JPS6043437B2 - Method for producing azetidinone derivatives - Google Patents
Method for producing azetidinone derivativesInfo
- Publication number
- JPS6043437B2 JPS6043437B2 JP56069688A JP6968881A JPS6043437B2 JP S6043437 B2 JPS6043437 B2 JP S6043437B2 JP 56069688 A JP56069688 A JP 56069688A JP 6968881 A JP6968881 A JP 6968881A JP S6043437 B2 JPS6043437 B2 JP S6043437B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- lower alkyl
- alkyl group
- formula
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- MNFORVFSTILPAW-UHFFFAOYSA-N azetidin-2-one Chemical class O=C1CCN1 MNFORVFSTILPAW-UHFFFAOYSA-N 0.000 title claims description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 18
- -1 2-benzothiazolyl group Chemical group 0.000 claims description 17
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000004104 aryloxy group Chemical group 0.000 claims description 6
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 4
- 239000003115 supporting electrolyte Substances 0.000 claims description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 2
- 235000011054 acetic acid Nutrition 0.000 claims description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- 235000019253 formic acid Nutrition 0.000 claims description 2
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 2
- 235000019260 propionic acid Nutrition 0.000 claims description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 6
- 150000001298 alcohols Chemical class 0.000 description 4
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229930186147 Cephalosporin Natural products 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000003242 anti bacterial agent Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229940124587 cephalosporin Drugs 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 125000000453 2,2,2-trichloroethyl group Chemical group [H]C([H])(*)C(Cl)(Cl)Cl 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 125000003143 4-hydroxybenzyl group Chemical group [H]C([*])([H])C1=C([H])C([H])=C(O[H])C([H])=C1[H] 0.000 description 1
- 229930182555 Penicillin Natural products 0.000 description 1
- JGSARLDLIJGVTE-MBNYWOFBSA-N Penicillin G Chemical compound N([C@H]1[C@H]2SC([C@@H](N2C1=O)C(O)=O)(C)C)C(=O)CC1=CC=CC=C1 JGSARLDLIJGVTE-MBNYWOFBSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- RTEXIPZMMDUXMR-UHFFFAOYSA-N benzene;ethyl acetate Chemical compound CCOC(C)=O.C1=CC=CC=C1 RTEXIPZMMDUXMR-UHFFFAOYSA-N 0.000 description 1
- MDHYEMXUFSJLGV-UHFFFAOYSA-N beta-phenethyl acetate Natural products CC(=O)OCCC1=CC=CC=C1 MDHYEMXUFSJLGV-UHFFFAOYSA-N 0.000 description 1
- 150000001780 cephalosporins Chemical class 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229940049954 penicillin Drugs 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Landscapes
- Cephalosporin Compounds (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Description
【発明の詳細な説明】 本発明は新規なアゼチジノン誘導体の製造法に関する。[Detailed description of the invention] The present invention relates to a novel method for producing azetidinone derivatives.
本発明で得られるアゼチジノン誘導体は文献未載の新規
化合物であり、下記一般式〔1〕で表わされる。
−〔式中R1はアリール低級アルキル基又はアリ
ールオキシ低級アルキル基を示す。The azetidinone derivative obtained in the present invention is a new compound that has not been described in any literature, and is represented by the following general formula [1].
- [In the formula, R1 represents an aryl lower alkyl group or an aryloxy lower alkyl group.
R2はフェニル環上にニトロ基を有することのあるアリ
ール低級アルキル基、フェニル環上にニトロ基を有する
ことのあるアリールオキシ低級アルキル基又はハロゲン
原子を置換基として有することのある低級アルキル基を
示す。R3は低級アルキル基を示す。〕,本発明におい
て、R1で示されるアリール低級アルキル基としては例
えばベンジル基、2−フェニルエチル基、p−ヒドロキ
シベンジル基、p−ニトロベンジル基、p−クロルベン
ジル基等を挙げることができ、またアリールオキシ低級
アルキル基としては例えばフェノキシメチル基、2−フ
ェノキシエチル基、p−ヒドロキシフェノキシメチル基
、p−ニトロフェノキシメチル基等を挙げることができ
る。R2 represents an aryl lower alkyl group that may have a nitro group on the phenyl ring, an aryloxy lower alkyl group that may have a nitro group on the phenyl ring, or a lower alkyl group that may have a halogen atom as a substituent. . R3 represents a lower alkyl group. ], In the present invention, examples of the aryl lower alkyl group represented by R1 include benzyl group, 2-phenylethyl group, p-hydroxybenzyl group, p-nitrobenzyl group, p-chlorobenzyl group, etc. Examples of the aryloxy lower alkyl group include phenoxymethyl group, 2-phenoxyethyl group, p-hydroxyphenoxymethyl group, and p-nitrophenoxymethyl group.
R2で示されるフェニル環上にニトロ基を有することの
あるアリール低級アルキル基としては例えばベンジル基
、p−ニトロベンジル基、ジフェニルメチル基、2−フ
ェニルエチル基、2−(p−ニトロフェニル)エチル基
、3−フェニルプロピル基、3−(p−ニトロフェニル
)プロピル基等を挙げることができ、フェニル環上にニ
トロ基を有することのあるアリールオキシ低級アルキル
基としては例えばフェノキシメチル基、p−ニトロフェ
ノキシメチル基、2−フエノキシエチル基、2−(p−
ニトロフェノキシ)エチル基、3−フェノキシプロピル
基、3−(p−ニトロフェノキシ)プロピル基等を挙げ
ることができ、またハロゲン原子を置換基として有する
ことのある低級アルキル基としては例えばメチル基、エ
チル基、n−プロピル基、イソプロピル基、n−ブチル
基、Tert−ブチル基、2−クロロエチル基、2,2
,2−トリクロロエチル基等を挙げることができる。ま
たR3で示される低級アルキル基としては例えばメチル
基、エチル基、n)−プロピル基、イソプロピル基、n
−ブチル基、Tert−ブチル基等を挙げることができ
る。上記一般式〔1〕で表わされるアゼチジノン誘導体
はペニシリン系、セフアロスポリ7系抗生物質を合成す
るための中間体として有用な化合物で夕ある。例えば下
記反応式に従い本発明の化合物から抗菌剤として有用な
セフアロスポリン系化合物〔■a〕又は〔■b〕に誘導
し得る。〔式中Rl,R汲びR3は前記に同じ。Examples of the aryl lower alkyl group that may have a nitro group on the phenyl ring represented by R2 include benzyl group, p-nitrobenzyl group, diphenylmethyl group, 2-phenylethyl group, 2-(p-nitrophenyl)ethyl Examples of the aryloxy lower alkyl group which may have a nitro group on the phenyl ring include phenoxymethyl group, p- Nitrophenoxymethyl group, 2-phenoxyethyl group, 2-(p-
Examples include nitrophenoxy)ethyl group, 3-phenoxypropyl group, 3-(p-nitrophenoxy)propyl group, and examples of lower alkyl groups that may have a halogen atom as a substituent include methyl group, ethyl group, etc. group, n-propyl group, isopropyl group, n-butyl group, tert-butyl group, 2-chloroethyl group, 2,2
, 2-trichloroethyl group, and the like. Examples of the lower alkyl group represented by R3 include methyl group, ethyl group, n)-propyl group, isopropyl group, n)
-butyl group, tert-butyl group and the like. The azetidinone derivative represented by the above general formula [1] is a compound useful as an intermediate for synthesizing penicillin and cephalosporin 7 antibiotics. For example, a cephalosporin compound [■a] or [■b] useful as an antibacterial agent can be derived from the compound of the present invention according to the following reaction formula. [In the formula, Rl, R and R3 are the same as above.
〕本発明の方法によれば、上記一般式〔1〕で表わされ
るアゼチジノン誘導体は、一般式〔式中R4は2−ベン
ゾチアゾリル基を示す。] According to the method of the present invention, the azetidinone derivative represented by the above general formula [1] can be obtained from the azetidinone derivative represented by the general formula [where R4 represents a 2-benzothiazolyl group].
R1及びR2は前記に同じ。〕で表わされるアゼチジノ
ン誘導体を低級アルコールの存在下に電解処理すること
により製造される。本発明において出発原料として用い
られる一般式〔■〕の化合物は公知の化合物であり、例
えばテトラヘドロンレター3001(1973)に記載
されている方法に従い製造される。R1 and R2 are the same as above. It is produced by electrolytically treating an azetidinone derivative represented by ] in the presence of a lower alcohol. The compound of general formula [■] used as a starting material in the present invention is a known compound, and is produced, for example, according to the method described in Tetrahedron Letter 3001 (1973).
一般式〔■〕て表わされるアゼチジノン誘導体の電解処
理は低級アルコールの存在下に必要な電気量を通電する
ことにより行なわれる。The electrolytic treatment of the azetidinone derivative represented by the general formula [■] is carried out by applying a necessary amount of electricity in the presence of a lower alcohol.
低級アルコールとしては例えばメタノール、エタノール
、プロパノール、イソプロパノール、ブタノール、Te
rt−ブチルアルコール等を挙げることができる。斯か
る低級アルコールは通常溶媒として用いられるが、本発
明では低級アルコールと他の溶媒との混合溶媒を使用す
ることもできる。低級アルコールと混合して用いられる
溶媒としては例えばテトラヒドロフラン、ジエチルエー
テル、ジオキサン等のエーテル類、アセトニトリル、プ
ロビオニトリル等のニトリル類、塩化メチレン、クロロ
ホルム、四塩化炭素、ジクロロエタン等のハロゲン化炭
化水素類又はこれらの混合溶媒等を挙げることができる
。本発明の方法においては反応系内に支持電解質を存在
させるのが好ましい。Examples of lower alcohols include methanol, ethanol, propanol, isopropanol, butanol, Te
Examples include rt-butyl alcohol. Such lower alcohols are usually used as solvents, but in the present invention, mixed solvents of lower alcohols and other solvents can also be used. Examples of solvents used in combination with lower alcohols include ethers such as tetrahydrofuran, diethyl ether, and dioxane; nitriles such as acetonitrile and probionitrile; halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride, and dichloroethane; Mixed solvents of these can be mentioned. In the method of the present invention, it is preferred that a supporting electrolyte be present in the reaction system.
支持電解質としては例えば硫酸、過塩素酸、リン酸等の
鉱酸、p−トルエンスルホン酸、メタンスルホン酸等の
スルホン酸類、ギ酸、酢酸、プロピオン酸等の有機酸等
を挙げることができる。θ 電解反応は、定電位電解及
び定電流電解のいずれでも行うことができる。Examples of the supporting electrolyte include mineral acids such as sulfuric acid, perchloric acid, and phosphoric acid, sulfonic acids such as p-toluenesulfonic acid and methanesulfonic acid, and organic acids such as formic acid, acetic acid, and propionic acid. The θ electrolytic reaction can be performed by either constant potential electrolysis or constant current electrolysis.
電流密度は通常1〜500rr1A/C4の範囲であり
、好ましくは5〜200mA/Cltである。反応に必
要な電気量は、基質濃度、溶媒の種類、電解槽の型状等
によつて一5定しないが、通常2〜50F′/MOlで
よい。電極としては白金、炭素、ステンレス、チタン、
ニッケル等通常使用される電極を使用することができる
。反応温度としては原料及び生成物が分解、変性しない
温度以下であれば特に限定されないが、)−30℃〜6
(代)の範囲で行われ、好ましくは−20〜30℃の範
囲である。電解槽としては、無隔膜電解槽、隔膜電解槽
共に使用することができる。本発明によれば、後記実施
例から明らかなように、目的とする一般式〔1〕で表わ
されるアゼチジノン誘導体を簡便な操作により好収率で
製造し得る。以下実施例を示して説明する。The current density is usually in the range of 1 to 500 rr1A/C4, preferably 5 to 200 mA/Clt. The amount of electricity required for the reaction varies depending on the substrate concentration, the type of solvent, the shape of the electrolytic cell, etc., but is usually 2 to 50 F'/MOl. As electrodes, platinum, carbon, stainless steel, titanium,
Commonly used electrodes such as nickel can be used. The reaction temperature is not particularly limited as long as it is below a temperature at which the raw materials and products do not decompose or denature;
The temperature is preferably -20 to 30°C. As the electrolytic cell, both an electrolytic cell without a diaphragm and an electrolytic cell with a diaphragm can be used. According to the present invention, the desired azetidinone derivative represented by the general formula [1] can be produced in good yield by simple operations, as is clear from the Examples below. Examples will be described below.
実施例1
化合物〔■〕(R1=ベンジル、R2=メチル、R4=
ベンゾチアゾリル)250.3mgをメタノール50m
1に溶解し、濃硫酸0.4m1を加える。Example 1 Compound [■] (R1=benzyl, R2=methyl, R4=
Benzothiazolyl) 250.3 mg in methanol 50 m
1 and add 0.4 ml of concentrated sulfuric acid.
白金電極を装入し(4×3cri)、撹拌下0〜2℃、
騨A/dで2時間電解反応を行う。反応終了後酢酸エチ
ルで抽出し、飽和重曹水、飽和食塩水で洗浄した後無水
硫酸ナトリウムで乾燥する。減圧下溶媒を除去し、残渣
をベンゼンー酢酸エチル(3:1)の溶媒を用いてシリ
カゲルカラムで分離、精製すると、167.9m9の目
的物〔1〕(R1=ベンジル、R2=メチル、R3=メ
チル)を得る。5.16(4S,.4H)、6.71(
DllH)、7.27(S,.5l−[)実施例2
化合物〔■〕(R1=ベンジル、R2=メチル、R4=
ベンゾチアゾリル)50.2m9をメタノール4mt及
びトテラヒドロフラン4.5Tntに溶解し、濃硫酸0
.07mtを加える。Platinum electrodes were charged (4 x 3cri), and the temperature was heated to 0-2°C with stirring.
Electrolytic reaction is carried out for 2 hours at A/d. After the reaction is completed, the mixture is extracted with ethyl acetate, washed with saturated aqueous sodium bicarbonate and saturated brine, and dried over anhydrous sodium sulfate. The solvent was removed under reduced pressure, and the residue was separated and purified on a silica gel column using a solvent of benzene-ethyl acetate (3:1), yielding 167.9 m9 of the target product [1] (R1 = benzyl, R2 = methyl, R3 = methyl). 5.16 (4S, .4H), 6.71 (
DllH), 7.27(S,.5l-[) Example 2 Compound [■] (R1=benzyl, R2=methyl, R4=
50.2 m9 of benzothiazolyl) was dissolved in 4 mt of methanol and 4.5 Tnt of toterahydrofuran, and dissolved in concentrated sulfuric acid 0.
.. Add 07mt.
白金電極を装入し、−14〜−12℃、5n1A/Cl
tで1時間35分電解反応を行う。反応終了後実施例1
と同様の処理を行うと、目的物〔1〕(R1=ベンジル
、R2=メチル、R3=メチル)30.2mgを得る(
収率79%)。訳及びNMRで確認同定した。Insert a platinum electrode, -14 to -12°C, 5n1A/Cl
The electrolytic reaction was carried out at t for 1 hour and 35 minutes. Example 1 after completion of reaction
By performing the same treatment as above, 30.2 mg of the target product [1] (R1 = benzyl, R2 = methyl, R3 = methyl) is obtained (
yield 79%). Identification was confirmed by translation and NMR.
実施例3
化合物〔■〕(R1=ベンジル、R2=メチル、R4=
ベンゾチアゾリル)50.67?!9をメタノール8m
tに溶解し、濃硫酸0.07mtを加え炭素電極を装入
する。Example 3 Compound [■] (R1=benzyl, R2=methyl, R4=
Benzothiazolyl) 50.67? ! 9 with methanol 8m
0.07 mt of concentrated sulfuric acid was added, and a carbon electrode was charged.
0〜2℃、10rnA/Aiで4紛間電解反応を行う。A four-powder electrolytic reaction is performed at 0-2°C and 10rnA/Ai.
反応終了後実施例1と同様の処理を行うと目的物〔1〕
(R1=ベンジル、R2=メチル、R3=メチル)30
.2mgを得る(収率77%)。取及びNMRで確認同
定した。実施例4
化合物〔■〕(R1=ベンジル、R2=メチル、R4=
ベンゾチアゾリル)49.5mgをメタノール8m1に
溶解し、濃硫酸0.07mt1硫酸銅42即を加える。After the reaction is completed, the same treatment as in Example 1 yields the desired product [1]
(R1=benzyl, R2=methyl, R3=methyl) 30
.. Obtain 2 mg (yield 77%). The substance was confirmed and identified by separation and NMR. Example 4 Compound [■] (R1=benzyl, R2=methyl, R4=
Dissolve 49.5 mg of benzothiazolyl in 8 ml of methanol, and add 0.07 ml of concentrated sulfuric acid and 42 ml of copper sulfate.
白金電極を装入し、0〜2℃、10rnA/C7llで
1時間1紛電解反応を行つた。電解中電流方向を(9)
秒毎に変換した。反応終了後実施例1と同様の処理を行
うと目的物〔1〕(R1=ベンジル、R2=メチル、R
3=メチル)32.07m9を得る。(収率?%)■及
びNMRで確認同定した。A platinum electrode was inserted, and a one-powder electrolytic reaction was carried out at 0 to 2° C. and 10 rnA/C7ll for 1 hour. Current direction during electrolysis (9)
Converted every second. After the reaction was completed, the same treatment as in Example 1 was carried out to obtain the target product [1] (R1=benzyl, R2=methyl, R
3=methyl) 32.07 m9 are obtained. (Yield?%) ■Identification was confirmed by NMR.
適当な出発原料を用い実施例1〜4と同様にして下記第
1表記載の化合物を得る。The compounds shown in Table 1 below are obtained in the same manner as in Examples 1 to 4 using appropriate starting materials.
Claims (1)
キシ低級アルキル基を示す。 R^2はフェニル環上にニトロ基を有することのあるア
リール低級アルキル基、フェニル環上にニトロ基を有す
ることのあるアリールオキシ低級アルキル基又はハロゲ
ン原子を置換基として有することのある低級アルキル基
を示す。R^4は2−ベンゾチアゾリル基を示す。〕で
表わされるアゼチジノン誘導体を低級アルコールの存在
下に電解処理して一般式▲数式、化学式、表等がありま
す▼ 〔式中R_3は低級アルキル基を示す。 R^1及びR^2は前記に同じ。〕で表わされるアゼチ
ジノン誘導体を得ることを特徴とするアゼチジノン誘導
体の製造法。 2 支持電解質を用いて電解処理を行なう特許請求の範
囲第1項記載の方法。 3 支持電解質が硫酸、過塩素酸、リン酸、p−トルエ
ンスルホン酸、メタンスルホン酸、ギ酸、酢酸及びプロ
ピオン酸から選ばれた少なくとも1種である特許請求の
範囲第2項記載の方法。 4 電解処理を−70〜80℃にて行なう特許請求の範
囲第1項乃至第3項のいずれかに記載の方法。[Claims] 1 General formula ▲ Numerical formula, chemical formula, table, etc. ▼ [In the formula, R^1 represents an aryl lower alkyl group or an aryloxy lower alkyl group. R^2 is an aryl lower alkyl group that may have a nitro group on the phenyl ring, an aryloxy lower alkyl group that may have a nitro group on the phenyl ring, or a lower alkyl group that may have a halogen atom as a substituent. shows. R^4 represents a 2-benzothiazolyl group. ] The azetidinone derivative represented by the formula is electrolytically treated in the presence of a lower alcohol to form the general formula ▲ Numerical formula, chemical formula, table, etc. ▼ [In the formula, R_3 represents a lower alkyl group. R^1 and R^2 are the same as above. ] A method for producing an azetidinone derivative, the method comprising obtaining an azetidinone derivative represented by the following. 2. The method according to claim 1, wherein the electrolytic treatment is performed using a supporting electrolyte. 3. The method according to claim 2, wherein the supporting electrolyte is at least one selected from sulfuric acid, perchloric acid, phosphoric acid, p-toluenesulfonic acid, methanesulfonic acid, formic acid, acetic acid, and propionic acid. 4. The method according to any one of claims 1 to 3, wherein the electrolytic treatment is carried out at -70 to 80°C.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56069688A JPS6043437B2 (en) | 1981-05-08 | 1981-05-08 | Method for producing azetidinone derivatives |
GB8209646A GB2099817B (en) | 1981-04-10 | 1982-04-01 | Azetidinone derivatives and process for the preparation of the same |
FR8206164A FR2509300B1 (en) | 1981-04-10 | 1982-04-08 | AZETIDINONE DERIVATIVES AND PROCESS FOR THEIR PREPARATION |
DE19823213264 DE3213264A1 (en) | 1981-04-10 | 1982-04-08 | NEW AZETIDINONE COMPOUNDS AND METHOD FOR THE PRODUCTION THEREOF |
US06/865,651 US4689411A (en) | 1981-04-10 | 1986-05-15 | 4-thio azetidinone intermediates and process for the preparation of the same |
US07/071,664 US4784734A (en) | 1981-04-10 | 1987-07-09 | Azetidinone derivatives and process for the preparation of the same |
US07/166,918 US4853468A (en) | 1981-04-10 | 1988-03-11 | Process for the preparation of cephem derivatives |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56069688A JPS6043437B2 (en) | 1981-05-08 | 1981-05-08 | Method for producing azetidinone derivatives |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57185259A JPS57185259A (en) | 1982-11-15 |
JPS6043437B2 true JPS6043437B2 (en) | 1985-09-27 |
Family
ID=13410053
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56069688A Expired JPS6043437B2 (en) | 1981-04-10 | 1981-05-08 | Method for producing azetidinone derivatives |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6043437B2 (en) |
-
1981
- 1981-05-08 JP JP56069688A patent/JPS6043437B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS57185259A (en) | 1982-11-15 |
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