JPS60253115A - Method of producing sn or sn alloy plating conductor - Google Patents
Method of producing sn or sn alloy plating conductorInfo
- Publication number
- JPS60253115A JPS60253115A JP10926484A JP10926484A JPS60253115A JP S60253115 A JPS60253115 A JP S60253115A JP 10926484 A JP10926484 A JP 10926484A JP 10926484 A JP10926484 A JP 10926484A JP S60253115 A JPS60253115 A JP S60253115A
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- flux
- alloy
- hot
- dip plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating With Molten Metal (AREA)
- Non-Insulated Conductors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電気、電子器機の配線や同部品のリード線等に
用いるSn又はSn合金メッキ導体の製造法に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing Sn or Sn alloy plated conductors used for wiring of electrical and electronic equipment, lead wires of the same parts, and the like.
一般に上記配線やリード線には、Cu又はCu合金から
なる導体を用い、配線や組立時の半田付は性を改善し、
かつ耐食性及び耐硫化性を向上する目的で表面にsn又
はSn合金をメッキしている。5n又はSn合金のメッ
キ方法としては溶融メッキ法や電気メツキ法が知られて
いるが、溶融メッキ法は公害発生が少なく、比較的簡単
な設備でメッキを行なうことができるため、Snや5n
合金のような低融点金属のメッキに多用されている。Generally, conductors made of Cu or Cu alloy are used for the wiring and lead wires, and soldering properties during wiring and assembly are improved.
In addition, the surface is plated with sn or Sn alloy for the purpose of improving corrosion resistance and sulfidation resistance. Hot-dip plating and electroplating are known methods for plating 5n or Sn alloys, but hot-dip plating causes less pollution and can be plated with relatively simple equipment.
It is widely used for plating low melting point metals such as alloys.
従来導体にSn又はSn合金を溶融メッキするには、第
2図に示すように所望の導体(a)をサプライボビン(
1)より繰出して長手方向に走行させ、これをガイドロ
ーラ(2a) (2b)・・・(2e)により先ずフラ
ックス槽(3)を通して導体(a)の表面にフラックス
を塗布する。Conventionally, in order to hot-dip plate Sn or Sn alloy on a conductor, the desired conductor (a) is placed on a supply bobbin (
1) The conductor (a) is fed out and run in the longitudinal direction, and flux is first applied to the surface of the conductor (a) through a flux tank (3) using guide rollers (2a), (2b), . . . (2e).
続いてSn又は3n合金の溶融メッキ槽(4)を通して
溶融メッキを施した後、巻取機(5)に巻取っている。Subsequently, after being subjected to hot-dip plating through a Sn or 3N alloy hot-dip plating tank (4), it is wound up on a winder (5).
フラックスには塩化亜鉛と塩酸の混合水溶液を用いるか
又は有機水溶性中性フラックスを用いているが、フラッ
クスを塗布した導体を溶融メッキ槽内に通すと、導体と
溶融金属の濡れが起るまでの間に、フラックス成分と溶
融金属及び空気中の酸素とが反応し、人ωの金属酸化物
を発生Jる。この酸化物の発生量は、例えばメッキ厚さ
が1μ以下の蒲メッキにおいて、導体にメッキする金属
量とほぼ同じ吊となり、酸化物発生による金属ロスが」
ストに及ばず影響が大きい。For the flux, a mixed aqueous solution of zinc chloride and hydrochloric acid or an organic water-soluble neutral flux is used, but when a conductor coated with flux is passed through a hot-dip plating tank, the conductor and the molten metal will become wet. During this process, the flux component reacts with the molten metal and oxygen in the air, generating metal oxides. The amount of this oxide generated is approximately the same as the amount of metal plated on the conductor, for example, when the plating thickness is 1 μm or less, and metal loss due to the generation of oxides.
The impact was greater than the strike.
これを改善するため、溶融金属上を不活性ガスで覆った
り、或いは導体表面を還元し−C表面に何名した油脂や
酸化物を除去し、フラックスを使用せずに溶融メツ4−
16方法が提案され−Cいる。In order to improve this, we covered the molten metal with an inert gas, or reduced the conductor surface to remove the oils and oxides on the surface of the molten metal, and removed the molten metal without using flux.
Sixteen methods have been proposed.
(発明が解決しようとJる問題点)
溶融金属上を不活性ガスで覆ったり、或いは導体表面を
還元りる方法は装置が繁雑化するばかりか、導体表面の
濡れが悪く、品質の劣るメッキ導体どなる等の欠点があ
り、より簡便な方法で酸化物の発生を抑えることができ
る、品質良好な3 r+又は3 n合金メッキ導体の製
造法が強く望まれている。(Problems that the invention seeks to solve) Methods of covering the molten metal with inert gas or reducing the conductor surface not only complicate the equipment, but also cause poor wetting of the conductor surface, resulting in poor quality plating. However, there is a strong desire for a method for manufacturing 3R+ or 3N alloy plated conductors of good quality that can suppress the generation of oxides using a simpler method.
本発明はこれに鑑み種々検討の結果、酸化物の発(しを
抑え、品質良好なメッキを低ヨストで行なうことを可能
にする3 n又はSn合金メツ4−導体の製造法を開発
したもので、C1l又はCu合金からなる導体を長手方
向に走行させて、表面に70〜100℃に保持した右機
水溶性中竹ノラックスを塗イli シた後、3n又は3
n合金の溶融メツ■をに行なうことをv1′fiとりる
bのである。In view of this, as a result of various studies, the present invention has developed a method for manufacturing 3N or Sn alloy metal 4-conductors, which suppresses the generation of oxides and enables high-quality plating to be performed at low cost. A conductor made of C1l or Cu alloy was run in the longitudinal direction, and the surface was coated with water-soluble Nakatake Norax kept at 70 to 100°C, and then 3n or 3
It is assumed that v1'fi is performed to melt the n-alloy.
即ら本発明は第1図に示づように、Cu又はCu台金か
らなる所望導体を1jノシイボビンく1)より繰出して
長手り向に走(jさぜる。これをガイドローラ(2a)
(2b)・・・(2e)により先ずフラックス槽(3
)に通しで導体表面に70・〜100℃に保持したイ4
fl水溶性中性ノラックスを塗布(る。続いてSn又は
S11合金の溶融メッキ槽(4)を通しで導体(a)の
表面に3n又はSO合金を溶融メッキし、これを巻取機
(5)に巻取ることにより、SO又は3n合金メッキ導
体を製造覆るものである。フラックス槽(4)としては
フラックス槽分の蒸発を避けるため、密閉構)告とし、
槽(4)内に設()たヒーター(6)によりフラックス
を70〜 + OO’Cに加熱りることにより、導体(
a )表面に70・〜100″Gに保1?j L/たフ
ラックスを塗イIIツる。That is, in the present invention, as shown in FIG. 1, a desired conductor made of Cu or a Cu base metal is fed out from a nozzle bobbin 1), and is run (rolled) in the longitudinal direction.
(2b)...(2e) first, the flux tank (3
) and held at 70-100℃ on the conductor surface.
fl Water-soluble neutral Norax is applied (.Next, 3N or SO alloy is hot-dip plated on the surface of the conductor (a) through a hot-dip plating tank (4) of Sn or S11 alloy, and this is passed through a hot-dip plating tank (4) of Sn or S11 alloy, and this is passed through a hot-dip plating bath (4) of Sn or S11 alloy. ) to manufacture and cover SO or 3N alloy plated conductors.The flux tank (4) is a closed structure to avoid evaporation of the flux tank content.
The conductor (
a) Apply a flux maintained at 70-100″G to the surface.
Cfl 用〕
フラックスは70・〜100℃に保持されて導体表面に
塗aされるため、溶融メッキ槽に入るまでの間に乾燥が
起り、フラックス成分中の金属酸化物を発生させる余分
な成分が気化し、同時に導体表面を活性化Jる。従って
導体が溶融メッキ槽内に入ると同時に溶融メッキが始ま
り、金属酸化物の発生を抑制して欠陥の少ない品質良好
なSO又は3 n含金メッキ導体が得られる。For Cfl] Since the flux is maintained at 70-100℃ and applied to the conductor surface, it dries before it enters the hot-dip plating bath, and excess components that generate metal oxides in the flux components are removed. It vaporizes and simultaneously activates the conductor surface. Therefore, hot-dip plating starts as soon as the conductor enters the hot-dip plating tank, suppressing the generation of metal oxides, and obtaining a good-quality SO or 3N gold-containing plated conductor with few defects.
しかし−(フラックスの保持温度を70〜100℃と限
定したのは、10°C未満では塗布後、溶融メツに槽に
入るまぐの間にフラックスが完全に乾燥せず、フラック
ス中の金属酸化物を発生させる成分の気化が不十分とな
って金属酸化物の発生を抑制できず、100℃を越える
とフラックスの分解が起り、良好な溶融メッキが得られ
ないIこめ(゛あり、望ましくはフラックスを80〜,
95℃に保持するとよい。However, the reason why the flux holding temperature was limited to 70 to 100°C is because if it is lower than 10°C, the flux will not dry completely during the time it enters the melting tank after application, and metal oxides in the flux will If the temperature exceeds 100°C, the flux will decompose, making it difficult to obtain good hot-dip plating. 80~,
It is best to keep it at 95°C.
(実施例)
線径0,1#15IのCu線を長手/j向に走行さけ、
フラックス槽を通して活f1剤10wt%、界面活性剤
1wt%、有機溶剤5wt%、残部水からなる80℃に
温度制御された中性フラックスを94i シフζ後、2
90℃に温度制御した溶融S t+メツ1浴と絞りダイ
スを通して厚さ 05μの3nメツトをh岨しlこ。(Example) A Cu wire with a wire diameter of 0.1 #15I was run in the longitudinal/j direction,
A neutral flux whose temperature was controlled at 80°C consisting of 10 wt% of active F1 agent, 1 wt% of surfactant, 5 wt% of organic solvent, and the balance water was passed through a flux tank and then sifted for 2 hours.
A 3n metal with a thickness of 0.05μ is made by passing it through a molten ST + metal bath whose temperature is controlled at 90°C and a drawing die.
比較のためフラックスを全く用いない場合と、20℃に
保持したフラックスを塗布した場合について、同様の溶
融S IIメツ−1をに行なった。For comparison, similar melting S II Metsu-1 was carried out in the case where no flux was used and in the case where flux maintained at 20°C was applied.
これ等について溶融メツV浴上の酸化物発イ1吊を測定
すると共に得られた3 nメツ−V19体についてJ
I 5−C−3002に基づく多硫化ナトリウム試験を
行なって黒点発生まひの試験回数をめた。これ等の結果
を第1表に示す。Regarding these, the amount of oxide emitted on the molten Metsu-V bath was measured, and the obtained 3n Metsu-V19 body was J
A sodium polysulfide test according to I5-C-3002 was conducted to determine the number of tests for sunspot paralysis. These results are shown in Table 1.
第 1 表
製 造 法 多硫化ナトリ 錫酸化物発生量ラム試験回
数
本 発 明 法 8 回 30す/hrフラックスなし
1 回 30g/hr20°Cのフラッフ
ス塗イ書1 7 回 240 g/hr第1表から明ら
かなように、本発明法によれば、酸化物の発生量はフラ
ックスなしの場合と同程度に少なく、メッキ導体の品質
は従来の20℃の7ラツクス塗布の場合と同等以上に優
れていることが判る。Table 1 Manufacturing method Sodium polysulfide Amount of tin oxide generated Ram test number Invention method 8 times 30 g/hr No flux 1 time 30 g/hr 20°C fluff coating 1 7 times 240 g/hr 1st As is clear from the table, according to the method of the present invention, the amount of oxide generated is as small as that without flux, and the quality of the plated conductor is superior to that of the conventional 7 lux coating at 20°C. It can be seen that
このように本発明によれば、比較的簡単な設備の溶融メ
ッキにおいて、金属酸化物の発生を抑制し、品質良好な
メッキ導体を低コストで製造することができるもので、
工業上顕著な効果を奏するものである。As described above, according to the present invention, it is possible to suppress the generation of metal oxides in hot-dip plating using relatively simple equipment, and to manufacture plated conductors of good quality at low cost.
This has a remarkable industrial effect.
第1図は本発明製造法の一例を六す説明図、第2図は従
来の製造法の一例を示J説明図である。
a・・・導体
1・・・リプライボビン
2a、 2b〜2e・・・ガイドロール3・・・フラッ
クス槽
4・・・溶融メッキ槽
5・・・巻取機
6・・・ヒーターFIG. 1 is an explanatory diagram showing an example of the manufacturing method of the present invention, and FIG. 2 is an explanatory diagram showing an example of the conventional manufacturing method. a...Conductor 1...Reply bobbin 2a, 2b-2e...Guide roll 3...Flux tank 4...Hot-dip plating tank 5...Winder 6...Heater
Claims (1)
て、表面に10〜100℃に保持した有機水溶性中性フ
ラックスを塗布した後、3n又は3n合金の溶融メッキ
を行なうことを特徴とするSn又はSO合金メッキ導体
の製造法。Sn is characterized by running a conductor made of CLI or Cu alloy in the longitudinal direction, applying an organic water-soluble neutral flux maintained at 10 to 100°C on the surface, and then hot-dip plating with 3n or 3n alloy. Or a method for manufacturing SO alloy plated conductor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10926484A JPS60253115A (en) | 1984-05-29 | 1984-05-29 | Method of producing sn or sn alloy plating conductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10926484A JPS60253115A (en) | 1984-05-29 | 1984-05-29 | Method of producing sn or sn alloy plating conductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60253115A true JPS60253115A (en) | 1985-12-13 |
Family
ID=14505760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10926484A Pending JPS60253115A (en) | 1984-05-29 | 1984-05-29 | Method of producing sn or sn alloy plating conductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60253115A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006511041A (en) * | 2002-12-18 | 2006-03-30 | アゴスチネッリ・パオロ | Electrical conductor |
-
1984
- 1984-05-29 JP JP10926484A patent/JPS60253115A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006511041A (en) * | 2002-12-18 | 2006-03-30 | アゴスチネッリ・パオロ | Electrical conductor |
JP4914009B2 (en) * | 2002-12-18 | 2012-04-11 | アゴスチネッリ・パオロ | Electrical conductor |
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