JPS6059386A - Pattern line drawing system and apparatus - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method and apparatus for drawing digital pattern lines having a pattern that cyclically uses a two-dimensional grid-like basic pattern defined by brightness or color codes. .

When displaying a digital vector on a display device or outputting it to a hard copy device, vector generating means is used to generate a sequence of points to be output to each device from the starting point and vector components of the vector.

These dot sequences are realized on each device as a series of pixels having a basic unit size and brightness or color, and by regularly changing the brightness or color, vectors having various line patterns can be obtained.

On the other hand, when creating documents, drawings, etc. using a word processor or the like, not only these vectors but also pattern lines such as railroad track patterns on maps or decorative lines in documents are required. FIG. 1 is a diagram showing an example of pattern lines to which the present invention is applied, in which (a) shows the pattern lines, and (b) shows the respective basic patterns. The pattern lines in (a) are realized by continuously connecting and using the basic patterns of (bl).

FIG. 2 is a diagram for explaining a conventional method for realizing pattern lines, in which (a) shows a case where the line is horizontally inclined, and (b) shows a case where the line is obliquely inclined. The simplest method for realizing pattern lines from basic patterns is to continuously arrange rectangular basic patterns horizontally or vertically, as shown in (a). To use one basic pattern for both horizontal and vertical pattern lines, create a pattern rotated 90 degrees from the basic pattern and use it. Although this method is simple, it has the disadvantage that the extension of the pattern lines is limited to either horizontal or vertical lines, and it is not possible to create patterns with arbitrary inclinations. On the other hand, pattern lines with arbitrary inclinations can be realized by creating patterns that are converted from the basic pattern into parallelogram shapes corresponding to the desired inclinations and arranging them so that they are continuously connected, as shown in (()). . According to this method, pattern lines with a certain degree of freedom (lj'I) can be obtained, but as is clear from the figure, the pattern is deformed diagonally, and the line width of the pattern lines is apparently narrower than the original line width. Furthermore, in order to treat pattern lines as having completely arbitrary slopes and arbitrary lengths, like conventional vectors, there is a disadvantage that non-electronically complex processing is required.

An object of the present invention is to solve the above-mentioned drawbacks, and to provide a pattern line drawing method that can easily draw pattern lines at any inclination without causing the pattern to be deformed diagonally or the line width to become narrow, just like vectors. The objective is to provide a method and its equipment.

According to the present invention, in a digital pattern line drawing method having a pattern using cyclically a two-dimensional grid-like basic pattern defined by a brightness or color code,
1 When the starting point of the pattern line in the y-coordinate system, the component, and the basic pattern are given, the correction line width calculated from the angle between the pattern line and the X axis and the line width of the basic pattern, and the line width of the basic pattern. A correction pattern is created using the phase shift amount of the pattern corresponding to the position in the line width direction, and the starting point of a vector of unit line width having a line pattern using the row part pattern of this correction pattern cyclically is set to an angle. X axis or
A pattern line drawing method is obtained in which pattern lines are drawn superimposed on the face by the number of corrected line widths while being shifted by a unit pixel in parallel to the axis.

Further, according to the present invention, in a digital pattern line drawing device having a pattern using a two-dimensional grid-like basic pattern determined by a brightness or color code in a circular manner,
a basic pattern memory that stores the basic pattern P;
11) Starting point x, y and component d of pattern line in I coordinate system
x, dy and the basic pattern P-(C1j) (i=1.
2, ..., m, j: 1.21010, n), the line width m of the basic pattern and the component dx of the pattern line
, dy and outputs a corrected line width m', and a pattern code C1 from the basic pattern memory.
j, and input the corrected line width m° and pattern line component dx,
Modified butter 7 using dy and P'==(C', jl (
i-1,2,...,ml,j=1.2,...,n)
a pattern converting unit that converts and outputs the corrected pattern P1, a corrected pattern memory that temporarily stores the corrected pattern P1 outputted by the pattern converting unit, the corrected line width m1 and the starting point x of the pattern line,
Input y, components dx and dy to find the starting point of m° group Xi, Y
A starting point calculation unit that outputs H (i = 1.2, ..., m゛), and the starting points Xi, Yi and pattern line components dx, dy.
and the row partial pattern “i””1j(
J=1.2, -..., n), and calculate the coordinates Xiv, Yiv of a point sequence representing a vector having a line pattern using the row partial pattern Tli cyclically, and the brightness or color at each point. Code C1v (v=1.2,...-1MAX(d
, x, d, y ));
A pattern line drawing device is obtained which includes an image memory for writing and storing the code C1v at addresses corresponding to the coordinates Xiv and Yiv of the point sequence, and a control section for controlling the operation of the device.

The present invention will be described below with reference to drawings showing embodiments. First, the system of the present invention will be described.

FIG. 3 is a conceptual diagram for explaining the present invention in detail;
Figure 3 (a) is the basic pattern of pattern lines, (b) is the modified pattern, (C) is the partial pattern, and Figure 4 (a) is the X/y pattern.
The pattern line forms an angle θ with the X axis on a plane, and FIG. 4(b) shows an enlarged view of a part of the pattern line.

The basic pattern shown in Figure (a) has a grid shape divided into n sections in the line direction and m sections in the line width direction, and when the brightness or color code of a certain subdivision is C1j, P-(CIJ)(
i=1.2s 3+ ”'* mi J=1+ 2.3
,...,n). Similarly, the modification pattern shown in FIG.
+ =1-2.3,...1ml, j=1.2,3, Han
), and the partial pattern for one line of the modified pattern shown in FIG.
．． ..., n). 1. In Figure 4(a), a parallelogram ABFB surrounded by AB and EF represents a pattern line with a line width m, and in reality, vectors AB, . . . , CD have unit line width.

, EF are superimposed in parallel 0 In the present invention, the starting point A1...ICI...,E of each vector is determined by the angle θ00≦θ〈45° or 315°≦θ〈3
In the case of 60°, AE is set parallel to the y-axis stopping direction, and 45
When °≦θ<135°, AE is set parallel to the negative direction of the X-axis, and when 135°≦θ<225°, l is set parallel to the negative direction of the y-axis, and 225°≦θ 315° A in the case of
E is set parallel to the X-axis stop direction. Here 0°≦0〈4
The case of 5° is shown.

The line width of the pattern line, that is, the line width m of the basic pattern, and the number of overlapping vectors of unit line width, that is, the line width m of the modified pattern
' (hereinafter referred to as corrected line width) is expressed by equation (1).

m' = (m - secθ) - (1) The symbol [ ] in the formula (1) means that the value is converted into an integer by, for example, rounding off. In order to increase the line width of the basic pattern from m to m' according to the angle θ, an appropriate interpolation operation is performed. In other words, the pattern whose line width is corrected for the basic pattern P-(C,j) is P' = ("kj) (k=1.2.3
．． . . , ml, j=1.2°3, .

C"kj-Cij- ...... (2) According to equation (2), from the basic pattern of line width m, line width ml
A pattern P"-(C"kj) corrected to is obtained.

On the other hand, the row partial pattern of this correction pattern P'' is T'r
=(C'111 (j=1.2.3,...,n) and l
-, if the vectors of line patterns using this pattern T1 amount cyclically are superimposed as shown in Figure 4<a), the pattern lines will be aligned in the OH direction, so the pattern will be Deforms diagonally throughout. In order to correct this deformation, it is better to change the phase of the helix pattern of each vector in the direction perpendicular to the direction, that is, the direction. The amount of phase shift at this time corresponds to ■-11 with respect to the first vector, but as shown in the enlarged view in Figure 4 (1)), point ■ (
Since the unit pixel from to dotting is not the absolute value of f-1,I, it becomes the X-axis direction component of IIJ when 0°≦θ and 45°. Therefore, if the case where the 1st place +1+ is advanced is positive, the phase shift amount Si in this case is expressed by equation (3).

S, 2C-IHIl*cosθ] = [-i φSinθ@C05O] : C-Sin 2θ] ・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・(3) Therefore, the partial pattern Tl, which is obtained by shifting the phase of the partial pattern TI in each row by 8°, is given by equation (4). .

T'i = l (S1lJl, C1,, -C1[t=
=MOD(j-1-81,n)+1(j-1,2,3,
・・・, n)・・・・・・・・・・・・・・・・・・
・・・・・・・・・(4) 1, this partial pattern TI,
The correction pattern P′ having the following equation is expressed by equation (5).

P', = l C'i j l, C1ij= C″it
t=MOD(j-1-8H1n)+1(1=1.2.
3,..., m', j=l, 2.3,..., n) ・
・・・－・・・・・・・・・－・・・・・・・・・・・・
・・・－・・・・・・・・・・・・・・・・・・・・・・・・
(5) Therefore, m is the vector of unit line width that uses the partial pattern 7 of this modified pattern P' as a line pattern.

By stacking these in parallel, pattern lines with a line width of m and a pattern aligned perpendicular to the line direction can be obtained. On the other hand, the corrected line width m° and the phase shift amount S1 are similarly determined for other angles, and are expressed in equation (6) for 0°≦θ<360°.

If 0°≦θ45°, 315°≦θ360°, m
'==[m*secθ], Si=[-Hs+n2θ],
In the case of 45°≦θ×135°, ・〔□・C08eCθ〕, s1=〔〔in2θ〕,
If 135°≦θ and 225°■.

m' == C-m ”seeθ], 5i=(-Hs
+n2θ), 1 if 225°≦θ<315°.

m'==:[-m11cosccθ], 5i=(-ps
+n2θ) -16+Figure 5 (a), (bl, (cl,
(dl, (ei) are diagrams showing examples of pattern lines according to the method of the present invention, (a) is a pattern line, (b) is a basic pattern, (
C> shows a pattern in which the line width is corrected, (d) shows a corrected pattern in which the phase shift is also corrected, and (e) shows an example of pattern line drawing using the corrected pattern. Here m
An example will be shown for the case where -11, n = 8, and θ = 45°. A method of obtaining a modified pattern P' from a basic pattern P and drawing pattern lines will be explained in order. The corrected line width is m′2 [11·cosec45°]=15 according to equation (6), and the pattern P” whose line width is corrected is as shown in equation (7).

P"=l C"3i), C"kj -C1j (
j-1, 2, 3, ..., n) k21.2.3.4.5.6.7.8.9.101],
12.1314.15i = 1.2.3.3.4.5
．． 6.6.7.8.9.9.10.11.11...
(7) This means that the partial patterns in rows i2, 3, 6, 9, and 11 are used overlappingly, and the result of correction is as shown in FIG. 5(C). Furthermore, i = 1.2.3
,...,15, the amount of phase shift for Si
20, 1.1.2.2.3.3.4.4.5.5.6.
6.7.7, for example, partial pattern T"4-10.
0.1, Olo, ■, 0, O) (0 means white, 1 means black) is shifted by 5i-2 and becomes Tl4-(0,0,0
, 0, 1, 0, 0, ■). The correction pattern P′ shown in FIG. 5(d) after correcting the phase shift for the whole
is obtained. Furthermore, the partial pattern T' +-(1,1°1, Olo, 1.1.1) of the modified pattern P°, Tl
2-(1,1,1,1,0,0,],T1),...-1
T'ts=t 1.1.1.1.1.0.0.11
A vector having a line pattern using each cyclically is
Figure 5 (e
), pattern lines with a line width of 11 and an angle of 45° are obtained.

As described above, according to the pattern line drawing method of the present invention, it is possible to easily draw pattern lines with arbitrary inclinations, in which the pattern is obliquely deformed and the width does not become narrow, just like vectors. be able to.

FIG. 6 is a block diagram showing an embodiment of an apparatus implementing the pattern line drawing method of the present invention. 2 in the figure is a correction line width calculation unit, which includes the line width m of the basic pattern and the component dx of the pattern line.
, dy are input, and the corrected line width m' is output. 3 is a basic pattern memory, in which a specific basic pattern P=i Cr
jl (i=1.2.3.-..., m, j=1.2,3
,...,n) are stored. 4 is a pattern conversion unit which inputs the luminance or color code CiJ from 6D and basic pattern memory 3.72 in order, and uses the correction line width m1 and pattern line components dx and dy to create a correction pattern P'=(C' i
, l (t=i, 2.3,..., mo, j-1,2
, 3, ..., n). A modified pattern memory 5 temporarily stores the modified pattern output from the pattern converter 4. 6 is a starting point calculation unit, which calculates the corrected line width I
Input n', the components dx and dy of the pattern line, and the starting points x and y of the pattern line to find the starting points Xi and Yi of m' group (l=1.2.3, .
..., m') is output. 7 is a vector generation part,
The starting points Xi, Yi, etc., the components dx and dy of the pattern line, and the partial pattern T'i of the correction pattern (i = l, 2.3.
..., m') and input the coordinates X of the point sequence representing the vector.
iv, Y1v and the code C1v (V:l,
2.3,..., MAX(dx-dy)) is output. Reference numeral 8 denotes an image memory in which a code C1v is written and stored at the address corresponding to the coordinates Xiv, Yiv of the point sequence sequentially sent from the vector generation section. Reference numeral 1 denotes a control unit that controls the operation of the device.

The operation when drawing a number of patterns having starting points x, y, components dx, dy, and basic pattern P will be explained using FIG.

It is assumed that the basic pattern P is stored in the basic pattern memory 3 in advance. The corrected line width calculating section 2 inputs the basic pattern line width m, dx=dy, performs the calculation shown in equation (6), and outputs the corrected line width m'. However, in the following explanation, θ=a r c t 3n (”')
, (01θ×360°). The pattern conversion unit 4 inputs the corrected line widths m°, dx, and dy, sequentially inputs the pattern code C1j from the basic pattern memory 3, and converts the data according to equations (2), (5), and (6). It is converted into a code c l 1J of the correction pattern P′ by arithmetic operations, output, and temporarily stored in the correction pattern memory 5.

This conversion operation can be performed, for example, as follows. First, according to equation (2), the code C1j is input in order from the basic pattern memory 3, and the line width is corrected using nl'.
. . , mo, J-1, 2, . . . , n) are temporarily stored in an internal memory (not shown) of the pattern conversion unit 4.

Next, the amount of phase shift of the pattern 5I(
i=1.2, . Further, the operation of equation (6) can also be performed using a cyclic n-stage shift register. The starting point calculation unit 6 is m
', x, y, dx, dy, and as shown in the detailed description of the present invention, start points Xi, Yi (i =
1.2, ..., m') is output. -Example (8)
Formula % Formula % (8 However, i21.2, ..., m", o0≦θ<45°
Or partial pattern T'1=IC'1jl(j=
x, 2, .
2, . . . , mo are sent to the vector generator 7 rn' times in this order. Each time, the vector generator 7 generates coordinates XIV, Yiv of a point sequence representing a vector of unit line width having a line pattern using the partial pattern T I cyclically.
and code C1v(v21.2,..., MAX ((l
X, d y ) and writes C1v to the corresponding address position in the image memory 80. Therefore, m' vectors are stored in the image memory 8. Display device or notebook copy device (none of which is shown) d, image memory 8
It reads and visualizes data stored in
Since this is not essential to the embodiment of the present invention, its explanation will be omitted.

As described above, according to the pattern line drawing device of the present invention, the starting point, component, and basic pattern of the pattern line are given, and the width of the pattern deformed diagonally is narrowed by the arbitrary inclination determined by the component. It is possible to easily draw pattern lines that are not completely drawn in the same way as vectors.

In the above description of the width vector generation method and width vector generation device of the present invention, as shown in equation (6), secθ, cosecθ, 5in2θ (θ = m” S, is calculated by calculation). , this operation can be easily executed by VC using a functional calculator or microprocessor, etc.
%; b. Here f (1, s = MIN (I dx
l, 1ay+), d]=MAX(l dx 1-dy
I)-01-te. On the other hand, at 0°≦θ and 360°, the relationship between θ and θ1 is expressed by equation (9).

θ=θ1 (0°≦θ<45°) −900−01 (45°≦θ 90°)2 90°+
01(90°≦θ×135°)=180°−01(13
5°≦θ<180°)=180°+01(180°≦θ
<225°)=270°−01(225°≦θri270
°)=2700+01(270°≦θ<315°)=3
60°-01 (315°≦θ<360°) ... (9
) where 5i1==[->5tn2θ1] (9)
Using the formula (61) is rewritten to obtain (14).

m'-(mesecθ1) (0°≦θ<360'
)Si” 5it (0°≦θ×45°, 90°≦θ×1
80c.

225° ≦ θ 270°) = S mouth (45° ≦ θ 90°, 180° ≦ θ 225°
, 270°≦θ×360°) ・・・・・・・・・・−
・(1shima) The conditions for θ shown in equation (10) are that dx and dy are positive,
It can be easily expressed by negative and magnitude. Therefore, −
For the J value of
The value of i can be set quickly, the operating speed of the device can be increased, and the configuration can be simplified.

In addition, in the description of the above embodiment, the correction starting point coordinates Xi,
Although Yi is given by formula (8), it is limited to this method (not d, but as another example, d = [m'/2), then X1 = x + q @ (d - i + 1), ode=y-
Red at the starting point of the pattern line by I-re(d-i+1)! Set the center of the chanting direction (x,
y).

[Brief explanation of the drawing]

FIG. 1 is a diagram showing an example of a pattern line, in which (a) shows the pattern line and (b) shows the basic pattern. Figure 2 (a), (b)
) is a diagram for explaining the conventional method of realizing pattern lines. Figure 3 (a), (1)), (C) and Figure 4 (a)
, (b) 1 are diagrams for explaining the pattern line drawing method of the present invention. Figure 5 (a), (bl, (C), (dl,
(e) is a diagram showing an example of pattern lines according to the method of the present invention. FIG. 6 is a block diagram showing an embodiment of an apparatus implementing the pattern line drawing method of the present invention. In the figure, 1 is a control section, 2 is a correction line width calculation section, 3 is a basic pattern memory, 4 is a pattern conversion section, 5 is a correction pattern memory, 6 is a starting point calculation section, 7 is a vector generation section, 8
indicate image memory, respectively. E 1 Figure 1 +→+H square (a) (b) Figure 2 ' Figure 3 (b) Figure 4 Figure 5 (b) (c) (d)

Claims (1)

[Claims] 1. In a digital pattern line drawing method having a pattern that uses a two-dimensional grid-like basic pattern determined by a brightness or color code cyclically, the pattern in an x-y coordinate system. The starting point of the line, its components, and 1. Basic pattern P =
l C1Jl (i21.2,..., m, j21.2
, ..., n, ), and if the angle between the pattern line and the Corrected line width m゛ associated with angle θ and position 1 in the line width direction in the basic pattern
(i=1.2,...,m') and the phase shift amount 8i of the pattern intertwined with the angle θ,
i j l(i=1.2,..., mo, j=1.2,
..., n), and create a row partial pattern 'I"1=fcij 1 (j=1.2,..., n) of the modified pattern.
The starting point of a vector with a unit line width having a line pattern using cyclically is shifted by a unit pixel in parallel to y@t or the X axis according to the angle θ, and the correction line width m1 is overlapped. A pattern line drawing method characterized by: 2. In a digital pattern line drawing device having a pattern using a two-dimensional lattice-like basic pattern cyclically defined by a brightness or color code, a basic pattern memory that stores the basic pattern P, and an X-y The starting point Xy of the pattern line in the coordinate system, its components dx, dy, and the basic pattern P(Cijt(i=1.2, . . . , m, j21.
2, . Input the Shiba turn code Ci'j into the basic pattern memory and use the corrected line width m' and pattern line components dx, dy to create a modified pattern P':lC'ii) (i=1.2,...・,n
]', 1-1.2, . ', the starting point X, y of the pattern line, and the components dx, dy are input to the starting point X1, yi of m' group: i, 2, ..., m
'); the starting point X2, Yi, the pattern line components dx, dy, and the row partial pattern Ill of the modified pattern. = C1ij (j-1, 2,..., n) is input and the row partial pattern TI is used cyclically to obtain the coordinates XiV, Yiv of a point sequence representing a vector having a line pattern, and the coordinates XiV, Yiv at each point. Brightness or color code C1y (v=1.2,...
, MAX (dx, dy)); an image memory that writes and stores the code Crv at the address corresponding to the coordinates Xiv, Y1v of the point sequence; and a control unit that controls the operation of the device. A pattern line drawing device characterized by: