JPS61104622A - Variable aperture - Google Patents
Variable apertureInfo
- Publication number
- JPS61104622A JPS61104622A JP59227370A JP22737084A JPS61104622A JP S61104622 A JPS61104622 A JP S61104622A JP 59227370 A JP59227370 A JP 59227370A JP 22737084 A JP22737084 A JP 22737084A JP S61104622 A JPS61104622 A JP S61104622A
- Authority
- JP
- Japan
- Prior art keywords
- blade
- arm
- turning
- pins
- linked
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004888 barrier function Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003303 reheating Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体集積回路の製造に使用されるフォトマ
スクのパターンの原版（以下、レティクル）を作成する
パターン描画装置のバリアプルアパーチャーに関するも
のである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a barrier pull aperture of a pattern writing device for creating a pattern original (hereinafter referred to as a reticle) of a photomask used in the manufacture of semiconductor integrated circuits. It is.
半導体集積回路の製造に使用されるフォトマスクは、通
常実寸の１０倍、あるいは５倍のレティクルのパターン
を縮小投影露光装置を使用し、Ｍ行Ｎ列にステップアン
ドリヒートシて作成する。レティクルのパターンはＣＡ
Ｄ等の設計ツールにより作成され、その設計データに基
づき、パターンジェネレータ（以下Ｐ、Ｇ ）により描
画されるのが一般的である。Photomasks used in the manufacture of semiconductor integrated circuits are usually created by step-and-reheating a reticle pattern 10 or 5 times the actual size in M rows and N columns using a reduction projection exposure apparatus. The reticle pattern is CA
It is generally created by a design tool such as D, and drawn by a pattern generator (hereinafter referred to as P or G) based on the design data.
ＰＣは矩形スリットイメージを形成するバリアプルアパ
ーチャ一部と、ＸＹステージ部とから成り、そのパター
ン描画方法は被描画プレートを載せたＸＹステージを設
計データに従い適宜移動させ、バリアプルアパーチャー
による矩形スリットイメージと適宜組合せ使用すること
により矩形イメージを積分させ、所要のパターンを発生
させる。The PC consists of a barrier pull aperture part that forms a rectangular slit image and an XY stage part.The pattern drawing method is to move the XY stage on which the plate to be drawn is placed as appropriate according to the design data, and to draw a rectangular slit image using the barrier pull aperture. A rectangular image is integrated and a desired pattern is generated by using an appropriate combination of
従来のＰＧのバリアプルアパーチャーは第５図に示す様
に、相対する２枚のブレード２２．２３と、それに直交
するもう一組のブレード２４．２５から構成され、これ
らブレード２２．２３．２４．、２５のエツジて矩形を
形成している。各ブレードにはアーム２６〜２９が取付
けられ、相対するプレートのアーム２６゜２７及び２８
，２９の一側に刻設された歯溝に歯車３０゜３１がそ」
ｔそれ噛合し、歯車の回転力向を違えることにより相対
するプレートの間隔は可変することが出来、Ｊ−１つ又
、これらのプレー１−’ ｆｄ：セクタギア３２とモー
タ３３の歯車３４との組合ぜにて円盤基板３５を回転さ
せることにより矩形イメージのセンタを中心に回転出来
る機構になっている。As shown in FIG. 5, the conventional PG barrier pull aperture is composed of two opposing blades 22.23 and another set of blades 24.25 perpendicular to these blades 22.23.24. , 25 form a rectangle. Arms 26-29 are attached to each blade, with arms 26, 27 and 28 of the opposing plate.
, 29. Gears 30° and 31 are located in the tooth grooves carved on one side of 29.
The spacing between the opposing plates can be varied by meshing with them and changing the rotational force direction of the gears. By rotating the disc substrate 35 in combination, the mechanism is such that it can rotate around the center of the rectangular image.
〔発明が角？ｒ決しようとする問題点〕しかしなから、
この様な従来のバリアプルアパーチャーの機構では三角
形や台形の様なパターンを描画し、１一つとする場合に
、鋭角のコーツーーを正確にパターンニングすることが
出来ないことはもとより、第６図（ａ）の形態のパター
ンはバリアプルアパーチャーの組合せにより近似的に第
６図（）））の形態に表現されるが、この場合でもデー
タ量が非常に大量になるため、描画時間が長くなるとい
う欠点を有している。[Is invention a corner? The problem that we are trying to resolve] However,
With such a conventional barrier pull aperture mechanism, when a triangular or trapezoidal pattern is drawn and it is made into one, it is not possible to accurately pattern an acute angle corner. The pattern in form a) can be expressed approximately in the form shown in Figure 6()) by a combination of barrier apertures, but even in this case, the amount of data is extremely large, so it takes a long time to draw. It has its drawbacks.
本発明ｄ、前記の従来のアパーチャーの欠点を除去し、
三角形や台形のパターンも正確、且つ迅速に描画可能な
バリアプルアパーチャーを提供する′ものである。The present invention d eliminates the drawbacks of the above-mentioned conventional apertures,
It provides a barrier pull aperture that can accurately and quickly draw triangular or trapezoidal patterns.
本発明は２組の相対する２枚のブレード対により１２Ｔ
ｌ廿れる空間内に、各組のプレートの姿勢を変化させて
該ブレードの端縁にて三角形或いは四辺形のパターンを
形成させるアパーチャーにおいて、一方向に前進又は後
退する支持アーム先端に各ブレードを一定角度範囲内で
回動可能に軸支したことを特徴とするバリアプルアパー
チャーである。The present invention uses two opposing pairs of blades to achieve a 12T
Each blade is attached to the tip of a support arm that moves forward or backward in one direction in an aperture that changes the attitude of each set of plates in a space that extends to form a triangular or quadrilateral pattern at the edges of the blades. This is a barrier pull aperture characterized by being pivotally supported so that it can rotate within a certain angle range.
以下に、本発明の一実施例を図によって説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第１図は本発明によるバリアプルアパーチャーの一実施
例の概念図である。４枚のブレード］、２゜３．４はそ
の前端縁により四辺形等が形成されるように配列されて
おり、相対するプレート２．／Ｉはその中央部分で、Ｘ
方向（図中左右方向）に前後進する支持アーム５の先端
にピン７によシ枢支されているとともに、他の相対する
ブレード］、３はその中央部分で、Ｙ方向（図中上下方
向）に前後進する支持アーム６の先端にピン７により同
様に枢支されている（ブレード１及び３のものは図中省
略しである）。さらに、各々のプレー１−ニは支持アー
ムの両側に、該ブレードをピン７を中心に回転させるだ
めの回転運動伝達棒８が２本対称位置にピンにより連結
されておシ、各ブレードの２本の回転運動伝達棒８は支
持アームを中心に回転する回転駆動アーム９にピンによ
り連結されている０
ここで、個々のブレードシステムの機能は同等であるの
で、代表として１つのブレードシステムの詳細な構成機
能を、以下第２図（ａ） 、 （ｂ）により説明する。FIG. 1 is a conceptual diagram of an embodiment of a barrier pull aperture according to the present invention. The four blades], 2°3.4 are arranged so that their front edges form a quadrilateral, etc., and the opposing plates 2. /I is the central part, X
The supporting arm 5 is pivoted by a pin 7 at the tip of the support arm 5 which moves forward and backward in the direction (left and right in the figure), and is supported by a pin 7 at the tip of the supporting arm 5. ) is similarly pivotally supported by a pin 7 at the tip of a support arm 6 that moves back and forth (blades 1 and 3 are omitted from the figure). Furthermore, each blade 1-2 has two rotary motion transmitting rods 8 connected at symmetrical positions on both sides of the support arm to rotate the blade around the pin 7, The rotary motion transmission rod 8 of the book is connected by a pin to a rotary drive arm 9 that rotates around the support arm.Here, since the functions of the individual blade systems are equivalent, the details of one blade system will be taken as a representative. The configuration functions will be explained below with reference to FIGS. 2(a) and (b).
ブレード１１には支持アーム１２と、それを中心に対称
関係に２本の回転運動伝達棒１３．１４がそれぞれピン
１５，１６．１７により連結されている。２本の回転運
動伝達棒１３ 、１４は、支持アーム１２を中心にモー
タ１８により回転される回転駆動アーム１９にピン２０
，２１により連結されている。ピン２０及び２１０回転
駆動アームに対する位置は、モータ７８に対して対称な
位置である。A support arm 12 and two rotary motion transmitting rods 13.14 are connected to the blade 11 in a symmetrical relationship around the support arm 12 by pins 15, 16.17, respectively. The two rotary motion transmission rods 13 and 14 are connected to a rotary drive arm 19 that is rotated by a motor 18 around the support arm 12 with a pin 20.
, 21. The position of pins 20 and 210 relative to the rotational drive arm is symmetrical relative to motor 78.
本ブレードシステムＢ全体は支持アームの後部に伺いて
いる駆動システム（省略しである）に」：υ、前後に駆
動する。他方、モータ１８により回転駆動アーム１９を
例えば反時計方向に回転させると、回転運動伝達棒１３
はピン２０を介して図中左方向へ運動し、回転運動伝達
棒１４は対称に右方へ運動するＯ
従って、ブレード１１は第３図のように支持アーム］２
と連結しているピン１５を中心に反時計方向に回転する
。然るに第４図のように４つのブレードシステムＢｉｒ
夫々独立に操作することにより、任意の四辺形（三角形
を含む）を形成することが出来る。The entire blade system B is driven back and forth by a drive system (not shown) located at the rear of the support arm. On the other hand, when the rotary drive arm 19 is rotated, for example, counterclockwise by the motor 18, the rotary motion transmission rod 13
moves to the left in the figure via the pin 20, and the rotary motion transmission rod 14 moves symmetrically to the right. Therefore, the blade 11 is supported by the support arm]2 as shown in FIG.
It rotates counterclockwise around the pin 15 that is connected to it. However, as shown in Fig. 4, the four blade system Bir
Any quadrilateral (including a triangle) can be formed by operating each of them independently.
本発明は以上説明したように、一方向に前後進するアー
ムにブレードを一定角度範囲で回動するように支持した
ので、４つのブレードシステムヲ適宜組み合せることに
より任意の三角形あるいは四辺形を容易に形成すること
ができ、しかもブレードが一定範囲で回動するから、い
かなる角度のコーナーも正確に、かつ最小のショットで
４Ｗｉ画することができる効果を有するものである。As explained above, in the present invention, since the blade is supported so as to rotate within a certain angle range on the arm that moves back and forth in one direction, any triangle or quadrilateral can be easily formed by appropriately combining the four blade systems. Moreover, since the blade rotates within a certain range, corners of any angle can be accurately drawn in 4Wi with the minimum number of shots.
第１図は本発明の一実施例を示す構成図、第２図（ａ）
ｔｄ：本発明のブレードシステムを示す一実施例の平
面図、（）〕）は同側面図、第３図は本発明のブレード
システムの任意角度にブレードを回転した状態を示す図
、第４図は本発明の一実施例に基づくブレードシステム
により任意の四辺形を形成した状態を示す図、第５図は
従来のバリアプルアパーチャーの概念図、第６図は従来
のバリアプルアパーチャーを使用して任意角度のパター
ンを近似して描画した状態を示す図で、（ａ）は形成し
たいパターンを示す図、（１つ）は実際の描画イメージ
を示す図である。
１．２．３．／ｌ ブレード、５・・・支持アーム、
６・・・支持アーム、７・ピン、８ 回転運動伝達棒、
９・・・回転１駆動アーム、］１・・プレート、１２・
・・支持アーム、１３．１４・・・回転運動伝達棒、１
５，１６．１７・・・ピン、］８・・・モータ、１９・
回転駆動アーム、２０．２１・・・ピン第１図
第２図
（Ｑ）
（ｂ）
（α）
第６図
（ｂ）Fig. 1 is a configuration diagram showing an embodiment of the present invention, Fig. 2(a)
td: A plan view of one embodiment of the blade system of the present invention, ()]) is the same side view, Figure 3 is a diagram showing the blade system of the present invention in a state where the blade is rotated to an arbitrary angle, Figure 4 5 is a conceptual diagram of a conventional barrier pull aperture, and FIG. 6 is a diagram showing an arbitrary quadrilateral formed by a blade system according to an embodiment of the present invention. FIG. 6 is a conceptual diagram of a conventional barrier pull aperture. These are diagrams showing a state in which a pattern at an arbitrary angle is approximated and drawn, where (a) shows a pattern to be formed, and (one) shows an actual drawing image. 1.2.3. /l blade, 5... support arm,
6... Support arm, 7. Pin, 8 Rotary motion transmission rod,
9... Rotation 1 drive arm,] 1... Plate, 12...
...Support arm, 13.14...Rotary motion transmission rod, 1
5,16.17...Pin, ]8...Motor, 19.
Rotation drive arm, 20.21...Pin Fig. 1 Fig. 2 (Q) (b) (α) Fig. 6 (b)
Claims (1)
空間内に、各組のブレードの姿勢を変化させて該ブレー
ドの端縁で三角形或いは四辺形のパターンを形成させる
アパーチャーにおいて、一方向に前進又は後退する支持
アーム先端に各ブレードを一定角度範囲内で回動可能に
軸支したことを特徴とするバリアブルアパーチャー。(1) In an aperture that changes the posture of each pair of blades to form a triangular or quadrilateral pattern with the edges of the blades in a space surrounded by two opposing pairs of blades, one A variable aperture characterized in that each blade is rotatably supported within a certain angle range at the tip of a support arm that moves forward or backward in a direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59227370A JPS61104622A (en) | 1984-10-29 | 1984-10-29 | Variable aperture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59227370A JPS61104622A (en) | 1984-10-29 | 1984-10-29 | Variable aperture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61104622A true JPS61104622A (en) | 1986-05-22 |
Family
ID=16859739
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59227370A Pending JPS61104622A (en) | 1984-10-29 | 1984-10-29 | Variable aperture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61104622A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0869396A3 (en) * | 1997-03-31 | 2000-12-06 | Svg Lithography Systems, Inc. | Adjustable slit and method for varying line width |
| EP1020769A3 (en) * | 1999-01-15 | 2002-12-11 | Svg Lithography Systems, Inc. | Dynamically adjustable slit |
| WO2003050621A1 (en) * | 2001-12-07 | 2003-06-19 | Motorola, Inc. | Continuously adjustable neutral density filter |
| EP1431829A1 (en) * | 2002-12-19 | 2004-06-23 | ASML Netherlands B.V. | Lithographic projection apparatus |
| US7224438B2 (en) | 2002-12-19 | 2007-05-29 | Asml Netherlands B.V. | Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus |
| JP2009020441A (en) * | 2007-07-13 | 2009-01-29 | Nsk Ltd | Exposure apparatus and exposure method |
| CN102955366A (en) * | 2011-08-22 | 2013-03-06 | 上海微电子装备有限公司 | Projection exposure device and splicing method |
| WO2014055585A1 (en) * | 2012-10-05 | 2014-04-10 | Rudolph Technologies, Inc. | Blade for substrate edge protection during photolithography |
-
1984
- 1984-10-29 JP JP59227370A patent/JPS61104622A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0869396A3 (en) * | 1997-03-31 | 2000-12-06 | Svg Lithography Systems, Inc. | Adjustable slit and method for varying line width |
| KR100548050B1 (en) * | 1997-03-31 | 2006-05-02 | 에스브이지 리도그래피 시스템즈, 아이엔씨. | Adjustable slits and methods to change line width |
| EP1020769A3 (en) * | 1999-01-15 | 2002-12-11 | Svg Lithography Systems, Inc. | Dynamically adjustable slit |
| WO2003050621A1 (en) * | 2001-12-07 | 2003-06-19 | Motorola, Inc. | Continuously adjustable neutral density filter |
| US6744494B2 (en) | 2001-12-07 | 2004-06-01 | Motorola, Inc. | Continuously adjustable neutral density area filter |
| EP1431829A1 (en) * | 2002-12-19 | 2004-06-23 | ASML Netherlands B.V. | Lithographic projection apparatus |
| US7224438B2 (en) | 2002-12-19 | 2007-05-29 | Asml Netherlands B.V. | Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus |
| JP2009020441A (en) * | 2007-07-13 | 2009-01-29 | Nsk Ltd | Exposure apparatus and exposure method |
| CN102955366A (en) * | 2011-08-22 | 2013-03-06 | 上海微电子装备有限公司 | Projection exposure device and splicing method |
| CN102955366B (en) * | 2011-08-22 | 2015-08-26 | 上海微电子装备有限公司 | A kind of projection aligner and joining method |
| WO2014055585A1 (en) * | 2012-10-05 | 2014-04-10 | Rudolph Technologies, Inc. | Blade for substrate edge protection during photolithography |
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