JPS61154283A - Solid image pick-up element - Google Patents
Solid image pick-up elementInfo
- Publication number
- JPS61154283A JPS61154283A JP59277299A JP27729984A JPS61154283A JP S61154283 A JPS61154283 A JP S61154283A JP 59277299 A JP59277299 A JP 59277299A JP 27729984 A JP27729984 A JP 27729984A JP S61154283 A JPS61154283 A JP S61154283A
- Authority
- JP
- Japan
- Prior art keywords
- light
- photoelectric conversion
- lens array
- incident
- solid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007787 solid Substances 0.000 title 1
- 238000006243 chemical reaction Methods 0.000 claims abstract description 22
- 239000004065 semiconductor Substances 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 6
- 206010034960 Photophobia Diseases 0.000 abstract description 7
- 208000013469 light sensitivity Diseases 0.000 abstract description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract description 3
- 239000011521 glass Substances 0.000 abstract description 3
- 229910052698 phosphorus Inorganic materials 0.000 abstract 1
- 239000011574 phosphorus Substances 0.000 abstract 1
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000036211 photosensitivity Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Transforming Light Signals Into Electric Signals (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は固体撮像素子、特に光感度を向上するだめのレ
ンズアレーを備えた固体撮像素子に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a solid-state image sensor, and particularly to a solid-state image sensor equipped with a lens array for improving light sensitivity.
一般に固体撮像素子は、半導体基板の上面に光電変換部
と共に信号読出し部および電気的絶縁領域を有してお、
9.100mの領域を光電変換部として使用することは
できない。第2図は従来の固体撮像素子の断面構造を模
式的に示したもので、インターライン転送方式CCDと
称される素子である。Generally, a solid-state image sensor has a photoelectric conversion section, a signal readout section, and an electrically insulating region on the top surface of a semiconductor substrate.
9. An area of 100 m cannot be used as a photoelectric conversion section. FIG. 2 schematically shows the cross-sectional structure of a conventional solid-state image sensor, which is a device called an interline transfer type CCD.
基板半導体20の主面にはフォトダイオード11、転送
ゲート12、垂直CCDレジスタ13が形成され、絶縁
膜21を介して転送電極14が配置され、さらにリンガ
ラス層22を介して垂直CCDレジスタ13および転送
ゲート14を遮光するようにアルミニウムの遮光層15
が配置されている。若しこの遮光層15がないと垂直C
ODレジスタ13において信号電荷が転送される期間に
入射光によ多発生した電荷が前記信号電荷に付加される
ため、スミアと呼ばれる白い縦線が再生画像に現われ、
画質が極度に劣化する。A photodiode 11 , a transfer gate 12 , and a vertical CCD register 13 are formed on the main surface of the substrate semiconductor 20 , a transfer electrode 14 is arranged with an insulating film 21 interposed therebetween, and a vertical CCD register 13 and a vertical CCD register 13 are further arranged with a phosphor glass layer 22 interposed therebetween. An aluminum light shielding layer 15 is provided to shield the transfer gate 14 from light.
is located. If this light shielding layer 15 is not present, the vertical C
During the period when the signal charges are transferred in the OD register 13, charges generated by the incident light are added to the signal charges, so that a white vertical line called a smear appears on the reproduced image.
Image quality deteriorates significantly.
遮光層15はこれを防止するためのもので、具体的には
1絵素ピツチ(フォトダイオードの間隔)に対応した入
射光31〜33のうち、入射光32のみがフォートダイ
オード11に入射され、入射光31,33は遮光層15
で反射されてフォトダイオード11には入射されないよ
うになっている。したがって従来の固体撮像素子におい
ては、入射光に対して光電変換機能を有する領域すなわ
ち開口率は全体の20〜40%程度となっている。この
ために光感度の低下また被写体が星のような点光源の場
合には再生画像に現われないことがあるなどの欠点があ
った。The light shielding layer 15 is provided to prevent this, and specifically, among the incident lights 31 to 33 corresponding to one pixel pitch (interval between photodiodes), only the incident light 32 enters the fort diode 11, Incident lights 31 and 33 pass through the light shielding layer 15
The light is reflected by the light so that it does not enter the photodiode 11. Therefore, in conventional solid-state image sensors, the area having a photoelectric conversion function for incident light, that is, the aperture ratio is approximately 20 to 40% of the total area. This has resulted in drawbacks such as a decrease in light sensitivity and, if the object is a point light source such as a star, it may not appear in the reproduced image.
このような従来の固体撮像素子の欠点を除去する方法が
、本発明と同一出願人により特開昭57−9180、特
開昭57−124485、特願昭57−229039、
特願昭58−147534によって提案されている。Methods for eliminating such drawbacks of conventional solid-state image sensors are disclosed in Japanese Patent Application Laid-open No. 57-9180, Japanese Patent Application Laid-Open No. 57-124485, Japanese Patent Application No. 57-229039, filed by the same applicant as the present invention.
This was proposed in Japanese Patent Application No. 58-147534.
第3図は特願昭58−147534号出願明細書の実施
例に開示された固体撮像素子の断面図である。該固体撮
像素子上には第1および第2の透明な樹脂層23および
24より成るレンズアレーが形成されている。樹脂層2
3の厚さおよび樹脂層240曲率半径は、レンズアレー
への入射光のほぼ100チがフォトダイオード11に集
光されるように適切に定められる。従ってこの構造では
遮光層15によって反射されていた入射光31および3
3もフォトダイオード11に入射されることになる。こ
の結果、入射光に対して光電変換機能を有する領域すな
わち開口率はioo sに近くでき、従来の固体撮像素
子に比べて光感度を向上できる。FIG. 3 is a sectional view of a solid-state image pickup device disclosed in an embodiment of the specification of Japanese Patent Application No. 147534/1982. A lens array consisting of first and second transparent resin layers 23 and 24 is formed on the solid-state image sensor. Resin layer 2
3 and the radius of curvature of the resin layer 240 are appropriately determined so that approximately 100 inches of light incident on the lens array is focused on the photodiode 11. Therefore, in this structure, the incident light 31 and 3 that was reflected by the light shielding layer 15
3 will also be incident on the photodiode 11. As a result, the area having a photoelectric conversion function for incident light, that is, the aperture ratio, can be made close to IOOs, and the photosensitivity can be improved compared to conventional solid-state image sensors.
第3図に示したレンズアレーを固体撮像素子上に形成す
ることによって光感度を向上する方法は、通常の場合固
体撮像素子の全部の光電変換部上のレンズアレーに対し
て入射光が図示31〜33のようにほぼ垂直に入射され
る場合には、レンズアレーへの入射光のほぼ100チが
光電変換部へ集光されるため、光感度の向上の効果に関
して問題はなかった。In the method of improving photosensitivity by forming the lens array shown in FIG. 3 on a solid-state image sensor, normally, the incident light is When the light is incident almost perpendicularly as in .about.33, approximately 100 beams of light incident on the lens array are focused on the photoelectric conversion section, so there was no problem with the effect of improving photosensitivity.
しかしながら、この方法を用いた固体撮像素子を備えた
撮像装置において光学像を形成するだめのレンズの絞シ
の値が小さいとき、固体撮像素子上の光電変換部の平面
位置に応じて光感度が異なるという問題があった。例え
ば第3図において、フォトダイオード11が固体撮像素
子上の中心位置にある場合にはレンズアレーへの入射光
31〜33ハはぼ垂直に入射されるために入射光31〜
33のほぼioo %がフォトダイオード11に入射さ
れるのに対し、フォトダイオード16が固定撮像素子上
の端部にある場合にはレンズアレーへの入射光34〜3
6の入射角θが大きくなるために入射光35および36
はフォトダイオード16に入射されず、別の部分へ集光
される。従って、レンズアレーへの入射光がフォトダイ
オードへ入射される割合は固体撮像素子上のレンズアレ
ーの平面位置によって中心部から端部に寄るに従って小
さくなシ、固体撮像素子上の平面位置による光感度の相
異すなわちシェーディングが生じるという欠点があった
。However, in an imaging device equipped with a solid-state image sensor using this method, when the aperture value of the lens used to form an optical image is small, the light sensitivity varies depending on the planar position of the photoelectric conversion section on the solid-state image sensor. The problem was that they were different. For example, in FIG. 3, when the photodiode 11 is located at the center position on the solid-state image sensor, the incident light beams 31 to 33 are incident almost perpendicularly to the lens array.
33 is incident on the photodiode 11, whereas when the photodiode 16 is located at the end above the fixed image sensor, the incident light on the lens array 34-3 is incident on the photodiode 11.
Since the incident angle θ of 6 becomes large, the incident light rays 35 and 36
The light is not incident on the photodiode 16, but is focused on another part. Therefore, the proportion of light incident on the lens array that is incident on the photodiode depends on the planar position of the lens array on the solid-state image sensor, and decreases from the center to the edge. However, there is a drawback that shading occurs.
本発明の目的は、レンズアレーを備えることによって光
感度がよく、かつレンズアレーを備えたことを原因とす
るシェーディングすなわち固体撮像素子上の平面位置に
よる光感度の相異のない固体撮像素子を提供することに
ある。An object of the present invention is to provide a solid-state image sensor that has good light sensitivity due to the provision of a lens array and is free from shading caused by the provision of the lens array, that is, differences in light sensitivity due to the planar position on the solid-state image sensor. It's about doing.
本発明は、同一半導体基板上にモザイク状に形成された
光電変換部および前記光電変換部にて光電変換された信
号の読み出し部からなる固体撮像素子において、前記光
電変換部に対応し、集光機能を有する透明なレンズアレ
ーと、前記レンズアレーによって前記光電変換部以外の
部分に集光される光を反射し、反射光を前記光電変換部
に集光する反射層とを備えたことを特徴とする固体撮像
素子であろ、。1゜
〔作用〕
本発明では3、まず従来の固体撮像素子上にレンズアレ
ーを設けることによって、固体撮像素子上の全部の光電
変換機能々への入射光量が増加し、さらに、前記レンズ
アレーにより光電変換部と異なる部分に集光される光を
反射し反射光を光電変換部へ集光させる反射層を備える
ことによシ、光学像を形成するだめのレンズの絞夛の値
が小さくレンズアレーへの入射光の入射角が固体撮像素
子上の平面位置によって大きく異なる場合にも、レンズ
アレーへの入射光が光電変換部へ入射される割合が前記
平面位置によらず均一となる。The present invention provides a solid-state imaging device comprising a photoelectric conversion section formed in a mosaic shape on the same semiconductor substrate and a readout section for a signal photoelectrically converted in the photoelectric conversion section, in which a light condensing section corresponding to the photoelectric conversion section is provided. A transparent lens array having a function, and a reflective layer that reflects light focused on a portion other than the photoelectric conversion section by the lens array and focuses the reflected light on the photoelectric conversion section. Whether it's a solid-state image sensor. 1. [Function] In the present invention, 3. First, by providing a lens array on a conventional solid-state image sensor, the amount of light incident on all the photoelectric conversion functions on the solid-state image sensor increases; By providing a reflective layer that reflects light focused on a part different from the photoelectric conversion part and focuses the reflected light on the photoelectric conversion part, the aperture value of the lens used to form an optical image can be reduced. Even if the angle of incidence of the light incident on the array differs greatly depending on the planar position on the solid-state image sensor, the ratio of the light incident on the lens array to the photoelectric conversion section becomes uniform regardless of the planar position.
以下、本発明の実施例について図面を参照して詳細に説
明する。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
〜暢\\
第1図は本発明による固体撮像素子の実施例の断面図で
ある。第3図に示した例の第1及び第2の樹脂層23お
よび24より成るレンズアレーの代りに透明なレンズア
レー25と反射層26とを基板半導体20のリンガラス
層22上に備えたものである。他の構造部分は第3図と
同じであるため、同一番号を付して説明する。レンズア
レー25は先の例のレンズアレーと同じ機能を有し、垂
直に入射させる入射光31〜33のほぼ100%がフォ
トダイオード11に集光され、また入射角の大きい入射
光34〜36のうち入射光35.36はフォトダイオー
ド16とは異なる部分に集光される。〜Nobu\\ FIG. 1 is a sectional view of an embodiment of a solid-state image sensor according to the present invention. In place of the lens array consisting of the first and second resin layers 23 and 24 in the example shown in FIG. 3, a transparent lens array 25 and a reflective layer 26 are provided on the phosphor glass layer 22 of the substrate semiconductor 20. It is. Since the other structural parts are the same as those in FIG. 3, they will be explained using the same numbers. The lens array 25 has the same function as the lens array in the previous example, and almost 100% of the vertically incident incident lights 31 to 33 is focused on the photodiode 11, and also focuses the incident lights 34 to 36 having a large angle of incidence. Among them, incident light 35 and 36 are focused on a portion different from the photodiode 16.
しかしながら、これら入射光35.36は反射層26に
よって反射され、反射光はフォトダイオード16に入射
される。従って、入射角の大きい入射光34〜36もそ
のほぼ100チがフォトダイオード16に入射されるこ
とになる。However, these incident lights 35 and 36 are reflected by the reflective layer 26, and the reflected lights are incident on the photodiode 16. Therefore, approximately 100 of the incident lights 34 to 36 having a large angle of incidence are incident on the photodiode 16.
第1図に示した実施例においては、反射層26の断面形
状は三角形であったが、台形あるいは周囲が曲線である
図形の断面形状をもつ反射層、ある射光を各々示す。In the embodiment shown in FIG. 1, the reflective layer 26 had a triangular cross-sectional shape, but the reflective layer 26 has a trapezoidal cross-sectional shape or a trapezoidal cross-sectional shape with a curved periphery.
いは周囲のみが光を反射する物質で作られた反射層を備
えた固体撮像素子も、本発明に含まれることは明らかで
ある。また、実施例においては固体撮像素子がインター
ライン転送方式CCDである場合を示したが、他の固体
撮像素子の場合も本発明に含まれることも明らかである
。It is clear that the present invention also includes a solid-state image sensor having a reflective layer made of a material that reflects light only at the periphery. Further, in the embodiment, a case where the solid-state image sensor is an interline transfer type CCD is shown, but it is clear that the present invention also includes the case of other solid-state image sensors.
以上詳細に述べた通シ、本発明による固体撮像素子は、
従来の固体撮像素子上にレンズアレーおよび反射層を設
けることによって、光感度が良く、星のような点光源の
被写体も再生画像に再現することが可能となシ、かつレ
ンズアレーを備えたことを原因とするシェーディングが
ないという特徴をもっている。As described in detail above, the solid-state imaging device according to the present invention includes:
By providing a lens array and a reflective layer on a conventional solid-state image sensor, it has good light sensitivity, and it is possible to reproduce objects with point light sources such as stars in the reproduced image. It has the characteristic that there is no shading caused by.
Claims (1)
変換部および前記光電変換部にて光電変換された信号の
読み出し部からなる固体撮像素子において、前記光電変
換部に対応し集光機能を有する透明なレンズアレーと、
前記レンズアレーによって前記光電変換部以外の部分に
集光される光を反射し、反射光を前記光電変換部に集光
する反射層とを備えたことを特徴とする固体撮像素子。(1) In a solid-state image sensor that includes a photoelectric conversion section formed in a mosaic shape on the same semiconductor substrate and a readout section for a signal photoelectrically converted in the photoelectric conversion section, a light collecting function is provided corresponding to the photoelectric conversion section. a transparent lens array having;
A solid-state image sensor, comprising: a reflective layer that reflects light focused on a portion other than the photoelectric conversion section by the lens array and focuses the reflected light on the photoelectric conversion section.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59277299A JPS61154283A (en) | 1984-12-26 | 1984-12-26 | Solid image pick-up element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59277299A JPS61154283A (en) | 1984-12-26 | 1984-12-26 | Solid image pick-up element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61154283A true JPS61154283A (en) | 1986-07-12 |
Family
ID=17581599
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59277299A Pending JPS61154283A (en) | 1984-12-26 | 1984-12-26 | Solid image pick-up element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61154283A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02161772A (en) * | 1988-12-14 | 1990-06-21 | Canon Inc | Solid-state image pickup device |
JPH0485960A (en) * | 1990-07-30 | 1992-03-18 | Toshiba Corp | Solid-state imaging device and its manufacturing method |
JPH04343471A (en) * | 1991-05-21 | 1992-11-30 | Nec Corp | Solid-state image pickup element |
WO2000031805A1 (en) * | 1998-11-25 | 2000-06-02 | Intel Corporation | Reflecting structures for photosensitive devices |
JP2006121065A (en) * | 2004-09-24 | 2006-05-11 | Fuji Photo Film Co Ltd | Solid-state imaging device |
CN109427835A (en) * | 2017-08-30 | 2019-03-05 | 台湾积体电路制造股份有限公司 | Imaging sensor and forming method thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55124366A (en) * | 1979-03-19 | 1980-09-25 | Fuji Photo Film Co Ltd | Pickup device |
JPS55138979A (en) * | 1979-04-17 | 1980-10-30 | Olympus Optical Co Ltd | Solid pickup device |
-
1984
- 1984-12-26 JP JP59277299A patent/JPS61154283A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55124366A (en) * | 1979-03-19 | 1980-09-25 | Fuji Photo Film Co Ltd | Pickup device |
JPS55138979A (en) * | 1979-04-17 | 1980-10-30 | Olympus Optical Co Ltd | Solid pickup device |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02161772A (en) * | 1988-12-14 | 1990-06-21 | Canon Inc | Solid-state image pickup device |
JPH0485960A (en) * | 1990-07-30 | 1992-03-18 | Toshiba Corp | Solid-state imaging device and its manufacturing method |
JPH04343471A (en) * | 1991-05-21 | 1992-11-30 | Nec Corp | Solid-state image pickup element |
WO2000031805A1 (en) * | 1998-11-25 | 2000-06-02 | Intel Corporation | Reflecting structures for photosensitive devices |
JP2006121065A (en) * | 2004-09-24 | 2006-05-11 | Fuji Photo Film Co Ltd | Solid-state imaging device |
CN109427835A (en) * | 2017-08-30 | 2019-03-05 | 台湾积体电路制造股份有限公司 | Imaging sensor and forming method thereof |
CN109427835B (en) * | 2017-08-30 | 2022-05-03 | 台湾积体电路制造股份有限公司 | Image sensor and method of forming the same |
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