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JPS61219800A - Production of silicon carbide whisker - Google Patents

Production of silicon carbide whisker

Info

Publication number
JPS61219800A
JPS61219800A JP60062266A JP6226685A JPS61219800A JP S61219800 A JPS61219800 A JP S61219800A JP 60062266 A JP60062266 A JP 60062266A JP 6226685 A JP6226685 A JP 6226685A JP S61219800 A JPS61219800 A JP S61219800A
Authority
JP
Japan
Prior art keywords
silicon carbide
carbide whiskers
grains
sulfide particles
sulfide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60062266A
Other languages
Japanese (ja)
Other versions
JPH058160B2 (en
Inventor
Teizo Hase
長谷 貞三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP60062266A priority Critical patent/JPS61219800A/en
Publication of JPS61219800A publication Critical patent/JPS61219800A/en
Publication of JPH058160B2 publication Critical patent/JPH058160B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/005Growth of whiskers or needles
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/36Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To obtain the titled whisker large in the aspect ratio at the low reaction temp. by charging both the sulfide grains of Si and the sulfide grains of Al in a specified reaction vessel and feeding a gaseous mixture of H2 and gaseous hydrocarbon under the heating. CONSTITUTION:After charging the spherical sulfide grains 4 of Si having 0.2-0.5mm diameter and the spherical sulfide grains 5 of Al having 0.2-0.5mm diameter so that the height ratio of the grains 4 and the grains 5 is regulated to about 50:1 in a reaction vessel 1 which is provided with a perforated plate 2 having plural gas blow-off ports 3 of about 0.1mm diameter to a base part, these are heated at 1,100-1,500 deg.C and held and a gaseous mixture of >=90% H2 and <=10% gaseous hydrocarbon (e.g. propylene) is fed in about 500cm<3>/min flow velocity through the gas blow-off port 3, and the SiC whiskers 6 are deposited and grown on the upper part of the sulfide grains 4 of Si and the sulfide grains 5 of Al.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、炭化珪素ウィスカーの製造方法に関し、詳し
くは、繊維強化複合材料(例えば、FRP・ FRM、
FRC等)における強化繊維として好適に適用すること
のできる炭化珪素ウィスカーの製造方法にかかる。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for producing silicon carbide whiskers, and more specifically, to a method for producing silicon carbide whiskers, and more specifically, to a method for producing silicon carbide whiskers.
The present invention relates to a method for producing silicon carbide whiskers that can be suitably applied as reinforcing fibers in FRC, etc.).

〔従来の技術〕[Conventional technology]

単結晶の繊維であるウィスカーを製造する基本的な技術
は、ウィスカーとなる成分元素からなる化学種を含有す
る気相と気相との化学反応によるものである。
The basic technology for producing whiskers, which are single-crystal fibers, is based on a chemical reaction between a gas phase and a gas phase containing chemical species consisting of constituent elements that form the whisker.

具体的には、従来の炭化珪素ウィスカーを製造する場合
においては、 ■ 固体Sin、と固体炭素との化学反応により炭化珪
素ウィスカーを製造する方法(例えば、特開昭56−1
00125号、特開昭57−101000号等)。
Specifically, in the case of manufacturing conventional silicon carbide whiskers, there are two methods:
No. 00125, JP-A-57-101000, etc.).

即ち、1350〜1600℃の高温において、上記の成
分からなる混合物から発生した気相SiOとCOにより
、 S i O* + CO= S i O+ COaS 
I O+ 3 CO−S i C+ 2 COt3G+
3CO2=6CO に示されるような化学反応に基づいて、第2ステツプの
反応によって炭化珪素ウィスカーを析出・成長させて炭
化珪素ウィスカーを製造する方法・■ CHtSiCl
>のような有機珪素化合物の熱分解により、炭化珪素ウ
ィスカーを製造する方法。
That is, at a high temperature of 1350 to 1600°C, gaseous SiO and CO generated from the mixture of the above components produce the following: SiO* + CO= SiO+ COaS
I O+ 3 CO-S i C+ 2 COt3G+
A method for producing silicon carbide whiskers by precipitating and growing silicon carbide whiskers through a second step reaction based on the chemical reaction shown by 3CO2=6CO ・■ CHtSiCl
A method for producing silicon carbide whiskers by thermal decomposition of an organosilicon compound such as

■ 4塩化珪素と4塩化炭素と水素とにより、5iC1
,+cC14+4H2=sic+8C1 に示されるような化学反応に基づいて、ハライドと水素
或いは炭化水素ガスの気相反応により炭化珪素ウィスカ
ーを製造する方法(例えば、特開昭58−49697号
等)。
■ By silicon tetrachloride, carbon tetrachloride and hydrogen, 5iC1
, +cC14+4H2=sic+8C1 A method for producing silicon carbide whiskers by a gas phase reaction of halide and hydrogen or hydrocarbon gas (for example, JP-A-58-49697, etc.).

等の方法が採用されている。The following methods have been adopted.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上述のような従来の技術の現状に鑑み、本発明が解決し
ようとする問題点は、従来の炭化珪素ウィスカーの製造
方法においては、炭化珪素ウィスカーの製造のための反
応温度が高いばかりでなく、直径に対する長さの比、い
わゆる、アスペクト比の大きい炭化珪素ウィスカーを量
産的に製造することが困難であったということである。
In view of the current state of the conventional technology as described above, the problem that the present invention attempts to solve is that in the conventional method for producing silicon carbide whiskers, not only the reaction temperature for producing silicon carbide whiskers is high; It has been difficult to mass-produce silicon carbide whiskers with a large length-to-diameter ratio, or so-called aspect ratio.

従って、本発明の技術的課題とするところは、珪素の硫
化物粒子とアルミニウムの硫化物粒子とが装填された反
応容器を、1100〜1500℃にて加熱保持するとと
もに前記多孔板に穿設された多数のガス吹出口より水素
と炭化水素ガスとの混合ガスを送給することによって、
従来の炭化珪素ウィスカーの製造方法に比較して反応温
度を低温とすることができるばかりでなく、大量生産可
能であり、しかも、効率良くアスペクト比の大きい炭化
珪素ウィスカーの製造を可能とす為ことにある。
Therefore, the technical problem of the present invention is to heat and maintain a reaction vessel loaded with silicon sulfide particles and aluminum sulfide particles at 1100 to 1500°C, and to By supplying a mixed gas of hydrogen and hydrocarbon gas from multiple gas outlets,
This is because not only can the reaction temperature be lowered compared to conventional silicon carbide whisker manufacturing methods, but also mass production is possible, and moreover, it is possible to efficiently manufacture silicon carbide whiskers with a large aspect ratio. It is in.

〔問題点を解決するための手段〕[Means for solving problems]

このような従来の技術における問題点に鑑み、本発明に
おける従来の技術の問題点を解決するための手段は、底
部に多数のガス吹出口を有する多孔板が配設された反応
容器の底部多孔板上に珪素の硫化物粒子を装填し、その
上層部にアルミニウムの硫化物粒子を装填・配置する工
程と、上述により珪素の硫化物粒子とアルミニウムの硫
化物粒子とが装填された反応容器を、1100〜150
0℃にて加熱保持するとともに前記多孔板に穿設された
多数のガス吹出口より水素と炭化水素ガスとの混合ガス
を送給する工程とからなり、珪素の硫化物粒子及びアル
ミニウムの硫化物粒子の装填された層の上方部に、炭化
珪素ウィスカーを析出・成長させることを特徴とする炭
化珪素ウィスカーの製造方法からなっている。
In view of such problems in the conventional technology, the present invention provides a means for solving the problems in the conventional technology by using a porous bottom part of a reaction vessel in which a perforated plate having a large number of gas outlets is disposed at the bottom part. A step of loading silicon sulfide particles on a plate and loading and arranging aluminum sulfide particles on the upper layer thereof, and a reaction vessel loaded with silicon sulfide particles and aluminum sulfide particles as described above. , 1100-150
It consists of a step of heating and holding at 0°C and feeding a mixed gas of hydrogen and hydrocarbon gas from a large number of gas outlets bored in the perforated plate, and silicon sulfide particles and aluminum sulfide particles are removed. This method consists of producing silicon carbide whiskers, which is characterized by precipitating and growing silicon carbide whiskers above a layer loaded with particles.

〔作用〕[Effect]

以下、本発明の作用について説明する。 Hereinafter, the effects of the present invention will be explained.

本発明の炭化珪素ウィスカーの製造方法において、炭化
珪素ウィスカーの製造のための気相生成成分として、珪
素の硫化物粒子とアルミニウムの硫化物粒子とを用いる
こととしているのは、硫化物の蒸気圧が酸化物の蒸気圧
より高いことを利用することによって、炭化珪素ウィス
カー生成のための珪素の蒸気種濃度を高めるためである
In the method for producing silicon carbide whiskers of the present invention, silicon sulfide particles and aluminum sulfide particles are used as vapor phase generating components for producing silicon carbide whiskers because the vapor pressure of the sulfide This is to increase the concentration of silicon vapor species for producing silicon carbide whiskers by taking advantage of the fact that is higher than the vapor pressure of the oxide.

また、本発明の炭化珪素ウィスカーの製造方法において
、珪素の硫化物粒子とアルミニウムの硫化物粒子とが装
填された反応容器を、1100〜1500℃にて加熱保
持するとともに前記多孔板に穿設された多数のガス吹出
口より水素と炭化水素ガスとの混合ガスを送給すること
としているのは、珪素の硫化物粒子を高温にて気化させ
水素と炭化水素ガスとを化学反応させて、炭化珪素ウィ
スカーの成長促進剤としてアルミニウムを用いることに
より、従来法に比較して反応温度を低温とすることがで
きるばかりでなく、大量生産可能であり、しかも、効率
良くアスペクト比の大きい炭化珪素ウィスカーの製造を
可能とするためである。
Further, in the method for producing silicon carbide whiskers of the present invention, a reaction vessel loaded with silicon sulfide particles and aluminum sulfide particles is heated and held at 1100 to 1500°C, and the perforated plate is bored. The mixed gas of hydrogen and hydrocarbon gas is supplied from a large number of gas outlets.Silicon sulfide particles are vaporized at high temperature and the hydrogen and hydrocarbon gas undergo a chemical reaction. By using aluminum as a growth promoter for silicon whiskers, not only can the reaction temperature be lowered compared to conventional methods, but also mass production is possible, and moreover, silicon carbide whiskers with a large aspect ratio can be efficiently grown. This is to enable manufacturing.

また、本発明の炭化珪素ウィスカーの製造方法において
、反応容器にまず珪素の硫化物粒子を装填し、その上層
部にアルミニウムの硫化物粒子を装填・配置することと
しているのは、化学反応する気相中にアルミニウムを含
有させることによって、アルミニウムが存在しない場合
に成長するβ−3iC(立方晶)の一部を六方晶化(2
H多形のS i C)させ、炭化珪素ウィスカーの形状
を維持させ易くし、非常に長いウィスカーに成長させる
ことを可能とするためである。
In addition, in the method for producing silicon carbide whiskers of the present invention, silicon sulfide particles are first loaded into the reaction vessel, and aluminum sulfide particles are loaded and arranged in the upper layer because the chemical reaction gas is By including aluminum in the phase, a part of β-3iC (cubic crystal) that would grow in the absence of aluminum is converted into hexagonal crystal (2
This is to make it easier to maintain the shape of silicon carbide whiskers and to allow them to grow into very long whiskers.

また、本発明の炭化珪素ウィスカーの製造方法において
、炭化珪素ウィスカーを製造するための反応温度を11
00−1500℃しているのは、1100℃以下におい
ては反応速度が遅く、1500℃を越えるとアルミニウ
ムの硫化物粒子が昇華して消失して望ましくないからで
ある。
Further, in the method for producing silicon carbide whiskers of the present invention, the reaction temperature for producing silicon carbide whiskers is set to 11
The temperature is set at 00-1500°C because the reaction rate is slow below 1100°C, and when it exceeds 1500°C, aluminum sulfide particles sublime and disappear, which is not desirable.

〔実施例〕〔Example〕

以下、添付図面に基づいて、本発明の1実施例を説明す
る。
Hereinafter, one embodiment of the present invention will be described based on the accompanying drawings.

図は、本発明法により炭化珪素ウィスカーを製造してい
る状況を示す図である。
The figure shows a situation in which silicon carbide whiskers are manufactured by the method of the present invention.

まず、平均粒径が15μの珪素の硫化物粒子を造粒して
、直径を0.2〜0.51嘗の大きさとした珪素硫化物
球状粒子4を、第1図に示すような直径が80鶴、高さ
が400mからなる炭化珪素製の反応容器1に装填し、
珪素硫化物球状粒子4の上層部に、平均粒径が4μのア
ルミニウムの硫化物粒子を造粒して直径を0.2〜0.
5鰭の大きさとしたアルミニウム硫化物球状粒子5を、
珪素硫化物球状粒子4とアルミニウム硫化物球状粒子5
の層の高さ比にて50:1として装填・配置した。
First, silicon sulfide particles 4 having a diameter of 0.2 to 0.51 mm are obtained by granulating silicon sulfide particles with an average particle size of 15 μm, and the diameter is as shown in FIG. 80 cranes were loaded into a silicon carbide reaction vessel 1 with a height of 400 m,
Aluminum sulfide particles with an average particle size of 4 μm are granulated in the upper layer of the silicon sulfide spherical particles 4 to have a diameter of 0.2 to 0.0 μm.
5 Aluminum sulfide spherical particles 5 having the size of a fin,
Silicon sulfide spherical particles 4 and aluminum sulfide spherical particles 5
The layers were loaded and arranged at a layer height ratio of 50:1.

そして、反応容器lの底部に配設された多孔板2には、
直径0.1 tarの多数のガス吹出口3を有しており
、ガス吹出口3を経由して反応容器l内に対して、反応
容器1における反応温度が1100℃に達するまでは水
素のみを送給し、上記反応温度に達してからは水素と炭
化水素ガスの混合ガスを送給した。
Then, on the perforated plate 2 arranged at the bottom of the reaction vessel l,
It has a large number of gas outlets 3 with a diameter of 0.1 tar, and only hydrogen is supplied to the inside of the reaction vessel l via the gas outlets 3 until the reaction temperature in the reaction vessel 1 reaches 1100°C. After the reaction temperature reached the above reaction temperature, a mixed gas of hydrogen and hydrocarbon gas was fed.

なお、炭化水素ガスとしては、メタン、プロパン、プロ
ピレン、アセチレン、ベンゼン、トルエン、メチルエチ
ルケトン等を好適に利用することができるが、上述の炭
化水素ガスの中ではプロピレンとベンゼンを使用した場
合において炭化珪素ウィスカーの収率が優れていた。
As the hydrocarbon gas, methane, propane, propylene, acetylene, benzene, toluene, methyl ethyl ketone, etc. can be suitably used, but among the above hydrocarbon gases, when propylene and benzene are used, silicon carbide The whisker yield was excellent.

また、水素に°対する炭化水素ガスの濃度は10%以下
が望ましく、炭化水素ガスの濃度が濃くなるにつれてす
すを混在するようになる。
Further, the concentration of hydrocarbon gas relative to hydrogen is preferably 10% or less, and as the concentration of hydrocarbon gas becomes higher, soot becomes mixed.

なお、アセチレンの場合においては、低濃度で有効であ
った・ そして、ガス流速500 c4/ min 、温度13
0Q”C,プロピレン;7%の条件にて生成した炭化珪
素ウィスカー6は、直径が5〜10μであって長さが数
CnIオーダーとなり、通常の従来法Gこより製造され
た炭化珪素ウィスカーである数百μのものに比較して、
著しくアスペクト比が大きい炭化珪素ウィスカーを製造
させることができた。
In the case of acetylene, it was effective at low concentrations.The gas flow rate was 500 c4/min and the temperature was 13.
The silicon carbide whiskers 6 produced under the conditions of 0Q"C, propylene and 7% have a diameter of 5 to 10 μ and a length on the order of several CnI, and are silicon carbide whiskers produced by the usual conventional method G. Compared to those of several hundred microns,
Silicon carbide whiskers with a significantly large aspect ratio could be produced.

〔発明の効果〕 以上により明らかなように、本発明にかかる炭化珪素ウ
ィスカーの製造方法によれば、珪素の硫化物粒子とアル
ミニウムの硫化物粒子とが装填された反応容器を、11
.00〜1500°Cにて加熱保持するとともに前記多
孔板に穿設された多数のガス吹出口より水素と炭化水素
ガスとの混合ガスを送給することによって、従来の炭化
珪素ウィスカーの製造方法に比較して反応温度を低温と
することができるばかりでなく、大量生産可能であり、
しかも、効率良くアスペクト比の大きい炭化珪素ウィス
カーの製造を可能とすることができる利点がある。
[Effects of the Invention] As is clear from the above, according to the method for producing silicon carbide whiskers according to the present invention, a reaction vessel loaded with silicon sulfide particles and aluminum sulfide particles is heated to 11
.. By heating and holding at 00 to 1,500°C and supplying a mixed gas of hydrogen and hydrocarbon gas from a large number of gas outlets provided in the perforated plate, the conventional method for producing silicon carbide whiskers can be applied. In comparison, not only can the reaction temperature be lowered, but also mass production is possible.
Moreover, there is an advantage that silicon carbide whiskers with a large aspect ratio can be efficiently produced.

【図面の簡単な説明】[Brief explanation of drawings]

図は、本発明法により炭化珪素ウィスカーを製造してい
る状況を示す図である。 1−・−・−反応容器。 2・−・−多孔板。 3−−−−−−ガス吹出口。 4−・・−・珪素硫化物球状粒子。 5・−−−一−アルミニウム硫化物球状粒子。 6−−−−−・炭化珪素ウィスカー。 出願人  トヨタ自動車株式会社 1−反〜容器 2−り糺板 3−η゛又吹出口 4−■生41群し化物玉F4大オ立2±5−7ルミ二つ
i−鎮しイtm玉茨デ尺〕iΣチローJイ乙辻嚢つイヌ
カ−
The figure shows a situation in which silicon carbide whiskers are manufactured by the method of the present invention. 1-・-・-Reaction container. 2.---perforated plate. 3------Gas outlet. 4-...Silicon sulfide spherical particles. 5.----mono-aluminum sulfide spherical particles. 6-------Silicon carbide whiskers. Applicant: Toyota Motor Corporation 1 - Container 2 - Paste plate 3 - η Also air outlet 4 - Raw 41 group monster ball F4 large vertical 2 ± 5-7 Luminous two i - Calm itm Tamara Deshaku〕iΣ Chiro J I Otsuji Bag Tsu Inuka-

Claims (1)

【特許請求の範囲】 1、底部に多数のガス吹出口を有する多孔板が配設され
た反応容器の底部多孔板上に珪素の硫化物粒子を装填し
、その上層部にアルミニウムの硫化物粒子を装填・配置
する工程と、 上述により珪素の硫化物粒子とアルミニウムの硫化物粒
子とが装填された反応容器を、1100〜1500℃に
て加熱保持するとともに前記多孔板に穿設された多数の
ガス吹出口より水素と炭化水素ガスとの混合ガスを送給
する工程とからなり、珪素の硫化物粒子及びアルミニウ
ムの硫化物粒子の装填された層の上方部に、炭化珪素ウ
イスカーを析出・成長させることを特徴とする炭化珪素
ウイスカーの製造方法。
[Scope of Claims] 1. Silicon sulfide particles are loaded onto the bottom perforated plate of a reaction vessel in which a perforated plate having a large number of gas outlets is disposed at the bottom, and aluminum sulfide particles are loaded onto the bottom perforated plate. The reaction vessel loaded with silicon sulfide particles and aluminum sulfide particles as described above is heated and held at 1100 to 1500°C, and a large number of holes bored in the perforated plate are The process consists of feeding a mixed gas of hydrogen and hydrocarbon gas from the gas outlet, and silicon carbide whiskers are precipitated and grown on the upper part of the layer loaded with silicon sulfide particles and aluminum sulfide particles. A method for producing silicon carbide whiskers, the method comprising:
JP60062266A 1985-03-26 1985-03-26 Production of silicon carbide whisker Granted JPS61219800A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60062266A JPS61219800A (en) 1985-03-26 1985-03-26 Production of silicon carbide whisker

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60062266A JPS61219800A (en) 1985-03-26 1985-03-26 Production of silicon carbide whisker

Publications (2)

Publication Number Publication Date
JPS61219800A true JPS61219800A (en) 1986-09-30
JPH058160B2 JPH058160B2 (en) 1993-02-01

Family

ID=13195169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60062266A Granted JPS61219800A (en) 1985-03-26 1985-03-26 Production of silicon carbide whisker

Country Status (1)

Country Link
JP (1) JPS61219800A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0218400A (en) * 1988-07-07 1990-01-22 Chugai Ro Co Ltd Device for producing si-based whisker

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0218400A (en) * 1988-07-07 1990-01-22 Chugai Ro Co Ltd Device for producing si-based whisker

Also Published As

Publication number Publication date
JPH058160B2 (en) 1993-02-01

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