JPS61103287A - Information card - Google Patents
Information cardInfo
- Publication number
- JPS61103287A JPS61103287A JP59224866A JP22486684A JPS61103287A JP S61103287 A JPS61103287 A JP S61103287A JP 59224866 A JP59224866 A JP 59224866A JP 22486684 A JP22486684 A JP 22486684A JP S61103287 A JPS61103287 A JP S61103287A
- Authority
- JP
- Japan
- Prior art keywords
- information
- card
- recording
- light
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008859 change Effects 0.000 claims abstract description 11
- 230000003287 optical effect Effects 0.000 claims description 41
- 239000000463 material Substances 0.000 abstract description 67
- 239000000758 substrate Substances 0.000 abstract description 7
- 230000001681 protective effect Effects 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 description 54
- 239000002184 metal Substances 0.000 description 54
- 229920005989 resin Polymers 0.000 description 30
- 239000011347 resin Substances 0.000 description 30
- 150000003839 salts Chemical class 0.000 description 28
- 150000001875 compounds Chemical class 0.000 description 24
- -1 polyethylene Polymers 0.000 description 24
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 20
- 239000010409 thin film Substances 0.000 description 18
- 239000010408 film Substances 0.000 description 17
- 239000010949 copper Substances 0.000 description 16
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 16
- 150000002739 metals Chemical class 0.000 description 12
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- 235000005074 zinc chloride Nutrition 0.000 description 10
- 239000011592 zinc chloride Substances 0.000 description 10
- 229910052709 silver Inorganic materials 0.000 description 9
- 239000004332 silver Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- 239000003638 chemical reducing agent Substances 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- 239000003112 inhibitor Substances 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 7
- 230000001678 irradiating effect Effects 0.000 description 7
- 150000002736 metal compounds Chemical class 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 229910001385 heavy metal Inorganic materials 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000000020 Nitrocellulose Substances 0.000 description 5
- JBANFLSTOJPTFW-UHFFFAOYSA-N azane;boron Chemical class [B].N JBANFLSTOJPTFW-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 235000019441 ethanol Nutrition 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229920001220 nitrocellulos Polymers 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 229910052714 tellurium Inorganic materials 0.000 description 5
- 229910052718 tin Inorganic materials 0.000 description 5
- 239000011135 tin Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N acetone Substances CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 239000011976 maleic acid Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 108010010803 Gelatin Proteins 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 3
- 235000008429 bread Nutrition 0.000 description 3
- 239000002738 chelating agent Substances 0.000 description 3
- 229920006026 co-polymeric resin Polymers 0.000 description 3
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 239000008273 gelatin Substances 0.000 description 3
- 229920000159 gelatin Polymers 0.000 description 3
- 235000019322 gelatine Nutrition 0.000 description 3
- 235000011852 gelatine desserts Nutrition 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000002923 metal particle Substances 0.000 description 3
- 229910001120 nichrome Inorganic materials 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 239000001119 stannous chloride Substances 0.000 description 3
- 235000011150 stannous chloride Nutrition 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- VEJOYRPGKZZTJW-FDGPNNRMSA-N (z)-4-hydroxypent-3-en-2-one;platinum Chemical compound [Pt].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O VEJOYRPGKZZTJW-FDGPNNRMSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical class NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- 229910000978 Pb alloy Inorganic materials 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 229940081735 acetylcellulose Drugs 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 235000003704 aspartic acid Nutrition 0.000 description 2
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 229910000085 borane Inorganic materials 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical compound CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 108091008695 photoreceptors Proteins 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000012279 sodium borohydride Substances 0.000 description 2
- 229910000033 sodium borohydride Inorganic materials 0.000 description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 2
- RCIVOBGSMSSVTR-UHFFFAOYSA-L stannous sulfate Chemical compound [SnH2+2].[O-]S([O-])(=O)=O RCIVOBGSMSSVTR-UHFFFAOYSA-L 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KSCNHKPMMKUPLO-UHFFFAOYSA-N ($l^{1}-boranylamino)boron Chemical compound [B]N[B] KSCNHKPMMKUPLO-UHFFFAOYSA-N 0.000 description 1
- AAWZDTNXLSGCEK-LNVDRNJUSA-N (3r,5r)-1,3,4,5-tetrahydroxycyclohexane-1-carboxylic acid Chemical compound O[C@@H]1CC(O)(C(O)=O)C[C@@H](O)C1O AAWZDTNXLSGCEK-LNVDRNJUSA-N 0.000 description 1
- FGLRWHNZUBAWJK-MDZDMXLPSA-N (e)-3-(3-hydroxyphenyl)-1-phenylprop-2-en-1-one Chemical compound OC1=CC=CC(\C=C\C(=O)C=2C=CC=CC=2)=C1 FGLRWHNZUBAWJK-MDZDMXLPSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- UOFGSWVZMUXXIY-UHFFFAOYSA-N 1,5-Diphenyl-3-thiocarbazone Chemical compound C=1C=CC=CC=1N=NC(=S)NNC1=CC=CC=C1 UOFGSWVZMUXXIY-UHFFFAOYSA-N 0.000 description 1
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 1
- BMNGOGRNWBJJKB-UHFFFAOYSA-N 1-azidopyrene Chemical compound C1=C2C(N=[N+]=[N-])=CC=C(C=C3)C2=C2C3=CC=CC2=C1 BMNGOGRNWBJJKB-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- JQPFYXFVUKHERX-UHFFFAOYSA-N 2-hydroxy-2-cyclohexen-1-one Natural products OC1=CCCCC1=O JQPFYXFVUKHERX-UHFFFAOYSA-N 0.000 description 1
- IQKPRZPVTQHVOY-UHFFFAOYSA-N 2-methylpentanedial Chemical compound O=CC(C)CCC=O IQKPRZPVTQHVOY-UHFFFAOYSA-N 0.000 description 1
- FQHYQCXMFZHLAE-UHFFFAOYSA-N 25405-85-0 Chemical compound CC1(C)C2(OC(=O)C=3C=CC=CC=3)C1C1C=C(CO)CC(C(C(C)=C3)=O)(O)C3C1(O)C(C)C2OC(=O)C1=CC=CC=C1 FQHYQCXMFZHLAE-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- DGRVGDGENRMGSY-UHFFFAOYSA-N B.C(C)[SbH]CC Chemical compound B.C(C)[SbH]CC DGRVGDGENRMGSY-UHFFFAOYSA-N 0.000 description 1
- WQSBEGCSKGQEFI-UHFFFAOYSA-N B.C[SbH]C Chemical compound B.C[SbH]C WQSBEGCSKGQEFI-UHFFFAOYSA-N 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
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- 239000004094 surface-active agent Substances 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- FAKFSJNVVCGEEI-UHFFFAOYSA-J tin(4+);disulfate Chemical compound [Sn+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O FAKFSJNVVCGEEI-UHFFFAOYSA-J 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- PVVQHYYIXOYMHC-UHFFFAOYSA-L zinc;n-phenylaniline;dichloride Chemical compound [Cl-].[Cl-].[Zn+2].C=1C=CC=CC=1NC1=CC=CC=C1 PVVQHYYIXOYMHC-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Credit Cards Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は情報カードに関し、ざらに詳しくは、記録内容
の変更でがきるIC記録部と、記録内容の変更および改
閏ができない光記録部とを有する情報カードに関する。[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to an information card, and more specifically, the present invention relates to an information card, and more specifically, it includes an IC recording section whose recorded contents can be changed, an optical recording section whose recorded contents cannot be changed or tampered with, and an optical recording section whose recorded contents cannot be changed or tampered with. Regarding an information card having.
〔発明の技術的背景ならびにその問題点〕従来、クレジ
ットカード、バンクカードなどのカード類に埋設される
記録材料としては、磁気材料が主として用いられてきた
。この磁気材料は、情報の書込みならびに読出しが容易
に行なえるという利点はあるが、反曲、情報の改憲が容
易に行なわれ、しかも高密度記録ができないという問題
点があった。[Technical Background of the Invention and Problems Therein] Conventionally, magnetic materials have been mainly used as recording materials embedded in cards such as credit cards and bank cards. Although this magnetic material has the advantage that information can be easily written and read, it has the problem that it can be easily distorted or altered, and high-density recording cannot be performed.
ところで、上記のような問題点を解決するため、感光材
にパターン露光を施こして、未露光部である光透過部と
露光部である遮光部とを形成することによって、感光材
に情報を書込み、この情報を光透過度の差異によって読
取るようなタイプの光記録材料が提案されている。By the way, in order to solve the above-mentioned problems, information can be transmitted to the photosensitive material by subjecting the photosensitive material to pattern exposure to form an unexposed light-transmitting area and an exposed light-blocking area. Types of optical recording materials have been proposed in which information is written and this information is read by means of differences in light transmission.
一方、光透過度の相違による情報の読出しではなく、光
反射率の相違により情報を読出そうとする試みもある。On the other hand, there are attempts to read information not based on differences in light transmittance but based on differences in light reflectance.
た・とえは、銀粒子をゼラチンマトリックス中に分散し
てなる記録層を有するカード類が提案されている。この
記録層への情報の書込みは、レーザビームを記録層に照
射して記録ビットを形成して行なわれている。この記録
層はコーティング法により連続的に製造でき、しかも銀
を用いることによって広い波長域にわたって均一な反射
率が得られ、種々の波長のレーザビームを用いた記録再
生装置への適用が可能であるという利代を有している。For example, cards have been proposed that have a recording layer made of silver particles dispersed in a gelatin matrix. Information is written to the recording layer by irradiating the recording layer with a laser beam to form recording bits. This recording layer can be manufactured continuously using a coating method, and by using silver, uniform reflectance can be obtained over a wide wavelength range, making it possible to apply it to recording and reproducing devices that use laser beams of various wavelengths. It has an interest rate of
一方また、記録材料の記録層に、レーザビームなどのエ
ネルギービームをスポット状に照射して、記録層の一部
を状態変化させて記録する、いわゆるヒートモード記録
材料が提案されている。このヒートモード記録材料に用
いる記録層としては、テルル、ビスマスなどの金属11
11、ポリスチレン、ニトロセルロースなどの有機薄膜
、あるいは相転位を利用したテルル低酸化物膜などが用
いられている。これらの記録材料は、情報の書込みの後
現像処理などの必要がなく、「書いた後直読する」こと
のできる、いわゆるD RA W (direct r
eadafter write )媒体であり、高密度
記録が可能であり追加書込みも可能であるという利点を
有している。On the other hand, a so-called heat mode recording material has been proposed in which the recording layer of the recording material is irradiated with an energy beam such as a laser beam in a spot shape to change the state of a part of the recording layer. The recording layer used in this heat mode recording material is metal 11 such as tellurium or bismuth.
11. Organic thin films such as polystyrene and nitrocellulose, or tellurium low oxide films that utilize phase transition, are used. These recording materials do not require any development treatment after information is written, and can be read directly after writing.
It has the advantage of being capable of high-density recording and additional writing.
ところが、上記のような光記録材料からなる光%l
記録部を有する光カードにおいては、一旦情報
を光記録部に書込んだ後には、書込んだ情報の変更がで
きないため、たとえば預金総額、預金残高、あるいは利
用履歴などの刻々に変化したり変更を要する事項は記録
できないという問題点があった。However, the light %l made of the above-mentioned optical recording material
For optical cards that have a recording section, once the information is written into the optical recording section, the written information cannot be changed. There was a problem that matters that required the following could not be recorded.
さらに、光記録部を有する光カードにおいては、たとえ
ば書込まれた情報の索引に相当する部分は、変更可能な
情報であることが好ましい場合もある。Further, in an optical card having an optical recording section, for example, it may be preferable that a portion corresponding to an index of written information is changeable information.
このように、光記録部を有する光カードでは、変更を要
する情報が書込めないという問題点かあった。As described above, an optical card having an optical recording section has a problem in that information that needs to be changed cannot be written.
本発明は、上記のような従来技術に伴なう問題点を解決
しようとするものであって、光記録部を有する光カード
の利点をも有するとともに、ざらに刻々に変化したりあ
るいは変更を要する情報をも書込める情報カードを提供
することを目的としている。The present invention is an attempt to solve the problems associated with the prior art as described above, and has the advantages of an optical card having an optical recording section, and also has the advantages of an optical card having an optical recording section. The purpose is to provide an information card on which necessary information can be written.
本発明に係る情報カードは、光記録部および I
IGIC記録部えたことを特徴としており、この情報カ
ードでは、記録内容に変更を要しない情報は光記録部に
記録され、記録内容に変更を要する情報はIC記録部に
記録される。The information card according to the present invention includes an optical recording section and an I
This information card is characterized by having an IGIC recording section.In this information card, information that does not require a change in recorded content is recorded on the optical recording section, and information that requires a change in recorded content is recorded on an IC recording section.
以下、本発明に係る情報カードを、図面に示す具体例に
より説明する。Hereinafter, the information card according to the present invention will be explained using specific examples shown in the drawings.
本発明に係る情報カード1は、その断面図が第1図に示
されるように、カード基材2上に、光記録部3とIC記
録部4とが設けられて形成されており、場合によっては
、カード基材2上に保護フィルム5が設けられていても
よい。As shown in FIG. 1, the information card 1 according to the present invention is formed by providing an optical recording section 3 and an IC recording section 4 on a card base material 2. A protective film 5 may be provided on the card base material 2.
カード基材2としては、通常のカードの基材として用い
ることができるあらゆる材料が用いられうる。具体的に
は、ポリ塩化ビニル、塩化ビニル/酢酸ビニル共重合体
、ポリ塩化ビニリデン、ポリメタクリル酸メチルなどの
アクリル系重合体、ポリスチレン、ポリビニルブチラー
ル、アセチルセルロース、スチレン/ブタジェン共重合
体、ポリエチレン、ボリア0ピレン、ポリカーボネート
などが用いられる。場合によっては、鉄、ステンレス、
アルミニウム、スズ、銅、亜鉛などの金属シート、合成
紙、紙なども用いられうる。さらに、上記のような材料
の積層体も用いられつる。As the card base material 2, any material that can be used as a base material for a normal card can be used. Specifically, polyvinyl chloride, vinyl chloride/vinyl acetate copolymer, polyvinylidene chloride, acrylic polymers such as polymethyl methacrylate, polystyrene, polyvinyl butyral, acetylcellulose, styrene/butadiene copolymer, polyethylene, Boria pyrene, polycarbonate, etc. are used. In some cases, iron, stainless steel,
Metal sheets of aluminum, tin, copper, zinc, etc., synthetic paper, paper, etc. may also be used. Furthermore, a laminate of the above-mentioned materials may also be used.
光記録部3としては、以下に例示されるものを含めて、
既知のものが広く用いられつる。Examples of the optical recording section 3 include those exemplified below.
The known ones are widely used.
(a) テルル、ビスマスなどの金属薄膜、ポリスチ
レン、ニトロセルロースなどの有機薄膜、あるいは相転
位を利用したテルル低酸化物膜などの記録材料からなる
光記録部であって、この光記録部への情報の書込みは、
レーザビームなどのエネルギービームをスポット状に光
記録部に照射して、記録部の一部を状態変化させて行な
い、書込まれた情報の読出しは、記録部に記録再生光を
照射し、反射光の強度と位相とを関連づけて検出するこ
とによって行なわれる。(a) An optical recording section made of a recording material such as a metal thin film such as tellurium or bismuth, an organic thin film such as polystyrene or nitrocellulose, or a tellurium low oxide film that utilizes phase transition; To write information,
The optical recording section is irradiated with an energy beam such as a laser beam in the form of a spot to change the state of a part of the recording section.Reading of the written information is carried out by irradiating the recording section with recording/reproducing light and using the reflected light. This is done by correlating and detecting the intensity and phase of light.
(b) 銀粒子をゼラチンマトリックス中に分散して
なる光記録部であって、この光記録部への情報の書込み
は、レーザビームなどのエネルギービームを記録部に照
射して記録ビットを形成することにより行ない、書込ま
れた情報の読出しは、記録部に記録再生光を照射し、反
射光の強度と位相とを関連づけて検出することによって
行なわれる。(b) An optical recording section formed by dispersing silver particles in a gelatin matrix, and information is written to this optical recording section by irradiating the recording section with an energy beam such as a laser beam to form recording bits. The written information is read out by irradiating the recording section with recording/reproducing light and detecting the intensity and phase of the reflected light in association with each other.
(C) ジアゾ基などの感光性基を有する化合物から
なる感光材がマトリックス中に分散されてなる光記録部
であって、情報の書込みは、光記録部にパターン露光を
施こして、未露光部である光透過部と露光部である遮光
部とを形成することによって行ない、書込まれた情報の
読出しは記録部に記録再生光を照射し、光透過度の差異
と位相とを関連づけて検出することによって行なわれる
。(C) An optical recording section in which a photosensitive material made of a compound having a photosensitive group such as a diazo group is dispersed in a matrix, and information is written by subjecting the optical recording section to pattern exposure and leaving the unexposed section. The written information is read by irradiating the recording section with recording/reproducing light and correlating the difference in light transmittance with the phase. This is done by detecting.
(d) (i)光記録材料の用基材と、(ii)この
基材下面に設けられた、光透過部および遮光部からなる
第1記録層と、(iii)この第1記録層の下面に設け
られた、反射性金属薄膜層からなる第2記録層とからな
る光記録部であって、この光記録部は、カード基材Ti
第2記録層が接するように設けられている。(d) (i) a base material for an optical recording material; (ii) a first recording layer provided on the lower surface of this base material and consisting of a light transmitting part and a light shielding part; (iii) a first recording layer of this first recording layer; and a second recording layer made of a reflective metal thin film layer provided on the lower surface of the card base material Ti.
The second recording layer is provided so as to be in contact with it.
この光記録部3について、その断面図を第2図す・1.
に示す・
光記録材料3は、(a)光記録材料用基材6と、(b)
この基材下面に設けられた、光透過部7および遮光部8
からなる第1記録層9と、(C)この第1記録P9の下
面に設けられた、反射性金属 ・薄i!層からなる第
2記録層10とから構成されているが、以下に各層につ
いて詳細に説明する。A cross-sectional view of this optical recording section 3 is shown in Figure 2.1.
The optical recording material 3 shown in FIG.
A light transmitting section 7 and a light shielding section 8 provided on the lower surface of this base material.
A first recording layer 9 consisting of (C) a reflective metal provided on the lower surface of this first recording P9 - Thin i! The second recording layer 10 is composed of layers, and each layer will be explained in detail below.
光記録材料用基材6としては、光透過性であるガラス、
セラミック、紙、プラスチックフィルム、織布、不織布
などあらゆるタイプの材料が用いられうるが、生産性お
よび平滑性の点からガラスあるいはプラスチックフィル
ムが好ましい。プラスチックとしては、セルロース誘導
体、ポリエステル樹脂、ポリカーボネート樹脂、ビニル
系樹脂、ポリイミド系樹脂、アクリル系樹脂、ポリエー
テル樹脂、ポリスルホン41m、ポリアミド樹脂などを
用いることができ、寸法安定性および平滑性の点から、
セルローストリアセテート、ポリエチレンテレフタレー
ト、ポリイミドなどが特に好ましい。これら基材6には
、必要に応じて、コロナ放電処理、プラズマ処理、プラ
イマー処理などの接着性改良のための前処理をしてもよ
い。As the base material 6 for optical recording material, optically transparent glass,
Any type of material can be used, such as ceramic, paper, plastic film, woven fabric, or non-woven fabric, but glass or plastic film is preferred from the viewpoint of productivity and smoothness. As plastics, cellulose derivatives, polyester resins, polycarbonate resins, vinyl resins, polyimide resins, acrylic resins, polyether resins, polysulfone 41m, polyamide resins, etc. can be used, and from the viewpoint of dimensional stability and smoothness. ,
Particularly preferred are cellulose triacetate, polyethylene terephthalate, polyimide, and the like. These base materials 6 may be subjected to pretreatment to improve adhesion, such as corona discharge treatment, plasma treatment, and primer treatment, if necessary.
第1記録部9は、光透過部7および遮光部8 hlら構
成されている。この第1記録部9は、たとえば未露光部
が光透過性となり露光部が遮光性となる感光材をパター
ン露光し、次いで現像することによって形成される。場
合によっては、未露光部が遮光性となり、露光部が光透
過性となる感光材をパターン露光し次いで現像すること
によって、第1記録部9を形成してもよい。The first recording section 9 includes a light transmitting section 7 and a light shielding section 8hl. The first recording section 9 is formed, for example, by exposing a photosensitive material in a pattern such that unexposed areas are light-transmissive and exposed areas are light-blocking, and then developed. In some cases, the first recording section 9 may be formed by exposing a photosensitive material in a pattern such that unexposed areas are light-shielding and exposed areas are light-transmissive, followed by development.
感光材は、たとえば(イ)バインダーとしての透明樹脂
、(ロ)ジアゾ基またはアジド基を有する光分解性の現
像抑制剤および(ハ)還元されて金属現像核となる金属
錯化合物または金属化合物から構成されている。この感
光材においては、バインダーとしての透明樹脂100重
間部に対して、ジアゾ基またはアジド基を有する光分解
性の現像抑制剤は1〜100重石部好ましくは20〜5
0重量部の量で存在し、還元されて金属現像核となる金
属錯化合物または金属化合物は0.1〜100重量部好
ましぐは1〜10重量部の争で存在している。上記の現
像抑i、13剤、金属錯化合物または金属化合物は、バ
インダーとしての透明樹脂中に溶解あるいは分散されて
いるが、好ましくは溶解されている。The photosensitive material is made of, for example, (a) a transparent resin as a binder, (b) a photodegradable development inhibitor having a diazo group or an azide group, and (c) a metal complex compound or metal compound that is reduced to become a metal development nucleus. It is configured. In this photosensitive material, the photodegradable development inhibitor having a diazo group or an azide group is preferably 1 to 100 parts by weight per 100 parts by weight of the transparent resin as a binder.
The metal complex compound or metal compound which is reduced to become metal development nuclei is present in an amount of 0.1 to 100 parts by weight, preferably 1 to 10 parts by weight. The above-mentioned development inhibitors I, 13, metal complex compounds, or metal compounds are dissolved or dispersed in a transparent resin as a binder, and are preferably dissolved.
透明樹脂としては、親油性あるいは親水性の透明樹脂の
いずれもが使用できる。親油性透明樹脂としては、ポリ
酢酸ビニル樹脂、酢酸ビニル/アクリル酸エステル共重
合樹脂、アクリルlli!/酢酸ビニル共重合樹脂、エ
チレン/酢酸ビニル共重合樹脂などのエステル基を有す
る樹脂、酢酸セルロースなどの水酸基を有する樹脂、カ
ルボン酸基あるいはスルホン酸基を含む変性酢酸ビニル
系樹脂などが挙げられる。As the transparent resin, either lipophilic or hydrophilic transparent resin can be used. Lipophilic transparent resins include polyvinyl acetate resin, vinyl acetate/acrylic acid ester copolymer resin, and acrylic lli! Examples include resins having ester groups such as /vinyl acetate copolymer resins and ethylene/vinyl acetate copolymer resins, resins having hydroxyl groups such as cellulose acetate, and modified vinyl acetate resins containing carboxylic acid groups or sulfonic acid groups.
また、光記録特性上はヒートモードで変形する性質を有
するニトロセルロースなどのセル0−ス誘導体をこれら
の親油性透明樹脂に添加することも高感度化のために有
効である。Furthermore, in terms of optical recording properties, it is also effective to add cellulose derivatives such as nitrocellulose, which have the property of deforming in a heat mode, to these lipophilic transparent resins to increase sensitivity.
また、親水性の透明樹脂としては、ゼラチン、カゼイン
、グルー、アラビアゴム、セラックなどの天然高分子化
合物、カルボキシメチルセルロース、卵白アルブミン、
ポリビニルアルコール(部分ケン化ポリ酢酸ビニル)、
ポリアクリル酸、ポリアクリルアミド、ポリビニルピロ
リドン、ボリエチレンオキシド、無水マレイン酸共重合
体などのp成樹脂が用いられるが、水溶性ないし親水性
樹脂である限りにおいて、上記以外のものも使用可能で
ある。バインダーとしての親水性透明樹脂には、この透
明樹脂により感光材層を形成して物理現像液と接触させ
る際に、物理現像液が感光剤層に浸透して物理現像が可
能となる程度の親水性を有することが好ましい。In addition, hydrophilic transparent resins include natural polymer compounds such as gelatin, casein, glue, gum arabic, and shellac, carboxymethyl cellulose, egg albumin,
Polyvinyl alcohol (partially saponified polyvinyl acetate),
P resins such as polyacrylic acid, polyacrylamide, polyvinylpyrrolidone, polyethylene oxide, and maleic anhydride copolymers are used, but other resins than those mentioned above can also be used as long as they are water-soluble or hydrophilic resins. The hydrophilic transparent resin used as a binder has such hydrophilicity that when a photosensitive material layer is formed using this transparent resin and brought into contact with a physical developer, the physical developer penetrates into the photosensitive material layer and physical development is possible. It is preferable that the
また光記録特性上はヒートモードで変形し易い性質のあ
る、ニトロセルロースなどの低分子吊物をエタノール溶
解して上記の親水性透明樹脂に添加することも有効であ
る。Furthermore, it is also effective to dissolve a low-molecular material such as nitrocellulose, which has a property of being easily deformed in a heat mode in terms of optical recording properties, in ethanol and then add the resulting solution to the above-mentioned hydrophilic transparent resin.
現像抑制剤としては、ジアゾ基またはアジド基を有する
化合物が用いられる。ジアゾ基を有する化合物としては
ジアゾ基を有する塩化亜鉛複塩もしくはホウフッ化塩、
またはこれらの化合物とバ・・・11 ラ1
″ムアルデ5ドより1専ら0る縮合生成物である化合物
が好ましい。より具体的には、I)−N。As the development inhibitor, a compound having a diazo group or an azide group is used. Examples of compounds having a diazo group include zinc chloride double salts or fluoroborate salts having a diazo group;
Or these compounds and bar...11 La1
Compounds which are condensation products exclusively 0 from Mualde 5 are preferred. More specifically, I)-N.
N−ジエチルアミノベンゼンジアゾニウム塩化亜鉛複塩
、D−N〜エチル−N−βヒドロキシエチルアミノベン
ゼンジアゾニウム塩化亜鉛複塩、4−モルフォリノ−2
,5−ジェトキシベンゼンジアゾニウム塩化亜鉛複塩、
4−モルフォリノ−2゜5−ジブトキシベンゼンジアゾ
ニウム塩化亜鉛複塩、4−ベンゾイルアミノ−2,5−
ジェトキシベンゼンジアゾニウム塩化亜鉛複塩、4−(
4’−メトキシベンゾイルアミノ)−2,5−ジェトキ
シベンゼンジアゾニウム塩化亜鉛複塩、4−(p〜トル
イルメルカプト)−2,5−ジメトキシベンゼンジアゾ
ニウム塩化亜鉛複塩、4−ジアゾ−4′ −メトキシジ
フェニルアミン塩化亜鉛複塩、4−ジアゾ−3−メトキ
シ−ジフェニルアミン塩化亜鉛複塩などのジアゾ基を有
する塩化亜鉛複塩もしくは以上のような塩化亜鉛複塩の
代わりに上記のホウフッ化塩、硫酸塩、リン酸塩なども
使用できる。N-diethylaminobenzenediazonium zinc chloride double salt, D-N~ethyl-N-β hydroxyethylaminobenzenediazonium zinc chloride double salt, 4-morpholino-2
, 5-jethoxybenzenediazonium zinc chloride double salt,
4-morpholino-2゜5-dibutoxybenzenediazonium zinc chloride double salt, 4-benzoylamino-2,5-
Jetoxybenzenediazonium zinc chloride double salt, 4-(
4'-Methoxybenzoylamino)-2,5-jethoxybenzenediazonium zinc chloride double salt, 4-(p~toluylmercapto)-2,5-dimethoxybenzenediazonium zinc chloride double salt, 4-diazo-4'-methoxy In place of the zinc chloride double salt having a diazo group such as diphenylamine zinc chloride double salt, 4-diazo-3-methoxy-diphenylamine zinc chloride double salt, or the above zinc chloride double salt, the above borofluoride salt, sulfate, Phosphates can also be used.
アジド基を有する化合物としては、p−アジド
1アセトフエノン、4.4′ −ジアジドカルコン、2
.6−ビス−(4′−アジドベンザル)−アセトン、2
,6−ビス−(4′−−7ジドベンザル)−シクロヘキ
サノン、2.6−ビス−(4’ −7ジドベンザル)
−4−メチルシクロヘキサノン、2.6−ビス(4′−
アジドスチリル)−アセトン、アジドピレンなどが使用
できる。ジアゾ基もしくはアジド基を有する限り上記以
外の化合物も使用することもでき、また、上記したジア
ゾ基もしくはアジド基を有する化合物を任意に2種以上
併用して使用することもできる。As a compound having an azide group, p-azide
1 acetophenone, 4.4'-diazide chalcone, 2
.. 6-bis-(4'-azidobenzal)-acetone, 2
, 6-bis-(4'-7didobenzal)-cyclohexanone, 2.6-bis-(4'-7didobenzal)
-4-methylcyclohexanone, 2,6-bis(4'-
(azidostyryl)-acetone, azidopyrene, etc. can be used. Compounds other than those mentioned above can also be used as long as they have a diazo group or an azide group, and two or more of the above-mentioned compounds having a diazo group or an azide group can also be used in combination.
なおジアゾ基を有する化合物を用いる場合には、この化
合物を安定化させる安定化剤を用いるとよく、有機カル
ボン酸や有機スルホン酸がこの安定化剤として用いるこ
とができ、より実際的にはp−トルエンスルホン酸など
を用いることが好ましい。In addition, when using a compound having a diazo group, it is recommended to use a stabilizer that stabilizes this compound. Organic carboxylic acids and organic sulfonic acids can be used as this stabilizer, and more practically p - It is preferable to use toluenesulfonic acid or the like.
次に還元されて金属現像核となる金属錯化合物もしくは
金属化合物について説明する。Next, the metal complex compound or metal compound which is reduced and becomes a metal development nucleus will be explained.
まず、還元されて金属現像核となる金属錯化合物として
は、パラジウム、金、銀、白金、銅などの金属の錯化合
物が用いられ、これらの金属に対し電子ドナーとなる配
位子としては通常知られているものを用いることができ
る。具体的には、下記のような金属錯化合物が用いられ
る。First, complex compounds of metals such as palladium, gold, silver, platinum, and copper are used as the metal complex compounds that are reduced and become metal development nuclei, and the ligands that serve as electron donors for these metals are usually Any known material can be used. Specifically, the following metal complex compounds are used.
ビス(エチレンジアミン)パラジウム([)塩、ジクロ
0エチレンジアミンパラジウム(If)塩、ジクロロ(
エチレンジアミン)白金(Ye塩、テトラクロロジアン
ミン白金(TV)塩、ジクロロビス(エチレンジアミン
)白金(rV)塩、テトラエチルアンモニウムM(II
)塩、ビス(エチレンジアミン銅(I)塩。Bis(ethylenediamine)palladium([) salt, dichloroethylenediaminepalladium(If) salt, dichloro(
ethylenediamine) platinum (Ye salt, tetrachlorodiamine platinum (TV) salt, dichlorobis(ethylenediamine) platinum (rV) salt, tetraethylammonium M (II
) salt, bis(ethylenediamine copper(I) salt.
さらに金属の錯化合物を形成する配位子としては、2力
所以上で配位して環状構造をとるいわゆるキレート化剤
を用いると、形成される金属錯化合物の安定性が高いた
めに好適である。キレート化剤としては第1級、第2級
もしくは第3級アミン類、オキシム類、イミン類、ケト
ン類を挙げることができ、より具体的にはジメチルグリ
オキシム、ジチゾン、オキシン、アセチルアセトン、グ
リシン、エチレンジアミン四酢酸、ニトリ0三酢酸、ウ
ラミルニ酢酸などの化合物が用いられる。Furthermore, as a ligand for forming a metal complex compound, it is preferable to use a so-called chelating agent that forms a cyclic structure by coordinating at two or more sites because the stability of the metal complex compound formed is high. be. Examples of chelating agents include primary, secondary or tertiary amines, oximes, imines, and ketones, more specifically dimethylglyoxime, dithizone, oxine, acetylacetone, glycine, Compounds such as ethylenediaminetetraacetic acid, nitriacetic acid, and uramyldiacetic acid are used.
上記のキレート化剤を用いたものとしては、ビス(2,
2’ −ビピリジン)パラジウム(II)塩、ビス(
アセチルアセトナート)パラジウム(II)、ヒス(N
、N−ジエチルエチレンジアミン)銅(If)塩、ビス
(2,2’ −ビピリジン)銅(I[)塩、ビス(1
,10−7エナントロリン)銅(I)塩、ビス(ジメチ
ルグリオキシマート)銅(IF)、ビス(アセチルアセ
トナート)銅(■)、ビス゛(アセチルアセトナート)
白金(II)などが好ましい。Examples using the above chelating agent include bis(2,
2'-bipyridine) palladium(II) salt, bis(
acetylacetonato) palladium(II), his(N
, N-diethylethylenediamine) copper(If) salt, bis(2,2'-bipyridine) copper(I[) salt, bis(1
, 10-7 enanthroline) copper (I) salt, bis(dimethylglyoximate) copper (IF), bis(acetylacetonate) copper (■), bis(acetylacetonate)
Platinum (II) and the like are preferred.
還元されて金属現像核を与える金属化合物としては、パ
ラジウム、金、銀、白金、銅などの金属の塩化物、硝酸
塩などの水溶性塩などの金属化合物が用いられ、具体的
には無電解メッキの7クチベーター液中に含まれる塩化
パラジウム、硝酸銀、四塩化水素金などの塩が好ましい
が、このうちパラジウムの塩が特に好ましい。As metal compounds that are reduced to give metal development nuclei, metal compounds such as water-soluble salts such as chlorides and nitrates of metals such as palladium, gold, silver, platinum, and copper are used. Specifically, they are used in electroless plating. Salts such as palladium chloride, silver nitrate, and gold tetrachloride contained in the 7 activator liquid are preferred, and among these, palladium salts are particularly preferred.
↑・1. 上述のような・ (イ)l\イン
ダーとしての透明樹脂、(ロ)ジアゾ基またはアジド基
を有する光分解性の現像抑制剤および(ハ)還元されて
金属現像核となる金属錯化合物または金属化合物は、バ
インダーとしての透明樹脂に応じて選択された溶剤とと
もに混合されて、塗布に適した粘度である10〜100
0センチボイズを有する感光材層形成用塗布液とされる
。この感光材層形成用塗布液は、光記録材料用基材6上
に通常0.1〜30(t mの膜厚に塗布されて感光材
層が形成される。↑・1. As mentioned above, (a) a transparent resin as an inder, (b) a photodegradable development inhibitor having a diazo group or an azide group, and (c) a metal complex compound or metal that is reduced to become a metal development nucleus. The compound is mixed with a solvent selected depending on the transparent resin as a binder to obtain a viscosity of 10-100, which is suitable for application.
It is said to be a coating liquid for forming a photosensitive material layer having 0 centimeter void. This coating liquid for forming a photosensitive material layer is coated on the optical recording material substrate 6 to a film thickness of usually 0.1 to 30 tm to form a photosensitive material layer.
バインダーとしての透明樹脂を溶解する溶剤としては、
種々の溶剤が使用できるが、親水性透明樹脂を用いる場
合には、水あるいは水と低級アルコール、ケトン、エー
テルなどの水混和性溶媒との混合溶剤が用いられる。ま
た、親油性透明樹脂を用いる場合には、メチルアルコー
ル、エチルアルコール、イソプロピルアルコールなどの
低級アルコール類、アセトン、メチルエチルケトンなど
のケトン類、酢酸エチル、酢酸ロブチルなどの1ステル
類、メチルセロソルブなどの極性の高い溶剤が好ましく
用いられる。 jなお、
親水性の透明樹脂を用いる場合には、感光材層を形成後
、物理現像処理中の現像液へのバインダーなどの溶出を
抑制するため、硬膜処理を行うことが望ましい。硬膜処
理は、たとえば下記化合物を感光材形成用塗布液中に透
明樹脂100部に対して0.1〜50部の量で予じめ混
合するか、あるいは下記化合物の水溶液をすでに形成さ
れた感光材層上に塗布することにより行なうことができ
る。As a solvent for dissolving the transparent resin as a binder,
Various solvents can be used, but when using a hydrophilic transparent resin, water or a mixed solvent of water and a water-miscible solvent such as a lower alcohol, ketone, or ether is used. In addition, when using a lipophilic transparent resin, lower alcohols such as methyl alcohol, ethyl alcohol, and isopropyl alcohol, ketones such as acetone and methyl ethyl ketone, monoesters such as ethyl acetate and butyl acetate, and polar alcohols such as methyl cellosolve are used. Solvents with high viscosity are preferably used. jIn addition,
When using a hydrophilic transparent resin, it is desirable to perform hardening treatment after forming the photosensitive material layer in order to suppress elution of the binder and the like into the developer during physical development. For example, the hardening treatment can be carried out by pre-mixing the following compound in a coating solution for forming a photosensitive material in an amount of 0.1 to 50 parts per 100 parts of the transparent resin, or by adding an aqueous solution of the following compound to the coating solution that has already been formed. This can be done by coating on the photosensitive material layer.
カリ明パン、アンモニウム明パンなどのAj化合物;ク
ロム明パン、硫酸クロムなどのCr化合物;ホルムアル
デヒド、グリオキザル、グルタルアルデヒド、2−メチ
ルグルタルアルデヒド、サクシナルデヒドなどのアルデ
ヒド類、;0−ベンゾキノン、p−ベンゾキノン、シク
ロヘキサン−1,2−ジオン、シフ0ペンタンー1.2
−ジオン、ジアセチル、2,3−ペンタンジオン、2゜
5−ヘキサンジオン、2.5−ヘキセンジオンなどのジ
ケトンニトリグリシジルイソシアヌル酸塩などのエポキ
シド:テトラフタロイルクロリド、4.4′ −ジフェ
ニルメタンジスルフォニルクOリド、4.4′ −ジフ
ェニルメタンジスルフォニルクロリドなどの酸無水物;
タンニン酸、没食子酸、2.4−ジクロロ−6−ヒドロ
キシ−5−トリアジン、ならびに一般式R2NPOx2
、R−N=C=N−R’ (ここでRは炭素2〜6の
アルキル基、R′は(CH) N (CH3)3x
−基、XはFまたはCI、nは1または2)で表わされ
るリン化合物またはカルボジイミド;スチレン/マレイ
ン酸共重合体、ビニルピロリドン/マレイン酸共重合体
、ビニルメチルエーテル/マレイン酸共重合体、エチレ
ンイミン/マレイン酸共重合体、メタクリル酸/メタク
リ0ニトリル共重合体、ポリメタクリルアミド、メタク
リル酸エステル共重合体などの樹脂類、グルタル酸、コ
ハク酸、リンゴ酸、乳酸、クエン酸、アスパラギン酸、
ゲルコール酸、酒石酸など。Aj compounds such as potassium light bread and ammonium light bread; Cr compounds such as chromium light bread and chromium sulfate; aldehydes such as formaldehyde, glyoxal, glutaraldehyde, 2-methylglutaraldehyde, and succinaldehyde; 0-benzoquinone, p -benzoquinone, cyclohexane-1,2-dione, Schiff 0 pentane-1.2
- Epoxides such as diketone nitriglycidyl isocyanurate such as dione, diacetyl, 2,3-pentanedione, 2゜5-hexanedione, 2.5-hexanedione, etc.: tetraphthaloyl chloride, 4.4'-diphenylmethane disulfonyl Acid anhydrides such as chloride, 4.4′-diphenylmethanedisulfonyl chloride;
Tannic acid, gallic acid, 2,4-dichloro-6-hydroxy-5-triazine, and the general formula R2NPOx2
, R-N=C=N-R' (where R is an alkyl group having 2 to 6 carbon atoms, R' is (CH) N (CH3)3x
- group, X is F or CI, n is 1 or 2) phosphorus compound or carbodiimide; styrene/maleic acid copolymer, vinylpyrrolidone/maleic acid copolymer, vinyl methyl ether/maleic acid copolymer, Resins such as ethyleneimine/maleic acid copolymer, methacrylic acid/methacrylic acid nitrile copolymer, polymethacrylamide, methacrylic acid ester copolymer, glutaric acid, succinic acid, malic acid, lactic acid, citric acid, aspartic acid ,
Gelcolic acid, tartaric acid, etc.
このようにして、光記録材料用基材6上に設けられた感
光材層をパターン露光し、次いで現像して、未露光部で
ある光透過部7および露光部である遮光部8とからなる
第1記録層9を形成する。In this way, the photosensitive material layer provided on the substrate 6 for optical recording material is pattern-exposed and then developed to form a light-transmitting area 7, which is an unexposed area, and a light-blocking area 8, which is an exposed area. A first recording layer 9 is formed.
パターン露光は、たとえばホトマスクなどのマスクを介
して行なうことができる。Pattern exposure can be performed, for example, through a mask such as a photomask.
また照射光をビーム状に集光して感光材層に直接照射し
てパターン状に遮光部8を形成することもできる。Alternatively, the light shielding portions 8 can be formed in a pattern by condensing the irradiation light into a beam and directly irradiating the photosensitive material layer.
第1記録層9における光透過部7および遮光部8により
もたらされる画像情報は、情報そのものあるいは情報を
読取る際に、トラッキングおよびプレフォーマットとし
ての働きをしている。The image information provided by the light transmitting section 7 and the light shielding section 8 in the first recording layer 9 functions as tracking and preformat when reading the information itself or the information.
感光材層における露光部では、ジアゾ基またはアジド基
を有する光分解性の現像抑制剤は、露光量に応じて分解
されて潜像が形成される。In the exposed area of the photosensitive material layer, the photodegradable development inhibitor having a diazo group or an azide group is decomposed according to the amount of exposure to form a latent image.
;・111 露光に際して使用される光源と
しては、ジアゾ基もしくはアジド基を有する化合物を分
解しうる光源ならば任意に用いることができ、通常超^
圧水銀灯が好ましく用いられる。;・111 Any light source can be used as long as it can decompose a compound having a diazo group or an azide group as the light source used during exposure, and usually ultra-high
Pressure mercury lamps are preferably used.
上記のようなパターン露光によりジアゾ基もしくはアジ
ド基を有する化合物の分解により形成された潜像を、還
元剤水溶液と接触させて金属現像核を発生させる。なお
未露光部では、ジアゾ基またはアジド基を有する現像抑
制剤は分解されていないため、還元剤水溶液と接触して
も金属現像核は発生せずそのまま光透過部として残存し
ている。A latent image formed by decomposition of a compound having a diazo group or an azide group by pattern exposure as described above is brought into contact with an aqueous reducing agent solution to generate metal development nuclei. Note that in the unexposed area, the development inhibitor having a diazo group or an azide group is not decomposed, so even when it comes into contact with the reducing agent aqueous solution, no metal development nuclei are generated and it remains as a light-transmitting area.
この際用いられる還元剤としては、塩化第1スズ、硫酸
第1スズ、水素化ホウ素ナトリウム、ジメチルアミンボ
ラザン、ジエチルアミンボラザン、トリメチルアミンボ
ラザンなどのボラザン系化合物、ボラン、ジボラン、メ
チルジボランなどのボラン系化合物、ヒドラジンなどが
用いられる。このうち、酸性塩化第1スズ溶液、硫酸第
1スズ溶液(weiss液)あるいは重版の無電解メッ
キ用のセンシタイザ−液などが特に好ましいが、一般に
は、強力な還元剤であればすべて使用できる。
1次いで、このようにして得られた金属現像核と物理
現像液とを接触させると、物理現像液中に含まれる金属
が還元されて、前記金属現像核を中心として析出し、遮
光部8が形成される。Reducing agents used in this case include stannous chloride, stannous sulfate, sodium borohydride, borazane compounds such as dimethylamine borazane, diethylamine borazane, and trimethylamine borazane, borane, diborane, and methyldiborane. Borane compounds, hydrazine, etc. are used. Among these, acidic stannous chloride solution, stannous sulfate solution (Weiss solution), and sensitizer solution for electroless plating of reprints are particularly preferred, but in general, any strong reducing agent can be used.
1. Next, when the metal development nuclei thus obtained are brought into contact with a physical developer, the metal contained in the physical developer is reduced and precipitated around the metal development nuclei, and the light shielding portion 8 is formed. It is formed.
物理現像液としては、水溶性の被還元性金属塩および還
元剤を含む水溶液が、低温または必要に応じて加温した
状態で使用される。As the physical developer, an aqueous solution containing a water-soluble reducible metal salt and a reducing agent is used at a low temperature or in a heated state if necessary.
被還元性金属塩としては、たとえばニッケル、コバルト
、鉄およびクロムなどの■■b族金属、銅などのtb族
金属の水溶性塩が単独でまたは混合して使用される。ま
た一旦鋼塩溶液で物理現像した後、塩化第一錫や硫酸錫
で置換メッキを行い錫ないし錫・銅系の金属層を得るこ
とも可能である。これらの中でも安全性、保存性を考慮
するとニッケル、銅、錫が好ましい。但し、蒸着と異な
り原料の純度、メッキ安定化剤などから少量の異種金属
やリン、イオウなどの元素が混入することはあり得るが
、特に光記録材料としての特性に影響を与えるものでは
ない。As the reducible metal salt, for example, water-soluble salts of group IIb metals such as nickel, cobalt, iron and chromium, and group Tb metals such as copper are used alone or in combination. It is also possible to obtain a tin or tin/copper metal layer by performing physical development with a steel salt solution and then performing displacement plating with stannous chloride or tin sulfate. Among these, nickel, copper, and tin are preferred in consideration of safety and preservability. However, unlike vapor deposition, small amounts of different metals and elements such as phosphorus and sulfur may be mixed in due to the purity of the raw materials, plating stabilizers, etc., but this does not particularly affect the properties as an optical recording material.
適当な水溶性の被還元性金属塩としては、具体的には以
下のものが用いられる。Specifically, the following are used as suitable water-soluble reducible metal salts.
塩化第一コバルト、ヨウ化第−コバルト、臭化第一鉄、
塩化第一鉄、臭化第ニクロム、ヨウ化第ニクロム、塩化
第二銅などの重金属ハライド;硫酸ニッケル、硫酸第一
鉄、硫酸第一コバルト、硫酸第ニクロム、硫酸第二銅な
どの重金属硫酸塩;硝酸ニッケル、硝酸第一鉄、硝酸第
一コバルト、硝酸第二りOム、硝酸第二銅などの重金属
硝酸塩;フェラスアセテート、コバルタスアセテート、
クロミックアセテート、キューブリックフォルメートな
どの金属の有機酸塩。Cobaltous chloride, cobaltous iodide, ferrous bromide,
Heavy metal halides such as ferrous chloride, nichrome bromide, nichrome iodide, cupric chloride; heavy metal sulfates such as nickel sulfate, ferrous sulfate, cobaltous sulfate, nichrome sulfate, cupric sulfate ; Heavy metal nitrates such as nickel nitrate, ferrous nitrate, cobaltous nitrate, ferrous nitrate, cupric nitrate; ferrus acetate, cobalt acetate,
Organic acid salts of metals such as chromic acetate and Kubrick formate.
これら被還元性重金属塩は物理現像液中にたとえば10
〜10(1/j!の量で含まれることが好ましい。These reducible heavy metal salts are contained in a physical developer solution, for example, 10
It is preferably included in an amount of ~10 (1/j!).
還元剤としては、たとえば次亜リン酸、次亜リン酸ナト
リウム、水素化ホウ素ナトリウム、ヒドラジン、ホルマ
リン、ジエチルアミンボラン、ジメチルアミンボラン、
トリメチルアミンボラン、ボラン、ジボラン、メチルジ
ボラン、ジボラザン、ボラぜン、ボラジン、t−ブチル
アミンボラザン、ピリジンボラン、2.6−ルヂジンボ
ラン、エチレンジアミンボラン、ヒドラジンジボラン、
ジメチルホスフィンボラン、フェニルホスフィンボラン
、ジメチルアルシンボラン、フェニルアルシンボラン、
ジメチルスチビンボラン、ジエチルスチビンボランなど
が使用できる。Examples of reducing agents include hypophosphorous acid, sodium hypophosphite, sodium borohydride, hydrazine, formalin, diethylamine borane, dimethylamine borane,
Trimethylamineborane, borane, diborane, methyldiborane, diborazane, borazane, borazine, t-butylamineborazane, pyridineborane, 2,6-luzidineborane, ethylenediamineborane, hydrazinediborane,
Dimethylphosphineborane, phenylphosphineborane, dimethylarsineborane, phenylarsineborane,
Dimethylstibine borane, diethylstibin borane, etc. can be used.
これらの還元剤は、物理現像液中に、たとえば0.1〜
5(1/jの量で用いられることが好ましい。These reducing agents are contained in the physical developer in an amount of, for example, 0.1 to
It is preferable to use an amount of 5(1/j).
物理現像液中には、前記した被還元性重金属塩の溶解に
より生成する重金属イオンが水酸化物として沈澱するの
を防止するために、たとえばモノカルボン酸、ジカルボ
ン酸、リンゴ酸、乳酸などのヒドロキシカルボン酸:コ
ハク酸、クエン酸、アスパラギン酸、グリコール酸、酒
石酸、エチレンジアミンテトラ酢酸、グルコン酸、糖酸
、キニン酸などの有様カルボン酸からなる錯塩化剤の一
種または二種以上を含ませることができる。これら錯塩
化剤は、物理現像液中にたとえば1〜’F:
100g/jの吊で用(゛られることが好まし°゛・ざ
らに、物理現像液には、現像液の保存性および操作性な
らびに得られる画像の質を改善するために、酸および塩
基などのpH調節剤、緩衝剤、防腐剤、増白剤、界面活
性剤などが常法に従い必要に応じて添加される。In order to prevent heavy metal ions generated by dissolving the above-mentioned reducible heavy metal salts from precipitating as hydroxides, hydroxyl acids such as monocarboxylic acids, dicarboxylic acids, malic acid, and lactic acid are added to the physical developer. Carboxylic acid: Contain one or more complexing agents consisting of specific carboxylic acids such as succinic acid, citric acid, aspartic acid, glycolic acid, tartaric acid, ethylenediaminetetraacetic acid, gluconic acid, sugar acid, and quinic acid. I can do it. These complex chloride forming agents are contained in the physical developer, for example, 1 to 'F:
100 g/j (preferably). In addition, the physical developer may contain acids, bases, etc. to improve the storage stability and operability of the developer and the quality of the resulting images. pH adjusters, buffers, preservatives, brighteners, surfactants, and the like are added as necessary according to conventional methods.
この添加剤のうち、アンモニア系でpHを上げると特に
感光材表面に光沢が得やすくなるため、pH調節剤とし
てアンモニウム塩またはアンモニウム塩とアンモニアと
からなるpH調節剤を用いることが特に好ましい。Among these additives, it is particularly preferable to use an ammonium salt or a pH adjuster consisting of an ammonium salt and ammonia as the pH adjuster, since increasing the pH with ammonia makes it easier to obtain gloss on the surface of the photosensitive material.
また、物理現像は、次亜リン酸ナトリウム還元剤を用い
た65℃から90℃の高温ニッケルメッキ浴または同メ
ッキ浴中で^速メッキ条件下で行ってもよい。この際得
られた画像を、たとえば塩15%またはr114I!の
5%の水溶液で5分間程度処理することにより光透過部
の透明樹脂を一部選択的に除去することもできる。Physical development may also be carried out in a high temperature nickel plating bath at 65° C. to 90° C. using a sodium hypophosphite reducing agent or under fast plating conditions in the same plating bath. The image obtained at this time is, for example, salt 15% or r114I! By treating with a 5% aqueous solution of for about 5 minutes, it is also possible to selectively remove a portion of the transparent resin in the light transmitting portion.
また、感光材としては、上述のような透明樹脂、現像抑
制剤、金属錯化合物なたは金属化合物からなる系のほか
に、(イ)ハロゲン化銀、ドライシ jルバー(
登録商標)などの有機銀塩に代表される銀塩系材料、(
ロ)ジアゾニウム塩とカプラーとの組合せ系、(ハ)カ
ルバ−フィルム(登録商標)、PDプロセス(登録商標
)材料などに代表されるジアゾ系材料、(ニ)アクリル
モノマー、ポリビニルケイ皮酸などに代表される光重合
型光橋かけ型のフォトポリマー系材料(ホ)トナー像を
形成するCdS、Zr)O、ポリビニルカルバゾールな
どの電子写真感光体あるいはその転写体、(へ)、フロ
スト像を形成するサーモプラスチックス電子写真感光体
などの電子写真系材料、(ト)ロイコ染料と四臭化炭素
との組合せ系、(チ)ダイラックス(登録商標)コバル
ト錯体とロイコ染料との組合せ系、(す)シュウ酸第二
酸と鉄塩との組合せ系、(ヌ)スビOビラン、モリブデ
ンタングステン化合物などの顔料または色素の画像を形
成する材料などが用いられうる。In addition to the above-mentioned systems consisting of transparent resins, development inhibitors, and metal complexes or metal compounds, photosensitive materials include (a) silver halide, dry silver (
Silver salt materials represented by organic silver salts such as (registered trademark),
(b) combination systems of diazonium salts and couplers, (c) diazo materials such as Carba Film (registered trademark) and PD process (registered trademark) materials, (d) acrylic monomers, polyvinyl cinnamic acid, etc. Typical photopolymerizable and crosslinked photopolymer materials (e) Electrophotographic photoreceptors such as CdS, Zr)O, and polyvinylcarbazole that form toner images, or their transfer bodies, (f), that form frost images electrophotographic materials such as thermoplastic electrophotographic photoreceptors, (th) combination systems of leuco dye and carbon tetrabromide, (h) combination systems of Dylux (registered trademark) cobalt complex and leuco dye, ( Materials that form images of pigments or dyes, such as a combination system of oxalic acid secondary acid and iron salts, (nu) subiobiran, molybdenum tungsten compounds, etc., can be used.
上記の感光材のうち、ある種のものは露光部が遮光性と
なり未露光部が光透過性であるが、またある種のものは
露光部が光透過性となり未露光部が遮光性である。いず
れにしても露光した侵に必要に応じて現像することによ
って、光透過部分と遮光部分とからなる記録を行ないう
るような感光材であれば使用できる。Among the above-mentioned photosensitive materials, some types have light-shielding properties in exposed areas and light-transmitting properties in unexposed areas, while others have light-transmitting properties in exposed areas and light-blocking properties in unexposed areas. . In any case, any photosensitive material can be used as long as it is possible to perform recording consisting of a light-transmitting area and a light-blocking area by developing the exposed material as required.
このような感光材への照射光としては、紫外線、可視光
線、赤外線、X線、電子線などが用いられうる。As the light for irradiating such a photosensitive material, ultraviolet rays, visible light, infrared rays, X-rays, electron beams, etc. can be used.
次に、上記のようにして形成された、光透過部7および
遮光部8とからなる第1記録層9上に、反射性金属薄1
11層からなる第2記録E10を形成する。Next, a reflective metal thin film 1 is placed on the first recording layer 9 formed as described above and consisting of the light transmitting part 7 and the light shielding part 8.
A second recording E10 consisting of 11 layers is formed.
反射性金属薄膜層は、Cr1Ti、Fe、Go。The reflective metal thin film layer is Cr1Ti, Fe, Go.
N i 、Cu、 八〇、Au、Ge、AJ 、Mg、
Sb、Te、Pb1Pd、Cd、B i、Sn、Se、
In、Ga、Rhなどの金属を単独もしくは2種以上組
合せて用いて形成される。Ni, Cu, 80, Au, Ge, AJ, Mg,
Sb, Te, Pb1Pd, Cd, Bi, Sn, Se,
It is formed using metals such as In, Ga, Rh, etc. alone or in combination of two or more.
反射性金属薄膜層からなる第2記録l510に情報をエ
ネルギービームの照射により書込む場合には、低融点金
属であるTe1Zn、Pb1Cd。When information is written on the second recording layer 510 made of a reflective metal thin film layer by irradiation with an energy beam, low melting point metals such as Te1Zn and Pb1Cd are used.
B i、3n、3e、In1Ga、Rbなどの金属を主
成分として反射性金属薄膜を構成することが好ましく、
特にTe −3e、Te −Se −Pb。It is preferable that the reflective metal thin film is composed mainly of metals such as Bi, 3n, 3e, In1Ga, and Rb,
Especially Te-3e, Te-Se-Pb.
Te−Pb、Te−3n−8,5n−Cu、Te−Cu
、Te−Cu−Pbなトノ合金が好マシイ。Te-Pb, Te-3n-8,5n-Cu, Te-Cu
, Te-Cu-Pb alloy is better.
さらにこれらの合金のうち、5〜40原子数パーセント
のCuを含むTe −Cu合金あるいは5〜40原子数
パーセントのCUおよびCuに対して1〜50原子数パ
ーセントのpbを含むTe−Cu −Pb合金が、読出
し用照射エネルギービームの波長を65On1以上とす
る場合に特に好ましい。これらの合金からなる反射性金
属薄膜層を第2記録層として用いると、外周部での乱れ
が少ない記録ビットが得られ、しかも読出し用照射エネ
ルギービームの波長が6500n以上特に700〜90
0 rvである場合に、記録部であるビットにおける反
射率と未記録部である金a簿膜における反射率すなわち
相対反射率が小さいという優れた情報読出し特性を有す
る反射性金属薄膜が得られる。Further, among these alloys, a Te-Cu alloy containing 5 to 40 atomic percent Cu or a Te-Cu -Pb alloy containing 5 to 40 atomic percent CU and 1 to 50 atomic percent PB to Cu. The alloy is particularly preferred when the wavelength of the readout irradiation energy beam is 65On1 or more. When a reflective metal thin film layer made of these alloys is used as the second recording layer, recorded bits with less disturbance at the outer periphery can be obtained, and the wavelength of the readout irradiation energy beam is 6500 nm or more, especially 700 to 90 nm.
In the case of 0 rv, a reflective metal thin film can be obtained which has excellent information read characteristics such that the reflectance at the bits, which are recorded parts, and the reflectance, that is, the relative reflectance, at the bits, which are unrecorded parts, are small.
さらに1〜40原子数パーセントのCuを含む’Fl
3 n −(:、 u合金を用いると記録ビッ
ト形状の外周部の乱れが少なく、かつ毒性の低い反射性
金属薄膜が得られる。Furthermore, 'Fl containing 1 to 40 atomic percent Cu
When the 3n-(:, u alloy is used, a reflective metal thin film with less disturbance in the outer periphery of the recording bit shape and low toxicity can be obtained.
反射性金属薄11層からなる第2記録層10に情報を書
込まずに単に反射層として使用する場合には、AN、N
i、AQ、八りなトノ特に光磁tJI 性に優れた金属
あるいは合金により反射性金属薄膜層を形成することが
好ましい。When the second recording layer 10 consisting of 11 reflective metal thin layers is used simply as a reflective layer without writing information, AN, N
It is preferable to form the reflective metal thin film layer from a metal or an alloy having excellent magneto-optical properties.
このような反射性金filll1層を第1記録層上に形
成するには、上記のような金属あるいは合金を準備し、
これをスパッタリング法、真空蒸着法、イオンブレーテ
ィング法、電気メツキ法などの従来既知の方法によって
第1記録層上に成膜すればよい。この反射性金属薄膜層
の膜厚は、200〜1000Aであることが好ましい。In order to form such a reflective gold fill layer on the first recording layer, the above metal or alloy is prepared,
This may be formed on the first recording layer by a conventionally known method such as a sputtering method, a vacuum evaporation method, an ion blating method, or an electroplating method. The thickness of this reflective metal thin film layer is preferably 200 to 1000 Å.
場合によっては、上記金属からなる多層膜たとえばin
膜とTe1llとの多層膜も反射性金属l膜として用い
られる。また、上記金属と有機化合物または無機酸化物
との複合物たとえばTe−CH4、Te−C32,Te
−スチレン、S n −S O2、G e 5−8n、
5nS−8などの′7a膜あるいは5i02/T i
/S i 02 /AJなどの多層膜も反射性金属l膜
として用いられうる。In some cases, a multilayer film made of the above metals, such as an in
A multilayer film of a film and a Te1ll film can also be used as a reflective metal film. In addition, composites of the above metals and organic compounds or inorganic oxides such as Te-CH4, Te-C32, Te
-Styrene, S n -S O2, Ge 5-8n,
'7a film such as 5nS-8 or 5i02/T i
A multilayer film such as /S i 02 /AJ can also be used as the reflective metal film.
さらに、シアニンなどの色素を凝集させて光反射性を与
えた薄膜、ニトロセルロース、ポリスチレン、ポリエチ
レンなどの熱可塑性樹脂中に色素または銀などの金属粒
子を分散させたもの、あるいはこの熱可塑性樹脂の表面
に色素または金属粒子を擬集させたものなどが反射性金
属1M9として用いられつる。In addition, there are thin films made by aggregating pigments such as cyanine to give light reflectivity, films in which pigments or metal particles such as silver are dispersed in thermoplastic resins such as nitrocellulose, polystyrene, and polyethylene, or films made from thermoplastic resins such as pigments or metal particles such as silver. A reflective metal 1M9 having pigments or metal particles aggregated on its surface is used.
さらにまた、エネルギービームの照射により相転移が生
じてその反射率が変化する、10M化物、5bPa化物
、Mail化物、Gel!化物、■酸化物、Sm酸化物
、あるいはTe酸化物−Ge、Te−8nなどの化合物
が、反射性金属薄膜として用いられうる。Furthermore, 10M compounds, 5bPa compounds, Mail compounds, and Gel! compounds whose reflectance changes due to phase transition caused by irradiation with energy beams! Compounds such as oxide, oxide, Sm oxide, Te oxide-Ge, and Te-8n can be used as the reflective metal thin film.
また、カルコーゲンあるいは発色型のMoO2−Cu1
Mob3−8n−Cuが反射性金FKii[膜として用
いられ、場合によっては泡形成型の有機薄膜と金属Ml
!l!lとの多層体も反射性金属薄膜として用いられつ
る。 。In addition, chalcogen or colored MoO2-Cu1
Mob3-8n-Cu was used as a reflective gold FKii film, and in some cases a bubble-forming organic thin film and metal Ml
! l! Multilayer bodies with 1 and 1 are also used as reflective metal thin films. .
ざらに光磁記録材料であるGdCo、TbCo、GdF
e、oyFe、GdTbFe。GdCo, TbCo, GdF, which are magneto-optical recording materials
e, oyFe, GdTbFe.
GdFeB i、TbDyFelMnCuB i。GdFeB i, TbDyFelMnCuB i.
Cr O2B i S m E r G d I G
1GdB iGa IG、GdBFaB i IGなど
も反射性金属i#膜として用いられうる。Cr O2B i S m E r G d I G
1GdB iGa IG, GdBFaB i IG, etc. can also be used as the reflective metal i# film.
上記のような各種のタイプの反射性金属薄膜を組合せて
用いることも可能である。It is also possible to use a combination of various types of reflective metal thin films as described above.
次にIC記録wI4について説明する。IC記録部4は
、ICチップならびに配線回路を含めた電気的要素が一
体化されてなるICモジュールからなり、このICモジ
ュールはカード基材2に埋設されている。そしてICモ
ジュールの外部電源との接続用電極は、カード表面に設
けられている。Next, the IC record wI4 will be explained. The IC recording section 4 is composed of an IC module in which electric elements including an IC chip and a wiring circuit are integrated, and this IC module is embedded in the card base material 2. Electrodes for connecting the IC module to an external power source are provided on the card surface.
ICモジュールをカード基材2に埋設するには、カード
基材2にICモジュールが埋設されるのに適当な凹部を
くり抜き、この凹部にICモジュールを嵌め込んだ後に
両者を接着すればよい。In order to embed the IC module in the card base material 2, a recess suitable for embedding the IC module is cut out in the card base material 2, the IC module is fitted into the recess, and then both are bonded.
なお、このICモジュールの構造およびカード基材への
埋設方法は、従来知られている。Note that the structure of this IC module and the method of embedding it in the card base material are conventionally known.
本発明に係る情報カードは1は、上述のように光記録部
3およびIC記録部4とを有しており、この情報カード
においては、たとえば印鑑パターン、指紋、顔写真、声
紋暗証番号などの変更を要しない事項は光記録部3に記
録され、また預金総額、預金列^、利用履歴などの刻々
に変化したり変更を要する事項はIC記録部4に記録さ
れる。The information card 1 according to the present invention has the optical recording section 3 and the IC recording section 4 as described above, and in this information card, for example, a seal pattern, a fingerprint, a facial photograph, a voiceprint PIN number, etc. can be recorded. Items that do not require changes are recorded in the optical recording section 3, and items that change from moment to moment or require changes, such as the total deposit amount, deposit row, and usage history, are recorded in the IC recording section 4.
(発明の効果)
本発明に係る情報カードは、光記録部とIC記録部とを
有しているので、以下のような効果が得られる。(Effects of the Invention) Since the information card according to the present invention has an optical recording section and an IC recording section, the following effects can be obtained.
(a) !l気カードと比較して、はるかに高密度記
録が可能である。(a)! Much higher density recording is possible than with standard cards.
(b) 変更を要しない事項は光記録部に記録されて
いるため、この記録の改憲が著しく困難であり、安全性
が高い。(b) Matters that do not require change are recorded in the optical recording section, making it extremely difficult to amend this record and ensuring high security.
(C) 刻々に変化したり変更を要する事項はIC記
録部に記録されているため、情報カードとして極めて多
くの情報が記録できる。(C) Since items that change from moment to moment or require changes are recorded in the IC recording section, an extremely large amount of information can be recorded as an information card.
+)′4.□、@。□
第1図は本発明に係る情報カードの断面図であり、第2
図は本発明に係る情報カードに用いられる光記録部の1
例の断面図である。+)'4. □, @. □ Figure 1 is a sectional view of the information card according to the present invention, and Figure 2 is a cross-sectional view of the information card according to the present invention.
The figure shows one of the optical recording parts used in the information card according to the present invention.
FIG. 3 is an example cross-sectional view.
1・・・情報カーk、2・・・カード基材、3・・・光
記録部、4・・・IC記録部DESCRIPTION OF SYMBOLS 1... Information car k, 2... Card base material, 3... Optical recording part, 4... IC recording part
Claims (1)
しない情報は光記録部に記録され、記録内容に変更を要
する情報はIC記録部に記録されることを特徴とする情
報カード。1. An information card comprising an optical recording section and an IC recording section, wherein information that does not require a change in recorded content is recorded on the optical recording section, and information that requires a change in recorded content is recorded on the IC recording section.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59224866A JPS61103287A (en) | 1984-10-25 | 1984-10-25 | Information card |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59224866A JPS61103287A (en) | 1984-10-25 | 1984-10-25 | Information card |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5233356A Division JPH06342485A (en) | 1993-09-20 | 1993-09-20 | Information card |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61103287A true JPS61103287A (en) | 1986-05-21 |
Family
ID=16820392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59224866A Pending JPS61103287A (en) | 1984-10-25 | 1984-10-25 | Information card |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61103287A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62279531A (en) * | 1986-05-28 | 1987-12-04 | Hitachi Ltd | Memory card and its reading and writing device |
JPS62282991A (en) * | 1986-05-31 | 1987-12-08 | 三菱電機株式会社 | Card system |
JPS6316172U (en) * | 1986-07-15 | 1988-02-02 | ||
US5332890A (en) * | 1991-08-08 | 1994-07-26 | Olympus Optical Co., Ltd. | Hybrid card and its recording/reproducing apparatus |
US5744792A (en) * | 1993-10-05 | 1998-04-28 | Canon Kabushiki Kaisha | Hybrid information recording medium |
US5821515A (en) * | 1995-08-09 | 1998-10-13 | Olympus Optical Co., Ltd. | Information recording and reproducing apparatus |
US6098889A (en) * | 1996-10-09 | 2000-08-08 | Canon Kabushiki Kaisha | Hybrid information recording medium with masking layer |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59109397A (en) * | 1982-11-26 | 1984-06-25 | ブラウン・ボバリ・ウント・シ−・アクチエンゲゼルシヤフト | How to improve security against counterfeiting of identification cards |
JPS59120497A (en) * | 1982-12-28 | 1984-07-12 | 大日本印刷株式会社 | Card and method of deciding truth or falsehood of card |
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1984
- 1984-10-25 JP JP59224866A patent/JPS61103287A/en active Pending
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59109397A (en) * | 1982-11-26 | 1984-06-25 | ブラウン・ボバリ・ウント・シ−・アクチエンゲゼルシヤフト | How to improve security against counterfeiting of identification cards |
JPS59120497A (en) * | 1982-12-28 | 1984-07-12 | 大日本印刷株式会社 | Card and method of deciding truth or falsehood of card |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62279531A (en) * | 1986-05-28 | 1987-12-04 | Hitachi Ltd | Memory card and its reading and writing device |
JPS62282991A (en) * | 1986-05-31 | 1987-12-08 | 三菱電機株式会社 | Card system |
JPS6316172U (en) * | 1986-07-15 | 1988-02-02 | ||
US5332890A (en) * | 1991-08-08 | 1994-07-26 | Olympus Optical Co., Ltd. | Hybrid card and its recording/reproducing apparatus |
US5514856A (en) * | 1991-08-08 | 1996-05-07 | Olympus Optical Co., Ltd. | Hybrid card having IC chip and optical/magnetic recording region thereon |
US5744792A (en) * | 1993-10-05 | 1998-04-28 | Canon Kabushiki Kaisha | Hybrid information recording medium |
US5821515A (en) * | 1995-08-09 | 1998-10-13 | Olympus Optical Co., Ltd. | Information recording and reproducing apparatus |
US6098889A (en) * | 1996-10-09 | 2000-08-08 | Canon Kabushiki Kaisha | Hybrid information recording medium with masking layer |
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