JPS6118736B2 - - Google Patents
Info
- Publication number
- JPS6118736B2 JPS6118736B2 JP1132377A JP1132377A JPS6118736B2 JP S6118736 B2 JPS6118736 B2 JP S6118736B2 JP 1132377 A JP1132377 A JP 1132377A JP 1132377 A JP1132377 A JP 1132377A JP S6118736 B2 JPS6118736 B2 JP S6118736B2
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- ethylenically unsaturated
- water
- carboxylic acid
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 claims description 43
- 229920000642 polymer Polymers 0.000 claims description 33
- -1 alkali metal salt Chemical class 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 23
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 15
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 10
- 150000003839 salts Chemical group 0.000 claims description 10
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 9
- 239000003999 initiator Substances 0.000 claims description 9
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 8
- 125000000466 oxiranyl group Chemical group 0.000 claims description 8
- 239000000470 constituent Substances 0.000 claims description 7
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 claims description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 5
- 150000001733 carboxylic acid esters Chemical class 0.000 claims description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 4
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 4
- 239000000194 fatty acid Substances 0.000 claims description 4
- 229930195729 fatty acid Natural products 0.000 claims description 4
- 150000002825 nitriles Chemical class 0.000 claims description 4
- 229920001567 vinyl ester resin Polymers 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000003863 ammonium salts Chemical class 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 21
- 238000007639 printing Methods 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 239000002904 solvent Substances 0.000 description 15
- 229920005601 base polymer Polymers 0.000 description 14
- 150000002148 esters Chemical class 0.000 description 13
- 238000007259 addition reaction Methods 0.000 description 11
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 239000003112 inhibitor Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- 150000001298 alcohols Chemical class 0.000 description 6
- 238000006386 neutralization reaction Methods 0.000 description 6
- 239000000945 filler Substances 0.000 description 5
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000004014 plasticizer Substances 0.000 description 5
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 5
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000003431 cross linking reagent Substances 0.000 description 4
- 238000012719 thermal polymerization Methods 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 239000001530 fumaric acid Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- 239000003504 photosensitizing agent Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000008399 tap water Substances 0.000 description 3
- 235000020679 tap water Nutrition 0.000 description 3
- 229920003169 water-soluble polymer Polymers 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000007809 chemical reaction catalyst Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 239000010893 paper waste Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- OVYTZAASVAZITK-UHFFFAOYSA-M sodium;ethanol;hydroxide Chemical compound [OH-].[Na+].CCO OVYTZAASVAZITK-UHFFFAOYSA-M 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- NNSUABWOUMCGLN-UHFFFAOYSA-N (2,5-diphenylphenyl)-phenylmethanone Chemical compound C=1C(C=2C=CC=CC=2)=CC=C(C=2C=CC=CC=2)C=1C(=O)C1=CC=CC=C1 NNSUABWOUMCGLN-UHFFFAOYSA-N 0.000 description 1
- YXMYPHLWXBXNFF-UHFFFAOYSA-N (2-chlorophenyl)-(4-chlorophenyl)methanone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=CC=C1Cl YXMYPHLWXBXNFF-UHFFFAOYSA-N 0.000 description 1
- VMHYWKBKHMYRNF-UHFFFAOYSA-N (2-chlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1 VMHYWKBKHMYRNF-UHFFFAOYSA-N 0.000 description 1
- IKCBNUVGOJSNDB-UHFFFAOYSA-N (2-methylphenyl)-(4-methylphenyl)methanone Chemical compound C1=CC(C)=CC=C1C(=O)C1=CC=CC=C1C IKCBNUVGOJSNDB-UHFFFAOYSA-N 0.000 description 1
- UJHSIDUUJPTLDY-UHFFFAOYSA-N (2-nitrophenyl)-phenylmethanone Chemical compound [O-][N+](=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 UJHSIDUUJPTLDY-UHFFFAOYSA-N 0.000 description 1
- URBLVRAVOIVZFJ-UHFFFAOYSA-N (3-methylphenyl)-phenylmethanone Chemical compound CC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1 URBLVRAVOIVZFJ-UHFFFAOYSA-N 0.000 description 1
- RBKHNGHPZZZJCI-UHFFFAOYSA-N (4-aminophenyl)-phenylmethanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=CC=C1 RBKHNGHPZZZJCI-UHFFFAOYSA-N 0.000 description 1
- NPENBPVOAXERED-UHFFFAOYSA-N (4-benzoylphenyl)-phenylmethanone Chemical compound C=1C=C(C(=O)C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 NPENBPVOAXERED-UHFFFAOYSA-N 0.000 description 1
- WLQXEFXDBYHMRG-UPHRSURJSA-N (z)-4-(oxiran-2-ylmethoxy)-4-oxobut-2-enoic acid Chemical compound OC(=O)\C=C/C(=O)OCC1CO1 WLQXEFXDBYHMRG-UPHRSURJSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- QWQFVUQPHUKAMY-UHFFFAOYSA-N 1,2-diphenyl-2-propoxyethanone Chemical compound C=1C=CC=CC=1C(OCCC)C(=O)C1=CC=CC=C1 QWQFVUQPHUKAMY-UHFFFAOYSA-N 0.000 description 1
- NICBEWDPKDDXRY-UHFFFAOYSA-N 1,2-diphenyl-2-trimethylsilyloxyethanone Chemical compound C=1C=CC=CC=1C(O[Si](C)(C)C)C(=O)C1=CC=CC=C1 NICBEWDPKDDXRY-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- DULLEKOHORMWFS-UHFFFAOYSA-N 1-(4-benzoylphenyl)ethanone Chemical compound C1=CC(C(=O)C)=CC=C1C(=O)C1=CC=CC=C1 DULLEKOHORMWFS-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2,2'-azo-bis-isobutyronitrile Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- AOGNACZDZNOTSN-UHFFFAOYSA-N 2,3-dihydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(O)(CO)C(=O)C1=CC=CC=C1 AOGNACZDZNOTSN-UHFFFAOYSA-N 0.000 description 1
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- DBBSWURSQHDBEQ-UHFFFAOYSA-N 2-butan-2-yloxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC(C)CC)C(=O)C1=CC=CC=C1 DBBSWURSQHDBEQ-UHFFFAOYSA-N 0.000 description 1
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- FOKPRFXQNLWVJG-UHFFFAOYSA-N 2-ethoxy-3-hydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(CO)(OCC)C(=O)C1=CC=CC=C1 FOKPRFXQNLWVJG-UHFFFAOYSA-N 0.000 description 1
- WROUWQQRXUBECT-UHFFFAOYSA-N 2-ethylacrylic acid Chemical compound CCC(=C)C(O)=O WROUWQQRXUBECT-UHFFFAOYSA-N 0.000 description 1
- CKKQLOUBFINSIB-UHFFFAOYSA-N 2-hydroxy-1,2,2-triphenylethanone Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(O)C(=O)C1=CC=CC=C1 CKKQLOUBFINSIB-UHFFFAOYSA-N 0.000 description 1
- FSJIAFAPQGPONH-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylbutan-1-one Chemical compound C=1C=CC=CC=1C(O)(CC)C(=O)C1=CC=CC=C1 FSJIAFAPQGPONH-UHFFFAOYSA-N 0.000 description 1
- RZCDMINQJLGWEP-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpent-4-en-1-one Chemical compound C=1C=CC=CC=1C(CC=C)(O)C(=O)C1=CC=CC=C1 RZCDMINQJLGWEP-UHFFFAOYSA-N 0.000 description 1
- DIVXVZXROTWKIH-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(O)(C)C(=O)C1=CC=CC=C1 DIVXVZXROTWKIH-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- IMAHLMWOKFATMM-UHFFFAOYSA-N 2-methoxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(C)(OC)C(=O)C1=CC=CC=C1 IMAHLMWOKFATMM-UHFFFAOYSA-N 0.000 description 1
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 1
- AXYQEGMSGMXGGK-UHFFFAOYSA-N 2-phenoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(=O)C(C=1C=CC=CC=1)OC1=CC=CC=C1 AXYQEGMSGMXGGK-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- LKVFCSWBKOVHAH-UHFFFAOYSA-N 4-Ethoxyphenol Chemical compound CCOC1=CC=C(O)C=C1 LKVFCSWBKOVHAH-UHFFFAOYSA-N 0.000 description 1
- CIICLJLSRUHUBY-UHFFFAOYSA-N 4-[(2-methylpropan-2-yl)oxy]phenol Chemical compound CC(C)(C)OC1=CC=C(O)C=C1 CIICLJLSRUHUBY-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical class OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- SHKWSBAVRQZYLE-UHFFFAOYSA-N 5-oxo-5-phenylpentanoic acid Chemical compound OC(=O)CCCC(=O)C1=CC=CC=C1 SHKWSBAVRQZYLE-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- UIERETOOQGIECD-UHFFFAOYSA-N Angelic acid Natural products CC=C(C)C(O)=O UIERETOOQGIECD-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001339 alkali metal compounds Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- UIERETOOQGIECD-ARJAWSKDSA-N angelic acid Chemical compound C\C=C(\C)C(O)=O UIERETOOQGIECD-ARJAWSKDSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- LHMRXAIRPKSGDE-UHFFFAOYSA-N benzo[a]anthracene-7,12-dione Chemical compound C1=CC2=CC=CC=C2C2=C1C(=O)C1=CC=CC=C1C2=O LHMRXAIRPKSGDE-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- YOUGRGFIHBUKRS-UHFFFAOYSA-N benzyl(trimethyl)azanium Chemical compound C[N+](C)(C)CC1=CC=CC=C1 YOUGRGFIHBUKRS-UHFFFAOYSA-N 0.000 description 1
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- PVEOYINWKBTPIZ-UHFFFAOYSA-N but-3-enoic acid Chemical compound OC(=O)CC=C PVEOYINWKBTPIZ-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000586 desensitisation Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- FRNQMDDRJXSCAX-UHFFFAOYSA-N ethane;prop-2-enoic acid Chemical compound CC.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C FRNQMDDRJXSCAX-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- YQCFXPARMSSRRK-UHFFFAOYSA-N n-[6-(prop-2-enoylamino)hexyl]prop-2-enamide Chemical compound C=CC(=O)NCCCCCCNC(=O)C=C YQCFXPARMSSRRK-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- QMQNMBYPQFQQPK-UHFFFAOYSA-N n-methoxyprop-2-enamide Chemical compound CONC(=O)C=C QMQNMBYPQFQQPK-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OPECTNGATDYLSS-UHFFFAOYSA-N naphthalene-2-sulfonyl chloride Chemical compound C1=CC=CC2=CC(S(=O)(=O)Cl)=CC=C21 OPECTNGATDYLSS-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- LIGACIXOYTUXAW-UHFFFAOYSA-N phenacyl bromide Chemical compound BrCC(=O)C1=CC=CC=C1 LIGACIXOYTUXAW-UHFFFAOYSA-N 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- YLLIGHVCTUPGEH-UHFFFAOYSA-M potassium;ethanol;hydroxide Chemical compound [OH-].[K+].CCO YLLIGHVCTUPGEH-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000004059 quinone derivatives Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
【発明の詳細な説明】
本発明は、水のみで現像可能な、新規な光重合
性組成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel photopolymerizable composition that is developable only with water.
従来の光重合性組成物は、他の感光材料に比
べ、その硬化後の強度、耐薬品性等が良好なた
め、印刷用プレート、レジスト等に広く使われて
いる。しかしながら、これらのものは現像の際
に、溶剤又は溶剤を含むアルカリ溶液を用いねば
ならず、このため、作業員が現像時に溶剤の蒸気
を吸入したり、作業場に臭気がたちこむ等作業環
境が悪く、さらに可燃性溶剤の場合には引火の危
険があり、また、現像廃液が高濃度の有機物を含
む場合はその処理装置を必要とする等、種々の問
題があつた。 Conventional photopolymerizable compositions have better strength and chemical resistance after curing than other photosensitive materials, and are therefore widely used in printing plates, resists, and the like. However, these products require the use of a solvent or an alkaline solution containing a solvent during development, which creates a poor working environment such as workers inhaling solvent vapor and odor in the workplace. Moreover, in the case of using a flammable solvent, there is a risk of ignition, and when the developer waste solution contains a high concentration of organic matter, a treatment device is required.
また、有機溶剤やアルカリ溶剤を用いる現像方
法においては、樹脂を膨潤させ、これをブラツシ
ングなどにより強制的に除去させるため、解像
性、耐刷性がそこなわれるし、アルカリ溶液を用
いる場合にはさらにベースとなる亜鉛やアルミニ
ウムの表面が腐食され、不均質なものとなるとい
う欠点がある。他方において、水のみにより現像
しうる光重合性組成物もいくつか提案されてい
る。この光重合性組成物は、水溶性高分子と光重
合性エチレン性不飽和化合物と光重合開始剤とか
ら成り、前記エチレン性不飽和化合物を光重合さ
せて重合体を形成させると同時に、その組織中に
水溶性高分子を包絡することにより硬化が行われ
る。 In addition, in developing methods that use organic solvents or alkaline solvents, the resin swells and is forcibly removed by brushing, which impairs resolution and printing durability. Another drawback is that the surface of the base zinc or aluminum is corroded, making it non-uniform. On the other hand, some photopolymerizable compositions that can be developed only with water have also been proposed. This photopolymerizable composition consists of a water-soluble polymer, a photopolymerizable ethylenically unsaturated compound, and a photopolymerization initiator, and simultaneously photopolymerizes the ethylenically unsaturated compound to form a polymer. Curing is performed by enveloping water-soluble polymers in the tissue.
しかし、この種の光重合性組成物を用いて得ら
れる平版印刷版は、印刷開始時にインキの転移性
が悪く、不良の印刷物が増えヤレ紙の増加となつ
たり、また印刷中に湿し水により水溶性高分子が
溶け出すためか、実用上十分な耐刷性を得ること
が困難である等の欠点がある。そこでこれらの欠
点を解消すべく検討した結果、重合体と架橋剤と
光重合開始剤とからなる光重合性組成物におい
て、該重合体の側鎖にエチレン性不飽和基と水溶
性塩の基とを導入することにより、感光液自身が
溶剤タイプであつても塗布乾燥後は水のみで現像
可能であり、かつインキの転移性の良好な耐印刷
性のある印刷版を作成することのできる光重合性
組成物が得られることを見出した。本発明は、こ
の知見に基いてなされたものである。 However, lithographic printing plates obtained using this type of photopolymerizable composition have poor ink transfer properties at the start of printing, resulting in an increase in the number of defective prints and an increase in waste paper. This has drawbacks such as difficulty in obtaining practically sufficient printing durability, probably because the water-soluble polymer dissolves out. Therefore, as a result of studies to eliminate these drawbacks, we found that in a photopolymerizable composition consisting of a polymer, a crosslinking agent, and a photopolymerization initiator, ethylenically unsaturated groups and water-soluble salt groups were added to the side chains of the polymer. By introducing this, even if the photosensitive liquid itself is a solvent type, it is possible to create a printing plate that can be developed with only water after application and drying, and has good ink transfer properties and printing resistance. It has been found that a photopolymerizable composition can be obtained. The present invention has been made based on this knowledge.
すなわち、本発明の光重合性組成物は、(イ)側鎖
にエチレン性不飽和基と水溶性塩の基をもつ重合
体と、(ロ)エチレン性不飽和基を含む光重合性不飽
和化合物と、(ハ)光重合開始剤の3成分を必須成分
として成るもので、その他必要に応じて組成物の
貯蔵安定性を向上させるための熱重合禁止剤や、
光重合後の機械的強度、耐溶剤性、支持体への接
着性を向上させるための種々の充てん剤、可塑剤
を含むものである。これらのうち、本発明で用い
られる側鎖にエチレン性不飽和基と水溶性塩の基
を有する重合体とは不飽和カルボン酸5重量%以
上を構成単位として含有する重合体(以下「ベー
スポリマー」と称する)にそのカルボキシル基に
対し0.03〜0.85当量のオキシシラン環含有エチレ
ン性不飽和化合物を付加させ、残りのカルボキシ
ル基の0.60〜1.00当量を中和しアルカリ金属塩又
はアンモニウム塩としたものである。 That is, the photopolymerizable composition of the present invention comprises (a) a polymer having an ethylenically unsaturated group and a water-soluble salt group in its side chain; and (b) a photopolymerizable unsaturated polymer containing an ethylenically unsaturated group. It consists of three essential components: a compound and (iii) a photopolymerization initiator, and if necessary, a thermal polymerization inhibitor to improve the storage stability of the composition.
It contains various fillers and plasticizers to improve mechanical strength, solvent resistance, and adhesion to the support after photopolymerization. Among these, the polymer having an ethylenically unsaturated group and a water-soluble salt group in the side chain used in the present invention refers to a polymer containing 5% by weight or more of an unsaturated carboxylic acid as a constituent unit (hereinafter referred to as "base polymer"). ) is added with 0.03 to 0.85 equivalents of an oxysilane ring-containing ethylenically unsaturated compound to the carboxyl group, and 0.60 to 1.00 equivalents of the remaining carboxyl group is neutralized to form an alkali metal salt or ammonium salt. be.
これまでに、カルボキシル基を含む重合体にオ
キシシラン環含有エチレン性不飽和化合物を付加
せしめ、側鎖にエチレン性不飽和基とカルボキシ
ル基を含有する重合体を主体とする光重合性組成
物は知られている。(例えば特開昭47−30402号公
報、特開昭47−31704号公報、特公昭49−34041
号、特公昭49−17874号公報参照)。 Until now, photopolymerizable compositions are known in which an oxysilane ring-containing ethylenically unsaturated compound is added to a polymer containing a carboxyl group, and the photopolymerizable composition is mainly composed of a polymer containing an ethylenically unsaturated group and a carboxyl group in the side chain. It is being (For example, JP-A-47-30402, JP-A-47-31704, JP-A-49-34041)
(See Special Publication No. 49-17874).
しかしながら、この種の重合体は分子内に電離
性基としてカルボキシル基しか含んでいないた
め、アルカリ性水溶液には可溶ではあるが水のみ
では現像不可能であつた。 However, since this type of polymer contains only a carboxyl group as an ionizable group in its molecule, it cannot be developed with water alone, although it is soluble in an alkaline aqueous solution.
これに対し、本発明の側鎖にエチレン性不飽和
基と水溶性塩の基とを有する重合体は水のみに可
溶であり、かつ不飽和基を有しているので露光さ
れることにより光重合性エチレン性不飽和化合物
と共に光重合し、完全に反応硬化し不溶化する。
このため、平版印刷版に用いた場合、現像時にに
アルカリ水溶液を用いることなく水のみで現像可
能でかつ露光現像された硬化部は非常に撥水性で
親油性な性質を持つ。このものは、印刷開始時の
ヤレ紙を非常に減少するという利点があり、従来
の重合体包絡型のエチレン性不飽和化合物のみが
反応し、重合体を包絡するものと比較し、エチレ
ン性不飽和化合物のみでなく、重合体自身の不飽
和基も反応に関与するため非常に強靫な画像を形
成し、耐刷性が向上する。 On the other hand, the polymer of the present invention having an ethylenically unsaturated group and a water-soluble salt group in its side chain is soluble only in water, and since it has an unsaturated group, it cannot be easily exposed to light. It is photopolymerized together with a photopolymerizable ethylenically unsaturated compound, completely reacting and curing, and becoming insolubilized.
Therefore, when used in a lithographic printing plate, it can be developed with only water without using an alkaline aqueous solution during development, and the cured area exposed and developed has extremely water-repellent and lipophilic properties. This product has the advantage of greatly reducing waste paper at the start of printing, and compared to the conventional polymer-enveloped type in which only the ethylenically unsaturated compound reacts and envelops the polymer, it Since not only the saturated compound but also the unsaturated groups of the polymer itself participate in the reaction, a very strong image is formed and printing durability is improved.
一方、レジストとして使用した場合、現像液に
溶剤を含まないため現像時に硬化した部分の樹脂
のの膨潤が起きにくく解像性、耐薬品性が良好に
なるという利点がある。また、通常の水(水道
水)で現像できるため作業性、作業環境も良好に
維持でき、廃液処理も容易である。 On the other hand, when used as a resist, since the developer does not contain a solvent, there is an advantage that swelling of the resin in the hardened portion during development is less likely to occur, resulting in good resolution and chemical resistance. Furthermore, since development can be performed using ordinary water (tap water), workability and working environment can be maintained favorably, and waste liquid treatment is also easy.
本発明の組成物の調製に用いられるベースポリ
マーは、その構成単位として不飽和カルボン酸を
全構成単位の少なくとも5重量%含有することが
必要であり、通常は、5〜70重量%含有すること
が望ましい。不飽和カルボン酸単位が5重量%よ
りも少ないと、充分な光重合性及び水溶性を与え
るに足るエチレン性不飽和基及び水溶性塩の基を
導入することができない。一方、不飽和カルボン
酸単位は70重量%以下にしておく方が、ベースポ
リマーの極性ガラス転移温度などに好ましい点が
多い。特に平版用印刷版として高い耐刷力などが
要求される場合には、ベースポリマーの構成単位
として、スチレン化合物、不飽和ニトリル、不飽
和カルボン酸エステルおよび脂肪酸ビニルエステ
ルの中から選ばれた少なくとも1種のエチレン性
不飽和化合物を全構成単位の95〜30重量%含有さ
せることが好ましい。このような構成単位を加え
ることにより、平版用感光層やレジストとして好
ましい性質を得ることができる。 The base polymer used for preparing the composition of the present invention needs to contain unsaturated carboxylic acid as a constituent unit of at least 5% by weight of the total constituent units, and usually contains 5 to 70% by weight. is desirable. When the amount of unsaturated carboxylic acid units is less than 5% by weight, sufficient ethylenically unsaturated groups and water-soluble salt groups cannot be introduced to provide sufficient photopolymerizability and water solubility. On the other hand, it is often preferable to keep the unsaturated carboxylic acid unit at 70% by weight or less in terms of the polar glass transition temperature of the base polymer. In particular, when high printing durability is required as a lithographic printing plate, at least one constituent unit selected from styrene compounds, unsaturated nitriles, unsaturated carboxylic acid esters, and fatty acid vinyl esters is used as the constituent unit of the base polymer. It is preferred that the ethylenically unsaturated compound be contained in an amount of 95 to 30% by weight of the total structural units. By adding such a structural unit, desirable properties can be obtained as a lithographic photosensitive layer or a resist.
本発明のベースポリマーに用いられる不飽和カ
ルボン酸としては、アクリル酸、メタクリル酸、
イタコン酸、クロトン酸、マレイン酸、フマル
酸、ビニル酢酸、α−エチルアクリル酸、アンゲ
リカ酸;イタコン酸、マレイン酸またはフマル酸
のモノメチルエステル、モノエチルエステル、モ
ノプロピルエステル、モノイソプロピルエステ
ル、モノノルマルブチルエステルあるいは無水マ
レイン酸、無水イタコン酸などを挙げることがで
き、これらは単独で、または混合して使用するこ
とができる。スチレン化合物としては、スチレ
ン、α−メチルスチレン、ビニルトルエンなど、
不飽和ニトリルとしては、アクリロニトリル、メ
タクリロニトリルなど、不飽和カルボン酸エステ
ルとしては、アクリル酸アルキルエステルまたは
メタクリル酸アルキルエステル、例えばメチルア
クリレート、エチルアクリレート、ノルマルプロ
ピルアクリレート、イソプロピルアクリレート、
オクチルアクリレート、2−エチルヘキシルアク
リレート、ラウリルアクリレート、メチルメタク
リレート、エチルメタクリレート、ブチルメタク
リレート、オクチルメタクリレート、ラウリルメ
タクリレートなど、脂肪酸ビニルエステルとして
は、酢酸ビニル、プロピオン酸ビニルなどをそれ
ぞれ挙げることができる。これらはそれぞれ単独
で、または混合して使用することができる。 The unsaturated carboxylic acids used in the base polymer of the present invention include acrylic acid, methacrylic acid,
Itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, α-ethyl acrylic acid, angelic acid; monomethyl ester, monoethyl ester, monopropyl ester, monoisopropyl ester, mononormal of itaconic acid, maleic acid or fumaric acid Examples include butyl ester, maleic anhydride, itaconic anhydride, and the like, and these can be used alone or in combination. Styrene compounds include styrene, α-methylstyrene, vinyltoluene, etc.
Examples of unsaturated nitriles include acrylonitrile and methacrylonitrile; examples of unsaturated carboxylic esters include alkyl acrylates and alkyl methacrylates, such as methyl acrylate, ethyl acrylate, normal propyl acrylate, isopropyl acrylate,
Examples of fatty acid vinyl esters include octyl acrylate, 2-ethylhexyl acrylate, lauryl acrylate, methyl methacrylate, ethyl methacrylate, butyl methacrylate, octyl methacrylate, and lauryl methacrylate, and vinyl acetate and vinyl propionate. These can be used alone or in combination.
ベースポリマーは、不飽和カルボン酸、または
このほかにさらにスチレン化合物、不飽和ニトリ
ル、不飽和カルボン酸エステル、脂肪酸ビニルエ
ステルなどを混合したものを、通常行なわれる方
法で溶液重合、乳化重合または懸濁重合すること
により製造される。この重合反応において、重合
開始剤として過酸化物、アゾ化合物などを使用す
ることができるが、光重合性組成物としての放置
安定性を考慮すると、できるだけ分解効率のよい
重合開始剤を使用することが好ましい。重合溶媒
としては、ケトン類、エステル類、アルコール
類、エーテル類、芳香族炭化水素類等を用いるこ
とができるが、オキシラン環含有エチレン性飽和
化合物の付加反応時の反応安定性より、アルコー
ル系溶媒、特に炭素数が3〜5のアルコールが良
好である。 The base polymer is prepared by polymerizing an unsaturated carboxylic acid, or a mixture of a styrene compound, an unsaturated nitrile, an unsaturated carboxylic acid ester, a fatty acid vinyl ester, etc. using a conventional method such as solution polymerization, emulsion polymerization, or suspension polymerization. Manufactured by polymerization. In this polymerization reaction, peroxides, azo compounds, etc. can be used as a polymerization initiator, but in consideration of the storage stability of the photopolymerizable composition, it is recommended to use a polymerization initiator with as high decomposition efficiency as possible. is preferred. As the polymerization solvent, ketones, esters, alcohols, ethers, aromatic hydrocarbons, etc. can be used, but due to the reaction stability during the addition reaction of the oxirane ring-containing ethylenic saturated compound, alcohol-based solvents are preferred. In particular, alcohols having 3 to 5 carbon atoms are preferred.
側鎖にエチレン性不飽和基と水溶性塩の基とを
有する重合体は、ベースポリマーのカルボキシル
基へのオキシラン環含有エチレン性不飽和化合物
の付加反応及びアルカリによる中和反応により得
られる。 A polymer having an ethylenically unsaturated group and a water-soluble salt group in its side chain can be obtained by an addition reaction of an oxirane ring-containing ethylenically unsaturated compound to a carboxyl group of a base polymer and a neutralization reaction with an alkali.
付加反応時の反応溶媒としては、ケトン類、エ
ステル類、アルコール類、エーテル類、芳香族炭
化水素類等を用いることができるが、反応の安定
性からみると、アルコール系溶媒、特に炭素数3
〜5のアルコールまたはこれらのアルコールと他
種の有機溶媒との混合溶媒が好ましい。また反応
触媒としては、カルボン酸とオキシラン環化合物
の反応触媒であればどのようなものでも使用可能
であるが、特にトリメチルベンジルアンモニウム
サイドロオキサイドが有効である。またこの反応
を行なうにあたり、オキシラン環含有エチレン性
不飽和化合物のビニル型付加重合を抑制するた
め、反応系に重合禁止剤として還元性物質を存在
させておく必要がある。このような化合物として
はハイドロキノンが有効である。 Ketones, esters, alcohols, ethers, aromatic hydrocarbons, etc. can be used as reaction solvents during the addition reaction, but from the viewpoint of reaction stability, alcoholic solvents, especially those with 3 carbon atoms, are preferred.
-5 alcohols or a mixed solvent of these alcohols and other organic solvents are preferred. Further, as the reaction catalyst, any catalyst for the reaction between a carboxylic acid and an oxirane ring compound can be used, but trimethylbenzylammonium sideroxide is particularly effective. In carrying out this reaction, it is necessary to have a reducing substance present as a polymerization inhibitor in the reaction system in order to suppress vinyl type addition polymerization of the oxirane ring-containing ethylenically unsaturated compound. Hydroquinone is effective as such a compound.
オキシラン環含有エチレン性不飽和化合物とし
ては、グリシジルアクリレート、グリシジルメタ
クリレート、アクリルグリシジルエーテル、α−
エチルグリシジルアクリレート、クロトニルグリ
シジルエーテル、グリシジルクロトネート、グリ
シジルイソクロトネート、イタコン酸モノアルキ
ルエステルモノグリシジルエステル、フマール酸
モノアルキルエステルモノグリシジルエステル、
マレイン酸モノアルキルエステルモノグリシジル
エステル等を挙げることができるが、グリシジル
アクリレート、グリシジルメタクリレートが反応
性の点でより好ましい。得られる光重合性組成物
の感光速度、基材への接着性、現像性および皮膜
の強じん性よりみて、ベースポリマーのカルボキ
シル基に対し、0.03〜0.85当量、特に好ましくは
0.10〜0.80当量のオキシラン環含有エチレン性不
飽和化合物が付加される。 Examples of oxirane ring-containing ethylenically unsaturated compounds include glycidyl acrylate, glycidyl methacrylate, acrylic glycidyl ether, α-
Ethyl glycidyl acrylate, crotonyl glycidyl ether, glycidyl crotonate, glycidyl isocrotonate, itaconic acid monoalkyl ester monoglycidyl ester, fumaric acid monoalkyl ester monoglycidyl ester,
Examples include monoalkyl maleate monoglycidyl ester, but glycidyl acrylate and glycidyl methacrylate are more preferred in terms of reactivity. In view of the photosensitive speed, adhesion to the substrate, developability and toughness of the film of the resulting photopolymerizable composition, the amount is preferably 0.03 to 0.85 equivalents, particularly preferably, based on the carboxyl group of the base polymer.
0.10 to 0.80 equivalents of oxirane ring-containing ethylenically unsaturated compound are added.
このようにしてベースポリマーのカルボキシル
基へのオキシラン環含有エチレン性不飽和化合物
の付加反応終了後、残存カルボキシル基をアルカ
リで中和し、アルカリ金属塩又はアンモニウム塩
とする。用いられるアルカリとしては、アルカリ
金属化合物、例えば水酸化ナトリウム、水酸化カ
リウムなどやアンモニア、アミン類、例えばエタ
ノールアミン、トリエタノールアミン、トリメチ
ルアミンなどがある。これらの水溶液又はアルコ
ール溶液を付加反応終了後のベースポリマー溶液
に添加することにより中和することができる。こ
の場合、水現像性より付加反応後の残りのカルボ
キシル基の0.60〜1.00当量を中和する必要があ
る。0.60当量以下の中和度では水のみの現像が困
難となる。 After completing the addition reaction of the oxirane ring-containing ethylenically unsaturated compound to the carboxyl group of the base polymer in this manner, the remaining carboxyl group is neutralized with an alkali to form an alkali metal salt or an ammonium salt. Examples of the alkali used include alkali metal compounds such as sodium hydroxide and potassium hydroxide, ammonia, and amines such as ethanolamine, triethanolamine, and trimethylamine. Neutralization can be achieved by adding these aqueous or alcoholic solutions to the base polymer solution after the completion of the addition reaction. In this case, it is necessary to neutralize 0.60 to 1.00 equivalents of carboxyl groups remaining after the addition reaction due to water developability. If the degree of neutralization is less than 0.60 equivalent, development using only water becomes difficult.
前記(ロ)成分として用いられるエチレン性不飽和
基を含む光重合性組成物には、アクリル酸、メタ
クリル酸又はそのエステル、例えばメチル、エチ
ル、n−プロピル、イソプロピル、n−ヘキシ
ル、n−オクチル、n−ドデシル、シクロヘキシ
ル、テトラヒドロフルフリル、アリル、グリシジ
ル、2−ヒドロキシエチル、2−ヒドロキシプロ
ピル、3クロロ−2−ヒドロキシ又は4−ヒドロ
キシブチルのアクリレート及びメタクリレート、
あるいはエチレングリコール、ジエチレングリコ
ール、プロピレングリコール、ジプロピレングリ
コール、ポリエチレングリコール、ポリプロピレ
ングリコール、ブチレングリコールのモノ又はジ
アクリレート及びモノ又はジメタクリレート、あ
るいはトリメチロールプロパントリアクリレート
及びメタクリレート、ペンタエリトリツトテトラ
アクリレート及びメタクリレートなどや、アクリ
ルアミド、メタクリルアミド又はその誘導体、例
えば、N−メチロールアクリルアミド及びメタク
リルアミド、N−メトキシアクリルアミド及びメ
タクリルアミド、N,N′−メチレンビスアクリ
ルアミド及びメタクリルアミド、N,N′−ヘキ
サメチレンビスアクリルアミド及びメタクリアミ
ドなどや、スチレン、ビニルトルエン、ジビニル
ベンゼン、ジアリルフタレート、トリアリルシア
ヌレート、酢酸ビニルなどがあり、特に好ましい
のは、3〜4個のエチレン基を有するトリメチロ
ールプロパントリアクリレート及びメタクリレー
ト、トリメチロールエタントリアクリレート及び
メタクリレート、テトラメチロールメタントリア
クリレート及びメタクリレート、ペンタエリトリ
ツトテトラアクリレート及びメタクリレートであ
る。 The photopolymerizable composition containing an ethylenically unsaturated group used as the component (b) includes acrylic acid, methacrylic acid, or an ester thereof, such as methyl, ethyl, n-propyl, isopropyl, n-hexyl, n-octyl. , n-dodecyl, cyclohexyl, tetrahydrofurfuryl, allyl, glycidyl, 2-hydroxyethyl, 2-hydroxypropyl, 3chloro-2-hydroxy or 4-hydroxybutyl acrylates and methacrylates,
Or mono- or diacrylates and mono- or dimethacrylates of ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, polyethylene glycol, polypropylene glycol, butylene glycol, or trimethylolpropane triacrylate and methacrylate, pentaerythritate tetraacrylate and methacrylate, etc. , acrylamide, methacrylamide or derivatives thereof, such as N-methylolacrylamide and methacrylamide, N-methoxyacrylamide and methacrylamide, N,N'-methylenebisacrylamide and methacrylamide, N,N'-hexamethylenebisacrylamide and methacrylamide. amide, styrene, vinyltoluene, divinylbenzene, diallyl phthalate, triallyl cyanurate, vinyl acetate, etc. Particularly preferred are trimethylolpropane triacrylate and methacrylate having 3 to 4 ethylene groups, and trimethylol. Ethane triacrylate and methacrylate, tetramethylolmethane triacrylate and methacrylate, pentaerythritate tetraacrylate and methacrylate.
(ハ)成分の光重合開始剤としては、慣用の光重合
開始剤である。ベンゾイン、ベンゾインメチルエ
ーテル、ベンゾインエチルエーテル、ベンゾイン
−n−プロピルエーテル、ベンゾインイソプロピ
ルエーテル、ベンゾイン−n−ブチルエーテル、
ベンゾインイソブチルエーテル、ベンゾイン−
Sec−ブチルエーテル、ベンゾインフエニルエー
テル、α−メチルベンゾイン、α−エチルベンゾ
イン、α−メチルベンゾインメチルエーテル、α
−フエニルベンゾイン、α−メチロ−ルベンゾイ
ン、α−メチロ−ルベンゾインエチルエーテル、
α−アリルベンゾイン、ベンゾイントリメチルシ
リルエーテル、γ−ヒドロキシ−γ−フエニル−
γ−ベンゾイル酪酸などのベンゾイン誘導体、ベ
ンゾフエノン、3−メチルベンゾフエノン、2,
4′−ジメチルベンゾフエノン、2,2′−ジメチル
−3−オキシベンゾフエノン、2−ニトロベンゾ
フエノン、4−アミノベンゾフエノン、4−アセ
チルベンゾフエノン、2−クロルベンゾフエノ
ン、2,4′−ジクロルベンゾフエノン、4−ベン
ゾイルベンゾフエノン、4,4′−ビス(ジメチル
アミノ)ベンゾフエノン、4,4′−ビス(ジエチ
ルアミノ)ベンゾフエノンなどのベンゾフエノン
誘導体、アンスラキノン、β−メチルアンスラキ
ノン、β−エチルアンスラキノン、β−クロルア
ンスラキノン、1,2−ベンゾアンスラキノン、
フエナンスレンキノンなどのキノン誘導体、及び
ジアセチル、ベンジル、ジフエニルジスルフイ
ド、β−ナフタレンスルホニルクロリド、アセト
フエノン、ω−ブロモアセトフエノンなどを例と
して挙げることができる。 The photopolymerization initiator of component (iii) is a commonly used photopolymerization initiator. Benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin-n-propyl ether, benzoin isopropyl ether, benzoin-n-butyl ether,
Benzoin isobutyl ether, benzoin-
Sec-butyl ether, benzoin phenyl ether, α-methylbenzoin, α-ethylbenzoin, α-methylbenzoin methyl ether, α
-phenylbenzoin, α-methylolbenzoin, α-methylolbenzoin ethyl ether,
α-allyl benzoin, benzoin trimethylsilyl ether, γ-hydroxy-γ-phenyl-
Benzoin derivatives such as γ-benzoylbutyric acid, benzophenone, 3-methylbenzophenone, 2,
4'-dimethylbenzophenone, 2,2'-dimethyl-3-oxybenzophenone, 2-nitrobenzophenone, 4-aminobenzophenone, 4-acetylbenzophenone, 2-chlorobenzophenone, Benzophenone derivatives such as 2,4'-dichlorobenzophenone, 4-benzoylbenzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, anthraquinone, β- Methyl anthraquinone, β-ethylanthraquinone, β-chloroanthraquinone, 1,2-benzoanthraquinone,
Examples include quinone derivatives such as phenanthrenequinone, and diacetyl, benzyl, diphenyl disulfide, β-naphthalenesulfonyl chloride, acetophenone, ω-bromoacetophenone, and the like.
以上の光重合開始剤は単独で、あるいは2種類
以上の組み合わせで用いることができる。比較的
感度の速いものを得るに好ましいものは、β−エ
チルアンスラキノン、ベンゾフエノン、4,4′−
ビス(ジメチルアミノ)ベンゾフエノンの単独、
あるいは組み合わせである。 The above photopolymerization initiators can be used alone or in combination of two or more. Preferred compounds for obtaining relatively fast sensitivity are β-ethyl anthraquinone, benzophenone, and 4,4'-
Bis(dimethylamino)benzophenone alone,
Or a combination.
光重合性エチレン性不飽和化合物は側鎖にエチ
レン性不飽和基と水溶性塩の基とを有する重合体
100重量部に対して1〜100重量部の範囲で使用す
ることが好ましい。光重合開始剤は光重合性組成
物全重量に対し0.001〜10重量%の割合で用いら
れる。 A photopolymerizable ethylenically unsaturated compound is a polymer having an ethylenically unsaturated group and a water-soluble salt group in its side chain.
It is preferably used in an amount of 1 to 100 parts by weight per 100 parts by weight. The photopolymerization initiator is used in an amount of 0.001 to 10% by weight based on the total weight of the photopolymerizable composition.
また、本発明の光重合性組成物は暗所での反応
を防止するため、また長期間安定に貯蔵するため
適当な熱重合禁止剤を含有することが好ましい。
この禁止剤の例としては、例えば、ハイドロキノ
ン、ハイドロキノンモノメチルエーテル、ハイド
ロキノンモノエチルエーテル、ハイドロキノンモ
ノ第三ブチルエーテル、ベンゾキノン、p−メト
キシフエノール、2,5−ジフエニルp−ベンゾ
フエノン、ピリジン、フエノチアジン、p−ジア
ミノベンゼン、β−ナフトール、ナフチルアミ
ン、ピロガロール、第三ブチルカテコール、ニト
ロベンゼンなどを挙げることができる。これらの
熱重合抑制剤は、通常、光重合性組成物全重量に
対し0.005〜10重量%の割合で使用される。 Further, the photopolymerizable composition of the present invention preferably contains a suitable thermal polymerization inhibitor in order to prevent reactions in a dark place and to ensure stable storage for a long period of time.
Examples of this inhibitor include, for example, hydroquinone, hydroquinone monomethyl ether, hydroquinone monoethyl ether, hydroquinone monotert-butyl ether, benzoquinone, p-methoxyphenol, 2,5-diphenyl p-benzophenone, pyridine, phenothiazine, p-diamino Mention may be made of benzene, β-naphthol, naphthylamine, pyrogallol, tert-butylcatechol, nitrobenzene, and the like. These thermal polymerization inhibitors are usually used in an amount of 0.005 to 10% by weight based on the total weight of the photopolymerizable composition.
また本発明の光重合性組成物は、充てん剤、可
塑剤などを含んでもよい。充てん剤としては、無
機化合物、例えば、ガラス粉末、雲母、シリカ等
が挙げられ、有機化合物としては、ポリエチレ
ン、ポリエチレンオキサイド、ポリエステル、ポ
リアミド、ポリメタクリレート、セルロースおよ
びその誘導体等が挙げられる。 The photopolymerizable composition of the present invention may also contain fillers, plasticizers, and the like. Examples of the filler include inorganic compounds such as glass powder, mica, and silica, and examples of organic compounds include polyethylene, polyethylene oxide, polyester, polyamide, polymethacrylate, cellulose, and derivatives thereof.
これら充てん剤は、光重合性組成物成分と相溶
性の良いものを選ぶ必要があり、その目的に応じ
て充てん剤を組合せて用いることができる。また
感光性樹脂組成物の目的に応じて、その量は適当
な範囲に選ぶことができる。 These fillers must be selected to have good compatibility with the components of the photopolymerizable composition, and fillers can be used in combination depending on the purpose. Further, the amount can be selected within an appropriate range depending on the purpose of the photosensitive resin composition.
一方、可塑剤としては、フタル酸ジアルキルエ
ステル、オリゴエチレングリコールモノアルキル
エステル、オリゴエチレングリコールジアルキル
エステル、リン酸トリクレジルなどのリン酸エス
テル系可塑剤等を使用することができる。そのほ
か、本発明の光重合性組成物を構成する側鎖にエ
チレン性不飽和基及び水溶性塩の基を有する重合
体に対し相溶性のある低分子有機化合物であれば
いかなるものでも可塑剤として使用することがで
きる。 On the other hand, as the plasticizer, phosphate ester plasticizers such as phthalic acid dialkyl ester, oligoethylene glycol monoalkyl ester, oligoethylene glycol dialkyl ester, tricresyl phosphate, etc. can be used. In addition, any low-molecular organic compound that is compatible with the polymer having an ethylenically unsaturated group and a water-soluble salt group in the side chain constituting the photopolymerizable composition of the present invention can be used as a plasticizer. can be used.
本発明の感光液は、前記光重合性組成物成分を
以下に記する溶媒に溶解することにより得られ
る。感光液を作製するための溶媒は、少なくとも
前記のエチレン性不飽和基及び水溶性塩の基を有
する重合体、光重合性エチレン性不飽和化合物、
光重合開始剤、および熱重合防止剤のいずれをも
溶解する能力を有していることが必要である。こ
の場合、前記4成分の組合せによつては、2種以
上の成分から成る混合溶媒とすることが必要にな
る。このような観点から、本発明の光重合性組成
物溶液を作製するに適した溶媒としては、エステ
ル類、ケトン類、アルコール類、エーテル類、芳
香族炭化水素類等を挙げることができる。特に、
酢酸エチル、メチルエチルケトン、n−ブチルア
ルコール、t−ブチルアルコール、ジオキサン、
ベンゼンあるいはこれらの混合物が適当である。 The photosensitive liquid of the present invention can be obtained by dissolving the photopolymerizable composition components in the following solvents. The solvent for preparing the photosensitive liquid includes at least the above-mentioned polymer having an ethylenically unsaturated group and a water-soluble salt group, a photopolymerizable ethylenically unsaturated compound,
It is necessary to have the ability to dissolve both the photopolymerization initiator and the thermal polymerization inhibitor. In this case, depending on the combination of the four components, a mixed solvent consisting of two or more components may be required. From this point of view, examples of solvents suitable for preparing the photopolymerizable composition solution of the present invention include esters, ketones, alcohols, ethers, aromatic hydrocarbons, and the like. especially,
Ethyl acetate, methyl ethyl ketone, n-butyl alcohol, t-butyl alcohol, dioxane,
Benzene or mixtures thereof are suitable.
一方、感光液に含まれる光重合性組成物の濃度
としては、感光液の基材への塗布様式および塗布
条件によつて異なるが、たとえば、ホイラー塗り
でオフセツトPS版を作成する場合には約2〜20
重量%が適当である。 On the other hand, the concentration of the photopolymerizable composition contained in the photosensitive solution varies depending on the method and conditions of application of the photosensitive solution to the base material, but for example, when making an offset PS plate by wheeler coating, approximately 2~20
Weight % is appropriate.
本発明の組成物からの感光液は、その光重合性
組成物成分と溶媒を通常の混合槽内で通常の方法
でカキマゼ混合することによつて製造することが
できる。 A photosensitive liquid from the composition of the present invention can be produced by kakimaze mixing the photopolymerizable composition components and a solvent in a conventional mixing tank using a conventional method.
このようにして製造された感光液は、一般に、
オフセツト印刷用基材として使用されているアル
ミ板、亜鉛板、マグネシウム板、その他多層平版
用金属板上に塗布される。該感光液を塗布する場
合、塗布方法としては、回転塗布機(Whirler)
による塗布、カーテンコーター、ロールコータな
どを使用した枚葉塗布またはエブ塗布を行なうこ
とができる。 The photosensitive liquid produced in this way is generally
It is applied to aluminum plates, zinc plates, magnesium plates, and other metal plates for multilayer planography, which are used as substrates for offset printing. When applying the photosensitive liquid, the application method is a rotary coating machine (Whirler).
It is possible to perform sheet coating or web coating using a curtain coater, roll coater, etc.
本発明の感光性樹脂組成物を塗布した生版は、
通常の平版と同様なプロセスで焼付け、水のみに
て現像を行なうことができ、活性光線光源とし
て、アーク灯、水銀灯、キセノン灯、ケミカルラ
ンプなどが用いられる。又、現像が水のみで行な
うことができるため溶剤、アルカリ使用による各
種の問題点が解消される。 The raw plate coated with the photosensitive resin composition of the present invention is
It can be baked in the same process as a normal lithographic plate and developed using only water, and an arc lamp, mercury lamp, xenon lamp, chemical lamp, etc. can be used as the active light source. Further, since development can be carried out using only water, various problems caused by the use of solvents and alkalis are solved.
製版工程としては、露光、現像、水洗、乾燥お
よび不感脂化処理の工程から成り、以上の過程を
経てオフセツト用印刷版が作成される。さらに多
層平版の場合には、現像後、腐食、剥膜の処理を
行なうことによつてバイメタル、トリメタル印刷
版を得ることができる。 The plate-making process consists of exposure, development, water washing, drying, and desensitization treatment, and an offset printing plate is created through the above steps. Furthermore, in the case of a multilayer planographic plate, a bimetallic or trimetallic printing plate can be obtained by performing corrosion and film peeling treatments after development.
このように、本発明の感光性樹脂組成物は、オ
フセツトPS版、ワイポン版、エツチング版
(Deep Etch Plate)、および平凸版用の感光材料
として広く用いることができるほか各種のレジス
トとして有用なものである。 As described above, the photosensitive resin composition of the present invention can be widely used as a photosensitive material for offset PS plates, Wipon plates, etching plates (Deep Etch Plates), and plano relief plates, and is also useful as various resists. It is.
次に、実施例により本発明を詳細に説明する
が、これらは決して本発明を限定するものではな
い。 Next, the present invention will be explained in detail with reference to Examples, but these are not intended to limit the present invention in any way.
実施例 1
かきまぜ後、還流冷却器、滴下漏斗及び温度計
を備えた500ml容の四つ口フラスコに、反応溶媒
としてイソプロピルアルコール100gを入れ、窒
素置換を行いながら80℃に加熱した。滴下漏斗に
アクリルニトリル30g、ブチルアクリレート30
g、アクリル酸30g、スチレン10g及び重合触媒
としてN,N′−アゾビスイソブチロニトリル3
gの混合物を入れておき、該混合物を2時間30分
で滴下し、次いで80℃で5時間30分加熱すること
によつて反応を完結した。混合物を60℃に冷却
し、次いでこれにイソプロピルアルコール96g、
重合禁止剤としてハイドロキノン0.3g、反応触
媒としてトリメチルベンジルアンモニウムハイド
ロオキサイドの40%メタノール溶液3.75gを加え
た。次に内容物を80℃に昇温したのち、ハイドロ
キノン0.3gを含むグリシジルメタクリレート30
gを1時間で滴下し、さらに4時間反応を続け
た。室温に冷却後、淡黄色の粘稠な重合体溶液を
得た。得られた重合体のグリシジルメタクリレー
トの付加反応率(カルボキシル基に対するもの)
は68%であつた。Example 1 After stirring, 100 g of isopropyl alcohol as a reaction solvent was placed in a 500 ml four-necked flask equipped with a reflux condenser, a dropping funnel, and a thermometer, and heated to 80° C. while purging with nitrogen. Add 30 g of acrylonitrile and 30 g of butyl acrylate to the dropping funnel.
g, 30 g of acrylic acid, 10 g of styrene, and 3 N,N'-azobisisobutyronitrile as a polymerization catalyst.
The mixture was added dropwise over 2 hours and 30 minutes, and the reaction was completed by heating at 80° C. for 5 hours and 30 minutes. The mixture was cooled to 60°C and then added with 96 g of isopropyl alcohol,
0.3 g of hydroquinone was added as a polymerization inhibitor, and 3.75 g of a 40% methanol solution of trimethylbenzylammonium hydroxide was added as a reaction catalyst. Next, after raising the temperature of the contents to 80℃, glycidyl methacrylate 30 containing 0.3g of hydroquinone
g was added dropwise over 1 hour, and the reaction was continued for an additional 4 hours. After cooling to room temperature, a pale yellow viscous polymer solution was obtained. Addition reaction rate of glycidyl methacrylate (to carboxyl group) of the obtained polymer
was 68%.
ここで得られた重合体に1N−水酸化ナトリウ
ムエタノール溶液93.3gをかきまぜながら混合し
中和度0.7とした。 The polymer thus obtained was mixed with 93.3 g of a 1N sodium hydroxide ethanol solution with stirring to give a neutralization degree of 0.7.
こうして得た重合体溶液250gを、n−ブチル
アルコール1300ml、ベンゼン200ml及び酢酸エチ
ル200mlから成る混合溶媒で希釈し、これに架橋
剤としてペンタエリトリツトテトラメタクリレー
ト25g及び光増感剤としてβ−エチルアントラキ
ノン0.9g及びベンゾインメチルエーテル0.1gを
加え、よくかきまぜ混合して水現像用光重合性組
成物溶液を調製した。 250 g of the polymer solution thus obtained was diluted with a mixed solvent consisting of 1300 ml of n-butyl alcohol, 200 ml of benzene and 200 ml of ethyl acetate, and 25 g of pentaerythritate tetramethacrylate was added as a crosslinking agent and β-ethylanthraquinone as a photosensitizer. 0.9 g and 0.1 g of benzoin methyl ether were added and stirred well to prepare a photopolymerizable composition solution for water development.
この溶液をよく水洗乾燥した0.3mmのアルミニ
ウム板上にホイラーで塗布、乾燥して9μのポリ
エチレンテレフタレートフイルムをラミネートし
た。 This solution was applied with a foiler onto a 0.3 mm aluminum plate that had been thoroughly washed and dried, and then dried and laminated with a 9 μm polyethylene terephthalate film.
こうして得られた版を、ネガフイルムを密着さ
せ真空焼枠中で、2Kw超高圧水銀灯で1mの距離
より20秒間露光した。 The plate thus obtained was exposed with a 2 Kw ultra-high pressure mercury lamp from a distance of 1 m for 20 seconds in a vacuum printing frame with a negative film attached.
通常の水(水道水)で現像し、鮮明な画線を得
た。この版をオフセツト印刷機(小森スプリン
ト)に取り付け墨インキ(FグロスNo.85、大日本
インキ製)で50000枚印刷した。この結果、刷り
出し時のインキ着肉性も良く、また地汚れ、画線
のトビ、カケなどがみられず、良好な印刷物を得
た。 Developed with ordinary water (tap water) to obtain clear image lines. This plate was attached to an offset printing machine (Komori Sprint) and 50,000 sheets were printed using black ink (F Gloss No. 85, manufactured by Dainippon Ink). As a result, the ink receptivity at the beginning of printing was good, and there was no background smearing, uneven printing, chipping, etc., and good printed matter was obtained.
実施例 2
下記組成の単量体混合物を用いて、実施例1と
同様にして、ベースポリマーを製造した。Example 2 A base polymer was produced in the same manner as in Example 1 using a monomer mixture having the following composition.
アクリルニトリル 30g
ブチルアクリレート 30g
メタクリル酸 30g
酢酸ビニル 10g
重合反応完結後、実施例1と同様にして、ベー
スポリマーへのグリシジルメタクリレートの付加
反応を行つた。得られた重合体のグリシジルメタ
クリレートの付加反応率(カルボキシル基に対す
る)は70%であつた。 Acrylic nitrile 30g Butyl acrylate 30g Methacrylic acid 30g Vinyl acetate 10g After the polymerization reaction was completed, an addition reaction of glycidyl methacrylate to the base polymer was carried out in the same manner as in Example 1. The addition reaction rate (with respect to carboxyl groups) of glycidyl methacrylate in the obtained polymer was 70%.
ここで得られた重合体に1N−水酸化カリウム
エタノール溶液83.7gを実施例1と同様に混合か
きまぜ、中和度0.8とした。 The polymer thus obtained was mixed with 83.7 g of a 1N potassium hydroxide ethanol solution in the same manner as in Example 1, and the degree of neutralization was set to 0.8.
ここで得られた重合体溶液250gに、架橋剤及
び光増感剤としてトリメチロールプロパントリア
クリレート25g、ミケラスケトン1gを用いて実
施例1と同様にして水現像用光重合性組成物溶液
を調製した。 A photopolymerizable composition solution for water development was prepared in the same manner as in Example 1 using 250 g of the polymer solution obtained here, 25 g of trimethylolpropane triacrylate and 1 g of Michaelasketone as a crosslinking agent and photosensitizer. .
こうして得られた光重合性組成物溶液を用いる
ほかは、実施例1と同様にして原版を作成し、露
光し、水で現像を行つたところ、解像力の高い鮮
明な画線が得られた。また実施例1と同様に
50000枚の印刷を行なつたところ、インキの着
肉性も良く良好な印刷物が得られた。 Except for using the photopolymerizable composition solution thus obtained, an original plate was prepared in the same manner as in Example 1, exposed to light, and developed with water. Clear image lines with high resolution were obtained. Further, when 50,000 sheets were printed in the same manner as in Example 1, good prints with good ink receptivity were obtained.
実施例 3
下記組成の単量体混合物を用いて、実施例1と
同様にして、ベースポリマーを製造した。Example 3 A base polymer was produced in the same manner as in Example 1 using a monomer mixture having the following composition.
アクリルニトリル 30g
スチレン 10g
ブチルアクリレート 30g
アクリル酸 30g
重合反応完結後、グリシジルメタクリレート30
gの代りにグリシジルアクリレート27gを使用し
たほかはすべて実施例1と同様の手順で、ベース
ポリマーのグリシジルアクリレートの付加反応を
行つた。得られた重合体のグリシジルアクリレー
トの付加反応率(カルボキシル基に対するもの)
は62%であつた。 Acrylic nitrile 30g Styrene 10g Butyl acrylate 30g Acrylic acid 30g After the polymerization reaction is completed, glycidyl methacrylate 30g
An addition reaction of glycidyl acrylate as a base polymer was carried out in the same manner as in Example 1 except that 27 g of glycidyl acrylate was used instead of 27 g of glycidyl acrylate. Addition reaction rate of glycidyl acrylate (to carboxyl group) of the obtained polymer
was 62%.
ここで得られた重合体に1N−水酸化ナトリウ
ムエタノール溶液126.7gを実施例1と同様に混
合かきまぜ中和度0.8とした。 The polymer thus obtained was mixed with 126.7 g of a 1N sodium hydroxide ethanol solution in the same manner as in Example 1, and the degree of neutralization was adjusted to 0.8.
この重合体溶液250gに、架橋剤及び光増感剤
としてそれぞれテトラエチレングリコールジメタ
クリレート25g、ベンゾフエノン1gを加えて、
実施例1と同様にして光重合性組成物溶液を調製
した。 To 250 g of this polymer solution, 25 g of tetraethylene glycol dimethacrylate and 1 g of benzophenone were added as a crosslinking agent and a photosensitizer, respectively.
A photopolymerizable composition solution was prepared in the same manner as in Example 1.
こうして得られた光重合性組成物溶液を銅板上
に塗布、乾燥し、2μの膜厚を得た。これを、実
施例1と同様に真空焼枠中で露光し、その後、水
道水で現像したところ、高度の解像力を有する画
線が得られた。この銅板を腐食液に浸せきしたと
ころ、画線にはなんら異常は認められなかつた。 The photopolymerizable composition solution thus obtained was applied onto a copper plate and dried to obtain a film thickness of 2 μm. When this was exposed in a vacuum printing frame in the same manner as in Example 1 and then developed with tap water, an image with high resolution was obtained. When this copper plate was immersed in a corrosive solution, no abnormalities were observed in the lines.
Claims (1)
もつ重合体、エチレン性不飽和基を含む光重合性
不飽和化合物及び光重合開始剤から成る光重合性
組成物において、前記重合体として、不飽和カル
ボン酸5重量%以上を構成単位として含有する重
合体にそのカルボキシル基に対し0.03〜0.85当量
のオキシラン環含有エチレン性不飽和化合物を付
加させ、残りのカルボキシル基の0.60〜1.00当量
を中和し、アルカリ金属塩又はアンモニウム塩と
した重合体を用いることを特徴とする水現像可能
な光重合性組成物。 2 不飽和カルボン酸5重量%以上を構成単位と
して含有する重合体がアクリル酸及びメタクリル
酸の中から選ばれた少なくとも1種の不飽和カル
ボン酸5〜70重量%と、スチレン化合物、不飽和
ニトリル、不飽和カルボン酸エステル及び脂肪酸
ビニルエステルの中から選ばれた少なくとも1種
のエチレン性不飽和化合物95〜30重量%からなる
重合体である特許請求の範囲第1項記載の組成
物。 3 オキシラン環含有エチレン性不飽和化合物が
グリシジルアクリレート又はグリシジルメタクリ
レートである特許請求の範囲第1項記載の組成
物。[Scope of Claims] 1. A photopolymerizable composition comprising a polymer having an ethylenically unsaturated group and a water-soluble salt group in its side chain, a photopolymerizable unsaturated compound containing an ethylenically unsaturated group, and a photopolymerization initiator. In the above-mentioned polymer, an oxirane ring-containing ethylenically unsaturated compound in an amount of 0.03 to 0.85 equivalent to the carboxyl group is added to the polymer containing 5% by weight or more of unsaturated carboxylic acid as a constituent unit, and the remaining carboxyl group is A water-developable photopolymerizable composition characterized by using a polymer in which 0.60 to 1.00 equivalents of groups are neutralized to form an alkali metal salt or an ammonium salt. 2 A polymer containing 5% by weight or more of unsaturated carboxylic acid as a constituent unit contains 5 to 70% by weight of at least one unsaturated carboxylic acid selected from acrylic acid and methacrylic acid, a styrene compound, and an unsaturated nitrile. The composition according to claim 1, which is a polymer comprising 95 to 30% by weight of at least one ethylenically unsaturated compound selected from unsaturated carboxylic acid esters, unsaturated carboxylic acid esters, and fatty acid vinyl esters. 3. The composition according to claim 1, wherein the oxirane ring-containing ethylenically unsaturated compound is glycidyl acrylate or glycidyl methacrylate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1132377A JPS5397416A (en) | 1977-02-04 | 1977-02-04 | Light polymeric constitute possible for water development |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1132377A JPS5397416A (en) | 1977-02-04 | 1977-02-04 | Light polymeric constitute possible for water development |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5397416A JPS5397416A (en) | 1978-08-25 |
JPS6118736B2 true JPS6118736B2 (en) | 1986-05-14 |
Family
ID=11774806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1132377A Granted JPS5397416A (en) | 1977-02-04 | 1977-02-04 | Light polymeric constitute possible for water development |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5397416A (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5971048A (en) * | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | Photopolymerizable photosensitive composition |
JPS59166944A (en) * | 1983-03-11 | 1984-09-20 | Sekisui Chem Co Ltd | Photosensitive composition |
JPS59231531A (en) * | 1983-06-13 | 1984-12-26 | Agency Of Ind Science & Technol | Photosensitive polymer material |
JPH0731399B2 (en) * | 1984-12-21 | 1995-04-10 | 三菱化学株式会社 | Photopolymerizable composition |
JPH083634B2 (en) * | 1986-05-09 | 1996-01-17 | 関西ペイント株式会社 | Method for electrodeposition coating of electrodeposition coating composition for printed wiring photoresist |
TW229350B (en) * | 1992-08-28 | 1994-09-01 | Hitachi Seisakusyo Kk | |
JP2003040923A (en) * | 2001-07-30 | 2003-02-13 | Shinnakamura Kagaku Kogyo Kk | Water-dispersible and ultraviolet-curable polymer, and use and production method thereof |
-
1977
- 1977-02-04 JP JP1132377A patent/JPS5397416A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5397416A (en) | 1978-08-25 |
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