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JPS61133314A - Heat treatment device - Google Patents

Heat treatment device

Info

Publication number
JPS61133314A
JPS61133314A JP25358284A JP25358284A JPS61133314A JP S61133314 A JPS61133314 A JP S61133314A JP 25358284 A JP25358284 A JP 25358284A JP 25358284 A JP25358284 A JP 25358284A JP S61133314 A JPS61133314 A JP S61133314A
Authority
JP
Japan
Prior art keywords
hot plate
hot air
plate
hot
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25358284A
Other languages
Japanese (ja)
Other versions
JPH0346546B2 (en
Inventor
Hidetaka Jo
城 英孝
Munenori Ishimi
宗憲 石見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP25358284A priority Critical patent/JPS61133314A/en
Priority to US06/802,468 priority patent/US4693777A/en
Priority to EP85115144A priority patent/EP0187249B1/en
Priority to DE3587830T priority patent/DE3587830T2/en
Publication of JPS61133314A publication Critical patent/JPS61133314A/en
Publication of JPH0346546B2 publication Critical patent/JPH0346546B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Heat Treatment Of Articles (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To heat and remove thoroughly and quickly the reactive gas sticking to a material to be heated by heating said material, which is subjected to a plasma etching treatment, by a hot plate and hot air in a treatment chamber. CONSTITUTION:The reactive gas such as Cl used in etching is adsorbed on the surface of the material which is subjected to the plasma etching and therefore such material to be treated is carried into a treatment chamber 1 through an inlet 9 thereof. The hot plate 4 is lowered by operating an air cylinder 5 and a belt 7 for conveyance is emerged upper than the surface of the hot plate from a channel 8 provided to the plate 4 to receive the material 21 to be treated. The material 21 is positioned below a hot air suction and diffusion port 3 by the rotation of rollers 6, then the belt 7 is stopped. The plate 4 is thereafter raised to receive the material 21 on the plate 4; at the same time, the hot air from a hot air generator 2 is ejected from ejection ports 3 so that the material 21 is quickly heated by the hot plate 4 and the hot air. The gas adsorbed on the surface of said material is thus thoroughly and quickly removed.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は熱処理装置にか1つ、特にプラズマエツチング
処理を行なった被処理物のエツチング処理ガスの付着、
吸着等によるエツチング処理後の被処理物への影響を除
去するための熱処理工程に適用して最適な熱処理装置に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a heat treatment apparatus, in particular, to a heat treatment apparatus that is capable of controlling the adhesion of an etching process gas to a workpiece that has been subjected to a plasma etching process.
The present invention relates to a heat treatment apparatus that is most suitable for use in a heat treatment process for removing the influence of adsorption or the like on objects to be treated after etching.

(発明の技術的背景とその問題点〕  ・近年、集積回
路(IC)の製造プロセスでは、ICの高集積度化、高
速度化に伴い、素子の微細加工が強く要求されており、
そのため、アンダカットのない垂直なエツチング形状が
得られる反応性イオンエツチング方法が採用されている
(Technical background of the invention and its problems) - In recent years, in the manufacturing process of integrated circuits (ICs), with the increase in the degree of integration and speed of ICs, there has been a strong demand for microfabrication of elements.
For this reason, a reactive ion etching method is used that produces a vertical etched shape without undercuts.

例えば、電極配線材料として多用されているアルミニウ
ムをエツチングする場合には、塩素系ガスが用いられ、
反応容器内に被処理物を導入し、減圧状態の前記反応ガ
ス雰囲気中でグロー放電を発生させ、被処理物上の被エ
ツチング材料と反応ガスとの反応を促進させ、被エツチ
ング材料を揮発性化合物にすることでエツチングを進行
させている。
For example, when etching aluminum, which is often used as an electrode wiring material, chlorine-based gas is used.
The object to be processed is introduced into the reaction vessel, and a glow discharge is generated in the reaction gas atmosphere under reduced pressure to promote the reaction between the material to be etched on the object to be processed and the reaction gas, thereby making the material to be etched volatile. Etching progresses by forming a compound.

このエツチング処理が終了し、被処理物を反応室から大
気中に取出す場合、被処理物には反応に用いられたガス
成分が付着、吸着しており、大気中の水蒸気等と反応し
、被処理物の残されるべき被エツチング材料で形成され
た配線パターン等との反応を開始して配線の断線や短絡
が発生する。
When this etching process is completed and the object to be treated is taken out from the reaction chamber into the atmosphere, the gas components used in the reaction are attached to and adsorbed on the object, which reacts with water vapor in the atmosphere and removes the object from the reaction chamber. The processing material starts to react with the wiring pattern formed of the material to be etched, which is to be left behind, resulting in disconnection or short-circuiting of the wiring.

そのため、エツチング処理終了後、直ちに被処理物に付
着した反応ガス成分を除去することが必要となる。その
方法として、熱風の吹付け、加熱等が極めて有効であり
、従来からエツチング処理後電気炉、または工業用ドラ
イヤ等により熱処理を行なっていたが、これによると昇
温時間が長い点、温度分布が悪く処理効果に差が生じる
点、およびエツチング処理後熱処理を開始するまでに時
間が掛る点などの欠点を有している。
Therefore, it is necessary to immediately remove the reactive gas components adhering to the object to be processed after the etching process is completed. As a method, blowing hot air, heating, etc. are extremely effective, and conventionally heat treatment was performed using an electric furnace or industrial dryer after etching treatment, but this method has a long heating time and temperature distribution. The disadvantages are that the etching process is poor, resulting in a difference in treatment effect, and that it takes time to start the heat treatment after the etching process.

そこで、エツング処理装置と直結し、ベルトで熱処理装
置内に直ちに搬入し、常時加熱状態にある熱板および熱
風発生装置で直ちに熱処理を行なう熱処理装置が案出さ
れているが、これによると、内部に搬送機構を有するた
め、外部から駆動力伝達機構の導入口から熱流が漏出し
、周辺機器の温度上昇による障害、また反応性ガス蒸気
を含んでいるため、周辺構造物の腐蝕が発生するという
問題がある。
Therefore, a heat treatment device has been devised that is directly connected to the Etsung treatment device, is immediately carried into the heat treatment device using a belt, and is immediately subjected to heat treatment using a constantly heated hot plate and hot air generator. Since the conveyor mechanism is located inside the vehicle, heat flow leaks from the inlet of the driving force transmission mechanism from the outside, causing damage to peripheral equipment due to temperature rise.Also, since it contains reactive gas vapor, corrosion of surrounding structures occurs. There's a problem.

一方、上記搬送機構に、耐熱性および駆動源を処理室内
に具備せしめることが熱的および反応性ガス蒸気による
腐蝕の点において困難であり、したがって極力部Ill
源を少なく、かつ駆動方法を単純化する必要性があるこ
とから、ベルトによる搬送機構が用いられているが、こ
れによると被処理物をベルトの上にのせたまま熱処理を
行なうことになるため、熱板と被処理物とが接触せず、
その結果被処理物の加熱効率が非常に悪く、確実で速い
熱処理が行なえないという問題が生じている。
On the other hand, it is difficult to provide the above-mentioned transport mechanism with heat resistance and a drive source in the processing chamber due to thermal and corrosion caused by reactive gas vapor.
Because there is a need to reduce the number of heat sources and simplify the driving method, a conveyor mechanism using a belt is used. , there is no contact between the hot plate and the workpiece,
As a result, a problem arises in that the heating efficiency of the object to be treated is very poor and reliable and rapid heat treatment cannot be performed.

〔発明の目的〕[Purpose of the invention]

本発明は上記従来技術の諸問題に着目し、これを改善す
ることを目的としてなされたもので、橿めで高速で均一
加熱による熱゛処理を行なうことのできる熱処理装置を
提供するものである。
The present invention has focused on the problems of the above-mentioned prior art, and has been devised for the purpose of improving these problems, and provides a heat treatment apparatus that can carry out heat treatment by uniform heating at high speed.

〔発明の概要〕                  
  I上記目的を達成するため、本発明は、処理室内に
被処理物の自動搬入出を行ない、処理室内で熱板、熱風
、または熱板と熱風との併用により熱処理を行なうちに
おいて、熱板をその被処理物載置面が被処理物搬送Ia
mの搬送面より下位から上位にかけて昇降するよう上下
動自在に構成し、熱板を上昇させることにより搬送機構
上の被処理物を熱板の上面に接触させて被処理物を加熱
することを特徴とするものである。
[Summary of the invention]
I In order to achieve the above object, the present invention automatically transports objects to be processed into and out of a processing chamber, and while performing heat treatment in the processing chamber using a hot plate, hot air, or a combination of a hot plate and hot air. The workpiece placement surface is the workpiece transport Ia.
It is configured to be able to move up and down freely so as to move up and down from the lower side to the upper side of the conveyance surface of the conveyor mechanism, and by raising the hot plate, the workpiece on the conveyance mechanism is brought into contact with the upper surface of the hot plate, and the workpiece is heated. This is a characteristic feature.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明を図面に示す実施例を参照して説明する。 The present invention will be described below with reference to embodiments shown in the drawings.

第1図は本発明による熱処理装置の一実施例の概略構成
を示す断面図で、密閉箱型の処理室1の内部上方には熱
風発生袋[2が設置され、その下面に熱風吹出口3,3
が設けられて熱風発生装置2において発生した熱風を熱
風吹出口3,3から下方に向は吹出すようになっている
FIG. 1 is a sectional view showing a schematic configuration of an embodiment of a heat treatment apparatus according to the present invention, in which a hot air generating bag [2 is installed in the upper part of the inside of a closed box-shaped processing chamber 1, and a hot air outlet 3 is provided on the lower surface of the bag [2]. ,3
is provided so that the hot air generated in the hot air generator 2 is blown out from hot air outlets 3, 3 in a downward direction.

熱風吹出口3.3の直下方には熱板4が設けられ、この
熱板4は処理室1の外部に設置された駆動源としてのエ
アシリンダ5によって上下動自在に支持されている。な
お、この駆動源はエアシリンダに限らず、他にクランク
機構その他であってもよい。
A hot plate 4 is provided directly below the hot air outlet 3.3, and this hot plate 4 is supported by an air cylinder 5 as a drive source installed outside the processing chamber 1 so as to be able to move up and down. Note that this driving source is not limited to the air cylinder, but may also be a crank mechanism or the like.

上記熱板4の上面長手方向には、熱板4の両端部位に設
けられた少なくとも一対のベルト車6゜60に巻回され
る搬送機構としての少な(とも一対のベルト7の上部走
行側が嵌入する溝8が形成されている。この溝8の深さ
は、少なくとも熱板4の上面(被処理物載置面)がベル
ト7の上面より下位の位置からこのベルト7の上面を越
える上位の位置までの範囲にわたり昇降し得る寸法が与
えられている。
In the longitudinal direction of the upper surface of the hot plate 4, there is a conveying mechanism wound around at least a pair of belt pulleys 6 and 60 provided at both ends of the hot plate 4. A groove 8 is formed in which the top surface of the hot plate 4 (workpiece placement surface) extends from a position below the top surface of the belt 7 to a position above the top surface of the belt 7. The dimensions are given so that it can be raised and lowered over a range of positions.

前記熱板4の両端部には、処理室1の被処理物搬入用開
口部9および搬出用開口部10を開閉するシャッタ11
.12の開111m構を具有している。
Shutters 11 are provided at both ends of the hot plate 4 to open and close the opening 9 for carrying in the processing object and the opening 10 for carrying out the processing chamber 1.
.. It has a 111m structure with 12 openings.

このシャッタ11.12はフッソ樹脂等の密閉材からな
り、熱板4の両端部に断熱材13.14を介して固着さ
れたアーム15.16に取付けられ、熱板4が上昇した
ときシャッタ11.12が開口部9.10を密閉し、熱
板4が下降したとき開口部9,10を開放するようにな
っている。
The shutters 11 and 12 are made of a sealing material such as fluorocarbon resin, and are attached to arms 15 and 16 fixed to both ends of the hot plate 4 through heat insulating materials 13 and 14. .12 seals the openings 9, 10 and opens the openings 9, 10 when the hot plate 4 is lowered.

前記駆動源の駆動伝達軸17は、処理室1の底部を貫通
しており、この軸17と熱板4とは断熱材18を介して
結合されている。上記軸17の貫通部は、処理室1内で
発生するエツチング処理ガス等に対し反応を起さない材
料、例えばフッソ系樹脂材からなるリング部材19を軸
17に外嵌し、このリング部材19を押え部材20で押
圧固定することにより軸17と処理室1との隙間をなく
し、かつ軸17の動きは妨げないようになっている。
A drive transmission shaft 17 of the drive source passes through the bottom of the processing chamber 1, and the shaft 17 and the hot plate 4 are coupled via a heat insulating material 18. The penetrating portion of the shaft 17 is formed by fitting a ring member 19 made of a material that does not react with the etching gas generated within the processing chamber 1, such as a fluorocarbon resin material, onto the shaft 17. By pressing and fixing the shaft 17 with the holding member 20, a gap between the shaft 17 and the processing chamber 1 is eliminated, and the movement of the shaft 17 is not hindered.

図において21は被処理物を示す。In the figure, 21 indicates an object to be processed.

つぎに作用を説明する。Next, the effect will be explained.

被処理物21を処理室1内に搬入する場合には熱板4は
下降され、これと同時にシャッタ11゜12が下降して
搬入出用開口部9.10が開放される。熱板4の下降に
よりベルト7は熱板4上に露出し、被処理物21は開口
部9からベルト7上に搬入され、所定の位置に到達した
とき図示しないストッパ等により熱風吹出口3の直下位
置で停止される。これと共に熱板4が上昇し、その上面
がベルト7より上位に至るとき被処理物21を受取って
熱板4の上面に密着した状態におかれる。
When carrying the workpiece 21 into the processing chamber 1, the hot plate 4 is lowered, and at the same time the shutters 11 and 12 are lowered to open the loading/unloading openings 9 and 10. As the hot plate 4 descends, the belt 7 is exposed on the hot plate 4, and the workpiece 21 is carried onto the belt 7 from the opening 9, and when it reaches a predetermined position, the hot air outlet 3 is stopped by a stopper (not shown) or the like. It will be stopped directly below. At the same time, the hot plate 4 rises, and when its upper surface reaches above the belt 7, it receives the workpiece 21 and is brought into close contact with the upper surface of the hot plate 4.

この熱板4の上昇とともにシャッタ11.12も上昇し
、開口部9.10が閉じられ、処理室1内が気密に保た
れ、熱風発生装置2で発生する熱風が熱風吹出口3,3
から被処理物21に吹付けられ、熱処理がなされる。
As the hot plate 4 rises, the shutter 11.12 also rises, the opening 9.10 is closed, the inside of the processing chamber 1 is kept airtight, and the hot air generated by the hot air generator 2 is transferred to the hot air outlets 3, 3.
is sprayed onto the object 21 to be treated, and heat-treated.

熱処理が終了すると熱板4が下降し、熱板4の上面に載
置されていた被処理物21はベルト7上に受渡されて搬
送される。また熱板4の下降によってシャッタ11.1
2も開かれ、処理済の被処理物21は搬出用開口部10
から外部に搬出され、新たな被処理物21は搬入用開口
部9からベルト7上へ搬入され、*Eと同様な手順によ
り熱処理が行なわれる。
When the heat treatment is completed, the hot plate 4 is lowered, and the workpiece 21 placed on the top surface of the hot plate 4 is transferred onto the belt 7 and conveyed. Also, due to the lowering of the hot plate 4, the shutter 11.1
2 is also opened, and the processed object 21 is carried out through the carrying-out opening 10.
The new object 21 to be processed is carried out from the carrying-in opening 9 onto the belt 7, and heat-treated by the same procedure as in *E.

(発明の効果) 以上説明したように、本発明は、処理室内に被処理物の
自動搬入用を行ない、処理室内で熱板、熱風、または熱
板と熱風との併用により熱処理を行なうものにおいて、
熱板をその被処理物載置面が被処理物搬送機構の搬送面
より下位から上位にかけて昇降するよう上下動自在に構
成し、熱板を上昇させることにより搬送機構上の被処理
物を熱板の上面に接触させて被処理物を加熱するように
したので、被処理物と熱板との接触が容易かつ確実にで
き、第2図に示すように従来技術(A)に比し本発明(
B)によれば被処理物の加熱を約3倍速く行なうことが
でき、処理能力を飛躍的に向上することができる。
(Effects of the Invention) As explained above, the present invention provides a method for automatically transporting objects to be processed into a processing chamber and performing heat treatment using a hot plate, hot air, or a combination of a hot plate and hot air. ,
The hot plate is configured to be vertically movable so that the surface on which the workpiece is placed moves up and down from below to above the conveyance surface of the workpiece conveyance mechanism, and by raising the hot plate, the workpiece on the conveyance mechanism is heated. Since the object to be processed is heated by contacting with the upper surface of the plate, the object to be processed and the hot plate can easily and reliably come into contact with each other. invention(
According to B), the object to be processed can be heated about three times faster, and the processing capacity can be dramatically improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示す略示縦断正面図、第2
図は従来技術に対する本発明の加熱時間の関係を示す線
図である。 1・・・処理室、2・・・熱風発生装置、3・・・熱風
吹出口、4・・・熱板、5・・・駆動源、7・・・ベル
ト、8・・・溝、9.10・・・開口部、11.12・
・・シャッタ、15゜16・・・アーム、17・・・軸
FIG. 1 is a schematic vertical sectional front view showing one embodiment of the present invention, and FIG.
The figure is a diagram showing the relationship between the heating time of the present invention and the prior art. DESCRIPTION OF SYMBOLS 1... Processing chamber, 2... Hot air generator, 3... Hot air outlet, 4... Hot plate, 5... Drive source, 7... Belt, 8... Groove, 9 .10... opening, 11.12.
...Shutter, 15°16...Arm, 17...Axis.

Claims (1)

【特許請求の範囲】 1、処理室内に被処理物の自動搬入出を行ない、処理室
内で熱板、熱風、または熱板と熱風との併用により熱処
理を行なうものにおいて、熱板をその被処理物載置面が
被処理物搬送機構の搬送面より下位から上位にかけて昇
降するよう上下動自在に構成し、熱板を上昇させること
により搬送機構上の被処理物を熱板の上面に接触させて
被処理物を加熱することを特徴とする熱処理装置。 2、前記熱板は、処理室の被処理物搬入出用開口部を開
閉する開閉機構を具備することを特徴とする特許請求の
範囲第1項記載の熱処理装置。
[Scope of Claims] 1. In a device in which the workpiece is automatically carried in and out of the processing chamber, and heat treatment is performed in the processing chamber using a hot plate, hot air, or a combination of a hot plate and hot air, the hot plate is the object to be processed. The object mounting surface is configured to be vertically movable so as to move up and down from below to above the conveying surface of the object conveying mechanism, and by raising the hot plate, the object to be treated on the conveying mechanism is brought into contact with the upper surface of the hot plate. A heat treatment apparatus characterized by heating an object to be treated. 2. The heat treatment apparatus according to claim 1, wherein the heat plate is provided with an opening/closing mechanism for opening and closing an opening for carrying in and out of the processing chamber.
JP25358284A 1984-11-30 1984-11-30 Heat treatment device Granted JPS61133314A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP25358284A JPS61133314A (en) 1984-11-30 1984-11-30 Heat treatment device
US06/802,468 US4693777A (en) 1984-11-30 1985-11-27 Apparatus for producing semiconductor devices
EP85115144A EP0187249B1 (en) 1984-11-30 1985-11-29 Apparatus for producing semiconductor devices
DE3587830T DE3587830T2 (en) 1984-11-30 1985-11-29 Apparatus for manufacturing semiconductor devices.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25358284A JPS61133314A (en) 1984-11-30 1984-11-30 Heat treatment device

Publications (2)

Publication Number Publication Date
JPS61133314A true JPS61133314A (en) 1986-06-20
JPH0346546B2 JPH0346546B2 (en) 1991-07-16

Family

ID=17253377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25358284A Granted JPS61133314A (en) 1984-11-30 1984-11-30 Heat treatment device

Country Status (1)

Country Link
JP (1) JPS61133314A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5747876A (en) * 1980-09-03 1982-03-18 Toshiba Corp Plasma etching apparatus and method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5747876A (en) * 1980-09-03 1982-03-18 Toshiba Corp Plasma etching apparatus and method

Also Published As

Publication number Publication date
JPH0346546B2 (en) 1991-07-16

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