JPS60242561A - Manufacture of negative pressure type magnetic head slider - Google Patents

Abstract

PURPOSE:To improve manufacture yield by forming a mask material film for the formation of a negative pressure generating recesses part to be adhered to the surface of a slider forming substrate which goes to a slide surface by an ion plating method. CONSTITUTION:A nonmagnetic block body 21 of, for example, photoserum is coated with a nonmagnetic protection film of SiO2, etc., thickly, numbers of thin-film magnetic head elements 22 are formed, and the block body is cut and polished to have a finished plane, thus obtaining a slide base material. Then, the mask material film 25 of Cr, etc., is adhered as a mask material for the formation of the negative pressure generating recessed part to the surface 24 of a plural-head-element structure 23 as the slider surface by the ion plating method, etc. Then, the mask material film 25 is patterned to form the mask 26 for forming the negative pressure generating recesses part, the surface 24 is etched to specific depth, and the mask 26 is removed to form the negative pressure generating recesses part 27. Further, the slider surface 24 is polished flatly and the structure 23 is cut and separated into unit head element structures, thereby obtaining the head slider 28 which has no etching defect at the tip edge part of a thin-film magnetic head element as part of a slider side rail surface.

Description

Detailed Description of the Invention: fat Technical Field of the Invention The present invention relates to a method for manufacturing a floating negative pressure type magnetic heald slider used in a magnetic disk drive, and in particular to a method for manufacturing a negative pressure generating recess of a magnetic hent slider by etching. The present invention relates to a manufacturing method that makes it possible to prevent etching defects in edge portions around the slider surface and to obtain a magnetic hent slider having highly accurate negative pressure generating recesses.

Background of the Technology As is well known, the mainstream of magnetic head sliders for magnetic disk devices is a tapered/flat type positive pressure magnetic head slider that uses only positive pressure. However, since the air film rigidity of this positive pressure type magnetic head slider is approximately proportional to the pressing force applied to the slider, there is a certain limit to increasing the rigidity in a constant load head. Especially CS S (Contact 5tart 5t
In devices adopting the op) method, the load cannot be increased in terms of wear resistance, making it difficult to realize a magnetic hent slider with high air film rigidity and good flying height tracking characteristics.

From this point of view, in recent years, instead of relying only on positive pressure to float a magnetic slider, negative pressure has been generated by providing a reverse stepped surface within the sliding surface of the slider, and the suction force of the negative pressure has been applied to the floating magnetic slider. The development of so-called negative pressure magnetic hent sliders, which are designed to improve the flying height tracking characteristics by acting as a load, are actively underway.

(C1 Prior Art and Problems By the way, the conventional method for obtaining the negative pressure type magnetic hent slider described above is to first use photoceram as the slider base material,
Or alumina/titanium carbide (8Q203/Ti
c) A large number of thin-film magnetic head elements in which a non-magnetic block body consisting of the above is coated with a thick protective film of high hardness and non-magnetic material such as SjO'2 or Al2O2 using a thin-film formation technique and a photolithography technique. After forming the head element component block, the head element constituting block is cut into flat plates by a cutting means in units of a predetermined number of thin film magnetic head elements, and the cut surfaces are polished to a flat surface finish.

Next, chromium (Cr) or titanium (Tj
) or the like is deposited by sputtering or the like, and the mask material film is patterned to form a mask for forming negative pressure generating recesses. Next, the surface to be the slide surface is etched to a predetermined depth by ion milling through the mask to form a negative pressure generating recess.

Next, the mask for forming the negative pressure generating recesses is removed by, for example, polishing, and the surface that is to become the slider surface is polished flat, and then the multiple head element structure is cut and separated into each unit into gutter element structures. The desired negative pressure type magnetic hent slider is completed.

However, in the above-mentioned manufacturing method, as shown in FIG.
In addition, chromium (Cr) is used as a mask material for ion milling.
), or because a vacuum evaporation method, a sputtering method, etc. is used to deposit the mask material film 4 made of titanium (Ti), the mask material deposited on the surface 3 that is to become the slider surface. The edge portion of the film 4 is formed thinner than the other portions, and as a result, the thickness of the mask material film 4 becomes non-uniform.

Therefore, after that, the mask material film 4 is patterned to form a negative pressure generating recess forming mask 5, and the surface 3 which is to become the slider surface is subjected to ion milling through the negative pressure generating recess forming mask 5. Etched negative pressure generating recess 6
As shown in FIG. 2, the edge portion A including the tip gear portion of the thin film magnetic head element 2, which becomes a part of the slider site rail surface of the multiple head element assembly 1, is unnecessarily etched. There were some drawbacks.

This phenomenon is due to the fact that when etching is performed using the ion milling method, not only the intended surface to be etched but also the mask material film 4 for ion milling is slightly etched, and the etching rate increases at the edge portions. It is.

(dl Purpose of the Invention The present invention has been made in view of the above-mentioned conventional situation, when forming a mask material film for ion milling on the surface that is to become the slider surface of a multiple head element structure. A mask material film for ion milling is formed using a forming method that allows the film to be selectively thicker at the edge than at other parts, thereby eliminating etching defects at the edge when forming the negative pressure generating recess. It is an object of the present invention to provide a method for manufacturing a negative pressure type magnetic head slider in which a slider surface having a negative pressure generating recess is formed with high precision while preventing the above problems, thereby improving the manufacturing yield.

(According to the present invention, the structure and purpose of the present invention is to form a negative pressure generating recess on the surface of the non-magnetic slider forming substrate on which a thin film coated with a protective film is formed. A negative pressure type magnetic slider in which a mask material film is deposited, the mask material layer is patterned into a predetermined pattern, and then a negative pressure generating recess is formed by machining/notching means using the mask pattern as a mask. In the manufacturing method, the mask material film for forming the negative pressure generating recesses, which is applied to the surface of the slider forming substrate that is to become the sliding surface, is formed by ion blating, electroplating, or ion blating and electroplating. This is achieved by providing a method for manufacturing a negative pressure magnetic hent slider, which is characterized in that it is formed by a combined method.

(fl Embodiments of the Invention Below, embodiments of the present invention will be described in detail with reference to the drawings.

3 to 6 are perspective views showing one embodiment of a method for manufacturing a negative pressure magnetic head slider according to the present invention in the order of steps.

First, as shown in Fig. 3, for example, photoceram, which becomes the slider base material, or alumina titanium carbide (8Q2
On the non-magnetic block body 21 made of
Si using thin film formation techniques and photolithography techniques
After forming a large number of thin film magnetic head elements 22 thickly coated with a highly hard and non-magnetic protective film such as O2 or AP203, the head element constituent block body 21 is cut into a predetermined flat thin film by cutting means. It is cut into units of the number of magnetic head elements, and the cut surfaces are polished and finished.

Next, as shown in FIG. 4, on the surface 24 that is to become the slider surface of the multiple head element assembly 23, which has been subjected to surface polishing,
A mask material film 25 made of chromium (Cr) or titanium (Ti), which is a mask material for forming negative pressure generating recesses (for ion milling), is formed using an ion blasting method, an electroplating method (vapor deposition method, or a sputtering method). The ion blating method and electroplating method are different in terms of operation from forming a film in a vacuum or gas atmosphere, and forming a film in an electrolytic solution. , since both films are formed in an electric field, the adhesion to the substrate,
The mask material It! has good uniformity and good coverage, and in addition, the electric field is concentrated on the edge A of the substrate, and the mask material It! J25 is formed thickly so that it partially bulges.

After that, the mask material film 25 is patterned to form a mask 26 for forming a negative pressure generating recess, and then the surface 24 to be the slide surface is etched to a predetermined depth by ion milling through the mask 26. Even if the etching rate for the edge portion A increases, etching defects as in the prior art will not occur.

Thereafter, the mask 26 is removed by polishing, for example, to form a negative pressure generating recess 27 as shown in FIG.

Next, the surface 24 that is to become the slider surface is polished flat, and the multiple head element structure 23 on which the four negative pressure generating parts 27 are formed is cut and separated into each unit head element structure, as shown in FIG. As shown in the figure, there is no etching defect in the edge portion including the tip gear 7 of the thin film magnetic hand element 22 which becomes a part of the slider site rail surface, and a desired negative pressure generating recess 27 with good machining accuracy is obtained. A pressure-type magnetic hent slider 28 can be obtained.

In the above-mentioned embodiment, chromium (for ion milling) is applied to the surface 24 of the multiple head element structure 23 which is to become the slider surface.
Mask material film 2 made of Cr), titanium (Ti), etc.
5 is deposited to a predetermined thickness by the ion blating method or the electroplating method.
If the mask material film 25 is non-conductive, it is not possible to directly apply the mask material film 25 by electroplating, so conventionally vapor deposition or sputtering is used in combination, but it is also possible to use it in combination with ion blating. If implemented properly, it will be extremely effective.

(a) Effects of the Invention As is clear from the above explanation, according to the method for manufacturing a negative pressure type magnetic hent slider according to the present invention, when forming a negative pressure generating recess by ion milling, the surface that is to become the slider surface is Etching defects on the edge near the tip gap of the thin film magnetic head element, which becomes part of the site rail surface, can be reliably eliminated, and the tip gap length of the thin film magnetic head with high precision and the desired negative pressure generating recess can be achieved. It has the advantage that a pressure-type magnetic hent slider can be easily obtained, and when applied to the production of this type of negative-pressure type magnetic hent slider, excellent effects can be achieved.

[Brief explanation of the drawing]

1 to 2 are perspective views of main parts for explaining a conventional negative pressure type magnetic hent slider manufacturing method, and FIGS. 3 to 6
The figure is a perspective view showing an example of the method for manufacturing a negative pressure type magnetic hent slider according to the present invention in the order of steps, and FIG. FIG. In the drawing, 21 is a non-magnetic block, 22 is a large number of thin film magnetic head elements, 24 is a surface to be a slider surface, 25 is a mask material film for forming negative pressure generating recesses, and 26 is a mask for forming negative pressure generating recesses. , 27 is a negative pressure generating recess, and 28 is a negative pressure type magnetic rad slider. Figure 1 Figure 2 Figure 3 Figure 4 Figure 6! XI Figure 7

Claims (1)

[Claims] A mask material film for forming negative pressure generating recesses is deposited on the surface of the non-magnetic slider forming substrate on which a thin film magnetic head covered with a protective film is formed, and the mask material layer is formed in a predetermined pattern. In the method for manufacturing a negative pressure type magnetic hent slider, in which a negative pressure generating recess is formed by etching using the mask pattern as a mask, the negative pressure applied to the surface of the slider forming substrate that is to become the sliding surface. A method for manufacturing a negative pressure magnetic hent slider, characterized in that a mask material film for forming the generated recesses is formed by an ion blating method, an electroplating method, or a method using a combination of an ion blating method and an electroplating method.