JPS61165388A - Production of spirooxazine derivative - Google Patents
Production of spirooxazine derivativeInfo
- Publication number
- JPS61165388A JPS61165388A JP60004100A JP410085A JPS61165388A JP S61165388 A JPS61165388 A JP S61165388A JP 60004100 A JP60004100 A JP 60004100A JP 410085 A JP410085 A JP 410085A JP S61165388 A JPS61165388 A JP S61165388A
- Authority
- JP
- Japan
- Prior art keywords
- group
- derivative
- alkyl
- general formula
- nitro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 19
- 239000000126 substance Substances 0.000 claims abstract description 17
- 125000001273 sulfonato group Chemical class [O-]S(*)(=O)=O 0.000 claims abstract description 14
- SYUYTOYKQOAVDW-UHFFFAOYSA-N 2-nitrosonaphthalen-1-ol Chemical class C1=CC=C2C(O)=C(N=O)C=CC2=C1 SYUYTOYKQOAVDW-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 9
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 8
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 8
- 150000002367 halogens Chemical class 0.000 claims abstract description 8
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 4
- -1 nitro-substituted phenyl group Chemical group 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 3
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 3
- 125000003884 phenylalkyl group Chemical group 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 16
- 239000000463 material Substances 0.000 abstract description 15
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 abstract description 7
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical compound C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 abstract description 3
- CVPPUZPZPFOFPK-UHFFFAOYSA-N 2-phenylethyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCCC1=CC=CC=C1 CVPPUZPZPFOFPK-UHFFFAOYSA-N 0.000 abstract description 2
- FLHJIAFUWHPJRT-UHFFFAOYSA-N 2,3,3-trimethylindole Chemical compound C1=CC=C2C(C)(C)C(C)=NC2=C1 FLHJIAFUWHPJRT-UHFFFAOYSA-N 0.000 abstract 1
- 229910006069 SO3H Inorganic materials 0.000 abstract 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 abstract 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 33
- 239000002904 solvent Substances 0.000 description 28
- 238000006243 chemical reaction Methods 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 19
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 238000002156 mixing Methods 0.000 description 6
- 239000012467 final product Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000000376 reactant Substances 0.000 description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 150000001805 chlorine compounds Chemical class 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 150000002430 hydrocarbons Chemical class 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 150000004763 sulfides Chemical class 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 239000003586 protic polar solvent Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- FDVITFMRUUGIBF-UHFFFAOYSA-N 2-methylidene-1,3-dihydroindole Chemical class C1=CC=C2NC(=C)CC2=C1 FDVITFMRUUGIBF-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007336 electrophilic substitution reaction Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- IVQOVYWBHRSGJI-UHFFFAOYSA-N hexyl 4-methylbenzenesulfonate Chemical compound CCCCCCOS(=O)(=O)C1=CC=C(C)C=C1 IVQOVYWBHRSGJI-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- OIRDBPQYVWXNSJ-UHFFFAOYSA-N methyl trifluoromethansulfonate Chemical compound COS(=O)(=O)C(F)(F)F OIRDBPQYVWXNSJ-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 241000122205 Chamaeleonidae Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- 229930194542 Keto Natural products 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 235000012255 calcium oxide Nutrition 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000004042 decolorization Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- FDPIMTJIUBPUKL-UHFFFAOYSA-N dimethylacetone Natural products CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000007350 electrophilic reaction Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 125000003387 indolinyl group Chemical group N1(CCC2=CC=CC=C12)* 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- VUQUOGPMUUJORT-UHFFFAOYSA-N methyl 4-methylbenzenesulfonate Chemical compound COS(=O)(=O)C1=CC=C(C)C=C1 VUQUOGPMUUJORT-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical group [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- LYQJBZLAANNIER-UHFFFAOYSA-N octyl 4-methylbenzenesulfonate Chemical compound CCCCCCCCOS(=O)(=O)C1=CC=C(C)C=C1 LYQJBZLAANNIER-UHFFFAOYSA-N 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000006561 solvent free reaction Methods 0.000 description 1
- 238000009331 sowing Methods 0.000 description 1
- 238000007447 staining method Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は印写用フォトクロミック材料、光学機器用フォ
トクロミック材料、記録材料用フォトクロミック材料ま
たは衣料、装飾品用フォトクロミック材料として有用な
フォトクロミック化合物の製造法に関する。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a method for producing a photochromic compound useful as a photochromic material for printing, a photochromic material for optical equipment, a photochromic material for recording materials, or a photochromic material for clothing and decorative items. Regarding.
(従来の技術)
フォトクロミック化合物の代表的なものに、スピロピラ
ン誘導体があり、多くの誘導体が知られている( G、
H,Brown 、 @Photochromis
m ” 、 Willeyrnterscience
、 New York (1971) )。(Prior art) Spiropyran derivatives are typical photochromic compounds, and many derivatives are known (G,
H, Brown, @Photochromis
m”, Willeyrnterscience
, New York (1971)).
一方、特公昭49 48651号にはスピロオキサジン
誘導体の製造方法が記述されている。On the other hand, Japanese Patent Publication No. 49-48651 describes a method for producing spirooxazine derivatives.
(発明が解決しようとする問題点) スピロピラン誘導体は合成は容易である反面。(Problem that the invention attempts to solve) On the other hand, spiropyran derivatives are easy to synthesize.
光による発消色において疲労が激しいという欠点がある
。すなわち、溶媒またはマトリックスポリマー中に溶解
あるいは添加したものは、フェードメータなどで紫外光
に長時間さらされることにより、もはやフォトクロミッ
ク特性を示さなくなるという致命的な実用上の欠点を有
している。The drawback is that it causes severe fatigue when coloring and fading due to light. That is, a substance dissolved in or added to a solvent or matrix polymer has a fatal practical drawback in that it no longer exhibits photochromic properties when exposed to ultraviolet light using a fade meter or the like for a long time.
一方、スピロオキサジン誘導体は、一般にスピロピラン
誘導体に比べ、耐疲労性が良いことが知られている。し
かし、これらの化合物における従来の製造法が、単離困
難なインドレニウムハライドを出発原料として用いてい
るため9合成可能なスピロオキサジン誘導体の種類はご
く少数に限られていた。このことは、各種の異なったフ
ォトクロミック特性を有するスピロオキサジン化合物を
得る上で2重大な問題点であった。On the other hand, spirooxazine derivatives are generally known to have better fatigue resistance than spiropyran derivatives. However, since the conventional production methods for these compounds use indolenium halide, which is difficult to isolate, as a starting material, the types of spirooxazine derivatives that can be synthesized are limited to a very small number. This poses two serious problems in obtaining spirooxazine compounds with various different photochromic properties.
(問題点を解決するだめの手段)
本発明は、前記の問題点を改良することを目的とし、下
記の構成からなる。(Means for Solving the Problems) The present invention aims to improve the above-mentioned problems and consists of the following configuration.
[下記一般式CD]で示されるスピロオキサジン誘導体
の製造方法罠おいて。A method for producing a spirooxazine derivative represented by the general formula CD below.
で表わされるトリメチルインドレニン誘導体と。A trimethylindolenine derivative represented by
一般式CB) R,−0+ So、RCB) で表わされるスルホネート誘導体と。General formula CB) R, -0+ So, RCB) and a sulfonate derivative represented by
一般式〔C〕 N。General formula [C] N.
で表わされるモトロソ・す7ト一ル誘導体および塩基性
物質を反応させることを特徴とするスピロオキサジン誘
導体の製造方法。1. A method for producing a spirooxazine derivative, which comprises reacting a motroso-su7toyl derivative represented by the formula and a basic substance.
(ここでR6は水素、ハロゲン、ニトロ基、シアノ基、
炭素数1〜5のアルキル基またはアルコキシ基を表わし
、R2は炭素数1〜20の無置換または置換アルキル基
を表わし、Rは炭素数1〜8のアルキル基、ハロゲン化
アルキル基、ハロゲン化フェニル基、ニトロ置換アルキ
ル基、ニトロ置換フェニル基またはアルキル置換フェニ
ル基を表わし。(Here, R6 is hydrogen, halogen, nitro group, cyano group,
Represents an alkyl group or alkoxy group having 1 to 5 carbon atoms, R2 represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms, and R represents an alkyl group having 1 to 8 carbon atoms, a halogenated alkyl group, or a halogenated phenyl group. represents a nitro-substituted alkyl group, a nitro-substituted phenyl group or an alkyl-substituted phenyl group.
R8およびR4は水素、ハロゲン、スルホン酸基。R8 and R4 are hydrogen, halogen, and sulfonic acid group.
スルホン酸ソーダ基、カルボキシル基、’炭素数1〜5
のアルキル基、アルコキシ基まだはアルキルオキシカル
ボニル基を表わす。)」
本発明で使用される一般式(A)で表わされるトリメチ
ルインドレニン誘導体とは9例えばメチルインプロピル
ケトンの置換フェニルヒドラゾンの環化反応により合成
される( He1v 、 Chim 、 Acta 。Sodium sulfonate group, carboxyl group, 'C1-5
The alkyl group and alkoxy group represent an alkyloxycarbonyl group. )" The trimethylindolenine derivative represented by the general formula (A) used in the present invention is synthesized by, for example, a cyclization reaction of a substituted phenylhydrazone of methyl impropyl ketone (He1v, Chim, Acta).
25、2471 (1940) )。25, 2471 (1940)).
R8としては、水素、ノ・ロゲン、ニトロ基、炭素数1
〜5のアルキル基またはアルコキシ基が挙げられる。R8 is hydrogen, nitrogen, nitro group, carbon number 1
-5 alkyl groups or alkoxy groups.
本発明で使用される一般式CB)で表わされるスルホネ
ート誘導体とは公知の方法により合成されるものであり
9例えばアルキルアルコールとスルホネートハライドの
反応による合成方法等が挙げられる( Organic
5ynthesis 、 Co11ective’
Vol、 I、 145ン。The sulfonate derivative represented by the general formula CB used in the present invention can be synthesized by a known method.
5ynthesis, Co11active'
Vol. I, 145.
スルホネート誘導体におけるR2としては、炭素数1〜
20の無置換または置換アルキル基を表わし、一般式〔
D〕で表わされるスピロオキサジン誘導体のインドリン
環のN位に導入されるものである。また、Rfにおける
置換基としては、各種の官能基を挙げることができ2例
としてはカルボキシル基、ヒドロキシ基、(置換)フェ
ニル基、シアノ基、ハロゲン、ニトロ基、炭素数1〜5
のアルコキシ基まだはアルキルオキシカルボニル基等が
挙げられる。とくに本発明におけるスルホネート誘導体
を使用する特徴を最大限に発揮できるものとしては、イ
ノプロピル基、ジフェニルメチル基。R2 in the sulfonate derivative has 1 to 1 carbon atoms.
20 unsubstituted or substituted alkyl groups, represented by the general formula [
It is introduced into the N-position of the indoline ring of the spirooxazine derivative represented by D]. Further, as the substituent in Rf, various functional groups can be mentioned, and two examples include carboxyl group, hydroxy group, (substituted) phenyl group, cyano group, halogen, nitro group, and carbon number 1 to 5.
Examples of the alkoxy group include an alkyloxycarbonyl group. In particular, inopropyl group and diphenylmethyl group can maximize the characteristics of using sulfonate derivatives in the present invention.
ベンジル基および各種置換基誘導体などの立体障害の大
きいものが挙げられる。Examples include those with large steric hindrance such as a benzyl group and various substituent derivatives.
スルホネート誘導体におけるRとしては、炭素数1〜8
のアルキル基、ノ・ロゲン化アルキル基。R in the sulfonate derivative has 1 to 8 carbon atoms.
alkyl group, no-logenated alkyl group.
ハロゲン化フェニル基、ニトロ置換アルキル基。Halogenated phenyl group, nitro-substituted alkyl group.
ニトロ置換フェニル基またはアルキル置換フェニル基が
挙げられる。とくに反応性等の観点からは。Mention may be made of nitro-substituted phenyl groups or alkyl-substituted phenyl groups. Especially from the point of view of reactivity.
ハロゲン化アルキル基、パラ置換フェニル基、炭素数1
〜4のアルキル基が好ましく用いられる。Halogenated alkyl group, para-substituted phenyl group, carbon number 1
-4 alkyl groups are preferably used.
中でもとくに好ましく使用されるものとして、トリフル
オロメチル基、2,2.2−)リフルオロエチル基+
p l’fルフェニル基+ p −ブロムフェニ
ル基、P−ニトロフェニル基まだはブチル基等が挙げら
れる。Among them, trifluoromethyl group, 2,2.2-)lifluoroethyl group +
Examples include pl'f ruphenyl group + p-bromphenyl group, P-nitrophenyl group and butyl group.
これらスルホネート誘導体の具体的な化合物例としては
、メチルトシレート(トシレートとけP−トルエンスル
ホネートの略)、メチルプロシレー)(プロシレートト
ハp −フロムベンゼンスルホネートの略)、メチルト
リフルオロメタンスルホネート、ヘキシルトシレート、
オクチルトシレートまたはβ−フェニルエチルトシレー
ト等が挙げられる。Specific examples of these sulfonate derivatives include methyl tosylate (abbreviation for tosylate p-toluenesulfonate), methyl prosylate (abbreviation for prosylate p-frombenzenesulfonate), methyl trifluoromethanesulfonate, hexyl tosylate,
Examples include octyl tosylate and β-phenylethyl tosylate.
本発明で使用される一般式(C)で表わされるニトロソ
ナフトール誘導体は2例えば置換ナフトーールのニトロ
ン化により合成される。R3およびR4としては、 水
L ハロゲン、スルホン酸基、スルホン酸ソーダ基、カ
ルボキシル基、Flfi1〜5のアルキル基、アルコキ
シ基または・アルキルオキシカルボニル基が挙げられる
。The nitrosonaphthol derivative represented by the general formula (C) used in the present invention is synthesized by nitronation of 2, for example, substituted naphthols. Examples of R3 and R4 include a water L halogen, a sulfonic acid group, a sodium sulfonate group, a carboxyl group, an alkyl group of Flfi1 to 5, an alkoxy group, or an alkyloxycarbonyl group.
本発明で使用される塩基性物質とは、有機または無機の
塩基性のものであれば何でも良いが、ピリジン、ピペリ
ジン、トリエチルアミン等のアミン類が好ましく用いら
れる。The basic substance used in the present invention may be any organic or inorganic basic substance, but amines such as pyridine, piperidine, and triethylamine are preferably used.
本発明における一般式(A)で表わされるトリメチルイ
ンドレニン誘導体、一般式CB)で表わされるスルホネ
ート誘導体、一般式(C)で表わされるニトロソナフト
ール誘導体および塩基性物質を反応させる上において、
添加順序としてはいかなる方法も取シうるが、最も一般
的に行なわれる方法としては、一般式(A)で表わされ
るトリメチルインドレニン誘導体と一般式CB)で表わ
されるスルホネート誘導体を混合し、さらに塩基性物質
および一般式〔C〕で表わされるニトロソナフトール誘
導体を添加混合する方法が挙げられる。In reacting the trimethylindolenine derivative represented by general formula (A), the sulfonate derivative represented by general formula CB), the nitrosonaphthol derivative represented by general formula (C) and a basic substance in the present invention,
Although any method can be used for the order of addition, the most common method is to mix the trimethylindolenine derivative represented by the general formula (A) and the sulfonate derivative represented by the general formula CB), and then add a base. A method of adding and mixing a chemical substance and a nitrosonaphthol derivative represented by the general formula [C] can be mentioned.
他の方法としては、トリメチルインドレニン誘導体、ス
ルホネート誘導体、ニトロソナフトール誘導体および塩
基性物質を同時に添加混合する方法、トリメチルインド
レニン誘導体とニトロソナフトール誘導体を混合し、さ
らに塩基性物質およびスルホネート誘導体を添加混合す
る方法等が挙げられる。Other methods include adding and mixing a trimethylindolenine derivative, a sulfonate derivative, a nitrosonaphthol derivative, and a basic substance at the same time, or mixing a trimethylindolenine derivative and a nitrosonaphthol derivative, and then adding and mixing a basic substance and a sulfonate derivative. Examples include a method to do so.
本発明の反応溶媒としては、各種溶媒を使用することが
でき、また無溶媒も可能である。反応後の除去および反
応系温度のコントロールの観点から、60〜160℃ま
での沸点を有する有機溶剤が好ましく用いられる。As the reaction solvent of the present invention, various solvents can be used, and solvent-free reaction is also possible. From the viewpoint of removal after the reaction and control of the reaction system temperature, an organic solvent having a boiling point of 60 to 160°C is preferably used.
具体例としては、ベンゼン、ヘキサン等の炭化水素★
クロロホルム、塩化メチレン等の塩化物。Specific examples include hydrocarbons such as benzene and hexane★
Chlorides such as chloroform and methylene chloride.
二硫化炭素、ジメチルスルホキシド等の硫化物。Sulfides such as carbon disulfide and dimethyl sulfoxide.
アセト/、メチルエチルケト/、酢酸エチル、アセトニ
トリル等の極性アブロティツク溶媒、テトラヒドロフラ
ン、ジオキサン等のエーテル類、メタノール、エタノー
ル、メチルセロソルブ、エチレングリコール等の極性グ
ロテイツク溶媒等が挙けられる。Examples include polar abrotic solvents such as aceto/, methyl ethyl keto/, ethyl acetate, and acetonitrile, ethers such as tetrahydrofuran and dioxane, and polar grootic solvents such as methanol, ethanol, methyl cellosolve, and ethylene glycol.
上記溶媒は、少量の水を含むことは何ら問題がないが、
収率向上の観点からは脱水して用いられることが好まし
い。There is no problem with the above solvent containing a small amount of water, but
From the viewpoint of improving yield, it is preferable to use it after dehydration.
上記反応において、一般式(A)で表わされるトリメチ
ルインドレニン誘導体と一般式CB)で表わされるスル
ホネート誘導体の反応生成物であるインドレニウム塩を
単離することも十分可能であるが1作業性および精製時
のロス等の点から、連続的に反応を完結させることが好
ましい。In the above reaction, it is possible to isolate the indolenium salt which is the reaction product of the trimethylindolenine derivative represented by the general formula (A) and the sulfonate derivative represented by the general formula CB), but it is possible to From the viewpoint of loss during purification, it is preferable to complete the reaction continuously.
上記反応の条件は9例えば反応温度1反応時間。The conditions for the above reaction are 9, for example, reaction temperature and 1 reaction time.
反応雰囲気2反応物質の混合モル比等は2反応物質によ
ってそれぞれ実験的に決められるべきである。The reaction atmosphere, the mixing molar ratio of the two reactants, etc. should be determined experimentally for each of the two reactants.
一般的には9反応収率の点から1反応時間としては0,
1〜16時間2時間2皮応温ては各反応段階で変えるこ
とが可能でちゃ2通常は使用する溶媒の環流温度が好ま
しく用いられる。Generally, from the point of view of reaction yield, one reaction time is 0,
The temperature can be changed at each reaction step, but the reflux temperature of the solvent used is usually preferably used.
次に反応雰囲気としては、酸化分解等による収率低下を
防ぐ目的で、不活性ガスで置換されていることが好まし
い。かかる不活性ガス置換は、混合前において行なわれ
ることが、収率向上には特に好ましい。Next, the reaction atmosphere is preferably replaced with an inert gas in order to prevent a decrease in yield due to oxidative decomposition or the like. It is particularly preferable to perform such inert gas substitution before mixing in order to improve the yield.
不活性ガスとしては、収率を低下させないものであれば
何でもよいが1通常は窒素、ヘリウム。Any inert gas may be used as long as it does not reduce the yield, but nitrogen and helium are usually used.
アルゴン等が好ましく使用される。Argon or the like is preferably used.
本発明における反応物質の添加モル比は、トリメチルイ
ンドレニン1モルに対シて、スルホネート誘導体は0,
5〜50モル用いられるのが好ましく、特KO18〜5
モルが好ましい。ニトロソナフトール誘導体は0.1〜
10モル用いられるツカ好ましく、特に0.5〜1.5
モルが好ましい。塩基性物質は0.5モル以上用いられ
るのが好ましく、特に0.5〜50モルが好ましい。In the present invention, the molar ratio of the reactants added is 0 to 1 mole of trimethylindolenine,
It is preferable to use 5 to 50 moles, and especially KO18 to 5
Moles are preferred. Nitrosonaphthol derivatives are from 0.1 to
The strength used is preferably 10 mol, especially 0.5 to 1.5
Moles are preferred. The basic substance is preferably used in an amount of 0.5 mol or more, particularly preferably 0.5 to 50 mol.
なお、前記反応条件で温度あるいは時間が下限より低い
かあるいは短かい場合には、それぞれの反応が十分に進
行しないため、最終生成物であるスピロオキサジン誘導
体の収率が低下する傾向がある。また上限より高いかあ
るいは長い場合には。Note that if the temperature or time under the above reaction conditions is lower than or shorter than the lower limit, each reaction will not proceed sufficiently, and the yield of the final product, the spirooxazine derivative, will tend to decrease. Also, if it is higher or longer than the upper limit.
反応生成物および/または反応物質が熱分解等により消
失し、最終生成物の収率低下をもたらすので好ましくな
い。一方2反応物質の混合モル比については、前記の範
囲をはずれた場合には、最終生成物の収率低下をもたら
すげかり°か、最終生成物の単離も困難になるので好ま
しくない。This is not preferable because the reaction product and/or the reactant disappears due to thermal decomposition or the like, resulting in a decrease in the yield of the final product. On the other hand, if the molar ratio of the two reactants is out of the above range, it is not preferable because it will not only lower the yield of the final product but also make it difficult to isolate the final product.
一般式〔D〕で表わされる最終生成物スピロオキサジン
誘導体の分離精製は、各種溶剤を用いた再結晶法、各種
支持担体および各種有機溶剤を用いたカラム分離法、活
性炭処理法などが可能であるが、さらにはこれらを組み
合わせて複合的に行なうこともできる。The final product spirooxazine derivative represented by general formula [D] can be separated and purified by recrystallization using various solvents, column separation using various supports and organic solvents, activated carbon treatment, etc. However, it is also possible to combine these methods in a complex manner.
再結晶法で°用いられる溶剤はスピロオキサジン誘導体
が可溶なものであれば何でも良く、単一または混合溶剤
が用いられる。具体例としては、ベンゼン、トルエン、
ヘキサン等の炭化水g、paロホルム、塩化メチレン等
の塩化物書二硫化炭素。The solvent used in the recrystallization method may be any solvent as long as the spirooxazine derivative can be dissolved therein, and a single solvent or a mixed solvent may be used. Specific examples include benzene, toluene,
Hydrocarbons such as hexane, chloroform, methylene chloride, and carbon disulfide.
ジメチルスルホキシド等の硫化物、アセトン、メチルエ
チルケトン、酢酸エチル、アセトニトリル等の極性アブ
ロティツク溶媒、テトラヒドロフラン、ジオキサン、ジ
エチルエーテル等のエーテル類、メタノール、エタノー
ル、メチルセロソルブ。Sulfides such as dimethyl sulfoxide, polar abrotic solvents such as acetone, methyl ethyl ketone, ethyl acetate, and acetonitrile, ethers such as tetrahydrofuran, dioxane, and diethyl ether, methanol, ethanol, and methyl cellosolve.
エチレングリコール等の極性プロティック溶媒などが単
一または混合浴・剤として用いられる。Polar protic solvents such as ethylene glycol are used alone or in mixed baths/agents.
カラム分離法に用いられる支持担体の具体例としては、
シリカゲル、アルミナ、セルロース、水酸化カルシウム
、生石灰などが挙げられる。Specific examples of supports used in column separation methods include:
Examples include silica gel, alumina, cellulose, calcium hydroxide, and quicklime.
また展開溶剤は、スピロオキサジン誘導体が可溶で、上
記支持担体が不溶であれば何でも良く。Any developing solvent may be used as long as the spirooxazine derivative is soluble and the support carrier is insoluble.
具体的には、ベンゼン、トルエン、ヘキv”、’等。Specifically, benzene, toluene, hexv'', ', etc.
炭化水素、クロロホルム、塩化メチレン等の塩化物、ア
セトン、メチルエチルケトン、酢酸エチル等の極性アブ
ロティツク溶媒、テトラヒドロフラン、ジオキサン等の
エーテル類、メタノール、エタノールなどの極性プロテ
ィック溶媒等が単一または混合溶媒として用いられる。Hydrocarbons, chlorides such as chloroform and methylene chloride, polar abrotic solvents such as acetone, methyl ethyl ketone and ethyl acetate, ethers such as tetrahydrofuran and dioxane, polar protic solvents such as methanol and ethanol, etc. can be used as single or mixed solvents. It will be done.
各種支持担体と各種展開溶剤の組み合せは、被分離物の
溶解性を流出速度などに応じて、実験的に決められるべ
きである。The combination of various supporting carriers and various developing solvents should be determined experimentally depending on the solubility of the substance to be separated, the flow rate, etc.
活性炭処理法で用いられる溶剤はスピロオキサジン誘導
体が可溶なものであれば何でも良く、単一または混合溶
媒が用いられる。具体例としては。The solvent used in the activated carbon treatment method may be any solvent as long as the spirooxazine derivative can be dissolved therein, and a single solvent or a mixed solvent may be used. As a specific example.
ベンゼン、トルエン、ヘキサン等の炭化水素、クロロホ
ルム、塩化メチレン等の塩化物、二硫化炭素夛 ジメチ
ルスルホキシド等の硫化°物、アセトン。Hydrocarbons such as benzene, toluene and hexane, chlorides such as chloroform and methylene chloride, sulfides such as carbon disulfide and dimethyl sulfoxide, and acetone.
メチルエチルケトン、酢酸エチル、アセトニトリル等の
極性アブロティツク溶媒、テトラヒドロフラン、ジオキ
サン等のエーテル類、メタノール。Polar abrotic solvents such as methyl ethyl ketone, ethyl acetate, and acetonitrile, ethers such as tetrahydrofuran and dioxane, and methanol.
エタノール、メチルセロソルブ、エチレングリコール等
の極性グロテイック溶媒などが単一または混合溶媒とし
て用いられる。Polar glotic solvents such as ethanol, methyl cellosolve, and ethylene glycol are used alone or as a mixed solvent.
このようにして得られたスピロオキサジ/誘導体は、ポ
リマーを適当な溶剤に溶解させた溶液に溶解させたのち
、板状、繊維状等の被塗布物上にコーティングすること
、あるいはフィルム状にすることが可能である。The spirooxadi/derivative thus obtained is dissolved in a solution of the polymer in an appropriate solvent, and then coated on an object to be coated such as a plate or fiber, or made into a film. is possible.
ポリマーの具体例としては、ポリ酢酸ビニル。A specific example of the polymer is polyvinyl acetate.
ポリ塩化ビニル、ポリビニルブチラール、ポリメ、
チルメタクリレート、酢酸セルロース、ポリビニルピロ
リドン、ホリスチロール、ヒドロキシエチルセルロース
、ヒドロキシプロピルセルロース。Polyvinyl chloride, polyvinyl butyral, polymer,
Til methacrylate, cellulose acetate, polyvinylpyrrolidone, foristyrol, hydroxyethylcellulose, hydroxypropylcellulose.
エポキシ樹脂、フェノール樹脂、ポリシロキサン樹脂、
ウレタン樹脂等の各種の熱可塑性あるいは熱硬化性樹脂
等が挙げられる。Epoxy resin, phenolic resin, polysiloxane resin,
Examples include various thermoplastic or thermosetting resins such as urethane resins.
溶剤の具体例としては、ベンゼン、トルエン等の不飽和
炭化水素、アセトン、メチルエチルケトン、アセトニト
リル、ジメチルホルムアミド等の極性アブロティツク溶
媒、エタノール、n−ブタノール等の極性プロティック
溶媒、塩化メチレン。Specific examples of the solvent include unsaturated hydrocarbons such as benzene and toluene, polar abrotic solvents such as acetone, methyl ethyl ketone, acetonitrile, and dimethylformamide, polar protic solvents such as ethanol and n-butanol, and methylene chloride.
クロロホルム等の塩化物、ジメチルスルホキシド等の硫
化物等が挙げられる。Examples include chlorides such as chloroform, sulfides such as dimethyl sulfoxide, and the like.
またメチルメタクリレート、スチレン、エポキシ化合物
、メラミン化合物等の重合可能なモノマーに添加し、適
当な重合開始剤で重合することにより、硬化樹脂中に存
在させて使用することも可能である。重合開始剤の具体
例としては、アゾビスイソブチロニトリル等のアゾ化合
物が好ましく用いられるものとして挙げられる。It is also possible to use it by adding it to a polymerizable monomer such as methyl methacrylate, styrene, epoxy compound, or melamine compound and polymerizing it with a suitable polymerization initiator so that it is present in a cured resin. As a specific example of the polymerization initiator, an azo compound such as azobisisobutyronitrile is preferably used.
またポリカーボネート、ポリメチルメタクリレートおよ
びジエチレングリコールビスアリルカーボネートポリマ
−(CR−!i9)等の透明基体に。Also, for transparent substrates such as polycarbonate, polymethyl methacrylate, and diethylene glycol bisallyl carbonate polymer (CR-!i9).
染色手法を用いて添加することも可能である。染色手法
とは、適当な溶剤にスピロオキサジン誘導体を溶解また
は分散させて調整した溶液中に、透明基体を浸漬し、加
熱攪拌すること゛により、スピロオキサジン誘導体を透
明基体に拡散させることによる方法である。It is also possible to add using a staining method. The dyeing method is a method in which the spirooxazine derivative is diffused into the transparent substrate by immersing the transparent substrate in a solution prepared by dissolving or dispersing the spirooxazine derivative in an appropriate solvent and heating and stirring. be.
さらには真空蒸着法などによって、ポリマー表面に付着
させることも可能である。Furthermore, it is also possible to attach it to the polymer surface by a vacuum evaporation method or the like.
このように本発明の化合物は各種マトリックスポリマー
に各種方法で添加することが可能である。Thus, the compounds of the present invention can be added to various matrix polymers in various ways.
本発明によって得られるスピロオキサジン誘導体は印写
用フォトクロミック材料、プラスチックあるいはガラス
のレンズ、フィルターおよび光量計などの光学機器用フ
ォトクロミック材料、カメレオン繊維用フォトクロミッ
ク材料、変色人形用フォトクロミック材料、記録材料用
フォトクロミック材料等に利用することができる。The spirooxazine derivatives obtained by the present invention are photochromic materials for printing, photochromic materials for optical instruments such as plastic or glass lenses, filters and light meters, photochromic materials for chameleon fibers, photochromic materials for color-changing dolls, and photochromic materials for recording materials. It can be used for etc.
すなわち本発明によって得られるスピロオキサジン誘導
体は溶剤、マトリックスポリマーの種類によらず、一般
的な状態では無色であるが、紫外線の照射を受けると直
ちに可視光領域に吸収波長を有する化合物に変化し、紫
外線の照射をやめると速やかにもとの無色に戻る。That is, the spirooxazine derivative obtained by the present invention is generally colorless regardless of the type of solvent or matrix polymer, but when irradiated with ultraviolet rays, it immediately changes into a compound having an absorption wavelength in the visible light region. When UV irradiation is stopped, it quickly returns to its original colorless state.
本発明によって得られるスピロオキサジン誘導体は2発
色速度が大きく、かつ消色速度も大きく。The spirooxazine derivative obtained by the present invention has a high rate of two-color development and a high rate of decolorization.
発色濃度が大きく、かつ耐疲労性が非常に良いという特
性を有しているフォトクロミンク化合物である。It is a photochromic compound that has the characteristics of high color density and very good fatigue resistance.
また本発明によって得られるスピロオキサジン誘導体は
、溶剤、まだはマトリックスポリマー中で加熱されると
無色から可視光領域に吸収波長を有する化合物に変化し
、冷却すると速やかにもとの無色にもどるというサーモ
クロミック特性をも有する化合物である。In addition, the spirooxazine derivative obtained by the present invention changes from colorless to a compound having an absorption wavelength in the visible light region when heated in a solvent or matrix polymer, and quickly returns to its original colorless state when cooled. It is a compound that also has chromic properties.
そのため本発明によって得られるスピロオキサジン誘導
体は、温度センサー用サーモクロミック材料、記録材料
用サーモクロミック材料等に利用することも可能である
。Therefore, the spirooxazine derivative obtained by the present invention can also be used as a thermochromic material for temperature sensors, a thermochromic material for recording materials, etc.
本発明の製造法によれば、従来法では合成が困難もしく
は不可能であったスピロオキサジン誘導体の合成が可能
となる。特に好ましく適用される例としては一般式〔D
〕におけるR7が無置換および置換ベンジル基、または
α−フェニルエチル基等の立体的にかさ高い官能基であ
る誘゛導体が挙げられる。According to the production method of the present invention, it becomes possible to synthesize spirooxazine derivatives that are difficult or impossible to synthesize using conventional methods. A particularly preferably applied example is the general formula [D
Examples include derivatives in which R7 is a sterically bulky functional group such as an unsubstituted or substituted benzyl group or an α-phenylethyl group.
本発明の反応機構としては、一般式(A)で表わされる
トリメチルインドレニン誘導体に、一般式[B)で表わ
されるスルホネート誘導体が求電子反応することにより
、一般式(E)
で表わされるインドレニウム塩誘導体が生成しく求電子
置換反応)、該インドレニウム塩誘導体を塩基性物質が
還元することにより、一般式CF)R7
で表わされる2−メチレンインドリン誘導体力生成しく
中和、脱離反応)、該2−メチレンインドリン誘導体と
一般式(C)で表わされるニトロソナフトール誘導体が
還化および脱水反応することにより、一般式〔D〕で表
わされるスピロオキサジン誘導体が生成する(求核、脱
水反応)という反応機構が考えられる。The reaction mechanism of the present invention is that the sulfonate derivative represented by the general formula [B) undergoes an electrophilic reaction with the trimethylindolenine derivative represented by the general formula (A), whereby the indolenium represented by the general formula (E) When the indolenium salt derivative is reduced by a basic substance, a 2-methyleneindoline derivative represented by the general formula CF) R7 is produced (an electrophilic substitution reaction), which produces a salt derivative (an electrophilic substitution reaction), The 2-methyleneindoline derivative and the nitrosonaphthol derivative represented by the general formula (C) undergo a reflux and dehydration reaction to produce a spirooxazine derivative represented by the general formula [D] (nucleophilic, dehydration reaction). Possible reaction mechanism.
(実施例)
実施例1
■ 1−(2−フェニルエチル) −5,5−ジメチル
スピロ〔インドリン−2,5’−(3H)−ナフト(2
,1−b ) (1,4)オキサジン〕の合成(一般式
〔D〕において、 R,=R,=R,=H,R,=c
a、cH,KD)
β−フェニルエチルトシレート15.8gを50mzの
無水エタノールに溶解し、2,3.5−1−リメチルイ
ンドレニン8.0gを50mzの無水エタノールに溶解
し各々窒素ガスを15分間吹き込んだ後混合し窒素気流
中2時間還流する。その後1反応液の温度を50°Cま
で低下させ、トリエチルアミン10.0gを加え、50
分間かくはんする。その後。(Example) Example 1 ■ 1-(2-phenylethyl)-5,5-dimethylspiro[indoline-2,5'-(3H)-naphtho(2
, 1-b) Synthesis of (1,4)oxazine] (In the general formula [D], R, = R, = R, = H, R, = c
a. After blowing in for 15 minutes, the mixture was mixed and refluxed in a nitrogen stream for 2 hours. After that, the temperature of 1 reaction solution was lowered to 50 °C, 10.0 g of triethylamine was added, and 50 °C was added.
Stir for a minute. after that.
α−ニトロソ−β−ナフトール8.7gを加工、2時間
還流する。反応後濃縮し、アルミナを支持担体、トルエ
ンを展開溶媒としカラム分離する。トルエン留去後、得
られた固体をメタノールから再結晶し、さらにヘキサン
から再結晶し、白色の1−(2−7二二ルエチル) −
3,3−シメチルスヒ0口〔インドリン−2,5’−(
5H)−カプト〔2,1−bl(1,4)オキサジン〕
の結晶1.0gを得た。Process 8.7 g of α-nitroso-β-naphthol and reflux for 2 hours. After the reaction, it is concentrated and separated by column using alumina as a support carrier and toluene as a developing solvent. After distilling off the toluene, the obtained solid was recrystallized from methanol and further recrystallized from hexane to give white 1-(2-72-2-ethyl)-
3,3-dimethylsuhi 0 mouths [indoline-2,5'-(
5H)-capto[2,1-bl(1,4)oxazine]
1.0 g of crystals were obtained.
■ 分析結果
(融点) 107°C
(元素分析値) 実測値(チン 計算直(チンC85
,0R3,3
H6,26,2
N 6.7 6.7
■ 応用例
本化合物を0.5wt%の濃度に溶解させたポリビニル
ブチラール/n−ブタノール溶液をガラス板上に塗布乾
燥したものに、紫外線を照射すると青色になり、光を除
くと速やかKもとの無色に戻った。またこれを、フェー
ドメーターにて20時間の光照射を行なって、耐光性を
調べだところ、フェードメーターに入れる前とまったく
同様のフォトクロミック特性を示し、耐疲労性が優れて
いた。■ Analysis result (melting point) 107°C (Elemental analysis value) Actual value (Chin Calculated directly (Chin C85)
,0R3,3 H6,26,2 N 6.7 6.7 ■ Application example A polyvinyl butyral/n-butanol solution in which this compound was dissolved at a concentration of 0.5 wt% was applied onto a glass plate and dried. When exposed to ultraviolet light, it turned blue, and when the light was removed, it quickly returned to its original colorless state. When the light resistance was examined by irradiating it with light for 20 hours using a fade meter, it showed exactly the same photochromic properties as before being placed in the fade meter, and was found to have excellent fatigue resistance.
実施例2
■ 1−ヘキシル−3,3−ジメチルスピロ〔インドリ
ン−2,5’−[5H)−ナフト(2,1−b)(1゜
4)オキサジン〕の合成
(一般式〔D〕においてl R+=Rz=Ra=HI
R2=(CHy )sCJ )
ヘキシルトシレート25.0gを40mzの無水エタノ
ールに溶解し、2,3.3−トリメチルインドレニン8
.0gを40 rntの無水エタノールに溶解し各々窒
素ガスを15分間吹き込んだ後混合し、窒素気流中2時
間還流する。その後2反応液の温度を50℃まで低下さ
せ、α−ニトロン−β−ナフトール8.7gを加えた後
、トリエチルアミン10.0gを加え、2時間還流する
。反応後濃縮し、シリカゲルを支持担体、トルエンを展
開溶媒としカラム分離する。トルエン留去後、得られた
固体をトルエンから再結晶し、さらにエタノールから再
結晶し、白色の1−ヘキシル−5,5−ジメチルスピロ
〔インドリン−2,3(3H)−ナフト(2,1−b)
(1,4)オキサジン〕の結晶1.2gを得た。Example 2 ■ Synthesis of 1-hexyl-3,3-dimethylspiro[indoline-2,5'-[5H)-naphtho(2,1-b)(1°4)oxazine] (in general formula [D]) l R+=Rz=Ra=HI
R2=(CHy)sCJ) 25.0 g of hexyl tosylate was dissolved in 40 mz absolute ethanol, and 2,3.3-trimethylindolenine 8
.. 0 g was dissolved in 40 rnt of absolute ethanol, mixed after blowing nitrogen gas into each solution for 15 minutes, and refluxed in a nitrogen stream for 2 hours. Thereafter, the temperature of the two reaction solutions was lowered to 50° C., and 8.7 g of α-nitrone-β-naphthol was added, followed by 10.0 g of triethylamine, and the mixture was refluxed for 2 hours. After the reaction, it is concentrated and separated by column using silica gel as a support carrier and toluene as a developing solvent. After distilling off the toluene, the obtained solid was recrystallized from toluene and further recrystallized from ethanol to give white 1-hexyl-5,5-dimethylspiro[indoline-2,3(3H)-naphtho(2,1 -b)
1.2 g of crystals of (1,4)oxazine] were obtained.
■ 分析結果
(融点) 95℃
(元素分析値) 実測値(チ) 計算1直(チ)c
81.4 81.4H7,5Z5
N 7. OZ□
■ 応用例
本化合物をメチルメタアクリレートに溶解し。■ Analysis result (melting point) 95℃ (Elemental analysis value) Actual value (chi) Calculation 1st shift (chi) c
81.4 81.4H7,5Z5 N 7. OZ□ ■ Application example This compound was dissolved in methyl methacrylate.
アゾイソブチロニトリルを重合開始剤として用いキャス
ト重合したものは、紫外線の照射を受けると青色になり
、光を除き暗所に放置すると速やかにもとの無色に戻っ
た。Cast polymerization using azoisobutyronitrile as a polymerization initiator turned blue when irradiated with ultraviolet light, and quickly returned to its original colorless color when left in a dark place without light.
実施例6
■ 1.3.5− トIJメチルスピロ〔インドリン−
2゜5’−(5H]−ナフト(2,1−b ) (1,
4)オキサジン〕の合成
(一般式CD’]において、 R,=R,=R,=H,
R,=CH,)メチル−トリフルオロメタンスルホネー
ト15.0gを40 mtの無水エタノールに溶解し、
2,3.3−トリメチルインドレニン8.0gを40m
tの無水エタノールに溶解し各々窒素ガスを15分間吹
き込んだ後混合し、窒素気流中2時間還流する。その後
2反応液の温度を50°Cまで低下させ、トリエチルア
ミン10.0gを加え、50分間かくはんする。Example 6 ■ 1.3.5- IJ Methyl Spiro [Indoline-
2゜5'-(5H]-naphtho(2,1-b) (1,
4) Synthesis of [oxazine] (general formula CD'), R, =R, =R, =H,
R,=CH,) methyl-trifluoromethanesulfonate (15.0 g) was dissolved in 40 mt of absolute ethanol,
8.0g of 2,3.3-trimethylindolenine in 40m
of anhydrous ethanol, mixed after blowing in nitrogen gas for 15 minutes, and refluxed in a nitrogen stream for 2 hours. Thereafter, the temperature of the two reaction solutions was lowered to 50°C, 10.0 g of triethylamine was added, and the mixture was stirred for 50 minutes.
ソノ後、α−ニトロソ−β−ナフトール8.7gを加え
、2時間還流する。反応後濃縮し、アルミナを支持担体
、トルエンを展開溶媒としカラム分離する。トルエン留
去後、得られた固体をヘキサンから再結晶し、さらにエ
タノールから再結晶し。After sowing, 8.7 g of α-nitroso-β-naphthol was added, and the mixture was refluxed for 2 hours. After the reaction, it is concentrated and separated by column using alumina as a support carrier and toluene as a developing solvent. After distilling off the toluene, the obtained solid was recrystallized from hexane and further recrystallized from ethanol.
白色の1.3.3− )リンチルスピロ[インドリン−
2,5’−(5H]−ナフト(2,1−b)(1,4)
オキサジン〕の結晶6.9を得た。white 1.3.3- ) lynchylspiro [indoline-
2,5'-(5H]-naphtho(2,1-b)(1,4)
6.9 crystals of [Oxazine] were obtained.
■ 分析結果
(融点) 154〜135”C
(元素分析値) 実測値(チ) 計算値(チ)c
80.!l 80.5
H5,96,1
N 8.4 8.
5(発明の効果)
以上の説明から明らかなように1本発明の効果としては
。■ Analysis result (melting point) 154-135"C (elemental analysis value) Actual value (chi) Calculated value (chi) c
80. ! l 80.5
H5,96,1 N 8.4 8.
5 (Effects of the Invention) As is clear from the above explanation, one effect of the present invention is as follows.
一■ 従来法では得られなかった新規なスピロオキサジ
ン誘導体を製造することが可能となった。1) It became possible to produce a new spirooxazine derivative that could not be obtained by conventional methods.
■ 各種のスピロオキサジン誘導体を製造することが可
能となった。■ It has become possible to produce various spirooxazine derivatives.
■ スピロオキサジン誘導体の収率が向上した。■ The yield of spirooxazine derivatives was improved.
Claims (1)
導体の製造方法において、 ▲数式、化学式、表等があります▼〔D〕 一般式〔A〕 ▲数式、化学式、表等があります▼〔A〕 で表わされるトリメチルインドレニン誘導体と、一般式
〔B〕 R_2−O−SO_2R 〔B〕 で表わされるスルホネート誘導体と、一般式〔C〕▲数
式、化学式、表等があります▼〔C〕 で表わされるニトロソ・ナフトール誘導体および塩基性
物質を反応させることを特徴とするスピロオキサジン誘
導体の製造方法。 (ここでR_1は水素、ハロゲン、ニトロ基、シアノ基
、炭素数1〜5のアルキル基またはアルコキシ基を表わ
し、R_1は炭素数1〜20の無置換または置換アルキ
ル基を表わし、Rは炭素数1〜8のアルキル基、ハロゲ
ン化アルキル基、ハロゲン化フェニル基、ニトロ置換ア
ルキル基、ニトロ置換フェニル基またはアルキル置換フ
ェニル基を表わし、R_3およびR_4は水素、ハロゲ
ン、スルホン酸基、スルホン酸ソーダ基、カルボキシル
基、炭素数1〜5のアルキル基、アルコキシ基またはア
ルキルオキシカルボニル基を表わす。)(1) In the method for producing spirooxazine derivatives represented by the general formula [D] below, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [D] General formula [A] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [A ] A trimethylindolenine derivative represented by the general formula [B] R_2-O-SO_2R [B] A sulfonate derivative represented by the general formula [C] ▲ Numerical formulas, chemical formulas, tables, etc. ▼ [C] A method for producing a spirooxazine derivative, which comprises reacting a nitroso-naphthol derivative and a basic substance. (Here, R_1 represents hydrogen, a halogen, a nitro group, a cyano group, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group, R_1 represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms, and R represents a carbon number 1 to 8 alkyl group, halogenated alkyl group, halogenated phenyl group, nitro-substituted alkyl group, nitro-substituted phenyl group or alkyl-substituted phenyl group, R_3 and R_4 are hydrogen, halogen, sulfonic acid group, sulfonic acid sodium group , represents a carboxyl group, an alkyl group having 1 to 5 carbon atoms, an alkoxy group, or an alkyloxycarbonyl group.)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60004100A JPS61165388A (en) | 1985-01-16 | 1985-01-16 | Production of spirooxazine derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60004100A JPS61165388A (en) | 1985-01-16 | 1985-01-16 | Production of spirooxazine derivative |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61165388A true JPS61165388A (en) | 1986-07-26 |
Family
ID=11575369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60004100A Pending JPS61165388A (en) | 1985-01-16 | 1985-01-16 | Production of spirooxazine derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61165388A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63305181A (en) * | 1987-06-08 | 1988-12-13 | Nissan Motor Co Ltd | Thermal transfer recording ink |
-
1985
- 1985-01-16 JP JP60004100A patent/JPS61165388A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63305181A (en) * | 1987-06-08 | 1988-12-13 | Nissan Motor Co Ltd | Thermal transfer recording ink |
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