例
えば約301)まで、SiO2源としてのキラ、C源と
しての活性炭及びNaFの所定割合の混合粉2が収容さ
れる。このとき、ルツボ1の上部には、高さB(好まし
くはB≧5Aであり、例えば約1501)の範囲まで長
II維つィスカー生成用の空間3が形成されている。ル
ツボ1はグラフフィト族のかわりに、化学的安定性が高
いSiC等で形成されていてもよい。
In FIG. 1, reference numeral 1 is a graphite crucible. For example, in the lower part of the crucible 1 with an inner diameter of 150-1, Kira as a SiO2 source, activated carbon as a C source, and NaF A predetermined ratio of mixed powder 2 is accommodated. At this time, a space 3 for producing whiskers having a length II up to a height B (preferably B≧5A, for example about 1501) is formed in the upper part of the crucible 1. The crucible 1 may be made of SiC or the like, which has high chemical stability, instead of the graphite group.

ルツボ1は上部4で縮径されており、排気管として働く
グラファイトチューブ5 (例えば内径65■、長さ1
.30011 )に接続されている。
The diameter of the crucible 1 is reduced at the upper part 4, and a graphite tube 5 (for example, inner diameter 65 mm, length 1
.. 30011).

6はルツボ1をは望囲繞するように配置されたカーボン
製のヒータであり、ルツボ1及びヒータ6は更に、断熱
材ブロックからなる内側壁部7によって囲繞されている
。ルツボ1内の混合原料2を1400〜1700℃程度
に長時間加熱し続は得る限り、ヒータ6の形1位置1発
熱方式は他の形態(例えば高周波誘導加熱)でもよい。
Reference numeral 6 denotes a carbon heater arranged so as to surround the crucible 1, and the crucible 1 and the heater 6 are further surrounded by an inner wall portion 7 made of a heat insulating material block. As long as the mixed raw material 2 in the crucible 1 can be heated to about 1400 to 1700° C. for a long time and can be heated continuously, the heater 6 may have another form (for example, high-frequency induction heating).

8は断熱材ブロック製の外側壁部であり、ウィスカー生
成装!19の外枠を構成している外側壁部8は、壁部7
及びチューブ5を囲繞している。
8 is the outer wall made of insulation block and has a whisker generation device! The outer wall portion 8 constituting the outer frame of the wall portion 7
and surrounds the tube 5.

尚、グラファイトチューブ5の先端には別のチュー71
0が接続されており外壁部8を貫通して突出している。
Note that another tube 71 is attached to the tip of the graphite tube 5.
0 is connected and protrudes through the outer wall portion 8.

尚、ルツボ1の上端4、チューブ5.10の接続部は通
常完全には゛シールされていないが、所望な    □
らば完全にシールしてもよい。
Note that the connection between the upper end 4 of the crucible 1 and the tube 5.10 is usually not completely sealed, but as desired □
If it is, it may be completely sealed.

11は711r等の不活性気体の導入管であり、ウィス
カー製造の際、管11から所定の流1i1G(例えば2
00〜1,000 ffl/分;この明細書において、
気体の流速(流量)に関してai1分中のdは常温、常
圧下での量を示す)で導入されたArガスは、内側壁部
1と外側壁部8との間の筒状の空1i112を通った後
、外側壁部8とチューブ5との間の筒状の空間13を通
って流れ、流出口14から流出する。
Reference numeral 11 denotes a pipe for introducing an inert gas such as 711r, and when producing whiskers, a predetermined flow 1i1G (for example, 2
00-1,000 ffl/min; in this specification,
Regarding the gas flow rate (flow rate), the Ar gas introduced at ai1 minute (d indicates the amount at normal temperature and normal pressure) fills the cylindrical air 1i112 between the inner wall part 1 and the outer wall part 8. After passing through, it flows through the cylindrical space 13 between the outer wall 8 and the tube 5 and exits through the outlet 14.

尚、流入口11から流入し流出口14から流出する非酸
化性気体は、ヒータ6によって約1400〜1700℃
に加熱されるグラファイト製ルツボ1の外側とカーボン
ヒータ6との間の空1115及びカーボンヒータ6のま
わりの空1ffi1Bを非酸化性に保ち、また、その一
部(約50d/分程度)は、ルツボ1の上部4とチュー
ブ5との接続部からチューブ5内に入り、チューブ5を
通って流出する。
The non-oxidizing gas flowing in from the inlet 11 and flowing out from the outlet 14 is heated to about 1400 to 1700°C by the heater 6.
The space 1115 between the outside of the graphite crucible 1 and the carbon heater 6, which is heated to It enters the tube 5 from the connection between the upper part 4 of the crucible 1 and the tube 5, and flows out through the tube 5.

17は、ルツボ1内のウィスカー生成空間3にArガス
を導入可能なように外部からウィスカー生成空間まで貫
通しているガス導入管である。ウィスカー生成のための
原料混合粉2をルツボ1内に入れた後、ルツボ1を加熱
する前に、流入口18からArガスを導入し、ルツボ1
内及びチューブ5内を完全にArガスで満たし、その後
、流入口18を閏じる。
Reference numeral 17 denotes a gas introduction pipe that penetrates from the outside to the whisker generation space 3 so that Ar gas can be introduced into the whisker generation space 3 in the crucible 1. After putting the raw material mixed powder 2 for whisker generation into the crucible 1 and before heating the crucible 1, Ar gas is introduced from the inlet 18 and the crucible 1 is heated.
The inside of the tube 5 is completely filled with Ar gas, and then the inlet 18 is opened.

所望ならば、ルツボ1内にCO又はHF等の他の気体を
所望の間導入するためにも、この流入口18を利用し得
る。
If desired, this inlet 18 can also be used to introduce other gases such as CO or HF into the crucible 1 for a desired period of time.

尚、9aは測温用熱電対、9bはヒータ6の通電端子、
9Cは固定具である ウィスカーを生成させる際には、ヒータ6に通電してヒ
ータ6によってルツボ1を介して混合粉2を1400〜
1700℃の範囲内の所定温度゛「1に加熱すると共に
、ウィ゛スカーが生成されるべき空間3の温度T2及び
温度勾配ΔT2/Δ2(上方程低8りを25度/100
m−以上の所定値に保つ。
In addition, 9a is a thermocouple for temperature measurement, 9b is a current-carrying terminal of the heater 6,
9C is a fixture, and when generating whiskers, the heater 6 is energized and the mixed powder 2 is heated through the crucible 1 to 1400~
While heating to a predetermined temperature within the range of 1700°C, the temperature T2 of the space 3 where whiskers are to be generated and the temperature gradient ΔT2/Δ2 (from 8 to 25 degrees/100 degrees from upper to lower)
Maintain a predetermined value of m- or more.

尚ΔT2/ΔZは場所によって異なってもよく・例えば
下方程Δ゛r2/Δ2が大きくても、逆に上方程ΔT2
/Δ2が大きくてもよい。
Note that ΔT2/ΔZ may differ depending on the location. For example, even if Δ゛r2/Δ2 is larger in the lower part, ΔT2 in the upper part is larger.
/Δ2 may be large.

ΔT2/ΔZが200度/100gu+以下程度の範囲
内では、ΔT2/△2が大ぎい程良tjAMs i C
ウィスカーの収率が高くなる。
Within the range of ΔT2/ΔZ of 200 degrees/100gu+ or less, the larger ΔT2/Δ2 is, the better.
Higher whisker yield.

尚、ウィスカー生成空間3の温度は、好ましくは少なく
とも1200℃以上である。
Note that the temperature of the whisker generation space 3 is preferably at least 1200°C or higher.

尚、混合粉2の温度及びウィスカー生成空間3の所望部
位の温度は、熱雷対(図示せず)等の温度検出手段で検
出し、この検出手段で検出した温度に基づいて、ヒータ
6に流す電流を調整し、加熱を調整する。
The temperature of the mixed powder 2 and the temperature of a desired part of the whisker generation space 3 are detected by temperature detection means such as a thermocouple (not shown), and the heater 6 is controlled based on the temperature detected by this detection means. Adjust the current to flow and adjust the heating.

尚、図ではヒータ6は一つであるが、所望ならば、ルツ
ボ1の各部位の温度を調整し得るように複数の独立に加
熱制御可能なヒータを用いてもよい。
In the figure, there is only one heater 6, but if desired, a plurality of independently controllable heaters may be used so as to adjust the temperature of each part of the crucible 1.

温度勾配ΔT2/ΔZの調整は、例えば断熱材ブロック
7の位置、厚さ、長さ2等を変えることによっても行な
われ得るが、所望ならばルツボ1の外表面等を強制冷却
することによって調整するようにしてもよい。
The temperature gradient ΔT2/ΔZ can be adjusted, for example, by changing the position, thickness, length 2, etc. of the heat insulating block 7, but if desired, it can be adjusted by forcibly cooling the outer surface of the crucible 1, etc. You may also do so.

次に本発明の実施例について説明する。Next, examples of the present invention will be described.

実施例1 S102源としてのキラ(700℃での熱処理後の組成
、 S + 02    73.333重丸A1203  
20.03重量% Fe  OO,59重量% に20       s、1s重量% Na2O0,177重丸 MgO0108重量% T i 02     0.34重11%Ca OG、
06重量%) 中の5i02が1モル部、C(活性炭)が2モル部、N
aFが1/3モル部からなる講合粉をボールミルで混合
し、100(lの混合粉2をグラファイトルツボ1の下
部の原料充填領域2aに充填した。ルツボ1及びチュー
ブ5内の空気を流入口18からのArガスで完全に置換
し、流入口18を閉じた。
Example 1 Kira as S102 source (composition after heat treatment at 700°C, S + 02 73.333 Juumaru A1203
20.03 wt% Fe OO, 59 wt% to 20 s, 1 s wt% Na2O0, 177 weights MgO0 108 weight% T i 02 0.34 weights 11% Ca OG,
06% by weight), 1 mole part of 5i02, 2 mole parts of C (activated carbon), and N
A powder containing 1/3 mole part of aF was mixed in a ball mill, and 100 (l) of the mixed powder 2 was filled into the raw material filling area 2a at the bottom of the graphite crucible 1.The air in the crucible 1 and the tube 5 was The atmosphere was completely replaced with Ar gas from the inlet 18, and the inlet 18 was closed.

カーボンヒータ6での加熱によってルツボ1中の下部2
aの混合原料の温度°「1を12時g91570℃に保
った(ΔT2/Δz二100度/1001m )。
The lower part 2 in the crucible 1 is heated by the carbon heater 6.
The temperature of the mixed raw material in a was kept at 91570°C at 12 hours (ΔT2/Δz2100 degrees/1001 m2).

尚、ルツボ1の外側には、管11からc−so。Incidentally, on the outside of the crucible 1, there is a c-so from a pipe 11.

d/分でArガスを流した。Ar gas was flowed at d/min.

この結果、ルツボ1の上部のウィスカー生成空間3には
、太さが0.5〜1.0iI11で、長さが500JI
II以上の長繊維SiCウィスカーが14Q得られた。
As a result, the whisker generation space 3 at the top of the crucible 1 has a thickness of 0.5 to 1.0iI11 and a length of 500JI.
14Q long fiber SiC whiskers of II or higher were obtained.

これは、Siについてみると、収率的40%に相当する
This corresponds to a yield of 40% in terms of Si.

一方、ルツボ1の下部2aに残りた34Qの残渣2bに
ついてSEM観察及びX線回折で調べたところ、残漬2
b中には長さ10G、cm程度のSiCウィスカーがか
なりの割合で含まれていた。
On the other hand, when the 34Q residue 2b remaining in the lower part 2a of the crucible 1 was investigated by SEM observation and X-ray diffraction, it was found that
A considerable proportion of SiC whiskers with a length of about 10 G (cm) was contained in b.

監箆亘」 5i02源としてキラのかわりに沈降性無水ケイ酸を用
いた点、及び5i02(沈降性無水ケイIIりが1モル
部、C(活性炭)が2モル部、NaFが1/3モル部か
らなる混合粉2を130gルツボ1の下部の原料充填領
域に充填した点を除き実施例1と同様にしてSiCウィ
スカーの合成実験を行なった。
5i02 (precipitated anhydrous silica II is 1 mol part, C (activated carbon) is 2 mol parts, NaF is 1/3 mol). A SiC whisker synthesis experiment was carried out in the same manner as in Example 1, except that 130 g of mixed powder 2 consisting of

その結果、ルツボ1の上部のウィスカー生成空間3に太
さが0.1〜1声会蕃で長さが数■程度の長繊維SiC
ウィスカーが5g得られた。これはSiCについてみ−
ると収率10%に相当する。
As a result, in the whisker generation space 3 at the top of the crucible 1, long fibers of SiC with a thickness of 0.1 to 1 ring and a length of several square meters are formed.
5 g of whiskers were obtained. This is about SiC.
This corresponds to a yield of 10%.

一方ルツボ1の下部2aに残った42Qの残渣2bにつ
いて調べたところ、その大部分が長さ100 声前後の
SiCウィスカーがあった。
On the other hand, when the 42Q residue 2b remaining in the lower part 2a of the crucible 1 was examined, most of it was found to be SiC whiskers with a length of about 100 voices.

以上の実施例1及び比較例1の結果から明らかなとおり
、長繊維SiCウィスカーの生成に関する限り、純度が
高く反応性も高い沈降性無水ケイ酸のかわりに安価なキ
ラを使用し得ることがわかる。
As is clear from the results of Example 1 and Comparative Example 1 above, as far as the production of long-fiber SiC whiskers is concerned, it can be seen that inexpensive Kira can be used in place of precipitated silicic anhydride, which has high purity and high reactivity. .

このSiCウィスカーの合成に際して、キラ中のio、
Ko等は5h02.NaFなどと反応して、ケイ酸塩融
体を形成し、ウィスカー合成反応を促進すると考えられ
る。
When synthesizing this SiC whisker, io in Kira,
Ko et al. 5h02. It is thought that it reacts with NaF and the like to form a silicate melt and promote the whisker synthesis reaction.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明のSiCウィスカーの製造方法を実施するた
めの好ましい一例の製造装置の断面説明図である。 1・・・・・・ルツボ、2・・・・・・混合物、3・・
・・・・ウィスカー生成空間、6・・・・・・ヒータ、
A・・・・・・充填域の高さ、B・・・・・・生成域の
高さ。 出J喚人  斎 療  肇
The figure is a cross-sectional explanatory view of a preferable example of a manufacturing apparatus for carrying out the method for manufacturing SiC whiskers of the present invention. 1...crucible, 2...mixture, 3...
... Whisker generation space, 6 ... Heater,
A: Height of the filling region, B: Height of the production region. Ex-J member Hajime Sai Sou

Claims (3)

【特許請求の範囲】[Claims] (1)キラと炭素源とフッ化ナトリウム源とを含む混合
物を非酸化性雰囲気下で加熱してSiCウィスカーを製
造する方法。
(1) A method for producing SiC whiskers by heating a mixture containing Kira, a carbon source, and a sodium fluoride source in a non-oxidizing atmosphere.
(2)混合物が、キラに起因するSiO_2を1モル部
、Cを1.5〜5モル部、NaFを1/24〜1/2モ
ル部含むものである特許請求の範囲第1項に記載の方法
(2) The method according to claim 1, wherein the mixture contains 1 mole part of SiO_2 caused by Kira, 1.5 to 5 mole parts of C, and 1/24 to 1/2 mole part of NaF. .
(3)前記加熱温度が1,400〜1,700℃の間の
温度である特許請求の範囲第1項又は第2項に記載の方
法。
(3) The method according to claim 1 or 2, wherein the heating temperature is between 1,400 and 1,700°C.
JP60066229A 1985-03-29 1985-03-29 Production of sic whisker Pending JPS61227995A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60066229A JPS61227995A (en) 1985-03-29 1985-03-29 Production of sic whisker

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60066229A JPS61227995A (en) 1985-03-29 1985-03-29 Production of sic whisker

Publications (1)

Publication Number Publication Date
JPS61227995A true JPS61227995A (en) 1986-10-11

Family

ID=13309807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60066229A Pending JPS61227995A (en) 1985-03-29 1985-03-29 Production of sic whisker

Country Status (1)

Country Link
JP (1) JPS61227995A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0303479A2 (en) * 1987-08-12 1989-02-15 Alcan International Limited Method of preparing whiskers of silicon carbide and other materials
EP0353052A2 (en) * 1988-07-29 1990-01-31 Alcan International Limited Process for producing fibres composed of or coated with carbides or nitrides
JP2007223853A (en) * 2006-02-24 2007-09-06 National Institute For Materials Science Method for producing silicon carbide nanowire

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0303479A2 (en) * 1987-08-12 1989-02-15 Alcan International Limited Method of preparing whiskers of silicon carbide and other materials
EP0303479A3 (en) * 1987-08-12 1989-04-26 Alcan International Limited Method of preparing whiskers of silicon carbide and other materials
US4915924A (en) * 1987-08-12 1990-04-10 Alcan International Limited Method of preparing whiskers of silicon carbide and other materials
EP0353052A2 (en) * 1988-07-29 1990-01-31 Alcan International Limited Process for producing fibres composed of or coated with carbides or nitrides
US5116679A (en) * 1988-07-29 1992-05-26 Alcan International Limited Process for producing fibres composed of or coated with carbides or nitrides
JP2007223853A (en) * 2006-02-24 2007-09-06 National Institute For Materials Science Method for producing silicon carbide nanowire

Similar Documents

Publication Publication Date Title
JP2001146412A (en) Fluidized bed reactor and method for producing high- purity polycrystalline silicon
TW201037107A (en) Apparatus and method of manufacturing polysilicon
US4676968A (en) Melt consolidation of silicon powder
JP2003206126A (en) High-purity ultra-fine SiOx powder and method for producing the same
US3350166A (en) Synthesis of aluminum borate whiskers
JPS61227995A (en) Production of sic whisker
JPS60221398A (en) Manufacture of beta-type silicon nitride whisker by using killer as starting material
US4272488A (en) Apparatus for producing and casting liquid silicon
US4176166A (en) Process for producing liquid silicon
JP2003054933A (en) Reactor for silicon production
US3514256A (en) Fibrous corundum and its preparation
JPS61227993A (en) Production of sic whisker
JPS61227997A (en) Production of sic whisker
JPS61227998A (en) Production of sic whisker
JPS61227996A (en) Apparatus for production of sic whisker
JPS61227999A (en) Apparatus for production of sic whisker
JPS5820799A (en) Preparation of silicon carbide whisker
JPS6159243B2 (en)
JPS58213607A (en) Preparation of silicon imide and/or silicon nitride
JPS61227994A (en) Production of sic whisker
JPS5855315A (en) Method for manufacturing silicon nitride powder
JPS6296399A (en) Production of sic whisker
JPS61228000A (en) Apparatus for production of sic whisker
JPS5849611A (en) Silicon carbide and its manufacturing method
JPS5945637B2 (en) Method for manufacturing silicon carbide whiskers