JPS6046505A - Production of color filter - Google Patents

Abstract

PURPOSE:To reduce stage by forming a pattern of the 1st photoresist, subjecting the same to dyeing in the 1st dyeing region, coating the 2nd resist thereon, exposing and developing said resist to form a pattern, and dyeing the 2nd dyeing region with the 1st and 2nd resists as a mask. CONSTITUTION:The 1st dyeing region 4 in a dyeing resin layer 2 on a substrate for a solid-state image pickup element is dyed with the 1st photoresist 3 as a mask. The 2nd photoresist covering the 1st photoresist 3 and the 1st region 4 is then formed and with the 1st and 2nd phtoresists 3, 5 in the upper part of the 2nd dyeing region 6 as a mask, the 2nd region 6 in the layer 2 is dyed. The 3rd dyeing region 8 is obtd. by repeating the above-mentioned operation. Not only the formation of the dyed layers is made possible by such operation without removing the dyeing mask at each operation but also the need for stripping the photoresists which is a difficult stage is eliminated and therefore the yield is increased.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an on-chip color filter for use in a solid-state image sensor, and a method for manufacturing a color filter that divides and dyes a dye layer without the need to remove a dye mask layer at q#. Regarding.

A method for manufacturing a color filter of this type prior to the present invention is disclosed in, for example, Japanese Patent Application Laid-Open No. 58-2808 (1983).
A dyed resin pattern is formed on an MO8 type or CCD type solid-state imaging device substrate in an area excluding the bonding pad portion and scribe line.

Next, a first 7-oto-tone pattern is formed in a region other than the first dyed region, and the first dyed region is dyed, for example, with green 0), and the same method is used thereafter.

Three colors of red (R1 and blue) are dyed. In this prior art method of manufacturing color filters.

It is necessary to completely remove the first photoresist, which is a dyeing mask, before forming a pattern on the second photoresist, which makes the process of completely removing this resist difficult and long, and also makes it difficult to remove the resist completely. If any residue is left, that portion will serve as a dyeing mask in the next dyeing process, causing uneven dyeing and the like, resulting in a case where a predetermined yield cannot be obtained.

The object of the present invention is to overcome the above-mentioned drawbacks. A method for manufacturing a color filter is provided.

The method for manufacturing a color filter of the present invention involves forming a pattern of a dyed resin layer in an area excluding bonding pads and scribe lines of a MOS type or CCD type solid-state imaging device substrate, and then forming a pattern of a dyed resin layer on a positive type first photosensitive element substrate. A resist pattern is formed and the first dyeing area is dyed. A second similar positive photoresist is then applied, and jli
! A pattern is formed by exposing and developing the pattern, and the second dyeing area is dyed using the first and second seven-color dyest as a mask. As a photoresist for dyeing masks, use Bon-type phenol ψ novolak, quinonediazide, or polymethyl inogropenylkedone (PMIPK),
Alternatively, polyglycidyl methacrylate-1-(PGMA) or the like is used. In addition, gelatin and PVA are used as the dyed resin layer.
, a water-soluble resist prepared by adding dichromate to casein, or a polyester resin such as polyethylene terephtate (PET) or polyether sulfonate (PES).

For the former, dyeing is carried out with a hydrophilic dye such as an acid dye 1-reactive dye or a cationic dye, and for the latter, dyeing is carried out with a disperse dye.

If the method for manufacturing a color filter according to the present invention is used,
Since it is possible to move on to the next process without peeling off the photoresist, which is a dyeing mask, it not only shortens the process, but also improves the yield by eliminating the need for a peeling process that can lead to a decrease in yield, leading to improved productivity. etc., have great advantages.

Next, one embodiment of the present invention will be explained using the drawings.

First, the conventional method for manufacturing color filters is shown in Figure 1 (a).
This will be explained with reference to (c). First, as shown in FIG. 1(a), a dyed resin layer 2 is formed in a region of a MOS or CCD solid-state image sensor substrate l excluding the bonding pads and scribe lines, and a first photoresist layer 2 is formed on it. Form resist 3 pattern.

Using the photoresist 3 as a mask, the second dyeing region 4 is dyed, for example, in green O). Next, as shown in FIG. 1 (bl), the first photoresist 3 was completely removed.

A pattern of the second photoresist 5 is formed, and a second dyeing area 6 for red, for example, is dyed using the second photoresist 5 as a mask. Next, as shown in Figure 1 (C1),
The photoresist 5 is completely removed.

forming a pattern of the third photoresist 7;
For example, the third dyeing region 8 of blue (B) is dyed using the Otre 2 store as a mask.

In this conventional color filter manufacturing method, the first
and a step of completely removing the second 7-oto-lens strut 3.5. This step is difficult and takes a long time because it involves removing the photoresist 3.5 of the mask while leaving two dyed resin layers. Or if there is any uncut residue.

This area becomes a dyeing mask during the next dyeing process, causing problems such as uneven dyeing and a significant decrease in yield.

Next, an embodiment of the method for manufacturing a color filter of the present invention will be described using FIGS. 2(a) to (fl).

First, as shown in Fig. 2(a), the CCD type or M
For example, gelatin, PVA is applied to the area excluding the bonding pad and scribe m of the OS type solid-state image sensor substrate 1.
% dichromate is added to casein or the like and exposed to light to form the dyed resin layer 2.

Next, as shown in FIG. 2(b), a pattern of a seventh photoresist 3 is formed. In this case, the first photoresist is a positive resist such as a naphthoquinone-novolac resin (for example, 20 F P'aso).

etc.), or PMIPK (ODUR1013 etc.), P
Use MMA etc. Next, using the first seven photoresists 3 as a mask, dyeing is performed to form a first dyed area 4 of, for example, green O).

Next, as shown in FIG. 2(c), a second photoresist 5 is applied. In this case, the first photoresist 3 and the second 7-year old photoresist 5 are made of the same carbon type resist.

Next, as shown in Figure 2 (dl), UV, or deep
The second 7 by exposing with UV light and developing
The otoresist 3 and the second photoresist 5 are patterned and then dyed using the first and second photoresists 3.5 as masks to form a dyed region 6.

Next, a third photoresist is applied as shown in FIG.

Next, the UV or deep UV
From the trap of exposing and developing using light, 1st and 2nd. Pattern the third photoresist 3,5.7 and then
1st. and second and third 7-oto-renst 3,5.
7 as a mask to form a dyed area 8.

By using the color filter manufacturing method of the present invention, it is possible to form a dyed layer without removing the dyed mask layer, which not only shortens the process, but also removes the photoresist, which is a difficult process. It also has a great effect on improving yields because it eliminates the need for.

[Brief explanation of drawings]

Figure 1 (all C1 is a sectional view of the process order for explaining the conventional color filter manufacturing method, Figure 2 (
al to if) are cross-sectional views in the order of manufacturing steps of an embodiment of the present invention. L: solid-state image sensor substrate, 2: dyed resin layer. 3...First photoresist, 4...
1st dyed area, 5...2nd photoresist, 6...2nd dyed area, 7...3rd
photoresist, 8...Third dyed area. Porridge 1 Figure 2

Claims (1)

[Claims] A step of dyeing a first dyed area in a dyed resin layer on a solid-state image sensor substrate using a first photoresist as a mask, and forming a second photoresist that covers the first seven photoresists and the first dyed area. a step of removing the first and second photoresists on the upper part of the second dyed area by exposure and development; A method for producing a color filter, the method comprising: dyeing a dyed area of the color filter.