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JPS6074880A - Solid-state image pickup device - Google Patents

Solid-state image pickup device

Info

Publication number
JPS6074880A
JPS6074880A JP58182871A JP18287183A JPS6074880A JP S6074880 A JPS6074880 A JP S6074880A JP 58182871 A JP58182871 A JP 58182871A JP 18287183 A JP18287183 A JP 18287183A JP S6074880 A JPS6074880 A JP S6074880A
Authority
JP
Japan
Prior art keywords
semiconductor
solid
signal processing
semiconductor chip
imaging device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58182871A
Other languages
Japanese (ja)
Other versions
JPH0525228B2 (en
Inventor
Isao Hirozawa
広沢 勲
Hiroaki Kubokawa
窪川 広昭
Masahiro Kawashima
川嶋 正博
Koji Kanbara
神原 浩司
Ichiji Ohashi
大橋 一司
Hiroyuki Yashima
八嶋 弘幸
Mototsugu Ogawa
小川 元嗣
Hiroyoshi Fujimori
弘善 藤森
Hidetoshi Yamada
秀俊 山田
Masaru Iino
飯野 勝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp, Olympus Optical Co Ltd filed Critical Olympus Corp
Priority to JP58182871A priority Critical patent/JPS6074880A/en
Publication of JPS6074880A publication Critical patent/JPS6074880A/en
Publication of JPH0525228B2 publication Critical patent/JPH0525228B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/15Charge-coupled device [CCD] image sensors
    • H10F39/158Charge-coupled device [CCD] image sensors having arrangements for blooming suppression
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Instruments For Viewing The Inside Of Hollow Bodies (AREA)
  • Endoscopes (AREA)

Abstract

PURPOSE:To improve both packing density and image resolution of a solid-state image pickup device with a compact design by forming a conductor on the side surface of a semiconductor chip to secure the connection between a photodetecting semiconductor element and a signal processing circuit element. CONSTITUTION:A photodetecting semiconductor area 31a and a signal processing semiconductor area 31b are formed on both sides of a single semiconductor chip 31. The area 31a includes a charge coupled semiconductor element such as a CCD, etc. and a semiconductor image pickup element like an MOS transistor array, etc. At the same time, a color filter film is formed on the surface of the area 31a. Then an area 32 is connected to an area 33 by a conductor 34 formed by vapor-depositing a metal on the side surface of the chip 31 in order to perform transfer of signals between the areas 31a and 31b.

Description

【発明の詳細な説明】 技 術 分 野 本発明は固体撮像装置、特に体腔内部や機械的構造体内
部を観察するための内視鏡に内蔵して使用するのに好適
な固体撮像装置に関するものである。
[Detailed Description of the Invention] Technical Field The present invention relates to a solid-state imaging device, and particularly to a solid-state imaging device suitable for being incorporated into an endoscope for observing the inside of a body cavity or a mechanical structure. be.

従 来 技 術 従来の内視鏡は、被検体内部に挿入される可撓性外筒の
内部にオプチカルファイバ束より成るライトガイドとイ
メージガイドとを延在ぎせ、外部に設けた照明光源から
放射される光をライトガイドを経て内視鏡先端まで導き
、照明レンズ系を経て被検体に照射し、被検体の像を対
物レンズ系およびイメージガイドを経て外部へ導き、接
眼レンズ系を介して直接観察するかまたは撮像装置で撮
像してモニタ上に表示するようにしている。このような
イメージガイドを用いた従来の内視鏡における分解能は
イメージガイドを構成するファイバの径できまるが、フ
ァイバ径を現状よりもざらに細くするには非常に困難で
あり、分解能はほぼ限界に達している。また、イメージ
ガイドは破損し易いので耐久性の点でも問題がある。
Conventional technology A conventional endoscope has a light guide and an image guide made of an optical fiber bundle extending inside a flexible outer tube that is inserted into a subject, and emits light from an external illumination source. The light is guided through the light guide to the tip of the endoscope, and is irradiated onto the subject through the illumination lens system.The image of the subject is guided to the outside via the objective lens system and image guide, and then directly through the eyepiece system. They are either observed or captured with an imaging device and displayed on a monitor. The resolution of conventional endoscopes using such image guides is determined by the diameter of the fibers that make up the image guide, but it is extremely difficult to make the fiber diameter even thinner than it currently is, and the resolution is almost at its limit. has reached. Furthermore, since the image guide is easily damaged, there is also a problem in terms of durability.

このような問題を解決するために、内視鏡先端に小形の
撮像装置を組込み、これによって被検体像を撮像して画
像信号に変換し、この画像信号を導線を経て外部へ導き
、モニタ上に被検体像を表示することが提案されている
。撮像装置としてはOCD 、 BBD 、 MOS 
−FET ARRAY、PIN −PH0TODIOD
EARRAY 、 SIT ARRAYなどの半導体固
体撮像装着が開発されており、これらの固体撮像装置は
小形でありながら分解能が高く、シかも寿命も長いとい
う特長を有しており、内視鏡に内蔵するのに好適である
。しかしながら、現在製造されている固体撮像装置は従
来の撮像管に比べれば小形ではあるが、現状のままでは
内視鏡先端に内蔵することは困難である。特に体腔内観
察用の内視鏡は最も大径の直腸鏡でも直径は十数ミリ程
度であり、現状の固体撮像装置を組込むことはできない
。このような問題は内視鏡だけに限られるものではなく
、他の撮像機器においても生ずる可能性がある。
In order to solve these problems, a small imaging device is built into the tip of the endoscope, which captures the image of the subject and converts it into an image signal.This image signal is led to the outside via a conductor and displayed on a monitor. It has been proposed to display the image of the subject. Imaging devices include OCD, BBD, MOS
-FET ARRAY, PIN -PH0TODIOD
Semiconductor solid-state imaging devices such as EARRAY and SIT ARRAY have been developed, and these solid-state imaging devices are small, have high resolution, and have a long lifespan. suitable for However, although currently manufactured solid-state imaging devices are smaller than conventional imaging tubes, it is difficult to incorporate them into the tip of an endoscope as is. In particular, endoscopes for observing inside body cavities, even the largest diameter rectoscope, have a diameter of about 10-odd millimeters, and cannot incorporate current solid-state imaging devices. Such problems are not limited to endoscopes, and may also occur in other imaging devices.

半導体固体撮像装置Rを構成する光検出半導体素子から
の検出信号は微弱であるので一般に素子単独で用いられ
るより、検出信号を増幅する増幅回路等を構成する信号
処理回路素子と共に実装した半導体撮像装置が多用され
つつある。この場合、光検出半導体素子と信号処理回路
素子とを単一の半導体チップ内に構成する場合と、複数
個の半導体チップ内に構成する場合とがある。第1図は
従来の固体撮像装置の一例の構成を示しものであり、第
1図に示す例ではパックージを構成するセラミック基板
1上に1枚の半導体チップ2を設け、その左側の部分2
LにOOD t、 BBD等の電荷転送素子。
Since the detection signal from the photodetecting semiconductor element that constitutes the semiconductor solid-state imaging device R is weak, generally the semiconductor imaging device is mounted with a signal processing circuit element that constitutes an amplifier circuit that amplifies the detection signal, rather than using the element alone. is becoming more widely used. In this case, the photodetector semiconductor element and the signal processing circuit element may be configured in a single semiconductor chip or in multiple semiconductor chips. FIG. 1 shows the configuration of an example of a conventional solid-state imaging device. In the example shown in FIG.
Charge transfer elements such as OOD t and BBD are connected to L.

MOS )ランジスタウフォトダイオード、フォトトラ
ンジスタ、静電島導トランジスタ等の光検出半導体素子
を形成し、右側の部分2Rには水平、垂直シフトレジス
タ、アドレスレジスタ、各種の選択孔インチ、ビデオラ
インに接続された負荷抵抗。
MOS) Photodetection semiconductor elements such as Langistau photodiodes, phototransistors, and electrostatic conductive transistors are formed, and the right part 2R is connected to horizontal and vertical shift registers, address registers, various selection holes, and video lines. load resistance.

コンデンサ、アンプ等を構成する信号処理回路素子を形
成する。この信号処理回路素子を形成した部分2Rの上
[は遮光膜または遮光板8が設けられており、透明ガラ
スキャップ4を経て照射される光によって半導体内に発
生する亀子−正孔対に起因する微少隠流による悪影響が
信号処理回路に及ぶことを防いでいる。
Signal processing circuit elements constituting capacitors, amplifiers, etc. are formed. A light-shielding film or a light-shielding plate 8 is provided above the portion 2R where the signal processing circuit element is formed. This prevents the negative effects of minute hidden currents from reaching the signal processing circuit.

光検出半導体素子と信号処理回路素子との間での信号の
授受は半導体領域または導体パターンを介して行ない、
信号処理半導体領域からの出力信号や外部回路からの制
御信号等の授受は、リード5、セラミック基板1に設け
られたボンディングバット6および導線7を介して行な
われている。
Signals are exchanged between the photodetecting semiconductor element and the signal processing circuit element via a semiconductor region or a conductive pattern,
Output signals from the signal processing semiconductor region, control signals from external circuits, etc. are exchanged via leads 5, bonding bats 6 provided on ceramic substrate 1, and conductive wires 7.

このような構成の固体撮像装置では光検出半導体素子と
信号処理回路素子とを単一の半導体チップI内に形成で
きるので、これらを別々の半導体チップに形成する場合
に比べて小形とすることができるが、内視鏡の先端に内
蔵することができる程小形ではない。また、信号処理回
路内の増幅回路等で発生する熱が光検出半導体素子に伝
達され、暗電流が増大し、また光検出領域に入射した光
によって発生したキャリア電荷が増幅回路やその周辺回
路に拡散し誤動作の原因とな(。ざらに大きな問題点そ
して光検出半導体素子と信号処理回路素子とを単一の半
導体チップ上に構成するので、特性およびチップ製造プ
ロセスの合わせ込みの困11’2!に起因するコストア
ップが生ずる。
In a solid-state imaging device with such a configuration, the photodetection semiconductor element and the signal processing circuit element can be formed in a single semiconductor chip I, so the size can be made smaller than when these are formed in separate semiconductor chips. However, it is not small enough to be built into the tip of an endoscope. In addition, heat generated in the amplifier circuit, etc. in the signal processing circuit is transferred to the photodetection semiconductor element, increasing dark current, and carrier charges generated by light incident on the photodetection area are transferred to the amplifier circuit and its peripheral circuits. This is a major problem, and since the photodetector semiconductor element and the signal processing circuit element are configured on a single semiconductor chip, it is difficult to match the characteristics and the chip manufacturing process. !There will be an increase in costs.

技術的背景 上述したような問題を解決するために、本願人は特願昭
58−46967号において第2図に示すようなバック
接合と呼ばれる実装方法を提案している。第2図におい
て、光検出半導体素子は上側の半導体チップ11に形成
し、信号処理回路素子は下側の半導体チップ]2に形成
し、これらチップは絶縁性のホルダ18と一体に形成し
た隔壁14により離間されて支持されている。光検出半
導体素子と信号処理回路素子との間の信号の授受を行な
うために半導体チップ11および12の表面に形成した
接点パッド15および16を導線】7および18を介し
てホルダ】8の表裏に設けた接点パッド】9および20
にそれぞれ接続し、ざらにこれらの接点パッド19と2
0との間をホルダ18の側面を延在するリード21によ
り接続してし)る。
Technical Background In order to solve the above-mentioned problems, the applicant has proposed a mounting method called back bonding as shown in FIG. 2 in Japanese Patent Application No. 58-46967. In FIG. 2, the photodetecting semiconductor element is formed on the upper semiconductor chip 11, the signal processing circuit element is formed on the lower semiconductor chip 2, and these chips are integrated with the insulating holder 18 into the partition wall 14. are supported and spaced apart by. Contact pads 15 and 16 formed on the surfaces of semiconductor chips 11 and 12 are connected to the front and back sides of holder 8 via conductive wires 7 and 18 for transmitting and receiving signals between the photodetector semiconductor element and the signal processing circuit element. Contact pads provided】9 and 20
Roughly connect these contact pads 19 and 2 to
0 by a lead 21 extending from the side surface of the holder 18).

ざらに固体撮像装置を外部回路に接続するためのリード
22をホルダ】8から延在させている。実際の固体撮像
装置においては、第2図に示す全体をざらにパッケージ
に収納しているが、第2図ではパッケージは図示してい
ない。
A lead 22 for connecting the solid-state imaging device to an external circuit extends from the holder ]8. In an actual solid-state imaging device, the entire structure shown in FIG. 2 is roughly housed in a package, but the package is not shown in FIG.

第2図に示したバック接合構造では光検出半導体素子を
形成した半導体チップ11と信号処理回路素子を形成し
た半導体チップ12とは別体となっていると共に隔壁1
4を挟んで上下に重ねられているため入射光側から見た
面積は第1図に示した従来の固体撮像装置に比べて小さ
くなっていると共に熱の影響やキャリア電荷の拡散の問
題は解消されているが、そのままでは内視鏡失地に組込
むことは実際上不可能である。すなわち、内視鏡の径は
非常に小さく、固体撮像装置を組込むだけの十分なスペ
ースが得られない。例えば体腔内観察用の内視鏡では上
述したライトガイドの他に標本を採取するための鉗子お
よびこれを操作するためのワイヤが挿通されるようにな
っていると共に1対物レンズ系の先頭レンズを洗浄する
ための送水チューブや、先頭レンズに付着した洗浄水を
吹き飛ばしたり体腔を膨らませたりする送気チューブな
ども挿通されており、固体撮像装置を内蔵するために利
用できるスペースは非常に狭くなっている。したがって
高解像度の固体撮像装置を内視鏡先端のようにきわめて
狭い空間に組込むためには1.。
In the back junction structure shown in FIG.
4 are stacked one on top of the other with 4 in between, so the area seen from the incident light side is smaller than that of the conventional solid-state imaging device shown in Figure 1, and the problems of heat effects and carrier charge diffusion are solved. However, it is practically impossible to incorporate it into the endoscope as it is. That is, the diameter of the endoscope is very small, and there is not enough space to incorporate the solid-state imaging device. For example, in an endoscope for observing inside body cavities, in addition to the above-mentioned light guide, forceps for collecting specimens and wires for operating them are inserted, and the leading lens of a single objective lens system is inserted. A water supply tube for cleaning and an air supply tube for blowing off the cleaning water adhering to the leading lens and inflating the body cavity are also inserted, and the space available for housing the solid-state imaging device is extremely limited. There is. Therefore, in order to incorporate a high-resolution solid-state imaging device into an extremely narrow space such as the tip of an endoscope, there are 1. .

固体撮像素子自体の構成を改良する必要があるが、光検
出半導体チップと信号処理半導体チップとの結合と配置
、両生導体チップ間の信号ラインの結合、パッケージの
方法、リードの導出方法など種々の困11な問題を解決
しなければならない。
It is necessary to improve the structure of the solid-state image sensor itself, but there are various issues such as the coupling and arrangement of the photodetector semiconductor chip and the signal processing semiconductor chip, the coupling of signal lines between the bidirectional conductor chips, the packaging method, and the method of leading out the leads. We have to solve 11 difficult problems.

本発明の目的は、上述した従来の欠点を除去し、小形に
構成することができしかも実装密度を向上して解像度を
上げることができ、きわめて小径の内視鏡先端にも組込
むことができ、特に内視鏡先端に組込むのに好適な固体
撮像装置を提供しようとするものである。
The object of the present invention is to eliminate the above-mentioned conventional drawbacks, to be able to have a compact structure, to improve the packaging density and increase the resolution, and to be able to be incorporated into an endoscope tip with an extremely small diameter. In particular, the present invention aims to provide a solid-state imaging device suitable for being incorporated into the tip of an endoscope.

本発明による固体撮像装置は、光検出半導体素子および
信号処理回路素子を入射光の方向から見て前後に形成し
た少なく共1個の半導体チップの側面に、光検出半導体
素子と信号処理回路素子との間の相互接続を行なう導体
を形成したことを特徴とするものである。
The solid-state imaging device according to the present invention has a photodetecting semiconductor element and a signal processing circuit element formed on the side surface of at least one semiconductor chip, in which the photodetecting semiconductor element and the signal processing circuit element are formed on the front and rear sides when viewed from the direction of incident light. It is characterized by forming a conductor for interconnection between the two.

実施例 以下、図面を参照して本発明の詳細な説明する。Example Hereinafter, the present invention will be described in detail with reference to the drawings.

第8図は本発明の固体撮像装置の一実施例の構成を示す
線図である。本例では単一の半導体チップ8〕の表裏に
光検出半導体領域81aと、信号処理半導体領域81b
とを構成し、光検出半導体領域81aにはCOD、BB
D等の電荷結合半導体素子。
FIG. 8 is a diagram showing the configuration of an embodiment of the solid-state imaging device of the present invention. In this example, a photodetecting semiconductor region 81a and a signal processing semiconductor region 81b are provided on the front and back sides of a single semiconductor chip 8.
The photodetecting semiconductor region 81a includes COD, BB.
Charge-coupled semiconductor devices such as D.

MOS )ランジスタアレイ、ピンフォトダイオードア
レイ、フォトトランジスタアレイ、ewi導トランジス
タアレイなどの半導体撮像素子を形成すると共に表面に
は絶縁膜を介してモザイク状色フィルタ膜を形成するが
、これら素子の各領域や、絶縁膜9色フィルタ膜などの
図示は省略する。また、信号処理半導体領域81bには
水平、垂直シフトレジスタ、増幅回路、スイッチなどを
構成する半導体素子や、負荷抵抗、コンデンサなどの受
動素子を形成するが、これらの図示も省略する。本発明
においては、光検出半導体領域81aと信号処理半導体
領域81bとの間で信号の授受を行なうために、これら
領域の表面に形成された領域82および33の間を半導
体チップ81の側面に金属の蒸着により形成した導体8
4により接続する。また、半導体チップ81の裏面には
固体撮像装置と外部回路との間で信号の授受を行なうた
めのり一ド35を固着する。本発明では光検出半導体素
子と信号処理回路素子との間の接続を、半導体チップ(
IIII面に被着した導体によって行なうことにより、
固体撮像装置の入射光側から見た寸法を小ざくすること
かできる。また、半導体チップの裏面全体をリードの接
続に利用することができるので多数のリードを容易に接
続することができる。
MOS) Semiconductor imaging devices such as transistor arrays, pin photodiode arrays, phototransistor arrays, and EWI transistor arrays are formed, and a mosaic color filter film is formed on the surface with an insulating film interposed therebetween. , an insulating film, a nine-color filter film, and the like are omitted. Furthermore, although semiconductor elements constituting horizontal and vertical shift registers, amplifier circuits, switches, etc., and passive elements such as load resistors and capacitors are formed in the signal processing semiconductor region 81b, illustration thereof is also omitted. In the present invention, in order to transmit and receive signals between the photodetection semiconductor region 81a and the signal processing semiconductor region 81b, a metal layer is provided on the side surface of the semiconductor chip 81 between the regions 82 and 33 formed on the surface of these regions. A conductor 8 formed by vapor deposition of
Connect by 4. Furthermore, a glue 35 is fixed to the back surface of the semiconductor chip 81 for transmitting and receiving signals between the solid-state imaging device and an external circuit. In the present invention, the connection between the photodetection semiconductor element and the signal processing circuit element is made on a semiconductor chip (
By using a conductor attached to the III surface,
The dimensions of the solid-state imaging device viewed from the incident light side can be made smaller. Further, since the entire back surface of the semiconductor chip can be used for connecting leads, a large number of leads can be easily connected.

第4図は本発明の固体N像装置の他の同を示す線図的断
面図である。本例では半導体チップ41の領域4Ia内
に光検出半導体素子を形成し、半導体チップ42の領域
42a内に信号処理回路素子を形成する。これら半導体
チップ41および42を適当な厚ざの絶縁部材48を挟
んで入射光の方向に見て前後に重ね合わせる。半導体チ
ップ41の所定の領域44を、半導体チップ41.42
および絶縁部材48の側面に金属の蒸着により形成した
導体45により半導体チップ42に形成した所定の領域
46に接続する。本例では光検出半導体領域を形成した
半導体チップ41と信号処理回路を形成した半導体チッ
プ42とを別個に構成したため、回路の緒特性と半導体
チップ製造プ四セスの合わせ込みが不要となり、熱やキ
ャリア電荷による悪影響も除去できると共にリードを裏
側に設けたため光入射方向から見た横方向寸法を小ざく
することができ、しかも実装密度を向上することができ
る。
FIG. 4 is a schematic sectional view showing another solid-state N image device of the present invention. In this example, a photodetector semiconductor element is formed in the region 4Ia of the semiconductor chip 41, and a signal processing circuit element is formed in the region 42a of the semiconductor chip 42. These semiconductor chips 41 and 42 are stacked one on top of the other with an insulating member 48 of appropriate thickness in between when viewed in the direction of incident light. A predetermined area 44 of the semiconductor chip 41 is
A conductor 45 formed on the side surface of the insulating member 48 by metal vapor deposition is connected to a predetermined region 46 formed on the semiconductor chip 42 . In this example, since the semiconductor chip 41 on which the photodetection semiconductor region is formed and the semiconductor chip 42 on which the signal processing circuit is formed are configured separately, there is no need to match the circuit characteristics with the semiconductor chip manufacturing process. It is possible to eliminate the adverse effects caused by carrier charges, and since the leads are provided on the back side, the lateral dimension as viewed from the light incident direction can be reduced, and the packaging density can be improved.

ざらに本例では半導体チップ42の裏面にリードを直接
ボンディングせずに、半導体チップ42の裏面に接点領
#247を設け、取付は基板4日に取付けたリード49
の先端を接点領域に当接して電気的に接続する。本例の
ようにリードを取付は基板に取付け、この基板を半導体
チップ裏面に取付けることによりリードの機械的強度が
増大すると共にリードの電気的接続を容易に行なうこと
ができる。
Roughly speaking, in this example, a contact area #247 is provided on the back surface of the semiconductor chip 42 without directly bonding the leads to the back surface of the semiconductor chip 42, and the attachment is performed using the leads 49 attached on the fourth day of the substrate.
Abut the tip of the contact area on the contact area to make an electrical connection. By attaching the leads to a substrate as in this example and attaching this substrate to the back surface of the semiconductor chip, the mechanical strength of the leads is increased and electrical connection of the leads can be easily made.

第5図は本発明の固体撮像装置のざらに他の例を示す線
図的斜視図である。本例では光検出半導体素子を形成し
た半導体チップ51と信号処理回路素子を形成した半導
体チップ52とを前例と同様に入射光の方向に見て前後
に重ね合わせて配置する。半導体チップ5】と52との
間の接続はこれら半導体チップの側面に金属蒸着して形
成した導体58により行なう。本例では固体撮像装置と
外部回路との接続を行なうために、後側の半導体チップ
52に孔をあけ、この孔にリード線54の先端を挿入し
てハンダ付けする。第6図は半導体チップ52とリード
線54との接続部分を拡大して示す断面図であり、半導
体チップ表面に所定の領域55中に孔56をあけ、この
孔にリード線54の導体芯54aを挿入し1領域55と
導体芯54aとの間をはんだ57により接続する。この
ような構成とすることによって、リード線54が半導体
チップ52の外方へはみ出すことがないので、入射光方
向から見た寸法を小さくすることができると共に眠気的
な接続も簡単かつ確実に行なうことができるのでトラブ
ルの発生も少なくなる。
FIG. 5 is a schematic perspective view showing roughly another example of the solid-state imaging device of the present invention. In this example, a semiconductor chip 51 on which a photodetection semiconductor element is formed and a semiconductor chip 52 on which a signal processing circuit element is formed are placed one on top of the other when viewed in the direction of incident light, as in the previous example. The connection between the semiconductor chips 5 and 52 is made by a conductor 58 formed by metal vapor deposition on the side surfaces of these semiconductor chips. In this example, in order to connect the solid-state imaging device to an external circuit, a hole is made in the semiconductor chip 52 on the rear side, and the tip of the lead wire 54 is inserted into the hole and soldered. FIG. 6 is an enlarged cross-sectional view showing the connecting portion between the semiconductor chip 52 and the lead wire 54. A hole 56 is formed in a predetermined area 55 on the surface of the semiconductor chip, and the conductor core 54a of the lead wire 54 is inserted into the hole. is inserted, and the first region 55 and the conductor core 54a are connected by solder 57. With this configuration, the lead wires 54 do not protrude outward from the semiconductor chip 52, so the dimensions seen from the direction of incident light can be reduced, and drowsy connections can be easily and reliably performed. This reduces the occurrence of trouble.

第7図は上述した本発明の固体撮像装置を先端に内蔵し
た内視鏡の一例の構成を示す断面図である。本例の内視
鏡は直視形の体腔内観察用のものであり、被検体内部に
挿入される可撓性外筒61の先端に、例えばステンレス
スチールよす成る先端本体62を嵌着する。この先端本
体62には数個のチャンネル62a、62b、620・
・・ を形成する。ライトガイドチャンネル62aには
オプチカルファイバ束より成るライトガイド68を挿入
し、先端には凹レンズ64を嵌合する。ライトガイド6
8はカバーチューブ65により被覆し′、外筒61の内
部を延在させ、操作部へ導き照明光源に結合する。対物
観察チャンネル62b内部には先端に対物レンズ系66
を嵌合すると共に内部に固体撮像装置67を嵌合する。
FIG. 7 is a sectional view showing the configuration of an example of an endoscope incorporating the above-described solid-state imaging device of the present invention at its tip. The endoscope of this example is a direct-view type for observing the inside of a body cavity, and a tip body 62 made of stainless steel, for example, is fitted to the tip of a flexible outer tube 61 that is inserted into the subject. This tip body 62 has several channels 62a, 62b, 620.
... is formed. A light guide 68 made of an optical fiber bundle is inserted into the light guide channel 62a, and a concave lens 64 is fitted at the tip. light guide 6
8 is covered with a cover tube 65', extends inside the outer cylinder 61, leads to the operating section, and is connected to the illumination light source. An objective lens system 66 is provided at the tip inside the objective observation channel 62b.
At the same time, the solid-state imaging device 67 is fitted inside.

本例の固体撮像装置67は第4図に示した構成のもので
あり、2つの半導体チップを上下に重ねたものである。
The solid-state imaging device 67 of this example has the configuration shown in FIG. 4, and has two semiconductor chips stacked one above the other.

後側の半導体チップの裏面に取付けたリード68には導
線束69を接続し、この導線束69は可撓性チューブ7
0を経て外筒内部を延在させて操作部へ導き、信号処理
回路に接続する。送気チャンネル62cには送気チュー
ブ71を連結すると共に先端には送気ノズル72を取付
け、対物レンズ系66の先頭レンズに向け、送気できる
ようにする。送水チャンネルには送水チューブを連結す
ると共に先端には送水ノズルを設け、対物レンズ系66
の先頭レンズに送水して汚物等を−洗い流すことができ
るようにするが、第7図では送水チューブや送水ノズル
は図示していない。また、送気ノズル72は先頭レンズ
に付着した洗浄水を吹き飛ばすと共に必要に応じて被検
体内部に送気してこれを膨ませることができるようにす
る。先端本体62にはざらに鉗子チャンネルを形成し、
ここには被検体標本を採取するための鉗子およびこの鉗
子を外部より操作するためのワイヤを挿通できるように
する。
A conductive wire bundle 69 is connected to the leads 68 attached to the back surface of the rear semiconductor chip, and this conductive wire bundle 69 is connected to the flexible tube 7.
0, the inside of the outer cylinder is extended to the operating section, and connected to the signal processing circuit. An air supply tube 71 is connected to the air supply channel 62c, and an air supply nozzle 72 is attached to the tip thereof, so that air can be supplied toward the leading lens of the objective lens system 66. A water supply tube is connected to the water supply channel, a water supply nozzle is provided at the tip, and an objective lens system 66 is installed.
Water is supplied to the leading lens to wash away dirt, etc., but the water supply tube and water supply nozzle are not shown in FIG. Further, the air supply nozzle 72 blows away the cleaning water adhering to the leading lens and, if necessary, blows air into the inside of the subject to inflate it. A forceps channel is roughly formed in the tip body 62,
A forceps for collecting a specimen sample and a wire for operating the forceps from the outside can be inserted through this hole.

先端本体62の外周面にはねじ溝を形成し、ここに先端
フード78を螺合する。
A thread groove is formed on the outer circumferential surface of the tip main body 62, and a tip hood 78 is screwed therein.

本発明は上述した実施例にのみ限定されるものではなく
、幾多の変形例が可能である。例えば第3図に示した実
施例では半導体チップの裏面に直接リードを接続するよ
うにしたが、第4図に示すようにリードを取付は基板に
固着し、この取付は基板を半導体チップ裏面に固着する
こともできる6また、半導体チップの側面に延在する導
体は半導体チップの全側面に形成することもできるが、
少なくとも一つの側面には導体を形成しない方が製造上
有利である。ざらに本発明の固体撮像装置は第7図に示
した直視形内視鏡だけでなく、側視形の内視鏡にも組込
むことができる。更に、上述した内視鏡では、光源から
の光をライトガイドを経て外筒先端から射出させるよう
にしたが、ライトガイドを用いることなく、ランプや発
光ダイオード等の光源を外筒先端部に設けて被検体を照
明するよう構成することもできる。この場合、赤、青。
The present invention is not limited to the embodiments described above, and many modifications are possible. For example, in the embodiment shown in Fig. 3, the leads are connected directly to the back surface of the semiconductor chip, but as shown in Fig. 4, the leads are fixed to the substrate, and the mounting method is to connect the board to the back surface of the semiconductor chip. 6Also, the conductor extending to the side surface of the semiconductor chip can be formed on all the sides of the semiconductor chip,
It is advantageous in manufacturing not to form a conductor on at least one side surface. In general, the solid-state imaging device of the present invention can be incorporated not only in the direct-viewing endoscope shown in FIG. 7, but also in a side-viewing endoscope. Furthermore, in the above-mentioned endoscope, the light from the light source is emitted from the tip of the outer tube through a light guide, but it is also possible to install a light source such as a lamp or a light emitting diode at the tip of the outer tube without using a light guide. It can also be configured to illuminate the subject using the same method. In this case, red, blue.

緑の8色の発光ダイオードを用い、これらを順次に発光
きせるようにすることもでき、この場合には固体撮像装
置の受光面に設けたカラーフィルタは不要となる。ざら
に本発明の固体撮像装置は内1、)視鏡以外の撮像機器
にも組込むことができることは勿論である。
It is also possible to use light-emitting diodes of eight green colors and make them emit light in sequence. In this case, a color filter provided on the light-receiving surface of the solid-state imaging device becomes unnecessary. In general, it goes without saying that the solid-state imaging device of the present invention can be incorporated into imaging equipment other than (1) endoscopes;

本発明によれば、光検出半導体素子と信号処理回路素子
とを入射光の方向から見て前後に形成し、これら光検出
半導体素子と信号処理回路素子との間を、半導体チップ
の側面に形成した導体によって接続するようにしたため
、入射光の方向から見た横方向の寸法を受光面の寸法と
ほぼ同程度まで小びくすることかで@1例えば小径の内
視鏡先端内部に有効に組込むことができる。また、リー
ドを半導体チップの裏側に取付けることによっても小形
化に大きく貢献することになると共に製造も容易となり
、電気的特性も良好となる効果がある。
According to the present invention, the photodetection semiconductor element and the signal processing circuit element are formed in front and behind each other when viewed from the direction of incident light, and the space between the photodetection semiconductor element and the signal processing circuit element is formed on the side surface of the semiconductor chip. By making the lateral dimension as seen from the direction of the incident light almost the same as the dimension of the light-receiving surface, it can be effectively incorporated into the tip of a small-diameter endoscope, for example. be able to. Furthermore, attaching the leads to the back side of the semiconductor chip greatly contributes to miniaturization, facilitates manufacturing, and has the effect of improving electrical characteristics.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の固体撮像装置の一例の構成を示す断面図
、 第2図は本願人が先に提案したバック接合形固体撮像装
置の構成を示す断面図、 第8図は本発明の固体撮像装置の一例の構成を示す線図
、 第4図は本発明の固体撮像装置の他の例の構成を示す線
図的断面図、 第5図は本発明の固体撮像装置のざらに他の例の構成を
示す斜視図、 第6図は同じくその一部分を拡大して示す断面図、 第7図は本発明の固体撮像装置を先端内部に組込んだ内
視鏡の一例を示す断面図である。 81・・・半導体チップ 82.88・・・領域84・
・・導体 85・・・リード 41.42・・・半導体チップ 43・・・絶縁部材 44.46.47・・・領域45
・・・導体 49・・・リード 51.52・・・半導体チップ 58・・・導体 54・・・リード線 55・・・領域 56・・・孔 57・・・はんだ 特許出願人 オリンパス光学工朶株式会社第1図 第2図 第3図 第4図 第5図 第6図 第7図 第1頁の続き 0発 明 者 神 原 浩 司 東京都渋谷区幡ケ谷株
式会社内 0発 明 者 大 橋 −司 東京都渋谷区幡ケ谷株式
会社内 0発 明 者 八 嶋 弘 幸 東京都渋谷区幡ケ谷株
式会社内 0発 明 者 小 川 元 嗣 東京都渋谷区幡ケ谷株
式会社内 0発 明 者 藤 森 弘 善 東京都渋谷区幡ケ谷株
式会社内 0発 明 者 山 1) 秀 俊 東京都渋谷区幡ケ谷
株式会社内 0発 明 者 飯 野 勝 東京都渋谷区幡ケ谷株式会
社内 2丁目4旙2号 オリンパス光学工業 2了目4旙2号 オリンパス光学工業 2了目4旙2号 オリンパス光学工業 2了目4旙2号 オリンパス光学工業 2了目4旙2号 オリンパス光学工業 2了目4旙2号 オリンパス光学工業 2了目4旙2号 オリンパス光学工業
FIG. 1 is a sectional view showing the configuration of an example of a conventional solid-state imaging device, FIG. 2 is a sectional view showing the configuration of a back junction type solid-state imaging device previously proposed by the applicant, and FIG. 8 is a sectional view showing the configuration of an example of a conventional solid-state imaging device. FIG. 4 is a diagrammatic cross-sectional view showing the configuration of another example of the solid-state imaging device of the present invention, and FIG. 5 is a diagram showing the configuration of another example of the solid-state imaging device of the present invention. FIG. 6 is a cross-sectional view showing an enlarged portion of the configuration, and FIG. 7 is a cross-sectional view showing an example of an endoscope incorporating the solid-state imaging device of the present invention inside its tip. be. 81...Semiconductor chip 82.88...Region 84.
...Conductor 85...Lead 41.42...Semiconductor chip 43...Insulating member 44.46.47...Region 45
...Conductor 49...Lead 51.52...Semiconductor chip 58...Conductor 54...Lead wire 55...Region 56...Hole 57...Solder patent applicant Olympus Optical Co., Ltd. Co., Ltd.Figure 1Figure 2Figure 3Figure 4Figure 5Figure 6Figure 7Figure 7Continued from page 10Inventor Hiroshi Kamihara Hatagaya Co., Ltd., Shibuya-ku, Tokyo0Inventor Ohashi − Tsukasa 0 origin in Hatagaya Co., Ltd., Shibuya-ku, Tokyo Author Hiroyuki Yashima 0 origin in Hatagaya Co., Ltd., Shibuya-ku, Tokyo Author Mototsugu Ogawa 0 origin in Hatagaya Co., Ltd., Shibuya-ku, Tokyo Author Hiroyuki Fujimori 0 Inventor, Hatagaya Co., Ltd., Shibuya-ku, Tokyo Author: Yama 1) Hidetoshi 0 Inventor, Hatagaya Co., Ltd., Shibuya-ku, Tokyo Author: Masaru Iino 2-4-2, Hatagaya Co., Ltd., Shibuya-ku, Tokyo, Japan Olympus Optical Industry 2 Olympus Optical Industry 2nd term 4th hour 2nd edition Olympus Optical Industry 2nd term 4th hour 2nd edition Olympus Optical Industry 2nd term 4th hour 2nd edition Olympus Optical Industry 2nd term 4th hour 2nd edition Olympus Optical Industry 2nd term Ryome 4 旙2 No. 2 Olympus Optical Industry

Claims (1)

【特許請求の範囲】 L 光検出半導体素子および信号処理回路素子を入射光
の方向から見て前後に形成した少なく共1個の半導体チ
ップの側面に、光検出半導体素子と信号処理回路素子と
の間の相互接続を行なう導体を形成したことを特徴とす
る固体撮像装置。 2 前記光検出半導体素子および信号処理回路素子をそ
れぞれ別個の半導体チップに形成し、これら半導体チッ
プを入射光の方向に見て絶縁部材を介して前後に重ねて
配置し、前記光検出半導体素子と信号処理回路素子との
相互接続を行なう導体を、前記両生導体チップおよび絶
縁部材の側面に形成しfことを特徴とする特許請求の範
囲1記載の固体撮像装置。 & 固体撮像装置を外部回路へ接続するリードを前記半
導体チップの裏面に設けたことを特徴とする特許請求の
範囲1または2記載の固体撮像装置。
[Scope of Claims] L A photodetecting semiconductor element and a signal processing circuit element are formed on the side surface of at least one semiconductor chip formed in front and behind the photodetecting semiconductor element and the signal processing circuit element when viewed from the direction of incident light. A solid-state imaging device characterized in that a conductor is formed for interconnection between the two. 2. The photodetection semiconductor element and the signal processing circuit element are each formed on separate semiconductor chips, and these semiconductor chips are placed one on top of the other with an insulating member in between when viewed in the direction of incident light, and the photodetection semiconductor element and 2. The solid-state imaging device according to claim 1, wherein a conductor for interconnection with a signal processing circuit element is formed on a side surface of the amphibodiconductive chip and the insulating member. & The solid-state imaging device according to claim 1 or 2, characterized in that a lead for connecting the solid-state imaging device to an external circuit is provided on the back surface of the semiconductor chip.
JP58182871A 1983-09-30 1983-09-30 Solid-state image pickup device Granted JPS6074880A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58182871A JPS6074880A (en) 1983-09-30 1983-09-30 Solid-state image pickup device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58182871A JPS6074880A (en) 1983-09-30 1983-09-30 Solid-state image pickup device

Publications (2)

Publication Number Publication Date
JPS6074880A true JPS6074880A (en) 1985-04-27
JPH0525228B2 JPH0525228B2 (en) 1993-04-12

Family

ID=16125885

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58182871A Granted JPS6074880A (en) 1983-09-30 1983-09-30 Solid-state image pickup device

Country Status (1)

Country Link
JP (1) JPS6074880A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6260911U (en) * 1985-10-03 1987-04-15
JPS63313970A (en) * 1987-01-20 1988-12-22 Olympus Optical Co Ltd Solid-state image pickup device
EP1104182A1 (en) * 1999-11-27 2001-05-30 STMicroelectronics Limited Improved image sensor devices for Incorporation into endoscopes
JP2002329849A (en) * 2001-04-27 2002-11-15 Olympus Optical Co Ltd Image pickup apparatus
WO2006080359A1 (en) * 2005-01-26 2006-08-03 Matsushita Electric Industrial Co., Ltd. Image pickup device
JP2008506478A (en) * 2004-07-19 2008-03-06 フラウンホッファー−ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ Video endoscopy equipment
WO2017072862A1 (en) * 2015-10-27 2017-05-04 オリンパス株式会社 Image pickup unit and endoscope
US9667896B2 (en) 1997-10-06 2017-05-30 Cellect Llc Reduced area imaging device incorporated within endoscopic devices

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5268687U (en) * 1975-11-18 1977-05-21
JPS54162765U (en) * 1978-05-06 1979-11-14
JPS58143676A (en) * 1982-02-20 1983-08-26 Ricoh Co Ltd Memory for imaging device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5268687U (en) * 1975-11-18 1977-05-21
JPS54162765U (en) * 1978-05-06 1979-11-14
JPS58143676A (en) * 1982-02-20 1983-08-26 Ricoh Co Ltd Memory for imaging device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6260911U (en) * 1985-10-03 1987-04-15
JPH0532811Y2 (en) * 1985-10-03 1993-08-23
JPS63313970A (en) * 1987-01-20 1988-12-22 Olympus Optical Co Ltd Solid-state image pickup device
US9667896B2 (en) 1997-10-06 2017-05-30 Cellect Llc Reduced area imaging device incorporated within endoscopic devices
EP1104182A1 (en) * 1999-11-27 2001-05-30 STMicroelectronics Limited Improved image sensor devices for Incorporation into endoscopes
JP2002329849A (en) * 2001-04-27 2002-11-15 Olympus Optical Co Ltd Image pickup apparatus
JP4698877B2 (en) * 2001-04-27 2011-06-08 オリンパス株式会社 Imaging device
JP2008506478A (en) * 2004-07-19 2008-03-06 フラウンホッファー−ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ Video endoscopy equipment
WO2006080359A1 (en) * 2005-01-26 2006-08-03 Matsushita Electric Industrial Co., Ltd. Image pickup device
WO2017072862A1 (en) * 2015-10-27 2017-05-04 オリンパス株式会社 Image pickup unit and endoscope

Also Published As

Publication number Publication date
JPH0525228B2 (en) 1993-04-12

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