JPS60230629A - illumination optical device - Google Patents
illumination optical deviceInfo
- Publication number
- JPS60230629A JPS60230629A JP59086669A JP8666984A JPS60230629A JP S60230629 A JPS60230629 A JP S60230629A JP 59086669 A JP59086669 A JP 59086669A JP 8666984 A JP8666984 A JP 8666984A JP S60230629 A JPS60230629 A JP S60230629A
- Authority
- JP
- Japan
- Prior art keywords
- light source
- optical path
- secondary light
- path difference
- prism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
- G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B2006/0098—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings for scanning
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0043—Inhomogeneous or irregular arrays, e.g. varying shape, size, height
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
(発明の技術分野)
本発明は高輝度でしかも均一な照明を行い得る照明装置
に関する。DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to a lighting device capable of providing high brightness and uniform illumination.
(発明の背景)
従来、半導体の製造に用いられるフォトリゾグラフィー
を行うための装置として、プロキシミティ方式や投影露
光方式が知られており、特に縮小投影型露光装置は超L
SIの製造には不可欠となってきている。これらフォト
リゾグラフィーを行うための装置においては、高い輝度
でしかも均一な照明を行う必要があり、一般には超高圧
水銀灯が用いられ、その集光には楕円反射鏡が用いられ
ている場合が多い。しかしながら、最近は超LSIの一
層の高集積化が望まれてきており、照明の均一性のみな
らずより高輝度の照明が必要となってきいてる。高輝度
の光源として従来よりレーザーが知られているが、レー
ザーは強い干渉性をもつため照明物体面上にて干渉縞を
形成し、均一な照明には不利であった。(Background of the Invention) Conventionally, proximity method and projection exposure method have been known as devices for performing photolithography used in semiconductor manufacturing.
It has become essential for the production of SI. In the equipment used to perform these photolithography, it is necessary to provide high brightness and uniform illumination, and an ultra-high pressure mercury lamp is generally used, and an elliptical reflector is often used to collect the light. . However, recently there has been a demand for even higher integration of VLSIs, and not only uniform illumination but also higher luminance illumination is required. Lasers have long been known as high-intensity light sources, but since lasers have strong coherence, they form interference fringes on the surface of the illuminated object, which is disadvantageous for uniform illumination.
(発明の目的)
本発明の目的は、レーザー等のコヒーレント光源を用い
ながら、均一性に優れた照明を行い得る照明光学装置を
提供することにある。(Objective of the Invention) An object of the present invention is to provide an illumination optical device that can perform illumination with excellent uniformity while using a coherent light source such as a laser.
(発明の概要)
本発明による照明光学装置は、コヒーレント光源と該コ
ヒーレント光源から供給される光束から複数の二次光源
を形成するための二次光源形成部材を設け、該コヒーレ
ント光源と該二次光源形成部材との間に、各二次光源に
対応する光路の光路長に対して互いに光路差を)与える
ための光路差生起部材を設けたものである。即ち、コヒ
ーレント光源から複数の二次光源を形成するに際して、
各二次光源を形成する光束の光路に部分的な光路差を与
え、複数の二次光源からの光束が被照明物体面上にて互
いに干渉しない状態とし、これらの複数の二次光源によ
って実質的にインコヒーレントな面光源を形成するもの
である。このために、具体的にはコヒーレント光源から
の光束を複数の光路−に分離して所定位置の二次光源面
上へ導き、各光路ごとに光路長を変化させ、この光路長
差を可干渉距離よりも大きくしている。(Summary of the Invention) An illumination optical device according to the present invention is provided with a coherent light source and a secondary light source forming member for forming a plurality of secondary light sources from a luminous flux supplied from the coherent light source. An optical path difference generating member is provided between the secondary light source and the light source forming member to provide an optical path difference to the optical path length of the optical path corresponding to each secondary light source. That is, when forming a plurality of secondary light sources from a coherent light source,
A partial optical path difference is given to the optical path of the light beams forming each secondary light source, so that the light beams from the plurality of secondary light sources do not interfere with each other on the surface of the object to be illuminated. This forms an incoherent surface light source. For this purpose, specifically, the light beam from the coherent light source is separated into multiple optical paths and guided onto the secondary light source surface at a predetermined position, the optical path length is changed for each optical path, and this optical path length difference is made into a coherent light source. It is larger than the distance.
第1図は上記のごとき本発明の原理を示す概略構成図で
ある。コヒーレント光源(10)から供給されるコヒー
レントな平行光束は、光路差生起部材としての階段プリ
ズム(3)を透過した後、レンティキュラーレンズ(4
)によってその射出面近傍に複数の二次光源(1°)を
形成する。そして、コンデンサーレンズ(5)によって
複数の二次光源からめ光束が物体面(6)を重畳的に照
明する。コヒーレント光源(10)は点光源(1)が正
レンズ(2)によってコリメートされた状態と等価であ
るため、便宜上点光源として図示した。図示したレンテ
ィキュラーレンズ(4)は例として8個のレンズブロッ
クが並列配置されて構成されており、各レンズブロック
により8個の二次光源が形成される。そして、階段プリ
ズム(3)はレンティキュラーレンズ(4)の各レンズ
ブロックに対応する光路ごとに異なる光路長を生ずるべ
く、8つの段を有しており、8個の二次光源に対してそ
れぞれ光路差を生ずるものである。FIG. 1 is a schematic diagram showing the principle of the present invention as described above. A coherent parallel light flux supplied from a coherent light source (10) passes through a step prism (3) as an optical path difference generating member, and then passes through a lenticular lens (4).
) to form a plurality of secondary light sources (1°) near the exit surface. Then, a condenser lens (5) illuminates the object surface (6) with light beams from a plurality of secondary light sources in a superimposed manner. Since the coherent light source (10) is equivalent to a point light source (1) collimated by a positive lens (2), it is illustrated as a point light source for convenience. The illustrated lenticular lens (4) is configured by, for example, eight lens blocks arranged in parallel, and each lens block forms eight secondary light sources. The step prism (3) has eight steps to produce a different optical path length for each optical path corresponding to each lens block of the lenticular lens (4), and has eight steps for each of the eight secondary light sources. This creates an optical path difference.
ここで、点光源(1)から二次光源の任意の1点iまで
の光路長を21とし、この二次光源上の1点iから物体
面(6)上の任意の点Pまでの光路長をzi+とする。Here, the optical path length from the point light source (1) to any one point i on the secondary light source is 21, and the optical path from one point i on this secondary light source to any point P on the object plane (6) Let the length be zi+.
物体面上の点Pは複数の二次光源の各々から照明されて
いるので、二次光源上の点iと異なる他の任意の点jに
ついて同様に、点光源(1)からの光路長を7!j、物
体面上の点Pまでの光路長をlj゛とするとき、二次光
源(1゛)上の2点i及びjを通って物体面上の点Pに
達する各光路の光路差Δ!は、
ΔIt= (j!i +ni’) (7!j +Nj”
)(1)と表わされる。この光路差Δlがコヒーレント
光源からの光によって定まる可干渉距離りより大きい場
合には、二次光源上の1対の点i及びjからの光束によ
っては、物体面上の点Pにおいては干渉が起こらない。Since point P on the object plane is illuminated by each of the plurality of secondary light sources, similarly, for any other arbitrary point j that is different from point i on the secondary light source, calculate the optical path length from point light source (1). 7! j, and when the optical path length to point P on the object plane is lj゛, the optical path difference Δ of each optical path passing through two points i and j on the secondary light source (1゛) and reaching point P on the object plane is ! is, ΔIt= (j!i +ni') (7!j +Nj"
)(1). If this optical path difference Δl is larger than the coherence distance determined by the light from the coherent light source, the light beams from the pair of points i and j on the secondary light source will not interfere at point P on the object plane. It won't happen.
従って、二次光源上の任意の2点i、jに対して、また
照明物体領域上での任意の点Pに対して、
l (j!i +βi’) (j!j +1j’) l
>t、(2)の条件を満たす場合に照明物体領域上での
干渉縞の形成を避けることが可能である。Therefore, for any two points i and j on the secondary light source, and for any point P on the illumination object region, l (j!i + βi') (j!j +1j') l
>t, it is possible to avoid the formation of interference fringes on the illuminated object region if the condition (2) is satisfied.
いま、二次光源上で隣接する1対の点をi、jとするこ
ととして、上記(1)式を書き換えれば、光路差Δlは
Δ2 =、 (βi−1!、j) + (Ili’−A
!j’)と表わされる。ここで、この右辺第1項は階段
プリズム(3)によって生ずる光路差に対応しているの
で、いま、階段プリズム(3)の各段差をSとすると、
これによって生ずる光路差は、階段プリズムの屈折率を
nとして(n−1) ・S と表わされ、
(Ji −j!j ) = (n−1) ・Sとなる。Now, assuming that a pair of adjacent points on the secondary light source are i and j, and rewriting the above equation (1), the optical path difference Δl is Δ2 =, (βi-1!, j) + (Ili' -A
! j'). Here, the first term on the right side corresponds to the optical path difference caused by the step prism (3), so if each step of the step prism (3) is S, then
The optical path difference caused by this is expressed as (n-1).S, where n is the refractive index of the step prism, and (Ji -j!j) = (n-1).S.
またレンティキュラーレンズ(4)の各レンズブロック
の間隔をdlその開口数をNAとするならば、二次光源
から被照明物体の周縁までの光路差は、d−N^ と表
わされ、
(j2’i’−63’) =d −N^となる。尚、レ
ンティキュラーレンズ(4)の開口数N^は、その射出
角を2θとすれば、sinθで定義される。 従って、
(2)式の条件は、1 (n−1)−3+d−NAI>
L
となる。よって、光路差生起部材としての階段プリズム
により生ずべき各光路に対する光路差は、(n−1)
・S > d−N^+L(3)と与えられる。Furthermore, if the distance between each lens block of the lenticular lens (4) is dl and the numerical aperture is NA, then the optical path difference from the secondary light source to the periphery of the illuminated object is expressed as d-N^, ( j2'i'-63') = d - N^. Note that the numerical aperture N^ of the lenticular lens (4) is defined as sin θ, assuming that its exit angle is 2θ. Therefore,
The condition of equation (2) is 1 (n-1)-3+d-NAI>
It becomes L. Therefore, the optical path difference for each optical path that should be generated by the step prism as the optical path difference generating member is (n-1)
・It is given as S > d-N^+L (3).
そして、mヶだけ離れたプリズムブロックに対しては、
(n−1) ・m−3> m−d−NA+Lを満足する
ことが必要であるが、この条件は(3)式を満たしてい
れば必然的に満足されることが明らかである。For prism blocks that are spaced apart by m, it is necessary to satisfy (n-1) ・m-3> m-d-NA+L, but this condition must satisfy equation (3). It is clear that this is necessarily satisfied.
上記の条件は厳密に満たされることが望ましいが、レン
ティキュラーレンズによって多数の二次光源が形成され
る場合には、被照明物体領域上の任意の点において、二
次光源上の1対又は数対の点による干渉縞が形成されて
も、全体としての光強度に対して弱いため、実用上はほ
ぼ十分な均一照明が可能である。この場合には、二次光
源上のい(つかの対によって生ずる物体面上での干渉縞
の位置が、照明領域中でランダムになっていれば良い。Although it is desirable that the above conditions be strictly met, if a large number of secondary light sources are formed by a lenticular lens, one or more secondary light sources may be Even if interference fringes are formed by a pair of points, they are weak compared to the overall light intensity, so that practically sufficient uniform illumination can be achieved. In this case, it is only necessary that the positions of the interference fringes on the object plane generated by the pairs of lights on the secondary light source are random in the illumination area.
そして、このような構成によれば、光路差生起部材によ
る最長光路と最短光路との差を比較的小さくできるので
、光路差生起部材をコンパクトに構成することが可能に
なる。According to such a configuration, the difference between the longest optical path and the shortest optical path caused by the optical path difference generating member can be made relatively small, so that the optical path difference generating member can be configured compactly.
尚、可干渉距離の詳細については、Max Born&
Emit Wolf著 Pr1ncfples of
0ptics (第4版) 7.5.8.(p 31
6〜323)Pergamon Press、0xfo
rd。For details on the coherence distance, please refer to Max Born&
Written by Emit Wolf Pr1ncfples of
0ptics (4th edition) 7.5.8. (p 31
6-323) Pergamon Press, Oxfo
rd.
1970 に記載されており、コヒーレント光源から供
給される光束の中心波長をλ、波長幅をΔλとするとと
き、可干渉距離りは、
L−λ2/Δλ (4)
で与えられる。1970, where the center wavelength of the light beam supplied from the coherent light source is λ and the wavelength width is Δλ, the coherence length is given by L−λ2/Δλ (4).
(実施例)
以下、本発明を図示した実施例に基づいて説明する。第
2図は、本発明による照明光学装置を、半導体製造用の
縮小投影型露光装置に応用した実施例の概略構成図であ
る。コヒーレント光源(10)からの平行光束は光路差
生起部材としての階段プリズム(30)を透過し、レン
ティキュラーレンズ(40)に達し、ここで複数の二次
光源(11)が形成される。二次光源(11)からの光
束は、コンデンサーレンズ(50)によって被照明物体
としてのレチクルRへ導かれ、レチクルRを照明する。(Example) Hereinafter, the present invention will be described based on illustrated examples. FIG. 2 is a schematic diagram of an embodiment in which the illumination optical device according to the present invention is applied to a reduction projection type exposure device for semiconductor manufacturing. The parallel light beam from the coherent light source (10) passes through the step prism (30) as an optical path difference generating member and reaches the lenticular lens (40), where a plurality of secondary light sources (11) are formed. The light beam from the secondary light source (11) is guided to the reticle R as an object to be illuminated by a condenser lens (50), and illuminates the reticle R.
そして、レチクルR上に形成されている所定のパターン
は投影対物レンズ(12)によってウェハW上に投影さ
れる。二次光源(11)の像(11’)がコンデンサー
レンズ(50)によって、投影対物レンズ(12)の入
射瞳上に、即ち図示したごとく、対物レンズ(12)の
絞り(12a)の位置に形成され、所謂ケーラー照明が
なされている。図中には、レチクルRとウェハWとの共
役関係を示す光線を実線で、また、二次光源の共役関係
を示す光線を点線で記した。The predetermined pattern formed on the reticle R is then projected onto the wafer W by a projection objective lens (12). The image (11') of the secondary light source (11) is placed by the condenser lens (50) onto the entrance pupil of the projection objective (12), i.e. at the aperture (12a) of the objective (12) as shown. This is called Koehler illumination. In the figure, the light rays showing the conjugate relationship between the reticle R and the wafer W are shown as solid lines, and the light rays showing the conjugate relationship of the secondary light source are shown as dotted lines.
ここで、光路差生起部材としての階段プリズム(30)
は屈折率n = 1.5 で、段差の値は4.0II1
mである。コヒーレント光源(10)としては、エキシ
マレーザ−の一つで高出力高効率の希ガスハライドレー
ザー(XeC1)を用いるものとする。Here, a staircase prism (30) as an optical path difference generating member
has a refractive index n = 1.5, and the step value is 4.0II1
It is m. As the coherent light source (10), a rare gas halide laser (XeC1), which is one of the excimer lasers and has high output and high efficiency, is used.
このXeC1希ガスハライドレーザーは、中心波長λ−
308nm波長幅Δλ=0.5nWlのコヒーレント光
束を供給するものである。従って、このコヒーレント光
束の可干渉距離りは(4)式によってほぼ0゜2mmで
ある。また、レンティキュラーレンズ(40)の開口数
NAが0.2 で各レンズブロックの間隔が6.01で
あるとすると、(3)式の条件で与えられる階段プリズ
ム(30)の光路差の最小値は1 、4++onとなる
。従って、段差プリズム(40)によって生ずる光路差
、
(1,5−1) X 4.Omn+= 2.0 mmは
、条件(3)で与えられる光路差の最小値よりもかなり
大きく、レチクルR上に何等干渉縞を形成することなく
極めて均一な照明を行うことが可能である。This XeC1 rare gas halide laser has a center wavelength λ-
It supplies a coherent light beam having a wavelength width of 308 nm and a wavelength width Δλ=0.5 nWl. Therefore, the coherence length of this coherent light beam is approximately 0.degree. 2 mm according to equation (4). Furthermore, assuming that the numerical aperture NA of the lenticular lens (40) is 0.2 and the interval between each lens block is 6.01, the minimum optical path difference of the step prism (30) given by the condition of equation (3) is The value is 1, 4++on. Therefore, the optical path difference caused by the step prism (40) is (1,5-1)X4. Omn+=2.0 mm is considerably larger than the minimum value of the optical path difference given by condition (3), and it is possible to perform extremely uniform illumination without forming any interference fringes on the reticle R.
上記の説明では、簡単のためにレンティキュラーレンズ
(40)についても、階段プリズム(30)についても
3次元的構成には触れなかったが、実用上は、例えば第
3図の斜視図に示す如き構成の階段プリズム(31)を
用い、レンティキュラーレンズも3次元的に配列された
ものを用いる必要がある。第3図に示した階段プリズム
(31)は、長さの異なる12個の四角柱プリズム(3
18〜311)によって構成され、最も短い四角柱プリ
ズム(31a)から最も長い四角柱プリズム(31A
)までが長さがSだけ増しながら順に配列されている。In the above explanation, for the sake of simplicity, neither the three-dimensional structure of the lenticular lens (40) nor the step prism (30) was mentioned, but in practice, for example, as shown in the perspective view of FIG. It is necessary to use a step prism (31) of the configuration and also use lenticular lenses arranged three-dimensionally. The staircase prism (31) shown in Fig. 3 consists of 12 square prisms (31) of different lengths.
18 to 311), from the shortest rectangular prism (31a) to the longest rectangular prism (31A).
) are arranged in order with their lengths increasing by S.
第2図との対応では、第3図の上方が入射光側であり、
下方が射出光側であるが、光路差生起部材としては、そ
の表裏は関係なく、レンティキュラーレンズの個々のレ
ンズブロックの光路に対して、階段プリズムの各四角柱
プリズムが配置されることが重要である。In correspondence with Fig. 2, the upper part of Fig. 3 is the incident light side,
The lower side is the exit light side, but as an optical path difference generating member, it is important that each square prism of the stepped prism is placed with respect to the optical path of each lens block of the lenticular lens, regardless of whether it is front or back. It is.
第3図の階段プリズム(31)は四角柱プリズムの長さ
の分布に偏りがあるため、プリズムでの光の吸収によっ
て照明むらを生ずる恐れがあり、これを避けるためには
、各四角柱プリズムの配列に長さのかたよりが少なくな
るようにすることが必要である。この例の階段プリズム
(31”)を示した平面図が第4図であり、図中の数字
は各四角柱プリズムの長さの順序を表わしている。即ち
この場合には最も長い四角柱プリズムから順に1つ置き
に配置し、最も長い四角柱プリズムと最も短い四角柱プ
リズムとが隣接するように配列して、光路差生起部材全
体として長さの均一化を図ったものである。第3図及び
第4図に示した階段プリズムの例では、共に断面形状が
四角形の柱状プリズムブロックを束ねたものとしたが、
これは一般にレチクルR上に形成される投影パターンが
矩形であるためであり、矩形領域の照明に有効である。In the staircase prism (31) shown in Figure 3, the length distribution of the square prisms is uneven, so there is a risk of uneven illumination due to absorption of light in the prism. It is necessary to make the array have less variation in length. FIG. 4 is a plan view showing the step prism (31") of this example, and the numbers in the figure represent the order of the length of each square prism. In this case, the longest square prism The prisms are arranged every other time in order from 1 to 3, and the longest rectangular prisms and the shortest rectangular prisms are arranged adjacent to each other, so that the length of the optical path difference generating member as a whole is made uniform.Third. In the example of the step prism shown in Fig. 4 and Fig. 4, columnar prism blocks with a rectangular cross section are bundled together.
This is because the projection pattern formed on the reticle R is generally rectangular, and is effective for illuminating a rectangular area.
第5図の平面図に示した階段プリズム(31”)の例で
は、それぞれ断面形状が扇形の柱状プリズムを長いもの
を中心として順次螺旋状に配列したものであり、図中の
数字は各柱状プリズムの長さの順序を表わしている。こ
の場合には、一般的に回転対象に構成される光学系に合
わせて、光路差生起部材もほぼ回転対象となっており、
しかも比較的高輝度の光束が存在する中心部に長い柱状
プリズムを配置しているため、均一照明にはより有効で
ある。In the example of the step prism (31") shown in the plan view of Fig. 5, columnar prisms each having a fan-shaped cross section are arranged in a spiral shape with the longer one at the center, and the numbers in the figure indicate each columnar prism. It represents the order of the lengths of the prisms. In this case, the optical path difference generating member is also almost rotationally symmetrical in accordance with the optical system that is generally configured to be rotationally symmetrical.
Furthermore, since a long columnar prism is placed in the center where a relatively high-intensity light beam exists, it is more effective for uniform illumination.
さて、上記の実施例では光路差生起部材とレンティキュ
ラーレンズとを分離して配置したが、これらを一体とす
ることも可能である。第6図はその例を示す側面図であ
り、階段プリズム(32)の入射面(32B>は階段上
に形成されており、射出面(32b)には階段プリズム
の各プリズムブロックに対応して正レンズ作用を持つレ
ンティキュラーレンズが形成されている。Now, in the above embodiment, the optical path difference generating member and the lenticular lens are arranged separately, but it is also possible to integrate them. FIG. 6 is a side view showing an example of this, in which the entrance surface (32B> of the staircase prism (32) is formed on the staircase, and the exit surface (32b) has a shape corresponding to each prism block of the staircase prism (32). A lenticular lens with positive lens action is formed.
また、光路差生起部材としては、上述の如きプリズムに
限らず、第7図の側面図のようにオプティカルファイバ
ー(33)を用いることもできる。Furthermore, the optical path difference generating member is not limited to the above-mentioned prism, but an optical fiber (33) as shown in the side view of FIG. 7 can also be used.
図示した例では、その入射面(33a)と射出面(33
b)とを共に平面として各ファイバー束の長さが必要な
光路差に応じて変えられている。光路差を生ずるために
は、プリズムの長さばかりではなく屈折率の異なる光学
材料にて各プリズムブロックを構成することもできる。In the illustrated example, the entrance surface (33a) and the exit surface (33
(b) and (b) are both planes, and the length of each fiber bundle is changed according to the required optical path difference. In order to create an optical path difference, each prism block can be made of optical materials with different refractive indexes as well as prism lengths.
さらに、二次光源形成部材として、上記の例では正レン
ズ作用を持つレンティキュラーレンズを用いたが、負レ
ンズ作用を持つものでも同様に用いることができ、この
場合には二次光源が虚像として形成される。Furthermore, although a lenticular lens with a positive lens effect was used as the secondary light source forming member in the above example, a lens with a negative lens effect can also be used in the same way.In this case, the secondary light source can be used as a virtual image. It is formed.
そして、レンティキュラーレンズとしては、その入射側
にレンズ面が形成されていてもよいし、射出側にレンズ
面が形成されていてもよく、両側にレンズ面を形成して
もよい。The lenticular lens may have a lens surface formed on its entrance side, a lens surface formed on its exit side, or a lens surface formed on both sides.
(発明の効果)
以上の如く、本発明によれば、レーザー等のコヒーレン
ト光源を用いながらも極めて均一性に優れた照明を行う
ことができ、例えばエキシマレーザ−のごとき高輝度高
効率の光源によって、従来以上に明るい均一照明が可能
となる。そして、半導体製造に不可欠のフォトリゾグラ
フィーを行うための装置の照明系として用いるならば、
従来と同様の均一性を維持しつつ極めて高輝度の照明が
可能となるため、いわゆるスルーブツトの向上をもたら
し、またレーザーによってより短波長の光を用いてフォ
トリゾグラフィーを行うことが可能となるため、超LS
Iパターンの一層の微細化にも有用である。(Effects of the Invention) As described above, according to the present invention, it is possible to provide extremely uniform illumination while using a coherent light source such as a laser. This enables brighter and more uniform illumination than ever before. If used as an illumination system for equipment for photolithography, which is essential for semiconductor manufacturing,
This makes it possible to provide extremely high-intensity illumination while maintaining the same uniformity as before, resulting in an improvement in throughput, and it also makes it possible to perform photolithography using shorter wavelength light using a laser. , super LS
It is also useful for further miniaturization of I patterns.
第1図は本発明による照明光学装置の原理を示す図、第
2図は本発明による実施例の概略構成図、第3図は光路
差生起部材の例を示す斜視図、第4図及び第5図は光路
差生起部材の他の例の説明図、第6図、第7図はそれぞ
れ光路差生起部材の例を示す側面図である。
〔主要部分の符号の説明〕
lO・・・コヒーレント光源
3.30.31.31”、31”、32.33・・・光
路差生起部材4.40 ・・・二次光源形成部材
6・・・被照明物体
出願人 日本光学工業株式会社
代理人 渡辺隆男
し−一一一一一一一一一」
N4図
第6図
第5図
第7図
3FIG. 1 is a diagram showing the principle of an illumination optical device according to the present invention, FIG. 2 is a schematic configuration diagram of an embodiment according to the present invention, FIG. 3 is a perspective view showing an example of an optical path difference generating member, and FIGS. FIG. 5 is an explanatory view of another example of the optical path difference generating member, and FIGS. 6 and 7 are side views showing examples of the optical path difference generating member, respectively. [Explanation of symbols of main parts] lO... Coherent light source 3. 30. 31. 31", 31", 32.33... Optical path difference generating member 4.40... Secondary light source forming member 6...・Illuminated object applicant: Takao Watanabe, agent of Nippon Kogaku Kogyo Co., Ltd. - 11111111” N4 Figure 6 Figure 5 Figure 7 Figure 3
Claims (1)
光束から複数の二次光源を形成するための二次光源形成
部材を設け、該コヒーレント光源と該二次光源形成部材
との間に、各二次光源に対応する光路の光路長に対して
互いに光路差を与えるための光路差生起部材を設けたこ
とを特徴とする照明光学装置。A coherent light source and a secondary light source forming member for forming a plurality of secondary light sources from the light flux supplied from the coherent light source are provided, and each secondary light source is provided between the coherent light source and the secondary light source forming member. An illumination optical device characterized in that an optical path difference generating member is provided for providing an optical path difference between the optical path lengths of corresponding optical paths.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59086669A JPH0792556B2 (en) | 1984-04-28 | 1984-04-28 | Exposure equipment |
| US06/726,232 US4619508A (en) | 1984-04-28 | 1985-04-23 | Illumination optical arrangement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59086669A JPH0792556B2 (en) | 1984-04-28 | 1984-04-28 | Exposure equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60230629A true JPS60230629A (en) | 1985-11-16 |
| JPH0792556B2 JPH0792556B2 (en) | 1995-10-09 |
Family
ID=13893436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59086669A Expired - Lifetime JPH0792556B2 (en) | 1984-04-28 | 1984-04-28 | Exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0792556B2 (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62231924A (en) * | 1986-04-02 | 1987-10-12 | Hitachi Ltd | Exposure lighting device |
| JPS62284340A (en) * | 1986-06-02 | 1987-12-10 | Nippon Telegr & Teleph Corp <Ntt> | Irradiation optical system |
| JPS6380243A (en) * | 1986-09-24 | 1988-04-11 | Nikon Corp | Illumination optical device for exposure equipment |
| KR20000065391A (en) * | 1999-04-02 | 2000-11-15 | 김영환 | Method for improving on uniformity of illuminance |
| EP1102058A1 (en) * | 1999-11-17 | 2001-05-23 | Applied Materials, Inc. | Method and apparatus for inspecting articles |
| US6249381B1 (en) | 1998-05-13 | 2001-06-19 | Sony Corporation | Illuminating method and illuminating device |
| US6347173B1 (en) | 1998-05-15 | 2002-02-12 | Sony Corporation | Optical coherence reduction method and its device, illuminating method and its system and optical fiber bundle |
| JP2004206004A (en) * | 2002-12-26 | 2004-07-22 | Sanyo Electric Co Ltd | Illuminating device and projection type image display device |
| JP2009288301A (en) * | 2008-05-27 | 2009-12-10 | V Technology Co Ltd | Proximity exposure apparatus |
| US7758192B2 (en) | 2006-11-27 | 2010-07-20 | Seiko Epson Corporation | Lighting device and projector |
| JP2016021049A (en) * | 2014-06-19 | 2016-02-04 | 株式会社Screenホールディングス | Light irradiation apparatus and drawing apparatus |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54111832A (en) * | 1978-02-22 | 1979-09-01 | Hitachi Ltd | Exposure device |
-
1984
- 1984-04-28 JP JP59086669A patent/JPH0792556B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54111832A (en) * | 1978-02-22 | 1979-09-01 | Hitachi Ltd | Exposure device |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62231924A (en) * | 1986-04-02 | 1987-10-12 | Hitachi Ltd | Exposure lighting device |
| JPS62284340A (en) * | 1986-06-02 | 1987-12-10 | Nippon Telegr & Teleph Corp <Ntt> | Irradiation optical system |
| JPS6380243A (en) * | 1986-09-24 | 1988-04-11 | Nikon Corp | Illumination optical device for exposure equipment |
| US6249381B1 (en) | 1998-05-13 | 2001-06-19 | Sony Corporation | Illuminating method and illuminating device |
| US6347173B1 (en) | 1998-05-15 | 2002-02-12 | Sony Corporation | Optical coherence reduction method and its device, illuminating method and its system and optical fiber bundle |
| KR20000065391A (en) * | 1999-04-02 | 2000-11-15 | 김영환 | Method for improving on uniformity of illuminance |
| EP1102058A1 (en) * | 1999-11-17 | 2001-05-23 | Applied Materials, Inc. | Method and apparatus for inspecting articles |
| JP2004206004A (en) * | 2002-12-26 | 2004-07-22 | Sanyo Electric Co Ltd | Illuminating device and projection type image display device |
| US7758192B2 (en) | 2006-11-27 | 2010-07-20 | Seiko Epson Corporation | Lighting device and projector |
| JP2009288301A (en) * | 2008-05-27 | 2009-12-10 | V Technology Co Ltd | Proximity exposure apparatus |
| JP2016021049A (en) * | 2014-06-19 | 2016-02-04 | 株式会社Screenホールディングス | Light irradiation apparatus and drawing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0792556B2 (en) | 1995-10-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4497015A (en) | Light illumination device | |
| US4619508A (en) | Illumination optical arrangement | |
| KR960042228A (en) | Hybrid lighting devices used in photolithography techniques | |
| JPH06214318A (en) | Reflection type homogenizer and reflection type illuminating optical device | |
| JPS61169815A (en) | exposure equipment | |
| JPH032284B2 (en) | ||
| JPS60230629A (en) | illumination optical device | |
| JPH09288251A5 (en) | Illumination apparatus, exposure apparatus, and semiconductor device manufacturing method | |
| JPS633288B2 (en) | ||
| JPH03215930A (en) | Lighting device | |
| JP3067491B2 (en) | Projection exposure equipment | |
| JP2023096984A (en) | Exposure apparatus and article manufacturing method | |
| JPH0774086A (en) | Projection exposure device | |
| JP2000039557A5 (en) | ||
| JPS62265722A (en) | Optical system for illumination | |
| JPH1062710A (en) | Illumination optical system | |
| JPH0744141B2 (en) | Lighting optics | |
| JPH01271718A (en) | illumination optical device | |
| JPH0769576B2 (en) | Lighting optics | |
| TW202144928A (en) | Exposure apparatus, exposure method, and method for producing object that suppresses deterioration of transfer performance for transferring a pattern to a substrate in broadband illumination light | |
| JPH0311614A (en) | Illuminating apparatus | |
| JPH07104563B2 (en) | Illumination optical device for exposure equipment | |
| JPS6225483A (en) | Illuminating device | |
| KR101999553B1 (en) | Illumination optical device, exposure apparatus, and method of manufacturing article | |
| JPH0684760A (en) | Formation of zonal luminous flux and illuminating optical device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |