JPS61117271A - Vapor deposition method with laser - Google Patents

Abstract

PURPOSE:To form a vapor-deposited film of high purity on each substrate at a high rate by passing fine particles of a sample through a laser beam irradiated in vacuum to evaporate the particles in the passing space. CONSTITUTION:A laser beam 1 for evaporating a sample for vapor deposition is irradiated in vacuum or in rarefied gas, and fine or hyperfine particles of a sample 3 are fed into the laser beam 1 from a sample feeder 2 under control. The sample 3 is evaporated and forms a thin film on each substrate 6 placed on a spherical surface. Particles not evaporated perfectly in a sample evaporating region 4 are perfectly recovered with a recovering device 5. The vacuum region is always kept clean, and vapor deposition giving a film contg. no impurities can be carried out.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a laser evaporation method, and more specifically, a laser beam is used to evaporate a fine particle sample for evaporation in a space, and the evaporation gas is deposited on a deposition substrate. The present invention relates to a spatial evaporation deposition method using a laser beam, which is diffused into the internal space of the device and performs deposition using the entire spherical space excluding the laser beam irradiation optical path and the particle supply device.

[Prior art]

Conventional evaporation technology uses resistance heating as the evaporation energy source,
There are electron beam heating, material anode type electron heating, induction heating, thermal radiation heating, etc. These evaporation methods involve placing the evaporation sample on the evaporation energy supply body or placing it in the central crucible of the evaporation energy supply body. Alternatively, the deposition sample itself could be irradiated with an accelerated electron beam or the like for deposition.

[Problem that the invention seeks to solve]

Conventional vapor deposition methods have the disadvantage that the heat capacity of the vapor-deposited sample is extremely large because the heating temperature is low and the sample needs to be placed inside the crucible or at a position where energy is irradiated.

In addition to this, since various energy supply bodies are used, there are many problems such as the generation of impure gases from the energy supply bodies and other adverse effects.

[Purpose of the invention]

The present invention was made to solve the above drawbacks, and
Through evaporation energy using a clean laser beam,
By passing a microparticle sample with a very small heat capacity, it is possible to easily evaporate everything from low-temperature evaporation samples to ceramics, which are ultra-high temperature heat-resistant materials, without contaminating impurity scum, etc., in a vacuum space. It is an object of the present invention to provide a laser evaporation method in which the range of use of a evaporation sample is much larger than that of conventional techniques, and in addition, it is possible to easily evaporate even the inner surface of a three-dimensional structure. Hereinafter, the vAK of the present invention will be explained based on an example.

[Means for solving problems]

FIG. 1 is a rounded diagram illustrating one embodiment of the invention. It should be noted that a vacuum device, a laser beam absorption device, a laser beam focusing device, etc. are not shown in this figure because they are not directly related to the present invention. In the figure, 1 is a laser beam for sample evaporation, 2
3 is a particle sample supply device, 3 is a sample evaporation region, 4 is an unevaporated sample recovery device, and 5 is a vapor deposition substrate that can be arranged in a social sphere.

A particle sample supply device 2 is placed inside the laser beam 1 for sample evaporation.
The particulate sample 3 supplied from the sample deposition area 4 is completely evaporated in the space. At this time, the supply amount of the particulate sample 3 is controlled. The evaporated sample forms a thin film on the evaporation substrate 6 arranged on a spherical surface. A mask may be used if necessary.

It goes without saying that the vapor deposition substrate 6 is optimally heated by the heating device relative to the vapor deposited material. The sample that has not been completely evaporated in the sample deposition region 4 is completely collected by the unevaporated sample collection device 5 to keep the vacuum region clean at all times.

To generate a multilayer film, the above operation is performed by replacing the particulate sample supply device 2. Vapor deposition inside a cylindrical shape can be achieved by changing the irradiation angle of the laser beam 1 for sample evaporation.

[Effect]

Next, I will explain the effect.

The main feature of the present invention is that fine particles with a small heat capacity are evaporated by the sample evaporating laser beam 1 in a space, and the evaporation rate is fast, resulting in a wide range of materials from low melting point materials to ultra-high temperature materials. Widespread deposition coating speed. Moreover, a highly pure vapor deposited film is produced.

Also, by changing the atmosphere by filling various gases in a vacuum,
Vapor deposited films of nitrides, oxides, etc. can also be produced. The laser evaporation method of the present invention is capable of depositing a evaporation sample on the inner wall surface of a cylindrical or other complex shape by changing the evaporation method in a spherical space in order to deposit the evaporation sample in a 7゜( space). They also succeeded in creating a film.

〔Effect of the invention〕

As explained above, the present invention uses a clean laser beam as an evaporation energy source, and by passing the evaporation material through the laser beam, the evaporation sample is evaporated in the space and deposited on the evaporation substrate. It is possible to produce a high-purity vapor deposition film free of impurities from evaporation samples ranging from high temperature to ultra-high temperature heat-resistant materials such as ceramics, and has the effect of accelerating the vapor deposition coating speed.

Furthermore, since the evaporation is performed using the entire spherical space, it is possible to easily evaporate onto the inner surface of a three-dimensional structure.
The method has the advantage that the range in which the deposited sample can be used is much larger than in the prior art.

The laser vapor deposition method of the present invention brings about great technical ripple effects in many fields, such as the production of cutting tools, anti-wear films on friction surfaces, the production of various types of sensors, and the production of various types of laminated films.

[Brief explanation of drawings]

FIG. 1 is a diagram for explaining one embodiment of the present invention. In the figure, 1 is a laser beam for sample evaporation, 2 is a particle sample supply device, 3 is a sample evaporation area, 4 is an unevaporated sample recovery device,
5 is a deposition substrate.

Claims (1)

[Claims] A deposition method in which a deposition sample is spatially evaporated using a laser beam, in which a laser beam for evaporating the deposition sample is irradiated in a vacuum or a diluted gas, and fine particles or ultrafine particles are placed in the laser beam for evaporating the deposition sample. A laser evaporation method characterized in that the fine particles or superparticles are evaporated and deposited in this passing space during the passing process.