JPS61173942U - - Google Patents
Info
- Publication number
- JPS61173942U JPS61173942U JP1985056006U JP5600685U JPS61173942U JP S61173942 U JPS61173942 U JP S61173942U JP 1985056006 U JP1985056006 U JP 1985056006U JP 5600685 U JP5600685 U JP 5600685U JP S61173942 U JPS61173942 U JP S61173942U
- Authority
- JP
- Japan
- Prior art keywords
- support frame
- thin film
- photomask
- notch
- adhesive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Description
第１図は本考案の一実施態様による防塵機構の
斜視図、第２図は防塵機構離脱用の補助部材の斜
視図、第３図は従来のフオトマスクの防塵機構を
示す斜視図である。
１，５…透明樹脂薄膜、２，６…支持枠、３，
７…粘着層、４，８…フオトマスク、９…切り欠
き部、１０…通気性膜材料。
FIG. 1 is a perspective view of a dustproof mechanism according to an embodiment of the present invention, FIG. 2 is a perspective view of an auxiliary member for removing the dustproof mechanism, and FIG. 3 is a perspective view of a conventional photomask dustproof mechanism. 1, 5... Transparent resin thin film, 2, 6... Support frame, 3,
7... Adhesive layer, 4, 8... Photomask, 9... Notch, 10... Breathable membrane material.
Claims (1)
支持する支持枠と、支持枠の薄膜と反対側の端部
に設けられた粘着層とからなるフオトマスクの防
塵機構において、支持枠がその粘着層側に少くと
も１個の切欠き部を有し、該切り欠き部が外側か
ら通気性膜材料で覆われていることを特徴とする
フオトマスク用防塵機構。 In the dustproof mechanism of a photomask, which consists of a transparent resin thin film, a support frame that adheres and supports the peripheral edge of the thin film at the end, and an adhesive layer provided at the end of the support frame opposite to the thin film, the support frame is A dustproof mechanism for a photomask, characterized in that the adhesive layer side has at least one notch, and the notch is covered from the outside with a breathable film material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985056006U JPS61173942U (en) | 1985-04-15 | 1985-04-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985056006U JPS61173942U (en) | 1985-04-15 | 1985-04-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61173942U true JPS61173942U (en) | 1986-10-29 |
Family
ID=30579210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985056006U Pending JPS61173942U (en) | 1985-04-15 | 1985-04-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61173942U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001005169A (en) * | 1999-06-24 | 2001-01-12 | Shin Etsu Chem Co Ltd | Pellicle and production of pellicle |
| JP2021073536A (en) * | 2017-10-10 | 2021-05-13 | 信越化学工業株式会社 | Euv pellicle frame ventilation structure, euv pellicle, exposure original plate with euv pellicle, exposure method, method for producing semiconductor and method for producing liquid crystal display |
-
1985
- 1985-04-15 JP JP1985056006U patent/JPS61173942U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001005169A (en) * | 1999-06-24 | 2001-01-12 | Shin Etsu Chem Co Ltd | Pellicle and production of pellicle |
| JP2021073536A (en) * | 2017-10-10 | 2021-05-13 | 信越化学工業株式会社 | Euv pellicle frame ventilation structure, euv pellicle, exposure original plate with euv pellicle, exposure method, method for producing semiconductor and method for producing liquid crystal display |